JPH0631253A - Method and device for washing disk-shaped object - Google Patents

Method and device for washing disk-shaped object

Info

Publication number
JPH0631253A
JPH0631253A JP18717492A JP18717492A JPH0631253A JP H0631253 A JPH0631253 A JP H0631253A JP 18717492 A JP18717492 A JP 18717492A JP 18717492 A JP18717492 A JP 18717492A JP H0631253 A JPH0631253 A JP H0631253A
Authority
JP
Japan
Prior art keywords
cleaning
cleaned
shaped
disk
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18717492A
Other languages
Japanese (ja)
Inventor
Shigeru Nishizawa
茂 西沢
Original Assignee
Fuji Electric Co Ltd
富士電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd, 富士電機株式会社 filed Critical Fuji Electric Co Ltd
Priority to JP18717492A priority Critical patent/JPH0631253A/en
Publication of JPH0631253A publication Critical patent/JPH0631253A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve degree of surface cleanliness of an object to be washed by concentrating the main stream of washing liquid on a disk-shaped object to be washed having a center hole therein and utilizing the center hole which causes residual particle to improve use efficiency and washing efficiency. CONSTITUTION:Objects to be washed 1 such as substrates for magnetic recording medium are arranged parallelly with their centers aligned and stored in a supporting device 2. After the device 2 is placed in a washing tank 12, a water feed pipe 4 is inserted into a center hole 1a of the object 1 through a hole provided in the tank 12. The pipe 4 has thereon a large number of jet holes 4a and a rotation device 5 for rotation and a reciprocating device 6 for reciprocation in axial direction are provided, which are connected to a feed pipe 7. During the washing, the washing liquid is allowed to overflow from the tank 12 and during discharging water, the amount of feed water is made smaller to discharge water from the bottom.

Description

【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【産業上の利用分野】この発明は、磁気記録媒体用基板
などのような円盤状物体を純水などの洗浄液で洗浄する
洗浄装置及び洗浄方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus and a cleaning method for cleaning a disk-shaped object such as a magnetic recording medium substrate with a cleaning liquid such as pure water.
【0002】[0002]
【従来の技術】従来の磁気記録媒体用基板などのような
円盤状物体の洗浄装置及び洗浄方法は、数十枚単位の被
洗浄物を、中心を一致させ平行に並べてカセットともい
われる支持装置に収納し、これを洗浄槽に浸漬して上方
からのシャワー又は底部からの洗浄液の供給によって洗
浄し、洗浄が終了したら被洗浄物を引き上げ又は底部か
ら洗浄液を排水する。
2. Description of the Related Art A conventional apparatus and method for cleaning a disk-shaped object such as a substrate for a magnetic recording medium uses a support device also called a cassette in which several tens of objects to be cleaned are aligned in parallel with their centers aligned. It is housed, immersed in a cleaning tank and cleaned by showering from above or by supplying a cleaning liquid from the bottom, and when cleaning is completed, the object to be cleaned is pulled up or the cleaning liquid is drained from the bottom.
【0003】[0003]
【発明が解決しようとする課題】前記の従来の技術で
は、被洗浄物とこれを収納する支持装置が流体抵抗とな
るために、供給される洗浄液の主流は流体抵抗の少ない
洗浄槽の壁面に沿って流れることとなり、洗浄液の全部
が洗浄に寄与するわけではない。また、磁気記録媒体用
基板は中心部に穴の空いた円盤であるため、その穴の部
分が水流の溜まりとなってパーティクルが滞留しやすい
から、洗浄終了後に被洗浄物を引き上げるとき又は底部
からの排水のときに、滞留していた前記パーティクルが
被洗浄物の内周近傍に再付着して洗浄が完全に行われな
い。この残留パーティクルは後工程で磁気記録媒体用基
板などの被洗浄物の製品欠陥となる。
According to the above-mentioned conventional technique, since the object to be cleaned and the supporting device for accommodating the object to be cleaned have a fluid resistance, the main flow of the cleaning liquid supplied is to the wall surface of the cleaning tank having a small fluid resistance. Therefore, not all of the cleaning liquid contributes to cleaning. Further, since the magnetic recording medium substrate is a disk with a hole in the center thereof, the hole portion becomes a pool of water flow and particles are likely to stay, so when the object to be cleaned is pulled up after cleaning or from the bottom. At the time of the drainage, the accumulated particles are reattached to the vicinity of the inner circumference of the object to be cleaned, and the cleaning is not completely performed. The residual particles become a product defect of an object to be cleaned such as a magnetic recording medium substrate in a later process.
【0004】この発明の目的は、洗浄液の主流を被洗浄
物の円盤状物体に集中させ、残留パーティクルの原因と
なる中心穴を利用して洗浄液の使用効率と洗浄効率を向
上し、もって被洗浄物の表面清浄度を向上できる円盤状
物体の洗浄装置及び洗浄方法を提供することにある。
An object of the present invention is to concentrate the main stream of the cleaning liquid on the disk-shaped object of the cleaning object, and improve the use efficiency and cleaning efficiency of the cleaning solution by utilizing the central hole which causes the residual particles. An object of the present invention is to provide a cleaning device and a cleaning method for a disk-shaped object that can improve the surface cleanliness of an object.
【0005】[0005]
【課題を解決するための手段】発明1の洗浄装置は、中
心穴を有する被洗浄物を支持する支持装置と、前記被洗
浄物の中心穴に挿通されて外周に洗浄液の噴射口を持つ
給水管とを備えるものである。このとき、発明2は、前
記給水管を自転させる自転装置を備えるものである。
SUMMARY OF THE INVENTION A cleaning device according to a first aspect of the present invention is a support device for supporting an object to be cleaned having a center hole, and a water supply having an injection port for a cleaning liquid which is inserted through the center hole of the object to be cleaned. And a tube. At this time, the invention 2 includes a rotation device for rotating the water supply pipe.
【0006】発明3は、前記給水管を軸方向に往復させ
る往復動装置を備えるものである。発明4の洗浄装置
は、前記支持装置と前記給水管を、開閉可能な排水口を
底部に持つ洗浄槽の中に配置するものである。発明5の
洗浄方法は、中心穴を有する円盤状被洗浄物の中心部か
ら外周方向に洗浄液を噴射させるものである。このと
き、発明6は、前記洗浄液の噴射方向を周方向に自転さ
せるものである。
The invention 3 comprises a reciprocating device for reciprocating the water supply pipe in the axial direction. A cleaning device according to a fourth aspect of the invention arranges the support device and the water supply pipe in a cleaning tank having an openable / closable drain port at the bottom. A cleaning method according to a fifth aspect of the invention is to eject a cleaning liquid from a central portion of a disk-shaped object to be cleaned having a central hole toward an outer peripheral direction. At this time, the sixth aspect of the invention is to rotate the jet direction of the cleaning liquid in the circumferential direction.
【0007】発明7の洗浄方法は、発明5又は6におい
て、被洗浄物を底部に開閉可能な排水口を持つ洗浄槽の
中に配置し、前記洗浄液を前記排水口からの排水量より
多く噴射して前記洗浄槽からオーバフローさせながら洗
浄し、その後前記洗浄液を前記排水口からの排水量より
少なく噴射して洗浄を終了するものである。このとき、
発明8は、前記洗浄液を前記排水口からの排水量より多
く噴射するときに前記排水口を閉じているものである。
A cleaning method according to a seventh aspect of the present invention is the cleaning method according to the fifth or sixth aspect, in which the object to be cleaned is placed in a cleaning tank having a drain port that can be opened and closed at the bottom, and the cleaning liquid is sprayed in an amount larger than the amount discharged from the drain port. Thus, the cleaning liquid is washed while overflowing from the cleaning tank, and then the cleaning liquid is sprayed in an amount smaller than the amount of waste water discharged from the drain port to complete the cleaning. At this time,
The eighth aspect of the invention is to close the drain port when the cleaning liquid is injected in a larger amount than the drainage amount from the drain port.
【0008】[0008]
【作用】発明1によれば、被洗浄物1は支持装置2で支
持され、発明5の方法が使用できる。発明2によれば、
給水管の噴射口が周方向に自転し、発明6の方法が使用
できる。
According to the invention 1, the object to be cleaned 1 is supported by the supporting device 2, and the method of the invention 5 can be used. According to the invention 2,
The injection port of the water supply pipe rotates in the circumferential direction, and the method of the invention 6 can be used.
【0009】発明3によれば、洗浄開始・終了時に被洗
浄物の中心穴に給水管を挿脱する。発明4によれば、発
明7の方法が使用できる。発明5によれば、被洗浄物1
の中心穴1aの中心部から外周方向に放射状に噴射され
る洗浄液の主流は常に被洗浄物1の表面のパーティクル
を集中的に洗い、一度洗浄した洗浄液の排出液が新しい
洗浄液に混合して再び被洗浄物1の表面を流れることが
ない。このため、洗浄液の使用効率と洗浄効率が向上
し、被洗浄物1の表面清浄度が向上する。
According to the third aspect of the invention, the water supply pipe is inserted into and removed from the center hole of the object to be cleaned at the start and end of cleaning. According to invention 4, the method of invention 7 can be used. According to the invention 5, the article to be cleaned 1
The main stream of the cleaning liquid radially ejected from the central portion of the center hole 1a of the cleaning liquid always intensively cleans the particles on the surface of the object to be cleaned 1, and the discharged liquid of the cleaning liquid once cleaned is mixed with the new cleaning liquid again. It does not flow on the surface of the object to be cleaned 1. Therefore, the use efficiency of the cleaning liquid and the cleaning efficiency are improved, and the surface cleanliness of the object to be cleaned 1 is improved.
【0010】発明6によれば、被洗浄物1の表面の洗浄
作用の周方向の均一性が向上する。発明7によれば、洗
浄時には、被洗浄物1を洗浄した洗浄液は洗浄槽12の
壁面に沿って上昇しパーティクルとともにオーバフロー
して確実に排出され、排水時には、洗浄槽12内を低下
していく液面に漂うパーティクルは、被洗浄物1の表面
を流れる新しい洗浄液に押し流されて被洗浄物1に再付
着することがない。排水口11を多少開いてかつ洗浄液
が洗浄槽12からオーバフローするようにして洗浄をし
てもよく、重いパーティクルは排水口11から排出され
る。
According to the sixth aspect, the uniformity of the cleaning action on the surface of the object to be cleaned 1 in the circumferential direction is improved. According to the invention 7, at the time of cleaning, the cleaning liquid for cleaning the object to be cleaned 1 rises along the wall surface of the cleaning tank 12 and overflows with the particles to be reliably discharged, and when draining, the inside of the cleaning tank 12 lowers. The particles floating on the liquid surface will not be washed away by the new cleaning liquid flowing on the surface of the object to be cleaned 1 and reattached to the object to be cleaned 1. The drainage port 11 may be opened slightly and the washing liquid may overflow from the washing tank 12 for washing, and heavy particles are discharged from the drainage port 11.
【0011】このとき、発明8によれば、重いパーティ
クルがないとき、浮遊する軽いパーティクルは効率よく
オーバフローする。
At this time, according to the eighth aspect, when there are no heavy particles, the floating light particles efficiently overflow.
【0012】[0012]
【実施例】図1は実施例1の洗浄装置の透視正面図、図
2は図1の透視側面図、図3は図1の平面図、図4は図
1の給水管の要部拡大図、図5は図1の洗浄時の流れを
示す要部側面図、図6は図1の排水時の流れを示す要部
側面図であり、図7は実施例2の洗浄装置の透視正面図
であり、図8は実施例3の洗浄装置の透視正面図であ
る。各図において同一符号をつけるものはおよそ同一機
能を持ち、重複説明を省くこともある。また、図2にお
いてフック2dとハンガ3の図示を、図3においてハン
ガ3の図示をなど省略する。
FIG. 1 is a perspective front view of a cleaning apparatus according to a first embodiment, FIG. 2 is a perspective side view of FIG. 1, FIG. 3 is a plan view of FIG. 1, and FIG. 4 is an enlarged view of a main part of a water supply pipe of FIG. 5, FIG. 5 is a side view of a main part showing a flow at the time of cleaning in FIG. 1, FIG. 6 is a side view of a main part showing a flow at the time of draining of FIG. 1, and FIG. 7 is a perspective front view of the cleaning apparatus of the second embodiment. FIG. 8 is a perspective front view of the cleaning apparatus according to the third embodiment. In each figure, components having the same reference numeral have approximately the same function, and duplicate explanation may be omitted. Further, the hook 2d and the hanger 3 are not shown in FIG. 2, and the hanger 3 is not shown in FIG.
【0013】図1から図4までにおいて、磁気記録媒体
用基板などのような環状円板をなす被洗浄物1は、数十
枚単位で、軸心を一致させ平行に並べてカセットともい
われる支持装置2に収納される。支持装置2にはさまざ
まな形状があるが、ここでは一対の支持枠2aの4隅を
枠棒2bで結合し、被洗浄物1の外周を溝で支持する3
本以上の支持棒2cを支持枠2aに固定する。なお、3
本の支持棒2cの1本が上部にあってばねなどで下方に
付勢されるものでもよい。支持装置2はそのフック2d
をハンガ3に引っ掛けて搬送される。被洗浄物1の中心
穴1aに、外周に洗浄液のための複数の噴射口4aを持
つ給水管4を挿通する。給水管4には、これを自転させ
る自転装置5と、軸方向に往復させる往復動装置6を設
け、純水などの洗浄液を供給する供給管7に接続する。
In FIGS. 1 to 4, an object to be cleaned 1 which is an annular disk, such as a magnetic recording medium substrate, has a unit of several tens of sheets and is arranged in parallel with their axes aligned and is also called a cassette. It is stored in 2. The supporting device 2 has various shapes, but here, the four corners of the pair of supporting frames 2a are joined by the frame rods 2b, and the outer periphery of the object to be cleaned 1 is supported by the groove 3
More than one support rod 2c is fixed to the support frame 2a. 3
One of the supporting rods 2c of the book may be on the upper side and urged downward by a spring or the like. The support device 2 has its hook 2d
Is hooked on the hanger 3 and conveyed. A water supply pipe 4 having a plurality of injection ports 4a for cleaning liquid on the outer periphery is inserted into the center hole 1a of the object to be cleaned 1. The water supply pipe 4 is provided with a rotation device 5 that rotates the water supply pipe 4 and a reciprocating device 6 that reciprocates in the axial direction, and is connected to a supply pipe 7 that supplies a cleaning liquid such as pure water.
【0014】前記支持装置2と前記給水管4を、開閉可
能な排水口11を底部に持つ洗浄槽12の中に搬送可能
に配置する。被洗浄物1を収納した支持装置2を洗浄槽
12のスタンド12aの上に配置してから給水管4を洗
浄槽12に設けた図示しない穴と被洗浄物1の中心穴1
aに挿通する。前記穴と給水管4との隙間にラビリンス
シールなどを設けるとよい。
The support device 2 and the water supply pipe 4 are arranged so as to be able to be transported in a cleaning tank 12 having a drain port 11 which can be opened and closed at the bottom. The support device 2 accommodating the object to be cleaned 1 is placed on the stand 12a of the cleaning tank 12, and then the water supply pipe 4 is provided in the cleaning tank 12 through a hole (not shown) and the central hole 1 of the object to be cleaned 1.
Insert into a. A labyrinth seal or the like may be provided in the gap between the hole and the water supply pipe 4.
【0015】このような洗浄装置を使用する洗浄方法は
次のとおりである。被洗浄物1を収納した支持装置2と
給水管4を、洗浄槽12の中に配置する。環状円板をな
す被洗浄物1の中心穴1aの軸心近傍の給水管4の噴射
口4aから洗浄液を径方向に噴射させる。同時に給水管
4を自転装置5で自転させることにより、洗浄液の噴射
口4aを周方向に自転させる。更に給水管4を往復動装
置6で往復させることにより、洗浄液の噴射口4aを軸
方向に往復させる。洗浄時には排水量より多い給水量を
補給して洗浄を継続し、排水時には排水量より少ない給
水量を補給して洗浄を終了する。洗浄時には排水口11
を閉じて洗浄液がパーティクルとともに洗浄槽12から
オーバフローするようにして洗浄を継続するとよいが、
排水口11を多少開いてかつ洗浄液が洗浄槽12からオ
ーバフローするようにして洗浄をしてもよく、重いパー
ティクルは排水口11から排出される。
The cleaning method using such a cleaning device is as follows. The support device 2 accommodating the object to be cleaned 1 and the water supply pipe 4 are arranged in the cleaning tank 12. The cleaning liquid is sprayed in the radial direction from the spray port 4a of the water supply pipe 4 in the vicinity of the axis of the center hole 1a of the object 1 to be cleaned which is an annular disk. At the same time, the water supply pipe 4 is rotated by the rotation device 5, so that the cleaning liquid injection port 4a is rotated in the circumferential direction. Further, by reciprocating the water supply pipe 4 by the reciprocating device 6, the cleaning liquid injection port 4a is reciprocated in the axial direction. At the time of cleaning, the amount of water supplied that is greater than the amount of drainage is supplied to continue cleaning, and when draining, the amount of water supplied that is less than the amount of drainage is supplied to complete the cleaning. Drainage port 11 for cleaning
Is closed and the cleaning liquid may overflow from the cleaning tank 12 together with the particles to continue the cleaning.
The drainage port 11 may be opened slightly and the washing liquid may overflow from the washing tank 12 for washing, and heavy particles are discharged from the drainage port 11.
【0016】このような洗浄方法によれば、洗浄時は図
5に示すように、被洗浄物1の中心穴1aの軸心近傍の
噴射口4aから径方向に放射状に噴射される洗浄液の主
流は常に被洗浄物1の表面のパーティクルを集中的に洗
い、一度洗浄した洗浄液の排出液が新しい洗浄液に混合
して再び被洗浄物1の表面を流れることがない。このた
め、洗浄液の使用効率と洗浄効率が向上し、被洗浄物1
の表面清浄度が向上する。なお、慣用の方法により噴射
される洗浄液が図5に示すように適宜な角度θの広がり
を持つようにするとよい。また洗浄液の噴射口4aを周
方向に自転させるから、被洗浄物1の表面の洗浄作用の
周方向の均一性が向上する。そして洗浄液の噴射口4a
を軸方向に往復させるから、被洗浄物1の表面は確実に
洗浄液にさらされ洗浄作用が確保される。
According to such a cleaning method, as shown in FIG. 5, at the time of cleaning, the main flow of the cleaning liquid radially injected radially from the injection port 4a near the axis of the central hole 1a of the object to be cleaned 1 is performed. The particles of the surface of the object to be cleaned 1 are always intensively washed, and the discharged liquid of the cleaning liquid once cleaned does not mix with the new cleaning liquid and flow again on the surface of the object to be cleaned 1. Therefore, the use efficiency of the cleaning liquid and the cleaning efficiency are improved, and the cleaning target 1
The surface cleanliness of is improved. Incidentally, it is preferable that the cleaning liquid sprayed by the conventional method has an appropriate spread of the angle θ as shown in FIG. Further, since the cleaning liquid jet port 4a is rotated in the circumferential direction, the uniformity of the cleaning action on the surface of the object to be cleaned 1 in the circumferential direction is improved. And the cleaning liquid injection port 4a
Is reciprocated in the axial direction, the surface of the object to be cleaned 1 is reliably exposed to the cleaning liquid, and the cleaning action is secured.
【0017】洗浄時には排水量より多い給水量を補給し
て洗浄を継続するから、被洗浄物1を洗浄した洗浄液は
洗浄槽12の壁面に沿って上昇しパーティクルとともに
オーバフローして確実に排出される。図6に示すよう
に、排水時には排水量より少ない給水量を補給して洗浄
を終了するから、洗浄槽12内を低下していく液面に漂
うパーティクルは、被洗浄物1の表面を流れる新しい洗
浄液に押し流されて被洗浄物1に再付着することがな
い。
During cleaning, since the amount of water supplied is greater than the amount of waste water to continue the cleaning, the cleaning liquid for cleaning the object to be cleaned 1 rises along the wall surface of the cleaning tank 12 and overflows with particles to be reliably discharged. As shown in FIG. 6, when the water is drained, the amount of water supplied is smaller than the amount of the water drained to complete the cleaning. Therefore, the particles floating on the surface of the cleaning tank 12 that are descending are new cleaning liquid flowing on the surface of the object to be cleaned 1. It will not be washed away and will not adhere to the object to be cleaned 1 again.
【0018】図7に示す実施例2が実施例1と異なる点
は、洗浄槽12を持たない点であり、クリンールーム内
などで開放して使用する例であり、必要により逆U字状
のカバーで覆ってもよい。図8に示す実施例3が実施例
1と異なる点は、洗浄槽12と自転装置5と往復動装置
6とを持たない点であり、給水管4の噴射口4aを細密
にすればよい。
The second embodiment shown in FIG. 7 is different from the first embodiment in that it does not have the cleaning tank 12 and is used by opening it in a clean room or the like, and an inverted U-shaped cover if necessary. May be covered with. The third embodiment shown in FIG. 8 differs from the first embodiment in that the cleaning tank 12, the rotation device 5, and the reciprocating device 6 are not provided, and the injection port 4a of the water supply pipe 4 may be made fine.
【0019】[0019]
【発明の効果】以上の本発明の洗浄装置及び洗浄方法に
よれば、洗浄液の主流を被洗浄物に集中させ、残留パー
ティクルの原因となる中心穴を利用して洗浄液の使用効
率と洗浄効率が向上し、もって被洗浄物の表面清浄度を
向上できるという効果がある。
According to the above-described cleaning apparatus and cleaning method of the present invention, the main flow of the cleaning liquid is concentrated on the object to be cleaned, and the use efficiency and cleaning efficiency of the cleaning liquid are improved by utilizing the central hole that causes residual particles. This has the effect of improving the surface cleanliness of the object to be cleaned.
【図面の簡単な説明】[Brief description of drawings]
【図1】実施例1の洗浄装置の透視正面図FIG. 1 is a perspective front view of a cleaning device according to a first embodiment.
【図2】図1の透視側面図FIG. 2 is a perspective side view of FIG.
【図3】図1の平面図FIG. 3 is a plan view of FIG.
【図4】図1の給水管の要部拡大図FIG. 4 is an enlarged view of a main part of the water supply pipe of FIG.
【図5】図1の洗浄時の流れを示す要部側面図FIG. 5 is a side view of a main part showing a flow at the time of cleaning in FIG.
【図6】図1の排水時の流れを示す要部側面図FIG. 6 is a side view of a main part showing a flow at the time of draining in FIG.
【図7】実施例2の洗浄装置の透視正面図FIG. 7 is a transparent front view of the cleaning apparatus according to the second embodiment.
【図8】実施例3の洗浄装置の透視正面図FIG. 8 is a transparent front view of the cleaning apparatus according to the third embodiment.
【符号の説明】[Explanation of symbols]
1 被洗浄物 1a 中心穴 2 支持装置 3 ハンガ 4 給水管 4a 噴射口 5 自転装置 6 往復動装置 7 供給管 11 排水口 12 洗浄槽 1 Object to be washed 1a Center hole 2 Support device 3 Hanger 4 Water supply pipe 4a Injection port 5 Rotating device 6 Reciprocating device 7 Supply pipe 11 Drainage port 12 Cleaning tank

Claims (8)

    【特許請求の範囲】[Claims]
  1. 【請求項1】中心穴を有する円盤状被洗浄物を支持する
    支持装置と、前記被洗浄物の中心穴に挿通されて外周に
    洗浄液の噴射口を持つ給水管とを備えることを特徴とす
    る円盤状物体の洗浄装置。
    1. A support device for supporting a disk-shaped object to be cleaned having a central hole, and a water supply pipe which is inserted into the central hole of the object to be cleaned and has an injection port for the cleaning liquid on the outer periphery. Cleaning device for disk-shaped objects.
  2. 【請求項2】請求項1記載の円盤状物体の洗浄装置にお
    いて、前記給水管を自転させる自転装置を備えることを
    特徴とする円盤状物体の洗浄装置。
    2. The disk-shaped object cleaning apparatus according to claim 1, further comprising a rotation device for rotating the water supply pipe.
  3. 【請求項3】請求項1又は2記載の洗浄装置において、
    前記給水管を軸方向に往復させる往復動装置を備えるこ
    とを特徴とする円盤状物体の洗浄装置。
    3. The cleaning apparatus according to claim 1 or 2,
    A disk-shaped object cleaning device comprising a reciprocating device that reciprocates the water supply pipe in the axial direction.
  4. 【請求項4】請求項1、2又は3記載の洗浄装置におい
    て、前記支持装置と前記給水管を、開閉可能な排水口を
    底部に持つ洗浄槽の中に配置することを特徴とする円盤
    状物体の洗浄装置。
    4. The disk-shaped cleaning device according to claim 1, 2 or 3, wherein the support device and the water supply pipe are arranged in a cleaning tank having an openable / closable drain port at the bottom. Equipment for cleaning objects.
  5. 【請求項5】中心穴を有する円盤状被洗浄物の中心部か
    ら外周方向に洗浄液を噴射させることを特徴とする円盤
    状物体の洗浄方法。
    5. A method of cleaning a disk-shaped object, which comprises spraying a cleaning liquid from a central portion of a disk-shaped object to be cleaned having a central hole to an outer peripheral direction.
  6. 【請求項6】請求項5記載の洗浄方法において、前記洗
    浄液の噴射方向を周方向に自転させることを特徴とする
    円盤状物体の洗浄方法。
    6. The cleaning method according to claim 5, wherein the jetting direction of the cleaning liquid is rotated in the circumferential direction.
  7. 【請求項7】請求項5又は6記載の洗浄方法において、
    被洗浄物を底部に開閉可能な排水口を持つ洗浄槽の中に
    配置し、前記洗浄液を前記排水口からの排水量より多く
    噴射して前記洗浄槽からオーバフローさせながら洗浄
    し、その後前記洗浄液を前記排水口からの排水量より少
    なく噴射して洗浄を終了することを特徴とする円盤状物
    体の洗浄方法。
    7. The cleaning method according to claim 5 or 6,
    The object to be cleaned is placed in a cleaning tank having a drain port that can be opened and closed at the bottom, and the cleaning liquid is sprayed more than the amount discharged from the drain port for cleaning while overflowing from the cleaning tank, and then the cleaning liquid is A method for cleaning a disk-shaped object, characterized in that the cleaning is completed by injecting less than the amount of drainage from the drain port.
  8. 【請求項8】請求項7記載の洗浄方法において、前記洗
    浄液を前記排水口からの排水量より多く噴射するときに
    前記排水口を閉じていることを特徴とする円盤状物体の
    洗浄方法。
    8. The cleaning method according to claim 7, wherein the drain port is closed when the cleaning liquid is jetted in a larger amount than the drainage amount from the drain port.
JP18717492A 1992-07-15 1992-07-15 Method and device for washing disk-shaped object Pending JPH0631253A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18717492A JPH0631253A (en) 1992-07-15 1992-07-15 Method and device for washing disk-shaped object

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18717492A JPH0631253A (en) 1992-07-15 1992-07-15 Method and device for washing disk-shaped object

Publications (1)

Publication Number Publication Date
JPH0631253A true JPH0631253A (en) 1994-02-08

Family

ID=16201405

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18717492A Pending JPH0631253A (en) 1992-07-15 1992-07-15 Method and device for washing disk-shaped object

Country Status (1)

Country Link
JP (1) JPH0631253A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004043405A1 (en) * 2004-09-08 2006-03-16 Volkswagen Ag Method for cleaning a stack of plate-like objects e.g. metal sheets comprises impinging the stack with a cleaning fluid under pressure from a direction parallel to the plate direction
JP2009208064A (en) * 2008-02-04 2009-09-17 Nidec Sankyo Corp Washing tank and washing apparatus
JP2010099637A (en) * 2008-10-27 2010-05-06 Showa Denko Kk Apparatus and method for cleaning substrate
US8211241B2 (en) 2006-11-28 2012-07-03 Showa Denko K.K. Washing device and washing method for substrate for magnetic recording medium
JP2013016215A (en) * 2011-06-30 2013-01-24 Konica Minolta Advanced Layers Inc Process for producing glass substrate for hdd, glass substrate for hdd, and magnetic recording medium for hdd

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004043405A1 (en) * 2004-09-08 2006-03-16 Volkswagen Ag Method for cleaning a stack of plate-like objects e.g. metal sheets comprises impinging the stack with a cleaning fluid under pressure from a direction parallel to the plate direction
US8211241B2 (en) 2006-11-28 2012-07-03 Showa Denko K.K. Washing device and washing method for substrate for magnetic recording medium
JP2009208064A (en) * 2008-02-04 2009-09-17 Nidec Sankyo Corp Washing tank and washing apparatus
JP2010099637A (en) * 2008-10-27 2010-05-06 Showa Denko Kk Apparatus and method for cleaning substrate
JP2013016215A (en) * 2011-06-30 2013-01-24 Konica Minolta Advanced Layers Inc Process for producing glass substrate for hdd, glass substrate for hdd, and magnetic recording medium for hdd

Similar Documents

Publication Publication Date Title
TW396382B (en) Solution treatment apparatus
JP3131149B2 (en) Flow liquid scrubber cleaning method and apparatus
US4375992A (en) Apparatus and method for cleaning recorded discs
US5865894A (en) Megasonic plating system
JP2008077764A (en) Method of cleaning magnetic head slider, manufacturing method, and cleaning device
JPH0631253A (en) Method and device for washing disk-shaped object
JP3380021B2 (en) Cleaning method
JP2897537B2 (en) Substrate cleaning device
JP2893146B2 (en) Coating device
JP2006273671A (en) Crucible washing device
JP2001044106A (en) Wet equipment
JPH0620936A (en) Method and apparatus for cleaning treating solution dropping nozzle
JP3722337B2 (en) Wet processing equipment
JPH05160017A (en) Coating device
JPH09186126A (en) Cleaning device for semiconductor wafer
JP2883844B2 (en) High frequency cleaning method
JP3386892B2 (en) Wash tank
JP3068404B2 (en) Semiconductor substrate cleaning equipment
JP2606150B2 (en) Wet processing equipment
JP2000288490A (en) Wet treating device
KR101008114B1 (en) An apparatus for removing metallic foreign substance in strip cleaning tank
JPH09164374A (en) Ultrasonic cleaner
JP2703424B2 (en) Cleaning equipment
JP3877910B2 (en) Plating equipment
JPH09285768A (en) Work cleaning method and device therefor