JPH06179991A - Device and method for cleaning - Google Patents
Device and method for cleaningInfo
- Publication number
- JPH06179991A JPH06179991A JP33463292A JP33463292A JPH06179991A JP H06179991 A JPH06179991 A JP H06179991A JP 33463292 A JP33463292 A JP 33463292A JP 33463292 A JP33463292 A JP 33463292A JP H06179991 A JPH06179991 A JP H06179991A
- Authority
- JP
- Japan
- Prior art keywords
- work
- cleaning
- cleaning liquid
- fine bubbles
- bubbles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、熱処理後のワーク等を
洗浄液を満たした浸漬槽内に浸漬して洗浄を行う洗浄装
置及び洗浄方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus and a cleaning method for cleaning a work after heat treatment by immersing it in an immersion tank filled with a cleaning liquid.
【0002】[0002]
【従来の技術】例えば熱処理を施した後のワークの表面
にはごみや熱処理工程で用いる油分等が付着しており、
そのため熱処理後のワークの表面を洗浄する必要があ
る。このような場合、ワーク表面に洗浄液を吹き付けて
洗浄する他、洗浄液を満たした浸漬槽内にワークを浸漬
して洗浄を行う場合がある。このようにワークを浸漬槽
内に浸漬して洗浄を行う場合にはワーク表面に接する洗
浄液を常に交換させ洗浄効果を上げるために洗浄液を攪
拌する必要がある。そこで、浸漬槽の内底部にノズルを
設け、該ノズルから気泡を発生させてこの気泡の上昇に
より洗浄液を攪拌することが従来より行われている。2. Description of the Related Art For example, dust and oil used in a heat treatment process adhere to the surface of a work after heat treatment,
Therefore, it is necessary to clean the surface of the work after the heat treatment. In such a case, in addition to spraying the cleaning liquid onto the surface of the work, the work may be cleaned by immersing the work in an immersion tank filled with the cleaning liquid. When the work is immersed in the dipping tank for cleaning in this way, it is necessary to stir the cleaning liquid in order to constantly exchange the cleaning liquid in contact with the surface of the work and improve the cleaning effect. Therefore, it has been conventionally practiced to provide a nozzle at the inner bottom of the immersion tank, generate bubbles from the nozzle, and stir the cleaning liquid by the rise of the bubbles.
【0003】[0003]
【発明が解決しようとする課題】上記従来のものでは、
ワークに凹入部等の気泡が届きにくい部分があると、こ
の部分の洗浄液は気泡による攪拌では十分に交換させ
ず、そのため洗浄効果を上げることができないという問
題がある。SUMMARY OF THE INVENTION In the above conventional one,
If the work has a portion such as a recessed portion where air bubbles are hard to reach, the cleaning liquid in this portion cannot be sufficiently exchanged by stirring with the air bubbles, so that the cleaning effect cannot be enhanced.
【0004】尚、特開平2−293078号公報に記載
のように、微細気泡を洗浄液中に発生させればこの微細
気泡を凹入部内の奥深くまで到達させて汚れを該微細気
泡に吸着させることができるが、微細気泡は浮力が小さ
いため汚れを吸着した微細気泡がワーク表面近傍に滞留
し、新たな微細気泡がワーク表面に接近することを阻害
したり、一旦吸着した汚れをワーク表面に再付着させる
おそれがある。As described in JP-A-2-293078, if fine bubbles are generated in the cleaning liquid, the fine bubbles can reach deep inside the recessed portion to adsorb dirt to the fine bubbles. However, since the fine bubbles have small buoyancy, the fine bubbles that have adsorbed the dirt stay in the vicinity of the work surface and prevent new fine bubbles from approaching the work surface. May be attached.
【0005】そこで本発明は、上記不具合を解決すべ
く、浸漬槽を用いてワークの洗浄を行う際に、ワークの
細部に至るまで十分に洗浄することのできる洗浄装置及
び洗浄方法を提供することを目的とする。In view of the above, the present invention provides a cleaning apparatus and a cleaning method capable of sufficiently cleaning the details of a work when cleaning the work using an immersion tank in order to solve the above problems. With the goal.
【0006】[0006]
【課題を解決するための手段】上記目的を達成するため
に、請求項1の発明は、洗浄液を満たした浸漬槽内にワ
ークを浸漬して洗浄を行う装置において、上記浸漬槽の
内底部に微細気泡を発生させる第1ノズルと洗浄液を攪
拌し得る大きさの気泡を発生させる第2ノズルとを並設
すると共に、両ノズルに対して個々に空気を圧送する送
気手段を設けたことを特徴とする。In order to achieve the above object, the invention of claim 1 is an apparatus for cleaning a work by immersing a workpiece in an immersion tank filled with a cleaning liquid, wherein an inner bottom portion of the immersion tank is provided. A first nozzle for generating fine bubbles and a second nozzle for generating bubbles of a size capable of stirring the cleaning liquid are arranged in parallel, and an air supply means for individually feeding air to both nozzles is provided. Characterize.
【0007】また、請求項2の発明は、洗浄液を満たし
た浸漬槽内にワークを浸漬して洗浄を行う方法におい
て、上記浸漬槽の内底部から微細気泡と洗浄液を攪拌し
得る大きさの気泡とを交互に発生させることを特徴とす
る。The invention of claim 2 is a method of immersing a workpiece in an immersion tank filled with a cleaning liquid for cleaning, in which bubbles are sized so that fine bubbles and the cleaning liquid can be agitated from the inner bottom of the immersion tank. And is generated alternately.
【0008】[0008]
【作用】ワークが浸漬槽内に浸漬されると、まず微細気
泡を発生させ、該微細気泡をワークの細部まで到達させ
て汚れを吸着させる。次に、洗浄液を攪拌し得る大きさ
の気泡を発生させ、洗浄液全体を攪拌することにより汚
れを吸着した微細気泡をワーク表面から引き離し、更
に、微細気泡同士を衝突合体させて成長させたり、洗浄
液攪拌用の気泡に微細気泡を取り込んで、微細気泡が吸
着していた汚れを洗浄液表面に移動させる。When the work is dipped in the dipping tank, first, fine bubbles are generated, and the fine bubbles reach the details of the work to adsorb the dirt. Next, generate bubbles of a size that can stir the cleaning liquid, separate the fine bubbles that have adsorbed dirt from the work surface by stirring the entire cleaning liquid, and further grow by colliding and coalescing the fine bubbles. Fine bubbles are taken into the bubbles for stirring, and the dirt adsorbed by the fine bubbles is moved to the surface of the cleaning liquid.
【0009】[0009]
【実施例】図1及び図2を参照して、1は洗浄装置であ
って、該洗浄装置1内にはガイドレール13に沿い昇降
シリンダ11によって昇降される昇降枠12が設けられ
ており、該昇降枠12の底部に設けられたガイドレール
14上にワークWを多数搭載したパレットPが搬送され
ると昇降枠12を下降させ、該昇降枠12を浸漬槽2内
に浸漬し洗浄した後、昇降枠12と共にパレットPを引
き上げ、昇降枠12に対して垂直軸線回りに回動自在に
取り付けられたパイプ15の噴射ノズルとパレットPの
下方を往復する移動パイプ16の噴射ノズルとから洗浄
液をワークWに吹き付けてワークのすすぎを行い、洗浄
装置1からパレットPを払い出すようにした。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Referring to FIGS. 1 and 2, a cleaning device 1 is provided with an elevating frame 12 which is moved up and down by a lifting cylinder 11 along a guide rail 13 in the cleaning device 1. When a pallet P having a large number of works W mounted thereon is conveyed on a guide rail 14 provided at the bottom of the elevating frame 12, the elevating frame 12 is lowered, and the elevating frame 12 is immersed in the dipping tank 2 and washed. The pallet P is pulled up together with the elevating frame 12, and the cleaning liquid is supplied from the ejection nozzle of the pipe 15 rotatably attached to the elevating frame 12 around the vertical axis and the ejection nozzle of the moving pipe 16 that reciprocates below the pallet P. The work W was sprayed to rinse the work, and the pallet P was discharged from the cleaning device 1.
【0010】ところで、上記ワークWは本実施例の場
合、自動変速機に使用されるカウンタシャフトであり、
またパレットPは載置するワークWの個数と同数の開口
部PHを有するベース板PLと井桁状のガイド枠PUと
を各々の4隅及び中央の5か所で連結棒PBを介して上
下に連結したものである。また開口部PHの周縁部上面
には互いに等間隔を存して少なくとも3個の支持突起P
Sが立設され、ワークWの一側周面に設けられたギヤ部
WGの側面を該支持突起PSにて支持し、有底の深穴部
WHが下方に向って開口するようにした。In the present embodiment, the work W is a counter shaft used in an automatic transmission,
Further, the pallet P has a base plate PL having the same number of openings PH as the number of works W to be placed and a guide frame PU in the shape of a cross girder at the four corners and the central five places, respectively, via the connecting rods PB. It is a connection. In addition, at least three support protrusions P are evenly spaced from each other on the upper surface of the peripheral edge of the opening PH.
S is erected, and the side surface of the gear portion WG provided on one side peripheral surface of the work W is supported by the support protrusion PS, so that the bottomed deep hole portion WH is opened downward.
【0011】上記浸漬槽2の底部には2系統の送気パイ
プ22・23が配置されており、一方の送気パイプ22
には浸漬槽2内の洗浄液を攪拌し得る比較的大きな気泡
を発生させるノズルが複数並設されている。また、他方
の送気パイプ23は微細気泡(例えば気泡径が0.1μ
m〜3μm)を発生し得るよう焼結パイプで形成した。
そして、コンプレッサに接続されている元管4を、送気
パイプ22には切替バルブ41を介して連結し、送気パ
イプ23には切替バルブ42及び増圧ポンプ43を介し
て連結した。At the bottom of the immersion tank 2, two systems of air supply pipes 22 and 23 are arranged, and one of the air supply pipes 22 is provided.
A plurality of nozzles that generate relatively large bubbles that can stir the cleaning liquid in the dipping tank 2 are arranged side by side. Further, the other air supply pipe 23 has fine bubbles (for example, a bubble diameter of 0.1 μm).
m-3 μm) was used to form the sintered pipe.
Then, the main pipe 4 connected to the compressor was connected to the air supply pipe 22 via the switching valve 41, and was connected to the air supply pipe 23 via the switching valve 42 and the booster pump 43.
【0012】上記構成によれば、ワークWを搭載したパ
レットPが昇降枠12と共に下降し浸漬槽2内に浸漬さ
れると、まず送気パイプ23に空気を圧送し該送気パイ
プ23から微細気泡を発生させる。これにより、浸漬槽
2内全体に微細気泡が充満しワークWのあらゆる部分、
例えば深穴部WHの内部やギヤ部WGの歯底等に微細気
泡が到達してワークWの表面の汚れ等を吸着する。所定
時間微細気泡を発生させると、次に送気パイプ22のノ
ズルから上記比較的大きな気泡を発生させ洗浄液を攪拌
し、ワークWの表面に滞留している微細気泡をワークW
から引き離し、微細気泡を成長させながら微細気泡に吸
着された汚れを洗浄液表面に移動させ、浸漬槽2の周囲
に設けた樋21に洗浄液と共にオーバーフローさせる。
尚、送気パイプ22のノズルから比較的大きな気泡を発
生させる際には送気パイプ23からの微細気泡の発生は
停止させても継続させていても構わない。そして、所定
時間浸漬洗浄を行った後は上記のように昇降枠12と共
にワークWを引き上げ、すすぎを行いワークWに対する
洗浄を終了する。According to the above construction, when the pallet P on which the work W is mounted descends together with the elevating frame 12 and is immersed in the dipping tank 2, first, the air is sent under pressure to the air supply pipe 23, and the fine air is supplied from the air supply pipe 23. Generate bubbles. As a result, the entire inside of the immersion tank 2 is filled with fine bubbles, and every part of the work W,
For example, fine bubbles reach the inside of the deep hole portion WH or the tooth bottom of the gear portion WG to adsorb dirt and the like on the surface of the work W. When the fine bubbles are generated for a predetermined time, the relatively large bubbles are then generated from the nozzle of the air supply pipe 22 to stir the cleaning liquid and the fine bubbles remaining on the surface of the work W are removed.
The dirt adsorbed by the fine bubbles is moved to the surface of the cleaning liquid while growing the fine bubbles, and overflows together with the cleaning liquid into the gutter 21 provided around the dipping tank 2.
When relatively large bubbles are generated from the nozzle of the air supply pipe 22, the generation of fine bubbles from the air supply pipe 23 may be stopped or continued. Then, after immersion cleaning for a predetermined time, the work W is pulled up together with the elevating frame 12 and rinsed as described above, and the cleaning of the work W is completed.
【0013】ところで、上記実施例では上記送気パイプ
22・23への送気の切替は1回であったが、これを数
回繰り返し行うようにしてもよい。By the way, in the above embodiment, the air supply to the air supply pipes 22 and 23 was switched once, but this may be repeated several times.
【0014】[0014]
【発明の効果】以上の説明から明らかなように、本発明
によれば、浸漬槽にワークを浸漬して洗浄を行う際に、
該ワークに洗浄しにくい凹入部等があっても、該凹入部
内の細部に至るまで十分に洗浄することができる。As is clear from the above description, according to the present invention, when the work is immersed in the immersion tank for cleaning,
Even if the work has a recessed portion or the like that is difficult to clean, it is possible to sufficiently clean the details inside the recessed portion.
【図1】 本発明が適用される洗浄装置の構成を示す正
面図FIG. 1 is a front view showing the configuration of a cleaning device to which the present invention is applied.
【図2】 II−II断面図FIG. 2 II-II sectional view
1 洗浄装置 2 浸漬槽 4 元管 11 昇降シリンダ 12 昇降枠 22 送気パイプ 23 送気パイプ 43 増圧ポンプ P パレット W ワーク DESCRIPTION OF SYMBOLS 1 Cleaning device 2 Immersion tank 4 Main pipe 11 Elevating cylinder 12 Elevating frame 22 Air supply pipe 23 Air supply pipe 43 Booster pump P Pallet W Work
Claims (2)
漬して洗浄を行う装置において、上記浸漬槽の内底部に
微細気泡を発生させる第1ノズルと洗浄液を攪拌し得る
大きさの気泡を発生させる第2ノズルとを並設すると共
に、両ノズルに対して個々に空気を圧送する送気手段を
設けたことを特徴とする洗浄装置。1. An apparatus for cleaning a work by immersing a workpiece in a dipping tank filled with a cleaning liquid, wherein a first nozzle for generating fine bubbles and an air bubble having a size capable of stirring the cleaning liquid are provided in an inner bottom portion of the dipping tank. A cleaning device characterized in that a second nozzle to be generated is arranged in parallel, and an air supply means for individually feeding air to both nozzles is provided.
漬して洗浄を行う方法において、上記浸漬槽の内底部か
ら微細気泡と洗浄液を攪拌し得る大きさの気泡とを交互
に発生させることを特徴とする洗浄方法。2. A method of cleaning a work by immersing a work in a dipping tank filled with a cleaning liquid, wherein fine bubbles and bubbles having a size capable of stirring the cleaning liquid are alternately generated from an inner bottom portion of the dipping tank. A cleaning method characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33463292A JP3172818B2 (en) | 1992-12-15 | 1992-12-15 | Cleaning device and cleaning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33463292A JP3172818B2 (en) | 1992-12-15 | 1992-12-15 | Cleaning device and cleaning method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH06179991A true JPH06179991A (en) | 1994-06-28 |
JP3172818B2 JP3172818B2 (en) | 2001-06-04 |
Family
ID=18279553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33463292A Expired - Fee Related JP3172818B2 (en) | 1992-12-15 | 1992-12-15 | Cleaning device and cleaning method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3172818B2 (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08112574A (en) * | 1994-10-17 | 1996-05-07 | Kyoei Seisakusho:Kk | Cleaning method using functional water along with fine bubble |
JP2006147617A (en) * | 2004-11-16 | 2006-06-08 | Dainippon Screen Mfg Co Ltd | Substrate processor and particle removing method |
JP2009061454A (en) * | 2008-12-19 | 2009-03-26 | Mitsubishi Electric Corp | Washing method and washing object |
JP2009098270A (en) * | 2007-10-15 | 2009-05-07 | Tokyo Electron Ltd | Substrate cleaning device |
US7981286B2 (en) | 2004-09-15 | 2011-07-19 | Dainippon Screen Mfg Co., Ltd. | Substrate processing apparatus and method of removing particles |
JP2013251383A (en) * | 2012-05-31 | 2013-12-12 | Mitsubishi Electric Corp | Wafer cleaning device and cleaning method for cleaning tank |
CN103567183A (en) * | 2012-06-29 | 2014-02-12 | 台湾上村股份有限公司 | Micro-bubble type processing device |
US9206380B2 (en) | 2013-03-14 | 2015-12-08 | Ecolab Usa Inc. | Method of generating carbonate in situ in a use solution and of buffered alkaline cleaning under an enriched CO2 atmosphere |
KR101853412B1 (en) * | 2017-12-12 | 2018-04-30 | 임태균 | System for treating steel pipes with an acid and method thereof |
US10099264B2 (en) | 2008-02-11 | 2018-10-16 | Ecolab Usa Inc. | Bubble enhanced cleaning method and chemistry |
-
1992
- 1992-12-15 JP JP33463292A patent/JP3172818B2/en not_active Expired - Fee Related
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08112574A (en) * | 1994-10-17 | 1996-05-07 | Kyoei Seisakusho:Kk | Cleaning method using functional water along with fine bubble |
US7981286B2 (en) | 2004-09-15 | 2011-07-19 | Dainippon Screen Mfg Co., Ltd. | Substrate processing apparatus and method of removing particles |
JP2006147617A (en) * | 2004-11-16 | 2006-06-08 | Dainippon Screen Mfg Co Ltd | Substrate processor and particle removing method |
JP2009098270A (en) * | 2007-10-15 | 2009-05-07 | Tokyo Electron Ltd | Substrate cleaning device |
US10099264B2 (en) | 2008-02-11 | 2018-10-16 | Ecolab Usa Inc. | Bubble enhanced cleaning method and chemistry |
JP2009061454A (en) * | 2008-12-19 | 2009-03-26 | Mitsubishi Electric Corp | Washing method and washing object |
JP2013251383A (en) * | 2012-05-31 | 2013-12-12 | Mitsubishi Electric Corp | Wafer cleaning device and cleaning method for cleaning tank |
CN103567183A (en) * | 2012-06-29 | 2014-02-12 | 台湾上村股份有限公司 | Micro-bubble type processing device |
CN103567183B (en) * | 2012-06-29 | 2016-08-17 | 台湾上村股份有限公司 | Micro-bubble type processing device |
US9206380B2 (en) | 2013-03-14 | 2015-12-08 | Ecolab Usa Inc. | Method of generating carbonate in situ in a use solution and of buffered alkaline cleaning under an enriched CO2 atmosphere |
US9845447B2 (en) | 2013-03-14 | 2017-12-19 | Ecolab Usa Inc. | Method of generating carbonate in situ in a use solution and of buffered alkaline cleaning under an enriched CO2 atmosphere |
KR101853412B1 (en) * | 2017-12-12 | 2018-04-30 | 임태균 | System for treating steel pipes with an acid and method thereof |
Also Published As
Publication number | Publication date |
---|---|
JP3172818B2 (en) | 2001-06-04 |
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