CN202803656U

CN202803656U - Cleaning system for solar silicon wafer

Info

Publication number: CN202803656U
Application number: CN201220433044.XU
Authority: CN
Inventors: 左国军
Original assignee: Changzhou Jiejiachuang Precision Machinery Co Ltd
Current assignee: Changzhou Jiejiachuang Precision Machinery Co Ltd
Priority date: 2012-08-29
Filing date: 2012-08-29
Publication date: 2013-03-20
Anticipated expiration: 2022-08-29

Abstract

The utility model discloses a solar silicon wafer cleaning system, which comprises: a cleaning tank, a silicon wafer roller conveying device arranged above the tank body, and a plurality of spraying devices arranged above and below the conveying device for spraying and cleaning silicon wafers tube, wherein, the cleaning tank is divided into at least two tank bodies along the silicon wafer transport direction, and the spray pipe is divided into spray groups corresponding to each tank body. The utility model adopts a step-by-step spraying cleaning method to clean the acid-bearing silicon wafers multiple times, the silicon wafers are cleaned more thoroughly, and the water used to clean the silicon wafers is recycled to save water resources.

Description

The solar silicon wafers purging system

Technical field

The utility model relates to technical field of solar batteries, relates in particular to the solar silicon wafers purging system.

Background technology

In existing solar energy cleaning equipment and wet processing apparatus, especially in chain type solar energy cleaning equipment and the wet processing apparatus, after silicon chip is corroded out from dipper, remained on surface part soda acid, need in time silicon chip to be cleaned, in order to avoid silicon chip surface is corroded again by residual acid or alkali, the surface of corroding simultaneously exposes for a long time in air can produce new oxide layer, this will have a strong impact on the integral production technique of cell piece, reduce the conversion efficiency of cell piece.Existing silicon chip spraying cleaning system can wash residual acid or the alkali of silicon chip surface absorption.But existing spray system needs a large amount of water to clean, the waste resource, and cleaning performance is also unsatisfactory.

How to provide a kind of cleaning efficiency high, and the solar silicon wafers purging system of economical environment-protective is the technical problem that industry needs to be resolved hurrily.

Summary of the invention

For solving the technical problem that exists in the above-mentioned prior art, the utility model proposes a kind of solar silicon wafers purging system, comprise: rinse bath, be located at the silicon chip cylinder transmitting device of cell body top and be arranged on the conveyer above and below, the a plurality of showers that are used for the jet cleaning silicon chip, wherein, described rinse bath is divided at least two cell bodies along the chip transmission direction, and described shower is divided into the spray group corresponding to each cell body.As required, spray group internal sparger pipe quantity can change.

In a preferred embodiment, described rinse bath is divided into the first cell body and the second cell body, described shower adopts four groups of relative cylinder transmitting device showers setting up and down, and first group of shower is corresponding to the first cell body, and second group to the 4th group shower is corresponding to the second cell body.

Described first group to the 3rd group shower adopts a pair of secondary groove that supplies water up and down, and described the 4th group of shower adopts the secondary groove of a pair of up and down pure water.

The drainpipe of described the first cell body directly is disposed to sewage disposal system, and the drainpipe of described the second cell body connects the secondary groove circulation of supplying water.

The utility model is divided into several steps with traditional spray process; not only can wash timely residual acid or the alkali of silicon chip surface absorption; can also improve spray efficient; silicon chip can be accessed thoroughly to be cleaned; and shortened the time that silicon chip is further corroded, well protected the surperficial oxidized of silicon chip, in addition; part water reusable edible in the spray process, the using water wisely resource.

Description of drawings

Below in conjunction with accompanying drawing and preferred embodiment the utility model is described in detail, wherein:

Fig. 1 is the structural representation of the utility model preferred embodiment.

The specific embodiment

As shown in Figure 1, a kind of solar silicon wafers purging system that the utility model preferred embodiment provides, comprise: rinse bath 1, be located at the silicon chip cylinder transmitting device 2 of cell body top and be arranged on the conveyer above and below, the a plurality of showers 3 that are used for the jet cleaning silicon chip, rinse bath is divided at least two cell bodies along the chip transmission direction, and shower is divided into the spray group corresponding to each cell body.As required, spray group internal sparger pipe quantity can change.

In a preferred embodiment, the drainpipe 4 that rinse bath is divided into the first cell body 11 and the second cell body 12, the first cell bodies directly is disposed to sewage disposal system, and the drainpipe of the second cell body connects secondary groove 5 circulations of supplying water.Shower adopts four groups of relative cylinder transmitting device showers setting up and down, and first group of shower 31 be corresponding to the first cell body, second group of shower 32 to the 4th group of shower 34 corresponding to the second cell body.First group to the 3rd group shower 33 adopts a pair of 5, the four groups of showers of secondary groove 34 that supply water up and down to adopt the secondary groove 6 of a pair of up and down pure water.

The below introduces the course of work of the present utility model in detail.

Utilize pump to fetch water as the water source from the secondary groove 5 that supplies water with reference to 1, the first group of shower 31 of figure to the 3rd group of shower 33, the water inlet of the 4th group of shower 34 directly connects the secondary groove 6 of peripheral pure water, with new pure water as cleaning the water source.Silicon chip to be cleaned flows out from dipper, enter successively the first cell body 11, gearing by silicon chip cylinder transmitting device 2, during through first group of shower 31, shower sprays cleaning to the upper and lower surface with sour silicon chip up and down, the water with the high concentration liquid after the cleaning falls into the first cell body 11, is drained by the drainpipe 4 of the first cell body 11 bottoms.

Through the preliminary silicon chip that cleans, under the gearing of silicon chip cylinder transmitting device 2, enter the second cell body 12, second group of shower 32 and the 3rd group of shower 33 are again from further spraying cleaning to silicon chip surface up and down, the water that spray cleans flows back to the secondary groove 5 that supplies water from the bottom of the second cell body 12, so that recycling, economize on resources.

Silicon chip continues to advance forward, the 4th group of shower 34 fetched water from pure water device 6, utilize new pure water that silicon chip is sprayed cleaning again, the new pure water that utilized falls into the second cell body 12, flow into the secondary groove 5 that supplies water for recycling from the bottom, so that the water source of secondary groove can in time replenish, guaranteed the ordinary water level of secondary groove.

Only in order to illustrate structure of the present utility model, those of ordinary skill in the art can make various deformation and variation to above specific embodiment under design of the present utility model, and these distortion and variation include within protection domain of the present utility model.

Claims

1. A solar silicon wafer cleaning system, comprising: a cleaning tank, a silicon wafer roller conveying device located above the tank body, and a plurality of spray pipes arranged above and below the conveying device for spraying and cleaning silicon wafers, wherein It is characterized in that the cleaning tank is divided into at least two tank bodies along the silicon wafer conveying direction, and the spray pipes are divided into spray groups corresponding to each tank body.

2. The solar wafer cleaning system as claimed in claim 1, characterized in that: the cleaning tank is divided into a first tank body and a second tank body, and the spray pipes are arranged up and down in four groups relative to the roller conveying device The spray pipes of the first group correspond to the first tank body, and the second to fourth groups of spray pipes correspond to the second tank body.

3. The solar silicon wafer cleaning system as claimed in claim 2, characterized in that: said first to third groups of spray pipes use a pair of upper and lower water supply auxiliary tanks, and said fourth group of spray pipes use a pair of Upper and lower pure water auxiliary tanks.

4. The solar silicon wafer cleaning system according to claim 2, wherein the drainage pipe of the first tank body is directly discharged to the sewage treatment system, and the drain pipe of the second tank body is connected to the auxiliary water supply tank for circulation.