CN202803656U - Cleaning system for solar silicon wafer - Google Patents

Cleaning system for solar silicon wafer Download PDF

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Publication number
CN202803656U
CN202803656U CN 201220433044 CN201220433044U CN202803656U CN 202803656 U CN202803656 U CN 202803656U CN 201220433044 CN201220433044 CN 201220433044 CN 201220433044 U CN201220433044 U CN 201220433044U CN 202803656 U CN202803656 U CN 202803656U
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China
Prior art keywords
cell
cleaning
shower
silicon wafer
water
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Active
Application number
CN 201220433044
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Chinese (zh)
Inventor
左国军
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changzhou Jiejiachuang Precision Machinery Co Ltd
Original Assignee
Changzhou Jiejiachuang Precision Machinery Co Ltd
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Priority to CN 201220433044 priority Critical patent/CN202803656U/en
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Abstract

The utility model discloses a cleaning system for a solar silicon wafer. The cleaning system comprises a cleaning tank, a wafer cylinder conveying device arranged above tank bodies, and a plurality of spraying pipes which are arranged above and under the conveying device and used for spraying and cleaning the silicon wafer. The cleaning tank is divided into at least two tank bodies along the conveying direction of the silicon wafer, and the spraying pipes are divided into spraying groups corresponding to the tank bodies. By means of a multiple-step spraying and cleaning, the silicon wafer with acid can be cleaned for many times, silicon wafer cleaning can be thorough, water used for cleaning the relatively clean silicon wafer can be recycled, and water resources are saved.

Description

The solar silicon wafers purging system
Technical field
The utility model relates to technical field of solar batteries, relates in particular to the solar silicon wafers purging system.
Background technology
In existing solar energy cleaning equipment and wet processing apparatus, especially in chain type solar energy cleaning equipment and the wet processing apparatus, after silicon chip is corroded out from dipper, remained on surface part soda acid, need in time silicon chip to be cleaned, in order to avoid silicon chip surface is corroded again by residual acid or alkali, the surface of corroding simultaneously exposes for a long time in air can produce new oxide layer, this will have a strong impact on the integral production technique of cell piece, reduce the conversion efficiency of cell piece.Existing silicon chip spraying cleaning system can wash residual acid or the alkali of silicon chip surface absorption.But existing spray system needs a large amount of water to clean, the waste resource, and cleaning performance is also unsatisfactory.
How to provide a kind of cleaning efficiency high, and the solar silicon wafers purging system of economical environment-protective is the technical problem that industry needs to be resolved hurrily.
Summary of the invention
For solving the technical problem that exists in the above-mentioned prior art, the utility model proposes a kind of solar silicon wafers purging system, comprise: rinse bath, be located at the silicon chip cylinder transmitting device of cell body top and be arranged on the conveyer above and below, the a plurality of showers that are used for the jet cleaning silicon chip, wherein, described rinse bath is divided at least two cell bodies along the chip transmission direction, and described shower is divided into the spray group corresponding to each cell body.As required, spray group internal sparger pipe quantity can change.
In a preferred embodiment, described rinse bath is divided into the first cell body and the second cell body, described shower adopts four groups of relative cylinder transmitting device showers setting up and down, and first group of shower is corresponding to the first cell body, and second group to the 4th group shower is corresponding to the second cell body.
Described first group to the 3rd group shower adopts a pair of secondary groove that supplies water up and down, and described the 4th group of shower adopts the secondary groove of a pair of up and down pure water.
The drainpipe of described the first cell body directly is disposed to sewage disposal system, and the drainpipe of described the second cell body connects the secondary groove circulation of supplying water.
The utility model is divided into several steps with traditional spray process; not only can wash timely residual acid or the alkali of silicon chip surface absorption; can also improve spray efficient; silicon chip can be accessed thoroughly to be cleaned; and shortened the time that silicon chip is further corroded, well protected the surperficial oxidized of silicon chip, in addition; part water reusable edible in the spray process, the using water wisely resource.
Description of drawings
Below in conjunction with accompanying drawing and preferred embodiment the utility model is described in detail, wherein:
Fig. 1 is the structural representation of the utility model preferred embodiment.
The specific embodiment
As shown in Figure 1, a kind of solar silicon wafers purging system that the utility model preferred embodiment provides, comprise: rinse bath 1, be located at the silicon chip cylinder transmitting device 2 of cell body top and be arranged on the conveyer above and below, the a plurality of showers 3 that are used for the jet cleaning silicon chip, rinse bath is divided at least two cell bodies along the chip transmission direction, and shower is divided into the spray group corresponding to each cell body.As required, spray group internal sparger pipe quantity can change.
In a preferred embodiment, the drainpipe 4 that rinse bath is divided into the first cell body 11 and the second cell body 12, the first cell bodies directly is disposed to sewage disposal system, and the drainpipe of the second cell body connects secondary groove 5 circulations of supplying water.Shower adopts four groups of relative cylinder transmitting device showers setting up and down, and first group of shower 31 be corresponding to the first cell body, second group of shower 32 to the 4th group of shower 34 corresponding to the second cell body.First group to the 3rd group shower 33 adopts a pair of 5, the four groups of showers of secondary groove 34 that supply water up and down to adopt the secondary groove 6 of a pair of up and down pure water.
The below introduces the course of work of the present utility model in detail.
Utilize pump to fetch water as the water source from the secondary groove 5 that supplies water with reference to 1, the first group of shower 31 of figure to the 3rd group of shower 33, the water inlet of the 4th group of shower 34 directly connects the secondary groove 6 of peripheral pure water, with new pure water as cleaning the water source.Silicon chip to be cleaned flows out from dipper, enter successively the first cell body 11, gearing by silicon chip cylinder transmitting device 2, during through first group of shower 31, shower sprays cleaning to the upper and lower surface with sour silicon chip up and down, the water with the high concentration liquid after the cleaning falls into the first cell body 11, is drained by the drainpipe 4 of the first cell body 11 bottoms.
Through the preliminary silicon chip that cleans, under the gearing of silicon chip cylinder transmitting device 2, enter the second cell body 12, second group of shower 32 and the 3rd group of shower 33 are again from further spraying cleaning to silicon chip surface up and down, the water that spray cleans flows back to the secondary groove 5 that supplies water from the bottom of the second cell body 12, so that recycling, economize on resources.
Silicon chip continues to advance forward, the 4th group of shower 34 fetched water from pure water device 6, utilize new pure water that silicon chip is sprayed cleaning again, the new pure water that utilized falls into the second cell body 12, flow into the secondary groove 5 that supplies water for recycling from the bottom, so that the water source of secondary groove can in time replenish, guaranteed the ordinary water level of secondary groove.
Only in order to illustrate structure of the present utility model, those of ordinary skill in the art can make various deformation and variation to above specific embodiment under design of the present utility model, and these distortion and variation include within protection domain of the present utility model.

Claims (4)

1. solar silicon wafers purging system, comprise: rinse bath, be located at the silicon chip cylinder transmitting device of cell body top and be arranged on the conveyer above and below, the a plurality of showers that are used for the jet cleaning silicon chip, it is characterized in that, described rinse bath is divided at least two cell bodies along the chip transmission direction, and described shower is divided into the spray group corresponding to each cell body.
2. solar silicon wafers purging system as claimed in claim 1, it is characterized in that: described rinse bath is divided into the first cell body and the second cell body, described shower adopts four groups of relative cylinder transmitting device showers setting up and down, first group of shower is corresponding to the first cell body, and second group to the 4th group shower is corresponding to the second cell body.
3. solar silicon wafers purging system as claimed in claim 2 is characterized in that: a pair of secondary groove that supplies water up and down of described first group to the 3rd group shower employing, the secondary groove of a pair of up and down pure water of described the 4th group of shower employing.
4. solar silicon wafers purging system as claimed in claim 2 is characterized in that, the drainpipe of described the first cell body directly is disposed to sewage disposal system, and the drainpipe of described the second cell body connects the secondary groove circulation of supplying water.
CN 201220433044 2012-08-29 2012-08-29 Cleaning system for solar silicon wafer Active CN202803656U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201220433044 CN202803656U (en) 2012-08-29 2012-08-29 Cleaning system for solar silicon wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201220433044 CN202803656U (en) 2012-08-29 2012-08-29 Cleaning system for solar silicon wafer

Publications (1)

Publication Number Publication Date
CN202803656U true CN202803656U (en) 2013-03-20

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201220433044 Active CN202803656U (en) 2012-08-29 2012-08-29 Cleaning system for solar silicon wafer

Country Status (1)

Country Link
CN (1) CN202803656U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106884166A (en) * 2015-12-16 2017-06-23 浙江鸿禧能源股份有限公司 A kind of method for designing of cleaning and texturing rinsing bowl spray equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106884166A (en) * 2015-12-16 2017-06-23 浙江鸿禧能源股份有限公司 A kind of method for designing of cleaning and texturing rinsing bowl spray equipment

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