CN201702135U - Ultrasonic circulation wafer washer - Google Patents

Ultrasonic circulation wafer washer Download PDF

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Publication number
CN201702135U
CN201702135U CN2010201693137U CN201020169313U CN201702135U CN 201702135 U CN201702135 U CN 201702135U CN 2010201693137 U CN2010201693137 U CN 2010201693137U CN 201020169313 U CN201020169313 U CN 201020169313U CN 201702135 U CN201702135 U CN 201702135U
Authority
CN
China
Prior art keywords
ultrasonic
washer
circulation
tank
ultrasonic tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2010201693137U
Other languages
Chinese (zh)
Inventor
刘雷
罗贵实
陈鹏
赵亮
唐迪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jinzhou Rixin Silicon Material Co Ltd
Original Assignee
Jinzhou Rixin Silicon Material Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jinzhou Rixin Silicon Material Co Ltd filed Critical Jinzhou Rixin Silicon Material Co Ltd
Priority to CN2010201693137U priority Critical patent/CN201702135U/en
Application granted granted Critical
Publication of CN201702135U publication Critical patent/CN201702135U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

An ultrasonic circulation wafer washer solves the problem that insufficient wafer flushing and mortar residues and metal impurities left on the surfaces of wafers during production of monocrystalline silicon cause degrading of the wafers, and comprises an ultrasonic tank, a drain valve is arranged on one side of the ultrasonic tank, a support for holding wafers is erected at an opening of the ultrasonic tank, and a collection net is arranged inside the ultrasonic tank. The ultrasonic circulation wafer washer is characterized in that a circulation water pipeline is further arranged on the ultrasonic tank and connected with a stripy nozzle through a filter device and a water pump. The ultrasonic circulation wafer washer has the advantages that the washer reuses water to reduce cost, flowing water generated by the stripy nozzle solves the problem that residues and metal impurities in gaps of the wafers cannot be spilled only by ultrasonic, and the washer can more thoroughly and clearly flush the wafer so as to increase product quality.

Description

Ultrasonic circulation silicon wafer cleaner
Technical field
The utility model relates to the ultrasonic circulation silicon wafer cleaner that uses in a kind of monocrystalline silicon production process.
Background technology
It is ultrasonic need to use supersonic wave cleaning machine that silicon chip is carried out in the monocrystalline silicon production process, washes the residue that is present in the silicon chip gap and metal impurities etc.Because the gap of silicon chip is very little, is difficult to make residue and metal impurities to overflow, cause the appearance of defective works such as a large amount of greasy dirt sheets, flower sheet, influence product quality.In addition, the water in the groove can not flow, and needs the frequent water that changes, and waste water resource has increased production cost.
Summary of the invention
The technical problems to be solved in the utility model provides a kind of residue in silicon chip gap and metal impurities of making and overflows, make silicon chip wash more thoroughly, cleaner, improve the quality of products, water can recycle, and saves the ultrasonic circulation silicon wafer cleaner of cost.
The ultrasonic circulation silicon wafer cleaner that the utility model relates to, comprise ultrasonic tank, be provided with water discharging valve in ultrasonic tank one side, notch place in ultrasonic tank is overlapped with the support that is used to place silicon chip, in ultrasonic tank, be provided with collecting net, its special character is: also be provided with circulating water line on ultrasonic tank, circulating water line is connected with the bar shaped shower nozzle by filter and suction pump.
Above-mentioned ultrasonic circulation silicon wafer cleaner, described support links together by connecting rod and collecting net.
The utility model compared with prior art has following advantage:
Water can be recycling, guaranteed to save production cost the cleaning of recirculated water by filter; Make the water generates flowing effect in ultrasonic, the residue and the metal impurities in silicon chip gap are taken away by suction pump with ripples, produce the circulation flushing effect with this.The flowed current that produce by the bar shaped shower nozzle have solved and have only depended on the ultrasonic problem that silicon chip gap residue and metal impurities are overflowed, make silicon chip wash more thoroughly, cleaner, improved product quality.
Description of drawings
Fig. 1 is a structural representation of the present utility model.
Among the figure: Water filling valve 1, support 2, collecting net 3, connecting rod 4, water discharging valve 5, bar shaped shower nozzle 6, suction pump 7, filter 8, circulating water line 9, ultrasonic tank 10.
The specific embodiment
As shown in the figure, this ultrasonic circulation silicon wafer cleaner has a ultrasonic tank 10, is provided with water discharging valve 5 and circulating water line 9 in ultrasonic tank 10 1 sides, and circulating water line 9 is connected with bar shaped shower nozzle 6 by filter 8 and suction pump 7.Be overlapped with the support 2 that is used to place silicon chip at the notch place of ultrasonic tank 10, in ultrasonic tank 10, be provided with collecting net 3, be used for receiving the silicon chip that may come off when ultrasonic.Collecting net 3 links together by connecting rod 4 with support 2.When water level is not enough, open Water filling valve 1, the too high then opening water discharge of water level valve 5.When the water in the groove is limpid gradually, open suction pump 7, make clear water install position and the direction of 8 backs after filtration by manually-operated bar shaped shower nozzle 6 control current, clear water is squeezed in the ultrasonic tank 10 again so that the position and the direction of control current, in ultrasonic, make the water generates flowing effect, the residue in silicon chip gap and metal impurities are taken away by suction pump 7 with ripples, produce the circulation flushing effect with this.

Claims (2)

1. ultrasonic circulation silicon wafer cleaner, comprise ultrasonic tank, be provided with water discharging valve in ultrasonic tank one side, notch place in ultrasonic tank is overlapped with the support that is used to place silicon chip, in ultrasonic tank, be provided with collecting net, it is characterized in that: also be provided with circulating water line on ultrasonic tank, circulating water line is connected with the bar shaped shower nozzle by filter and suction pump.
2. ultrasonic circulation silicon wafer cleaner according to claim 1, it is characterized in that: described support links together by connecting rod and collecting net.
CN2010201693137U 2010-04-19 2010-04-19 Ultrasonic circulation wafer washer Expired - Fee Related CN201702135U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2010201693137U CN201702135U (en) 2010-04-19 2010-04-19 Ultrasonic circulation wafer washer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2010201693137U CN201702135U (en) 2010-04-19 2010-04-19 Ultrasonic circulation wafer washer

Publications (1)

Publication Number Publication Date
CN201702135U true CN201702135U (en) 2011-01-12

Family

ID=43439282

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010201693137U Expired - Fee Related CN201702135U (en) 2010-04-19 2010-04-19 Ultrasonic circulation wafer washer

Country Status (1)

Country Link
CN (1) CN201702135U (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102218413A (en) * 2011-05-18 2011-10-19 益阳晶益电子有限公司 Method and device for cleaning quartz wafers
CN102363146A (en) * 2011-08-09 2012-02-29 太仓协鑫光伏科技有限公司 Flushing device capable of recycling water
CN103008281A (en) * 2011-09-20 2013-04-03 宜兴市环洲微电子有限公司 Cleaning tank used for cleaning semiconductor wafers
CN103522169A (en) * 2012-07-05 2014-01-22 上海宏力半导体制造有限公司 Water tank system for chemical grinding machine
CN104525518A (en) * 2014-12-13 2015-04-22 苏州汇诚智造工业设计有限公司 Rapid washing equipment for constructional engineering safety net and manufacturing method of rapid washing equipment
CN104690034A (en) * 2015-04-07 2015-06-10 黄浩 Ultrasonic cleaning device for cleaning metal watchbands
CN104841664A (en) * 2015-04-18 2015-08-19 成都菲斯普科技有限公司 Medical ultrasonic cleaning device
CN105149286A (en) * 2015-09-25 2015-12-16 无锡市博阳超声电器有限公司 Ultrasonic filtering cleaning tank
CN107164109A (en) * 2017-03-31 2017-09-15 吴江创源新材料科技有限公司 Cleaning fluid and preparation method thereof and cleaning before a kind of sapphire wafer annealing
CN108176670A (en) * 2015-11-20 2018-06-19 苏州赛森电子科技有限公司 Ultrasonic processing equipment in DMOS disk process
CN113600554B (en) * 2021-10-09 2021-12-07 南通欧能达超声设备有限公司 Ultrasonic chip cleaning equipment

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102218413A (en) * 2011-05-18 2011-10-19 益阳晶益电子有限公司 Method and device for cleaning quartz wafers
CN102363146A (en) * 2011-08-09 2012-02-29 太仓协鑫光伏科技有限公司 Flushing device capable of recycling water
CN103008281A (en) * 2011-09-20 2013-04-03 宜兴市环洲微电子有限公司 Cleaning tank used for cleaning semiconductor wafers
CN103522169A (en) * 2012-07-05 2014-01-22 上海宏力半导体制造有限公司 Water tank system for chemical grinding machine
CN104525518A (en) * 2014-12-13 2015-04-22 苏州汇诚智造工业设计有限公司 Rapid washing equipment for constructional engineering safety net and manufacturing method of rapid washing equipment
CN104525518B (en) * 2014-12-13 2017-04-12 江苏泰建建设集团有限公司 Rapid washing equipment for constructional engineering safety net and manufacturing method of rapid washing equipment
CN104690034A (en) * 2015-04-07 2015-06-10 黄浩 Ultrasonic cleaning device for cleaning metal watchbands
CN104841664A (en) * 2015-04-18 2015-08-19 成都菲斯普科技有限公司 Medical ultrasonic cleaning device
CN105149286A (en) * 2015-09-25 2015-12-16 无锡市博阳超声电器有限公司 Ultrasonic filtering cleaning tank
CN108176670A (en) * 2015-11-20 2018-06-19 苏州赛森电子科技有限公司 Ultrasonic processing equipment in DMOS disk process
CN107164109A (en) * 2017-03-31 2017-09-15 吴江创源新材料科技有限公司 Cleaning fluid and preparation method thereof and cleaning before a kind of sapphire wafer annealing
CN113600554B (en) * 2021-10-09 2021-12-07 南通欧能达超声设备有限公司 Ultrasonic chip cleaning equipment

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Date Code Title Description
GR01 Patent grant
C14 Grant of patent or utility model
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20110112

Termination date: 20130419

C17 Cessation of patent right