CN203900007U

CN203900007U - Solar silicon wafer cleaning device

Info

Publication number: CN203900007U
Application number: CN201420311982.1U
Authority: CN
Inventors: 牛龙; 王文; 童林剑; 张斌; 胡亚东; 董典谟; 樊帅
Original assignee: Shaanxi Tianhong Silicon Material Co Ltd
Current assignee: Shaanxi Tianhong Silicon Material Co Ltd
Priority date: 2014-06-12
Filing date: 2014-06-12
Publication date: 2014-10-29
Anticipated expiration: 2024-06-12

Abstract

The utility model discloses a solar silicon wafer cleaning device which comprises a precleaning slot, a first alkaline slot, a second alkaline slot, an alkaline cleaning slot, a first rinse slot, a second rinse slot, a third rinse slot and a pure water slot, wherein the first alkaline slot, the second alkaline slot and the alkaline cleaning slot are sequentially adjacent to the precleaning slot. Liquid in the pure water slot overflows from the upper portion of the pure water slot to the third rinse slot, and then overflows to the second rinse slot from the upper portion of the third rinse slot. The solar silicon wafer cleaning device further comprises a tap water pipeline, a pure water pipeline and a drainage pipeline, wherein the tap water pipeline is connected with the middle position of a slot body of the precleaning slot and the middle position of a slot body of the alkaline cleaning slot, the pure water pipeline is connected with the first alkaline slot, the second alkaline slot, the first rinse slot, the third rinse slot and the pure water slot, and the drainage pipeline is connected with the bottoms of the slot bodies respectively. A polysilicon wafer cleaning machine can clean (high in requirement and multiple in slot bodies) monocrystalline silicon wafers, and the purposes that the surfaces of the silicon wafers are high in quality and clean, pure water consumption is reduced, production cost is reduced, and thus the production benefit is increased are achieved.

Description

A kind of solar silicon wafers cleaning equipment

Technical field

The utility model belongs to semiconductor applications, is specifically related to a kind of solar silicon wafers cleaning equipment.

Background technology

Clean as the committed step of preparing silicon suitable for solar purposes sheet, to Si wafer quality, comprise that appearance, surface metal ion concentration etc. and even follow-up process for etching have vital impact.It is mainly that organic matter stains that silicon chip surface stains, and particle contaminant and metal ion stain, as Cu, and Fe, Na etc.The diffusion coefficient of Fe is larger, is easy to be diffused into inner formation deep energy level complex centre from silicon chip surface, thereby affects non-equilibrium minority carrier life time and then reduce photoelectric transformation efficiency.

The pollutant sources of silicon chip surface mainly contains: the pollution that operated implement brings, the pollution that in the pollution that the pollution of working fluid, environmental pollution, operating personnel bring and process, silicon chip surface generation chemical reaction produces etc.

At present, the cleaning of solar level monocrystalline silicon piece be after section by the silicon chip after coming unstuck, first by pure water Ultrasonic Cleaning, then under pure water and cleaning agent certain proportion, carry out Ultrasonic Cleaning, through pure water ultrasonic rinsing repeatedly, complete cleaning more afterwards.This cleaning method requires cleaning equipment need to have 9 grooves at least, otherwise clean not thorough, cause chemicals, metal impurities, the cleaning agent on solar monocrystalline silicon slice surface residual, can make fine-hair maring using monocrystalline silicon slice rear surface occur turning white, produce aberration phenomenon, reduce the conversion efficiency of cell piece, the specification requirement that does not even reach cell piece, affects quality and the yield rate of product.

Utility model content

The technical problems to be solved in the utility model is to provide a kind of solar silicon wafers cleaning equipment, improving and optimizating with scrap build of silicon wafer cleaning process combined, the less polysilicon chip cleaning machine of cell body can be cleaned (to be required high, cell body is many) monocrystalline silicon piece, reach silicon chip surface quality clean, pure water consumption reduces, and production cost reduces, and finally realizes the object that productivity effect improves.

For achieving the above object, the technical solution of the utility model is as follows:

A solar silicon wafers cleaning equipment, comprising:

One precleaning spout,

One with precleaning spout successively adjacent the first alkali groove, the second alkali groove, alkali rinse bath, and the first potcher, the second potcher, the 3rd potcher and pure water groove,

Described pure water groove, forms overflow effect between the 3rd potcher and the second potcher three, and the liquid in described pure water groove is from top overflow to the three potchers, then from the 3rd potcher top overflow to the second potcher,

Also comprise a water supply pipe, described water supply pipe connects respectively the cell body medium position of prewash tank and alkali rinse bath,

One pure water pipeline, described pure water pipeline connects the first alkali groove, the second alkali groove, the first potcher, the 3rd potcher and pure water groove,

One drainage pipeline, described drainage pipeline is connected with the bottom of above-mentioned each cell body.

In a preferred embodiment of the present utility model, described precleaning spout is divided into bubbling and two stations of Ultrasonic Cleaning of adjacent setting.

In a preferred embodiment of the present utility model, also comprise an auxiliary groove and a circulating water pipeline being connected with auxiliary groove, described circulating water pipeline is interconnected described the first potcher and the second potcher, and described auxiliary groove is by liquid suction first potcher of the second potcher.

By technique scheme, the beneficial effects of the utility model are:

1, input cost reasonable in design low and realize convenient.

2, two stations that precleaning spout increases, have improved the prerinse ability of silicon chip, thereby promote Wafer Cleaning quality.

3, the pure water overflow pipe and the water supply pipe that increase, increased the number of potcher, guaranteed the rinsing ability of silicon chip, and effectively reduced the use amount of pure water, reduces costs.

Accompanying drawing explanation

In order to be illustrated more clearly in the utility model embodiment or technical scheme of the prior art, to the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described below, apparently, accompanying drawing in the following describes is only embodiment more of the present utility model, for those of ordinary skills, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.

Fig. 1 is structural representation of the present utility model.

Illustrate each label as follows:

1# prewash tank, 2# the first alkali groove, 3# the second alkali groove, 4# alkali potcher, 5# the first potcher, 6# the second potcher, 7# the 3rd potcher, 8# pure water groove, the auxiliary groove of 9#, I water supply pipe, II pure water pipeline, III drainage pipeline, IV circulating water pipeline.

The specific embodiment

For technological means, creation characteristic that the utility model is realized, reach object and effect is easy to understand, below in conjunction with concrete diagram, further set forth the utility model.

With reference to Fig. 1, sun energy single crystal battery Wafer Cleaning equipment, comprise: 1# prewash tank, 2# the first alkali groove, 3# the second alkali groove, 4# alkali potcher, 5# the first potcher, 6# the second potcher, 7# the 3rd potcher, 8# pure water groove, I water supply pipe, II pure water pipeline, III drainage pipeline, IV circulating water pipeline.

Concrete install as follows, comprise a 1# precleaning spout, one and 1# precleaning spout adjacent 2# the first alkali groove, 3# the second alkali groove successively, 4# alkali rinse bath, and 5# the first potcher, 6# the second potcher, 7# the 3rd potcher and 8# pure water groove,

Each cell body is adjacent successively, I water supply pipe injects running water from the cell body middle part of 1# precleaning spout and 4# alkali rinse bath, II pure water pipeline injects pure water from the cell body middle part of 2# the first alkali groove, 3# the second alkali groove, 5# the first potcher, 7# the 3rd potcher, 8# pure water groove, III drainage pipeline is discharged sewage from each trench bottom, IV circulating water pipeline, pure water overflows to the auxiliary groove of 9# from 6# the second potcher, then is injected into 5# the first potcher from the auxiliary groove water of 9# pump.

The utility model solar energy single crystal cell silicon chip cleaning equipment is divided into two parts by the prewash tank of legacy equipment, sets up compressed air bubbling and ultrasonic wave, has reached good prerinse effect;

Increase the auxiliary groove of 9# to the pure water inlet channel of 5# the first potcher, the pure water that overflows to auxiliary groove is injected into 4# groove, increased a potcher, improved cleansing power; By pure water, change 3# the second alkali groove water inlet into running water, reach sufficient rinsing.

During work, silicon chip of solar cell is the I station bubbling prerinse in prewash tank 1 first, then enter the prerinse of II station ultrasonic wave, enter successively again 2# the first alkali groove, 3# the second alkali groove, 4# alkali potcher, 5# the first potcher, 6# the second potcher, 7# the 3rd potcher, 8# pure water groove, pure water constantly injects from 8# pure water trench bottom, then the 3rd potcher from top overflow to 7#, again from 7# the 3rd potcher top overflow to 6# the second potcher, and then from 6# the second potcher top overflow to the auxiliary groove of 9#, finally from auxiliary groove, pure water is injected into 5# the first potcher, in 4# alkali potcher, from bottom, inject running water.

The water of whole process is from the overflow of 8# pure water groove to 7# the 3rd potcher, overflow to again 6# the second potcher again overflow to 5# the first potcher, pure water is fully used, saved the water consumption of whole process, and improved the cleaning quality of monocrystalline silicon piece, thereby reduced production cost.

More than show and described basic principle of the present utility model and principal character and advantage of the present utility model.The technical staff of the industry should understand; the utility model is not restricted to the described embodiments; that in above-described embodiment and description, describes just illustrates principle of the present utility model; do not departing under the prerequisite of the utility model spirit and scope; the utility model also has various changes and modifications, and these changes and improvements all fall within the scope of claimed the utility model.The claimed scope of the utility model is defined by appending claims and equivalent thereof.

Claims

1. a solar silicon wafers cleaning equipment, is characterized in that, comprising:

One precleaning spout,

Also comprise a water supply pipe, described water supply pipe connects respectively the cell body medium position of precleaning spout and alkali rinse bath,

2. a kind of solar silicon wafers cleaning equipment according to claim 1, is characterized in that, described precleaning spout is divided into bubbling and two stations of Ultrasonic Cleaning of adjacent setting.

3. a kind of solar silicon wafers cleaning equipment according to claim 1, it is characterized in that, also comprise an auxiliary groove and a circulating water pipeline being connected with auxiliary groove, described circulating water pipeline is interconnected described the first potcher and the second potcher, and described auxiliary groove is by liquid suction first potcher of the second potcher.