CN107716440B - Solar silicon wafer cleaning machine - Google Patents
Solar silicon wafer cleaning machine Download PDFInfo
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- CN107716440B CN107716440B CN201710872645.8A CN201710872645A CN107716440B CN 107716440 B CN107716440 B CN 107716440B CN 201710872645 A CN201710872645 A CN 201710872645A CN 107716440 B CN107716440 B CN 107716440B
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- solar silicon
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- 238000004140 cleaning Methods 0.000 title claims abstract description 75
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 40
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 40
- 239000010703 silicon Substances 0.000 title claims abstract description 40
- 238000009434 installation Methods 0.000 claims description 15
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 9
- 238000003466 welding Methods 0.000 claims description 6
- 230000002035 prolonged effect Effects 0.000 abstract description 6
- 235000012431 wafers Nutrition 0.000 description 28
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000003513 alkali Substances 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000013083 solar photovoltaic technology Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1876—Particular processes or apparatus for batch treatment of the devices
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses a solar silicon wafer cleaning machine which comprises a cleaning machine body, wherein four corners of the bottom of the cleaning machine body are respectively provided with an adjusting groove, the inner walls of two sides of each adjusting groove are respectively provided with a driving groove, the inner walls of the two sides, far away from each other, of the two driving grooves on the same adjusting groove are respectively provided with a push rod motor in a sliding manner, the inner wall of the top of each adjusting groove is hinged with two symmetrically arranged upper supporting rods, the bottom ends of the upper supporting rods extend into the corresponding driving grooves and are rotatably installed with the output shaft of the push rod motor, and the output shaft of the push rod motor is also rotatably installed with a lower supporting rod. The cleaning machine is high in practicability, simple in structure and convenient to operate, the idler wheel is convenient to move, so that the cleaning machine body is convenient to move, the idler wheel can be retracted into the adjusting groove to be protected, the service life of the idler wheel is prolonged, the idler wheel is convenient to detach and replace, and the cleaning machine is convenient for people to use.
Description
Technical Field
The invention relates to the technical field of solar silicon wafer cleaning machines, in particular to a solar silicon wafer cleaning machine.
Background
The solar silicon wafer cleaning machine is widely used in the production of photovoltaic products, the patent document with the application number of 201410091070.2 provides a full-automatic solar silicon wafer cleaning machine, the structure enables dirt on the surface and in gaps of an object to be rapidly peeled off through ultrasonic waves, so that the object surface purification purpose is achieved, and alkali liquor cleaning is combined for cleaning the object, so that solar photovoltaic technology is generally paid attention and supported by governments of all countries, the cost of a solar cell is increased due to the rising of the price of a photovoltaic product, the solar cell cleaning machine is increased to reduce the silicon wafer rate and reduce the production cost in order to improve the production efficiency and improve the competitiveness of the solar cell, and meanwhile, high requirements are put on the quality of the cell silicon wafer, and the solar silicon wafer cleaning machine is applied to efficiently clean the silicon wafer in the production process to meet the requirements of manufacturers The solar silicon wafer cleaning machine has the advantages that the cleaning of polycrystal, monocrystal solar silicon wafers and optical lenses is achieved, a complex cleaning process can be completed, the size of a common solar silicon wafer cleaning machine is large, but the structure is inconvenient to move and cannot protect the roller, the roller is inconvenient to detach and replace when the roller is damaged, and therefore the normal use of the solar silicon wafer cleaning machine is influenced, and therefore the solar silicon wafer cleaning machine is provided for solving the problems.
Disclosure of Invention
Based on the technical problems in the background art, the invention provides a solar silicon wafer cleaning machine.
The invention provides a solar silicon wafer cleaning machine, which comprises a cleaning machine body, wherein four corners of the bottom of the cleaning machine body are respectively provided with an adjusting groove, the inner walls of two sides of each adjusting groove are respectively provided with a driving groove, the inner wall of one side, far away from each other, of each driving groove on the same adjusting groove is provided with a push rod motor in a sliding way, the inner wall of the top of each adjusting groove is hinged with two symmetrically arranged upper supporting rods, the bottom ends of the upper supporting rods extend into the corresponding driving grooves and are rotatably installed with the output shaft of the push rod motor, the output shaft of the push rod motor is also rotatably provided with lower supporting rods, the bottom ends of the two lower supporting rods are hinged with the same adjusting column, the bottom of each adjusting column is provided with a supporting column, the bottom end of each supporting column is rotatably provided with a roller, the bottom of each adjusting column is provided, the top of the limiting column extends into a corresponding limiting groove, an installation cavity arranged on the adjusting column is arranged above the limiting groove, a rotary disc is rotatably arranged on the inner wall of one side of the installation cavity, a first umbrella-shaped gear is welded on one side of the rotary disc, a stepping motor is arranged in the installation cavity, a second umbrella-shaped gear is welded on an output shaft of the stepping motor, the first umbrella-shaped gear is meshed with the corresponding second umbrella-shaped gear, a groove is formed in the inner wall of the bottom of the installation cavity, a rotating rod is welded at the bottom of the first umbrella-shaped gear, the bottom of the rotating rod extends into the groove, a sliding groove is formed in one side of the rotating rod close to the limiting groove, a sliding block is slidably arranged in the sliding groove, a clamping column hole is formed in the inner wall of one side of the groove close to the limiting groove, a clamping column is slidably arranged in the clamping column hole, and a, one end of the clamping column extends into the corresponding limiting groove and is clamped with the clamping groove, and the other end of the clamping column extends into the corresponding groove and is hinged with the sliding block.
Preferably, the welding of the top of cleaning machine body has U type translation support, and a plurality of ultrasonic cleaning tank have been seted up at the top of cleaning machine body, and a plurality of ultrasonic cleaning tank's top all is equipped with the hanging flower basket of slidable mounting on U type translation support, the solar energy silicon chip body has been placed in the hanging flower basket.
Preferably, the mounting groove has all been seted up on the one side inner wall of seting away from each other of two drive slots on same adjustment tank, slidable mounting has the protection shield in the mounting groove, one side of protection shield extends to corresponding drive inslot and welds mutually with the push rod motor.
Preferably, the fixed plates are welded on the inner walls of the two sides of the adjusting groove, and one sides, close to each other, of the two fixed plates in the same adjusting groove are connected with the adjusting columns in a sliding mode.
Preferably, the cross section of the adjusting column is of a rectangular structure, and the adjusting column is connected with the adjusting groove in a sliding mode.
Preferably, a dismounting plate is fixed on the inner wall of one side of the mounting cavity in a threaded manner and is welded with the corresponding stepping motor.
Preferably, the welding has the spring on the dwang keeps away from one side inner wall in kelly hole, the other end and the recess of spring keep away from one side inner wall in kelly hole and weld mutually.
Preferably, the cross section of the limiting groove and the cross section of the limiting column are both rectangular structures.
In the invention, the solar silicon wafer cleaning machine is convenient for moving the roller through the matching of the cleaning machine body, the adjusting groove, the driving groove, the push rod motor, the upper support rod, the lower support rod, the adjusting column, the support column, the roller, the limiting column, the fixing plate, the mounting groove, the protective plate and the limiting groove, can move the bottom of the roller to the lower part of the cleaning machine body, is convenient for moving the cleaning machine body, can retract the roller into the adjusting groove, can protect the roller, slows down the corrosion speed of the roller, prolongs the service life of the roller, and is characterized in that the solar silicon wafer cleaning machine is matched with the disassembling plate and the spring through the matching of the limiting column, the mounting cavity, the turntable, the first bevel gear, the stepping motor, the second bevel gear, the groove, the rotating rod, the sliding groove, the sliding block, the clamping column hole, the clamping column, the clamping groove, the U-shaped translation bracket, be convenient for remove the card post to remove the fixed to spacing post, accomplish the quick dismantlement to the gyro wheel, be convenient for change the gyro wheel.
The cleaning machine is high in practicability, simple in structure and convenient to operate, the idler wheel is convenient to move, so that the cleaning machine body is convenient to move, the idler wheel can be retracted into the adjusting groove to be protected, the service life of the idler wheel is prolonged, the idler wheel is convenient to detach and replace, and the cleaning machine is convenient for people to use.
Drawings
FIG. 1 is a schematic cross-sectional structural view of a solar silicon wafer cleaning machine according to the present invention;
FIG. 2 is a schematic cross-sectional structural view of part A of a solar silicon wafer cleaning machine according to the present invention;
FIG. 3 is a schematic cross-sectional structural view of part B of a solar silicon wafer cleaning machine according to the present invention;
FIG. 4 is a schematic cross-sectional structural view of a part C of a solar silicon wafer cleaning machine according to the present invention;
fig. 5 is a partially enlarged view of a portion C of a solar silicon wafer cleaning machine according to the present invention.
In the figure: 1 cleaning machine body, 2 adjustment grooves, 3 driving grooves, 4 push rod motors, 5 upper supporting rods, 6 lower supporting rods, 7 adjustment columns, 8 supporting columns, 9 rollers, 10 limiting columns, 11 mounting cavities, 12 turntables, 13 first umbrella-shaped gears, 14 stepping motors, 15 second umbrella-shaped gears, 16 grooves, 17 rotating rods, 18 sliding grooves, 19 sliding blocks, 20 clamping column holes, 21 clamping columns, 22 clamping grooves, 23 fixing plates, 24 mounting grooves, 25 protecting plates, 26U-shaped translation supports, 27 ultrasonic cleaning tanks, 28 hanging baskets, 29 solar silicon wafer bodies, 30 detaching plates, 31 springs and 32 limiting grooves.
Detailed Description
The present invention will be further illustrated with reference to the following specific examples.
Examples
Referring to fig. 1-5, the embodiment provides a solar silicon wafer cleaning machine, which includes a cleaning machine body 1, adjusting grooves 2 are formed at four corners of the bottom of the cleaning machine body 1, driving grooves 3 are formed on inner walls of two sides of each adjusting groove 2, a push rod motor 4 is slidably mounted on an inner wall of one side, away from each other, of each driving groove 3 formed in the same adjusting groove 2, two symmetrically arranged upper support rods 5 are hinged to an inner wall of the top of each adjusting groove 2, the bottom ends of the upper support rods 5 extend into the corresponding driving grooves 3 and are rotatably mounted with an output shaft of the push rod motor 4, lower support rods 6 are rotatably mounted on output shafts of the push rod motor 4, the bottom ends of the two lower support rods 6 formed in the same adjusting groove 2 are hinged to the same adjusting column 7, a support column 8 is arranged at the bottom of the adjusting column 7, and a roller 9 is rotatably mounted at the bottom, the bottom of the adjusting column 7 is provided with a limiting groove 32, the top of the supporting column 8 is welded with a limiting column 10, the top of the limiting column 10 extends into the corresponding limiting groove 32, an installation cavity 11 arranged on the adjusting column 7 is arranged above the limiting groove 32, a rotary disc 12 is rotatably arranged on the inner wall of one side of the installation cavity 11, one side of the rotary disc 12 is welded with a first umbrella-shaped gear 13, a stepping motor 14 is arranged in the installation cavity 11, an output shaft of the stepping motor 14 is welded with a second umbrella-shaped gear 15, the first umbrella-shaped gear 13 is meshed with the corresponding second umbrella-shaped gear 15, the inner wall of the bottom of the installation cavity 11 is provided with a groove 16, the bottom of the first umbrella-shaped gear 13 is welded with a rotating rod 17, the bottom of the rotating rod 17 extends into the groove 16, one side of the rotating rod 17, which is close to the limiting groove 32, is provided with a sliding groove 18, a sliding block 19 is slidably arranged in, a clamping column 21 is arranged in the clamping column hole 20 in a sliding manner, one side of the limiting column 10 is provided with a clamping groove 22, one end of the clamping column 21 extends into the corresponding limiting groove 32 and is clamped with the clamping groove 22, the other end of the clamping column 21 extends into the corresponding groove 16 and is hinged with the sliding block 19, under the matching of the cleaning machine body 1, the adjusting groove 2, the driving groove 3, the push rod motor 4, the upper support rod 5, the lower support rod 6, the adjusting column 7, the support column 8, the roller 9, the limiting column 10, the fixing plate 23, the mounting groove 24, the protection plate 25 and the limiting groove 32, the roller 9 is convenient to move, the bottom of the roller 9 can be moved to the lower part of the cleaning machine body 1, the cleaning machine body 1 is convenient to move, the roller 9 can be retracted into the adjusting groove 2, the roller 9 can be protected, the corrosion speed of the roller 9 is slowed down, and the service life of the roller 9 is prolonged, under the matching of a limiting column 10, an installation cavity 11, a rotary disc 12, a first bevel gear 13, a stepping motor 14, a second bevel gear 15, a groove 16, a rotating rod 17, a sliding groove 18, a sliding block 19, a clamping column hole 20, a clamping column 21, a clamping groove 22, a U-shaped translation bracket 26, an ultrasonic cleaning tank 27, a hanging basket 28, a solar silicon wafer body 29, a detaching plate 30 and a spring 31, the clamping column 21 is convenient to move, thereby releasing the fixation of the limiting column 10, completing the quick disassembly of the roller 9, facilitating the replacement of the roller 9, having high practicability, simple structure and convenient operation, facilitating the movement of the roller 9, thereby moving the cleaning machine body 1, being capable of retracting the roller 9 into the adjusting groove 2, the roller 9 is protected, the service life of the roller 9 is prolonged, the roller 9 is convenient to detach and replace, and the use of people is facilitated.
In the embodiment, a U-shaped translation bracket 26 is welded at the top of a cleaning machine body 1, a plurality of ultrasonic cleaning tanks 27 are arranged at the top of the cleaning machine body 1, hanging baskets 28 slidably mounted on the U-shaped translation bracket 26 are arranged above the plurality of ultrasonic cleaning tanks 27, a solar silicon wafer body 29 is placed in the hanging baskets 28, mounting grooves 24 are formed in the inner walls of the two driving grooves 3 far away from each other in the same adjusting groove 2, protective plates 25 are slidably mounted in the mounting grooves 24, one sides of the protective plates 25 extend into the corresponding driving grooves 3 and are welded with a push rod motor 4, fixing plates 23 are welded on the inner walls of the two sides of the adjusting groove 2, the sides of the two fixing plates 23 close to each other in the same adjusting groove 2 are slidably connected with an adjusting column 7, the cross section of the adjusting column 7 is of a rectangular structure, and the adjusting column 7 is slidably connected with the adjusting, a dismounting plate 30 is fixed on the inner wall of one side of the mounting cavity 11 through threads, the dismounting plate 30 is welded with a corresponding stepping motor 14, a spring 31 is welded on the inner wall of one side of the rotating rod 17 far away from the clamping column hole 20, the other end of the spring 31 is welded with the inner wall of one side of the groove 16 far away from the clamping column hole 20, the cross section of the limiting groove 32 and the cross section of the limiting column 10 are both rectangular structures, under the matching of the cleaning machine body 1, the adjusting groove 2, the driving groove 3, the push rod motor 4, the upper support rod 5, the lower support rod 6, the adjusting column 7, the support column 8, the roller 9, the limiting column 10, the fixing plate 23, the mounting groove 24, the protection plate 25 and the limiting groove 32, the roller 9 is convenient to move, the bottom of the roller 9 can be moved to the lower part of the cleaning machine body 1, the cleaning machine body 1 is convenient to move, the roller 9 can be retracted, the speed of corrosion of the roller 9 is slowed down, the service life of the roller 9 is prolonged, under the matching of the limiting column 10, the mounting cavity 11, the rotary disc 12, the first bevel gear 13, the stepping motor 14, the second bevel gear 15, the groove 16, the rotating rod 17, the sliding groove 18, the sliding block 19, the clamping column hole 20, the clamping column 21, the clamping groove 22, the U-shaped translation bracket 26, the ultrasonic cleaning tank 27, the hanging basket 28, the solar silicon wafer body 29, the disassembling plate 30 and the spring 31, the clamping column 21 is convenient to move, so that the fixing of the limiting column 10 is released, the quick disassembling of the roller 9 is completed, the roller 9 is convenient to replace, the cleaning machine is high in practicability, simple in structure and convenient to operate, the roller 9 is convenient to move, the cleaning machine body 1 is convenient to move, the roller 9 can be retracted into the adjusting groove 2, the roller 9 is protected, and the service life of the roller 9 is prolonged, and the roller 9 is convenient to be detached and replaced, thereby facilitating the use of people.
In the embodiment, when the cleaning machine body 1 needs to be moved, the push rod motor 4 is started, the output shaft of the push rod motor 4 pushes the upper support rod 5 and the lower support rod 6 to move, at the moment, the bottom end of the upper support rod 5 and the bottom end of the lower support rod 6 both move downwards, the protection plate 25 slides downwards in the installation groove 24, the lower support rod 6 drives the adjusting column 7 to move downwards, the adjusting column 7 drives the support column 8 to drive the roller 9 to move downwards, so that the bottom of the roller 9 moves to the lower part of the cleaning machine body 1, at the moment, the push rod motor 4 is turned off, the cleaning machine body 1 can be pushed to move, the cleaning machine body 1 moves through the rollers 9 at four corners of the bottom, the cleaning machine body 1 is convenient to move, after the cleaning machine body 1 is moved, the push rod motor 4 is started, the push rod motor 4 drives the adjusting column 7 to move upwards through the upper support rod 5 and the lower support, at the moment, the roller 9 does not support the cleaning machine body 1 any more, the protection of the roller 9 is realized, when the roller 9 is damaged, the roller 9 needs to be disassembled, the stepping motor 14 is started at the moment, the output shaft of the stepping motor 14 drives the second bevel gear 15 to rotate, the second bevel gear 15 drives the first bevel gear 13 to rotate, the first bevel gear 13 drives the rotary disc 12 to rotate, the rotary disc 12 drives the rotary rod 17 to rotate, the rotary rod 17 drives the clamping column 21 to move through the sliding block 19, so that the clamping column 21 slides in the clamping column hole 20, the sliding block 19 slides in the sliding groove 18 at the moment, the clamping column 21 continues to slide, the clamping column 21 is separated from the clamping groove 22, the fixing of the limiting column 10 is released, the supporting column 8 is pulled to slide out of the limiting column 10 from the limiting groove 32, the disassembly of the roller 9 is completed, the replacement of the roller 9 is convenient, and the replaced roller 9 is convenient to fix on the adjusting column 7 again, the roller 9 is convenient to disassemble and replace by people, and the cleaning agent body 1 is convenient to use by people.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.
Claims (8)
1. A solar silicon wafer cleaning machine comprises a cleaning machine body (1) and is characterized in that adjusting grooves (2) are formed in four corners of the bottom of the cleaning machine body (1), driving grooves (3) are formed in inner walls of two sides of each adjusting groove (2), a push rod motor (4) is installed on an inner wall, far away from each other, of one side of each of two driving grooves (3) formed in the same adjusting groove (2) in a sliding mode, two upper supporting rods (5) symmetrically arranged are hinged to an inner wall of the top of each adjusting groove (2), the bottom ends of the upper supporting rods (5) extend into the corresponding driving grooves (3) and are installed with an output shaft of the push rod motor (4) in a rotating mode, lower supporting rods (6) are further installed on output shafts of the push rod motor (4) in a rotating mode, the bottom ends of the two lower supporting rods (6) are hinged to the same adjusting column (7), and supporting columns (8) are arranged at the, the bottom of support column (8) is rotated and is installed gyro wheel (9), spacing groove (32) have been seted up to the bottom of regulation post (7), the top welding of support column (8) has spacing post (10), the top of spacing post (10) extends to in corresponding spacing groove (32), the top of spacing groove (32) is equipped with installation cavity (11) of seting up on regulation post (7), rotate on the inner wall of one side of installation cavity (11) and install carousel (12), one side welding of carousel (12) has first umbrella type gear (13), install step motor (14) in installation cavity (11), the welding has second umbrella type gear (15) on the output shaft of step motor (14), first umbrella type gear (13) meshes with corresponding second umbrella type gear (15), set up fluted (16) on the bottom inner wall of installation cavity (11), the bottom welding of first umbrella type gear (13) has dwang (17), the bottom of dwang (17) extends to in recess (16), dwang (17) are close to one side of spacing groove (32) and have seted up spout (18), sliding fit has slider (19) in spout (18), recess (16) are close to and have seted up draw-in groove hole (20) on one side inner wall of spacing groove (32), sliding fit has card post (21) in draw-in groove hole (20), draw-in groove (22) have been seted up to one side of spacing post (10), the one end of card post (21) extends to in corresponding spacing groove (32) and clamps mutually with draw-in groove (22), the other end of card post (21) extends to in corresponding recess (16) and articulates mutually with slider (19).
2. The solar silicon wafer cleaning machine as claimed in claim 1, wherein a U-shaped translation bracket (26) is welded on the top of the cleaning machine body (1), a plurality of ultrasonic cleaning tanks (27) are arranged on the top of the cleaning machine body (1), a hanging basket (28) slidably mounted on the U-shaped translation bracket (26) is arranged above each ultrasonic cleaning tank (27), and a solar silicon wafer body (29) is placed in the hanging basket (28).
3. The solar silicon wafer cleaning machine as claimed in claim 1, wherein the inner walls of the two driving grooves (3) on the same adjusting groove (2) at the sides far away from each other are provided with mounting grooves (24), a protecting plate (25) is slidably mounted in the mounting grooves (24), and one side of the protecting plate (25) extends into the corresponding driving groove (3) and is welded with the push rod motor (4).
4. The solar silicon wafer cleaning machine as claimed in claim 1, wherein the fixing plates (23) are welded on the inner walls of the two sides of the adjusting groove (2), and the sides of the two fixing plates (23) in the same adjusting groove (2) close to each other are connected with the adjusting column (7) in a sliding manner.
5. The solar silicon wafer cleaning machine as claimed in claim 1, wherein the cross section of the adjusting column (7) is a rectangular structure, and the adjusting column (7) is connected with the adjusting groove (2) in a sliding manner.
6. The solar silicon wafer cleaning machine as claimed in claim 1, wherein a dismounting plate (30) is fixed on the inner wall of one side of the installation cavity (11) in a threaded manner, and the dismounting plate (30) is welded with the corresponding stepping motor (14).
7. The solar silicon wafer cleaning machine according to claim 1, wherein a spring (31) is welded on the inner wall of the side of the rotating rod (17) far away from the clamping column hole (20), and the other end of the spring (31) is welded with the inner wall of the side of the groove (16) far away from the clamping column hole (20).
8. The solar silicon wafer cleaning machine as claimed in claim 1, wherein the cross section of the limiting groove (32) and the cross section of the limiting column (10) are both rectangular structures.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710872645.8A CN107716440B (en) | 2017-09-25 | 2017-09-25 | Solar silicon wafer cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710872645.8A CN107716440B (en) | 2017-09-25 | 2017-09-25 | Solar silicon wafer cleaning machine |
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| Publication Number | Publication Date |
|---|---|
| CN107716440A CN107716440A (en) | 2018-02-23 |
| CN107716440B true CN107716440B (en) | 2020-06-16 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710872645.8A Active CN107716440B (en) | 2017-09-25 | 2017-09-25 | Solar silicon wafer cleaning machine |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108411539A (en) * | 2018-02-26 | 2018-08-17 | 石狮市恒鑫电子科技有限公司 | The extruding cleaning equipment of cloth processing |
| CN110369390A (en) * | 2019-07-05 | 2019-10-25 | 上海提牛机电设备有限公司 | A kind of 360 degree of cyclones of ceramic disk |
| CN111877807B (en) * | 2020-07-27 | 2022-09-06 | 安徽瑞邦电池有限公司 | Traffic command console powered by solar energy |
| CN115870259A (en) * | 2022-10-11 | 2023-03-31 | 华林科纳(江苏)半导体设备有限公司 | Wafer single-chip type cleaning machine capable of cleaning two surfaces of wafer simultaneously |
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| CN203787392U (en) * | 2014-03-12 | 2014-08-20 | 张家港市港威超声电子有限公司 | Full-automatic cleaning machine for solar silicon wafers |
| CN203900007U (en) * | 2014-06-12 | 2014-10-29 | 陕西天宏硅材料有限责任公司 | Solar silicon wafer cleaning device |
| CN204074616U (en) * | 2014-09-23 | 2015-01-07 | 浙江昊能光电有限公司 | A kind of ultrasonic wave solar silicon wafers cleaning machine |
| CN106423994A (en) * | 2016-12-10 | 2017-02-22 | 钱理 | Automatic cleaning and drying device of photovoltaic solar wafers |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN203787392U (en) * | 2014-03-12 | 2014-08-20 | 张家港市港威超声电子有限公司 | Full-automatic cleaning machine for solar silicon wafers |
| CN203900007U (en) * | 2014-06-12 | 2014-10-29 | 陕西天宏硅材料有限责任公司 | Solar silicon wafer cleaning device |
| CN204074616U (en) * | 2014-09-23 | 2015-01-07 | 浙江昊能光电有限公司 | A kind of ultrasonic wave solar silicon wafers cleaning machine |
| CN106423994A (en) * | 2016-12-10 | 2017-02-22 | 钱理 | Automatic cleaning and drying device of photovoltaic solar wafers |
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Address after: 226500 No.90 Xintao Road, Chengnan street, Rugao City, Nantong City, Jiangsu Province Patentee after: Hualin Kona (Jiangsu) semiconductor equipment Co.,Ltd. Address before: 226500 No.90 Xintao Road, Chengnan street, Rugao City, Nantong City, Jiangsu Province Patentee before: NANTONG HUALIN KONA SEMICONDUCTOR EQUIPMENT CO.,LTD. |