CN203343111U - Water saving system of silicon wafer rinsing machine - Google Patents
Water saving system of silicon wafer rinsing machine Download PDFInfo
- Publication number
- CN203343111U CN203343111U CN 201320411744 CN201320411744U CN203343111U CN 203343111 U CN203343111 U CN 203343111U CN 201320411744 CN201320411744 CN 201320411744 CN 201320411744 U CN201320411744 U CN 201320411744U CN 203343111 U CN203343111 U CN 203343111U
- Authority
- CN
- China
- Prior art keywords
- water
- grooves
- tank
- silicon wafer
- storage tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 76
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 30
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 29
- 239000010703 silicon Substances 0.000 title claims abstract description 29
- 238000003860 storage Methods 0.000 claims abstract description 26
- 238000004140 cleaning Methods 0.000 claims description 16
- 230000003020 moisturizing effect Effects 0.000 claims description 16
- 239000007788 liquid Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 5
- 239000010865 sewage Substances 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 239000004570 mortar (masonry) Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000013589 supplement Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model discloses a water saving system of a silicon wafer rinsing machine and belongs to the field of solar cell silicon wafer production devices. The water saving system of the silicon wafer rinsing machine particularly comprises seven rinsing tanks of the rinsing machine, wherein a third tank and a fourth tank are alkaline bathes with no need for water replenishing, pure water in a second tank overflows into a first tank, pure water of a seventh tank overflows into a sixth tank, the pure water of the sixth tank overflows to a fifth tank, and a water replenishing pneumatic valve is arranged below each of the rinsing tanks. The water saving system of the silicon wafer rinsing machine further comprises a water storage tank and a water pump, wherein the water storage tank is arranged below the rinsing tanks, the fifth tank is connected with the water storage tank through a water overflowing pipeline, and the water replenishing pneumatic valve of the second tank is in pipe communication with the water storage tank through the water pump. The water saving system of the silicon wafer rinsing machine can save water and reduce sewage discharge and pollution to the environment, and the purpose of saving energy and reducing cost can be achieved.
Description
Technical field
The utility model relates to a kind of silicon chip of solar cell cleaning equipment, belongs to silicon chip of solar cell production equipment field, especially a kind of water-saving system of silicon wafer cleaner.
Background technology
In the manufacture of solar cells process, necessary silicon chip, after cutting processing, needs through multistage cleaning, to remove the mortar that is attached to silicon chip surface.
Current cleaning equipment used is multistage groove-type cleaning machine, and such as the good wound silicon wafer cleaner one of victory has seven grooves, wherein three, four grooves are alkaline baths, does not need moisturizing in the process of cleaning, as long as can guarantee the concentration of alkali lye.This equipment has two overflows, first is that the pure water of two grooves overflows to a groove, the pure water overflow of one groove is discharged to trench and flows away, but the mortar that this part water flowed away contains cutting silicon wafer, water is more muddy, water quality inferiority, the effect of this part is that silicon chip is carried out to rinsing, rinses the mortar that silicon chip surface is adhering to; Second is that the pure water of seven grooves overflows to six grooves, the pure water of six grooves overflows to five grooves again, the pure water overflow of five grooves is discharged to trench again, the effect of this part is to rinse liquid and the various harmful substance that silicon chip surface is adhering to, such as each metal ion species, organic matter etc., but the pure water that five groove overflows are discharged to trench not only clean, have certain temperature (40-50 degree centigrade is probably arranged) and also flow also large especially.Therefore, in this equipment, the required water yield expended of cleaning silicon chip is very large, the easy contaminated environment of the sewage of discharge.
The utility model content
The technical problems to be solved in the utility model is to provide a kind of water-saving system of silicon wafer cleaner, pure water pipeline and the electrical control aspect of this system in can cleaning machine improved, can using water wisely, reduce sewage discharge, reduce the pollution to environment, reach cost-saving, energy-saving and cost-reducing purpose.
For solving the problems of the technologies described above, technical solution adopted in the utility model is: a kind of water-saving system of silicon wafer cleaner, seven rinse baths that comprise cleaning machine, wherein three, four grooves are the alkaline baths that do not need moisturizing, the pure water of two grooves overflows to a groove, the pure water of seven grooves overflows to six grooves, the pure water of six grooves overflows to five grooves again, each rinse bath below is equipped with the moisturizing pneumatic operated valve, it is characterized in that described storage tank and the water pump of also comprising, described storage tank is located at the rinse bath below, and there is the spilling water pipeline to be connected between five grooves and storage tank, between the moisturizing pneumatic operated valve of two grooves and storage tank, the process water pump is with pipeline connection.
Above-mentioned system is done further to supplement, and the sidewall of described storage tank is provided with two liquid level sensors, is respectively high liquid level gauge and low liquid level gauge.For realizing the protection to pump, prevent that aqua storage tank from not having pump depletion after water, we have added two liquid level sensors to aqua storage tank, and during low liquid level, to the aqua storage tank automatic watering, during high liquid level, lathe stops adding water.
Above-mentioned system is done further to supplement, also comprise control loop, described control loop comprises the relay of two normally opened contacts, and a contact of relay is connected with two groove moisturizing pneumatic operated valves, and another contact is connected with water pump.The utility model is water circulating pump maintenance work when realizing that two groove overflow pneumatic operated valves are opened, we have added a relay to equipment, utilize the coil of PLC to the input signal control relay of two groove moisturizing pneumatic operated valves, two normally opened contacts of recycling relay, one of them contact meets DC24V, controls two groove moisturizing pneumatic operated valves; Another contact meets AC220V, the startup of control pump.
The beneficial effect that adopts technique scheme to produce is:
1) in the utility model, silicon wafer cleaner is carried out to the secondary transformation, set up aqua storage tank and control loop, realized the pure water of five groove overflows is supplied to two grooves, can meet the requirement of silicon wafer cleaner to Wafer Cleaning fully, saved great lot of water resources;
2) realized the utilization again to pure water in the utility model, the unit price of pure water is 3-4 times of running water, has therefore reduced production cost;
3) for guaranteeing the cleaning quality of one, two groove silicon chips, one, the pure water in two grooves need to be heated to certain temperature, generally be set as 40 degrees centigrade of left and right, and five groove overflows are discharged to the temperature of the pure water of trench, 40-50 degree centigrade probably arranged, also can meet cleaning requirement.After the project implementation, once, two grooves, or else with the heating tube heating, save so again the energy and the electricity charge, reduced production cost;
4) minimizing of cleaning machine sewage effluent, not only reduced the sewage disposal expense but also alleviated the pollution to environment.
The accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the utility model is described in further detail.
Fig. 1 is system connection diagram of the present utility model;
Wherein: 1, moisturizing pneumatic operated valve, 2, high liquid level gauge, 3, low liquid level gauge, 4, storage tank, 5, water pump.
The specific embodiment
1 is known with reference to the accompanying drawings, and the utility model is specifically related to a kind of water-saving system of silicon wafer cleaner, for the cleaning of silicon chip of solar cell.
The conventional cleaning machine used has seven rinse baths, wherein three, four grooves are the alkaline baths that do not need moisturizing, this structure has two overflows, first is that the pure water of two grooves overflows to a groove, the pure water overflow of one groove is discharged to trench and flows away, but the mortar that this part water flowed away contains cutting silicon wafer, water is more muddy, water quality inferiority.Second is that the pure water of seven grooves overflows to six grooves, and the pure water of six grooves overflows to five grooves again, and the pure water overflow of five grooves is discharged to trench again and flows away.
Concrete improvement of the present utility model: each rinse bath below is equipped with moisturizing pneumatic operated valve 1, storage tank 4 and water pump 5 have been increased, storage tank 4 is located at the rinse bath below, and between five grooves and storage tank 4, have the spilling water pipeline to be connected, between the moisturizing pneumatic operated valve of two grooves and storage tank 4 through water pump 5 with pipeline connection.
In addition, be provided with two liquid level sensors on the sidewall of storage tank 4, be respectively high liquid level gauge 2 and low liquid level gauge 3, realize the protection to water pump, prevent that aqua storage tank from not having pump depletion after water.
Water circulating pump is also worked when realizing that two groove overflow pneumatic operated valves are opened, need to set up control loop, wherein control loop comprises the relay of two normally opened contacts, and a contact of relay is connected with two groove moisturizing pneumatic operated valves, and another contact is connected with water pump 5.
The utility model principle: the water that silicon wafer cleaner five groove overflows is discharged to trench is collected in a storage tank, then by machine reformation, collected pure water is got to two groove the insides, do like this and not only can originally want two grooves used up pure water to save, and the pure water itself reclaimed just has certain temperature, can meet one, two groove cleaning requirements fully, reduced so again heating tube heating expense, played energy-saving and cost-reducing purpose, the minimizing of sewage discharge has simultaneously also alleviated the expense of sewage treatment plant.Annual workshop is saved more than 80 ten thousand yuan with regard to water rate and the electricity charge.
Claims (3)
1. the water-saving system of a silicon wafer cleaner, seven rinse baths that comprise cleaning machine, wherein three, four grooves are the alkaline baths that do not need moisturizing, the pure water of two grooves overflows to a groove, the pure water of seven grooves overflows to six grooves, the pure water of six grooves overflows to five grooves again, each rinse bath below is equipped with moisturizing pneumatic operated valve (1), it is characterized in that described storage tank (4) and the water pump (5) of also comprising, described storage tank (4) is located at the rinse bath below, and there is the spilling water pipeline to be connected between five grooves and storage tank (4), between the moisturizing pneumatic operated valve of two grooves and storage tank (4), process water pump (5) is with pipeline connection.
2. the water-saving system of a kind of silicon wafer cleaner according to claim 1, is characterized in that the sidewall of described storage tank (4) is provided with two liquid level sensors, is respectively high liquid level gauge (2) and low liquid level gauge (3).
3. the water-saving system of a kind of silicon wafer cleaner according to claim 1 and 2, characterized by further comprising control loop, described control loop comprises the relay of two normally opened contacts, and a contact of relay is connected with two groove moisturizing pneumatic operated valves, and another contact is connected with water pump (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320411744 CN203343111U (en) | 2013-07-11 | 2013-07-11 | Water saving system of silicon wafer rinsing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320411744 CN203343111U (en) | 2013-07-11 | 2013-07-11 | Water saving system of silicon wafer rinsing machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203343111U true CN203343111U (en) | 2013-12-18 |
Family
ID=49743046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320411744 Expired - Fee Related CN203343111U (en) | 2013-07-11 | 2013-07-11 | Water saving system of silicon wafer rinsing machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203343111U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107225112A (en) * | 2017-06-15 | 2017-10-03 | 江苏吉星新材料有限公司 | A kind of high-efficient automatic sapphire substrate sheet alkali acid cleaning all-in-one |
-
2013
- 2013-07-11 CN CN 201320411744 patent/CN203343111U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107225112A (en) * | 2017-06-15 | 2017-10-03 | 江苏吉星新材料有限公司 | A kind of high-efficient automatic sapphire substrate sheet alkali acid cleaning all-in-one |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN203900007U (en) | Solar silicon wafer cleaning device | |
| CN102315318B (en) | Water-saving washing device of solar battery silicon wafer | |
| CN203265136U (en) | Energy-saving cleaning machine | |
| CN203343111U (en) | Water saving system of silicon wafer rinsing machine | |
| CN201883120U (en) | Annealing cooling system | |
| CN202907346U (en) | Water-saving glue refuse removal production line for circuit board processing | |
| CN202465417U (en) | Special industrial wastewater treatment system for silicon-based solar cells | |
| CN104624552A (en) | Overflow pure water circulation system of silicon wafer cleaning machine | |
| CN205056521U (en) | Quick belt cleaning device | |
| CN205010182U (en) | Car wash who has sewage cycle processing capacity through solar energy | |
| CN201835379U (en) | Water-saving operation device | |
| CN202803660U (en) | Step-overflow communicated washing tank | |
| CN203402946U (en) | Water treatment system | |
| CN207183226U (en) | A kind of silicon solar cell wet etching water washing device | |
| CN202155331U (en) | Silicon material rinser | |
| CN201394556Y (en) | Graphite carrying plate cleaning device | |
| CN202606441U (en) | Water-saving device of chain type texturing and cleaning machine | |
| CN204424294U (en) | A kind of fluff making device of solar battery sheet | |
| CN203389887U (en) | Silicon chip multi-stage circulation cleaning equipment | |
| CN204406032U (en) | A kind of cleaning fluid recycling device for developing machine | |
| CN202803656U (en) | Cleaning system for solar silicon wafer | |
| CN204619476U (en) | A kind of crystal silicon battery concentrated acid retracting device | |
| CN201940387U (en) | High-pressure washing system for the presensitized plate version continuous production | |
| CN203265215U (en) | Cleaning tank for silicon wafers | |
| CN213652730U (en) | A device for improving the life of single crystal texturing liquid |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20131218 |
|
| CU01 | Correction of utility model | ||
| CU01 | Correction of utility model |
Correction item: Termination upon expiration of patent Correct: Revocation of Patent Expiration and Termination False: On July 28, 2023, the expiration and termination of the 39-volume 3002 patent Number: 30-02 Volume: 39 |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131218 |