CN203265215U - Cleaning tank for silicon wafers - Google Patents
Cleaning tank for silicon wafers Download PDFInfo
- Publication number
- CN203265215U CN203265215U CN 201320306796 CN201320306796U CN203265215U CN 203265215 U CN203265215 U CN 203265215U CN 201320306796 CN201320306796 CN 201320306796 CN 201320306796 U CN201320306796 U CN 201320306796U CN 203265215 U CN203265215 U CN 203265215U
- Authority
- CN
- China
- Prior art keywords
- cleaning tank
- cavity
- water
- rinse bath
- bath body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Abstract
The utility model provides a cleaning tank for silicon wafers. The cleaning tank for the silicon wafers comprises a cleaning tank body and a water pump, wherein a cavity is formed inside the side wall of the cleaning tank body, a perpendicular separation plate is arranged in the cavity, the cavity is divided into an inner cavity and an outer cavity by the perpendicular separation plate, a notch is formed in the top of the perpendicular separation plate, the inner cavity and the outer cavity are communicated through the notch, a water outlet is formed in the bottom of the outer cavity, the water pump is installed on the water outlet, sieve meshes are formed in the inner wall of the cleaning tank body, a sewage discharge outlet is formed in the bottom of the cleaning tank body, and a valve is arranged on the sewage discharge outlet. The cleaning tank for the silicon wafers is simple in structure, achieves recycling of water, improves the use rate of the water, reduces waste of the water, and reduces production cost.
Description
Technical field
The utility model relates to a kind of cleaning device, particularly a kind of silicon wafer cleaning tank.
Background technology
Can produce the silicon oxide layer that contains higher phosphorous concentration in the manufacturing process of photovoltaic industry crystal silicon cell, be called as phosphorosilicate glass, be called for short PSG, when silion cell is produced, carry out pickling this silicon oxide layer is removed, be called for short and remove PSG.At present, traditional cleaning equipment needs to use pure water in each rinse bath when cleaning, and silicon chip is cleaned, and therefore accumulative total uses the amount of pure water larger, and the water waste is serious, has also improved production cost.
The utility model content
The technical problem that (one) will solve
The technical problems to be solved in the utility model is to provide a kind of waste water in rinse bath can being recycled, and improves the silicon wafer cleaning tank of water use efficiency.
(2) technical scheme
for solving the problems of the technologies described above, the utility model provides a kind of silicon wafer cleaning tank, comprise rinse bath body 1 and water pump 6, the interior of described rinse bath body 1 forms cavity, be provided with vertical partition plate 2 in described cavity, described vertical partition plate 2 is divided into inner chamber 32 and exocoel 31 with described cavity, the top of described vertical partition plate 2 is provided with breach, described inner chamber 32 and exocoel 31 are communicated with by described breach, the bottom of described exocoel 31 offers delivery port 5, described water pump 6 is arranged on described delivery port 5, the inwall of described rinse bath body 1 offers sieve aperture 4, the bottom of described rinse bath body 1 offers sewage draining exit 7, described sewage draining exit 7 is provided with valve 8.
Further, described valve 8 is magnetic valve.
Further, the diameter of described sieve aperture 4 is more than or equal to 0.5mm and less than or equal to 5mm.
(3) beneficial effect
The utility model silicon wafer cleaning tank when silicon chip is cleaned, continues to supply water to the rinse bath body, and the water that overflows flows into outer chamber after inner cavity top, then is sent to another rinse bath through pump, realizes the water circuit utilization; The utility model silicon wafer cleaning tank, simple in structure, realize the water circuit utilization, improved water use efficiency, reduced the waste of water, reduced production cost.
Description of drawings
Fig. 1 is the structural representation of the utility model silicon wafer cleaning tank.
The specific embodiment
consult Fig. 1, the utility model provides a kind of silicon wafer cleaning tank, comprise rinse bath body 1 and water pump 6, the interior of rinse bath body 1 forms cavity, be provided with vertical partition plate 2 in this cavity, this vertical partition plate 2 is divided into inner chamber 32 and exocoel 31 with cavity, top at vertical partition plate 2 is provided with breach, inner chamber 32 and exocoel 31 are communicated with by this breach, offer delivery port 5 in the bottom of exocoel 31, water pump 6 is arranged on this delivery port 5, inwall at rinse bath body 1 offers sieve aperture 4, the diameter of this sieve aperture 4 is more than or equal to 0.5mm and less than or equal to 5mm, 3mm preferably, offer sewage draining exit 7 in the bottom of rinse bath body 1, be provided with valve 8 on sewage draining exit 7, in the present embodiment, this valve 8 is magnetic valve.
The utility model silicon wafer cleaning tank when silicon chip is cleaned, continues to supply water to the rinse bath body, and the water that overflows flows into outer chamber after inner cavity top, then is sent to another rinse bath through pump, realizes the water circuit utilization; The utility model silicon wafer cleaning tank, simple in structure, realize the water circuit utilization, improved water use efficiency, reduced the waste of water, reduced production cost.
The above is only preferred embodiment of the present utility model; should be understood that; for those skilled in the art; under the prerequisite that does not break away from the utility model know-why; can also make some improvements and modifications, these improvements and modifications also should be considered as protection domain of the present utility model.
Claims (3)
1. silicon wafer cleaning tank, it is characterized in that: comprise rinse bath body (1) and water pump (6), the interior of described rinse bath body (1) forms cavity, be provided with vertical partition plate (2) in described cavity, described vertical partition plate (2) is divided into inner chamber (32) and exocoel (31) with described cavity, the top of described vertical partition plate (2) is provided with breach, described inner chamber (32) and exocoel (31) are communicated with by described breach, the bottom of described exocoel (31) offers delivery port (5), described water pump (6) is arranged on described delivery port (5), the inwall of described rinse bath body (1) offers sieve aperture (4), the bottom of described rinse bath body (1) offers sewage draining exit (7), described sewage draining exit (7) is provided with valve (8).
2. silicon wafer cleaning tank as claimed in claim 1, it is characterized in that: described valve (8) is magnetic valve.
3. silicon wafer cleaning tank as claimed in claim 1, it is characterized in that: the diameter of described sieve aperture (4) is more than or equal to 0.5mm and less than or equal to 5mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320306796 CN203265215U (en) | 2013-05-30 | 2013-05-30 | Cleaning tank for silicon wafers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320306796 CN203265215U (en) | 2013-05-30 | 2013-05-30 | Cleaning tank for silicon wafers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203265215U true CN203265215U (en) | 2013-11-06 |
Family
ID=49495709
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320306796 Expired - Fee Related CN203265215U (en) | 2013-05-30 | 2013-05-30 | Cleaning tank for silicon wafers |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203265215U (en) |
-
2013
- 2013-05-30 CN CN 201320306796 patent/CN203265215U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131106 Termination date: 20170530 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |