CN204685622U - A kind of silicon wafer cleaner pure water recovery system - Google Patents
A kind of silicon wafer cleaner pure water recovery system Download PDFInfo
- Publication number
- CN204685622U CN204685622U CN201520361523.9U CN201520361523U CN204685622U CN 204685622 U CN204685622 U CN 204685622U CN 201520361523 U CN201520361523 U CN 201520361523U CN 204685622 U CN204685622 U CN 204685622U
- Authority
- CN
- China
- Prior art keywords
- water
- pure water
- discharge pipe
- pipe line
- collection pond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model discloses a kind of silicon wafer cleaner pure water recovery system, comprise pure water groove, drainage collection pond, main drainpipe road, in line water lines, reclaim discharge pipe line and recycle-water storage tank, it is inner that described pure water groove is arranged on drainage collection pond, the bottom in drainage collection pond is tapered, and drainage collection pond is connected by bottom end opening one end with main drainpipe road, the other end on main drainpipe road connects in line water lines respectively by threeway pneumatic operated valve and reclaims the water inlet end of discharge pipe line, reclaim discharge pipe line and be provided with Ph value tester, the water side of reclaiming discharge pipe line is connected to recycle-water storage tank, the bottom of recycle-water storage tank is provided with outlet pipeline, outlet pipeline is provided with water pump, described threeway pneumatic operated valve is connected with PLC.The utility model effectively can solve the current existing silicon wafer cleaner problem that operating cost is high because consuming pure water in a large number, decreases pure water discharge capacity, significantly reduces production cost.
Description
Technical field
the utility model relates to semi-conducting material production technical field, is specifically related to a kind of silicon wafer cleaner pure water recovery system.
Background technology
Circuit-level is silicon polished after effects on surface carries out mirror finish processing, surface is subject to the severe contamination of polished bonding sheet wax, polishing fluid etc., and one of the surface cleanliness of polished silicon slice mass parameter that to be product the most key, after polishing process, silicon chip surface must be removed particle, metal ion and organic pollution, and wet chemical cleaning process is the most effective Wafer Cleaning technology.In wet chemical cleaning process, silicon chip by the cleaning of a series of multiple Acidity of Aikalinity different chemical liquid bath, with reach remove surface particles, Organic Pollution, metal ion object.Polished silicon slice surface is layer of silicon dioxide film, silica surface is hydrophilic surface, so silicon chip soaks rear surface can be accompanied with water membrane, the chemicals for cleaning silicon chip is contain in this layer of moisture film, residual a certain alkaline chemical with the acidic chemical reaction in another kind chemistry liquid bath afterwards, can cause inefficacy to the following process of silicon chip.So all configure pure water groove after each chemical liquid bath, be used for carrying out rinsing to the past together chemical liquid bath silicon chip out, the chemical liquids removing silicon chip surface remains, and avoids affecting cleaning performance.Pure water groove is divided into overflow launder and washing trough two kinds fast, pure water overflow launder is by constantly supplying fresh pure water from pure water trench bottom, unnecessary pure water is along outside overflow from groove, and the chemical liquids of silicon chip surface is constantly diluted, and the pure water with overflow is discharged to outside groove.Washing trough of falling fast enters in tank at silicon chip, the vent valves of trench bottom is opened, and pure water is by fast evacuation, and the nozzle above trough both sides starts to carry out pure water spray to silicon chip, after pure water again fills cell body and does of short duration overflow, the fast evacuation again of the pure water in groove.This process repeats several cycle usually, and the chemical liquids that silicon chip surface is residual is removed completely.
In existing cleaning machine, the used pure water of pure water groove is all directly emitted, and belong to ultra-pure water for cleaning silicon polished pure water, particle in water, metal ion content, the parameter that resistivity value and total organic content etc. are numerous has strict index, need through multiple ion exchanger resin, RO counter-infiltration, the processing procedure of ultraviolet lamp sterilization etc. series of complex could obtain, therefore ultra-pure water price is also costly, a large amount of ultra-pure waters is caused to be discharged into lower water trench in existing silicon wafer cleaner use procedure, pure water consumption remains high, become operating cost the highest in cleaning process.
Utility model content
For solving the problems of the technologies described above, the utility model provides a kind of silicon wafer cleaner pure water recovery system, this device effectively can solve the current existing silicon wafer cleaner problem that operating cost is high because consuming pure water in a large number, decreases pure water discharge capacity, significantly reduces production cost.
The technical scheme that the utility model adopts is: a kind of silicon wafer cleaner pure water recovery system, comprise pure water groove, drainage collection pond, main drainpipe road, in line water lines, reclaim discharge pipe line and recycle-water storage tank, it is inner that described pure water groove is arranged on drainage collection pond, the bottom in drainage collection pond is tapered, and drainage collection pond is connected by bottom end opening one end with main drainpipe road, the other end on main drainpipe road connects in line water lines respectively by threeway pneumatic operated valve and reclaims the water inlet end of discharge pipe line, reclaim discharge pipe line and be provided with Ph value tester, the water side of reclaiming discharge pipe line is connected to recycle-water storage tank, the bottom of recycle-water storage tank is provided with outlet pipeline, outlet pipeline is provided with water pump, described threeway pneumatic operated valve is connected with PLC.
Compared with prior art, the utility model at least has following advantage and beneficial effect:
Cleaning machine pure water recovery system described in the utility model, processing is simple, installs easy to operate, effectively can solving the current existing silicon wafer cleaner problem that operating cost is high because consuming pure water in a large number, decreasing pure water discharge capacity, significantly reducing production cost.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model;
Reference numeral: 1, pure water groove, 2, drainage collection pond, 3, main drainpipe road, 4, threeway pneumatic operated valve, 5, in line water lines, 6, reclaim discharge pipe line, 7, pH value tester, 8, recycle-water storage tank, 9, outlet pipeline, 10, water pump.
Detailed description of the invention
For making content of the present utility model become apparent, below in conjunction with specific embodiment, the utility model is described in detail.
As shown in the figure, a kind of silicon wafer cleaner pure water recovery system, comprise pure water groove 1, drainage collection pond 2, main drainpipe road 3, in line water lines 5, reclaim discharge pipe line 6 and recycle-water storage tank 8, it is inner that described pure water groove 1 is arranged on drainage collection pond 2, the bottom in drainage collection pond 2 is tapered, and drainage collection pond 2 is connected by bottom end opening one end with main drainpipe road 3, the other end on main drainpipe road 3 connects in line water lines 5 respectively by threeway pneumatic operated valve 4 and reclaims the water inlet end of discharge pipe line 6, reclaim discharge pipe line 6 and be provided with Ph value tester 7, the water side of reclaiming discharge pipe line 6 is connected to recycle-water storage tank 8, the bottom of recycle-water storage tank 8 is provided with outlet pipeline 9, outlet pipeline 9 is provided with water pump 10, described threeway pneumatic operated valve 4 is connected with PLC.
In order to make the utility model have better effect, drainage collection pond 2 uses high-purity PVC material to make.
It is inner that pure water groove 1 of the present utility model is arranged on drainage collection pond 2, pure water groove 1 overflow or the used pure water given off all are stored in drainage collection pond 2, threeway pneumatic operated valve 4 is by PLC programme-control opening, the concentration of the chemical liquids that silicon chip contains in the pure water of tank rinsing initial stage overflow and discharge is higher, and this stage threeway pneumatic operated valve 4 controls pure water and is disposed to the external world from line water lines 5; The concentration of the chemical liquids that silicon chip contains in the pure water of pure water groove 1 rinsing later stage overflow and discharge is on the low side, pH value close to 7 time, this stage threeway pneumatic operated valve 4 controls pure water and discharges from recovery discharge pipe line 6, and flow into recycle-water storage tank 8, the timing node switching discharge sets in PLC program.PH value tester 7 is arranged on and reclaims on discharge pipe line 6, and carrying out recovery water quality by pH value must monitor.Recycle-water storage tank 8 is connected with factory business Purified Water Station by outlet pipeline 9, and water pump 10 will need the pure water feeding Purified Water Station regeneration of reclaiming.
Silicon wafer cleaner pure water recovery system of the present utility model can realize recycling to most of pure water of cleaning machine discharge, considerably reduces the consumption of cleaning machine pure water.Except in line water lines 5 in this system, also add a road and reclaim discharge pipe line 6, this recovery discharge pipe line 6 and factory business Purified Water Station be connected, realize using rear pure water in line water lines 5 and switching discharge between discharge pipe line 6 can be reclaimed by the threeway pneumatic operated valve 4 on PLC programme-control main drainpipe road 3, enter the pure water reclaiming discharge pipe line 6 and squeezed into factory's business Purified Water Station through recycle-water storage tank 8 by water pump 10, only need through counter-infiltration, the simple process such as filtration, completely qualified pure water can be regenerated as utilized once again, to solve existing silicon chip consumption, discharge operating cost that a large amount of ultra-pure water causes to dash forward high problem.
Technical scheme cited by the utility model and embodiment be not restriction, be equal to the technical scheme cited by the utility model and embodiment or effect same approach all in the scope that the utility model is protected.
Claims (1)
1. a silicon wafer cleaner pure water recovery system, it is characterized in that: comprise pure water groove (1), drainage collection pond (2), main drainpipe road (3), in line water lines (5), reclaim discharge pipe line (6) and recycle-water storage tank (8), it is inner that described pure water groove (1) is arranged on drainage collection pond (2), the bottom in drainage collection pond (2) is tapered, and drainage collection pond (2) are connected by bottom end opening one end with main drainpipe road (3), the other end on main drainpipe road (3) connects in line water lines (5) respectively by threeway pneumatic operated valve (4) and reclaims the water inlet end of discharge pipe line (6), reclaim discharge pipe line (6) and be provided with Ph value tester (7), the water side of reclaiming discharge pipe line (6) is connected to recycle-water storage tank (8), the bottom of recycle-water storage tank (8) is provided with outlet pipeline (9), outlet pipeline (9) is provided with water pump (10), described threeway pneumatic operated valve (4) is connected with PLC.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520361523.9U CN204685622U (en) | 2015-05-30 | 2015-05-30 | A kind of silicon wafer cleaner pure water recovery system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520361523.9U CN204685622U (en) | 2015-05-30 | 2015-05-30 | A kind of silicon wafer cleaner pure water recovery system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204685622U true CN204685622U (en) | 2015-10-07 |
Family
ID=54225963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520361523.9U Expired - Fee Related CN204685622U (en) | 2015-05-30 | 2015-05-30 | A kind of silicon wafer cleaner pure water recovery system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204685622U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107546148A (en) * | 2016-06-28 | 2018-01-05 | 上海新昇半导体科技有限公司 | A kind of semiconductor wafer wet clean equipment |
| CN108878321A (en) * | 2018-06-25 | 2018-11-23 | 扬州思普尔科技有限公司 | A kind of semiconductor crystal wafer cleaning fast row's flushing tank of energy conservation |
| CN110047788A (en) * | 2019-06-03 | 2019-07-23 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Wafer cleaning device and wafer cleaning system |
-
2015
- 2015-05-30 CN CN201520361523.9U patent/CN204685622U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107546148A (en) * | 2016-06-28 | 2018-01-05 | 上海新昇半导体科技有限公司 | A kind of semiconductor wafer wet clean equipment |
| CN108878321A (en) * | 2018-06-25 | 2018-11-23 | 扬州思普尔科技有限公司 | A kind of semiconductor crystal wafer cleaning fast row's flushing tank of energy conservation |
| CN110047788A (en) * | 2019-06-03 | 2019-07-23 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Wafer cleaning device and wafer cleaning system |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101773915B (en) | Multilevel circulating cleaning equipment for solar cell silicon wafers | |
| CN204685622U (en) | A kind of silicon wafer cleaner pure water recovery system | |
| CN202655283U (en) | Multi-stage circulated cleaning equipment | |
| CN106350614A (en) | Comprehensive recycling method for preparing hybridization water and acid-base by utilizing malt syrup | |
| CN203265136U (en) | Energy-saving cleaning machine | |
| CN201586649U (en) | Multistage circulating cleaning equipment for solar cell silicon chip | |
| CN102092877B (en) | System for comprehensively recycling waste water | |
| CN207204736U (en) | Solar silicon wafers cleaning device | |
| CN202822955U (en) | Ceramic filter cleaning device | |
| CN103668268B (en) | A kind of waste acidity recovery reutilization system | |
| CN203124337U (en) | Wafer cleaning device | |
| CN202290646U (en) | Silicon wafer cleaning machine | |
| CN105236616A (en) | Electroplating copper-containing sewage treatment and reuse technology | |
| CN102614705A (en) | Method and device for cleaning ceramic filter | |
| CN204111439U (en) | A kind of beverage bottle Cleaning Wastewater recycling device | |
| CN108911287A (en) | Cleaning solution process of regenerating and device for IC manufacturing | |
| WO2013028641A1 (en) | Reduced consumption stand alone rinse tool having self-contained closed-loop fluid circuit, and method of rinsing substrates using the same | |
| CN104326606B (en) | A kind of circulation of Coated Glass Line | |
| CN210286847U (en) | Water system for inserting machine and silicon wafer cleaning system | |
| CN214495813U (en) | Soft water system | |
| CN209792083U (en) | Spray unit and silicon wafer cleaning system | |
| CN108557909A (en) | Spent solution regeneration equipment and working method after a kind of glass cleaning | |
| CN204224369U (en) | A kind of water circulation system of glass coating production line | |
| CN203653350U (en) | Wastewater online recovery device of anodizing wire | |
| CN210825665U (en) | Glass edging process water circle device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151007 Termination date: 20170530 |