CN207204736U - Solar silicon wafers cleaning device - Google Patents
Solar silicon wafers cleaning device Download PDFInfo
- Publication number
- CN207204736U CN207204736U CN201721081426.XU CN201721081426U CN207204736U CN 207204736 U CN207204736 U CN 207204736U CN 201721081426 U CN201721081426 U CN 201721081426U CN 207204736 U CN207204736 U CN 207204736U
- Authority
- CN
- China
- Prior art keywords
- water
- pure water
- silicon wafers
- potcher
- solar silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 57
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 57
- 239000010703 silicon Substances 0.000 title claims abstract description 57
- 238000004140 cleaning Methods 0.000 title claims abstract description 47
- 235000012431 wafers Nutrition 0.000 title claims abstract description 47
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 218
- 230000007246 mechanism Effects 0.000 claims abstract description 21
- 238000004064 recycling Methods 0.000 claims abstract description 18
- 238000005086 pumping Methods 0.000 claims abstract description 13
- 239000007788 liquid Substances 0.000 claims description 15
- 238000005192 partition Methods 0.000 claims description 12
- 230000005587 bubbling Effects 0.000 claims description 9
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 5
- 230000003247 decreasing effect Effects 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 3
- 239000002351 wastewater Substances 0.000 abstract description 4
- 238000000034 method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 206010021036 Hyponatraemia Diseases 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000004570 mortar (masonry) Substances 0.000 description 3
- 239000005416 organic matter Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 241000270295 Serpentes Species 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 210000005056 cell body Anatomy 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003911 water pollution Methods 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
It the utility model is related to a kind of solar silicon wafers cleaning device, including potcher, dipper, pure water groove, return water tank, pure water overflow pipe, recycling water utilization pipe and backwater comb.Solar silicon wafers cleaning device, can effectively saving water resource by being recycled to Wafer Cleaning waste water.Specifically, the water that pure water groove overflows is flowed into return water tank through pure water overflow pipe, then, then the water collected in return water tank is pumped into potcher by the water pumping mechanism that is arranged on recycling water utilization pipe, so as to realize the secondary use of water resource.
Description
Technical field
Photovoltaic art is the utility model is related to, more particularly to a kind of solar silicon wafers cleaning device.
Background technology
The preparation of solar silicon wafers is one of important process of manufacture of solar cells.Wherein, the preparation of solar silicon wafers
In last procedure be silicon chip surface cleaning.
The purpose of Wafer Cleaning is that silicon chip surface adheres in removing silicon chip working process metal, organic matter, mortar etc. are dirty
It is dirty.Traditional solar silicon wafers cleaning device cleans in cell body the water overflowed and is discharged directly into wastewater disposal basin in cleaning process, it is impossible to
Effectively utilize, cause water resource waste.
Utility model content
Based on this, it is necessary to for in traditional solar silicon wafers cleaning device cleaning process the problem of water resource waste,
A kind of solar silicon wafers cleaning device is provided.
A kind of solar silicon wafers cleaning device, including：
Potcher, for holding the running water of rinsing solar silicon wafers；
Dipper, for holding the solar silicon wafers after rinsing are carried out with the decoction of Chemical cleaning；
Pure water groove, for holding the pure water for the remained on surface decoction for removing solar silicon wafers；Open the upper end of the pure water groove
Provided with pure water spout hole；
Return water tank, for storing the water overflowed in the pure water groove；The upper end of the return water tank offers backwater and overflow
Discharge orifice；
Pure water overflow pipe, the water for will be overflowed in the pure water groove are imported in the return water tank；The pure water overflow
The first end of pipe connects with the pure water spout hole, and the second end of the pure water overflow pipe connects with the return water tank；
Recycling water utilization pipe, for the water in the return water tank to be imported in the potcher；The recycling pipe
First end connects with the potcher, and the second end of the recycling water utilization pipe connects with the return water tank；Wherein, the backwater
Be provided with the water pumping mechanism for being used for the water collected in the return water tank being pumped into the potcher using pipe；
And backwater comb, the water discharge for connecting to overflow in the return water tank with the backwater spout hole.
Above-mentioned solar silicon wafers cleaning device, by being recycled to Wafer Cleaning waste water, it can effectively save water
Resource.Specifically, the water that pure water groove overflows is flowed into return water tank through pure water overflow pipe, then, then by return water tank
The water of collection is pumped into potcher by the water pumping mechanism being arranged on recycling water utilization pipe, so as to realize the secondary profit of water resource
With.In addition, the upper end of return water tank offers backwater spout hole, when the dilutional hyponatremia stored in return water tank, water can be from backwater
Spout hole overflows through backwater comb, prevents that from the top of return water tank spilling, the water of spilling solar silicon wafers cleaning dress can be polluted
The outer member put.
In one of the embodiments, the potcher, the dipper and the pure water groove adjacent setting successively.
In one of the embodiments, from the pure water groove to the direction of the potcher, set successively in the pure water groove
There are first partition, second partition, the 3rd dividing plate so that the pure water groove is divided into the first pilot trench, the second pilot trench, the 3rd pilot trench,
Four pilot trench, first pilot trench, second pilot trench, the 3rd pilot trench, the 4th pilot trench adjacent setting successively；Described
One dividing plate, the second partition, the height of the 3rd dividing plate are successively decreased successively, and the pure water spout hole is arranged on the 4th son
On groove.
In one of the embodiments, the of the water level that is used to monitor in the return water tank is provided with the return water tank
One liquid level sensor and the control unit for controlling the water pumping mechanism, first liquid level sensor and the control
Unit electrically connects.
In one of the embodiments, the potcher, the dipper, ultrasonic wave cleaning is equipped with the pure water groove
Mechanism.
In one of the embodiments, the potcher, the dipper, the second liquid level biography is equipped with the pure water groove
Sensor is to monitor the water level in the potcher, the dipper, the pure water groove；Second liquid level sensor surpasses with described
Sound wave wiper mechanism electrically connects.
In one of the embodiments, it is provided with bubbling mechanism in the potcher or the dipper.
In one of the embodiments, the bubbling mechanism includes being used for the snakelike air inlet pipe for conveying bubbled gas, described
Snakelike air inlet pipe enters from the potcher from the dipper to be passed, and bubble holes are offered in the snakelike air inlet pipe.
In one of the embodiments, the inlet end of the snakelike air inlet pipe is arranged on the dipper, described snakelike
The outlet side of air inlet pipe is arranged on the potcher.
In one of the embodiments, the inlet end of the snakelike air inlet pipe is provided with air pressure regulator.
Brief description of the drawings
Fig. 1 is the structural representation of the solar silicon wafers cleaning device of an embodiment；
Fig. 2 is the structural representation of the solar silicon wafers cleaning device of another embodiment.
Embodiment
In order that the purpose of this utility model, technical scheme and advantage are more clearly understood, below in conjunction with accompanying drawing and implementation
Example, the utility model is further elaborated.It should be appreciated that specific embodiment described herein is only explaining
The utility model, it is not used to limit the utility model.
Solar silicon wafers cleaning device of the present utility model is described in detail below with reference to accompanying drawing.
Fig. 1 is the structural representation of the solar silicon wafers cleaning device of an embodiment, potcher 110, dipper in figure
112nd, the internal structure of pure water groove 114 is not shown.
Refering to Fig. 1, the utility model embodiment provides a kind of solar silicon wafers cleaning device 100, including potcher
110th, dipper 112, pure water groove 114, return water tank 116, pure water overflow pipe 201, recycling water utilization pipe 203 and backwater comb
205。
Wherein, the effect of potcher 110 is the running water for holding rinsing solar silicon wafers.That is, rinsing
In groove, the dirty of running water that dissolve in of silicon chip surface is tentatively cleared up.Overflow in addition, the top of potcher 110 is provided with rinsing
Discharge orifice (not shown), rinsing spout hole connect with rinsing overflow pipe 207, and the running water of such top overflow of potcher 110 can
To be discharged by rinsing overflow pipe 207.
Wherein, the effect of dipper 112 is for holding the decoction to the solar silicon wafers Chemical cleaning after rinsing.In medicine
In liquid bath 112, to carrying out decoction cleaning by the silicon chip tentatively cleaned in potcher 110, the gold adhered on silicon chip surface is removed
Category, organic matter and mortar etc. are dirty.
Dividing plate is provided with an embodiment, in dipper 112, dipper 112 is divided for multiple decoction pilot trench, this
Sample is more beneficial for Wafer Cleaning.Specifically, when Wafer Cleaning is carried out in a wherein decoction pilot trench, decoction can be with silicon chip table
The organic matter that adheres on face, metal, mortar etc. react, and as reaction is carried out, liquor strength declines.Now, then by the silicon
Piece, which is transferred in another decoction pilot trench, to carry out medicine and washes, and so as to ensure higher initial liquor strength, cleaning performance is good.
Wherein, the effect of pure water groove 114 is to hold the pure water for the remained on surface decoction for removing solar silicon wafers.In pure water groove
114 upper end offers pure water spout hole (not shown).
In an embodiment, the adjacent setting successively of potcher 110, dipper 112, pure water groove 114.From pure water groove
114 to the direction of potcher 110, be sequentially provided with pure water groove 114 first partition 104, second partition 106, the 3rd dividing plate 108 with
Pure water groove 114 is divided into the first pilot trench 103, the second pilot trench 105, the 3rd pilot trench 107, the 4th pilot trench 109, the first pilot trench 103,
Second pilot trench 105, the 3rd pilot trench 107, the adjacent setting successively of the 4th pilot trench 109；First partition 104, second partition the 106, the 3rd
The height of dividing plate 108 is successively decreased successively, and pure water spout hole (not shown) is arranged on the 4th pilot trench 109.In general, in pure water groove
In 114 during cleaning silicon chip, pure water is entered from the bottom of pure water groove 114, is overflowed from the top of pure water groove 114.By silicon chip
It is sequentially placed into each pilot trench and cleans along the direction of the 4th pilot trench 109 to the first pilot trench 103.Due to first partition 104,
Two dividing plates 106, the height of the 3rd dividing plate 108 are successively decreased setting successively, so the pure water for making to overflow from the first pilot trench 103 drain into
In second pilot trench 105, the pure water overflowed in the second pilot trench 105 is drained in the 3rd pilot trench 107, is overflowed in the 3rd pilot trench 107
Pure water is drained in the 4th pilot trench 109, and the pure water that the 4th pilot trench 109 overflows is discharged from pure water spout hole.Divider height is passed successively
The setting subtracted, it can avoid along the first pilot trench to the direction of the 4th pilot trench, the pure water in posterior pilot trench passes back into preceding pilot trench
In, cause water pollution.In addition, such a design can also be made full use of in pilot trench compared with clean water.Specifically, the first pilot trench
In pure water it is most clean, when the pure water overflowed in the first pilot trench is flowed into the second pilot trench, the pure water of spilling can be to the second pilot trench
In silicon chip cleaned；When the pure water overflowed in the second pilot trench is flowed into the 3rd pilot trench, the pure water of spilling again can be to the 3rd
Silicon chip in pilot trench is cleaned；When the pure water overflowed in the 3rd pilot trench is flowed into the 4th pilot trench, the pure water of spilling again can be right
Silicon chip in 4th pilot trench is cleaned；So that water resource, which utilizes, reaches maximization.
Wherein, return water tank 116 is used to store the water overflowed in pure water groove 114.
One end of return water tank 116 connects with pure water overflow pipe 201, and pure water overflow pipe 201 will can overflow in pure water groove 114
The water gone out is imported in return water tank 116.The first end of pure water overflow pipe 201 connects with pure water spout hole, pure water overflow pipe 201
Second end connects with return water tank 116.Preferably, the height of the first end of pure water overflow pipe 201 is higher than pure water overflow pipe 201
The second end.
The other end of return water tank 116 connects with recycling water utilization pipe 203, and recycling water utilization pipe 203 is used for return water tank 116
In water import potcher 110 in.The first end of recycling water utilization pipe 203 connects with potcher 110, and the of recycling water utilization pipe 203
Two ends connect with return water tank 116.Preferably, recycling water utilization pipe 203 is provided with the water for being used for being collected in return water tank 116
The water pumping mechanism 301 being pumped into potcher 110, water pumping mechanism 301 are preferably suction pump.
In summary, the water that pure water groove 114 overflows is flowed into return water tank 116 through pure water overflow pipe 201, then, then
The water collected in return water tank 116 is pumped into potcher 110 by the water pumping mechanism 301 being arranged on recycling water utilization pipe 203
In, so as to realize the secondary use of water resource.
In an embodiment, the upper end of return water tank 116 offers backwater spout hole (not shown), works as recycle-water
During the dilutional hyponatremia stored in case 116, water can overflow from backwater spout hole through backwater comb 205.Such a design can prevent from reclaiming
The water stored in water tank 116 overflows from the top of return water tank 116, pollutes the outer member of solar silicon wafers cleaning device.
The first of the water level being used to monitor in return water tank 116 is provided with an embodiment, in return water tank 116
Liquid level sensor (not shown) and the control unit (not shown) for controlling water pumping mechanism 301, the first liquid level sensor with
Control unit electrically connects.When the water stored in return water tank 116 is less than given threshold, the prompting control of the first liquid level sensor is single
Member control water pumping mechanism stops pumping.Control unit is preferably programmable logic controller (PLC) (PLA).
In addition, the second liquid level sensor is equipped with potcher, dipper, pure water groove to monitor potcher, dipper, pure
Water level in tank, the second liquid level sensor electrically connect with ultrasonic cleaning agency.When threshold value of the water level less than setting, second
Liquid level sensor instruction ultrasonic cleaning agency stops being cleaned by ultrasonic, and prevents ultrasonic cleaning agency non-productive work.
Refering to Fig. 2, bubbling mechanism 400 is provided with potcher 110 and/or dipper 112.Bubbling mechanism 400 provides bubbling
Gas, bubbled gas are beneficial to during Wafer Cleaning, accelerate the dirty and stripping of silicon chip surface on silicon chip surface.
In an embodiment, bubbling mechanism 400 includes being used for the snakelike air inlet pipe 410 for conveying bubbled gas, snake
Shape air inlet pipe 410 enters from potcher 110 from dipper 112 to be passed, and bubble holes 412 are offered in snakelike air inlet pipe 410.
It is the volume for increasing air inlet pipe in potcher 110 and/or dipper 112 that air inlet pipe, which is arranged to the snakelike first purpose, is easy to
Blast more bubbled gas.
In an embodiment, the inlet end of snakelike air inlet pipe 410 is arranged on dipper 112, snakelike air inlet pipe
Outlet side be arranged on potcher 110.Because the snakelike pipeline of air inlet pipe 410 is longer, cause the bubbling gas blasted in pharmacy slot 112
Body is more than the bubbled gas blasted in potcher 110, and more bubbled gas are beneficial to flow the medicament in dipper 112
Come, accelerate dirty on the silicon chip surface and stripping of silicon chip surface, improve cleaning performance.
In an embodiment, the inlet end of snakelike air inlet pipe 410 is provided with air pressure regulator 414, for controlling
The inlet of bubbled gas.
Above-mentioned solar silicon wafers cleaning device, by being recycled to Wafer Cleaning waste water, it can effectively save water
Resource.Specifically, the water that pure water groove overflows is flowed into return water tank through pure water overflow pipe, then, then by return water tank
The water of collection is pumped into potcher by the water pumping mechanism being arranged on recycling water utilization pipe, so as to realize the secondary profit of water resource
With.In addition, the upper end of return water tank offers backwater spout hole, when the dilutional hyponatremia stored in return water tank, water can be from backwater
Spout hole overflows through backwater comb, prevents that from the top of return water tank spilling, the water of spilling solar silicon wafers cleaning dress can be polluted
The outer member put.
Each technical characteristic of embodiment described above can be combined arbitrarily, to make description succinct, not to above-mentioned reality
Apply all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, the scope that this specification is recorded all is considered to be.
Embodiment described above only expresses several embodiments of the present utility model, and its description is more specific and detailed,
But therefore it can not be interpreted as the limitation to utility model patent scope.It should be pointed out that the common skill for this area
For art personnel, without departing from the concept of the premise utility, various modifications and improvements can be made, these are belonged to
The scope of protection of the utility model.Therefore, the protection domain of the utility model patent should be determined by the appended claims.
Claims (10)
- A kind of 1. solar silicon wafers cleaning device, it is characterised in that including：Potcher, for holding the running water of rinsing solar silicon wafers；Dipper, for holding the solar silicon wafers after rinsing are carried out with the decoction of Chemical cleaning；Pure water groove, for holding the pure water for the remained on surface decoction for removing solar silicon wafers；The upper end of the pure water groove offers Pure water spout hole；Return water tank, for storing the water overflowed in the pure water groove；The upper end of the return water tank offers backwater spout hole；Pure water overflow pipe, the water for will be overflowed in the pure water groove are imported in the return water tank；The pure water overflow pipe First end connects with the pure water spout hole, and the second end of the pure water overflow pipe connects with the return water tank；Recycling water utilization pipe, for the water in the return water tank to be imported in the potcher；The first of the recycling water utilization pipe End connects with the potcher, and the second end of the recycling water utilization pipe connects with the return water tank；Wherein, the recycling water utilization Pipe is provided with the water pumping mechanism for being used for being pumped into the water collected in the return water tank in the potcher；And backwater comb, the water discharge for connecting to overflow in the return water tank with the backwater spout hole.
- 2. solar silicon wafers cleaning device according to claim 1, it is characterised in that the potcher, the dipper, And the pure water groove adjacent setting successively.
- 3. solar silicon wafers cleaning device according to claim 2, it is characterised in that from the pure water groove to the rinsing The direction of groove, first partition, second partition, the 3rd dividing plate are sequentially provided with the pure water groove so that the pure water groove is divided into One pilot trench, the second pilot trench, the 3rd pilot trench, the 4th pilot trench, it is first pilot trench, second pilot trench, the 3rd pilot trench, described The adjacent setting successively of 4th pilot trench；The first partition, the second partition, the height of the 3rd dividing plate are successively decreased successively, institute Pure water spout hole is stated to be arranged on the 4th pilot trench.
- 4. solar silicon wafers cleaning device according to claim 1, it is characterised in that be provided with and be used in the return water tank The first liquid level sensor of the water level in the return water tank and the control unit for controlling the water pumping mechanism are monitored, First liquid level sensor electrically connects with described control unit.
- 5. solar silicon wafers cleaning device according to claim 1, it is characterised in that the potcher, the dipper, Ultrasonic cleaning agency is equipped with the pure water groove.
- 6. solar silicon wafers cleaning device according to claim 5, it is characterised in that the potcher, the dipper, The second liquid level sensor is equipped with the pure water groove to monitor the water in the potcher, the dipper, the pure water groove Position；Second liquid level sensor electrically connects with the ultrasonic cleaning agency.
- 7. solar silicon wafers cleaning device according to claim 1, it is characterised in that the potcher or the dipper It is interior to be provided with bubbling mechanism.
- 8. solar silicon wafers cleaning device according to claim 7, it is characterised in that the bubbling mechanism is included for defeated The snakelike air inlet pipe of bubbled gas is sent, the snakelike air inlet pipe enters from the potcher from the dipper to be passed, described Bubble holes are offered in snakelike air inlet pipe.
- 9. solar silicon wafers cleaning device according to claim 8, it is characterised in that the inlet end of the snakelike air inlet pipe It is arranged on the dipper, the outlet side of the snakelike air inlet pipe is arranged on the potcher.
- 10. solar silicon wafers cleaning device according to claim 9, it is characterised in that the air inlet of the snakelike air inlet pipe End is provided with air pressure regulator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721081426.XU CN207204736U (en) | 2017-08-25 | 2017-08-25 | Solar silicon wafers cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721081426.XU CN207204736U (en) | 2017-08-25 | 2017-08-25 | Solar silicon wafers cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207204736U true CN207204736U (en) | 2018-04-10 |
Family
ID=61817017
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721081426.XU Expired - Fee Related CN207204736U (en) | 2017-08-25 | 2017-08-25 | Solar silicon wafers cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207204736U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109877105A (en) * | 2019-04-04 | 2019-06-14 | 江苏美科硅能源有限公司 | Cleaning machine overflow reusing device for waste water |
| CN112775089A (en) * | 2020-12-30 | 2021-05-11 | 四川永祥硅材料有限公司 | Silicon chip washs effluent disposal system |
| CN113877876A (en) * | 2021-11-13 | 2022-01-04 | 镇江原轼新型材料有限公司 | A wash basin for rinsing diamond wire liquid medicine |
-
2017
- 2017-08-25 CN CN201721081426.XU patent/CN207204736U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109877105A (en) * | 2019-04-04 | 2019-06-14 | 江苏美科硅能源有限公司 | Cleaning machine overflow reusing device for waste water |
| CN112775089A (en) * | 2020-12-30 | 2021-05-11 | 四川永祥硅材料有限公司 | Silicon chip washs effluent disposal system |
| CN113877876A (en) * | 2021-11-13 | 2022-01-04 | 镇江原轼新型材料有限公司 | A wash basin for rinsing diamond wire liquid medicine |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180410 Termination date: 20190825 |
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| CF01 | Termination of patent right due to non-payment of annual fee |