CN204243011U - A kind of wet etching apparatus of solar battery sheet - Google Patents
A kind of wet etching apparatus of solar battery sheet Download PDFInfo
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- CN204243011U CN204243011U CN201420725099.7U CN201420725099U CN204243011U CN 204243011 U CN204243011 U CN 204243011U CN 201420725099 U CN201420725099 U CN 201420725099U CN 204243011 U CN204243011 U CN 204243011U
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- reservoir
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- rinse bath
- liquid
- solar battery
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The utility model provides a kind of wet etching apparatus of solar battery sheet, this device comprise place successively etching bath, the first rinse bath, alkaline bath, the second rinse bath, descaling bath and the 3rd rinse bath; The entrance of the first rinse bath and exit are equiped with the first water cutter and the second water cutter respectively; This device also comprises the first reservoir and the second reservoir, be connected with the 3rd rinse bath and the second water cutter respectively by connecting tube, when the liquid in the 3rd rinse bath reaches preset water level, discharge unnecessary liquid to the second reservoir, the second reservoir is the second water cutter feed flow; First reservoir is connected with the first rinse bath and etching bath respectively by connecting tube, first rinse bath is the first water cutter feed flow, when the liquid in the first rinse bath reaches preset water level, discharge unnecessary liquid to the first reservoir, the liquid in the first reservoir is used for for etching bath moisturizing and dosing.The utility model effectively can reduce the discharge of nitrogenous effluent, reduces solar battery sheet production cost.
Description
Technical field
The utility model belongs to area of solar cell, relates to a kind of wet etching apparatus of solar battery sheet.
Background technology
The part such as the P-type layer that common crystal silicon solar energy battery is made up of backplate, semi-conducting material, N-type layer, P-N junction, antireflection film, positive gate electrode forms.When solar irradiation is mapped to solar cell surface, antireflection film and suede structure effectively can reduce the light reflection loss of battery surface.After semiconductor structure in solar cell absorbs solar energy.Excite and produce electronics, hole pair, electronics, hole separate by the inner P-N junction built-in field of semiconductor, and electron stream enters N district, hole flows into P district, form photoproduction electric field, if can the positive and negative electrode of battery be connected with external circuit very much by crystalline silicon, in external circuit, just have photogenerated current to pass through.
The manufacturing process of solar cell comprises making herbs into wool, diffusion, etching, plated film, silk screen printing and the sorting of IV efficiency.Fig. 1 is shown as the structural representation of the wet etching apparatus of the solar battery sheet of prior art, in the wet-method etching and etching of solar battery sheet, shown in silicon chip direction of travel arrow, silicon chip can pass through etching bath 101, first rinse bath 102, alkaline bath 103, second rinse bath 104, descaling bath 105 and the 3rd rinse bath 106 successively.Wherein etching bath 101 solution used is nitric acid and hydrofluoric acid, and its effect is the mechanical damage layer of removal silicon chip surface and forms matte.First rinse bath 102 can make it nitrogenous when utilizing the first water cutter 107 and the second water cutter 108 pairs of silicon chips to clean, and this process can produce a large amount of nitrogenous effluent.And descaling bath 105 is made up of hydrofluoric acid and hydrochloric acid, silicon chip surface silicon dioxide and metal ion are removed in its effect.3rd rinse bath 106 can not be nitrogenous when cleaning silicon chip.If the process that nitrogenous effluent does not obtain, will polluted water resources.Because the processing cost of nitrogenous effluent is relatively high, the production cost of cell piece can be improve.In existing wet etching equipment (RENA), outside deionized water is first supplemented to the 3rd rinse bath the 106, three rinse bath 106 and exceedes after predetermined fluid level all flow to the first rinse bath 102 and discharge, and the nitrogenous effluent of generation is more.
Therefore, provide a kind of wet etching apparatus of new solar battery sheet, produce to reduce nitrogenous effluent, reduce production cost, become the major issue that those skilled in the art are urgently to be resolved hurrily.
Utility model content
The shortcoming of prior art in view of the above, the purpose of this utility model is the wet etching apparatus providing a kind of solar battery sheet, wet etching apparatus for solving solar battery sheet of the prior art produces a large amount of nitrogenous effluent, make processing cost relatively high, improve the problem of the production cost of solar battery sheet.
For achieving the above object and other relevant objects, the utility model provides a kind of wet etching apparatus of solar battery sheet, comprise place successively etching bath, the first rinse bath, alkaline bath, the second rinse bath, descaling bath and the 3rd rinse bath; The entrance of described first rinse bath and exit are equiped with the first water cutter and the second water cutter respectively; Wherein:
Described wet etching apparatus also comprises the first reservoir and the second reservoir;
Described second reservoir is connected with described 3rd rinse bath and described second water cutter respectively by connecting tube, when the liquid in described 3rd rinse bath reaches preset water level, discharge unnecessary liquid to described second reservoir, described second reservoir is described second water cutter feed flow;
Described first reservoir is connected with described first rinse bath and described etching bath respectively by connecting tube, described first rinse bath is described first water cutter feed flow, when the liquid in described first rinse bath reaches preset water level, discharge unnecessary liquid to described first reservoir, liquid in described first reservoir is used for for described etching bath moisturizing, and for the etching solution dosing of described etching bath.
Alternatively, described second reservoir comprises a floss hole, and when the liquid in described second reservoir arrives preset water level, unnecessary liquid is directly drained.
Alternatively, described first reservoir comprises a floss hole, and when the liquid in described first reservoir arrives preset water level, unnecessary liquid is directly drained.
Alternatively, the connecting tube between described first reservoir and described etching bath is provided with the pump housing and flow valve.
Alternatively, the connecting tube between described second reservoir and described second water cutter is provided with the pump housing and flow valve.
Alternatively, the liquid in described 3rd rinse bath is deionized water.
Alternatively, the etching solution in described etching bath is the mixed liquor of nitric acid and hydrofluoric acid; Pickle in described descaling bath is the mixed liquor of hydrofluoric acid and hydrochloric acid.
As mentioned above, the wet etching apparatus of solar battery sheet of the present utility model, there is following beneficial effect: the wet etching apparatus of solar battery sheet of the present utility model is on the basis of original trough body structure, first rinse bath and the connecting tube of the 3rd rinse bath and the discharge unit of the first rinse bath are improved, reduce the generation of the first rinse bath nitrogenous effluent, and the waste water of the first rinse bath is utilized again.When utilizing the wet etching apparatus of solar battery sheet of the present utility model to carry out wet etching, the water of the 3rd rinse bath is first disposed to the second reservoir and deposits, the water entering the second reservoir is directly drained more than the second reservoir scheduled volume, and this part waste water is nonnitrogenous.Owing to being provided with two water cutter cleaning silicon chips above the first rinse bath, wherein the second reservoir is connected to the second water cutter, and the first water cutter uses the water in the first rinse bath.Nitrogenous in the water of the first rinse bath ejection, be not fine to Wafer Cleaning effect, and the second water cutter is the nonnitrogenous water cleaning utilizing the 3rd rinse bath to provide, such Integral cleaning effect is better, and decrease the water yield that the 3rd rinse bath flows into the first rinse bath, reduce nitrogenous effluent and produce.And the waste water that the first rinse bath exceedes predetermined fluid level discharge drains into the first reservoir again and collects, for etching bath moisturizing and when changing cell body dosing, thus nitrogenous effluent can be utilized again, further the discharge of minimizing nitrogenous effluent.
Accompanying drawing explanation
Fig. 1 is shown as the structural representation of the wet etching apparatus of the solar battery sheet of prior art.
Fig. 2 is shown as the structural representation of the wet etching apparatus of solar battery sheet of the present utility model.
Element numbers explanation
101,201 etching baths
102,202 first rinse baths
103,203 alkaline baths
104,204 second rinse baths
105,205 descaling baths
106,206 the 3rd rinse baths
107,207 first water cuttves
108,208 second water cuttves
209 first reservoirs
210 second reservoirs
Embodiment
Below by way of specific instantiation, execution mode of the present utility model is described, those skilled in the art the content disclosed by this specification can understand other advantages of the present utility model and effect easily.The utility model can also be implemented or be applied by embodiments different in addition, and the every details in this specification also can based on different viewpoints and application, carries out various modification or change not deviating under spirit of the present utility model.
Refer to Fig. 2.It should be noted that, the diagram provided in the present embodiment only illustrates basic conception of the present utility model in a schematic way, then only the assembly relevant with the utility model is shown in graphic but not component count, shape and size when implementing according to reality is drawn, it is actual when implementing, and the kenel of each assembly, quantity and ratio can be a kind of change arbitrarily, and its assembly layout kenel also may be more complicated.
The utility model provides a kind of wet etching apparatus of solar battery sheet, refer to Fig. 2, be shown as the structural representation of this device, comprise etching bath 201, first rinse bath 202, alkaline bath 203, second rinse bath 204, descaling bath 205 and the 3rd rinse bath 206 placed successively; The entrance of described first rinse bath 202 and exit are equiped with the first water cutter 207 and the second water cutter 208 respectively; Wherein:
Described wet etching apparatus also comprises the first reservoir 209 and the second reservoir 210.
Concrete, described second reservoir 210 is connected with described 3rd rinse bath 206 and described second water cutter 208 respectively by connecting tube, when the liquid in described 3rd rinse bath 206 reaches preset water level, discharge unnecessary liquid to described second reservoir 210, described second reservoir 210 is described second water cutter 208 feed flow;
Described first reservoir 209 is connected with described first rinse bath 202 and described etching bath 201 respectively by connecting tube, described first rinse bath 202 is described first water cutter 207 feed flow, when the liquid in described first rinse bath 202 reaches preset water level, discharge unnecessary liquid to described first reservoir 209, liquid in described first reservoir 209 is used for for described etching bath 201 moisturizing, and for the etching solution dosing of described etching bath 201.
Concrete, described second reservoir 210 comprises a floss hole, and when the liquid in described second reservoir 210 arrives preset water level, unnecessary liquid is directly drained.Described floss hole can be located at this preset water level place height, and when the liquid in described second reservoir 210 arrives preset water level, unnecessary liquid overflows discharge automatically by described floss hole.Described floss hole also can be located at other height of described second reservoir, and described floss hole is provided with a valve, and this valve is connected with a level sensor, and opens under the control of described level sensor or close.When the liquid in described second reservoir 210 arrives preset water level, described valve is opened under the signal function of described level sensor, drain unnecessary liquid, when the liquid in described second reservoir 210 drops to certain water level, described valve is closed under the signal function of described level sensor, makes the liquid possessing predetermined amount in described second reservoir 210.
Described first reservoir 209 also comprises a floss hole, and when the liquid in described first reservoir 210 arrives preset water level, unnecessary liquid is directly drained.Described floss hole can be located at this preset water level place height, and when the liquid in described first reservoir 209 arrives preset water level, unnecessary liquid overflows discharge automatically by described floss hole.Described floss hole also can be located at other height of described first reservoir, and described floss hole is provided with a valve, and this valve is connected with a level sensor, and opens under the control of described level sensor or close.When the liquid in described first reservoir 209 arrives preset water level, described valve is opened under the signal function of described level sensor, drain unnecessary liquid, when the liquid in described first reservoir 209 drops to certain water level, described valve is closed under the signal function of described level sensor, makes the liquid possessing predetermined amount in described first reservoir 209.
Concrete, the connecting tube between described first reservoir 209 and described etching bath 201 is provided with the pump housing and flow valve, for controlling the moisturizing speed that described first reservoir 209 is described etching bath 201.
Connecting tube between described second reservoir 210 and described second water cutter 208 is also provided with the pump housing and flow valve, for controlling the liquid supply speed that described second reservoir 210 is described second water cutter 208.
Concrete, liquid in described 3rd rinse bath 206 is deionized water, by outside feeding mechanism (as deionized water pipeline), the deionized water that continuous supply is new, when the liquid in described 3rd rinse bath 206 reaches preset water level, discharge unnecessary liquid to described second reservoir 210, described second reservoir 210 is described second water cutter 208 feed flow, thus the water making described second water cutter 208 spray is nonnitrogenous, make the cleaning performance of silicon chip better, meanwhile, flow into the discharge reduction of described first rinse bath 202, decrease the generation of nitrogenous effluent.
Concrete, the etching solution in described etching bath 201 is the mixed liquor of nitric acid and hydrofluoric acid, and silicon chip is soaked in described etching bath 201, can remove the mechanical damage layer of silicon chip surface and form matte.Described first water cutter 207 and the second water cutter 208 are installed on entrance and the exit of described first rinse bath 202 respectively, when silicon chip arrives described first rinse bath 202 place by transmission device, described first water cutter 207 and the second water cutter 208 utilize the water in described first rinse bath 202 and the second reservoir 210 to clean the front of silicon chip and the back side respectively.Pickle in described descaling bath 205 is the mixed liquor of hydrofluoric acid and hydrochloric acid, and silicon chip surface silicon dioxide and metal ion are removed in effect.
The wet etching apparatus of solar battery sheet of the present utility model is on the basis of original trough body structure, first rinse bath and the connecting tube of the 3rd rinse bath and the discharge unit of the first rinse bath are improved, the water of described 3rd rinse bath only has part to be utilized by described first rinse bath, thus decrease the generation of the first rinse bath nitrogenous effluent, and improve the cleaning performance of silicon chip, simultaneously, again can utilize the waste water of the first rinse bath, the generation of further minimizing nitrogenous effluent, thus the production cost reducing solar battery sheet.
The wet etching apparatus of solar battery sheet of the present utility model is utilized to carry out the method step of wet etching as follows:
First provide a solar battery sheet, in the present embodiment, described solar battery sheet is for silicon chip.
Then by conveyer, described solar battery sheet is passed through etching bath 201, first rinse bath 202, alkaline bath 203, second rinse bath 204, descaling bath 205 and the 3rd rinse bath 206 successively;
Wherein:
The entrance of described first rinse bath 202 and exit are equiped with the first water cutter 207 and the second water cutter 208 respectively; When described solar battery sheet arrives described first rinse bath 202, described first water cutter and the second water cutter carry out hydro-peening to the front of described solar battery sheet and the back side respectively;
Described 3rd rinse bath 206 is connected to the second reservoir 210 by connecting tube, constantly deionized water is supplemented in described 3rd rinse bath 206, when the liquid in described 3rd rinse bath 206 reaches preset water level, discharge unnecessary liquid to described second reservoir 210 by connecting tube, described second reservoir 210 is described second water cutter 208 feed flow by connecting tube; When the liquid in described second reservoir 210 arrives preset water level, unnecessary liquid is directly drained by the floss hole be arranged on described second reservoir 210;
Described first rinse bath 202 is connected to the first reservoir 209 by connecting tube, when the liquid in described first rinse bath 202 reaches preset water level, discharges unnecessary liquid to described first reservoir 209; When the liquid in described first reservoir 209 arrives preset water level, the floss hole that unnecessary liquid is arranged on described first reservoir 209 is directly drained.
Described etching bath 201 is connected to described first reservoir 209 by connecting tube, and the liquid in described first reservoir 209 is described etching bath 201 moisturizing by this connecting tube, and for the etching solution dosing of described etching bath.
Concrete, described conveyer can be existing roller type or hanging connecting gear.
Concrete, by being installed in the pump housing on the connecting tube between described first reservoir 209 and described etching bath 201 and flow valve controls the moisturizing speed that described first reservoir is described etching bath.
By being installed in the pump housing on the connecting tube between described second reservoir 210 and described second water cutter 208 and flow valve controls the liquid supply speed that described second reservoir 210 is described second water cutter 208.
When utilizing the Etaching device of solar battery sheet of the present utility model to carry out wet etching, the water of the 3rd rinse bath is first disposed to the second reservoir and deposits, the water entering the second reservoir is directly drained more than the second reservoir scheduled volume, and this part waste water is nonnitrogenous.Owing to being provided with two water cutter cleaning silicon chips above the first rinse bath, wherein the second reservoir is connected to the second water cutter, and the first water cutter uses the water in the first rinse bath.Nitrogenous in the water of the first rinse bath ejection, be not fine to Wafer Cleaning effect, and the second water cutter is the nonnitrogenous water cleaning utilizing the 3rd rinse bath to provide, such Integral cleaning effect is better, and decrease the water yield that the 3rd rinse bath flows into the first rinse bath, reduce nitrogenous effluent and produce.And the waste water that the first rinse bath exceedes predetermined fluid level discharge drains into the first reservoir again and collects, for etching bath moisturizing and when changing cell body dosing, thus nitrogenous effluent can be utilized again, further the discharge of minimizing nitrogenous effluent.
In sum, the wet etching apparatus of solar battery sheet of the present utility model is on the basis of original trough body structure, first rinse bath and the connecting tube of the 3rd rinse bath and the discharge unit of the first rinse bath are improved, reduce the generation of the first rinse bath nitrogenous effluent, and the waste water of the first rinse bath is utilized again.When utilizing the Etaching device of solar battery sheet of the present utility model to carry out wet etching, the water of the 3rd rinse bath is first disposed to the second reservoir and deposits, the water entering the second reservoir is directly drained more than the second reservoir scheduled volume, and this part waste water is nonnitrogenous.Owing to being provided with two water cutter cleaning silicon chips above the first rinse bath, wherein the second reservoir is connected to the second water cutter, and the first water cutter uses the water in the first rinse bath.Nitrogenous in the water of the first rinse bath ejection, be not fine to Wafer Cleaning effect, and the second water cutter is the nonnitrogenous water cleaning utilizing the 3rd rinse bath to provide, such Integral cleaning effect is better, and decrease the water yield that the 3rd rinse bath flows into the first rinse bath, reduce nitrogenous effluent and produce.And the waste water that the first rinse bath exceedes predetermined fluid level discharge drains into the first reservoir again and collects, for etching bath moisturizing and when changing cell body dosing, thus nitrogenous effluent can be utilized again, further the discharge of minimizing nitrogenous effluent.So the utility model effectively overcomes various shortcoming of the prior art and tool high industrial utilization.
Above-described embodiment is illustrative principle of the present utility model and effect thereof only, but not for limiting the utility model.Any person skilled in the art scholar all without prejudice under spirit of the present utility model and category, can modify above-described embodiment or changes.Therefore, such as have in art and usually know that the knowledgeable modifies or changes not departing from all equivalences completed under the spirit and technological thought that the utility model discloses, must be contained by claim of the present utility model.
Claims (7)
1. a wet etching apparatus for solar battery sheet, comprise place successively etching bath, the first rinse bath, alkaline bath, the second rinse bath, descaling bath and the 3rd rinse bath; The entrance of described first rinse bath and exit are equiped with the first water cutter and the second water cutter respectively; It is characterized in that:
Described wet etching apparatus also comprises the first reservoir and the second reservoir;
Described second reservoir is connected with described 3rd rinse bath and described second water cutter respectively by connecting tube, when the liquid in described 3rd rinse bath reaches preset water level, discharge unnecessary liquid to described second reservoir, described second reservoir is described second water cutter feed flow;
Described first reservoir is connected with described first rinse bath and described etching bath respectively by connecting tube, described first rinse bath is described first water cutter feed flow, when the liquid in described first rinse bath reaches preset water level, discharge unnecessary liquid to described first reservoir, liquid in described first reservoir is used for for described etching bath moisturizing, and for the etching solution dosing of described etching bath.
2. the wet etching apparatus of solar battery sheet according to claim 1, is characterized in that: described second reservoir comprises a floss hole, and when the liquid in described second reservoir arrives preset water level, unnecessary liquid is directly drained.
3. the wet etching apparatus of solar battery sheet according to claim 1, is characterized in that: described first reservoir comprises a floss hole, and when the liquid in described first reservoir arrives preset water level, unnecessary liquid is directly drained.
4. the wet etching apparatus of solar battery sheet according to claim 1, is characterized in that: the connecting tube between described first reservoir and described etching bath is provided with the pump housing and flow valve.
5. the wet etching apparatus of solar battery sheet according to claim 1, is characterized in that: the connecting tube between described second reservoir and described second water cutter is provided with the pump housing and flow valve.
6. the wet etching apparatus of solar battery sheet according to claim 1, is characterized in that: the liquid in described 3rd rinse bath is deionized water.
7. the wet etching apparatus of solar battery sheet according to claim 1, is characterized in that: the etching solution in described etching bath is the mixed liquor of nitric acid and hydrofluoric acid; Pickle in described descaling bath is the mixed liquor of hydrofluoric acid and hydrochloric acid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420725099.7U CN204243011U (en) | 2014-11-26 | 2014-11-26 | A kind of wet etching apparatus of solar battery sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420725099.7U CN204243011U (en) | 2014-11-26 | 2014-11-26 | A kind of wet etching apparatus of solar battery sheet |
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| Publication Number | Publication Date |
|---|---|
| CN204243011U true CN204243011U (en) | 2015-04-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420725099.7U Expired - Fee Related CN204243011U (en) | 2014-11-26 | 2014-11-26 | A kind of wet etching apparatus of solar battery sheet |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204243011U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104409396A (en) * | 2014-11-26 | 2015-03-11 | 太极能源科技（昆山）有限公司 | Wet etching method and device for solar cells |
| CN111842326A (en) * | 2020-07-23 | 2020-10-30 | 昆山万盛电子有限公司 | Cleaning process of ceramic dielectric capacitor |
-
2014
- 2014-11-26 CN CN201420725099.7U patent/CN204243011U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104409396A (en) * | 2014-11-26 | 2015-03-11 | 太极能源科技（昆山）有限公司 | Wet etching method and device for solar cells |
| CN104409396B (en) * | 2014-11-26 | 2017-08-25 | 太极能源科技（昆山）有限公司 | The wet etch process and device of a kind of solar battery sheet |
| CN111842326A (en) * | 2020-07-23 | 2020-10-30 | 昆山万盛电子有限公司 | Cleaning process of ceramic dielectric capacitor |
| CN111842326B (en) * | 2020-07-23 | 2022-07-26 | 昆山万盛电子有限公司 | Cleaning process of ceramic dielectric capacitor |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150401 Termination date: 20181126 |