CN202643918U - Chemical treatment tank device for silicon wafer texturization - Google Patents
Chemical treatment tank device for silicon wafer texturization Download PDFInfo
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- CN202643918U CN202643918U CN 201220177764 CN201220177764U CN202643918U CN 202643918 U CN202643918 U CN 202643918U CN 201220177764 CN201220177764 CN 201220177764 CN 201220177764 U CN201220177764 U CN 201220177764U CN 202643918 U CN202643918 U CN 202643918U
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- chemical treatment
- silicon wafer
- inside groove
- treatment tank
- water jacket
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Abstract
The utility model relates to a chemical treatment tank device for silicon wafer texturization. The chemical treatment tank device comprises a inner chemical treatment tank, wherein a heater is arranged at the bottom of the inner chemical treatment tank, the inner chemical treatment tank is connected with an outer tank so that pollution caused due to the fact that corrosive liquids spill out of the inner chemical treatment tank and flows into the outer tank is avoided, a circulation pump is used for pressuring the inner chemical treatment tank and the outer tank so that the liquids in the outer tank return back to the inner tank, accordingly, the use ratio of the corrosive liquids is improved, and waste of the corrosive liquids is reduced.
Description
Technical field
The utility model relates to the fluff making device of silicon chip, more specifically, relates to the chemical treatment slot device for silicon wafer wool making.
Background technology
Along with photovoltaic power generation technology is ripe gradually, the application of solar cell is also flourish.Making herbs into wool is the important factor that affects sun power efficient in the solar cell.The making herbs into wool of solar battery sheet is to produce anisotropic etch by chemical reaction at silicon chip surface, forms the matte of intensive micro-pyramid pyramid structure, makes solar battery sheet reduce to greatest extent luminous reflectance factor, improves photoelectric transformation efficiency.Therefore, can effectively reduce silicon chip to the reflex action of sunlight by making herbs into wool, increase silicon chip to the incident Optical Absorption, thereby improve battery efficiency.
General lower-cost sodium hydroxide or the potassium hydroxide dilute solution (concentration is 1%~2%) of adopting prepares matte in large industrial production.In addition, in order effectively to control the size of speed of response and matte, can add a certain amount of IPA as sustained release dosage and complexing agent.Desirable matte effect should be that the pyramid size is even, covers whole surface.The height of gold tower does not have the space between the adjacent pyramid between 3~5 μ m, have lower surface albedo.
General production technique is to adopt groove type etching at present, in the making herbs into wool process, the silicon chip after cleaning is put into the chemical treating tank that fills corrosive fluid, and chemical treating tank commonly used is general hexahedron container, such as square or rectangular parallelepiped etc.When the corrosive fluid in the chemical treating tank overflows, this structure can't be avoided overflowing the pollution that causes because of corrosive fluid, cause simultaneously the waste of corrosive fluid, therefore need a kind of improved chemical treatment slot device that is used for silicon wafer wool making that can carry the overflowing liquid of corrosive fluid and reduce the corrosive fluid waste.
The utility model content
The purpose of this utility model is to overcome the defective of above-mentioned prior art, and a kind of improved chemical treatment slot device for silicon wafer wool making is provided.
For achieving the above object, the utility model is by the following technical solutions:
Be used for the chemical treatment slot device of silicon wafer wool making, it comprises the chemical treatment inside groove, and described inside groove bottom is provided with well heater, and described inside groove connects a water jacket.
In an embodiment of the present utility model, described inside groove and described water jacket are an integral body.
In an embodiment of the present utility model, described inside groove and described water jacket pass through pipeline communication.
In an embodiment of the present utility model, be provided with recycle pump on the described pipeline.
In an embodiment of the present utility model, also be provided with a strainer on the described pipeline.
In an embodiment of the present utility model, described install pipeline has the liquid mouth of throwing out, and described relief outlet is arranged in described inside groove.
In an embodiment of the present utility model, described liquid outlet is two.
Compared with prior art, the beneficial effects of the utility model are by connecting a water jacket at the chemical treatment inside groove, so that the corrosive fluid in the chemical treatment inside groove spills into water jacket, avoided the pollution that causes thus, simultaneously, by circulation line the overflowing liquid in the water jacket is got back in the inside groove, improved thus the utilization ratio of corrosive fluid, reduced the waste of corrosive fluid.
Description of drawings
Fig. 1 is the structural representation of the chemical treating tank that is used for silicon making herbs into wool commonly used.
Fig. 2 is the structural representation that is used for the chemical treating tank of silicon wafer wool making under the utility model one embodiment.
Fig. 3 is the structural representation that is used for the chemical treatment slot device of silicon wafer wool making under the utility model one embodiment.
Embodiment
The utility model is described in further detail below in conjunction with the drawings and specific embodiments, but described embodiment is not intended to limit protection domain of the present utility model.
Figure 1 shows that the structural representation that fills the chemical treating tank 100 of corrosive fluid commonly used.Figure 2 shows that the structural representation of the chemical treating tank under the utility model one embodiment, this chemical treating tank 100 ' comprise inside groove 101, the water jacket 102 that is connected with inside groove, the liquid that overflows so as to carrying inside groove.In one embodiment, this inside groove and this water jacket are an integral body.Interchangeable, this inside groove and this water jacket can link together by any way, to guarantee junction absence of liquid Seepage.In one embodiment, this chemical treating tank is rectangular structure.Interchangeable, this chemical treating tank can be the container of other any structures.As shown in Figure 2, by connecting a water jacket 102 at chemical treatment inside groove 101, so that the corrosive fluid in the chemical treatment inside groove 101 spills in the water jacket 102, avoided the pollution that causes thus.
Figure 3 shows that the structural representation that is used for the chemical treatment slot device of silicon wafer wool making under the utility model one embodiment.This chemical treatment slot device 100 " comprises inside groove 101; The water jacket 102 that is connected with inside groove is so as to the liquid that overflows in the carrying inside groove 101; In order to heat the well heater 103 that is positioned at inside groove 101 bottoms of corrosive fluid; The pipeline 104 that is communicated with inside groove 101 and water jacket 102; Be arranged on the recycle pump 105 on the pipeline 104, pressurize so that the circulation line that between inside groove 101 and water jacket 102, forms by recycle pump 105; Be arranged on the pipeline 104 in order in circulation line, to remove deimpurity strainer 106; And be arranged in two liquid outlets 107 on the pipeline 104 of inside groove 101.When corrosive fluid spilt into water jacket 102 from inside groove 101 after, the overflowing liquid in the water jacket 102 flowed along direction shown in Fig. 3 arrow A under the effect of recycle pump 105, discharged via flowing in the inside groove 101 and from liquid outlet 107 behind the strainer 106 removal impurity.As shown in Figure 3, by connecting a water jacket 102 at chemical treatment inside groove 101, so that the corrosive fluid in the chemical treatment inside groove 101 spills in the water jacket 102, avoided the pollution that causes thus, simultaneously, by circulation line the overflowing liquid in the water jacket 102 is got back in the inside groove 101, improved thus the utilization ratio of corrosive fluid, reduced the waste of corrosive fluid.
Above-described embodiment is more preferably embodiment a kind of of the utility model, and the common conversion that those skilled in the art carries out in the scope of technical solutions of the utility model and replacing all should be included in the scope of the present utility model.
Claims (7)
1. be used for the chemical treatment slot device of silicon wafer wool making, it comprises the chemical treatment inside groove, and described inside groove bottom is provided with well heater, it is characterized in that described inside groove connects a water jacket.
2. the chemical treatment slot device for silicon wafer wool making according to claim 1 is characterized in that, described inside groove and described water jacket are an integral body.
3. the chemical treatment slot device for silicon wafer wool making according to claim 1 is characterized in that, described inside groove and described water jacket pass through pipeline communication.
4. the chemical treatment slot device for silicon wafer wool making according to claim 3 is characterized in that, is provided with recycle pump on the described pipeline.
5. the chemical treatment slot device for silicon wafer wool making according to claim 3 is characterized in that, also is provided with a strainer on the described pipeline.
6. the chemical treatment slot device for silicon wafer wool making according to claim 3 is characterized in that described install pipeline has liquid outlet, and described relief outlet is arranged in described inside groove.
7. the chemical treatment slot device for silicon wafer wool making according to claim 6 is characterized in that, described liquid outlet is two.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN 201220177764 CN202643918U (en) | 2012-04-24 | 2012-04-24 | Chemical treatment tank device for silicon wafer texturization |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201220177764 CN202643918U (en) | 2012-04-24 | 2012-04-24 | Chemical treatment tank device for silicon wafer texturization |
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CN202643918U true CN202643918U (en) | 2013-01-02 |
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CN 201220177764 Expired - Fee Related CN202643918U (en) | 2012-04-24 | 2012-04-24 | Chemical treatment tank device for silicon wafer texturization |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109841705A (en) * | 2019-02-26 | 2019-06-04 | 镇江仁德新能源科技有限公司 | A kind of alkali throwing slot with filter device |
-
2012
- 2012-04-24 CN CN 201220177764 patent/CN202643918U/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109841705A (en) * | 2019-02-26 | 2019-06-04 | 镇江仁德新能源科技有限公司 | A kind of alkali throwing slot with filter device |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130102 Termination date: 20170424 |