CN207250464U - A kind of wafer fast draining wash tank - Google Patents
A kind of wafer fast draining wash tank Download PDFInfo
- Publication number
- CN207250464U CN207250464U CN201721088177.7U CN201721088177U CN207250464U CN 207250464 U CN207250464 U CN 207250464U CN 201721088177 U CN201721088177 U CN 201721088177U CN 207250464 U CN207250464 U CN 207250464U
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- rinse bath
- wafer
- osculum
- pure water
- wash tank
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Abstract
A kind of wafer fast draining wash tank, the rinse bath uses flower basket type, the bottom of the rinse bath is equipped with stent, the pure water pipe of rinse bath is fixed on the bottom bracket side of rinse bath, quartzy supporting plate is placed on stent, it is used to place the cleaning gaily decorated basket on quartzy supporting plate, the cleaning gaily decorated basket is used to carry wafer, pure water pipe is equipped with multiple spray apertures, pure water is cleaned for introducing, osculum is equipped with the bottom of rinse bath, the aperture of osculum is not less than the length for cleaning the gaily decorated basket, pressing device is also equipped with bottom of rinse bath, for press seal osculum.
Description
Technical field
The utility model belongs to technical field of manufacturing semiconductors, more particularly to a kind of wafer fast draining wash tank.
Background technology
The patent document of Publication No. CN1567538, it is noted that " in semiconductor fabrication, the cleanliness factor pair of wafer
The qualification rate of manufacture has greatest influence.In view of this, it is often necessary to before the progress of every one of semiconductor technology, and technique
After completion, the step that one of wafer is cleaned in addition is carried out again, it is residual so as to removing the particles of material being attached on wafer and chemistry
Stay thing etc..At present, in the program that wafer is cleaned, Quick drainage ablution is a kind of fairly common wafer cleaning mode.Institute
It is that first the wafer being placed on wafer block (Wafer Stand) is completely soaked in fast draining wash tank to call Quick drainage ablution
In deionized water in, then rapidly exclude fast draining wash tank in deionized water, at the same time, to the crystalline substance on wafer block
Circle sprinkling deionized water, to rinse wafer.In general, on the wet type board (Wet Bench) of multi-groove type (Multi-bath), it is brilliant
Circle after each chemical liquid bath program, generally can and then fast draining wash tank step, so as to removing in a upper program, attach
In process microparticles and chemical residue on wafer ".
The technical solution of above-mentioned patent application is that " a kind of fast draining wash tank, includes at least：One groove body, the wherein groove
Body includes at least the bottom that an osculum is located at the groove body；And one deflector be fixed on the groove body above the osculum
On, so that a discharge jet flow field of the groove body is transformed into a uniform flow field.Wherein the deflector includes：
One flow distribution plate, includes at least multiple tap holes wherein on the flow distribution plate；
Multiple connecting portions are respectively and fixedly connected to the both sides of the flow distribution plate, and those connecting portions are downward from a bottom of the flow distribution plate
It is prominent；
Multiple slides, wherein those slides engage with those connecting portions and are fixed on the lower section of those sides of the flow distribution plate,
And form an activity space between those slides and the bottom of the flow distribution plate；Multiple pars contractilis are located at the two of those slides respectively
End, and those pars contractilis are movable in the activity space, to adjust a length of the deflector；And multiple adjustment elements,
Those pars contractilis are fixed between the flow distribution plate and those slides." however, the technical solution is filled for existing cleaning
Standby to seem excessively complicated, cost is too high.
Utility model content
The utility model provides a kind of wafer fast draining wash tank.
A kind of wafer fast draining wash tank, the rinse bath use flower basket type, and the bottom of the rinse bath is equipped with branch
Frame, the pure water pipe of rinse bath are fixed on the bottom bracket side of rinse bath,
Quartzy supporting plate is placed on stent,
It is used to place the cleaning gaily decorated basket on quartzy supporting plate, the cleaning gaily decorated basket is used to carry wafer,
Pure water pipe is equipped with multiple spray apertures, and pure water is cleaned for introducing,
Osculum is equipped with the bottom of rinse bath, the aperture of osculum is not less than the length of the cleaning gaily decorated basket,
Pressing device is also equipped with bottom of rinse bath, for press seal osculum.
The outer wall of the rinse bath is equipped with on-line checking box, the component for on-line checking liquid.
Rinse bath edge of opening is covered with multiple overflow launders
The fast draining wash tank of the utility model provides a kind of function foot simple in structure for the pure water cleaning of wafer
Enough structural design schemes.
Brief description of the drawings
Detailed description below is read by reference to attached drawing, the utility model illustrative embodiments above-mentioned and other
Objects, features and advantages will become prone to understand.In the accompanying drawings, show that this practicality is new by way of example, and not by way of limitation
Some embodiments of type, wherein：
The structure schematic side view of Fig. 1 the utility model.
1 --- flower basket type QDR, 2 --- the cleaning gaily decorated basket, 3 --- quartzy supporting plate, 4 --- pure water pipe, 5 --- on-line checking
Box, 6 --- pressing device.QDR is the english abbreviation of fast draining wash tank.
Embodiment
As shown in Figure 1, a kind of wafer fast draining wash tank, the rinse bath uses flower basket type, the rinse bath
Bottom is equipped with stent, and the pure water pipe of rinse bath is fixed on the bottom bracket side of rinse bath.Quartzy supporting plate, quartz are placed on stent
It is used to place the cleaning gaily decorated basket on supporting plate, the cleaning gaily decorated basket is used to carry wafer.Pure water pipe is equipped with multiple spray apertures, for introducing
Clean pure water.Osculum is equipped with the bottom of rinse bath, the aperture of osculum is not less than the length for cleaning the gaily decorated basket.At rinse bath bottom
Portion is also equipped with pressing device, for press seal osculum.The outer wall of the rinse bath is equipped with on-line checking box.Clean channel opening
Edge is covered with multiple overflow launders
What deserves to be explained is created although foregoing teachings describe the utility model by reference to some embodiments
Spirit and principle, it should be appreciated that, the utility model is not limited to disclosed embodiment, and each side is drawn
Divide and also do not mean that the feature in these aspects cannot combine, this division is merely to the convenience of statement.The utility model purport
Covering various modifications and equivalent arrangements included in spirit and scope of the appended claims.
Claims (3)
1. a kind of wafer fast draining wash tank, it is characterised in that the rinse bath uses flower basket type, the bottom of the rinse bath
Portion is equipped with stent, and the pure water pipe of rinse bath is fixed on the bottom bracket side of rinse bath,
Quartzy supporting plate is placed on stent,
It is used to place the cleaning gaily decorated basket on quartzy supporting plate, the cleaning gaily decorated basket is used to carry wafer,
Pure water pipe is equipped with multiple spray apertures, and pure water is cleaned for introducing,
Osculum is equipped with the bottom of rinse bath, the aperture of osculum is not less than the length of the cleaning gaily decorated basket,
Pressing device is also equipped with bottom of rinse bath, for press seal osculum.
2. wafer fast draining wash tank as claimed in claim 1, it is characterised in that the outer wall of the rinse bath is equipped with
Line detects box, the component for on-line checking liquid.
3. wafer fast draining wash tank as claimed in claim 1, it is characterised in that rinse bath edge of opening is covered with multiple overflow
Chute.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721088177.7U CN207250464U (en) | 2017-08-29 | 2017-08-29 | A kind of wafer fast draining wash tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721088177.7U CN207250464U (en) | 2017-08-29 | 2017-08-29 | A kind of wafer fast draining wash tank |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207250464U true CN207250464U (en) | 2018-04-17 |
Family
ID=61884645
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721088177.7U Active CN207250464U (en) | 2017-08-29 | 2017-08-29 | A kind of wafer fast draining wash tank |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207250464U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109201608A (en) * | 2018-10-09 | 2019-01-15 | 无锡亚电智能装备有限公司 | A kind of wafer high-efficiency washing device and cleaning method |
-
2017
- 2017-08-29 CN CN201721088177.7U patent/CN207250464U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109201608A (en) * | 2018-10-09 | 2019-01-15 | 无锡亚电智能装备有限公司 | A kind of wafer high-efficiency washing device and cleaning method |
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