CN201473591U - Etch cleaning tank - Google Patents
Etch cleaning tank Download PDFInfo
- Publication number
- CN201473591U CN201473591U CN2009201896425U CN200920189642U CN201473591U CN 201473591 U CN201473591 U CN 201473591U CN 2009201896425 U CN2009201896425 U CN 2009201896425U CN 200920189642 U CN200920189642 U CN 200920189642U CN 201473591 U CN201473591 U CN 201473591U
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- China
- Prior art keywords
- cell body
- rinse bath
- side wall
- etching
- tank body
- Prior art date
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Abstract
The utility model discloses an etch cleaning tank, which comprises a tank body, wherein a ring of temporary storage area capable of storing chemical water is arranged outside the upper part of the side wall of the tank body, and the side wall of the temporary storage area is higher than the side wall of the tank body; a liquid inlet is arranged on the side wall of the temporary storage area, and a liquid suction opening is arranged at the lower part of the side wall of the tank body; and a bubble plate is arranged above the bottom wall of the tank body, and bubble holes are uniformly distributed on the bubble plate. Through the etch cleaning tank, the tank body needs to be temporarilly stored no longer, and thereby, the space and material are saved, and the etch cleaning chemical water can be more evenly mixed, and then the temperature of the chemical water is more even, and the etch cleaning effect of etch products is improved.
Description
Technical field
The utility model relates to the etching cleaning equipment, relates in particular to a kind of etching rinse bath of etching cleaning equipment.
Background technology
The etching cleaning technique is widely used in a plurality of manufacturings such as electronics, chemistry, machinery, for some accurate industries, for example semi-conductor, liquid-crystal display, solar cell industry, the etching cleaning performance is directly connected to the quality and the good article rate of product, and seeming is even more important.For slot type etching cleaning technique, need make liquid medicine abundant, and then make temperature can make just evenly that the etching degree of cleaning of each product is consistent to reach requirement, making the liquid medicine self-circulation by pump is well-mixed a kind of effective ways.
At present, the widely used etching rinse bath structural representation of slot type etching cleaning technique institute as shown in Figure 1, liquid medicine overflows to overflow working area 13 from etching rinse bath 10, and under the effect of gravity, flow in the temporary tank 11, with pump 12 liquid medicine is drawn back in the etching rinse bath 10 from temporary tank 11 then, finished the liquid medicine self-circulation.
In the ordinary course of things, this slot type loop structure can satisfy the etching cleaning requirement, but concerning the very high industry of etching cleaning requirement, this method exists significant disadvantages: need an additional temporary tank, take up room and material, for such as semi-conductor, liquid-crystal display, sun power industry, this cost all is very expensive.And, overflow belongs to the circulation of liquid medicine passive type, can not make the liquid medicine circulation fully, it is very fast that pump is drawn back the flow velocity of liquid medicine, also can make near the product etching degree of cleaning of fluid inlet cause bad greatly, during for example silicon chip etching cleans, can make near the silicon chip district of fluid inlet thinner, cause the big area of uneven thickness bad than other zone.
Summary of the invention
In view of the problems referred to above of the prior art, the purpose of this utility model is to provide a kind of etching rinse bath, does not need temporary tank, and liquid medicine is mixed, and flows evenly, improves the quality of etching cleaning products.
To achieve these goals, the utility model provides a kind of etching rinse bath, comprising:
One cell body, the working area that top peripheral hardware one circle of described cell body sidewall can be stored liquid medicine, described working area sidewall is than cell body sidewall height, offer fluid inlet on the sidewall of described working area, the bottom of described cell body sidewall is provided with liquid pumping hole, described cell body diapire top is provided with the bubbling plate, offers all the bubbling hole with distribution on the described bubbling plate.
As preferably, the utility model cell body is shaped as the cuboid or the cylinder bodily form.
The utlity model has following beneficial effect:
Reduced temporary tank, saved space and material, it is more even that liquid medicine is circulated, and improved product etching cleaning performance.
Description of drawings
Fig. 1 is traditional etching rinse bath circulation synoptic diagram;
Fig. 2 is the structural representation of etching rinse bath embodiment one of the present utility model;
Fig. 3 is the front view of Fig. 2;
Fig. 4 is the vertical view of Fig. 2;
Fig. 5 is the work synoptic diagram of etching rinse bath embodiment one of the present utility model.
Embodiment
Describe etching rinse bath embodiment of the present utility model in detail below in conjunction with accompanying drawing.
Embodiment one:
To shown in Figure 4, is example with the cuboid cell body as Fig. 2, comprising:
One cell body 20, the working area 24 that top peripheral hardware one circle of described cell body sidewall 21 can be stored liquid medicine, described working area 24 sidewalls are than cell body sidewall 21 height, be respectively equipped with fluid inlet 23 on the left side wall 241 in described working area 24, right side wall 242, front side wall 243, the rear wall 244, the left side wall 211 of described cell body sidewall 21, the bottom of right side wall 212 are respectively equipped with liquid pumping hole 22, described cell body diapire 26 tops are provided with bubbling plate 25, offer equally distributed bubbling hole 251 on the described bubbling plate 25.
Pass through present embodiment, the liquid medicine circulation has been become the active cycle pattern of drawing liquid bottom, bottom feed liquor by the passive circulation of overflow, the utility model etching rinse bath embodiment work synoptic diagram as shown in Figure 5, liquid medicine is extracted out from the liquid pumping hole 22 of cell body sidewall 21 by pump 12, get back to the working area 24 on top, exceed the height of sidewall 21 when liquid level after, liquid medicine automatic overflow etch-back is cleaned cell body 20, finish circulation, by the 251 pairs of even bubblings of liquid medicine in the bubbling hole on the bubbling dish 25, it is more even to impel liquid medicine to mix simultaneously.
Present embodiment has been saved temporary tank, thereby space and material have been saved, simultaneously, the active cycle pattern makes the liquid medicine circulation more even, the setting in working area has also solved the product undesirable condition that liquid medicine feed liquor flow velocity may cause, improved the etching cleaning performance greatly, be particularly suitable for the high industry of etching cleaning requirement precision and use.
In another embodiment of the present utility model, cell body diapire 26 makes issuable etching clean resultant precipitation and eliminating smoothly to centroclinal.
In another embodiment of the present utility model, the top of cell body sidewall 21 is offered and is spination, makes the mobile smoothly etch-back of liquid medicine clean cell body.
In another embodiment of the present utility model, the described bubbling hole 251 of crossing is circular, produces even bubble and makes liquid medicine more even.
Claims (7)
1. etching rinse bath, it is characterized in that, comprise a cell body, the working area that top peripheral hardware one circle of described cell body sidewall can be stored liquid medicine, described working area sidewall offers fluid inlet than cell body sidewall height on the sidewall of described working area, and the bottom of described cell body sidewall is provided with liquid pumping hole, described cell body diapire top is provided with the bubbling plate, offers all the bubbling hole with distribution on the described bubbling plate.
2. etching rinse bath according to claim 1 is characterized in that, described cell body is a cuboid.
3. etching rinse bath according to claim 1 is characterized in that, described cell body is the cylinder bodily form.
4. etching rinse bath according to claim 2 is characterized in that, four sidewalls in described working area offer fluid inlet respectively, and the bottom of cell body left side wall and right side wall offers liquid pumping hole respectively.
5. according to each described etching rinse bath of claim 1-4, it is characterized in that described cell body diapire is to centroclinal.
6. according to each described etching rinse bath of claim 1-4, it is characterized in that described cell body top side wall is a spination.
7. according to each described etching rinse bath of claim 1-4, it is characterized in that described bubbling hole is circular.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009201896425U CN201473591U (en) | 2009-07-22 | 2009-07-22 | Etch cleaning tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009201896425U CN201473591U (en) | 2009-07-22 | 2009-07-22 | Etch cleaning tank |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201473591U true CN201473591U (en) | 2010-05-19 |
Family
ID=42409835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009201896425U Expired - Fee Related CN201473591U (en) | 2009-07-22 | 2009-07-22 | Etch cleaning tank |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201473591U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106269690A (en) * | 2016-08-31 | 2017-01-04 | 湘潭大众整流器制造有限公司 | A kind of positive plate cleaning case |
| CN109701936A (en) * | 2019-01-14 | 2019-05-03 | 上海釜川自动化设备有限公司 | A kind of circulation trough body structure |
| WO2020195324A1 (en) * | 2019-03-28 | 2020-10-01 | 株式会社カネカ | Solar cell manufacturing method |
-
2009
- 2009-07-22 CN CN2009201896425U patent/CN201473591U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106269690A (en) * | 2016-08-31 | 2017-01-04 | 湘潭大众整流器制造有限公司 | A kind of positive plate cleaning case |
| CN106269690B (en) * | 2016-08-31 | 2019-07-26 | 湘潭大众整流器制造有限公司 | A kind of anode plate cleaning case |
| CN109701936A (en) * | 2019-01-14 | 2019-05-03 | 上海釜川自动化设备有限公司 | A kind of circulation trough body structure |
| WO2020195324A1 (en) * | 2019-03-28 | 2020-10-01 | 株式会社カネカ | Solar cell manufacturing method |
| JPWO2020195324A1 (en) * | 2019-03-28 | 2020-10-01 | ||
| JP7190555B2 (en) | 2019-03-28 | 2022-12-15 | 株式会社カネカ | Solar cell manufacturing method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100519 Termination date: 20110722 |