1378906 « · 九、發明說明： 【發明所屬之技術領域】 • 本發明係有μ祕mi及方法，更詳而言之，m關於一 種用於將大尺寸玻璃予以钱刻及/或薄化的光學玻璃钱刻裝置及方 法，使用具斜度之傳動線方式而減少光學玻璃應力，並採取婦描 式瀑布層流_塗佈赋，自光學_上方赠後及成左右來回 掃描的移動方式，均勻地釋出餘刻溶液，以均勻地侧及/或薄化 •光學玻璃。 【先前技術】 在液晶顯示器輕量化、薄型化及廣視角、高亮度的趨勢下， 液晶製造商紛紛針對獨的零組件提出了薄型化手段，特別是佔 了較大體積的玻璃基板，更是廠商們主要的目標。 為了薄化_純’各家廠商已提ώ 了幾種方法此些方法 大致上可分為多片直立式浸泡(Dip)、單片水平倾(ln彻 h〇riz〇ntal)、以及單片直立式噴灌(Spray)。而不論是那種方法主 要都是以化學驗，例如，氣化氫溶液，來對玻璃基板進行等向 性侧時辟控制手段來逐漸薄化綱基板，再配合 物理性侧，而進-步薄化玻璃基板。因，_以上之技術，使 玻璃基板的厚度從1995年的L2mm薄化至目前的〇.lmm，然， 上述手段本身的缺陷’已導致於薄化過程中產生出其他問題。 包於採用W直立式浸泡手段時為將複數片玻璃基板同時浸 應於餘刻溶贿射溶賴玻雜板所產生的化學反 2帶走餘刻後所產生的氟化石夕而逐漸餘刻薄化玻璃基板。然而， 帶走氟化石夕，必須使用氣泡(bubble)裝置，惟，氣泡震置不易 2使得薄化製造_度提高不少。在製程中，由於玻璃表面 力道不均，很容易造成玻璃表面粗糖。於此製程中，因原 餘到冷液触狀應生成物仍㈣於化學制，致使，仍浸泡於 xL奋液中的破璃基板’其表面容易再次反細著。若要加速反 應’則須提高溫度’然，化學龍積龐A，導致化學助無法有 效/皿控’而造成反應速率不―，又，根據流體力學顧，兩端钱 刻速率會加快，而造成玻璃均勻性變差，因此，在薄化完成後， 還需再初f磨，以得到均勻平坦的表面。原有驗刻溶液和反應 2成物都留於化學槽内，使得重複使㈣化學液造成增生物過 夕’而無法予以有效回收利用，致使成本相對提高。且，由於玻 璃基板被浸泡在蝕刻溶液中’玻璃基板的兩面會被相同效率予以 蝕刻，使得若其兩面有不同之餘刻要求時，將難以達成。而當玻 璃基板厚度減薄時’於_置放賴(ea喊6)之_將形成弧度而 造成平坦度偏S ’致使液Μ幕色敎真顯示S亮度獨(_)。 儲液槽大小不f ’所以加功尺寸成本無法τ降㈣了使成本降 低’則必須重;t細化學液’然，賴已轉於化學溶液中，致 使化學溶液濃度、密度已改變，是故’每一批次之飿刻率將有所 不同^需要對每一批次進行程式謂整，藉以達成相同之餘刻率， 並增高了研磨加工風險以及機械應力問題。 •躲壯找失，_，目«界大錄时舰的單片水 平侧⑽⑽卿卜單片直立式喷卿阶然^^ 刻方式仍有其缺點。以單片水平噴卿n UnehGriz_㈣言，還是 利用玻璃與化學誠生化學反應，水平澈的賴基板上端 喷濃磁h合液’藉由喷灌力道來力〇速姓刻反應，並將玻璃基板表 面上的化干反應生成物，例如，氟化石夕，予以帶走，以避免降低 餘刻溶液濃度而有較佳的回收使用條件，且免除了生成物附著於 玻璃基板上㈣題。另’因為每次侧玻璃基_，可僅針對單 一玻璃表面作蝕刻處理，故，可處理兩面不同姓刻之需求。 然，單片水平喷灑在帶走玻璃基板表面反應物時其喷灑面 積及力道不易控制，使得玻璃基板表面的承受力道不均，而容易 造成渦型(dimple)。另，由於外圍噴灑下來的化學液，亦會往玻璃 内部延伸，是故，玻璃中心的化學液不易流動，而使得中心面積 與外圍之反應速率不一，致使玻璃均勻性變差，而通量(thr〇ughput) 慢’且於蝕刻薄化後，仍須再次研磨。 為了解決化學液不易流動的問題，在單片直立式噴潘中，仍 利用蝕刻溶液對玻璃基板產生化學反應，但是僅對著垂直擺放的 玻璃基板喷灑蝕刻溶液，使得蝕刻溶液以及生成物自然落下，而 沒有不流動的問題，並藉由其喷灑力道來加速反應，而把玻璃基 板表面上的化學反應生成物，例如，氟化矽，帶走，並且噴灑後 的氫氟酸及反應後的氟化矽可直接過濾回收，而有較佳的回收使 用條件，不像多片直立浸泡方式會在反應後的生成物與氫氣酸在 長時間反應後，因化學鍵結會更1U定，而不易過濾、分解，而單 片水平喷灑、單片直立式喷灑則沒有生成物附著於玻璃基板上的 問題，同時，因每次蝕刻玻璃基板時，僅針對單一面作蝕刻處理， 所以可處理玻璃基板兩面不同蝕刻之需求。 然，採用單片直立式喷丨麗方法，雖能使钱刻溶液與生成物自 然落下’但是在帶走玻璃基板表面反應物時，僅在玻璃基板左右 兩側裝有贺麗裝置，使得玻璃基板表面的承受力道不均而容易造 成渦型，當薄化後，玻璃不易完全直立固定，且若玻璃未完全直 立並形成弧度將造成容易摔片及蝕刻不均。 是故，如何尋求一種光學玻璃蝕刻裝置及方法，可解決多片 直立式浸泡之薄化製造困難度、玻璃基板表面容易再次反應附 著、原蝕刻溶液與反應生成物均留於化學槽内、以及玻璃基板兩 端蝕刻速率加快等所造成的問題;可解決單片水平喷灑之喷灑面積 及力道控制不易所造成的玻璃基板表面渦型、玻璃均勻性變差、 通量慢、以及於餘刻薄化後仍須再次研磨等所造成的問題;以及， 可解決單片直立式喷灑之玻璃基板表面承受力道不均而造成之渦 型、玻璃不易完全直立囡定而造成容易摔片、以及蝕刻不均等的 問題;諸如以上種種所述之’均是有待解決的問題。 1378906 【發明内容】 本發明之主要目的便是在於提供一種光學玻璃蝕刻裝置及方 法’係應用於將大尺寸玻璃予以餘刻及/或薄化的情況下，使用具 斜度之傳動線(conveyer)方式而減少光學玻璃應力，並採取掃描式 瀑布溢流酸液塗佈型式，自光學玻璃上方以前後及/或左右來回掃 描的移動方式，均勻地釋出蝕刻溶液，用以均勻地蝕刻及/或薄化 光學玻璃。 本發明之另一目的便是在於提供一種光學玻璃蝕刻裝置及方 法，係應用於將大尺寸玻璃予以餘刻及/或薄化的情況下由於光 子玻璃呈現傾斜狀態，因而減少了於輸送傳動時玻璃本身的機械 強度及物性限制，避免了採用直立式垂直輸送傳動時所產生的問 題。 本發明之又一目的便是在於提供一種光學玻璃蝕刻裝置及方 法，係應肖鄕大尺核舒以侧及/_化的纽下，由於對 光學玻璃採轉描式瀑布溢紐液塗佈，因而可提箱刻速率、 以及光學玻璃钱刻均勻性。 根據以上所述之目的’本發明提供—種絲賴爛裝置， 該光學麵_較主要包含—載台、以及—掃描式瀑布溢流餘 刻噴灑器。 利用本發明之光學玻璃侧裝置進行光學玻顧刻方法時， 利用傾斜式傳動載台，以傾斜擺放方式使光學_與載台水平面 間之角度為切G 9G狀間，使得_絲朗職生的生 9 13.78906 成物能隨著剩她刻溶液—起順著光學__斜方向流下， 2生成物不會殘留在光學玻璃上溶液在傾斜之光學 玻璃面上具有擁之流雜，雜得馳平均_職面。且， 本發明之絲玻顧職置中之掃賊瀑布溢流__器，採 取掃描式瀑布溢流塗佈型式，從絲朗上方崎後及/或左 右來回_射式，均勻地釋_跑，因而，能均勻祕刻 及/或溥化光學㈣’並可提舰刻速率、以及光學玻触 性。 是故，本發明之光學玻璃綱褒置及方法，可解決多片直立 式浸泡之薄化製造_度、朗基板表面容易再次反應附著、原 侧溶液與反應魏物均留於化學彻、以及_基板兩端_ 速率加快等所造成關題;可解料片水平賴之铖_及力道 控制不易所造成的玻璃基板表面渦型、玻璃均勻性變差、通量慢、 以及於蝕刻薄化後仍須再次研磨等所造成的問題;以及，可解決單 片直立式噴灑之玻璃基板表面承受力道不均而造成之渦型、玻璃 不易完全直立固定而造成容易摔片、以及蝕刻不均等的問題。 爲使熟悉該項技藝人士瞭解本發明之目的、特徵及功 效，茲藉由下述具體實施例，並配合所附之圖式，對本發 明詳加說明如後： 【實施方式】 第1圖為一示意圖，用以顯示說明利用本發明之光學玻璃蝕 1圖中所示之，本 以及一掃描式瀑布 刻裝置以it行光學玻璃侧方法的情形。如第 發明之光學麵似彳裝置1主要包含一載台2, 溢流蝕刻喷灑器3。 利用本發明之光學玻魏難置1以進行光學玻顧刻方法 時’百先，·傾斜式傳動载台，_斜方式將光學朗1〇置於 载^ 2之傾斜面2a上，使光學玻璃10與載台2水平面間之角度 _為；丨於0度與90度之間;接著，利用掃描式瀑布溢流飯刻喷麗器 3 ’採取掃描式料溢紐㈣佈型式從鮮玻璃⑺上方以前 後及/或左右來回掃描的移動方式，均勻地釋出侧溶液。 3 ’如第1圖中所示之，掃描式瀑布溢流_喷灑器3所溢 出之瀑布流31加上介於〇度與9〇度之間的斜角0，於光學玻璃 之表面上可產生層流(laminafl〇w)32，當一邊之層流％酸液濃 度C1及流速VI等於另一邊之層流32酸液濃度C2及流速V2時， _ 光學玻璃10可被十分均勻地予以蝕刻。 更況’由於以傾斜方式擺放光學玻璃10、且掃描式爆布溢流 飯刻噴麗H 3 _掃描式轉布流蝴方式，致使，_光學玻 璃10所產生的生成|勿能隨著剩餘的姓刻溶液―起順著光學玻璃 10的傾斜方向流下，而使生成物不會殘留在光學玻璃1〇上，提升 生成物的排出速率(removalrate)，避免了生成物附著於光學玻璃 10上的問題’同時姓刻溶液在傾斜之光學玻璃10上具有較佳之流 動性，亦能得到較平均的蝕刻表面，因而，能均勻地姓刻及/或薄 11 1378906 化光學玻璃，並提升姓刻速率、以及光學玻璃餘刻均勻性，在此， 若餘刻光學玻璃10的触刻溶液為氫氟酸溶液時，則餘刻光學玻璃 1〇所產生之生成物則為氟化矽。 於調整_速率之時’必麟變_溶液停留在光學玻璃 上的時間長短而控制蝕刻速率，可藉由調整光學玻璃1〇與載台2 水平面間之角度、及/或調整掃描式爆布溢流钱刻噴灑器3之前後 及/或左右來回酸液塗佈速率而予以達成。 相較於單片直立式噴方法，於本發明之光學玻璃餘刻方法 中’以傾斜擺放方式使光學玻璃1〇與載台2水平面間之角度為介 於〇度與9G度之間，故’可採取掃描式瀑布溢流酸㈣佈型式， 知描式瀑布誠侧倾器3將侧溶液從光學朗1G上方，以 剛後及/或左絲回掃描的方式均勻地抑釋出，而並非如單片直 立式喷財法只能從側邊_，衫因受力柯岐光學玻璃ι〇 產生彎曲變形。 相較於單片水平喷灑方法，於本發明之光學玻璃餘刻方法 中，由於光學玻璃10與載台2水平面間之角度為介於〇度與9〇 ^之間’亦即，絲朗10承現傾做況，因而，侧溶液不會 聚集於光學麵1G上，使爛減有較狀流紐，而光學玻璃 1〇可得到触之_均勻性、並可提高侧速率。 另’相較於單純之爆布式層流_方法，於本發明之光學玻 璃姓刻方种，由崎描絲布溢紐射mu3採取前後及/或 12 ==描!_方式’從光學玻璃10上方均勻地_ 液釋放器予、t早純之料式層流_方法所採取之雜刻溶 Ί乂固疋並於光學破璃頂端溢出钱刻溶液的方式因 ==^_布溢__3之贿及/或左右來_ 喷移動m使本翻之絲賴_方 银刻速率、以及钮刻均勻性。 j更门之1378906 « · 9. Description of the invention: [Technical field to which the invention pertains] • The present invention relates to a method and method, and more particularly, to a method for engraving and/or thinning large-sized glass. The optical glass money engraving device and method use the inclined drive line method to reduce the optical glass stress, and adopt the smear-type waterfall laminar flow _ coating assignment, the movement mode from the optical _ above and after the left and right scanning, The residual solution is evenly released to evenly side and/or thin the optical glass. [Prior Art] In the trend of light weight, thinness, wide viewing angle and high brightness of liquid crystal displays, liquid crystal manufacturers have proposed thinning methods for individual components, especially glass substrates occupying a large volume. The main goal of the manufacturers. In order to reduce the number of _pure's manufacturers, several methods have been proposed. These methods can be roughly divided into multiple pieces of vertical immersion (Dip), single-piece horizontal tilting (Int H〇riz〇ntal), and single piece. Upright sprinkler (Spray). In either case, the method is mainly to use a chemical test, for example, a hydrogenated hydrogen solution, to control the isotropic side of the glass substrate to gradually thin the substrate, and then cooperate with the physical side, and further thinning glass substrate. Because of the above technique, the thickness of the glass substrate has been thinned from L2mm in 1995 to the current 〇.lmm. However, the defect of the above-mentioned means itself has caused other problems in the thinning process. When using the W vertical immersion method, the fluorite is generated by immersing a plurality of glass substrates at the same time in the chemical reaction of the residual smashing and dissolving the lysate. Glass substrate. However, it is necessary to use a bubble device to take away the fluoride fluorite. However, the bubble is not easily shaken. In the process, due to the uneven surface of the glass, it is easy to cause the surface of the glass to be raw sugar. In this process, the raw material to the cold liquid contact is still (4) chemically produced, so that the surface of the broken glass substrate that is still immersed in the xL liquid is easy to reverse again. If you want to speed up the reaction, you need to increase the temperature. However, the chemical dragon will accumulate A, which will cause the chemical aid to be ineffective/contained, and the reaction rate will not be--and, according to the fluid mechanics, the rate of money at both ends will increase. The glass uniformity is deteriorated. Therefore, after the thinning is completed, it is necessary to perform the initial grinding to obtain a uniform flat surface. Both the original inspection solution and the reaction 2 are left in the chemical tank, so that the (4) chemical liquid is repeatedly caused to increase the biological activity and cannot be effectively recycled, so that the cost is relatively increased. Moreover, since the glass substrate is immersed in the etching solution, both sides of the glass substrate are etched by the same efficiency, so that it is difficult to achieve if there are different requirements on both sides. When the thickness of the glass substrate is thinned, the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The size of the liquid storage tank is not f', so the cost of the working dimension cannot be reduced by τ (4) The cost is reduced, 'it must be heavy; t fine chemical liquid', the Lai has been transferred to the chemical solution, causing the concentration and density of the chemical solution to change. Therefore, the engraving rate of each batch will be different. ^ Each batch needs to be programmed to achieve the same residual rate, and the grinding processing risk and mechanical stress problem are increased. • Avoiding and finding faults, _, eyes «The single-level horizontal side of the ship in the Great Record (10) (10) Qing Bu single-piece upright spray qing jie ^ ^ ^ engraved way still has its shortcomings. In a single-piece horizontal spray, Un UnGGriz_ (4), or use the glass and chemical Chengsheng chemical reaction, the horizontally-thickly on the upper end of the substrate is sprayed with concentrated magnetic h-liquid 'by the spray force to force the idling reaction, and the surface of the glass substrate The above-mentioned dry reaction product, for example, fluorinated stone, is taken away to avoid lowering the concentration of the residual solution, has better recycling conditions, and eliminates the attachment of the product to the glass substrate (4). In addition, because each side of the glass substrate _ can be etched only for a single glass surface, it is possible to deal with the needs of two different faces. However, when the single-piece horizontal spray is used to remove the reactants on the surface of the glass substrate, the spray area and the force are not easily controlled, so that the surface of the glass substrate is unevenly supported, and it is easy to cause a dimple. In addition, since the chemical liquid sprayed from the periphery also extends inside the glass, the chemical liquid in the center of the glass does not easily flow, and the reaction rate between the central area and the periphery is different, resulting in poor glass uniformity, and flux. (thr〇ughput) Slow' and after the etching is thinned, it must be ground again. In order to solve the problem that the chemical liquid is not easy to flow, in the single-piece vertical spray pan, the etching reaction is still used to chemically react the glass substrate, but only the etching solution is sprayed on the vertically placed glass substrate, so that the etching solution and the product are formed. Naturally falling without the problem of no flow, and by its spraying force to accelerate the reaction, the chemical reaction product on the surface of the glass substrate, for example, barium fluoride, is taken away, and the hydrofluoric acid after spraying and The ruthenium fluoride after the reaction can be directly filtered and recovered, and has better recycling conditions. Unlike the multi-plate immersion method, the reaction product and the hydrogen acid react for a long time, and the chemical bond is more 1U. It is not easy to filter and decompose, and the single-piece horizontal spraying and the single-piece vertical spraying have no problem that the product adheres to the glass substrate, and at the same time, since the glass substrate is etched each time, only a single surface is etched. Therefore, the need for different etching on both sides of the glass substrate can be handled. However, the use of a single-piece vertical squirting method can make the money solution and the product fall naturally', but when carrying away the surface reaction of the glass substrate, only the Heli device is installed on the left and right sides of the glass substrate, so that the glass The surface of the substrate has uneven bearing force and is easy to cause a vortex shape. When thinned, the glass is not easily erected completely, and if the glass is not completely erected and curved, the film may be easily broken and unevenly etched. Therefore, how to find an optical glass etching apparatus and method can solve the difficulty of thinning and manufacturing of a plurality of upright immersing, the surface of the glass substrate is easily re-reacted, the original etching solution and the reaction product are left in the chemical tank, and The problem caused by the increase of the etching rate at both ends of the glass substrate; the surface area of the glass substrate can be solved, the surface vortex of the glass substrate is not easily caused, the glass uniformity is deteriorated, the flux is slow, and the remaining The problem caused by re-grinding after being thinned; and the vortex type caused by the unevenness of the surface of the glass substrate of the single-piece vertical spray, the glass is not easily erected, and the film is easily broken, and Problems of unequal etching; such as those described above are all problems to be solved. 1378906 SUMMARY OF THE INVENTION The main object of the present invention is to provide an optical glass etching apparatus and method for applying a gradient drive line (conveyer) in the case of engraving and/or thinning of large-sized glass. The method reduces the stress of the optical glass, and adopts a scanning waterfall overflow acid coating type to uniformly release the etching solution from the upper and lower sides of the optical glass before and/or to the left and right scanning to uniformly etch and / or thinned optical glass. Another object of the present invention is to provide an optical glass etching apparatus and method for use in the case of engraving and/or thinning of large-sized glass, since the photonic glass is inclined, thereby reducing the transmission speed. The mechanical strength and physical properties of the glass itself avoid the problems caused by the vertical vertical conveyor drive. Another object of the present invention is to provide an optical glass etching apparatus and method, which are suitable for the side of the nucleus and the nucleus of the nucleus, and the coating of the optical glass. Therefore, the box rate can be increased, as well as the optical glass uniformity. According to the above-mentioned objects, the present invention provides a seeding device, which mainly comprises a stage, and a scanning waterfall overflow residual sprayer. When the optical glass side device is used in the optical glass side etching method of the present invention, the angle between the optical _ and the horizontal plane of the stage is cut into a G 9G shape by using the inclined transmission stage, so that the angle is The birth of the student 9 13.78906 The object can flow with the solution of her left - down the optical __ oblique direction, 2 the product will not remain on the optical glass, the solution has a mixed flow on the inclined optical glass surface, miscellaneous Get the average _ face. Moreover, the squid overflowing __ device of the silk glass in the present invention adopts a scanning waterfall overflow coating type, and is splayed from the top of the silk and/or left and right _shooting, uniformly releasing _ Run, thus, can be evenly secreted and / or deuterated optical (four) 'can mention the ship engraving rate, and optical glass touch. Therefore, the optical glass assembly and method of the present invention can solve the thinning manufacturing of a plurality of vertical immersion _ degrees, the surface of the slab substrate is easily re-reacted, the original solution and the reaction material are left in the chemical, and the _ substrate The problems caused by the speed of the two ends _ speeding up; the level of the disintegrating film depends on the _ _ and the surface vortex of the glass substrate, the uniformity of the glass is poor, the flux is slow, and the etch is thinned after the etching is thinned The problem caused by re-grinding, etc.; and the problem that the surface of the glass substrate subjected to the single-piece upright spraying is not uniform, and the vortex type and the glass are not easily erected completely, which causes easy breakage and uneven etching. The present invention will be described in detail by the following specific embodiments, and with the accompanying drawings, in the following description of the accompanying drawings: FIG. A schematic view for illustrating the use of the optical glass etch 1 of the present invention, and a scanning waterfall apparatus for the optical glass side method. The optical surface like device 1 of the first aspect of the invention mainly comprises a stage 2, an overflow etching sprayer 3. By using the optical glass of the present invention to perform the optical glass engraving method, the 'hundred, tilting drive stage, _ oblique mode is placed on the inclined surface 2a of the carrier 2 to make the optical The angle between the glass 10 and the level of the stage 2 is 丨; between 0 and 90 degrees; then, using the scanning waterfall overflowing the rice streamer 3 'takes the scanning material overflow (four) cloth type from the fresh glass (7) The movement of the upper and lower and/or left and right scans is performed to uniformly release the side solution. 3 'As shown in Fig. 1, the scanning waterfall overflow _ the waterfall flow 31 overflowed by the sprinkler 3 plus the oblique angle 0 between the twist and 9 , on the surface of the optical glass A laminar flow (laminafl〇w) 32 can be generated. When the laminar flow % acid concentration C1 and the flow velocity VI on one side are equal to the laminar flow 32 acid concentration C2 and the flow velocity V2 on the other side, the optical glass 10 can be uniformly distributed. Etching. What's more, because the optical glass 10 is placed in an inclined manner, and the scanning type blasting overflows the H3 _scanning type of the smear, the generation of the _ optical glass 10 can not be The remaining surname solution flows downward in the oblique direction of the optical glass 10, so that the product does not remain on the optical glass 1,, and the discharge rate of the product is increased, and the product is prevented from adhering to the optical glass 10. The problem of the above is that the surname solution has better fluidity on the inclined optical glass 10, and a more average etched surface can be obtained, so that the optical glass can be uniformly engraved and/or thin 11 1378906, and the surname is raised. The engraving rate and the uniformity of the optical glass have a uniformity. Here, if the engraved solution of the optical glass 10 is a hydrofluoric acid solution, the product produced by the residual optical glass 1 is barium fluoride. Adjusting the etching rate when adjusting the _ rate _ _ _ solution to stay on the optical glass, by adjusting the angle between the optical glass 1 〇 and the level of the stage 2, and / or adjusting the scanning blast The overflowing ink is applied to the sprayer 3 before and/or to the left and right acid solution rate. Compared with the single-piece vertical spraying method, in the optical glass residual method of the present invention, the angle between the optical glass 1〇 and the horizontal plane of the stage 2 is inclined between 9 degrees and 9 degrees. Therefore, the scanning waterfall overflow acid (four) cloth type can be adopted, and the side-flowing solution of the known waterfall is tilted from the upper side of the optical lens 1G, and is uniformly released after the scanning of the rear and/or left silk. It is not like a single-piece upright spray method that can only be bent from the side _, the shirt due to the force of the optical glass 〇. Compared with the single-piece horizontal spraying method, in the optical glass residual method of the present invention, since the angle between the optical glass 10 and the horizontal plane of the stage 2 is between 〇 and 9〇^, that is, 10, the implementation of the dumping situation, therefore, the side solution will not accumulate on the optical surface 1G, so that the rotten reduction has a more fluent, and the optical glass 1 〇 can get the touch uniformity, and can increase the side rate. In addition, compared to the simple pop-up laminar flow method, the optical glass surnamed in the present invention is taken from the front and/or 12 or = 12 == Uniformly above the glass 10 _ liquid release device, t early pure material laminar flow _ method used to dissolve the sputum sputum solid sputum and the method of overflowing the solution at the top of the optical glass due to ==^_ __3 bribes and / or left and right _ spray moving m to make this turn over the _ square silver engraving rate, and button uniformity. j more door
第2圖為-示意圖，用以顯示說明本發明之光學玻璃钱刻裝 置的結構組成。如第2圖中所示之，本發明之光學玻雜刻裝置工 主要包含-載台2、以及-掃描式爆布溢流_姻器3，並可選 擇性增加嵌入式治具4、以及清潔器(未描繪出）。 載台2可提供傾斜面2a，而使擺放於傾斜面&上的光學玻璃 10與水平面間之角度為介於0度與90度之間。Fig. 2 is a schematic view showing the structural composition of the optical glass engraving apparatus of the present invention. As shown in FIG. 2, the optical glass-engraving device of the present invention mainly comprises a carrier 2, and a scanning blast overflow device 3, and can selectively add the embedded fixture 4, and Cleaner (not depicted). The stage 2 can provide the inclined surface 2a such that the angle between the optical glass 10 placed on the inclined surface & and the horizontal plane is between 0 and 90 degrees.
掃描式瀑布溢祕_職3採取雜式瀑布猶酸液塗佈 型式’自光學綱10上方以前後及/或左右細掃描邮動方式， 均句地釋出侧溶液，a ’由於以傾斜方式擺放光學玻璃10，致 使’蝕刻光學玻璃10所產生的生成物能隨著剩餘的蝕刻溶液一起 順著光學玻璃10的傾斜方向流下，而使生成物不會殘留在光學玻 璃10上，避免了生成物附著於光學玻璃10上的問題，同時蝕刻 溶液在傾斜之光學玻璃10上具有較佳之流動性，亦能得到較平均 的蝕刻表面，因而，能均勻地餘刻及/或薄化光學玻璃，並可提升 钱刻速率、以及光學玻璃蝕刻均勻性，在此，若蝕刻光學玻璃10 13 1378906 的韻刻溶料纽贿_，舰耻學賴IG魅生之生成物 則為氟化梦。 肷入式治具4用以固定住擺放於傾斜面2a上的光學玻璃1〇， 而為了避免在光學__程序t，_溶液流到另—面上，避 免光子玻璃1G_L面之反應生成物、以及蝴雜污染到背面將 於嵌入式料4_續轉帶雜㈣），可職避免酸液渗入 所造成之光學玻璃1G的側邊及背面的侧問題。 於光學玻璃10完成儀刻後，清潔器(未繪出)可用喷式清洗 方式或其他清洗方式，將光學玻璃1〇予以清潔。 第3圖為示忍圖’用以顯示說明對光學玻璃進行姓刻及/或 薄化處理的流程，其中，了本發明之光學玻璃磁懷置及方 法。 如第3财所示之，使用具斜度之傳動線方式而減少光學玻 璃10之應力，於進行光學玻璃蝕刻方法流程時，首先，於載台2 之傾斜面2a上的光學玻璃1〇以傾斜角度從左方投入。 接著’掃描式瀑布溢流侧噴麗器3採取掃描式爆布溢流酸 液塗佈型式’從光學玻璃10上方以前後及/或左右來回掃描的移動 方式，均勻地釋出_溶液，藉以能均勻輸刻及/或薄化光學破 璃，在此，嵌入式治具4用以固定住擺放於傾斜面2a上的光學玻 璃10，而為了避免在光學玻璃蝕刻程序中，蝕刻溶液流到另一面 上，避免光學玻璃10上面之反應生成物、以及餘刻溶液污染到背 1378906 面’將於嵌入式治具4週圍以防酸膠帶封住(seal)，可徹底避免酸 液滲入所以成之光學玻璃1〇的側邊及背面的蝕刻問題若蝕刻光 予玻璃10的姓刻’谷液為鼠氟酸溶液時’則钱刻光學玻璃10戶斤產 生之生成物則為氟化破。 繼而於光學玻璃丨〇完成钱刻後，清潔器(未繪出)可用喷濃 式清洗方式或其崎洗方式，將光學_料以錄以風刀⑽ knife)20將已蝕刻後之光學玻璃1〇予以吹乾。 鲁 最後’將經韻刻及/或薄化完成後的光學玻璃10自右方取出 (unload) ° 本發明的光學玻璃钱刻裝置及方法，亦可應用於對光學玻璃 之-面作侧及/或薄化、對其另-面倾清潔液體作清潔，然後 再對經侧叙光學朗的該面作清潔、錢，並_反轉機構 將光學玻璃反轉之後，對未祕刻之光學玻璃的該另一面進行姓 •刻及/或薄化、清潔、乾燥，並對光學玻璃相反面作清潔的處理過 程於此些處理過程中，對光學玻璃面進行侧及/或薄化時，均 可利用本發明之光學玻璃飯刻裝置及方法，其原理相同、類似於 以上所述之，是故，在此不再贅述。 综合以上之所述’我們可以得到本發社—種絲玻璃钱刻 裝置及方法’係細於將大尺核璃予以侧及/或薄化的情況 下’使用具斜度之傳動線方式而減少光學玻璃應力，並採取掃描 式瀑布溢流酸液塗佈型式，從光學玻璃上方以前後及/或左右來回 1378906Scanning waterfall overflow secret _ Occupation 3 adopts a hybrid waterfall with acid coating type 'from the top of the optical frame 10 before and after and / or left and right fine scanning postal mode, all the way to release the side solution, a 'because of the tilt The optical glass 10 is placed such that the product produced by the etching of the optical glass 10 can flow down the oblique direction of the optical glass 10 along with the remaining etching solution, so that the resultant does not remain on the optical glass 10, thereby avoiding The problem that the resultant adheres to the optical glass 10, while the etching solution has better fluidity on the inclined optical glass 10, and a relatively average etching surface can be obtained, thereby uniformly engraving and/or thinning the optical glass. Moreover, the rate of money engraving and the uniformity of etching of the optical glass can be improved. Here, if the engraving of the optical glass 10 13 1378906 is fused, the product of the IG Charm is a fluoridation dream. The squeezing jig 4 is for fixing the optical glass 1 摆 placed on the inclined surface 2a, and in order to avoid the reaction of the photon glass 1G_L surface in the optical __program t, _ solution flows to the other surface The object, as well as the contamination of the back to the back will be embedded in the material 4_ continued to carry the miscellaneous (four)), to avoid the side problem of the side and back of the optical glass 1G caused by acid infiltration. After the optical glass 10 is completed, the cleaner (not shown) can be cleaned by means of spray cleaning or other cleaning methods. Fig. 3 is a flow chart showing the process of surname and/or thinning the optical glass, in which the optical glass magnetic care method and method of the present invention are used. As shown in the third fiscal view, the stress of the optical glass 10 is reduced by using a sloped drive line method. When the optical glass etching method is performed, first, the optical glass on the inclined surface 2a of the stage 2 is The tilt angle is input from the left. Then, the 'scanning waterfall overflow side sprayer 3 adopts a scanning type explosion-proof overflow acid coating type' to move from above and/or to the left and right of the optical glass 10 to uniformly release the solution. The optical glass can be uniformly inscribed and/or thinned, and the embedded fixture 4 is used to fix the optical glass 10 placed on the inclined surface 2a, and the etching solution flow is avoided in the optical glass etching process. On the other side, avoid the reaction product on the optical glass 10 and the contamination of the solution to the back of the 1378906 surface. 'The seal will be sealed around the embedded fixture 4 to prevent the acid from penetrating. The etching problem of the side and the back side of the optical glass is etched. If the etched light is applied to the glass 10, the name of the gluten is the fluorinated acid solution, and the product produced by the 10 jin of optical glass is fluoridated. . After the optical glass crucible is finished, the cleaner (not shown) can be etched by the spray cleaning method or its sacrificial method, and the optical glass is recorded by the air knife (10) knife 20 1 〇 blow dry. Lu finally 'unloads the optical glass 10 after the rhyme and/or thinning is completed. The optical glass engraving apparatus and method of the present invention can also be applied to the side of the optical glass. / or thinning, cleaning the other side of the cleaning liquid, and then cleaning the surface of the side of the optically polished, money, and _ reversing mechanism to reverse the optical glass, the unsharp optical The other side of the glass is subjected to a process of surname and/or thinning, cleaning, drying, and cleaning the opposite side of the optical glass. During the treatment, when the optical glass surface is side and/or thinned, The optical glass rice carving apparatus and method of the present invention can be utilized, and the principle is the same, similar to the above, and therefore will not be described herein. In summary, the above-mentioned 'we can get the hairdressing machine---------------------------------------------------------------------------------------------------------- Reduce the optical glass stress and adopt a scanning waterfall overflow acid coating type, from the top of the optical glass before and after and/or around 1378906
知描的鶴対’均自轉_雜，肋均自地蝴及/或薄 化先學玻璃。彻本發明之光學玻_職置進行光學破璃餘刻 方法時，由於絲麵呈觀做態，因而減少了讀送傳動時 玻璃本身的顧強度及物性_，避免了_直立式垂直輸送傳 動時所產生_題’且’由於對光學玻璃採取掃描絲布溢流酸 液塗佈，因而可提升_速率、以及絲玻顧刻均勻性。本發 明之光學賴侧裝置及方法包含以下優點： 1.使用具斜度之傳動線方式而減少光學玻璃應力，減少了於輸送 傳_玻璃本身的機械強度及物性限制，避免了採用直立式垂 直輸讀動時所產生的問題，並採取掃描式瀑布溢流酸液塗佈 型式，從光學玻璃上方以前後及/或左右來回掃描的移動方式， 均勻地釋出侧溶液，肋均勻地_及/或薄化光學破璃。 •由於對光學錢採轉描式料溢錢錄佈，目而可提升姓 刻速率、以及光學玻璃蝕刻均勻性。 以上所述僅為本發明之較佳實施例而已，並非用以限定本發 月之細;凡其t：未麟本發明所揭示之精神下所完成之等效改變 或修飾’均應包含在下述之專利範圍内。 【圖式簡單說明】 第1圖為-示意圖，用以顯示說明利用本發明之光學玻璃姓 刻裝置以進行光學玻璃蝕刻方法的情形； 第2圖為-示意圖’用以顯示說明本發明之光學麵餘刻裝 置的結構組成;以及 _第3圖為-示意Ϊ ’用以顯示說明對光學破璃進行侧及/或 薄化處理的絲’其中’湘了本發明之光學玻璃似彳裝置及方 法。 【主要元件符號說明】 1光學玻璃蝕刻裝置 2 載台 2a傾斜面 3 掃描式瀑布溢流蝕刻噴灌器 4 嵌入式治具 10光學玻璃 20風刀 31瀑布流 32層流 Θ斜角 _The well-known cranes are all self-rotating, and the ribs are all from the ground and/or thin. When the optical glass _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The resulting problem is 'and' because the optical glass is coated with a scanning silk cloth overflow acid solution, thereby improving the _ rate and the uniformity of the wire. The optical side device and method of the invention comprises the following advantages: 1. The use of a slope-driven transmission line method reduces the optical glass stress, reduces the mechanical strength and physical property limitation of the transport-transmission glass itself, and avoids the use of vertical vertical The problem caused by the reading and moving, and adopting the scanning waterfall overflow acid coating type, the movement of the side of the optical glass from above and/or around the left and right scans, the side solution is evenly released, and the ribs are evenly _ and / or thinning optical glass. • Due to the optical recording of optical money, the speed of the surname and the uniformity of optical glass etching can be improved. The above is only the preferred embodiment of the present invention, and is not intended to limit the details of the present invention; any equivalent changes or modifications made by the present invention should be included in the following. Within the scope of the patents described. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view for explaining a case where an optical glass etching method using the optical glass surname apparatus of the present invention is performed; FIG. 2 is a schematic view for illustrating the optical body of the present invention. The structural composition of the surface engraving device; and FIG. 3 is a schematic view of the optical glass-like device for indicating the side and/or thinning treatment of the optical glass. method. [Main component symbol description] 1 optical glass etching device 2 stage 2a inclined surface 3 scanning type waterfall overflow etching sprinkler 4 embedded fixture 10 optical glass 20 air knife 31 waterfall flow 32 laminar flow slant angle _
Cl C2酸液濃度 VI V2流速 17Cl C2 acid concentration VI V2 flow rate 17