1352748 九、發明說明： 【發明所屬之技術領域】 本發明侧於—讎布式層流_裝置，尤指料式層流钱 刻裝置。 【先前技術】 在液晶顯示器輕量化、薄型化及廣視角、高亮度之趨勢下， •液晶製造商紛紛針對不同的零組件提出薄形化手段，特別是佔用 體積較大的玻璃基板，更是廠商們主要採用的薄形化手段。 為了薄化玻璃基板，已有廠商紛紛提&各種方法，這些方法 大致分為Dip(多片直立式浸泡）、In-line h〇rizontal(單片水平 喷灑）、Spray(單片直立式喷灑）。不論哪種方法，主要都以化學 參溶液(例如敗化氫溶液〕對玻璃基板進行等向健刻，利用姓刻時 間等控制手段來逐漸薄化玻璃基板，再配合物理性侧進一步薄 化玻璃基板。採用以上的技術，玻璃基板的厚度已從1995年的. 1.2腿發展到目前的〇1麵。然而，上述手段本身的缺陷，已導致 在薄化過程中產生出其他問題。 採用Dip手段時，將複刻玻璃基板同時浸泡_刻溶液错 槽中，利用餘刻溶液對玻璃基板所產纟的化學反應，並帶走餘刻 後所產生的氟化矽，而逐漸钱刻薄化玻璃基板。然而，為了帶走 5 化學液產生化學反應’但是僅對著水平擺放的玻璃基板上端喷灑 蝕刻溶液’藉著其喷麗的力道來加速反應，並把玻璃基板表面上 的化學反應生成物(例如氟化矽）帶走，以避免降低蝕刻溶液的濃 度而有較佳的回收使用條件、生成物附著在玻璃基板上等等問 題。同時，因為4次蝕刻玻璃基板時，僅針對單一面作盛刻處理， 所以可以處理兩面不同钱刻要求。 然而，In-line horizontal(單片水平噴灑)在帶走玻璃基板 表面反應物時，其喷灑面積及力道不易控制，使得玻璃基板表面 的承受力道不均，容易產生Dimple。因為外圍喷灌下來的化學液， 也會往玻璃内部延伸，玻璃中心的化學液不易流動，使得中心面 積造成反應速度不一，使玻璃均勻性變差。Thr〇ughput慢，且當 薄化完，還是需要再次研磨。 為了解決化學液不易流動的問題，在Spray(單片直立式喷灑） 中，仍利用蝕刻溶液對玻璃基板產生化學反應，但是僅對著垂直 擺放的玻璃基板喷灑蝕刻溶液，使得蝕刻溶液以及生成物自然落 下，而沒有不流動的問題，並藉由其噴灑力道來加速反應，而把 玻璃基板表面上的化學反應生成物（例如氟化矽）帶走，並且噴灑 後的氫氟酸及反應後的氟化石夕可直接過渡回收，而有較佳的回收 使用條件。不像Dip方式會在反應後的生成物與氫氟酸在長時間 反應後，因化學鍵結會更固定，不易過濾分解，而In_line horizontal or Spray則沒有生成物附著在玻璃基板上等等問題。 1352748 同時，因為每次働j玻璃基板時，僅針對單—面作_處理，所 以可以處理兩面不同钱刻要求。 然而，採用Spray(單片直立式喷灑）方法，雖然能夠讓飯刻溶 液和生成物自絲下’但是在帶走玻璃紐表面反應物時，僅在 玻璃基板1右_財_裝置，使抛雜板表_承受力道 不均，容易產生Dimple。當薄化後玻璃*易完全直立固定且若 玻璃沒完全直立魏弧度容易料及侧不均。 【發明内容】 本發明之主要目的在提供—種瀑布式層祕難置，其讓钱 刻溶液轉輕下枝驗_絲，使觸峨著重力均 勻落下’又_麻液在傾斜的光學玻璃有較佳的流動性，能夠 獲得較平均的儀刻表面。1352748 IX. Description of the Invention: [Technical Field of the Invention] The present invention is directed to a laminar laminar flow device, particularly a material laminar flow device. [Prior Art] In the trend of light weight, thinness, wide viewing angle and high brightness of liquid crystal displays, LCD manufacturers have proposed thinning methods for different components, especially glass substrates that occupy a large volume. The thinning means that manufacturers mainly use. In order to thin the glass substrate, various manufacturers have come up with various methods, which are roughly classified into Dip (multiple upright soaking), In-line h〇rizontal (single horizontal spraying), and Spray (single vertical). spray). Either way, the glass substrate is mainly anisotropically etched with a chemical reaction solution (for example, a desulfurized hydrogen solution), and the glass substrate is gradually thinned by a control means such as a time of the last name, and the glass is further thinned by the physical side. Substrate. With the above technology, the thickness of the glass substrate has been developed from the 1.2 foot in 1995 to the current one. However, the defects of the above-mentioned means have led to other problems in the thinning process. At the same time, the glass substrate is immersed in the etched solution, and the chemical reaction of the ruthenium on the glass substrate is carried out by using the residual solution, and the yttrium fluoride generated after the engraving is taken away, and the glass substrate is gradually thinned. However, in order to take away the chemical solution of 5 chemical liquids, 'but only the upper end of the horizontally placed glass substrate is sprayed with an etching solution' to accelerate the reaction by the force of the spray, and generate a chemical reaction on the surface of the glass substrate. The material (for example, barium fluoride) is carried away to avoid the problem of lowering the concentration of the etching solution, better recycling conditions, and adhesion of the product to the glass substrate. When the glass substrate is etched four times, only a single surface is processed, so that it is possible to deal with different requirements on both sides. However, when In-line horizontal is used to carry away the surface reaction of the glass substrate, The spraying area and the force path are not easy to control, so that the surface of the glass substrate is unevenly distributed, and Dimple is easily generated. Because the chemical liquid sprayed from the periphery also extends inside the glass, the chemical liquid in the center of the glass is not easy to flow, so that the central area is caused. The reaction rate is different, the glass uniformity is deteriorated. The Thr〇ughput is slow, and when it is thinned, it needs to be ground again. In order to solve the problem that the chemical liquid is not easy to flow, in Spray (single-piece vertical spray), The etching reaction solution is used to chemically react the glass substrate, but only the etching solution is sprayed on the vertically placed glass substrate, so that the etching solution and the product are naturally dropped without the problem of no flow, and the reaction is accelerated by the spraying force thereof. And taking away the chemical reaction product (such as barium fluoride) on the surface of the glass substrate, and spraying Fluoric acid and the fluorite after the reaction can be directly recycled and recovered, and have better recycling conditions. Unlike the Dip method, the reaction product and the hydrofluoric acid will be more fixed after chemical reaction for a long time. It is not easy to filter and decompose, and In_line horizontal or spray has no problem that the product adheres to the glass substrate. 1352748 At the same time, because each time the glass substrate is used, it can only be processed for single-face, so it can handle two different money. Engraved. However, using the Spray (single-piece upright spray) method, although it can make the solution and the product from the silk under the 'but when taking away the glass surface reaction, only on the glass substrate 1 The device makes the throwing plate table _ endurance uneven, easy to produce Dimple. When thinned, the glass * is easy to stand upright and if the glass is not completely upright, the arc is easy to material and the side is uneven. SUMMARY OF THE INVENTION The main object of the present invention is to provide a kind of waterfall layer secret, which allows the money engraving solution to turn down the light test _ silk, so that the touch of gravity is evenly dropped 'again _ hemp liquid in the inclined optical glass The better fluidity enables a more averaged surface to be obtained.
本發月之-人要目的在提供—種瀑布式層流侧裝置，其藉著 凸㈣揮起光學_，使得光學玻璃與载台的接觸面積極小f並 使得以瀑布流下方錢下_麻液等也住光學玻璃， 而避免在取出時剝離破壞。 △基於上述目的’在本發卿布式層趙職置主要包含有载 口、在载台表面上的凸狀物、以及侧溶液釋放器。在操作時， 吏光予麵呈現傾斜狀態，且由侧溶液釋放器的凹槽溢 出的儿錢，可用瀑布流下方式均勻地流經已擺放在載台上的 135274& 光學玻璃，使光學玻璃被均句地侧薄化。如此，基於傾斜狀陣 的光學玻璃，侧光學玻璃所產生的生成物，將隨著剩餘的蝴' 溶液一起順著光學玻璃的傾斜方向流下。 關於本發明之優點鋪神可域由以下的發畴述及所附圖 式得到進一步的瞭解。 . · 【實施方式】 -請參閱第1圖’第1圖為本發鴨布式層流爛裝置之實施 示意圖。如第1圖所示’本發明瀑布式層流_裝置主要包含载 台10、具_存_缝U的長餘⑽福贿_放器12。 足其中’固定治具18可固定住擺放在載台1Q上的光學玻璃I 餘刻溶液14的濃度可為2〇〜28%，且每分鐘使用量為m. 5L/pc， 以達到10/zm/分鐘的蝕刻速度。 簡單來說，本發哪布式層翻職置主要彻載㈣ =(例如5°〜1(0，使所承_光學相6也呈現傾斜狀態 Γ刻溶轉放器12的___溶液Η，可採爆布般丨 地流經已擺放在载台1〇上的光學玻璃Μ，細 身對玻璃的钱刻能力，使光學玻璃16被均勾地钱刻 ，可藉由纏鱗角度，而改_ 之上的時間長短，而控制蝕刻速率。 此來，本發明瀑布式層流钱刻裝置可基於傾斜狀態的: 9 1352748 于玻璃16使得餘刻光學玻璃16所產生的生成物，將隨著剩餘的 侧溶液-綱著絲_ 16 _斜方向流下，簡免生成物和 蝕刻溶液混合在-起，進而降低餘刻溶液的濃度，而有較佳的回 收使用條件，同時也解決了生成物附著在玻璃基板上等等問題。 •若侧光學玻璃16的钱刻溶液為氫_溶液時，姓刻光學玻璃所 產生的生成物則為氟化石夕。 為了進一步提高蝕刻溶液14流經光學玻璃16時的均勻性， 參利用特殊機構使得載台1〇可左右移位，使得擺放在傾斜面上的光 學玻璃16也隨之左右移位’並使得流經光學玻璃16上祕刻溶 液14更均勻地藉著重力流下。 此外，為了將光學玻璃16固定在載台1〇上，通常會直接.貼 膠膜覆蓋在目雜面板上，但是雜不但操作獅，侧完成後 掀起膠膜時，可能會破壞光學玻璃16的正表面，甚至使光學玻璃 16破損。除此之外，殘留在載台1〇上的蝕刻溶液14也可能蝕刻 參光學朗16的細與正面。因此，為了锻光學賴16的側面 與正面，同時也可避免取出不小心破壞到光學玻璃16，在載台1〇 表面上還可額外設置特殊凸狀物。 請參閱第2A〜2B圖，第2A〜2B圖為本發明瀑布式層流钱刻裝 置之另一實施示意圖。如第2A圖所示，本發明瀑布式層流蝕刻裝 置中的載台10上具有複數個凸狀物2〇，而使得擺放在載台1〇上 的光學玻璃16未接觸到载台10的平板狀表面，如第2B圖所示。 1352748 如此一來’光學玻璃16的邊緣接觸到载台1〇的固定治具18, 而光學玻璃16的背面卻辭為懸空，如同相框般的嵌人式轉， 只要周圍孔隙能夠用膠帶封住’就可完全避免钱刻溶液14流入載 台10的表面上，同畴膜未完全覆蓋在圖形區面板上，避免遭到 餘刻溶液14或機械式剝離所造咸的破壞。 藉由以上較佳具體實施例之魏，鱗望能更加清楚描述本 發明之特徵觸神’而並非以上賴揭露的触频實施例來對 本發明之齡純關。相反地，其目岐希望能涵蓋各種改變 及具相等性的鋪縣發撕欲申請之專概_範_内。 【圖式簡單說明】 第1圖為本發明瀑布式層流蝕刻裝置夂實施示意圖。 第2A〜2B圖為本發明漆布式層流餘刻農置之另一實施示意圖。 【主要元件符號說明】 1〇载台 12蝕刻溶液釋放器 钱刻溶液 16光學玻璃 18固定治具 20凸狀物The purpose of this month is to provide a waterfall-type laminar flow side device that illuminates the optical _ by the convex (four), so that the contact surface of the optical glass and the stage is positively small and allows the waterfall to flow under the money. Liquid, etc. also live in the optical glass, and avoid peeling damage when taken out. △ Based on the above purpose's position in the present invention, the main position includes a carrier, a protrusion on the surface of the stage, and a side solution releaser. During operation, the twilight surface is tilted, and the money overflowed by the groove of the side solution release device can be uniformly flowed through the 135274& optical glass placed on the stage to make the optical glass It is thinned by the average side of the sentence. Thus, the product produced by the side optical glass flows down the oblique direction of the optical glass along with the remaining butterfly's optical glass based on the oblique array of optical glass. Further advantages of the present invention will be apparent from the following description of the advantages of the present invention. · [Embodiment] - Please refer to Figure 1 'Figure 1 is a schematic diagram of the implementation of the duck-type laminar flow device. As shown in Fig. 1, the waterfall type laminar flow apparatus of the present invention mainly includes a stage 10 and a long remaining (10) bribe-disposer 12 having a storage_seam. The concentration of the optical glass I residual solution 14 which can be fixed on the stage 1Q can be 2〇~28%, and the usage amount per minute is m. 5L/pc, to reach 10 Etching speed of /zm/min. In simple terms, the layout of the hair layer is mainly carried (4) = (for example, 5 ° ~ 1 (0, so that the optical phase 6 is also tilted state Γ 溶 转 转 ___ solution Η, you can use the exploding cloth to flow through the optical glass enamel that has been placed on the sill of the stage, and the ability of the body to engrave the glass, so that the optical glass 16 is evenly engraved, And changing the length of time above _, and controlling the etching rate. Thus, the waterfall laminar flow device of the present invention can be based on the tilt state: 9 1352748 in the glass 16 causes the product produced by the optical glass 16 to be, As the remaining side solution - the wire _ 16 _ obliquely flows down, the product and the etching solution are mixed, thereby reducing the concentration of the residual solution, and having better recycling conditions, and also solving There is a problem that the product adheres to the glass substrate, etc. • If the engraved solution of the side optical glass 16 is a hydrogen_solution, the product produced by the surnamed optical glass is fluorite. In order to further increase the flow of the etching solution 14 Through the uniformity of the optical glass 16, the special mechanism is used to make the stage 1〇 can be shifted left and right, so that the optical glass 16 placed on the inclined surface is also shifted left and right 'and the flow of the secret solution 14 flowing through the optical glass 16 is more uniformly flowed by gravity. In addition, in order to The glass 16 is fixed on the stage 1 and is usually directly covered with a plastic film, but the lion is not only operated, but when the side is finished, the film may be damaged, and the front surface of the optical glass 16 may be damaged or even The optical glass 16 is broken. In addition, the etching solution 14 remaining on the stage 1 may also etch the fine and front side of the reference beam 16. Therefore, in order to forge the side and front side of the optical substrate 16, it is also possible to avoid taking out Inadvertently breaks into the optical glass 16, and a special convex can be additionally provided on the surface of the stage 1. Please refer to Figures 2A to 2B, and Figures 2A to 2B show another of the waterfall type laminar flow device of the present invention. A schematic diagram of the implementation. As shown in FIG. 2A, the stage 10 in the waterfall laminar flow etching apparatus of the present invention has a plurality of protrusions 2 〇 so that the optical glass 16 placed on the stage 1 is not in contact with The flat surface of the stage 10, as shown in Figure 2B 1352748 As a result, the edge of the optical glass 16 contacts the fixed fixture 18 of the stage 1 , while the back side of the optical glass 16 is vacant, like a photo frame embedded in the frame, as long as the surrounding aperture can be used The tape is sealed to completely prevent the solution 14 from flowing into the surface of the stage 10, and the same domain film is not completely covered on the panel of the pattern area, so as to avoid damage caused by the residual solution 14 or mechanical peeling. From the above preferred embodiment of the present invention, the scale can more clearly describe the features of the present invention, and not the disclosed embodiment of the frequency of the disclosure to the age of the present invention. Conversely, the goal is to cover Various changes and equality of the application for the application of the county's tearing application _ _ _. [Simplified description of the drawings] Figure 1 is a schematic diagram of the implementation of the waterfall laminar flow etching device of the present invention. 2A to 2B are schematic views showing another embodiment of the varnish type laminar flow residual implant. [Main component symbol description] 1〇 stage 12 etching solution releaser Money engraving solution 16 optical glass 18 fixing fixture 20 convex