JP2007010786A - Method for manufacturing large pellicle - Google Patents

Method for manufacturing large pellicle Download PDF

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JP2007010786A
JP2007010786A JP2005188724A JP2005188724A JP2007010786A JP 2007010786 A JP2007010786 A JP 2007010786A JP 2005188724 A JP2005188724 A JP 2005188724A JP 2005188724 A JP2005188724 A JP 2005188724A JP 2007010786 A JP2007010786 A JP 2007010786A
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pellicle
adhesive layer
liquid
adhesive
pellicle frame
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Kazuhisa Hatayama
和久 畑山
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Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a large pellicle in which nonuniform thickness and surface unevenness of an adhesive layer are improved, and which is in no danger of reduction of sticking power, contamination of a photomask and breakage of an exposure device. <P>SOLUTION: In a large pellicle with a pellicle area of ≥1,500 cm<SP>2</SP>comprising at least a pellicle film, a pellicle frame with the pellicle film stuck to one end face thereof, and an adhesive layer disposed on the other end face of the pellicle frame, when the adhesive layer is formed on the pellicle frame, a pressure-sensitive adhesive of the adhesive layer is stuck to the pellicle frame in a state of a substantially uniform mixture with at least one liquid. The liquid substantially uniformly mixed with the pressure-sensitive adhesive of the adhesive layer is preferably a carbon-containing liquid and preferably has a boiling point under 1 atm of 25-250°C and a surface tension of 5-80 mN/m. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、フォトリソグラフィー技術を用いた半導体回路やＬＣＤ（液晶ディスプレイ）製造工程で使用されるフォトマスクやレティクルに異物が付着することを防止するために用いられるペリクルに関するものであり、特にペリクル面積が１５００ｃｍ2以上の寸法を有する大型ペリクルの製造方法に関するものである。 The present invention relates to a pellicle used for preventing foreign matter from adhering to a photomask or a reticle used in a semiconductor circuit or LCD (liquid crystal display) manufacturing process using photolithography technology, and more particularly to a pellicle area. Relates to a method of manufacturing a large pellicle having a dimension of 1500 cm 2 or more.

従来、フォトリソグラフィー技術を用いた半導体回路やＬＣＤの製造は、フォトマスクが用いられ、ペリクルと呼ばれる部材を取り付けフォトマスクのパターン表面への異物の付着を防止している。
ペリクルは、一般的に金属製又はセラミクス製枠等の一方の面に、光学的に透明な薄膜を設置し、その反対の面に、フォトマスクに貼り付けるための粘着層が設けられている。粘着層を介してペリクルをフォトマスクのパターン面に貼付け、異物のフォトマスクのパターン面への付着を防止している。 Conventionally, in the manufacture of a semiconductor circuit or LCD using a photolithography technique, a photomask is used, and a member called a pellicle is attached to prevent foreign matter from adhering to the pattern surface of the photomask.
The pellicle is generally provided with an optically transparent thin film on one surface such as a metal or ceramic frame, and an adhesive layer for being attached to a photomask on the opposite surface. A pellicle is affixed to the pattern surface of the photomask through an adhesive layer to prevent foreign matter from adhering to the pattern surface of the photomask.

ペリクルを用いない場合、フォトマスクのパターン面に異物が付着すると、その異物が半導体ウエハー等の露光表面上で結像し回路に欠陥を発生させる。フォトマスクの少なくともパターン面にペリクルを貼り付けた場合、異物はフォトマスクのパターン面に付着せず、ペリクルの表面に付着する。ペリクル表面に付着した異物は焦点位置がずれ、半導体ウエハー等の露光表面上で結像することがなく、回路に欠陥は発生しない。
ペリクルはフォトマスクに均一な高さで貼り付けられることが求められており、粘着層もその厚さが均一で表面に凹凸が無いことが求められる。
従ってペリクル枠に粘着層を構成する際には、粘着剤をペリクル枠に均一な厚さで表面の凹凸無く付着させる必要がある。 When the pellicle is not used, if foreign matter adheres to the pattern surface of the photomask, the foreign matter forms an image on an exposure surface such as a semiconductor wafer and causes a defect in the circuit. When the pellicle is attached to at least the pattern surface of the photomask, the foreign matter does not adhere to the pattern surface of the photomask but adheres to the surface of the pellicle. The foreign matter attached to the pellicle surface is out of focus, does not form an image on the exposed surface of a semiconductor wafer or the like, and no defect occurs in the circuit.
The pellicle is required to be attached to the photomask at a uniform height, and the adhesive layer is also required to have a uniform thickness and no irregularities on the surface.
Therefore, when the pressure-sensitive adhesive layer is formed on the pellicle frame, it is necessary to adhere the pressure-sensitive adhesive to the pellicle frame with a uniform thickness without surface irregularities.

粘着層は、一般的に、単独あるいは複数の粘着剤の層３（図１）、またはペリクル枠２に接する粘着性を有する層４、粘着性を持たない層５、フォトマスクに接する粘着性を有する層６から成っている（図２）。
粘着層の厚さの均一性、表面の平滑性は、ペリクルの性能を決める重要な要素の一つである。
従来は、厚さの均一性や表面の平滑性を向上させるために粘着剤の付着量を調整したりしたが、必ずしも十分ではなく、粘着層の厚さの不均一や表面の凹凸により粘着層のしていた。
その結果、フォトマスクに貼り付けたペリクルが時間を経て剥がれ落ち、フォトマスクの汚染や露光装置の破損の原因にもなっていた。 In general, the adhesive layer has a single or a plurality of adhesive layers 3 (FIG. 1), an adhesive layer 4 in contact with the pellicle frame 2, a non-adhesive layer 5, and an adhesive in contact with a photomask. It consists of the layer 6 which has (FIG. 2).
The uniformity of the thickness of the adhesive layer and the smoothness of the surface are important factors that determine the performance of the pellicle.
Conventionally, the adhesion amount of the adhesive was adjusted in order to improve the uniformity of the thickness and the smoothness of the surface, but it was not always sufficient, and the adhesive layer was not sufficient due to the uneven thickness of the adhesive layer or the unevenness of the surface. I was doing.
As a result, the pellicle affixed to the photomask is peeled off over time, causing contamination of the photomask and damage to the exposure apparatus.

本発明は、大型ペリクルの製造において、前述の問題点に鑑み粘着層の厚みの不均一、表面の凹凸を改善することによって、前述の従来の問題の発生を抑止することを課題とするものである。   In view of the above-mentioned problems, an object of the present invention is to suppress the occurrence of the above-mentioned conventional problems by improving the uneven thickness of the adhesive layer and the unevenness of the surface in view of the above-mentioned problems. is there.

本発明に係る大型ペリクルの第１の発明の要旨は、従来の問題点を根本から解決する技術であり、少なくともペリクル膜と、前記ペリクル膜が貼り付けられたペリクル枠と、前記ペリクル枠の他方の端面に設けられた粘着層とを有する、ペリクル面積が１５００ｃｍ2以上の大型ペリクルにおいて、前記粘着層を前記ペリクル枠に構成する際に、前記粘着層の粘着剤を少なくとも１種類以上の液体と実質的に均一な混合物の状態で前記ペリクル枠に付着させることを特徴とする大型ペリクルの製造方法である。 The gist of the first invention of the large pellicle according to the present invention is a technique that fundamentally solves the conventional problems, and includes at least a pellicle film, a pellicle frame to which the pellicle film is attached, and the other of the pellicle frame In a large pellicle having a pellicle area of 1500 cm 2 or more having an adhesive layer provided on the end surface of the adhesive layer, when the adhesive layer is configured in the pellicle frame, the adhesive of the adhesive layer includes at least one type of liquid. A method for producing a large pellicle, wherein the pellicle frame is adhered to the pellicle frame in a substantially uniform mixture.

本発明に係る大型ペリクルの第２の発明の要旨は、前記粘着層の粘着剤と実質的に均一に混合される液体が炭素を含む液体である大型ペリクルの製造方法である。
本発明に係る大型ペリクルの第３の発明の要旨は、前記粘着層の粘着剤と実質的に均一に混合される液体の１気圧における沸点が２５℃以上２５０℃以下である大型ペリクルの製造方法である。
本発明に係る大型ペリクルの第４の発明の要旨は、前記粘着層基材を実質的に均一に分散あるいは可溶する液体の表面張力が５ｍＮ／ｍ以上８０ｍＮ／ｍ以下である大型ペリクルの製造方法である。 The gist of the second invention of the large pellicle according to the present invention is a method for producing a large pellicle, wherein the liquid substantially uniformly mixed with the adhesive of the adhesive layer is a liquid containing carbon.
The gist of the third invention of the large pellicle according to the present invention is a method for producing a large pellicle in which the boiling point at 1 atm of the liquid substantially uniformly mixed with the adhesive of the adhesive layer is 25 ° C. or more and 250 ° C. or less. It is.
The gist of the fourth invention of the large pellicle according to the present invention is to produce a large pellicle in which the surface tension of the liquid that disperses or dissolves the adhesive layer substrate substantially uniformly is 5 mN / m or more and 80 mN / m or less. Is the method.

前述の第１の発明による大型ペリクルにおいては、粘着層の粘着剤が少なくとも１種類以上の液体と実質的に均一な混合物の状態でペリクル枠に付着させることから、混合した液体の持つ流動性、レベリング性により、粘着層の高さの均一性、および表面の平滑度が大きく向上し、粘着層の粘着力が十分増加する。
その結果、ペリクルをフォトマスクに貼り付けた後に粘着層の粘着力が不足するために剥がれ落ちるといったことが無くなる。 In the above-described large pellicle according to the first invention, since the adhesive of the adhesive layer adheres to the pellicle frame in a substantially uniform mixture with at least one liquid, the fluidity of the mixed liquid, Due to the leveling property, the uniformity of the height of the adhesive layer and the smoothness of the surface are greatly improved, and the adhesive strength of the adhesive layer is sufficiently increased.
As a result, after the pellicle is attached to the photomask, the adhesive layer does not have enough adhesive force to peel off.

前述の第１および第２の発明による大型ペリクルにおいては、粘着剤と混合される液体はペリクルをフォトマスクに貼り付けた後で徐々に気体となって放出される。
この気体が、露光光源であるエキシマレーザーによりいわゆるヘイズと呼ばれるフォトマスクの汚染の原因になる可能性があることから、ペリクルは、粘着層から発生する気体を極めて少なくする必要がある。
このために、粘着基材と液体の混合物をペリクル枠に付着させた後に加熱し液体成分を気化し除去する。
該液体の沸点が２５０℃を超える場合、液体を気化させるために２５０℃以上にペリクルを加熱する必要が生じる。 In the large pellicle according to the first and second inventions described above, the liquid mixed with the adhesive is gradually released as a gas after the pellicle is attached to the photomask.
Since this gas may cause contamination of a photomask called a haze by an excimer laser that is an exposure light source, the pellicle needs to extremely reduce the gas generated from the adhesive layer.
For this purpose, the mixture of the adhesive substrate and the liquid is attached to the pellicle frame and then heated to vaporize and remove the liquid component.
When the boiling point of the liquid exceeds 250 ° C., it is necessary to heat the pellicle to 250 ° C. or higher in order to vaporize the liquid.

ペリクル枠は、一般的にアルミニウム合金製であり、この場合、熱によるペリクル枠の酸化、変形が強く起こり、製品としての使用が不可能になる。従って、前記液体の１気圧における沸点は、２５０℃以下であることが望ましい。
また、フォトリソグラフィーによる大型ＬＣＤ製造工程は極めて清浄度が高く、室温が一定のクリーンルームで行われている。その多くは装置精度への影響を考慮し、室温が２５℃前後に保たれている。
前記液体の沸点が２５℃未満の場合、粘着層基材と少なくとも１種類以上の液体との実質的に均一な混合物をペリクル枠に付着させた時点で混合物中の液体が直ちに急激に気化し、粘着層中あるいは粘着層の表面付近に残留すると粘着層表面に凹凸が発生しペリクルがフォトマスクに均一に貼り付かない原因になる。 The pellicle frame is generally made of an aluminum alloy. In this case, the pellicle frame is strongly oxidized and deformed by heat, and cannot be used as a product. Therefore, the boiling point of the liquid at 1 atm is desirably 250 ° C. or less.
In addition, a large LCD manufacturing process by photolithography is performed in a clean room with extremely high cleanliness and constant room temperature. In many cases, the room temperature is kept around 25 ° C. in consideration of the influence on the accuracy of the apparatus.
When the boiling point of the liquid is less than 25 ° C., the liquid in the mixture is immediately and rapidly vaporized when a substantially uniform mixture of the adhesive layer base material and at least one liquid is attached to the pellicle frame, If it remains in the adhesive layer or in the vicinity of the surface of the adhesive layer, the surface of the adhesive layer becomes uneven, causing the pellicle not to be uniformly attached to the photomask.

従って、前記液体の１気圧における沸点は、２５℃以上であることが望ましい。
前述の第４の発明による大型ペリクルにおいては、液体の表面張力が８０ｍＮ／ｍより大きいと、粘着剤と液体の混合物をペリクル枠２に付着させた後の粘着層７の形状は図３のようになり、表面の凹凸が大きく、露光部分に粘着層がはみ出し正常な露光を妨げてしまう。
一方、表面張力が５ｍＮ／ｍより小さい場合、粘着層７の形状は図４のようになり、表面の凹凸は小さくなるが、粘着層に所望の厚みを付与するために付着量を増すと、粘着剤がペリクル枠から垂れ落ちてしまう。
従って、前記液体の表面張力は、５ｍＮ／ｍ以上８０ｍＮ／ｍ以下が望ましい。 Therefore, the boiling point of the liquid at 1 atm is desirably 25 ° C. or higher.
In the above-described large pellicle according to the fourth invention, when the surface tension of the liquid is greater than 80 mN / m, the shape of the adhesive layer 7 after adhering the mixture of the adhesive and the liquid to the pellicle frame 2 is as shown in FIG. Therefore, the unevenness of the surface is large, and the adhesive layer protrudes from the exposed portion, preventing normal exposure.
On the other hand, when the surface tension is less than 5 mN / m, the shape of the pressure-sensitive adhesive layer 7 is as shown in FIG. 4, and the surface unevenness is reduced. The adhesive hangs down from the pellicle frame.
Therefore, the surface tension of the liquid is preferably 5 mN / m or more and 80 mN / m or less.

以下の実施例および比較例には、公知の技術にて黒色アルマイト処理を施したアルミニウム合金枠にフッ素系ポリマーペリクル膜を接着したペリクル枠を用意した。
［実施例１］
シリコーン系粘着剤にｎ−デカンを均一に混合し、これを公知の技術でペリクル枠に付着させ粘着層を形成した。この時の粘着層の高さのばらつきは±０．０２ｍｍであった。 In the following Examples and Comparative Examples, a pellicle frame was prepared in which a fluoropolymer pellicle film was bonded to an aluminum alloy frame that had been black anodized by a known technique.
[Example 1]
N-decane was uniformly mixed with the silicone-based adhesive, and this was adhered to the pellicle frame by a known technique to form an adhesive layer. The variation in the height of the adhesive layer at this time was ± 0.02 mm.

［実施例２］
シリコーン系粘着剤にエチルメチルケトンＣＨ3ＣＯＣ2Ｈ5；沸点＝７９．６℃、を均一に混合し、これを公知の技術でペリクル枠に付着させ粘着層を形成した。その後ペリクル全体を８０℃まで加熱した。この時の粘着層には気泡は発生せず、表面の凹凸も見られなかった。またフォトマスクに貼り付け露光を行ったが、ヘイズの発生は見られなかった。
［実施例３］
シリコーン系粘着剤にヘキサンＣ6Ｈ14；表面張力＝１８．４０ｍＮ／ｍ、を均一に混合し、これを公知の技術でペリクル枠に付着させ粘着層を形成した。粘着層を所望の厚さ１．０ｍｍまで厚くすることができた。 [Example 2]
Ethyl methyl ketone CH 3 COC 2 H 5 ; boiling point = 79.6 ° C. was uniformly mixed with the silicone-based adhesive, and this was adhered to the pellicle frame by a known technique to form an adhesive layer. Thereafter, the entire pellicle was heated to 80 ° C. At this time, no bubbles were generated in the adhesive layer, and surface irregularities were not observed. Moreover, although it stuck on the photomask and performed exposure, generation | occurrence | production of haze was not seen.
[Example 3]
Hexane C 6 H 14 ; surface tension = 18.40 mN / m was uniformly mixed with the silicone-based adhesive, and this was adhered to the pellicle frame by a known technique to form an adhesive layer. The adhesive layer could be thickened to a desired thickness of 1.0 mm.

［比較例１］
シリコーン系粘着剤のみを公知の技術でペリクル枠に付着させ粘着層を形成した。この時の粘着層の高さのばらつきは±０．１５ｍｍであった。
［比較例２］
シリコーン系粘着剤にネオペンタン（ＣＨ3）4Ｃ；沸点＝９．５℃、を均一に混合し、これを公知の技術でペリクル枠に付着させ粘着層を形成した。その後ペリクル全体を８０℃まで加熱した。この時粘着層内部、および表面近傍に気泡が多数発生し、粘着層の凹凸も大きく、製品として使用できなかった。
［比較例３］
シリコーン系粘着剤にビフェニルＣ6Ｈ5Ｃ6Ｈ5；沸点＝２５４．９℃、を均一に混合し、これを公知の技術でペリクル枠に付着させ粘着層を形成した。その後ペリクル全体を２５５℃まで加熱した。この時のペリクル枠は酸化され変色、パーティクルの発生が見られた。さらに全体にゆがみが発生し、製品として使用できなかった。 [Comparative Example 1]
Only the silicone adhesive was attached to the pellicle frame by a known technique to form an adhesive layer. The variation in the height of the adhesive layer at this time was ± 0.15 mm.
[Comparative Example 2]
Neopentane (CH 3 ) 4 C; boiling point = 9.5 ° C. was uniformly mixed with the silicone-based adhesive, and this was adhered to the pellicle frame by a known technique to form an adhesive layer. Thereafter, the entire pellicle was heated to 80 ° C. At this time, many bubbles were generated in the inside of the adhesive layer and in the vicinity of the surface, and the unevenness of the adhesive layer was too large to be used as a product.
[Comparative Example 3]
Biphenyl C 6 H 5 C 6 H 5 ; boiling point = 254.9 ° C. was uniformly mixed with the silicone-based adhesive, and this was adhered to the pellicle frame by a known technique to form an adhesive layer. Thereafter, the entire pellicle was heated to 255 ° C. At this time, the pellicle frame was oxidized and discolored and particles were observed. In addition, the entire product was distorted and could not be used as a product.

以上詳述したとおり、本発明による大型ペリクルは、少なくともペリクル膜と前記ペリクル膜が貼り付けられたペリクル枠と、前記ペリクル枠の他方の端面に設けられた粘着層を有するペリクル面積が１５００ｃｍ2以上の大型ペリクルにおいて、粘着層をペリクル枠に構成する際に、粘着層の粘着剤を少なくとも１種類以上の液体と実質的に均一な混合物の状態で、ペリクル枠に付着させることを特徴としている。
この結果、粘着層の高さの均一性、および表面の平滑度が大きく向上し、粘着層の粘着力が十分増加することで、フォトマスクに貼り付けたペリクルの落下を防止できる。 As described above in detail, the large pellicle according to the present invention has a pellicle area of 1500 cm 2 or more having at least a pellicle film, a pellicle frame to which the pellicle film is attached, and an adhesive layer provided on the other end surface of the pellicle frame. The large pellicle is characterized in that when the adhesive layer is formed into a pellicle frame, the adhesive of the adhesive layer is attached to the pellicle frame in a substantially uniform mixture with at least one liquid.
As a result, the uniformity of the height of the pressure-sensitive adhesive layer and the smoothness of the surface are greatly improved, and the pressure-sensitive adhesive force of the pressure-sensitive adhesive layer is sufficiently increased, so that the pellicle attached to the photomask can be prevented from falling.

また、本発明による大型ペリクルは、粘着剤と実質的に均一に混合される液体が炭素を含む液体であることを特徴とする大型ペリクルの製造方法である。
また、本発明による大型ペリクルは、粘着剤と実質的に均一に混合される液体の１気圧における沸点が２５℃以上２５０℃以下であることを特徴とする大型ペリクルの製造方法である。
この結果、ペリクル枠の変形、酸化を防止することができ、かつ粘着層表面が平滑なペリクルを得ることができ、フォトマスクへの貼り付きが均一になる。
また、本発明による大型ペリクルは、粘着層基材を実質的に均一に分散あるいは可溶する液体の表面張力が５ｍＮ／ｍ以上８０ｍＮ／ｍ以下であることから、正常な露光を妨げることも無く、表面の凹凸が小さく、かつ粘着層に所望の厚みを付与することができる。 The large pellicle according to the present invention is a method for producing a large pellicle, wherein the liquid that is substantially uniformly mixed with the adhesive is a liquid containing carbon.
In addition, the large pellicle according to the present invention is a method for producing a large pellicle, characterized in that a boiling point at 1 atm of a liquid substantially uniformly mixed with an adhesive is 25 ° C. or more and 250 ° C. or less.
As a result, the pellicle frame can be prevented from being deformed and oxidized, and a pellicle having a smooth adhesive layer surface can be obtained, and the sticking to the photomask becomes uniform.
Further, the large pellicle according to the present invention has a surface tension of 5 mN / m or more and 80 mN / m or less of a liquid that disperses or dissolves the adhesive layer base material substantially uniformly, so that normal exposure is not hindered. The surface unevenness is small, and a desired thickness can be imparted to the adhesive layer.

本発明によれば、ペリクル面積が１５００ｃｍ2以上の大型ペリクルにおいて、表面の凹凸が小さく、かつ粘着層に所望の厚みを付与することが簡易にできるから、フォトリソグラフィー技術を用いた半導体回路やＬＣＤ（液晶ディスプレイ）を製造する技術分野に裨益するところ大である。 According to the present invention, in a large pellicle having a pellicle area of 1500 cm 2 or more, the surface unevenness is small and a desired thickness can be easily given to the adhesive layer. Therefore, a semiconductor circuit or LCD using photolithography technology can be used. This is a great advantage in the technical field of manufacturing (liquid crystal displays).

ペリクルの断面の一例を示す説明図である。It is explanatory drawing which shows an example of the cross section of a pellicle. ペリクルの断面の他の例を示す説明図である。It is explanatory drawing which shows the other example of the cross section of a pellicle. 表面張力が８０ｍＮ／ｍより大きい場合にペリクル枠上に構成した粘着層の形状を示す説明図である。It is explanatory drawing which shows the shape of the adhesion layer comprised on the pellicle frame when surface tension is larger than 80 mN / m. 表面張力が５ｍＮ／ｍより小さい場合にペリクル枠上に構成した粘着剤の形状を示す説明図である。It is explanatory drawing which shows the shape of the adhesive comprised on the pellicle frame when surface tension is smaller than 5 mN / m.

符号の説明Explanation of symbols

１：ペリクル膜
２：ペリクル枠
３：粘着剤
４：粘着層の内、ペリクル枠に接する粘着性を有する部分
５：粘着層の内、粘着性を持たない部分
６：粘着層の内、フォトマスクに接する粘着性を有する部分
７：粘着層 1: Pellicle film 2: Pellicle frame 3: Adhesive 4: Part of adhesive layer having adhesiveness in contact with the pellicle frame 5: Part of adhesive layer having no adhesiveness 6: Of adhesive layer, photomask Part 7 having adhesiveness in contact with the adhesive layer: Adhesive layer

Claims (4)

少なくともペリクル膜と、前記ペリクル膜が貼り付けられたペリクル枠と、前記ペリクル枠の他方の端面に設けられた粘着層とを有する、ペリクル面積が１５００ｃｍ2以上の大型ペリクルにおいて、前記粘着層を前記ペリクル枠に構成する際に、前記粘着層の粘着剤を少なくとも１種類以上の液体と実質的に均一な混合物の状態で前記ペリクル枠に付着させることを特徴とする大型ペリクルの製造方法。 In a large-sized pellicle having a pellicle area of 1500 cm 2 or more, comprising at least a pellicle film, a pellicle frame to which the pellicle film is attached, and an adhesive layer provided on the other end surface of the pellicle frame, A method for producing a large pellicle, comprising: adhering the adhesive of the adhesive layer to the pellicle frame in a substantially uniform mixture with at least one liquid when forming the pellicle frame. 前記粘着層の粘着剤と実質的に均一に混合される液体が炭素を含む液体である請求項１に記載の大型ペリクルの製造方法。   The method for producing a large pellicle according to claim 1, wherein the liquid that is substantially uniformly mixed with the adhesive of the adhesive layer is a liquid containing carbon. 前記粘着層の粘着剤と実質的に均一に混合される液体の１気圧における沸点が２５℃以上２５０℃以下である請求項１または請求項２に記載の大型ペリクルの製造方法。   3. The method for producing a large pellicle according to claim 1, wherein the liquid that is substantially uniformly mixed with the pressure-sensitive adhesive in the pressure-sensitive adhesive layer has a boiling point at 1 atm of 25 ° C. or more and 250 ° C. or less. 前記粘着層基材を実質的に均一に分散あるいは可溶する液体の表面張力が５ｍＮ／ｍ以上８０ｍＮ／ｍ以下である請求項１または請求項２に記載の大型ペリクルの製造方法。   The method for producing a large pellicle according to claim 1 or 2, wherein a surface tension of a liquid that disperses or dissolves the adhesive layer substrate substantially uniformly is 5 mN / m or more and 80 mN / m or less.
JP2005188724A 2005-06-28 2005-06-28 Method for manufacturing large pellicle Pending JP2007010786A (en)

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