JP2006330372A - Method for stripping pellicle film - Google Patents

Method for stripping pellicle film Download PDF

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JP2006330372A
JP2006330372A JP2005154009A JP2005154009A JP2006330372A JP 2006330372 A JP2006330372 A JP 2006330372A JP 2005154009 A JP2005154009 A JP 2005154009A JP 2005154009 A JP2005154009 A JP 2005154009A JP 2006330372 A JP2006330372 A JP 2006330372A
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peeling
pellicle film
film
pellicle
peeled
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Kazutoshi Sekihara
一敏 関原
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Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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Priority to KR1020060033990A priority patent/KR20060122696A/en
Priority to TW095115043A priority patent/TWI297914B/en
Publication of JP2006330372A publication Critical patent/JP2006330372A/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for stripping a pellicle film, with which the pellicle film formed on a smooth substrate is stripped within a short time period and without damage in manufacturing a large sized pellicle film of which the length of the long edge is more than 300 mm. <P>SOLUTION: In manufacturing a large sized pellicle of which the length of the long edge of the frame is 300 mm or more, when the pellicle film 12 formed on the smooth substrate is stripped by using a stripping tool 15, the stripping is conducted along two or more directions. The stripping tool to strip the pellicle film optionally has a polygonal shape. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、半導体デバイス、プリント基板あるいは液晶ディスプレイ等を製造する際のゴミよけとして使用される、リソグラフィー用ペリクル、特には液晶ディスプレイ製造に用いられる大型のペリクルに関するものである。   The present invention relates to a pellicle for lithography, particularly a large pellicle used for manufacturing a liquid crystal display, which is used as a dust prevention when manufacturing a semiconductor device, a printed circuit board, a liquid crystal display or the like.

ＬＳＩなどの半導体デバイス或いは液晶ディスプレイなどの製造においては、半導体ウェハー或いは液晶用ガラス原板に光を照射してパターンを作製するが、この時に用いるフォトマスクあるいはレチクル（以下、単にフォトマスクという）にゴミが付着していると、このゴミが光を遮ったり、曲げたりしてしまうために、転写したパターンが損なわれるという問題があった。   In the manufacture of semiconductor devices such as LSIs or liquid crystal displays, patterns are produced by irradiating a semiconductor wafer or liquid crystal glass original plate with light, and dust is collected on a photomask or reticle (hereinafter simply referred to as a photomask) used at this time. If this is adhered, the dust blocks or bends the light, so that the transferred pattern is damaged.

このため、これらの作業は通常クリーンルーム内で行われているが、それでもフォトマスクを常に清浄に保つことが難しい。そこで、フォトマスク表面にゴミよけとして、ペリクルを貼付する方法が採られている。
この場合、異物はフォトマスクの表面上には直接付着せず、ペリクル上に付着するため、リソグラフィー時に焦点をフォトマスクのパターン上に合わせておけば、ペリクル上の異物は転写に無関係となる。 For this reason, these operations are usually performed in a clean room, but it is still difficult to keep the photomask clean. Therefore, a method of sticking a pellicle as a dust guard on the photomask surface is employed.
In this case, the foreign matter does not adhere directly to the surface of the photomask but adheres to the pellicle. Therefore, if the focus is set on the pattern of the photomask during lithography, the foreign matter on the pellicle becomes irrelevant to the transfer.

このペリクルは、通常光を良く透過させるニトロセルロース、酢酸セルロースあるいはフッ素系樹脂などからなる透明なペリクル膜を、アルミニウム、ステンレス、ポリエチレンなどからなるペリクルフレームの上端面にペリクル膜の良溶媒を塗布し、風乾して接着する（特許文献１参照）か、アクリル樹脂やエポキシ樹脂等の接着剤で接着し（特許文献２及び特許文献３参照）、更に、ペリクルフレームの下端には、フォトマスクに装着するためのポリブデン樹脂、ポリ酢酸ビニル樹脂、アクリル樹脂等からなる粘着層、及び粘着層の保護を目的とした離型層（セパレータ）が設けられる。   This pellicle usually has a transparent pellicle film made of nitrocellulose, cellulose acetate, or fluorine resin that transmits light well, and a good solvent for the pellicle film is applied to the upper end surface of a pellicle frame made of aluminum, stainless steel, polyethylene, or the like. Adhere by air-drying (see Patent Document 1) or with an adhesive such as acrylic resin or epoxy resin (see Patent Document 2 and Patent Document 3), and attach to a photomask at the lower end of the pellicle frame A pressure-sensitive adhesive layer made of a polybudene resin, a polyvinyl acetate resin, an acrylic resin, or the like, and a release layer (separator) for the purpose of protecting the pressure-sensitive adhesive layer are provided.

また、ペリクルをフォトマスクに貼り付けた状態において、ペリクル内部に囲まれた空間と外部との気圧差をなくすことを目的として、ペリクルフレームの一部に気圧調整用の小孔を開け、小孔を通じて移動する空気からの異物侵入を防ぐためのフィルターが設置されることもある（特許文献４参照）。
一般的に、ペリクル膜は、表面が平滑なＳｉウエハや石英ガラス基板上にスピンコート法により溶媒で適切な濃度に希釈した膜材料を塗布し、この溶媒を蒸発乾燥させて成膜される。その後、この基板上の膜には基板とほぼ同形の枠（剥離冶具）が接着される。 In addition, when the pellicle is attached to the photomask, a small hole for adjusting the atmospheric pressure is formed in a part of the pellicle frame in order to eliminate the pressure difference between the space enclosed inside the pellicle and the outside. There is a case where a filter is installed for preventing foreign matter from entering through the air moving through the air (see Patent Document 4).
Generally, a pellicle film is formed by applying a film material diluted to an appropriate concentration with a solvent by a spin coating method on a Si wafer or quartz glass substrate having a smooth surface, and evaporating and drying the solvent. Thereafter, a frame (peeling jig) having substantially the same shape as the substrate is bonded to the film on the substrate.

この枠の一端にはハンドルが取り付けられており、モータ等の剥離手段によりこれをゆっくりと基板から持ち上げることで基板上の乾燥膜が剥離し、ペリクル膜が得られる。
長辺が３００ｍｍを超えるような大型ペリクル膜の製造は、基本的には上記のような工程で行われている。このとき、膜の剥離は、かなりの低速で行わないと、膜に伸びなどの損傷が残ったり、成膜基板上に膜の残渣が残ったりしてしまう。そのため、長辺が３００ｍｍを超えるような大型ペリクル膜の剥離が完了するまでには多大な時間を要し、非常に生産性が悪いという問題があった。 A handle is attached to one end of the frame. By slowly lifting the handle from the substrate by a peeling means such as a motor, the dry film on the substrate is peeled off to obtain a pellicle film.
Manufacture of a large pellicle film having a long side exceeding 300 mm is basically performed in the above-described steps. At this time, unless the film is peeled off at a considerably low speed, damage such as elongation remains in the film, or a film residue remains on the film formation substrate. Therefore, it takes a long time to complete the peeling of the large pellicle film having a long side exceeding 300 mm, and there is a problem that the productivity is very poor.

特開昭５８−２１９０２３号公報JP 58-219033 米国特許第４８６１４０２号明細書US Pat. No. 4,861,402 特公昭６３−２７７０７号公報Japanese Patent Publication No. 63-27707 実公昭６３−３９７０３号公報Japanese Utility Model Publication No. 63-39703

本発明は、上記のような問題に鑑みてなされたもので、その目的は、長辺が３００ｍｍを超える大型ペリクル膜の製造において、平滑基板上に成膜されたペリクル膜を短時間で、かつ損傷を与えずに剥離するペリクル膜の剥離方法を得ることである。   The present invention has been made in view of the above problems, and its object is to produce a pellicle film formed on a smooth substrate in a short time in the production of a large pellicle film having a long side exceeding 300 mm. The object is to obtain a peeling method of a pellicle film that peels without being damaged.

即ち、上記課題を解決するための本発明のペリクル膜の剥離方法は、フレームの長辺が３００ｍｍ以上の大型ペリクルにおいて、平滑基板上に成膜したペリクル膜を剥離治具を用いて剥離する際に、２つ以上の方向から剥離する。
前記剥離治具は多角形状であることができる。 That is, the pellicle film peeling method of the present invention for solving the above-described problems is performed when a pellicle film formed on a smooth substrate is peeled off using a peeling jig in a large pellicle having a long side of a frame of 300 mm or more. And peel from two or more directions.
The peeling jig may have a polygonal shape.

本発明によれば、長辺が３００ｍｍを超える大型のペリクル膜の製造において、平滑基板上に成膜されたペリクル膜について、２つ以上の方向から同時に剥離を行うことで剥離速度が大幅に向上し、また、膜を引っ張る方向が分散されて、膜の損傷が生じにくくなる。その結果、大型ペリクル膜製造の生産性を大幅に向上することができる。
このとき使用する、ペリクル膜を剥離するための剥離治具が多角形状であれば、剥離しにくい角部に対して特に大きな効果が得られる。 According to the present invention, in the manufacture of a large pellicle film having a long side exceeding 300 mm, the peeling speed is greatly improved by simultaneously peeling the pellicle film formed on the smooth substrate from two or more directions. In addition, the direction of pulling the film is dispersed, and the film is less likely to be damaged. As a result, the productivity of manufacturing a large pellicle film can be greatly improved.
If the peeling jig for peeling the pellicle film used at this time is a polygonal shape, a particularly great effect is obtained for corners that are difficult to peel off.

以下、本発明の実施の形態を添付図面を用いて説明する。
図１は、本発明のペリクル膜の剥離方法の一実施の形態を示す説明図である。
図２は、本発明のペリクル膜の剥離方法により成膜基板からペリクル膜を剥離している状態を順に示す説明図である。
図３は、従来の手法で成膜基板からペリクル膜を剥離している状態を順に示す説明図である。
図１において、表面を研磨した石英基板１１上に塗工されたぺリクル膜１２上に接着剤層１３を介して枠状の剥離冶具１４が接着されている。剥離冶具１４の角部の２箇所に剥離ハンドル１５が取り付けられており、これをモータとボールねじから構成される駆動手段（図示しない）によって上方へ引き上げる構成となっている。 Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.
FIG. 1 is an explanatory view showing an embodiment of the pellicle film peeling method of the present invention.
FIG. 2 is an explanatory view sequentially showing a state in which the pellicle film is peeled from the film formation substrate by the pellicle film peeling method of the present invention.
FIG. 3 is an explanatory view sequentially showing a state in which the pellicle film is peeled from the film formation substrate by a conventional method.
In FIG. 1, a frame-shaped peeling jig 14 is bonded to a pellicle film 12 coated on a quartz substrate 11 whose surface is polished via an adhesive layer 13. Peeling handles 15 are attached to two locations at the corners of the peeling jig 14 and are configured to be pulled upward by driving means (not shown) including a motor and a ball screw.

図２は、このときの剥離の進行状況を平面的に示したものである。石英基板からのペリクル膜の剥離は、図２（ａ）、（ｂ）、（ｃ）、（ｄ）に示す順に進行し、１６はまだ剥離していない領域、１７は剥離して基板から浮き上がった領域、１８はその境界線を示している。
石英基板からのペリクル膜の剥離は、まず剥離ハンドル１５の取り付けられている両角部より始まり（ａ）、次第に剥離部分を増やしながら進行して、やがて２つの剥離部分は結合し（ｂ）、１本の剥離線となって剥離していく（ｃ）。そして、最後には成膜基板の端部まで剥離が進み（ｄ）、完了する。 FIG. 2 is a plan view showing the progress of peeling at this time. Pellicle film peeling from the quartz substrate proceeds in the order shown in FIGS. 2 (a), (b), (c), and (d), 16 is a region that has not yet been peeled, 17 is peeled and lifted off the substrate. The area 18 indicates the boundary line.
The peeling of the pellicle film from the quartz substrate starts from both corners to which the peeling handle 15 is attached (a) and proceeds while gradually increasing the number of peeling parts, and eventually the two peeling parts are combined (b), 1 It peels as a peeling line of the book (c). Finally, peeling proceeds to the end of the film formation substrate (d) and is completed.

２方向から剥離を行うことで、剥離速度を大幅に向上することができるうえ、膜を引っ張る方向が分散されるため、膜の損傷も生じにくい。また、さらに剥離速度を向上させるため、剥離ハンドルからの距離が伸びて剥離速度が低下する剥離後半において、引き上げ駆動手段の速度を高速に変速させることも有効である。   By peeling from two directions, the peeling speed can be greatly improved and the direction of pulling the film is dispersed, so that the film is hardly damaged. In order to further improve the peeling speed, it is also effective to change the speed of the pulling drive means at a high speed in the latter half of the peeling in which the distance from the peeling handle increases and the peeling speed decreases.

この実施の形態である４角形の剥離治具の場合、３箇所からでも剥離自体は好適に進めることができるが、剥離終了後の剥離冶具の落ち着きが悪く、成膜基板からの剥離終了と同時にずり落ちてしまうことがある。そのため、剥離治具が４角形の場合には２方向が特に好適である。
剥離治具は４角形に限られない。４角形よりも角の多い多角形状である場合、あるいは円形等である場合も、２つ以上の方向から剥離することは有効である。
例えば剥離治具が８角形の場合には、３方向もしくは４方向から剥離することが好適である。もちろん、円形剥離治具の場合にも本発明は利用することができるが、剥離しにくい角部がある角型剥離治具において特に効果が大きい。 In the case of the quadrangular peeling jig according to this embodiment, the peeling itself can be suitably advanced from three locations, but the peeling jig after the peeling is poorly settled, and at the same time as the peeling from the film formation substrate is completed. It may fall off. Therefore, when the peeling jig is a quadrangular shape, the two directions are particularly suitable.
The peeling jig is not limited to a quadrangular shape. Even in the case of a polygonal shape having more corners than a quadrangular shape or a circular shape, it is effective to peel from two or more directions.
For example, when the peeling jig is octagonal, it is preferable to peel from three or four directions. Of course, the present invention can also be used in the case of a circular peeling jig, but the effect is particularly great in a square peeling jig having corners that are difficult to peel off.

以下、本発明の実施例を説明するが、本発明はこれに限定されるものではない。
図１に示す実施の形態を用いた本発明の一実施例を行った。８００×９２０×厚さ８ｍｍの長方形石英基板１１上にフッ素系ポリマー［商品名サイトップ、旭硝子（株）製］をスピンコート法により塗布し、１８０℃に加熱して溶媒を完全に乾燥させ、ペリクル膜１２を得た。乾燥後の膜厚は約４μｍである。そして、基板外形と同形の枠状のアルミニウム合金製剥離冶具１４にシリコーン樹脂の接着剤層１３を設け、ペリクル膜１２上に押し付けて貼り合わせた。その後、上方からイオナイザ（図示しない）にて除電しながら、２箇所に取り付けられた剥離ハンドル１５を定速モータとボールねじからなる駆動装置（図示しない）にて、１ｍｍ／ｍｉｎの速度で上方に引き上げ、ペリクル膜１２を剥離させた。 Examples of the present invention will be described below, but the present invention is not limited thereto.
An example of the present invention using the embodiment shown in FIG. 1 was performed. A fluorine-based polymer [trade name Cytop, manufactured by Asahi Glass Co., Ltd.] was applied onto a rectangular quartz substrate 11 having a size of 800 × 920 × 8 mm by spin coating, heated to 180 ° C. to completely dry the solvent, A pellicle film 12 was obtained. The film thickness after drying is about 4 μm. Then, an adhesive layer 13 made of a silicone resin was provided on a frame-shaped aluminum alloy peeling jig 14 having the same shape as the outer shape of the substrate, and pressed onto the pellicle film 12 to be bonded. Thereafter, while removing electricity from above by an ionizer (not shown), the peeling handles 15 attached at two locations are moved upward at a speed of 1 mm / min by a driving device (not shown) comprising a constant speed motor and a ball screw. The pellicle film 12 was peeled off.

図２に示すように、石英基板からのペリクル膜の剥離は進行した。すなわち、剥離は図２（ａ）、（ｂ）、（ｃ）、（ｄ）に示す順に進行し、１６はまだ剥離していない領域、１７は剥離して基板から浮き上がった領域、１８はその境界線を示している。剥離は、まず剥離ハンドル１５の取り付けられている両角部より始まり（ａ）、次第に剥離部分を増やしながら進行して、やがて２つの剥離部分は結合し（ｂ）、１本の剥離線となって剥離していく（ｃ）。そして、最後には成膜基板の端部まで剥離が進み（ｄ）、完了した。このとき、剥離完了までの所要時間は、およそ３０ｍｉｎであった。   As shown in FIG. 2, peeling of the pellicle film from the quartz substrate proceeded. That is, peeling proceeds in the order shown in FIGS. 2 (a), (b), (c), and (d), 16 is a region that has not yet been peeled, 17 is a region that has been peeled off and lifted from the substrate, and 18 is The boundary line is shown. Peeling starts from both corners to which the peeling handle 15 is attached (a), and gradually proceeds while increasing the number of peeled parts, and eventually the two peeled parts are combined (b) to form one peeled line. Peel off (c). Finally, peeling progressed to the end of the film formation substrate (d), and was completed. At this time, the time required to complete the peeling was about 30 minutes.

その後、剥離したペリクル膜を暗室内に運び、３０万ルクスの集光ランプを照射して外観を観察した。その結果、ペリクル膜にはキズ、伸び、変色などの欠陥は一切見受けられなかった。   Thereafter, the peeled pellicle film was carried into a dark room and irradiated with a 300,000 lux condenser lamp to observe the appearance. As a result, no defects such as scratches, elongation and discoloration were found in the pellicle film.

比較例Comparative example

上記実施例と同様の方法にて石英基板上に成膜および溶媒乾燥を行い、図１に示すように剥離冶具１４を貼り合わせた。その後、剥離ハンドル１５のうち１方だけを用いて、１ｍｍ／ｍｉｎの速度で上方に引き上げ、ペリクル膜を剥離させた。   Film formation and solvent drying were performed on a quartz substrate by the same method as in the above example, and a peeling jig 14 was bonded as shown in FIG. Thereafter, using only one of the peeling handles 15, the pellicle film was peeled by pulling upward at a speed of 1 mm / min.

図３は、このときの剥離の進行状況を平面的に示したものである。剥離は図３（ａ）、（ｂ）、（ｃ）、（ｄ）に示す順に進行し、３３はまだ剥離していない領域、３４は剥離して基板から浮き上がった領域、３５はその境界線を示している。剥離は、まず剥離ハンドル３２の取り付けられている角部より始まり（ａ）、次第に剥離部分を増やしながら進行した（ｂ）が、ちょうど膜が中ほどまで剥離したあたり（ｃ）では、剥離速度の極端な低下が見られた。これは、剥離抵抗の増加により剥離冶具３１が撓み、剥離ハンドルの上昇量を吸収したためである。その後、膜は再び剥離を始め、剥離ハンドル３２の対角にある角部へ向かって剥離した（ｄ）。このとき、剥離終了までに要した時間は約４５ｍｉｎであった。   FIG. 3 is a plan view showing the progress of peeling at this time. Separation proceeds in the order shown in FIGS. 3A, 3B, 3C, and 3D, 33 is a region that has not yet been separated, 34 is a region that has been peeled off and lifted from the substrate, and 35 is a boundary line thereof. Is shown. Peeling first started from the corner where the peeling handle 32 is attached (a), and progressed while gradually increasing the number of peeled parts (b), but just around the middle of the film (c), An extreme decline was observed. This is because the peeling jig 31 is bent due to an increase in the peeling resistance and absorbs the rising amount of the peeling handle. Thereafter, the film began to peel again, and peeled toward the corner at the diagonal of the peeling handle 32 (d). At this time, it took about 45 minutes to complete the peeling.

その後、剥離したペリクル膜を暗室内に運び、３０万ルクスの集光ランプを照射して外観を観察した。その結果、ペリクル膜の中央部、おおよそ図３（ｃ）の３５周辺に、膜が伸びたと思われる無数のスジ状の白濁が観察された。   Thereafter, the peeled pellicle film was carried into a dark room and irradiated with a 300,000 lux condenser lamp to observe the appearance. As a result, innumerable streak-like white turbidity in which the film seems to have extended was observed in the central part of the pellicle film, approximately around 35 in FIG.

さらに、剥離ハンドル３２の引き上げ速度を低下させて何回か同様の実験を行ったところ、このスジ状の白濁が生じなくなる剥離ハンドル３２の引き上げ速度は０．７ｍｍ／ｍｉｎ以下であった。そして、このときの剥離完了までの所要時間は約６５ｍｉｎであった。   Further, when the same experiment was performed several times while decreasing the pulling speed of the peeling handle 32, the pulling speed of the peeling handle 32 at which the streaky white turbidity did not occur was 0.7 mm / min or less. The time required for completion of peeling at this time was about 65 minutes.

長辺が３００ｍｍを超える大型のペリクル膜の製造において、平滑基板上に成膜されたペリクル膜について、２つ以上の方向から同時に剥離を行うことで剥離速度が大幅に向上し、また、膜を引っ張る方向が分散されて、膜の損傷が生じにくくなり、その結果、大型ペリクル膜製造の生産性を大幅に向上することができるので、その産業上の利用価値は極めて高い。   In the manufacture of a large pellicle film having a long side exceeding 300 mm, the peeling speed is greatly improved by simultaneously peeling the pellicle film formed on the smooth substrate from two or more directions. The direction of pulling is dispersed and the film is less likely to be damaged. As a result, the productivity of manufacturing a large pellicle film can be greatly improved, and its industrial utility value is extremely high.

本発明のペリクル膜の剥離方法の一実施の形態を示す説明図である。It is explanatory drawing which shows one Embodiment of the peeling method of the pellicle film | membrane of this invention. 図２（ａ）〜（ｄ）は、本発明のペリクル膜の剥離方法により成膜基板からペリクル膜を剥離している状態を順に示す説明図である。FIGS. 2A to 2D are explanatory views sequentially showing a state in which the pellicle film is peeled from the film formation substrate by the pellicle film peeling method of the present invention. 図３（ａ）〜（ｄ）は、従来の手法で成膜基板からペリクル膜を剥離している状態を順に示す説明図である。FIGS. 3A to 3D are explanatory views sequentially showing a state in which the pellicle film is peeled from the film formation substrate by a conventional method.

符号の説明Explanation of symbols

１１ 石英基板
１２ ペリクル膜
１３ 接着剤層
１４ 剥離冶具
１５ 剥離ハンドル
１６ 基板から剥離していないペリクル膜の領域
１７ 剥離して基板から浮いているペリクル膜の領域
１８ ペリクル膜の剥離／未剥離領域の境界線
３１ 剥離冶具
３２ 従来の剥離ハンドル（１本）
３３ 基板から剥離していないペリクル膜の領域
３４ 剥離して基板から浮いているペリクル膜の領域
３５ ペリクル膜の剥離／未剥離領域の境界線 11 Quartz substrate 12 Pellicle film 13 Adhesive layer 14 Peeling tool 15 Peeling handle 16 Pellicle film area 17 not peeled off the substrate Pellicle film area 18 peeled off and floated from the substrate 18 Pellicle film peeled / unpeeled area Boundary line 31 Peeling jig 32 Conventional peeling handle (1)
33 Pellicle film region not peeled off from substrate 34 Pellicle film region peeled off and floated from substrate 35 Pellicle film peeling / unpeeled region boundary line

Claims (2)

フレームの長辺が３００ｍｍ以上の大型ペリクルの製造において、平滑基板上に成膜したペリクル膜を剥離治具を用いて剥離する際に、２つ以上の方向から剥離することを特徴とするペリクル膜の剥離方法。 In the manufacture of a large pellicle having a long side of 300 mm or more in the frame, the pellicle film is peeled from two or more directions when the pellicle film formed on the smooth substrate is peeled off using a peeling jig. Peeling method. 前記剥離治具が多角形状である請求項１に記載のペリクル膜の剥離方法。 The method for peeling a pellicle film according to claim 1, wherein the peeling jig has a polygonal shape.
JP2005154009A 2005-05-26 2005-05-26 Method for stripping pellicle film Pending JP2006330372A (en)

Priority Applications (3)

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KR1020060033990A KR20060122696A (en) 2005-05-26 2006-04-14 Method for peeling pellicle film
TW095115043A TWI297914B (en) 2005-05-26 2006-04-27 Method of pellicle film peeling

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017122865A (en) * 2016-01-08 2017-07-13 大日本印刷株式会社 Peeling method for dust-proof body and peeling method for dust-proof body

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017122865A (en) * 2016-01-08 2017-07-13 大日本印刷株式会社 Peeling method for dust-proof body and peeling method for dust-proof body

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KR20060122696A (en) 2006-11-30
TW200707561A (en) 2007-02-16
TWI297914B (en) 2008-06-11

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