WO2010079688A1 - Glass laminate and manufacturing method therefor - Google Patents

Glass laminate and manufacturing method therefor Download PDF

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Publication number
WO2010079688A1
WO2010079688A1 PCT/JP2009/071379 JP2009071379W WO2010079688A1 WO 2010079688 A1 WO2010079688 A1 WO 2010079688A1 JP 2009071379 W JP2009071379 W JP 2009071379W WO 2010079688 A1 WO2010079688 A1 WO 2010079688A1
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glass substrate
main
resin layer
thin glass
thin
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PCT/JP2009/071379
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French (fr)
Japanese (ja)
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近藤 聡
智之 清水
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旭硝子株式会社
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Priority to JP2009-003405 priority
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Publication of WO2010079688A1 publication Critical patent/WO2010079688A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B32B17/10005Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
    • B32B17/10009Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B32B17/10005Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
    • B32B17/1055Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer
    • B32B17/10798Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer containing silicone
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form
    • B32B3/02Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by features of form at particular places, e.g. in edge regions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2250/00Layers arrangement
    • B32B2250/40Symmetrical or sandwich layers, e.g. ABA, ABCBA, ABCCBA
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133302Rigid substrates, e.g. inorganic substrates

Abstract

Disclosed is a glass laminate, which comprises a thin sheet glass substrate having a first main surface and a second main surface, a support glass substrate having a first main surface and a second main surface, and an easily releasable resin layer, wherein the thin sheet glass substrate and the support glass substrate are laminated with the resin layer interposed therebetween so that the first main layer of the thin sheet glass substrate and the first main layer of the support glass substrate are tightly adhered with the resin layer affixed thereto, and wherein the thin sheet glass substrate is laminated so that at least part of the circumference of the first main surface of the thin sheet glass substrate protrudes from the circumference of the first main surface of the support glass substrate.

Description

ガラス積層体およびその製造方法Glass laminate and method for producing the same
  本発明は、液晶表示装置、有機EL表示装置等に用いられるガラス基板を含むガラス積層体およびその製造方法に関する。 The present invention relates to a glass laminate including a glass substrate used for a liquid crystal display device, an organic EL display device and the like, and a method for producing the same.
  液晶表示装置(LCD)、有機EL表示装置(OLED)、特に携帯電話やデジタルカメラ等の携帯型表示装置の分野では、表示装置の軽量化、薄型化が重要な課題となっている。
  この課題に対応するために、表示装置に用いるガラス基板の板厚をさらに薄くすることが望まれている。ガラス基板の板厚を薄くする方法としては、一般に、表示装置用部材をガラス基板の表面に形成する前または形成した後に、フッ酸等を用いてガラス基板をエッチング処理し、必要に応じてさらに物理研磨して薄くする方法が行われる。
In the field of liquid crystal display devices (LCD), organic EL display devices (OLED), especially portable display devices such as mobile phones and digital cameras, weight reduction and thinning of display devices are important issues.
In order to cope with this problem, it is desired to further reduce the thickness of the glass substrate used in the display device. As a method for reducing the thickness of the glass substrate, generally, before or after the display device member is formed on the surface of the glass substrate, the glass substrate is etched using hydrofluoric acid or the like, and further if necessary. A method of thinning by physical polishing is performed.
 しかしながら、表示装置用部材をガラス基板の表面に形成する前にエッチング処理等をしてガラス基板の板厚を薄くすると、ガラス基板の強度が低下し、たわみ量も大きくなる。そのため既存の表示装置用部材の製造ラインで処理することが困難になるという問題が生じる。
  また、表示装置用部材をガラス基板の表面に形成した後にエッチング処理等をしてガラス基板を薄くすると、表示装置用部材をガラス基板の表面に形成する過程においてガラス基板の表面に形成された微細な傷が顕在化する問題、すなわちエッチピット(etchpit)の発生という問題が生じる。
However, if the thickness of the glass substrate is reduced by performing an etching process or the like before forming the display device member on the surface of the glass substrate, the strength of the glass substrate is lowered and the amount of deflection is increased. Therefore, there arises a problem that it is difficult to process the existing display device member production line.
In addition, if the glass substrate is thinned by performing an etching process after forming the display device member on the surface of the glass substrate, the fineness formed on the surface of the glass substrate in the process of forming the display device member on the surface of the glass substrate. There arises a problem in that a simple flaw appears, that is, a problem that etch pits occur.
 そこで、このような問題を解決することを目的として、板厚の薄いガラス基板(以下では「薄板ガラス基板」ともいう。)を他の支持ガラス基板と貼り合わせてガラス積層体とし、その状態で表示装置を製造するための所定の処理を実施し、その後、薄板ガラス基板と支持ガラス基板とを分離する方法等が提案されている。 Therefore, for the purpose of solving such problems, a thin glass substrate (hereinafter also referred to as “thin glass substrate”) is bonded to another supporting glass substrate to form a glass laminate, and in that state, A method of performing a predetermined process for manufacturing a display device and then separating the thin glass substrate and the supporting glass substrate has been proposed.
 例えば特許文献1には、薄板ガラス基板と、支持ガラス基板と、を積層させてなる薄板ガラス積層体であって、前記薄板ガラス基板と、前記支持ガラス基板と、が易剥離性および非粘着性を有するシリコーン樹脂層を介して積層されていることを特徴とする薄板ガラス積層体が記載されている。 For example, Patent Document 1 discloses a thin glass laminate obtained by laminating a thin glass substrate and a supporting glass substrate, and the thin glass substrate and the supporting glass substrate are easily peelable and non-adhesive. The thin glass laminated body characterized by being laminated | stacked through the silicone resin layer which has is described.
国際公開第2007/018028号パンフレットInternational Publication No. 2007/018028 Pamphlet
  特許文献1において、薄板ガラス基板と支持ガラス基板の相対的な大小関係については、支持ガラス基板は薄板ガラス基板と同サイズ、もしくはそれよりも大きい事が望ましいと記載されている。つまり、特許文献1では、薄板ガラス基板の第1主面の外周が、支持ガラス基板の第1主面の外周よりも内周側に入ることを示している。この構成で、薄板ガラス基板を支持ガラス基板から剥離する工程に投入させると、次のような不具合が想定される。薄板ガラス基板と樹脂層との境界に、剥離用刃物を挿入しようとすると、前記境界に剥離用刃物が挿入されるのではなく、樹脂層に食い込むように挿入される。このため、剥離用刃物によって樹脂層を部分的に破壊してしまい、破壊された樹脂層の一部が薄板ガラス基板に付着したまま残る不具合を発生する。 In Patent Document 1, it is described that the relative size relationship between the thin glass substrate and the supporting glass substrate is preferably the same size as or larger than the thin glass substrate. In other words, Patent Document 1 shows that the outer periphery of the first main surface of the thin glass substrate enters the inner peripheral side of the outer periphery of the first main surface of the support glass substrate. In this configuration, when the thin glass substrate is introduced into the step of peeling from the supporting glass substrate, the following problems are assumed. When the peeling blade is inserted into the boundary between the thin glass substrate and the resin layer, the peeling blade is not inserted into the boundary but inserted into the resin layer. For this reason, the resin layer is partially destroyed by the peeling blade, and a problem that a part of the destroyed resin layer remains attached to the thin glass substrate occurs.
 図5、図6は従来のガラス積層体の端部を示した拡大断面図である。図5は、薄板ガラス基板52の第2主面52b側からガラス積層体50を俯瞰したときに、支持ガラス基板53の第1主面53aの外周と薄板ガラス基板52の第1主面52aの外周とが、実質的に重なる形態のガラス積層体50の端部付近の拡大断面図である。つまり、薄板ガラス基板52と支持ガラス基板53が同サイズの形態である。また、図6は、薄板ガラス基板62の第2主面62b側からガラス積層体60を俯瞰したときに、支持ガラス基板63の第1主面63aの外周が、薄板ガラス基板62の第1主面62aの外周より外側に突出している形態のガラス積層体60の端部付近の拡大断面図である。つまり、支持ガラス基板63が薄板ガラス基板62より大きい形態である。 FIG. 5 and FIG. 6 are enlarged cross-sectional views showing end portions of a conventional glass laminate. 5 shows the outer periphery of the first main surface 53a of the supporting glass substrate 53 and the first main surface 52a of the thin glass substrate 52 when the glass laminate 50 is viewed from the second main surface 52b side of the thin glass substrate 52. It is an expanded sectional view near the edge part of the glass laminated body 50 of the form which the outer periphery overlaps substantially. That is, the thin glass substrate 52 and the supporting glass substrate 53 have the same size. 6 shows that the outer periphery of the first main surface 63a of the support glass substrate 63 is the first main surface of the thin glass substrate 62 when the glass laminate 60 is viewed from the second main surface 62b side of the thin glass substrate 62. It is an expanded sectional view of the edge part vicinity of the glass laminated body 60 of the form which protrudes outside from the outer periphery of the surface 62a. That is, the supporting glass substrate 63 is larger than the thin glass substrate 62.
 図5、図6のガラス積層体50、60の形態で、薄板ガラス基板52、62を支持ガラス基板53、63から剥離する工程に投入すると、剥離用刃物15の先端が薄板ガラス基板の第1主面52a、62aと樹脂層54、64との境界に挿入されるのではなく、樹脂層54、64に食い込むように挿入される。このため、剥離用刃物15が樹脂層54、64を破壊し、樹脂層の一部が薄板ガラス基板の第1主面52a、62aに残ったまま、支持ガラス基板53、63から剥離される。 When the thin glass substrates 52 and 62 are put into the process of peeling from the supporting glass substrates 53 and 63 in the form of the glass laminates 50 and 60 in FIGS. 5 and 6, the tip of the peeling blade 15 is the first of the thin glass substrates. Instead of being inserted at the boundary between the main surfaces 52a, 62a and the resin layers 54, 64, it is inserted so as to bite into the resin layers 54, 64. For this reason, the peeling blade 15 breaks the resin layers 54 and 64 and is peeled from the supporting glass substrates 53 and 63 while a part of the resin layer remains on the first main surfaces 52a and 62a of the thin glass substrate.
 また、支持ガラス基板の端部に凹陥部を設けて、薄板ガラス基板を剥離し易くすることが考えられるが、支持ガラス基板に凹陥部を設けるための工程が必要となり、ガラス積層体の生産時間が余計に掛かる不具合を発生する。 In addition, it is conceivable to provide a recessed portion at the end of the supporting glass substrate to facilitate peeling of the thin glass substrate. However, a process for providing the recessed portion in the supporting glass substrate is required, and the glass laminate production time Will cause an extra problem.
  本発明者は上記課題を解決するために鋭意検討を重ね、本発明を完成した。
  すなわち、本発明は以下の(1)~(8)に関する。
The present inventor has intensively studied in order to solve the above problems, and has completed the present invention.
That is, the present invention relates to the following (1) to (8).
 (1)第1主面および第2主面を有する薄板ガラス基板、第1主面および第2主面を有する支持ガラス基板、ならびに易剥離性を有する樹脂層を有し、前記薄板ガラス基板の第1主面と前記支持ガラス基板の第1主面に固定された前記樹脂層とが密着するように、前記薄板ガラス基板と前記支持ガラス基板とが前記樹脂層を介して積層されたガラス積層体であって、
 前記薄板ガラス基板が、前記薄板ガラス基板の第1主面の外周の少なくとも一部が前記支持ガラス基板の第1主面の外周から突出するように積層されているガラス積層体。
  (2)前記薄板ガラス基板の第1主面と前記支持ガラス基板の第1主面とが矩形形状をしており、前記薄板ガラス基板の第1主面の縦および/または横のそれぞれの長さが、前記支持ガラス基板の第1主面の縦および/または横のそれぞれの長さよりも長い、(1)に記載のガラス積層体。
  (3)前記薄板ガラス基板の第1主面の縦および/または横のそれぞれの長さが、前記支持ガラス基板の第1主面の縦および/または横のそれぞれの長さよりも、0.2mmから20mm長い、(1)または(2)に記載のガラス積層体。
  (4)前記薄板ガラス基板の第1主面の外周の全てが、前記支持ガラス基板の第1主面の外周よりも外側に突出している、(1)~(3)のいずれかに記載のガラス積層体。
  (5)前記樹脂層を形成する樹脂が、アクリル樹脂、ポリオレフィン樹脂、ポリウレタン樹脂およびシリコーン樹脂から選ばれる少なくとも1つである、(1)~(4)のいずれかに記載のガラス積層体。
  (6)前記樹脂層の厚さが5~50μmである、(1)~(5)のいずれかに記載のガラス積層体。
  (7)前記薄板ガラス基板と前記支持ガラス基板との線膨張係数の差が150×10-7/℃以下である、(1)~(6)のいずれかに記載のガラス積層体。
  (8)前記(1)~(7)のいずれかに記載のガラス積層体の製造方法であって、前記支持ガラス基板の第1主面に易剥離性を有する樹脂層を形成し固定する樹脂層形成工程と、前記薄板ガラス基板の第1主面に、前記支持ガラス基板の第1主面上に固定された前記樹脂層を密着する密着工程とを含む、ガラス積層体の製造方法。
(1) A thin glass substrate having a first main surface and a second main surface, a supporting glass substrate having a first main surface and a second main surface, and an easily peelable resin layer, A glass laminate in which the thin glass substrate and the support glass substrate are laminated via the resin layer so that the first main surface and the resin layer fixed to the first main surface of the support glass substrate are in close contact with each other. Body,
A glass laminate in which the thin glass substrate is laminated such that at least a part of the outer periphery of the first main surface of the thin glass substrate protrudes from the outer periphery of the first main surface of the support glass substrate.
(2) The first main surface of the thin glass substrate and the first main surface of the support glass substrate have a rectangular shape, and the longitudinal and / or horizontal lengths of the first main surface of the thin glass substrate The glass laminate according to (1), wherein the length is longer than each of the vertical and / or horizontal lengths of the first main surface of the support glass substrate.
(3) The vertical and / or horizontal lengths of the first main surface of the thin glass substrate are 0.2 mm longer than the vertical and / or horizontal lengths of the first main surface of the supporting glass substrate. To 20 mm longer, the glass laminate according to (1) or (2).
(4) The entire outer periphery of the first main surface of the thin glass substrate protrudes outward from the outer periphery of the first main surface of the support glass substrate, according to any one of (1) to (3) Glass laminate.
(5) The glass laminate according to any one of (1) to (4), wherein the resin forming the resin layer is at least one selected from an acrylic resin, a polyolefin resin, a polyurethane resin, and a silicone resin.
(6) The glass laminate according to any one of (1) to (5), wherein the resin layer has a thickness of 5 to 50 μm.
(7) The glass laminate according to any one of (1) to (6), wherein a difference in linear expansion coefficient between the thin glass substrate and the supporting glass substrate is 150 × 10 −7 / ° C. or less.
(8) The method for producing a glass laminate according to any one of (1) to (7), wherein a resin layer is formed and fixed on the first main surface of the supporting glass substrate. The manufacturing method of a glass laminated body including a layer formation process and the contact | adherence process of closely_contact | adhering the said resin layer fixed on the 1st main surface of the said supporting glass substrate to the 1st main surface of the said thin glass substrate.
 さらに本発明者は、これら本発明のガラス積層体または製造方法を用いて形成される次の表示装置用パネルおよび表示装置に係る以下の発明を完成させた。
  (9)前記(1)~(7)のいずれかに記載のガラス積層体における前記薄板ガラス基板の第2主面に表示装置用部材を有する、支持体付き表示装置用パネル。
  (10)前記(9)に記載の支持体付き表示装置用パネルを用いて形成される表示装置用パネル。
  (11)前記(10)に記載の表示装置用パネルを有する表示装置。
  (12)前記(8)に記載のガラス積層体の製造方法、および得られたガラス積層体における前記薄板ガラス基板の第2主面に、表示装置用部材を形成する工程を含む、支持体付き表示装置用パネルの製造方法。
  (13)前記(12)に記載の支持体付き表示装置用パネルの製造方法、および得られた支持体付き表示装置用パネルにおける前記薄板ガラス基板と前記支持ガラス基板とを、前記薄板ガラス基板が該支持ガラス基板から突出している箇所を基点にして剥離する剥離工程を含む、表示装置用パネルの製造方法。
  (14)前記(13)に記載の表示装置用パネルの製造方法、および得られた表示装置用パネルを用いて表示装置を得る工程を含む、表示装置の製造方法。
Furthermore, the present inventor has completed the following invention relating to the following display device panel and display device formed using the glass laminate or the manufacturing method of the present invention.
(9) A panel for a display device with a support, comprising a display device member on a second main surface of the thin glass substrate in the glass laminate according to any one of (1) to (7).
(10) A display device panel formed using the support-equipped display device panel according to (9).
(11) A display device having the display device panel according to (10).
(12) The method for producing a glass laminate according to (8), and a step of forming a display device member on the second main surface of the thin glass substrate in the obtained glass laminate. Manufacturing method of panel for display device.
(13) The method for manufacturing a display device panel with a support according to (12) above, and the thin glass substrate and the support glass substrate in the obtained display device panel with a support, The manufacturing method of the panel for display apparatuses including the peeling process which peels from the location which protrudes from this support glass substrate as a starting point.
(14) A method for manufacturing a display device panel according to (13), and a method for manufacturing a display device, including a step of obtaining a display device using the obtained display device panel.
  本発明により得られたガラス積層体は、支持ガラス基板に特別な加工が不必要であって、薄板ガラス基板を支持ガラス基板から剥離する工程において、樹脂層を破壊せずに、密着した薄板ガラス基板と樹脂層とを、容易かつ短時間に剥離ができる。
  さらに、本発明のガラス積層体の製造方法によれば、ガラス基板間へ混入した気泡や塵介等の異物によるガラス欠陥の発生や、エッチピットの発生を抑制できる。
  また、このようなガラス積層体を含む支持体付き表示装置用パネルを提供することができる。また、このような支持体付き表示装置用パネルを用いて形成される表示装置用パネルおよび表示装置を提供することができる。
  さらに、このような支持体付き表示装置用パネル、表示装置用パネルおよび表示装置を製造する方法を提供することができる。
The glass laminate obtained by the present invention does not require special processing on the supporting glass substrate, and in the step of peeling the thin glass substrate from the supporting glass substrate, the thin glass glass adhered without destroying the resin layer The substrate and the resin layer can be peeled easily and in a short time.
Furthermore, according to the manufacturing method of the glass laminated body of this invention, generation | occurrence | production of the glass defect by foreign materials, such as a bubble mixed between glass substrates and dust, and generation | occurrence | production of an etch pit can be suppressed.
Moreover, the panel for display apparatuses with a support containing such a glass laminated body can be provided. In addition, it is possible to provide a display device panel and a display device that are formed using such a support-equipped display device panel.
Furthermore, a display device panel with a support, a display device panel, and a method for manufacturing the display device can be provided.
図1は、本発明のガラス積層体の実施形態を示す概略正面図である。FIG. 1 is a schematic front view showing an embodiment of the glass laminate of the present invention. 図2は、図1のA-A′断面を示す概略断面図である。FIG. 2 is a schematic cross-sectional view showing a cross section AA ′ of FIG. 図3は、本発明のガラス積層体の実施形態の端部を示す概略断面図である。FIG. 3 is a schematic cross-sectional view showing an end of an embodiment of the glass laminate of the present invention. 図4(a)、(b)および(c)は本発明のガラス積層体の他の実施形態を示す概略正面図である4 (a), (b) and (c) are schematic front views showing another embodiment of the glass laminate of the present invention. 図5は、従来のガラス積層体の実施形態の端部を示す概略断面図である。FIG. 5 is a schematic cross-sectional view showing an end of an embodiment of a conventional glass laminate. 図6は、従来のガラス積層体の実施形態の端部を示す概略断面図である。FIG. 6 is a schematic cross-sectional view showing an end portion of an embodiment of a conventional glass laminate.
  本発明のガラス積層体の実施形態について図を用いて説明する。 実 施 An embodiment of the glass laminate of the present invention will be described with reference to the drawings.
 図1は、本発明のガラス積層体(以下、単に「積層体」ともいう)の実施形態を示す概略正面図であり、図2は図1のA-A’断面図(概略断面図)である。 FIG. 1 is a schematic front view showing an embodiment of a glass laminate of the present invention (hereinafter also simply referred to as “laminate”), and FIG. 2 is a cross-sectional view along AA ′ (schematic cross-sectional view) of FIG. is there.
 本実施形態の積層体10は、薄板ガラス基板12、支持ガラス基板13および樹脂層14を有し、両ガラス基板で樹脂層14を挟むように積層されている。
  そして、図1に示すように、正面から見ると、本実施形態の積層体10は、薄板ガラス基板12、樹脂層14および支持ガラス基板13が各々矩形であり、薄板ガラス基板12の第1主面12aの外周の少なくとも一部が、支持ガラス基板13の第1主面13aの外周よりも主面方向の外側に突出するように位置している。
The laminated body 10 of this embodiment has the thin glass substrate 12, the support glass substrate 13, and the resin layer 14, and is laminated | stacked so that the resin layer 14 may be pinched | interposed with both glass substrates.
As shown in FIG. 1, when viewed from the front, the laminate 10 of the present embodiment has a thin glass substrate 12, a resin layer 14, and a supporting glass substrate 13 each having a rectangular shape, and the first main body of the thin glass substrate 12. At least a part of the outer periphery of the surface 12 a is positioned so as to protrude outward in the main surface direction from the outer periphery of the first main surface 13 a of the support glass substrate 13.
 樹脂層14は支持ガラス基板13の第1主面13aに固定されており、薄板ガラス基板12の第1主面12aに密着している。また、樹脂層14は薄板ガラス基板12の第1主面12aに対して易剥離性を具備している。ここで、薄板ガラス基板12が有する2つの主面のうちの支持ガラス基板13の側(樹脂層14の側)の主面が第1主面12aであり、反対側の主面が第2主面12bである。また、支持ガラス基板13が有する2つの主面のうちの薄板ガラス基板12の側(樹脂層14が存在する側)の主面が第1主面13aであり、反対側の主面が第2主面13bである。 The resin layer 14 is fixed to the first main surface 13 a of the supporting glass substrate 13 and is in close contact with the first main surface 12 a of the thin glass substrate 12. Further, the resin layer 14 is easily peelable from the first main surface 12 a of the thin glass substrate 12. Here, of the two main surfaces of the thin glass substrate 12, the main surface on the support glass substrate 13 side (resin layer 14 side) is the first main surface 12a, and the opposite main surface is the second main surface. It is the surface 12b. Of the two main surfaces of the supporting glass substrate 13, the main surface of the thin glass substrate 12 (the side where the resin layer 14 is present) is the first main surface 13a, and the main surface on the opposite side is the second main surface. This is the main surface 13b.
 図3は、薄板ガラス基板12の第1主面12aの外周の一部が、支持ガラス基板13の第1主面13aの外周の一部よりも外側に突出している、本実施形態の積層体10の端部付近の拡大断面図である。この場合、剥離用刃物15の先端は、薄板ガラス基板12の第1主面12aを傷つけないように突き当てた後、薄板ガラス基板12と樹脂層14との境界に向かって第1主面12a上を滑らせることができる。剥離用刃物15を滑らせることで、樹脂層14を破壊せずに、薄板ガラス基板12と樹脂層14との境界に剥離用刃物15の先端が挿入され、薄板ガラス基板12を支持ガラス基板13から剥離することが可能となる。 FIG. 3 shows a laminate according to this embodiment in which a part of the outer periphery of the first main surface 12 a of the thin glass substrate 12 protrudes outward from a part of the outer periphery of the first main surface 13 a of the support glass substrate 13. FIG. In this case, the tip of the peeling blade 15 is abutted against the first main surface 12a of the thin glass substrate 12 so as not to damage the first main surface 12a toward the boundary between the thin glass substrate 12 and the resin layer 14. You can slide on. By sliding the peeling blade 15, the tip of the peeling blade 15 is inserted at the boundary between the thin glass substrate 12 and the resin layer 14 without destroying the resin layer 14, and the thin glass substrate 12 is supported by the supporting glass substrate 13. It becomes possible to peel from.
 次に、本実施形態の積層体が有する薄板ガラス基板、支持ガラス基板、および樹脂層の各々について説明する。 Next, each of the thin glass substrate, the supporting glass substrate, and the resin layer included in the laminate of the present embodiment will be described.
 本発明における薄板ガラス基板について説明する。
  薄板ガラス基板の厚さ、形状、大きさ、物性(熱収縮率、表面形状、耐薬品性等)、組成等は特に制限されず、例えば従来のLCD、OLED等の表示装置用のガラス基板と同様であってよい。
The thin glass substrate in the present invention will be described.
The thickness, shape, size, physical properties (thermal shrinkage, surface shape, chemical resistance, etc.), composition, etc. of the thin glass substrate are not particularly limited. For example, a glass substrate for a display device such as a conventional LCD or OLED It may be the same.
 薄板ガラス基板の厚さは特に制限されないが、0.7mm未満であることが好ましく、0.5mm以下であることがより好ましく、0.4mm以下であることがさらに好ましい。また、0.05mm以上であることが好ましく、0.07mm以上であることがより好ましく、0.1mm以上であることがさらに好ましい。 The thickness of the thin glass substrate is not particularly limited, but is preferably less than 0.7 mm, more preferably 0.5 mm or less, and further preferably 0.4 mm or less. Further, it is preferably 0.05 mm or more, more preferably 0.07 mm or more, and further preferably 0.1 mm or more.
 薄板ガラス基板の形状は制限されないが、矩形であることが好ましい。ここで矩形とは、実質的に略矩形であり、周辺部の隅を切り落とした(コーナーカットした)形状をも含む。 The shape of the thin glass substrate is not limited, but is preferably rectangular. Here, the rectangle is substantially a rectangle and includes a shape in which the corners of the peripheral part are cut off (corner cut).
 薄板ガラス基板の大きさは制限されないが、例えば矩形の場合は100~2000mm×100~2000mmであってよく、500~1000mm×500~1000mmであることが好ましい。 Although the size of the thin glass substrate is not limited, for example, in the case of a rectangle, it may be 100 to 2000 mm × 100 to 2000 mm, and preferably 500 to 1000 mm × 500 to 1000 mm.
 このような好ましい厚さおよび好ましい大きさであっても、本実施形態の積層体は薄板ガラス基板と支持ガラス基板とを容易に剥離することができる。
  薄板ガラス基板の熱収縮率、表面形状、耐薬品性等の特性も特に制限されず、製造する表示装置の種類により異なる。
  ただし、薄板ガラス基板の熱収縮率は小さいことが好ましい。具体的には熱収縮率の指標である線膨張係数が150×10-7/℃以下であるものを用いることが好ましく、100×10-7/℃以下であることがより好ましく、45×10-7/℃以下であることがさらに好ましい。その理由は熱収縮率が大きいと高精細な表示装置を作り難くなるためである。また、薄板ガラス基板の線膨張係数は0/℃以上であることが好ましい。
Even if it is such a preferable thickness and preferable size, the laminated body of this embodiment can peel a thin glass substrate and a support glass substrate easily.
Properties of the thin glass substrate such as heat shrinkage, surface shape, chemical resistance and the like are not particularly limited, and vary depending on the type of display device to be manufactured.
However, it is preferable that the thermal contraction rate of the thin glass substrate is small. Specifically, it is preferable to use a material having a linear expansion coefficient of 150 × 10 −7 / ° C. or less, which is an index of heat shrinkage, more preferably 100 × 10 −7 / ° C. or less, and 45 × 10 10. More preferably, it is −7 / ° C. or lower. The reason is that it is difficult to make a high-definition display device when the thermal contraction rate is large. The linear expansion coefficient of the thin glass substrate is preferably 0 / ° C. or higher.
 なお、本発明において線膨張係数はJIS R3102(1995年)に規定のものを意味する。 In addition, in this invention, a linear expansion coefficient means a thing prescribed | regulated to JISR3102 (1995).
 薄板ガラス基板の組成は、例えば従来知られているアルカリ金属酸化物を含有するガラス、無アルカリガラスと同様であってよい。中でも、熱収縮率が小さいことから無アルカリガラスであることが好ましい。 The composition of the thin glass substrate may be the same as, for example, conventionally known glass containing alkali metal oxide or non-alkali glass. Among these, alkali-free glass is preferable because of its low thermal shrinkage rate.
 次に、本発明における支持ガラス基板について説明する。
  支持ガラス基板は樹脂層を介して薄板ガラス基板を支持し、薄板ガラス基板の強度を補強する。
Next, the supporting glass substrate in the present invention will be described.
The supporting glass substrate supports the thin glass substrate through the resin layer and reinforces the strength of the thin glass substrate.
 支持ガラス基板の厚さ、形状、物性(熱収縮率、表面形状、耐薬品性等)、組成等は特に制限されない。 The thickness, shape, physical properties (heat shrinkage rate, surface shape, chemical resistance, etc.), composition, etc. of the supporting glass substrate are not particularly limited.
 支持ガラス基板の厚さは特に制限されないが、本実施形態の積層体を現行の表示装置用部材の製造工程で処理できる厚さであることが必要である。
  例えば0.1~1.1mmの厚さであることが好ましく、0.3~0.8mmであることがより好ましく、0.4~0.7mmであることがさらに好ましい。
  例えば、現行の製造工程が厚さ0.5mmの基板を処理するように設計されたものであって、薄板ガラス基板の厚さが0.1mmである場合、支持ガラス基板の厚さと樹脂層の厚さとの和を0.4mmとする。また、現行の製造ラインは厚さが0.7mmのガラス基板を処理するように設計されているものが最も一般的であるが、例えば薄板ガラス基板の厚さが0.4mmならば、支持ガラス基板の厚さと樹脂層の厚さとの和を0.3mmとする。
The thickness of the supporting glass substrate is not particularly limited, but it is necessary that the thickness of the laminated body of the present embodiment be a thickness that can be processed in the current manufacturing process of a member for a display device.
For example, the thickness is preferably 0.1 to 1.1 mm, more preferably 0.3 to 0.8 mm, and still more preferably 0.4 to 0.7 mm.
For example, when the current manufacturing process is designed to process a substrate having a thickness of 0.5 mm, and the thickness of the thin glass substrate is 0.1 mm, the thickness of the supporting glass substrate and the resin layer The sum with the thickness is 0.4 mm. The current production line is most commonly designed to process a glass substrate having a thickness of 0.7 mm. For example, if the thickness of a thin glass substrate is 0.4 mm, the supporting glass The sum of the thickness of the substrate and the thickness of the resin layer is 0.3 mm.
 支持ガラス基板の厚さは、前記薄板ガラス基板よりも厚いことが好ましい。 The thickness of the supporting glass substrate is preferably thicker than that of the thin glass substrate.
 支持ガラス基板の形状は制限されないが、矩形であることが好ましい。ただし、ここで矩形とは、実質的に略矩形であり、周辺部の隅を切り落とした(コーナーカットした)形状をも含む。 The shape of the supporting glass substrate is not limited, but is preferably rectangular. However, the rectangle here is substantially a substantially rectangular shape, and includes a shape in which the corners of the peripheral portion are cut off (corner cut).
 本発明における支持ガラス基板の大きさは制限されないが、薄板ガラス基板より小さいことが好ましい。すなわち、支持ガラス基板の第1主面の縦および/または横のそれぞれの長さは、薄板ガラス基板の第1主面の縦および/または横のそれぞれの長さよりも短いことが好ましい。ここで縦とは、図1において、薄板ガラス基板の短辺方向であって矢印Xaの方向であり、横とは、図1において、薄板ガラス基板の長辺方向であって矢印Xbの方向であることを意味する。薄板ガラス基板と支持ガラス基板との縦の長さおよび/または横の長さの差の範囲としては、0.2mm以上20mm以下であることが好ましい。この長さの差が0.2mm以上20mm以下であると、薄板ガラス基板を支持ガラス基板から剥離する工程において、剥離用刃物による樹脂層の破壊を防ぐことができるため好ましい。さらに、薄板ガラス基板の突出部分が撓み難く、折れ難くなるため好ましい。この長さの差が2mm以上15mm以下であることが更に好ましい。 The size of the supporting glass substrate in the present invention is not limited, but is preferably smaller than the thin glass substrate. That is, it is preferable that the vertical and / or horizontal lengths of the first main surface of the supporting glass substrate are shorter than the vertical and / or horizontal lengths of the first main surface of the thin glass substrate. Here, the vertical is the short side direction of the thin glass substrate in FIG. 1 and the direction of the arrow Xa, and the horizontal is the long side direction of the thin glass substrate and the direction of the arrow Xb in FIG. It means that there is. The range of the difference between the vertical length and / or the horizontal length between the thin glass substrate and the supporting glass substrate is preferably 0.2 mm or more and 20 mm or less. It is preferable that the difference in length is 0.2 mm or more and 20 mm or less because in the step of peeling the thin glass substrate from the supporting glass substrate, the resin layer can be prevented from being broken by the cutting blade. Furthermore, the protruding portion of the thin glass substrate is preferable because it is difficult to bend and break. The difference in length is more preferably 2 mm or more and 15 mm or less.
 また、薄板ガラス基板の第1主面の外周の一部が、支持ガラス基板の第1主面の外周よりも外側に突出している箇所数は特に制限されない。例えば図4(a)~(c)は本発明の積層体の他の実施形態の概略正面図である。これらの図では理解を容易にするために、薄板ガラス基板の第1主面と支持ガラス基板の第1主面のみを記している。 In addition, the number of portions where a part of the outer periphery of the first main surface of the thin glass substrate protrudes outside the outer periphery of the first main surface of the supporting glass substrate is not particularly limited. For example, FIGS. 4A to 4C are schematic front views of other embodiments of the laminate of the present invention. In these drawings, for easy understanding, only the first main surface of the thin glass substrate and the first main surface of the supporting glass substrate are shown.
 図4(a)における実施形態では、薄板ガラス基板の第1主面42aの4辺のうち2辺が、支持ガラス基板の第1主面43aの外周よりも外側に突出している。図4(b)における実施形態では、薄板ガラス基板の第1主面42aの4辺のうち3辺が支持ガラス基板の第1主面43aの外周よりも外側に突出している。図4(c)における実施形態では、薄板ガラス基板の第1主面42aの4辺すべてが支持ガラス基板の第1主面43aの外周よりも外側に突出している。これら図4(a)~(c)の実施形態の中で、図4(c)の実施形態が好ましい。その理由は以下のとおりである。薄板ガラス基板を支持ガラス基板から剥離する工程において、剥離用刃物の挿入方向と積層体の薄板ガラス基板突出方向とが対向するように、積層体の薄板ガラス突出方向を確認して前記工程に投入する作業が必要となる。図4(c)の実施形態のように、薄板ガラス基板の第1主面の外周すべてが支持ガラス基板の第1主面の外周よりも外側に突出していれば、積層体の薄板ガラス突出方向を確認する作業が不要となるため好ましい。 4A, two of the four sides of the first main surface 42a of the thin glass substrate protrude outward from the outer periphery of the first main surface 43a of the support glass substrate. In the embodiment in FIG. 4B, three sides out of the four sides of the first main surface 42a of the thin glass substrate protrude outward from the outer periphery of the first main surface 43a of the support glass substrate. In the embodiment in FIG. 4C, all four sides of the first main surface 42a of the thin glass substrate protrude outward from the outer periphery of the first main surface 43a of the support glass substrate. Among these embodiments shown in FIGS. 4A to 4C, the embodiment shown in FIG. 4C is preferable. The reason is as follows. In the process of peeling the thin glass substrate from the support glass substrate, check the thin glass glass protruding direction of the laminated body so that the insertion direction of the peeling blade and the thin glass substrate protruding direction of the laminated body face each other and put into the process Work is required. If all the outer periphery of the 1st main surface of a thin glass substrate protrudes outside rather than the outer periphery of the 1st main surface of a support glass substrate like embodiment of FIG.4 (c), the thin glass protrusion direction of a laminated body This is preferable because the work of confirming the above becomes unnecessary.
 支持ガラス基板の線膨張係数は、薄板ガラス基板の線膨張係数と実質的に同一であってよく、異なってもよい。実質的に同一であると、本実施形態の積層体を熱処理した際に、薄板ガラス基板または支持ガラス基板に反りが発生し難い点で好ましい。
  薄板ガラス基板と支持ガラス基板との線膨張係数の差は150×10-7/℃以下であることが好ましく、100×10-7/℃以下であることがより好ましく、50×10-7/℃以下であることがさらに好ましい。
The linear expansion coefficient of the supporting glass substrate may be substantially the same as or different from the linear expansion coefficient of the thin glass substrate. Substantially the same is preferable in that the thin glass substrate or the supporting glass substrate is less likely to warp when the laminate of this embodiment is heat-treated.
The difference in coefficient of linear expansion between the thin glass substrate and the supporting glass substrate is preferably 150 × 10 −7 / ° C. or less, more preferably 100 × 10 −7 / ° C. or less, and 50 × 10 −7 / ° C. More preferably, it is not higher than ° C.
 支持ガラス基板の組成は、例えばアルカリ金属酸化物を含有するガラス、無アルカリガラスと同様であってよい。中でも、熱収縮率が小さいことから無アルカリガラスであることが好ましい。 The composition of the supporting glass substrate may be the same as, for example, glass containing an alkali metal oxide or non-alkali glass. Among these, alkali-free glass is preferable because of its low thermal shrinkage rate.
 次に、本発明における樹脂層について説明する。
  本実施形態の積層体において樹脂層は、前記支持ガラス基板の第1主面に固定されている。そして、樹脂層は、前記薄板ガラス基板の第1主面と密着しているが、容易に剥離することができる。すなわち樹脂層は、前記薄板ガラス基板に対して易剥離性を有する。
  本実施形態の積層体において、樹脂層と薄板ガラス基板とは粘着剤が有するような粘着力によっては付いておらず、固体分子間におけるファンデルワールス力に起因する力、すなわち、密着力によって付いている。
Next, the resin layer in the present invention will be described.
In the laminate of this embodiment, the resin layer is fixed to the first main surface of the support glass substrate. And although the resin layer is closely_contact | adhered with the 1st main surface of the said thin glass substrate, it can peel easily. That is, the resin layer has easy peelability from the thin glass substrate.
In the laminate of this embodiment, the resin layer and the thin glass substrate are not attached by the adhesive force that the adhesive has, but are attached by the force caused by van der Waals force between solid molecules, that is, the adhesive force. ing.
 樹脂層の厚さは特に制限されない。5~50μmであることが好ましく、5~30μmであることがより好ましく、7~20μmであることがさらに好ましい。樹脂層の厚さがこのような範囲であると、薄板ガラス基板と樹脂層との密着が十分になるからである。また、気泡や異物が介在しても、薄板ガラス基板のゆがみ欠陥の発生を抑制することができるからである。また、樹脂層の厚さが厚すぎると、形成するのに時間および材料を要するため経済的ではない。 The thickness of the resin layer is not particularly limited. It is preferably 5 to 50 μm, more preferably 5 to 30 μm, and even more preferably 7 to 20 μm. This is because when the thickness of the resin layer is in such a range, the thin glass substrate and the resin layer are sufficiently adhered. Moreover, even if bubbles or foreign substances are present, it is possible to suppress the occurrence of distortion defects in the thin glass substrate. On the other hand, if the resin layer is too thick, it takes time and materials to form the resin layer, which is not economical.
 なお、樹脂層は2層以上からなっていてもよい。この場合「樹脂層の厚さ」は全ての樹脂層の合計の厚さを意味するものとする。
  また、樹脂層が2層以上からなる場合は、各々の層を形成する樹脂の種類が異なってもよい。
In addition, the resin layer may consist of two or more layers. In this case, “the thickness of the resin layer” means the total thickness of all the resin layers.
Moreover, when a resin layer consists of two or more layers, the kind of resin which forms each layer may differ.
 樹脂層は表面張力が30mN/m以下であることが好ましく、25mN/m以下であることがより好ましく、22mN/m以下であることがさらに好ましい。このような表面張力であると、より容易に薄板ガラス基板と剥離することができ、同時に薄板ガラス基板との密着も十分になるからである。また、樹脂層は表面張力が15mN/m以上であることが好ましい。 The resin layer preferably has a surface tension of 30 mN / m or less, more preferably 25 mN / m or less, and even more preferably 22 mN / m or less. This is because such surface tension can be more easily peeled off from the thin glass substrate, and at the same time, the close contact with the thin glass substrate becomes sufficient. The resin layer preferably has a surface tension of 15 mN / m or more.
 また、樹脂層のガラス転移点は室温(25℃程度)よりも低い、またはガラス転移点を有さない材料からなることが好ましい。非粘着性の樹脂層となり、より易剥離性を有し、より容易に薄板ガラス基板と剥離することができ、同時に薄板ガラス基板との密着も十分になるからである。 The glass transition point of the resin layer is preferably lower than room temperature (about 25 ° C.) or made of a material having no glass transition point. This is because it becomes a non-adhesive resin layer, is more easily peelable, can be more easily peeled off from the thin glass substrate, and at the same time is sufficiently adhered to the thin glass substrate.
 また、樹脂層は耐熱性を有していることが好ましい。例えば前記薄板ガラス基板の第2主面上に表示装置用部材を形成する場合に、本実施形態の積層体を熱処理に供し得るからである。 The resin layer preferably has heat resistance. For example, when the display device member is formed on the second main surface of the thin glass substrate, the laminate of this embodiment can be subjected to heat treatment.
 また、樹脂層の弾性率が高すぎると薄板ガラス基板との密着性が低くなる傾向にある。また弾性率が低すぎると易剥離性が低くなる。 Also, if the elastic modulus of the resin layer is too high, the adhesion with the thin glass substrate tends to be lowered. Moreover, when an elastic modulus is too low, easy peelability will become low.
 樹脂層を形成する樹脂の種類は特に制限されない。例えばアクリル樹脂、ポリオレフィン樹脂、ポリウレタン樹脂およびシリコーン樹脂が挙げられる。いくつかの種類の樹脂を混合して用いることもできる。中でもシリコーン樹脂が好ましい。シリコーン樹脂は耐熱性に優れ、かつ、薄板ガラス基板に対する易剥離性に優れるためである。また、支持ガラス基板表面のシラノール基との縮合反応によって、支持ガラス基板に固定し易いからである。シリコーン樹脂層は例えば300~400℃程度で1時間程度処理しても、易剥離性がほぼ劣化しない点も好ましい。 The type of resin that forms the resin layer is not particularly limited. For example, acrylic resin, polyolefin resin, polyurethane resin, and silicone resin can be mentioned. Several types of resins can be mixed and used. Of these, silicone resins are preferred. This is because the silicone resin is excellent in heat resistance and easy to peel from a thin glass substrate. Moreover, it is because it is easy to fix to a support glass substrate by the condensation reaction with the silanol group of the support glass substrate surface. It is also preferable that the silicone resin layer is not easily deteriorated even if it is treated at about 300 to 400 ° C. for about 1 hour, for example.
 また、樹脂層はシリコーン樹脂の中でも剥離紙用シリコーンからなることが好ましく、その硬化物であることが好ましい。剥離紙用シリコーンは直鎖状のジメチルポリシロキサンを分子内に含むシリコーンを主剤とするものである。この主剤と架橋剤とを含む組成物を、触媒、光重合開始剤等を用いて前記支持ガラス基板の表面(第1主面)に硬化させて形成した樹脂層は、優れた易剥離性を有するので好ましい。また、柔軟性が高いので、薄板ガラス基板と樹脂層との間へ気泡や塵介等の異物が混入しても、薄板ガラス基板のゆがみ欠陥の発生を抑制することができる。 The resin layer is preferably made of silicone for release paper among silicone resins, and is preferably a cured product thereof. The silicone for release paper is mainly composed of silicone containing linear dimethylpolysiloxane in the molecule. The resin layer formed by curing the composition containing the main agent and the crosslinking agent on the surface (first main surface) of the supporting glass substrate using a catalyst, a photopolymerization initiator, etc. has excellent easy peelability. Since it has, it is preferable. Moreover, since the flexibility is high, even if foreign matters such as bubbles and dust are mixed between the thin glass substrate and the resin layer, the occurrence of distortion defects of the thin glass substrate can be suppressed.
 このような剥離紙用シリコーンは、その硬化機構により縮合反応型シリコーン、付加反応型シリコーン、紫外線硬化型シリコーンおよび電子線硬化型シリコーンに分類されるが、いずれも使用することができる。これらの中でも付加反応型シリコーンが好ましい。硬化反応のし易さ、樹脂層を形成した際に易剥離性の程度が良好で、耐熱性も高いからである。 Such release paper silicones are classified into condensation reaction type silicones, addition reaction type silicones, ultraviolet ray curable silicones, and electron beam curable silicones depending on the curing mechanism, and any of them can be used. Among these, addition reaction type silicone is preferable. This is because the curing reaction is easy, the degree of easy peeling is good when the resin layer is formed, and the heat resistance is also high.
 また、剥離紙用シリコーンは形態的に溶剤型、エマルジョン型および無溶剤型があり、いずれの型も使用可能である。これらの中でも無溶剤型が好ましい。生産性、安全性、環境特性の面が優れるからである。また、樹脂層を形成する際の硬化時、すなわち、加熱硬化、紫外線硬化または電子線硬化の時に発泡を生じる溶剤を含まないため、樹脂層中に気泡が残留しにくいからである。 Moreover, the silicone for release paper is classified into a solvent type, an emulsion type, and a solventless type, and any type can be used. Among these, a solventless type is preferable. This is because productivity, safety, and environmental characteristics are excellent. Further, since a solvent that causes foaming is not included at the time of curing when forming the resin layer, that is, at the time of heat curing, ultraviolet curing, or electron beam curing, bubbles are unlikely to remain in the resin layer.
 また、剥離紙用シリコーンとして、具体的には市販されている商品名または型番としてKNS-320A,KS-847(いずれも信越シリコーン社製)、TPR6700(GE東芝シリコーン社製)、ビニルシリコーン「8500」(荒川化学工業株式会社製)とメチルハイドロジェンポリシロキサン「12031」(荒川化学工業株式会社製)との組み合わせ、ビニルシリコーン「11364」(荒川化学工業株式会社製)とメチルハイドロジェンポリシロキサン「12031」(荒川化学工業株式会社製)との組み合わせ、ビニルシリコーン「11365」(荒川化学工業株式会社製)とメチルハイドロジェンポリシロキサン「12031」(荒川化学工業株式会社製)との組み合わせ等が挙げられる。
  なお、KNS-320A、KS-847およびTPR6700は、あらかじめ主剤と架橋剤とを含有しているシリコーンである。
Further, as the release paper silicone, specifically, commercially available product names or model numbers are KNS-320A, KS-847 (both manufactured by Shin-Etsu Silicone), TPR6700 (GE Toshiba Silicone), vinyl silicone “8500”. (Arakawa Chemical Industries, Ltd.) and methylhydrogenpolysiloxane "12031" (Arakawa Chemical Industries, Ltd.), vinyl silicone "11364" (Arakawa Chemical Industries, Ltd.) and methylhydrogenpolysiloxane " 12031 "(made by Arakawa Chemical Co., Ltd.), vinyl silicone" 11365 "(made by Arakawa Chemical Co., Ltd.) and methylhydrogenpolysiloxane" 12031 "(made by Arakawa Chemical Co., Ltd.), etc. It is done.
KNS-320A, KS-847, and TPR6700 are silicones that contain a main agent and a crosslinking agent in advance.
 また、樹脂層を形成するシリコーン樹脂は、シリコーン樹脂層中の成分が薄板ガラス基板に移行しにくい性質、すなわち低シリコーン移行性を有することが好ましい。 Further, it is preferable that the silicone resin forming the resin layer has a property that the components in the silicone resin layer are difficult to migrate to the thin glass substrate, that is, low silicone migration.
 このような本実施形態の積層体における前記薄板ガラス基板の第2主面に、表示装置用部材を形成することで支持体付き表示装置用パネルを得ることができる。
  表示装置用部材とは、従来のLCD、OLED等の表示装置用のガラス基板がその表面に有する発光層、保護層、カラーフィルタ、液晶、酸化インジウムスズ(ITO)からなる透明電極等、各種回路パターン等を意味する。
A panel for a display device with a support can be obtained by forming a display device member on the second main surface of the thin glass substrate in the laminate of this embodiment.
Display device members include various circuits such as a light emitting layer, a protective layer, a color filter, a liquid crystal, and a transparent electrode made of indium tin oxide (ITO) on a surface of a glass substrate for a display device such as a conventional LCD or OLED. Means a pattern.
 また、このような表示装置用パネルから表示装置を得ることができる。表示装置としてはLCD、OLEDが挙げられる。LCDとしてはTN型、STN型、FE型、TFT型、MIM型が挙げられる。 Also, a display device can be obtained from such a display device panel. Examples of the display device include an LCD and an OLED. Examples of LCD include TN type, STN type, FE type, TFT type, and MIM type.
 次に、本実施形態の積層体の製造方法の一例を説明する。
  本実施形態の積層体の製造方法は特に制限されないが、前記支持ガラス基板の第1主面上に易剥離性を有する樹脂層を形成し固定する樹脂層形成工程と、前記薄板ガラス基板の第1主面に、前記支持ガラス基板の第1主面上に固定された前記樹脂層を密着する密着工程とを含む、ガラス積層体の製造方法であることが好ましい。このような製造方法を、以下では「本実施形態の製造方法」ともいう。
Next, an example of the manufacturing method of the laminated body of this embodiment is demonstrated.
Although the manufacturing method of the laminated body of this embodiment is not particularly limited, a resin layer forming step of forming and fixing an easily peelable resin layer on the first main surface of the support glass substrate, and a process for forming the thin glass substrate. It is preferable that it is a manufacturing method of a glass laminated body including the contact | adherence process of closely_contact | adhering the said resin layer fixed on the 1st main surface of the said support glass substrate to 1 main surface. Hereinafter, such a manufacturing method is also referred to as “the manufacturing method of the present embodiment”.
 本実施形態の製造方法で用いる前記薄板ガラス基板および前記支持ガラス基板自体の製造方法は特に制限されない。例えば従来公知の方法で製造することができる。例えば従来公知のガラス原料を溶解し溶融ガラスとした後、フロート法、フュージョン法、ダウンドロー法、スロットダウン法、リドロー法等によって板状に成形して得ることができる。 The manufacturing method of the thin glass substrate and the supporting glass substrate itself used in the manufacturing method of the present embodiment is not particularly limited. For example, it can be produced by a conventionally known method. For example, it can be obtained by melting a conventionally known glass raw material to form a molten glass and then forming it into a plate shape by a float method, a fusion method, a down draw method, a slot down method, a redraw method or the like.
 本実施形態の製造方法における樹脂層形成工程について説明する。
  前記支持ガラス基板の表面(第1主面)に樹脂層を形成する方法も特に制限されない。例えば、フィルム状の樹脂を支持ガラス基板の表面に接着する方法が挙げられる。具体的には、フィルムの表面と高い接着力を付与するために、支持ガラス基板の表面に表面改質処理(プライミング処理)を行い、支持ガラス基板の第1主面に接着する方法が挙げられる。例えば、シランカップリング剤のような化学的に密着力を向上させる化学的方法(プライマー処理)や、フレーム(火炎)処理のように表面活性基を増加させる物理的方法、サンドブラスト処理のように表面の粗度を増加させることにより引っかかりを増加させる機械的処理方法などが例示される。
The resin layer formation process in the manufacturing method of this embodiment is demonstrated.
The method for forming the resin layer on the surface (first main surface) of the supporting glass substrate is not particularly limited. For example, a method of adhering a film-like resin to the surface of a supporting glass substrate can be mentioned. Specifically, in order to give a high adhesive force to the surface of the film, a method of performing surface modification treatment (priming treatment) on the surface of the supporting glass substrate and adhering to the first main surface of the supporting glass substrate can be mentioned. . For example, chemical methods such as silane coupling agents to improve adhesion (primer treatment), physical methods to increase surface active groups such as flame (flame) treatment, and surfaces such as sandblast treatment Examples of such a mechanical processing method increase the catch by increasing the roughness of the material.
 また、例えば、公知の方法によって樹脂層となる樹脂組成物を、支持ガラス基板の第1主面上にコートする方法が挙げられる。公知の方法としてはスプレーコート法、ダイコート法、スピンコート法、ディップコート法、ロールコート法、バーコート法、スクリーン印刷法、グラビアコート法が挙げられる。このような方法の中から、樹脂組成物に種類に応じて適宜選択することができる。 Further, for example, a method of coating a resin composition that becomes a resin layer on the first main surface of the supporting glass substrate by a known method may be mentioned. Known methods include spray coating, die coating, spin coating, dip coating, roll coating, bar coating, screen printing, and gravure coating. From such a method, it can select suitably according to a kind to a resin composition.
 また、樹脂組成物を支持ガラス基板の第1主面上にコートする場合、その塗工量は1~100g/mであることが好ましく、5~20g/mであることがより好ましい。 When the resin composition is coated on the first main surface of the supporting glass substrate, the coating amount is preferably 1 to 100 g / m 2 , and more preferably 5 to 20 g / m 2 .
 例えば付加反応型シリコーンから樹脂層を形成する場合、直鎖状のジメチルポリシロキサンを分子内に含むシリコーン(主剤)、架橋剤および触媒を含む樹脂組成物を、上記のスプレーコート法等の公知の方法により支持ガラス基板上に塗工し、その後に加熱硬化させる。加熱硬化条件は、触媒の配合量によっても異なるが、例えば、主剤および架橋剤の合計量100質量部に対して、白金系触媒を2質量部配合した場合、大気中で50℃~250℃、好ましくは100℃~200℃で反応させる。また、この場合の反応時間は5~60分間、好ましくは10~30分間とする。低シリコーン移行性を有するシリコーン樹脂層とするためには、シリコーン樹脂層中に未反応のシリコーン成分が残らないように、硬化反応をできるだけ進行させることが好ましい。上記のような反応温度および反応時間であると、シリコーン樹脂層中に未反応のシリコーン成分が残らないようにすることができるので好ましい。上記した反応時間よりも長すぎたり、反応温度が高すぎる場合には、シリコーン樹脂の酸化分解が同時に起こり、低分子量のシリコーン成分が生成して、シリコーン移行性が高くなる可能性がある。シリコーン樹脂層中に未反応のシリコーン成分が残らないように硬化反応をできるだけ進行させることは、加熱処理後の剥離性を良好にするためにも好ましい。 For example, when forming a resin layer from an addition reaction type silicone, a resin composition containing a silicone (main agent) containing a linear dimethylpolysiloxane in the molecule, a crosslinking agent and a catalyst is used for the known spray coating method or the like. It is coated on a supporting glass substrate by the method, and then cured by heating. The heating and curing conditions vary depending on the blending amount of the catalyst. For example, when 2 parts by weight of a platinum-based catalyst is blended with respect to 100 parts by weight of the total amount of the main agent and the cross-linking agent, The reaction is preferably carried out at 100 ° C to 200 ° C. In this case, the reaction time is 5 to 60 minutes, preferably 10 to 30 minutes. In order to obtain a silicone resin layer having low silicone migration, it is preferable to proceed the curing reaction as much as possible so that an unreacted silicone component does not remain in the silicone resin layer. It is preferable that the reaction temperature and the reaction time are as described above because no unreacted silicone component remains in the silicone resin layer. If the reaction time is too long or the reaction temperature is too high, the oxidative decomposition of the silicone resin occurs at the same time, and a low molecular weight silicone component is produced, which may increase the silicone transferability. It is preferable to allow the curing reaction to proceed as much as possible so that an unreacted silicone component does not remain in the silicone resin layer in order to improve the peelability after the heat treatment.
 また、例えば樹脂層を、剥離紙用シリコーンを用いて製造した場合、支持ガラス基板上に塗工した剥離紙用シリコーンを加熱硬化してシリコーン樹脂層を形成した後、密着工程で支持ガラス基板のシリコーン樹脂形成面に薄板ガラス基板を積層させる。剥離紙用シリコーンを加熱硬化させることによって、シリコーン樹脂硬化物が支持ガラス基板と化学的に結合する。また、アンカー効果によってシリコーン樹脂層が支持ガラス基板と結合する。これらの作用によって、シリコーン樹脂層が支持ガラス基板に強固に固定される。 For example, when the resin layer is manufactured using release paper silicone, the release paper silicone coated on the support glass substrate is heat-cured to form a silicone resin layer, and then the support glass substrate is bonded in the adhesion step. A thin glass substrate is laminated on the silicone resin forming surface. By curing the release paper silicone with heat, the cured silicone resin is chemically bonded to the supporting glass substrate. Further, the silicone resin layer is bonded to the supporting glass substrate by the anchor effect. By these actions, the silicone resin layer is firmly fixed to the supporting glass substrate.
 密着工程について説明する。
  密着工程は、前記薄板ガラス基板の第1主面に、前記支持ガラス基板の第1主面上に固定された前記樹脂層を密着する工程である。薄板ガラス基板と樹脂層とは、非常に近接した、相対する固体分子間におけるファンデルワールス力に起因する力、すなわち、密着力によって樹脂層と密着する。この場合、支持ガラス基板と薄板ガラス基板と樹脂層を介して積層させた状態に保持することができる。
The adhesion process will be described.
The adhesion process is a process in which the resin layer fixed on the first main surface of the supporting glass substrate is adhered to the first main surface of the thin glass substrate. The thin glass substrate and the resin layer are brought into close contact with the resin layer by a force caused by van der Waals force between the adjacent solid molecules that are very close to each other, that is, an adhesive force. In this case, the support glass substrate, the thin glass substrate, and the resin layer can be held in a laminated state.
 支持ガラス基板に固定された樹脂層の表面に薄板ガラス基板を積層させる方法は特に制限されない。例えば公知の方法を用いて実施することができる。例えば、常圧環境下で樹脂層の表面に薄板ガラス基板を重ねた後、ロールやプレスを用いて樹脂層と薄板ガラス基板とを圧着させる方法が挙げられる。ロールやプレスで圧着することにより樹脂層と薄板ガラス基板とがより密着するので好ましい。また、ロールまたはプレスによる圧着により、樹脂層と薄板ガラス基板との間に混入している気泡が比較的容易に除去されるので好ましい。真空ラミネート法や真空プレス法により圧着すると、気泡の混入の抑制や良好な密着の確保がより好ましく行われるのでより好ましい。真空下で圧着することにより、微小な気泡が残存した場合でも、加熱により気泡が成長することがなく、薄板ガラス基板のゆがみ欠陥につながりにくいという利点もある。 The method for laminating the thin glass substrate on the surface of the resin layer fixed to the supporting glass substrate is not particularly limited. For example, it can implement using a well-known method. For example, after laminating a thin glass substrate on the surface of the resin layer under a normal pressure environment, a method of pressure bonding the resin layer and the thin glass substrate using a roll or a press can be mentioned. It is preferable because the resin layer and the thin glass substrate are more closely adhered by pressure bonding with a roll or a press. In addition, it is preferable because bubbles mixed between the resin layer and the thin glass substrate are relatively easily removed by pressure bonding with a roll or a press. When pressure bonding is performed by a vacuum laminating method or a vacuum pressing method, it is more preferable because suppression of bubble mixing and securing of good adhesion are more preferably performed. By press-bonding under vacuum, even if minute bubbles remain, there is an advantage that the bubbles do not grow by heating and are less likely to cause distortion defects of the thin glass substrate.
 密着工程では、支持ガラス基板の樹脂層の表面に薄板ガラス基板を積層させる際には、薄板ガラス基板の表面を十分に洗浄し、クリーン度の高い環境で積層することが好ましい。樹脂層と薄板ガラス基板との間に異物が混入しても、樹脂層が変形するので薄板ガラス基板の表面の平坦性に影響を与えることはないが、クリーン度が高いほどその平坦性は良好となるので好ましい。 In the adhesion step, when the thin glass substrate is laminated on the surface of the resin layer of the supporting glass substrate, it is preferable that the surface of the thin glass substrate is sufficiently washed and laminated in a clean environment. Even if a foreign substance enters between the resin layer and the thin glass substrate, the resin layer is deformed, so the flatness of the surface of the thin glass substrate is not affected. However, the higher the cleanness, the better the flatness. Therefore, it is preferable.
 このような本実施形態の製造方法によって本実施形態のガラス積層体を製造することができる。 The glass laminate of this embodiment can be produced by the production method of this embodiment.
 本実施形態のガラス積層体の製造方法に、さらに、得られた本実施形態のガラス積層体における前記薄板ガラス基板の第2主面に、表示装置用部材を形成する工程を含む製造方法によって、支持体付き表示装置用パネルを製造することができる。
  ここで表示装置用部材は特に制限されない。例えばLCDが有するアレイやカラーフィルタが挙げられる。また、例えばOLEDが有する透明電極、ホール注入層、ホール輸送層、発光層、電子輸送層が挙げられる。
According to the manufacturing method of the glass laminate of the present embodiment, the manufacturing method further includes a step of forming a member for a display device on the second main surface of the thin glass substrate in the obtained glass laminate of the present embodiment. A panel for a display device with a support can be produced.
Here, the display device member is not particularly limited. For example, an array or a color filter included in the LCD can be mentioned. Further, for example, a transparent electrode, a hole injection layer, a hole transport layer, a light emitting layer, and an electron transport layer included in the OLED can be given.
 このような表示装置部材を形成する方法も特に制限されず、従来公知の方法と同様であってよい。
  例えば、表示装置としてTFT-LCDを製造する場合、従来公知のガラス基板上にアレイを形成する工程、カラーフィルタを形成する工程、アレイが形成されたガラス基板とカラーフィルタが形成されたガラス基板とをシール材等を介して貼り合わせる工程(アレイ・カラーフィルタ貼り合わせ工程)等の各種工程と同様であってよい。より具体的には、これらの工程で実施される処理として、例えば純水洗浄、乾燥、成膜、レジスト液塗布、露光、現像、エッチングおよびレジスト除去が挙げられる。さらに、アレイ・カラーフィルタ貼り合わせ工程を実施した後に行われる工程として、液晶注入工程および液晶注入口封止工程があり、これらの工程で実施される処理が挙げられる。
  また、OLEDを製造する場合を例にとると、薄板ガラス基板の第2主面上に有機EL構造体を形成するための工程として、透明電極を形成する工程、ホール注入層・ホール輸送層・発光層・電子輸送層等を蒸着する工程、封止工程等の各種工程を含み、これらの工程で実施される処理として、具体的には例えば、成膜処理、蒸着処理、封止板の接着処理等が挙げられる。
A method for forming such a display device member is not particularly limited, and may be the same as a conventionally known method.
For example, when manufacturing a TFT-LCD as a display device, a step of forming an array on a conventionally known glass substrate, a step of forming a color filter, a glass substrate on which an array is formed, and a glass substrate on which a color filter is formed May be the same as various steps such as a step of bonding together through a sealing material or the like (array / color filter bonding step). More specifically, examples of the process performed in these steps include pure water cleaning, drying, film formation, resist solution application, exposure, development, etching, and resist removal. Furthermore, as a process performed after implementing an array * color filter bonding process, there exist a liquid crystal injection process and a liquid crystal injection port sealing process, and the process implemented by these processes is mentioned.
Taking the case of manufacturing an OLED as an example, as a process for forming an organic EL structure on the second main surface of a thin glass substrate, a process of forming a transparent electrode, a hole injection layer, a hole transport layer, Various processes such as a process for depositing a light emitting layer / electron transport layer and the like, a sealing process, and the like are performed. Specifically, for example, a film forming process, a vapor deposition process, and an adhesion of a sealing plate are performed. Processing and the like.
 このようにして支持体付き表示装置用パネルを製造することができる。 In this way, a display panel with a support can be manufactured.
 また、このような支持体付き表示装置用パネルを得た後、さらに、得られた支持体付き表示装置用パネルにおける前記薄板ガラス基板と前記支持ガラス基板とを、剥離すること(剥離工程)によって、表示装置用パネルを得ることができる。 Moreover, after obtaining such a panel for a display device with a support, the thin glass substrate and the support glass substrate in the obtained panel for a display device with a support are further peeled (peeling step). A panel for a display device can be obtained.
 表示装置用パネルは、例えば、上記のような本実施形態の製造方法によって得られた支持体付き表示装置用パネルにおいて、前記薄板ガラス基板と前記支持ガラス基板とを剥離することにより製造することができる。剥離する方法は特に制限されない。具体的には、例えば、支持ガラス基板の第1主面の外周よりも外側に突出している、薄板ガラス基板の第1主面上に剥離用刃物を当てる。次に薄板ガラス基板と樹脂層との境界に向けて、剥離用刃物を薄板ガラス基板の第1主面上を滑らせる。そして、前記境界に剥離用刃物を差込み、剥離のきっかけを与えた上で、前記境界に水と圧縮空気との混合流体を吹き付けて、薄板ガラス基板を剥離することができる。好ましくは、前記支持体付き表示装置用パネルの支持ガラス基板が上側、パネル側が下側となるように定盤上に設置する。その後、パネル側基板を定盤上に真空吸着する(両面に支持ガラス基板が積層されている場合は順次行う)。この状態で、剥離用刃物を薄板ガラス基板の第1主面に突き当て、薄板ガラス基板の第1主面上を、薄板ガラス基板と樹脂層との境界に向かって滑らせ、前記境界に剥離用刃物を挿入させる。その後、薄板ガラス基板と樹脂層との境界に、水と圧縮空気の混合流体を噴きつけ、支持ガラス基板の端部を垂直上方へ引っ張り上げる。そうすると樹脂層と薄板ガラス基板との境界へ空気層が形成され、その空気層が前記境界の全面に広がり、支持ガラス基板を容易に剥離することができる(表示装置の前面側および背面側の薄板ガラス基板の両方に支持ガラス基板が積層されている場合は本操作を片面ずつ繰り返す)。 The display device panel can be manufactured, for example, by peeling the thin glass substrate and the support glass substrate in the support-equipped display device panel obtained by the manufacturing method of the present embodiment as described above. it can. The method for peeling is not particularly limited. Specifically, for example, the peeling blade is applied to the first main surface of the thin glass substrate that protrudes outside the outer periphery of the first main surface of the support glass substrate. Next, the cutting blade is slid on the first main surface of the thin glass substrate toward the boundary between the thin glass substrate and the resin layer. Then, a peeling blade can be inserted into the boundary to give a trigger for peeling, and then a mixed fluid of water and compressed air is sprayed onto the boundary to peel the thin glass substrate. Preferably, it is installed on a surface plate so that the supporting glass substrate of the display device-equipped panel is on the upper side and the panel side is on the lower side. Thereafter, the panel-side substrate is vacuum-sucked on the surface plate (if the supporting glass substrates are laminated on both surfaces, the steps are sequentially performed). In this state, the peeling blade is abutted against the first main surface of the thin glass substrate, and the first main surface of the thin glass substrate is slid toward the boundary between the thin glass substrate and the resin layer, and is peeled to the boundary. Insert the tool. Thereafter, a mixed fluid of water and compressed air is sprayed on the boundary between the thin glass substrate and the resin layer, and the end portion of the supporting glass substrate is pulled vertically upward. Then, an air layer is formed at the boundary between the resin layer and the thin glass substrate, the air layer spreads over the entire boundary, and the supporting glass substrate can be easily peeled off (the thin plate on the front side and the back side of the display device). If a supporting glass substrate is laminated on both of the glass substrates, repeat this operation one side at a time).
 さらに、得られた表示装置用パネルを用いて表示装置を得る工程を含む製造方法によって表示装置を製造することができる。
  ここで表示装置を得る工程における操作は特に制限されず、例えば従来公知の方法で表示装置を製造することができる。
Furthermore, a display device can be manufactured by a manufacturing method including a step of obtaining a display device using the obtained display device panel.
Here, the operation in the step of obtaining the display device is not particularly limited, and for example, the display device can be produced by a conventionally known method.
  (実施例1)
  初めに縦715mm、横595mm、板厚0.4mm、線膨張係数38×10-7/℃の支持ガラス基板(旭硝子株式会社製、AN100)を用意し、純水洗浄、UV洗浄して表面を清浄化した。
Example 1
First, a supporting glass substrate (Asahi Glass Co., Ltd., AN100) having a length of 715 mm, a width of 595 mm, a plate thickness of 0.4 mm, and a linear expansion coefficient of 38 × 10 −7 / ° C. is prepared. Cleaned.
 次に、無溶剤付加反応型剥離紙用シリコーン100質量部と、白金系触媒2質量部との混合物を、支持ガラス基板の第1主面上に縦714mm、横594mmの大きさで、スクリーン印刷機にて塗工した(塗工量30g/m)。そして、180℃にて30分間大気中で加熱硬化して厚さ20μmのシリコーン樹脂層を得た。 Next, a mixture of 100 parts by mass of solvent-free addition reaction type release paper silicone and 2 parts by mass of platinum-based catalyst is screen-printed on the first main surface of the supporting glass substrate in a size of 714 mm in length and 594 mm in width. The coating was carried out with a machine (coating amount 30 g / m 2 ). And it heat-hardened in air | atmosphere for 30 minutes at 180 degreeC, and obtained the 20-micrometer-thick silicone resin layer.
 次に、縦720mm、横600mm、板厚0.3mm、線膨張係数38×10-7/℃の薄板ガラス基板(旭硝子株式会社製、AN100)の第1主面(後にシリコーン樹脂層と接触させる側の面)を純水洗浄、UV洗浄して清浄化した。そして、前記支持ガラス基板の第1主面上のシリコーン樹脂層の表面と薄板ガラス基板の第1主面とを、室温下、真空プレスにて両基板の重心が重なるように貼り合わせ、ガラス積層体A(本発明の積層体A)を得た。 Next, the first main surface (later contacted with a silicone resin layer) of a thin glass substrate (Asahi Glass Co., Ltd., AN100) having a length of 720 mm, a width of 600 mm, a plate thickness of 0.3 mm, and a linear expansion coefficient of 38 × 10 −7 / ° C. The side surface) was cleaned with pure water and UV. Then, the surface of the silicone resin layer on the first main surface of the supporting glass substrate and the first main surface of the thin glass substrate are bonded together at room temperature by a vacuum press so that the centers of gravity of both the substrates overlap, Body A (laminated body A of the present invention) was obtained.
 このような実施例1に係るガラス積層体Aにおいて、薄板ガラス基板および支持ガラス基板は、シリコーン樹脂層と気泡を発生することなく密着しており、凸状欠点もなく平滑性も良好であった。 In such a glass laminate A according to Example 1, the thin glass substrate and the supporting glass substrate were in close contact with the silicone resin layer without generating bubbles, and had no convex defects and good smoothness. .
 (実施例2)
  実施例2は実施例1と同様であるが、より板厚が薄い薄板ガラス基板を用いた。
  初めに縦718mm、横598mm、板厚0.6mm、線膨張係数38×10-7/℃の支持ガラス基板(旭硝子株式会社製、AN100)を純水洗浄、UV洗浄して表面を清浄化した。
(Example 2)
Example 2 was the same as Example 1, but a thin glass substrate with a thinner plate thickness was used.
First, a supporting glass substrate (Asahi Glass Co., Ltd., AN100) having a length of 718 mm, a width of 598 mm, a thickness of 0.6 mm, and a linear expansion coefficient of 38 × 10 −7 / ° C. was cleaned with pure water and UV to clean the surface. .
 次に樹脂層を形成するための樹脂として、両末端にビニル基を有する直鎖状ポリオルガノシロキサンと、分子内にハイドロシリル基を有するメチルハイドロジェンポリシロキサンとを用いた。そして、これを白金系触媒と混合して混合物を調製し、支持ガラス基板の第1主面上に縦715mm、横595mmの大きさでダイコート装置にて塗工し(塗工量20g/m)、180℃にて30分間大気中で加熱硬化して厚さ20μmのシリコーン樹脂層を形成した。ここで、ハイドロシリル基とビニル基のモル比は1/1となるように、直鎖状ポリオルガノシロキサンとメチルハイドロジェンポリシロキサンとの混合比を調整した。白金系触媒は、直鎖状ポリオルガノシロキサンとメチルハイドロジェンポリシロキサンとの合計100質量部に対して5質量部添加した。
  次に、薄板ガラス基板として、縦720mm、横600mm、厚さ0.1mm、線膨張係数38×10-7/℃のガラス基板(旭硝子株式会社製AN100)を用いて、支持ガラス基板の第1主面上のシリコーン樹脂層の表面と薄板ガラス基板とを、室温下、真空プレスにて両基板の重心が重なるように貼り合わせガラス積層体B(本発明の積層体B)を得た。
Next, as the resin for forming the resin layer, linear polyorganosiloxane having vinyl groups at both ends and methyl hydrogen polysiloxane having hydrosilyl groups in the molecule were used. And this is mixed with a platinum-type catalyst, a mixture is prepared, and it coats with a die coat apparatus with a size of 715 mm in length and 595 mm in width on the first main surface of the supporting glass substrate (coating amount 20 g / m 2). ), And cured by heating in the air at 180 ° C. for 30 minutes to form a silicone resin layer having a thickness of 20 μm. Here, the mixing ratio of the linear polyorganosiloxane and the methylhydrogen polysiloxane was adjusted so that the molar ratio of hydrosilyl group to vinyl group was 1/1. The platinum-based catalyst was added in an amount of 5 parts by mass with respect to a total of 100 parts by mass of the linear polyorganosiloxane and methyl hydrogen polysiloxane.
Next, as a thin glass substrate, a glass substrate (AN100 manufactured by Asahi Glass Co., Ltd.) having a length of 720 mm, a width of 600 mm, a thickness of 0.1 mm, and a linear expansion coefficient of 38 × 10 −7 / ° C. is used. The surface of the silicone resin layer on the main surface and the thin glass substrate were bonded to each other so that the centers of gravity of the two substrates overlap each other at room temperature by vacuum pressing to obtain a laminated glass laminate B (laminate B of the present invention).
 このような実施例2に係るガラス積層体Bにおいて、薄板ガラス基板および支持ガラス基板は、シリコーン樹脂層と気泡を発生することなく密着しており、凸状欠点もなく平滑性も良好であった。 In such a glass laminate B according to Example 2, the thin glass substrate and the supporting glass substrate were in close contact with the silicone resin layer without generating bubbles, and had no convex defects and good smoothness. .
 (実施例3)
  本例では、実施例2で得たガラス積層体Bを用いてLCDを製造する。
  2枚のガラス積層体Bを準備して、1枚はアレイ形成工程に供して薄板ガラス基板の第2主面上にアレイを形成する。残りの1枚はカラーフィルタ形成工程に供して薄板ガラス基板の第2主面上にカラーフィルタを形成する。
(Example 3)
In this example, an LCD is manufactured using the glass laminate B obtained in Example 2.
Two glass laminates B are prepared, and one is subjected to an array forming process to form an array on the second main surface of the thin glass substrate. The remaining one sheet is subjected to a color filter forming process to form a color filter on the second main surface of the thin glass substrate.
 アレイが形成されたガラス積層体と、カラーフィルタが形成されたガラス積層体とをシール材を介して貼り合わせた後、厚さ0.25mmのステンレス製剥離用刃物を、支持ガラス基板の第1主面の外周よりも外側に突出している薄板ガラス基板の第1主面に突き当てる。次に、薄板ガラス基板と樹脂層との境界に向かって薄板ガラス基板の第1主面上を滑らせ、前記境界に剥離用刃物を挿入させる。その後、前記境界に向けて、圧縮空気と水の混合流体を吹きつけた上で、各々の支持ガラス基板を剥離する。剥離後の支持ガラス基板上に固着している樹脂層に傷は存在せず、薄板ガラス基板にも樹脂が残っていない。 After the glass laminate on which the array is formed and the glass laminate on which the color filter is formed are bonded together via a sealing material, a stainless steel cutting blade having a thickness of 0.25 mm is attached to the first support glass substrate. It abuts against the first main surface of the thin glass substrate protruding outward from the outer periphery of the main surface. Next, the first cutting surface of the thin glass substrate is slid toward the boundary between the thin glass substrate and the resin layer, and a peeling blade is inserted into the boundary. Thereafter, a mixed fluid of compressed air and water is sprayed toward the boundary, and each supporting glass substrate is peeled off. There is no scratch on the resin layer fixed on the support glass substrate after peeling, and no resin remains on the thin glass substrate.
 続いて、支持ガラス基板を剥離したガラス基板を切断し、縦51mm×横38mmの168個のセルに分断した後、液晶注入工程および注入口の封止工程を実施して液晶セルを形成する。形成された液晶セルに偏光板を貼付する工程を実施し、続いてモジュール形成工程を実施してLCDを得る。こうして得られるLCDは、特性上問題は生じない。 Subsequently, the glass substrate from which the supporting glass substrate has been peeled is cut and divided into 168 cells of 51 mm in length and 38 mm in width, and then a liquid crystal injection step and an injection port sealing step are performed to form a liquid crystal cell. A step of attaching a polarizing plate to the formed liquid crystal cell is performed, and then a module formation step is performed to obtain an LCD. The LCD obtained in this way does not have a problem in characteristics.
 (実施例4)
  本例では、実施例1で得たガラス積層体Aを用いてLCDを製造する。
  2枚のガラス積層体Aを準備して、1枚はアレイ形成工程に供して薄板ガラス基板の第2主面にアレイを形成する。残りの1枚はカラーフィルタ形成工程に供して薄板ガラス基板の第2主面にカラーフィルタを形成する。
Example 4
In this example, an LCD is manufactured using the glass laminate A obtained in Example 1.
Two glass laminates A are prepared, and one is subjected to an array forming process to form an array on the second main surface of the thin glass substrate. The remaining one sheet is subjected to a color filter forming process to form a color filter on the second main surface of the thin glass substrate.
 アレイが形成されたガラス積層体と、カラーフィルタが形成されたガラス積層体とをシール材を介して貼り合わせた後、厚さ0.25mmのステンレス製剥離用刃物を、支持ガラス基板の第1主面の外周よりも外側に突出している薄板ガラス基板の第1主面に突き当てる。次に、薄板ガラス基板の第1主面上を、薄板ガラス基板と樹脂層との境界に向かって滑らせ、前記境界に剥離用刃物を挿入させる。その後、前記境界に向けて、水と圧縮空気の混合流体を吹きつけた上で、各々の支持ガラス基板を剥離する。剥離後の支持ガラス基板上に固着している樹脂層に傷は存在せず、薄板ガラス基板にも樹脂が残っていない。 After the glass laminate on which the array is formed and the glass laminate on which the color filter is formed are bonded together via a sealing material, a stainless steel cutting blade having a thickness of 0.25 mm is attached to the first support glass substrate. It abuts against the first main surface of the thin glass substrate protruding outward from the outer periphery of the main surface. Next, the first main surface of the thin glass substrate is slid toward the boundary between the thin glass substrate and the resin layer, and a peeling blade is inserted into the boundary. Then, after spraying the mixed fluid of water and compressed air toward the said boundary, each support glass substrate is peeled. There is no scratch on the resin layer fixed on the support glass substrate after peeling, and no resin remains on the thin glass substrate.
 続いて、ケミカルエッチング処理によりそれぞれの薄板ガラス基板の厚さを0.15mmとする。ケミカルエッチング処理後の薄板ガラス基板の表面には光学的に問題となるようなエッチピットの発生はみられない。 Subsequently, the thickness of each thin glass substrate is set to 0.15 mm by a chemical etching process. Etch pits that cause optical problems are not observed on the surface of the thin glass substrate after the chemical etching treatment.
 その後、支持ガラス基板を剥離したガラス基板を切断し、縦51mm×横38mmの168個のセルに分断した後、液晶注入工程および注入口の封止工程を実施して液晶セルを形成する。形成された液晶セルに偏光板を貼付する工程を実施し、続いてモジュール形成工程を実施してLCDを得る。こうして得られるLCDは、特性上問題は生じない。 Thereafter, the glass substrate from which the supporting glass substrate has been peeled is cut and divided into 168 cells of 51 mm in length and 38 mm in width, and then a liquid crystal injection step and an injection port sealing step are performed to form a liquid crystal cell. A step of attaching a polarizing plate to the formed liquid crystal cell is performed, and then a module formation step is performed to obtain an LCD. The LCD obtained in this way does not have a problem in characteristics.
 (実施例5)
  本例では、実施例2で得たガラス積層体Bを用いてOLEDを製造する。
  透明電極を形成する工程、補助電極を形成する工程、ホール注入層・ホール輸送層・発光層・電子輸送層等を蒸着する工程、これらを封止する工程に供して、積層体の薄板ガラス基板の第2主面上に有機EL構造体を形成する。
(Example 5)
In this example, an OLED is manufactured using the glass laminate B obtained in Example 2.
Laminated glass substrate for the process of forming a transparent electrode, a process of forming an auxiliary electrode, a process of depositing a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, etc., and a process of sealing them An organic EL structure is formed on the second main surface.
 厚さ0.25mmのステンレス製剥離用刃物を、支持ガラス基板の第1主面の外周よりも外側に突出している薄板ガラス基板の第1主面に突き当てる。次に、剥離用刃物を積層体の薄板ガラス基板と樹脂層との境界に向かって薄板ガラス基板の第1主面上を滑らせ、前記境界に挿入させる。その後、前記境界に向けて、圧縮空気と水の混合流体を吹きつけた上で、各々の支持ガラス基板を剥離する。剥離後の支持ガラス基板上に固着している樹脂層に傷は存在せず、薄板ガラス基板にも樹脂が残っていない。 A stainless steel cutting blade having a thickness of 0.25 mm is abutted against the first main surface of the thin glass substrate protruding outward from the outer periphery of the first main surface of the supporting glass substrate. Next, the peeling blade is slid on the first main surface of the thin glass substrate toward the boundary between the thin glass substrate and the resin layer of the laminate, and is inserted into the boundary. Thereafter, a mixed fluid of compressed air and water is sprayed toward the boundary, and each supporting glass substrate is peeled off. There is no scratch on the resin layer fixed on the support glass substrate after peeling, and no resin remains on the thin glass substrate.
 続いて、薄板ガラス基板をレーザーカッタまたはスクライブ-ブレイク法を用いて切断し、縦41mm×横30mmの288個のセルに分断した後、有機EL構造体が形成されたガラス基板と対向基板とを組み立てて、モジュール形成工程を実施してOLEDを作成する。こうして得られるOLEDは、特性上問題は生じない。 Subsequently, the thin glass substrate is cut using a laser cutter or a scribe-break method, and divided into 288 cells of 41 mm length × 30 mm width, and then the glass substrate on which the organic EL structure is formed and the counter substrate are separated. Assemble and perform module formation process to create OLED. The OLED obtained in this way does not have a problem in characteristics.
 (比較例1)
  本例での積層体は、支持ガラス基板の縦および横のサイズを、薄板ガラス基板と同じサイズである、縦720mm、横600mmに変更したこと以外は、実施例1と同様とした。得られた比較例1に係るガラス積層体Cは、シリコーン樹脂層と気泡を発生することなくガラス基板が密着しており、凸状欠点もなく平滑性も良好であった。
(Comparative Example 1)
The laminated body in this example was the same as Example 1 except that the vertical and horizontal sizes of the supporting glass substrate were changed to the same size as the thin glass substrate, that is, 720 mm long and 600 mm wide. In the obtained glass laminate C according to Comparative Example 1, the glass substrate was in close contact with the silicone resin layer without generating bubbles, there was no convex defect, and the smoothness was good.
 続いて、2枚のガラス積層体Cを準備して、1枚はアレイ形成工程に供して薄板ガラス基板の第2主面にアレイを形成する。残りの1枚はカラーフィルタ形成工程に供して薄板ガラス基板の第2主面にカラーフィルタを形成する。 Subsequently, two glass laminates C are prepared, and one is subjected to an array forming process to form an array on the second main surface of the thin glass substrate. The remaining one sheet is subjected to a color filter forming process to form a color filter on the second main surface of the thin glass substrate.
 アレイが形成された積層体と、カラーフィルタが形成された積層体とをシール材を介して貼り合わせた後、厚さ0.25mmのステンレス製剥離用刃物を薄板ガラス基板の第1主面に突き当てる。次に、薄板ガラス基板の第1主面上を、薄板ガラス基板と樹脂層との境界に向かって滑らせ、前記境界に剥離用刃物を挿入させる。その後、前記境界に向けて、水と圧縮空気の混合流体を吹きつけた上で、各々の支持ガラス基板を剥離する。剥離後の支持ガラス基板上に固着している樹脂層に、剥離用刃物による傷が付いており、薄板ガラス基板の第1主面に樹脂の一部が付着して残っている。そのため、表示装置製造工程において、薄板ガラス基板の第1主面上に付着した樹脂の一部を、剃刀等で削ぎ落とす工程が余計に必要となる。 After the laminate having the array formed thereon and the laminate having the color filter formed thereon are bonded together via a sealing material, a stainless steel cutting blade having a thickness of 0.25 mm is applied to the first main surface of the thin glass substrate. Strike. Next, the first main surface of the thin glass substrate is slid toward the boundary between the thin glass substrate and the resin layer, and a peeling blade is inserted into the boundary. Then, after spraying the mixed fluid of water and compressed air toward the said boundary, each support glass substrate is peeled. The resin layer fixed on the supporting glass substrate after peeling is scratched by the cutting blade, and a part of the resin remains on the first main surface of the thin glass substrate. Therefore, in the display device manufacturing process, an extra step of scraping off a part of the resin adhering to the first main surface of the thin glass substrate with a razor or the like is necessary.
 本発明を詳細にまた特定の実施態様を参照して説明したが、本発明の精神と範囲を逸脱することなく様々な変更や修正を加えることができることは、当業者にとって明らかである。
 本出願は、2009年1月9日出願の日本特許出願2009-003405に基づくものであり、その内容はここに参照として取り込まれる。
Although the invention has been described in detail and with reference to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention.
This application is based on Japanese Patent Application No. 2009-003405 filed on Jan. 9, 2009, the contents of which are incorporated herein by reference.
  本発明によって得られた薄板ガラス基板は、各種表示装置のガラス基板として使用することができる。 薄 The thin glass substrate obtained by the present invention can be used as a glass substrate for various display devices.
  10、50、60 ガラス積層体
  12、52、62 薄板ガラス基板
  12a、42a、52a、62a 薄板ガラス基板の第1主面
  12b、52b、62b 薄板ガラス基板の第2主面
  13、53、63 支持ガラス基板
  13a、43a 支持ガラス基板の第1主面
  13b 支持ガラス基板の第2主面
  14、54、64 樹脂層
  15 剥離用刃物
  Xa 縦方向矢印
  Xb 横方向矢印
10, 50, 60 Glass laminate 12, 52, 62 Thin glass substrate 12a, 42a, 52a, 62a First main surface 12b, 52b, 62b of thin glass substrate Second main surface 13, 53, 63 of thin glass substrate Glass substrate 13a, 43a First main surface 13b of supporting glass substrate Second main surface of supporting glass substrate 14, 54, 64 Resin layer 15 Cutting blade Xa Longitudinal arrow Xb Horizontal arrow

Claims (8)

  1.   第1主面および第2主面を有する薄板ガラス基板、第1主面および第2主面を有する支持ガラス基板、ならびに易剥離性を有する樹脂層を有し、前記薄板ガラス基板の第1主面と前記支持ガラス基板の第1主面に固定された前記樹脂層とが密着するように、前記薄板ガラス基板と前記支持ガラス基板とが前記樹脂層を介して積層されたガラス積層体であって、
     前記薄板ガラス基板が、前記薄板ガラス基板の第1主面の外周の少なくとも一部が前記支持ガラス基板の第1主面の外周から突出するように積層されているガラス積層体。
    A thin glass substrate having a first main surface and a second main surface, a supporting glass substrate having a first main surface and a second main surface, and a resin layer having easy peelability, the first main surface of the thin glass substrate A glass laminate in which the thin glass substrate and the supporting glass substrate are laminated via the resin layer so that the surface and the resin layer fixed to the first main surface of the supporting glass substrate are in close contact with each other. And
    A glass laminate in which the thin glass substrate is laminated such that at least a part of the outer periphery of the first main surface of the thin glass substrate protrudes from the outer periphery of the first main surface of the support glass substrate.
  2.   前記薄板ガラス基板の第1主面と前記支持ガラス基板の第1主面とが矩形形状をしており、前記薄板ガラス基板の第1主面の縦および/または横のそれぞれの長さが、前記支持ガラス基板の第1主面の縦および/または横のそれぞれの長さよりも長い、請求項1に記載のガラス積層体。 The first main surface of the thin glass substrate and the first main surface of the support glass substrate have a rectangular shape, and the lengths of the first main surface of the thin glass substrate and / or the horizontal length thereof, The glass laminated body of Claim 1 longer than each length of the 1st main surface of the said support glass substrate and / or each horizontal.
  3.   前記薄板ガラス基板の第1主面の縦および/または横のそれぞれの長さが、前記支持ガラス基板の第1主面の縦および/または横のそれぞれの長さよりも、0.2mmから20mm長い、請求項1または2に記載のガラス積層体。 The vertical and / or horizontal lengths of the first main surface of the thin glass substrate are 0.2 mm to 20 mm longer than the vertical and / or horizontal lengths of the first main surface of the supporting glass substrate. The glass laminated body of Claim 1 or 2.
  4.   前記薄板ガラス基板の第1主面の外周の全てが、前記支持ガラス基板の第1主面の外周よりも外側に突出している、請求項1~3のいずれかに記載のガラス積層体。 The glass laminate according to any one of claims 1 to 3, wherein the entire outer periphery of the first main surface of the thin glass substrate protrudes outward from the outer periphery of the first main surface of the supporting glass substrate.
  5.   前記樹脂層を形成する樹脂が、アクリル樹脂、ポリオレフィン樹脂、ポリウレタン樹脂およびシリコーン樹脂から選ばれる少なくとも1つである、請求項1~4のいずれかに記載のガラス積層体。 The glass laminate according to claim 1, wherein the resin forming the resin layer is at least one selected from an acrylic resin, a polyolefin resin, a polyurethane resin, and a silicone resin.
  6.   前記樹脂層の厚さが5~50μmである、請求項1~5のいずれかに記載のガラス積層体。 The glass laminate according to claim 1, wherein the resin layer has a thickness of 5 to 50 μm.
  7.   前記薄板ガラス基板と前記支持ガラス基板との線膨張係数の差が150×10-7/℃以下である、請求項1~6のいずれかに記載のガラス積層体。 The glass laminate according to any one of claims 1 to 6, wherein a difference in linear expansion coefficient between the thin glass substrate and the supporting glass substrate is 150 × 10 -7 / ° C or less.
  8.   請求項1~7のいずれかに記載のガラス積層体の製造方法であって、前記支持ガラス基板の第1主面に易剥離性を有する樹脂層を形成し固定する樹脂層形成工程と、前記薄板ガラス基板の第1主面に、前記支持ガラス基板の第1主面上に固定された前記樹脂層を密着する密着工程とを含む、ガラス積層体の製造方法。 The method for producing a glass laminate according to any one of claims 1 to 7, wherein a resin layer forming step of forming and fixing an easily peelable resin layer on the first main surface of the supporting glass substrate; The manufacturing method of a glass laminated body including the contact | adherence process of closely_contact | adhering the said resin layer fixed on the 1st main surface of the said support glass substrate to the 1st main surface of a thin glass substrate.
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