CN204320728U - There is the experiment semiconductor cleaning apparatus of agitating function - Google Patents
There is the experiment semiconductor cleaning apparatus of agitating function Download PDFInfo
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- CN204320728U CN204320728U CN201420800821.9U CN201420800821U CN204320728U CN 204320728 U CN204320728 U CN 204320728U CN 201420800821 U CN201420800821 U CN 201420800821U CN 204320728 U CN204320728 U CN 204320728U
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- hollow out
- reactive tank
- dividing plate
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Abstract
The utility model discloses a kind of experiment semiconductor cleaning apparatus with agitating function, comprise the Sheng liquid reactive tank that upper end is uncovered; Hollow out dividing plate is located at contains bottom in liquid reactive tank, and be respectively equipped with rectangular notch in hollow out dividing plate surrounding, hollow out dividing plate is provided with multiple strip through-hole, described Sheng liquid reactive tank inner chamber is divided into two chambeies be communicated with up and down by hollow out dividing plate; Twayblade stirs plate and is hinged on the below of containing and being positioned at hollow out dividing plate in liquid reactive tank, stir plate two ends at twayblade and be symmetrically connected with two vertical rods, two blades that plate is stirred by Y type support and twayblade in vertical rod lower end are affixed, and two vertical rod upper ends extend to respectively contains outside liquid reactive tank.Beneficial effect is: can realize the cleaning completed under the actionless prerequisite of wafer basket wafer, effectively can avoid the uneven problem of colliding with easy generation in lift wafer basket cleaning process of the reaction rate in the static cleaning process of wafer basket, cleaning performance is good, wafer basket can not produce collision, and yield rate is high.
Description
Technical field
The utility model belongs to a kind of labware, particularly a kind of experiment semiconductor cleaning apparatus with agitating function.
Background technology
Wafer cleaning is the processing step the most often used in semiconductor wafer process processing.The Main Function of wafer cleaning comprises: obtain clean wafer surface (atom, ion, molecule, organic contaminations or the particle that are attached to wafer surface as removed), wafer polishing and chip oriented corrosion.In cleaning process, the solution concentration of wafer surface constantly reduces, and reaction rate will decline gradually, thus has a strong impact on the quality of cleaning.In order to ensure the quality of wafer cleaning, need to make the solution in reactive tank be in the state of constantly flowing, thus drive the flowing of wafer surface solution, the consumption of postreaction liquid concentration, obtains consistent course of reaction.
In semi-conductor industry is produced, the general method of nitrogen bubble that adopts makes reactant liquor in reactive tank produce flowing, namely connects nitrogen in reaction tank bottom, opens and closes nitrogen by jettron, make reaction liquid in reactive tank produce stirring from bottom to top.Different from high volume production process during industrial production, the number of wafers of cleaning in experimentation is little, and the time of most cleaning process is about 20 minutes, so adopt the method for nitrogen bubble cleaning wafer that the cost of wafer cleaning will be made greatly to increase.
The mode of what general experimentation adopted is manual rotation cleans wafer basket realizes the flowing of liquid.As shown in Figure 1, because the wafer be positioned in wafer basket is vertically positioned in cleaning reaction groove, spacing very little (being often 2-3mm) between wafer and wafer basket, so the most effective wafer basket motion mode should be two vertical direction along being parallel to silicon chip surface, namely Y-direction moves up and down with X to transverse movement.The cleaning reaction groove of general experiment and the gap of wafer basket very little, so generally adopt the cleaning carrying out wafer in two ways, i.e. the static placement of wafer basket or manually lift wafer basket up and down.Static placement wafer basket, can cause reaction rate uneven, and lifts wafer basket up and down and need rinse bath to have enough degree of depth.
Shortcoming that wafer process exists comprises to adopt the lift mode that moves up and down of wafer basket or the static mode of wafer basket to clean: 1, move distance is difficult to control.Moving upward of wafer basket can cause silicon chip to expose from cleaning fluid, and wafer basket moves downward easily makes wafer basket, between rinse bath and wafer, mechanical collision occurs, thus cause wafer particularly ultra thin wafer cleaning process yield rate reduce.2, cleaning liquid flowing direction and speed be difficult to control.Lift up and down in wafer basket process, lift the speed of wafer basket, wafer basket gap and wafer and pile up direction, jointly determine flowing velocity and the direction of cleaning fluid.Because the process difficult lifting wafer basket accomplishes uniform motion, and be difficult to keep wafer surface to be in plumbness always, so wafer inevitably bears very large stress, thus be easy to the breakage causing wafer, cause the reduction of yield rate in cleaning process.3, the static meeting of wafer basket causes wafer surface to react uneven, and the contamination material washed, be probably again attached to silicon chip surface, produce the problem of secondary pollution.
Utility model content
Technical problem to be solved in the utility model to provide a kind of experiment semiconductor cleaning apparatus with agitating function, and can realize the cleaning completed under the actionless prerequisite of wafer basket wafer, cleaning performance is good, and yield rate is high.
For solving the problem, the utility model adopts following technical scheme:
There is an experiment semiconductor cleaning apparatus for agitating function, comprise the Sheng liquid reactive tank that upper end is uncovered;
Hollow out dividing plate, be located at and contain bottom in liquid reactive tank, be respectively equipped with rectangular notch in hollow out dividing plate surrounding, hollow out dividing plate is provided with multiple strip through-hole, described Sheng liquid reactive tank inner chamber is divided into two chambeies be communicated with up and down by hollow out dividing plate;
Twayblade stirs plate, is hinged on the below of containing and being positioned at hollow out dividing plate in liquid reactive tank, for stirring the cleaning fluid contained in liquid reactive tank; Stir plate two ends at twayblade and be symmetrically connected with two vertical rods, two blades that plate is stirred by Y type support and twayblade in vertical rod lower end are affixed, and two vertical rod upper ends extend to respectively contains outside liquid reactive tank.
As preferred further, in Sheng liquid reactive tank, corner, bottom place is respectively equipped with boss, and described hollow out membrane support is on described boss.
As preferred further, described twayblade stirs plate and comprises described two blades be fixed together, and two blade-shaped are at a certain angle, and between two blades, the two ends of junction are arranged with rotating shaft.
As preferred further, the angle of described two blades is 120-160 degree.
As further preferably, being connected with driver plate respectively in the upper end of each vertical rod, in the middle part of driver plate, being provided with square hole, realizing mechanical agitation for connecting external vibration mechanism.
As preferred further, the upper end being positioned at hollow out dividing plate at Sheng liquid reactive tank inwall is provided with four spacing square grooves, and in spacing square groove, insert limited location block, limited block outer end is pressed in hollow out dividing plate upper surface, for carrying out spacing to hollow out dividing plate.
As preferred further, in the middle part of side, the front and back inwall containing liquid reactive tank, be vertically provided with strip-shaped clamp groove, the lower end of strip-shaped clamp groove is semicircle arcuation, and the rotating shaft that described twayblade stirs plate two ends is inserted into lower end in strip-shaped clamp groove respectively.
The beneficial effects of the utility model are: by placing wafer basket on hollow out dividing plate, drive twayblade to stir plate by vertical rod to swing, the cleaning fluid in Sheng liquid reactive tank can be made not arrhea dynamic, thus the cleaning that realization completes wafer under the actionless prerequisite of wafer basket, effectively can avoid the uneven problem of colliding with easy generation in lift wafer basket cleaning process of the reaction rate in the static cleaning process of wafer basket, cleaning performance is good, and wafer basket can not produce collision, and yield rate is high.
Accompanying drawing explanation
Fig. 1 is structure sectional view of the present utility model.
Fig. 2 is the top view of Fig. 1.
Fig. 3 is the A-A sectional view of Fig. 1.
In figure: contain liquid reactive tank 1, stir chamber 101, cleaning chambers 102, strip-shaped clamp groove 103, spacing square groove 104, twayblade stirs plate 2, blade 201, rotating shaft 202, boss 3, hollow out dividing plate 4, rectangular notch 401, strip through-hole 402, limited block 5, driver plate 6, square hole 601, vertical rod 7, Y type support 8, cleaning fluid 9.
Detailed description of the invention
Below in conjunction with accompanying drawing, the utility model is described in further detail, can implements according to this with reference to description word to make those skilled in the art.
As shown in Figure 1-Figure 3, a kind of experiment semiconductor cleaning apparatus with agitating function that the utility model relates to, comprise the rectangle Sheng liquid reactive tank 1 that a upper end is uncovered, in Sheng liquid reactive tank 1, corner, bottom place is respectively equipped with the boss 3 of one, hollow out dividing plate 4 is supported with by described boss 3 in Sheng liquid reactive tank 1, rectangular notch 401 is respectively equipped with in hollow out dividing plate 4 surrounding, hollow out dividing plate 4 is transversely provided with multiple strip through-hole 402 side by side, described Sheng liquid reactive tank 1 inner chamber is divided into two chambeies arranged up and down by hollow out dividing plate 4, be respectively cleaning chambers 102 and stir chamber 101, cleaning chambers 102 is communicated with strip through-hole 402 by the rectangular notch 401 of hollow out dividing plate 4 with stirring chamber 101.
As preferably, the upper end being positioned at hollow out dividing plate 4 at Sheng liquid reactive tank 1 inwall is provided with four spacing square grooves 104, in spacing square groove 104, be inserted with limited block 5 by matched in clearance, limited block 5 outer end is pressed in hollow out dividing plate 4 upper surface, for carrying out spacing to hollow out dividing plate 4.
In Sheng liquid reactive tank 1, the stirring chamber 101 be positioned at below hollow out dividing plate 4 is hinged with twayblade and stirs plate 2, for stirring the cleaning fluid 9 contained in liquid reactive tank 1.Described twayblade stirs plate 2, and to comprise two blades, 201, two blade 201 shapes that symmetry is fixed together at a certain angle, and between two blades 201, the two ends of junction are arranged with the rotating shaft 202 of one.As preferably, the angle of described two blades 201 is 120-160 degree.Strip-shaped clamp groove 103 is vertically provided with in the middle part of side, the front and back inwall containing liquid reactive tank 1, the lower end of strip-shaped clamp groove 103 is semicircle arcuation, and described twayblade stirs rotating shaft 202 diameter at plate 2 two ends and the width fits of strip-shaped clamp groove 103 and is inserted into lower end in strip-shaped clamp groove 103 respectively.
Stir plate 2 two ends at twayblade and be symmetrically connected with two vertical rods 7, two blade 201 upper surfaces that plate 2 is stirred respectively by a Y type support 8 and twayblade in vertical rod 7 lower end are affixed, rectangular notch 401, two vertical rod 7 upper ends that Y type support 8 runs through edge before and after hollow out dividing plate 4 respectively extend to outside Sheng liquid reactive tank 1 respectively.As preferably, being connected with rectangle driver plate 6 respectively in the upper end of each vertical rod 7, in the middle part of driver plate 6, being provided with square hole 601, realizing mechanical agitation for connecting external vibration mechanism.
During use, the wafer basket that wafer is housed is placed on hollow out dividing plate 4, manually pulling vertical rod 7 or connecting external vibration mechanism by driver plate 6 just to drive twayblade to stir plate 2 with the rotating shaft 202 at two ends for axle does reciprocally swinging, and drive and contain the cleaning fluid 9 in liquid reactive tank 1 and do not arrhea at cleaning chambers 102 and stirring dynamic between chamber 101 by the rectangular notch 401 of hollow out dividing plate 4 and strip through-hole 402, thus realize the cleaning that completes under the actionless prerequisite of wafer basket wafer.
Although embodiment of the present utility model is open as above, but it is not restricted to listed in description and embodiment utilization, it can be applied to various applicable field of the present utility model completely, for those skilled in the art, can easily realize other amendment, therefore do not deviating under the universal that claim and equivalency range limit, the utility model is not limited to specific details and illustrates here and the legend described.
Claims (7)
1. there is an experiment semiconductor cleaning apparatus for agitating function, comprise the Sheng liquid reactive tank that upper end is uncovered; It is characterized in that:
Hollow out dividing plate, be located at and contain bottom in liquid reactive tank, be respectively equipped with rectangular notch in hollow out dividing plate surrounding, hollow out dividing plate is provided with multiple strip through-hole, described Sheng liquid reactive tank inner chamber is divided into two chambeies be communicated with up and down by hollow out dividing plate;
Twayblade stirs plate, is hinged on the below of containing and being positioned at hollow out dividing plate in liquid reactive tank, for stirring the cleaning fluid contained in liquid reactive tank; Stir plate two ends at twayblade and be symmetrically connected with two vertical rods, two blades that plate is stirred by Y type support and twayblade in vertical rod lower end are affixed, and two vertical rod upper ends extend to respectively contains outside liquid reactive tank.
2. the experiment semiconductor cleaning apparatus with agitating function according to claim 1, is characterized in that: in Sheng liquid reactive tank, corner, bottom place is respectively equipped with boss, and described hollow out membrane support is on described boss.
3. the experiment semiconductor cleaning apparatus with agitating function according to claim 1, it is characterized in that: described twayblade stirs plate and comprises described two blades be fixed together, two blade-shaped are at a certain angle, and between two blades, the two ends of junction are arranged with rotating shaft.
4. the experiment semiconductor cleaning apparatus with agitating function according to claim 3, is characterized in that: the angle of described two blades is 120-160 degree.
5. the experiment semiconductor cleaning apparatus with agitating function according to claim 1, is characterized in that: be connected with driver plate respectively in the upper end of each vertical rod, in the middle part of driver plate, be provided with square hole, realizes mechanical agitation for connecting external vibration mechanism.
6. the experiment semiconductor cleaning apparatus with agitating function according to claim 1 and 2, it is characterized in that: the upper end being positioned at hollow out dividing plate at Sheng liquid reactive tank inwall is provided with four spacing square grooves, limited location block is inserted in spacing square groove, limited block outer end is pressed in hollow out dividing plate upper surface, for carrying out spacing to hollow out dividing plate.
7. the experiment semiconductor cleaning apparatus with agitating function according to claim 3 or 4, it is characterized in that: in the middle part of side, the front and back inwall containing liquid reactive tank, be vertically provided with strip-shaped clamp groove, the lower end of strip-shaped clamp groove is semicircle arcuation, and the rotating shaft that described twayblade stirs plate two ends is inserted into lower end in strip-shaped clamp groove respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420800821.9U CN204320728U (en) | 2014-12-17 | 2014-12-17 | There is the experiment semiconductor cleaning apparatus of agitating function |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420800821.9U CN204320728U (en) | 2014-12-17 | 2014-12-17 | There is the experiment semiconductor cleaning apparatus of agitating function |
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| CN204320728U true CN204320728U (en) | 2015-05-13 |
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| CN201420800821.9U Expired - Fee Related CN204320728U (en) | 2014-12-17 | 2014-12-17 | There is the experiment semiconductor cleaning apparatus of agitating function |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108109905A (en) * | 2018-02-01 | 2018-06-01 | 通威太阳能（合肥）有限公司 | A kind of semiconductor cleaning reactive tank with agitating function |
| CN108421769A (en) * | 2018-05-16 | 2018-08-21 | 贵州大学 | A kind of machine components cleaning device |
| CN109365443A (en) * | 2018-10-05 | 2019-02-22 | 泰州市正阳麦芽有限公司 | A kind of vortex cleaning device of malt processing |
-
2014
- 2014-12-17 CN CN201420800821.9U patent/CN204320728U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108109905A (en) * | 2018-02-01 | 2018-06-01 | 通威太阳能（合肥）有限公司 | A kind of semiconductor cleaning reactive tank with agitating function |
| WO2019148534A1 (en) * | 2018-02-01 | 2019-08-08 | 通威太阳能（合肥）有限公司 | Semiconductor cleaning reaction tank having stirring function |
| CN108421769A (en) * | 2018-05-16 | 2018-08-21 | 贵州大学 | A kind of machine components cleaning device |
| CN109365443A (en) * | 2018-10-05 | 2019-02-22 | 泰州市正阳麦芽有限公司 | A kind of vortex cleaning device of malt processing |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150513 Termination date: 20151217 |
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| EXPY | Termination of patent right or utility model |