JP2006315928A - Method of polishing glass surface - Google Patents

Method of polishing glass surface Download PDF

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JP2006315928A
JP2006315928A JP2005142121A JP2005142121A JP2006315928A JP 2006315928 A JP2006315928 A JP 2006315928A JP 2005142121 A JP2005142121 A JP 2005142121A JP 2005142121 A JP2005142121 A JP 2005142121A JP 2006315928 A JP2006315928 A JP 2006315928A
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polishing
liquid
glass
glass surface
polishing liquid
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Toshihiro Nishiyama
智弘 西山
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NISHAMA STAINLESS CHEM KK
Nishiyama Stainless Chemical Co Ltd
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NISHAMA STAINLESS CHEM KK
Nishiyama Stainless Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of polishing the surface of glass by which polishing is carried out while suppressing the extension of the depth of flaw on the surface. <P>SOLUTION: The polishing of the glass surface is carried out through a pre-polishing step using a pre-polishing liquid set to a prescribed polishing speed, an intermediate polishing step using an intermediate polishing liquid set to a polishing speed slower than that of the pre-polishing liquid and a post-polishing step carried out at a speed lower than that of the intermediate polishing liquid. In such a case, it is preferable to provide cleaning steps between respective polishing steps. It is further preferable to interpose the cleaning step during the pre-polishing step. In the polishing speed of the polishing liquid, the polishing speed of the post-polishing liquid is suitably set to ≤10 μm/min. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、研磨液を使用するガラス表面の研磨方法に関する。   The present invention relates to a method for polishing a glass surface using a polishing liquid.

現在、液晶ディスプレイ、プラズマディスプレイ、有機エレクトロルミネッセンスディスプレイ等、様々なフラットパネルディスプレイが製造されている。図3は、フラットパネルディスプレイの一種である液晶ディスプレイパネルの一例を表した断面模式図である。図示の液晶ディスプレイパネルは、一対のガラス基板の間に液晶を保持した貼り合せ構造をとっている。   Currently, various flat panel displays such as liquid crystal displays, plasma displays, and organic electroluminescence displays are manufactured. FIG. 3 is a schematic cross-sectional view showing an example of a liquid crystal display panel which is a kind of flat panel display. The illustrated liquid crystal display panel has a bonded structure in which liquid crystal is held between a pair of glass substrates.

図示のパネルの画像表示面となるガラス基板1には、貼り合せ後に外表面となる面に偏光板7が積層され、その反対面には、カラーフィルター2がブラックマトリックス3に区分けされつつ形成され、オーバーコート4、透明電極5及び配向膜6が順次積層されている。他方のガラス基板8には、貼り合せガラス基板の外表面側に偏光板12が積層され、反対面には、薄膜トランジスタ9及び透明電極10が形成され、更に配向膜11が積層されている。これらガラス基板1、8の貼り合せは、両ガラス基板間に液晶封入領域を確保させるためのスペーサー13を介在させ、両ガラス基板の配向膜を形成した面を対向させて行われている。このようなガラス基板の偏光膜7、12は、ガラス基板1と8を貼り合せた後にその表面上に貼着積層される。   A glass substrate 1 serving as an image display surface of the illustrated panel is formed by laminating a polarizing plate 7 on a surface that becomes an outer surface after being bonded, and a color filter 2 is formed while being divided into a black matrix 3 on the opposite surface. The overcoat 4, the transparent electrode 5 and the alignment film 6 are sequentially laminated. On the other glass substrate 8, a polarizing plate 12 is laminated on the outer surface side of the bonded glass substrate, a thin film transistor 9 and a transparent electrode 10 are formed on the opposite surface, and an alignment film 11 is further laminated. The glass substrates 1 and 8 are bonded together by interposing a spacer 13 for securing a liquid crystal sealing region between the glass substrates and facing the surfaces of the glass substrates on which the alignment films are formed. The polarizing films 7 and 12 of such a glass substrate are bonded and laminated on the surfaces after the glass substrates 1 and 8 are bonded together.

図示のガラス基板のようにディスプレイパネルにガラスが使用されており、偏光板7、12を積層する前にフッ化水素を含有する研磨液に浸漬してガラス表面を研磨し、ディスプレイパネルの薄型化が図られている。例えば、特許文献1には、ガラス基板を研磨液に60分間浸漬して、厚みを400μm程度研磨する方法が開示されている。
特開2002−087844号公報(第8段落)
Glass is used for the display panel like the glass substrate shown in the figure. Before laminating the polarizing plates 7 and 12, the glass surface is polished by dipping in a polishing solution containing hydrogen fluoride to reduce the thickness of the display panel. Is planned. For example, Patent Document 1 discloses a method in which a glass substrate is immersed in a polishing solution for 60 minutes and polished to a thickness of about 400 μm.
JP 2002-087844 A (8th paragraph)

しかしながら、ガラス表面には、搬送等の間に微細な傷が生じることがあり、このような負傷したガラス表面を特許文献1に開示されている方法で研磨すると、傷によっては、その深さが研磨途中に伸長することになる。傷の深さが伸長することは、研磨における傷の除去率向上の障壁となり、また、ガラスの機械的強度低下を懸念させる。そのため、傷の深さ伸長を抑制したガラス表面研磨方法が提供されることが望まれている。   However, fine scratches may occur on the glass surface during transportation or the like. When such a damaged glass surface is polished by the method disclosed in Patent Document 1, the depth of some scratches may be reduced. It will elongate during polishing. The extension of the depth of the flaws becomes a barrier for improving the removal rate of flaws in polishing, and there is a concern that the mechanical strength of the glass is lowered. Therefore, it is desired to provide a glass surface polishing method that suppresses the extension of the flaw depth.

係る事情に鑑み、本発明は、傷の深さの伸長を抑制しつつガラス表面を研磨可能な方法を提供することを目的とするものである。   In view of such circumstances, an object of the present invention is to provide a method capable of polishing a glass surface while suppressing the extension of the depth of a flaw.

本発明者は、研磨速度が所定速度に設定された研磨液を使用してガラス表面を研磨するよりも、その所定速度に向けて研磨速度を段階的に減速して研磨することが、ガラス表面傷の深さの伸長抑制に有意であることを見出し本発明を完成するに至った。   The inventor does not polish the glass surface using a polishing liquid whose polishing speed is set to a predetermined speed, but can polish the glass surface by gradually reducing the polishing speed toward the predetermined speed. The present invention was completed by finding that it is significant in suppressing the extension of the depth of the wound.

即ち、本発明は、研磨液をガラス表面に接触させるガラス表面の研磨方法において、所定の研磨速度に設定された前研磨液を使用する前研磨工程と、前記前研磨液よりも遅い研磨速度に設定された中研磨液を使用する中研磨工程と、前記中研磨液よりも遅い研磨速度に設定された後研磨液を使用する後研磨工程と、を備えたことを特徴とする。ここで、本明細書における「研磨速度」とは、(ガラス一面の研磨量)/(研磨時間)により算出される値である。   That is, the present invention provides a glass surface polishing method in which a polishing liquid is brought into contact with the glass surface, a pre-polishing step using a pre-polishing liquid set at a predetermined polishing speed, and a polishing speed slower than the pre-polishing liquid. An intermediate polishing step using the set intermediate polishing liquid, and a post-polishing step using the post-polishing liquid set at a polishing rate slower than that of the intermediate polishing liquid. Here, the “polishing rate” in this specification is a value calculated by (polishing amount of one glass surface) / (polishing time).

前記前研磨工程の途中に洗浄工程を備え、ガラス表面の研磨反応生成物を除去することが好ましい。また、前記後研磨液は、10μm/min以下の研磨速度に設定されていることが好適である。このような、途中洗浄や後研磨液の研磨速度設定により、研磨後ガラスの無傷部分の表面平坦性が向上する。また、前記前研磨工程、中研磨工程、および後研磨工程の各工程の間に洗浄工程を備えて研磨反応生成物をガラス表面から除去しても良く、このときも研磨後ガラスの無傷部分の表面平坦性が向上する。   It is preferable to provide a cleaning step in the middle of the pre-polishing step to remove the polishing reaction product on the glass surface. The post-polishing liquid is preferably set to a polishing rate of 10 μm / min or less. The surface flatness of the intact part of the glass after polishing is improved by such intermediate cleaning and setting the polishing rate of the post-polishing liquid. Further, a cleaning step may be provided between the pre-polishing step, the intermediate polishing step, and the post-polishing step, and the polishing reaction product may be removed from the glass surface. Surface flatness is improved.

また本発明は、前記研磨方法により研磨されたガラス板、およびこのガラス板を構成部材として備えたフラットパネルディスプレイである。   Moreover, this invention is a flat panel display provided with the glass plate grind | polished by the said grinding | polishing method, and this glass plate as a structural member.

上記のように構成された研磨方法に係る発明によれば、最終段階の研磨工程に至るまでに研磨速度を段階的に減速させるので、ガラス表面に傷がある場合であっても、その傷の深さが研磨中に伸長することが抑制される。   According to the invention relating to the polishing method configured as described above, the polishing rate is gradually reduced until the final polishing step, so even if the glass surface has scratches, The depth is suppressed from extending during polishing.

以下に、本発明を実施形態に基づき詳細に説明する。図1は、本発明に係る第一実施形態の研磨の工程手順を表したフロー図である。本実施形態におけるガラス表面の研磨は、矩形のガラス板表面に研磨液を接触させる研磨工程を複数備え、各研磨工程の間にガラス表面を洗浄する洗浄工程を備えるものである。本実施形態の研磨によれば、厚みが0.7mmのガラス板の一面を0.2mm以上研磨して、厚みが0.3mm以下のガラス板にすることも可能である。   Hereinafter, the present invention will be described in detail based on embodiments. FIG. 1 is a flowchart showing a polishing process procedure according to the first embodiment of the present invention. The polishing of the glass surface in the present embodiment includes a plurality of polishing steps for bringing a polishing liquid into contact with the surface of a rectangular glass plate, and includes a cleaning step for cleaning the glass surface between each polishing step. According to the polishing of the present embodiment, it is possible to polish one surface of a glass plate having a thickness of 0.7 mm by 0.2 mm or more to obtain a glass plate having a thickness of 0.3 mm or less.

研磨対象となるガラスは、その組成が特に限定されるものではなく、ケイ酸ガラスであれば良い。本実施形態においては、SiO2が50〜65重量%、Al23が16〜18重量%、Bが7〜10重量%の範囲のアルミノホウケイ酸ガラスが選択されている。このガラスの無傷部分の表面は、算術平均粗さ(Ra)が0.01μm以下の平坦なものを選択しても良い。 The composition of the glass to be polished is not particularly limited as long as it is a silicate glass. In the present embodiment, an aluminoborosilicate glass in which SiO 2 is 50 to 65 wt%, Al 2 O 3 is 16 to 18 wt%, and B 2 O 3 is 7 to 10 wt% is selected. As the surface of the intact part of the glass, a flat surface having an arithmetic average roughness (Ra) of 0.01 μm or less may be selected.

本実施形態の研磨は、前研磨工程、中研磨工程、および後研磨工程を備える三段階の研磨工程を経ることにより行なわれる。各研磨工程は、研磨液をガラス表面に接触させることにより行なわれるものであり、研磨液にガラス板を浸漬することにより行うことも可能である。   The polishing of this embodiment is performed through a three-step polishing process including a pre-polishing process, a middle polishing process, and a post-polishing process. Each polishing step is performed by bringing a polishing liquid into contact with the glass surface, and can also be performed by immersing a glass plate in the polishing liquid.

研磨液としては、ガラス溶解性の液体が使用され、本実施形態における研磨液は、10〜50℃の範囲における一定温度に保ったフッ化水素水溶液が使用される。このフッ化水素水溶液には、フッ化物を更に研磨液に含有させても良い。また、研磨液には、有機酸及び/又は無機酸を含有させても良く、陰イオン系界面活性剤及び両性界面活性剤のうち一種以上添加しても良い。   As the polishing liquid, a glass-soluble liquid is used. As the polishing liquid in the present embodiment, an aqueous hydrogen fluoride solution maintained at a constant temperature in the range of 10 to 50 ° C. is used. This aqueous hydrogen fluoride solution may further contain a fluoride in the polishing liquid. Moreover, an organic acid and / or an inorganic acid may be contained in the polishing liquid, and one or more of an anionic surfactant and an amphoteric surfactant may be added.

研磨液に含有させるフッ化物としては、フッ化アンモニウム、フッ化カリウム、フッ化ナトリウム等が挙げられる。有機酸としては、酢酸、コハク酸等から一種又は二種以上を選択すると良く、無機酸としては、塩酸、硫酸、リン酸、硝酸等から一種又は二種以上を選択すると良い。   Examples of the fluoride contained in the polishing liquid include ammonium fluoride, potassium fluoride, sodium fluoride and the like. As the organic acid, one or more kinds may be selected from acetic acid, succinic acid and the like, and as the inorganic acid, one kind or two kinds or more may be selected from hydrochloric acid, sulfuric acid, phosphoric acid, nitric acid and the like.

上記のような研磨液は、各研磨工程で異なる研磨速度の研磨液が使用される。前研磨工程では前研磨液を、中研磨工程では前研磨液よりも遅い研磨速度に設定された中研磨液を、後研磨工程では中研磨液よりも遅い研磨速度に設定された後研磨液を、使用する。研磨速度は、研磨液中のフッ化水素濃度が高いほど高速化し、研磨液温度が高温であるほど高速化するので、所定の研磨速度に設定することが可能である。後研磨液よりも研磨速度が高速の研磨液が使用されるので、後研磨液単独で研磨するよりもガラス表面傷の深さの伸長が抑制される。   As the polishing liquid as described above, a polishing liquid having a different polishing rate is used in each polishing step. In the pre-polishing process, the pre-polishing liquid is used, in the intermediate polishing process the medium polishing liquid set to a slower polishing speed than the previous polishing liquid, and in the post-polishing process, the post-polishing liquid set to a lower polishing speed than the medium polishing liquid. ,use. The polishing speed increases as the hydrogen fluoride concentration in the polishing liquid increases, and increases as the polishing liquid temperature increases. Therefore, the polishing speed can be set to a predetermined polishing speed. Since a polishing liquid having a higher polishing rate than that of the post-polishing liquid is used, elongation of the depth of the glass surface scratch is suppressed as compared with polishing with the post-polishing liquid alone.

前研磨工程では、ガラス表面研磨において研磨速度が最速に設定された前研磨液が使用される。本実施形態の前研磨液は、中研磨液の研磨速度よりも高速であれば良く、研磨速度が1μm/s以上であることが好ましく、更に好ましくは3〜10μm/s、最適には5〜8μm/sのものが使用される。好適な研磨液組成は、フッ化水素と硫酸を含有させた研磨液であり、フッ化水素が10〜30重量%であると良く、好ましくは、15〜28重量%、更に好ましくは、17〜25重量%、硫酸が20〜50重量%であると良く、好ましくは、30〜45重量%、更に好ましくは、35〜42重量%である。フッ化水素と硫酸がこのような濃度範囲にある研磨液を使用することで、ガラス板表面が波打つうねりの発生が抑制され、傷の大きさ拡大の抑制が優れたものとなる。   In the pre-polishing step, a pre-polishing liquid whose polishing rate is set to the fastest in the glass surface polishing is used. The pre-polishing liquid of this embodiment may be faster than the polishing speed of the medium polishing liquid, and the polishing speed is preferably 1 μm / s or more, more preferably 3 to 10 μm / s, and most preferably 5 to 5 μm / s. 8 μm / s is used. A suitable polishing liquid composition is a polishing liquid containing hydrogen fluoride and sulfuric acid, and hydrogen fluoride may be 10 to 30% by weight, preferably 15 to 28% by weight, and more preferably 17 to 25 wt% and sulfuric acid may be 20 to 50 wt%, preferably 30 to 45 wt%, and more preferably 35 to 42 wt%. By using a polishing liquid in which hydrogen fluoride and sulfuric acid are in such a concentration range, the generation of undulations on the surface of the glass plate is suppressed, and the suppression of the expansion of the size of the scratches is excellent.

前研磨工程における浸漬時間は、1分以内であると良く、傷の直径が60μm以下であるときは、1〜5秒、好ましくは1〜3秒であると良い。なお、本明細書における傷の直径とは、ガラス表面を平面視したときに観察することができる傷の内側を通る最大直線長さである。無傷部分のガラス表面の平坦性を高めるためには、ガラス一面の研磨量を20μm以下とすると良い。   The immersion time in the pre-polishing step is preferably within 1 minute, and when the scratch diameter is 60 μm or less, it is 1 to 5 seconds, preferably 1 to 3 seconds. In addition, the diameter of the flaw in this specification is the maximum straight line length passing through the inside of the flaw that can be observed when the glass surface is viewed in plan. In order to improve the flatness of the glass surface of the intact part, the polishing amount of the entire glass surface is preferably 20 μm or less.

中研磨工程では、中研磨液を使用してガラス表面研磨が行なわれる。中研磨液の研磨速度は、前研磨液の研磨速度と後研磨液の研磨速度との間のものであれば特に限定されるものでない。即ち研磨速度は、前研磨液の研磨速度よりも低速であれば、1μm/s以上であっても良いし、後研磨液の研磨速度よりも高速であれば10μm/min以下であっても良い。   In the intermediate polishing step, glass surface polishing is performed using an intermediate polishing liquid. The polishing rate of the intermediate polishing solution is not particularly limited as long as it is between the polishing rate of the pre-polishing solution and the polishing rate of the post-polishing solution. That is, the polishing rate may be 1 μm / s or more as long as it is slower than the polishing rate of the pre-polishing liquid, and may be 10 μm / min or less if it is faster than the polishing rate of the post-polishing liquid. .

後研磨工程は、最終的な研磨を行なう工程であり、ガラス表面の平坦性を高めるため、研磨速度が10μm/min以下の研磨液を使用すると良く、好ましくは5μm/min以下、更に好ましくは2.5μm/min以下の研磨速度の研磨液を使用することである。研磨液の研磨速度の下限値は、研磨効率上、0.5μm/min以上に設定される。研磨量は、最終目標とされるガラス板厚に応じて決定されるものであるので特に限定されないが、ガラス一面の研磨量が100μm以上であると良い。なお、この最終工程においては、研磨液貯留槽の底部に気泡発生装置を設置し、上昇液流を生じさせた研磨液の液面にガラス板を略垂直にして浸漬保持した状態で研磨を行なうことが好適である。このようにガラス基板を浸漬保持することで、研磨反応生成物がガラス表面から随時除去されることになるので、研磨の進行が安定なものとなる。また、研磨液流がガラス表面に対して略平行となるので、液流によるガラス表面のウネリの発生が抑制される。   The post-polishing step is a final polishing step, and in order to improve the flatness of the glass surface, a polishing liquid having a polishing rate of 10 μm / min or less may be used, preferably 5 μm / min or less, more preferably 2 It is to use a polishing liquid having a polishing rate of 5 μm / min or less. The lower limit of the polishing rate of the polishing liquid is set to 0.5 μm / min or more in terms of polishing efficiency. The polishing amount is not particularly limited because it is determined according to the final target glass plate thickness, but the polishing amount on one glass surface is preferably 100 μm or more. In this final process, a bubble generator is installed at the bottom of the polishing liquid storage tank, and polishing is performed in a state where the glass plate is immersed and held substantially perpendicular to the surface of the polishing liquid that has caused the rising liquid flow. Is preferred. By soaking and holding the glass substrate in this manner, the polishing reaction product is removed from the glass surface as needed, so that the progress of polishing becomes stable. Further, since the polishing liquid flow is substantially parallel to the glass surface, the occurrence of undulation on the glass surface due to the liquid flow is suppressed.

洗浄工程は、洗浄液で、研磨液のみならず、研磨液とガラスとの反応により生じた研磨反応生成物を除去する工程である。本実施形態においては、水をガラス表面上に噴射または流水をガラス表面に接触させることにより行なわれる。平坦性の高いガラス表面を研磨液で研磨すると、表面平坦性が低下するが、研磨反応生成物を洗浄除去することでガラス表面の平坦性の低下が抑制される。   The cleaning step is a step of removing not only the polishing solution but also the polishing reaction product generated by the reaction between the polishing solution and glass with the cleaning solution. In this embodiment, it is carried out by spraying water onto the glass surface or bringing running water into contact with the glass surface. When the glass surface having high flatness is polished with a polishing liquid, the surface flatness is lowered, but the polishing reaction product is removed by washing to suppress the lowering of the flatness of the glass surface.

次に第二実施形態に基づき本発明を詳述する。図2は、本発明に係る第二実施形態の工程手順を表したフロー図である。第二実施形態が第一実施形態と異なるところは、第一実施形態の前研磨工程を第一研磨工程と第二研磨工程とに分け、第一研磨工程と第二研磨工程の間に洗浄工程を設けている点である。第二実施形態の第一実施形態と異なる前研磨工程について、以下に説明する。   Next, the present invention will be described in detail based on the second embodiment. FIG. 2 is a flowchart showing the process procedure of the second embodiment according to the present invention. The second embodiment is different from the first embodiment in that the pre-polishing step of the first embodiment is divided into a first polishing step and a second polishing step, and a cleaning step is performed between the first polishing step and the second polishing step. This is the point. The pre-polishing step different from the first embodiment of the second embodiment will be described below.

第二実施形態における前研磨工程の第一研磨工程と第二研磨工程は、共に同じ研磨速度の研磨液にガラス板を浸漬することにより行なわれる。この研磨液は、第一実施形態に使用した前研磨液と同じ前研磨液が使用される。研磨は、前研磨工程終了後にガラス一面が20μm以下研磨されるように行なわれる。   The first polishing step and the second polishing step of the pre-polishing step in the second embodiment are both performed by immersing the glass plate in a polishing liquid having the same polishing rate. As this polishing liquid, the same pre-polishing liquid as that used in the first embodiment is used. Polishing is performed so that one glass surface is polished to 20 μm or less after the pre-polishing step.

第一研磨工程と第二研磨工程の間に洗浄工程が設けられているが、本洗浄工程は、ガラス表面の研磨液と研磨反応生成物を洗浄除去するものである。このように研磨速度が最速の研磨液を使用する前研磨工程中に洗浄工程が設けられていると、研磨速度が高速であるが故に多量となっている研磨反応生成物がガラス表面から適宜除去されることになるので、研磨終了時のガラス表面の平坦性が高まることになる。   A cleaning step is provided between the first polishing step and the second polishing step, and this cleaning step is for cleaning and removing the polishing liquid and the polishing reaction product on the glass surface. Thus, if a cleaning step is provided during the pre-polishing step using the polishing liquid with the fastest polishing rate, the polishing reaction products that are abundant due to the high polishing rate are appropriately removed from the glass surface. Therefore, the flatness of the glass surface at the end of polishing is enhanced.

以上の通り、実施形態に基づき本発明を説明したが、本発明の趣旨を逸脱しない限り、上記実施形態を適宜変更することも当然可能である。例えば、液晶ディスプレイパネルのような二枚の貼り合せガラス基板を研磨対象としても良い。また、研磨の際に研磨液をガラス表面に接触させるが、ガラス表面に研磨液を吹き付ける等の他の浸漬以外の接触態様を採ることも可能である。また、ガラス表面に所定のマスキングパターンを形成した後に研磨を行なって良い。また、中研磨工程を更に複数の研磨工程に分け、中研磨工程中で研磨速度を段階的に減速させても良い。   As described above, the present invention has been described based on the embodiments. However, the above-described embodiments can be appropriately changed without departing from the gist of the present invention. For example, two bonded glass substrates such as a liquid crystal display panel may be polished. In addition, the polishing liquid is brought into contact with the glass surface during polishing, but other contact modes other than immersion, such as spraying the polishing liquid on the glass surface, can be employed. Further, polishing may be performed after a predetermined masking pattern is formed on the glass surface. Further, the intermediate polishing step may be further divided into a plurality of polishing steps, and the polishing rate may be gradually reduced during the intermediate polishing step.

次に本発明を実施例に基づき示す。前研磨、中研磨、および後研磨を順次行ない、各研磨の間および後研磨後には、ガラス表面に水を噴射することにより実施例の研磨を行なった。また、比較例としての研磨を、実施例における後研磨の条件のみにより行なった。比較例の研磨においても、研磨後にガラス表面への水噴射を行なった。   The invention will now be illustrated on the basis of examples. Pre-polishing, intermediate polishing, and post-polishing were sequentially performed, and after each polishing and after post-polishing, the example was polished by spraying water onto the glass surface. Further, polishing as a comparative example was performed only under the post-polishing conditions in the examples. Also in the polishing of the comparative example, water was sprayed onto the glass surface after polishing.

実施例および比較例において使用したガラス板、および研磨条件は、以下の通りである。
(ガラス板)
正四角錐の圧子を1kg、5秒間、マイクロビッカース硬度計で表面に加重して、圧痕を形成したガラス板。
(前研磨)
研磨速度が0.8μm/sの前研磨液にガラス板を浸漬。
(中研磨)
研磨速度が8μm/minの中研磨液にガラス板を浸漬。
(後研磨)
研磨速度が3μm/minの後研磨液にガラス板を浸漬し、ガラス板を略鉛直状態に保持した。研磨液中には、気泡で上昇液流を発生させた。
The glass plates and polishing conditions used in Examples and Comparative Examples are as follows.
(Glass plate)
A glass plate in which indentations are formed by applying a regular quadrangular pyramid indenter to the surface with a micro Vickers hardness tester for 1 kg for 5 seconds.
(Pre-polishing)
Immerse the glass plate in a pre-polishing liquid with a polishing rate of 0.8 μm / s.
(Medium polishing)
Immerse the glass plate in a medium polishing solution with a polishing rate of 8 μm / min.
(Post-polishing)
After the polishing rate was 3 μm / min, the glass plate was immersed in a polishing liquid, and the glass plate was held in a substantially vertical state. In the polishing liquid, an ascending liquid flow was generated with bubbles.

実施例および比較例の結果を表1に示す。尚、表1中、研磨量は、ガラス板一面の研磨量である。   The results of Examples and Comparative Examples are shown in Table 1. In Table 1, the polishing amount is the polishing amount of one surface of the glass plate.

Figure 2006315928
Figure 2006315928

表1に示す通り、研磨量が同等のときには、後研磨液の研磨速度よりも高速の研磨液を使用した前研磨と中研磨を行なうことにより、傷の深さ伸長が抑制されている。 As shown in Table 1, when the polishing amount is the same, the depth extension of the scratches is suppressed by performing pre-polishing and intermediate polishing using a polishing liquid faster than the polishing speed of the post-polishing liquid.

本発明に係る第一実施形態の工程手順を表したフロー図である。It is a flowchart showing the process procedure of 1st embodiment which concerns on this invention. 本発明に係る第二実施形態の工程手順を表したフロー図である。It is a flowchart showing the process procedure of 2nd embodiment which concerns on this invention. 液晶ディスプレイパネルの一例を表した断面模式図である。It is a cross-sectional schematic diagram showing an example of the liquid crystal display panel.

Claims (6)

研磨液をガラス表面に接触させるガラス表面の研磨方法において、
所定の研磨速度に設定された前研磨液を使用する前研磨工程と、
前記前研磨液よりも遅い研磨速度に設定された中研磨液を使用する中研磨工程と、
前記中研磨液よりも遅い研磨速度に設定された後研磨液を使用する後研磨工程と、
を備えたことを特徴とするガラス表面の研磨方法。
In the polishing method of the glass surface where the polishing liquid is brought into contact with the glass surface,
A pre-polishing step using a pre-polishing liquid set at a predetermined polishing rate;
A middle polishing step using a middle polishing liquid set at a lower polishing rate than the previous polishing liquid;
A post-polishing step using a post-polishing liquid set at a slower polishing rate than the medium polishing liquid;
A method for polishing a glass surface, comprising:
前記前研磨工程の研磨途中に洗浄工程を備える請求項1に記載の研磨方法。 The polishing method according to claim 1, further comprising a cleaning step in the middle of the pre-polishing step. 前記後研磨液は、10μm/min以下の研磨速度に設定されている請求項1または2に記載の研磨方法。 The polishing method according to claim 1, wherein the post-polishing liquid is set to a polishing rate of 10 μm / min or less. 前記各研磨工程の間に洗浄工程を備えている請求項1〜3のいずれかに記載の研磨方法。 The polishing method according to claim 1, further comprising a cleaning step between the polishing steps. 請求項1〜4のいずれかの方法により研磨されたガラス板。 The glass plate grind | polished by the method in any one of Claims 1-4. 請求項5に記載のガラス板を構成部材として備えたフラットパネルディスプレイ。 The flat panel display provided with the glass plate of Claim 5 as a structural member.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010138000A (en) * 2008-12-09 2010-06-24 Densho Engineering Co Ltd Method and apparatus for etching glass substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010138000A (en) * 2008-12-09 2010-06-24 Densho Engineering Co Ltd Method and apparatus for etching glass substrate

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