SG94843A1 - Method and apparatus for chemically polishing liquid crystal glass substrate - Google Patents
Method and apparatus for chemically polishing liquid crystal glass substrateInfo
- Publication number
- SG94843A1 SG94843A1 SG200103698A SG200103698A SG94843A1 SG 94843 A1 SG94843 A1 SG 94843A1 SG 200103698 A SG200103698 A SG 200103698A SG 200103698 A SG200103698 A SG 200103698A SG 94843 A1 SG94843 A1 SG 94843A1
- Authority
- SG
- Singapore
- Prior art keywords
- liquid crystal
- glass substrate
- polishing liquid
- crystal glass
- chemically polishing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1313—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells specially adapted for a particular application
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02019—Chemical etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/52—Mechanical processing of waste for the recovery of materials, e.g. crushing, shredding, separation or disassembly
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/60—Glass recycling
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001114498 | 2001-04-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG94843A1 true SG94843A1 (en) | 2003-03-18 |
Family
ID=18965559
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200103698A SG94843A1 (en) | 2001-04-12 | 2001-06-05 | Method and apparatus for chemically polishing liquid crystal glass substrate |
Country Status (4)
Country | Link |
---|---|
KR (1) | KR100380844B1 (en) |
CN (2) | CN1277142C (en) |
SG (1) | SG94843A1 (en) |
TW (1) | TWI263079B (en) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG121817A1 (en) * | 2002-11-22 | 2006-05-26 | Nishiyama Stainless Chemical Co Ltd | Glass substrate for flat planel display, and process for producing the same |
CN100343420C (en) * | 2004-07-21 | 2007-10-17 | 常耀辉 | Fast chemical grinding polishing bath liquid for stainless steel surface and its method |
JP2007197236A (en) * | 2006-01-25 | 2007-08-09 | Nishiyama Stainless Chem Kk | Method for manufacturing glass substrate for display and glass substrate |
CN101089688B (en) * | 2006-06-14 | 2010-09-29 | 比亚迪股份有限公司 | Manufacturing method of superthin liquid crystal box |
CN100392477C (en) * | 2006-07-07 | 2008-06-04 | 南京大学 | Liquid crystal display panel resource processing method |
KR101233687B1 (en) * | 2010-10-28 | 2013-02-15 | 삼성디스플레이 주식회사 | Apparatus of etching a glass substrate |
JP5829458B2 (en) * | 2011-08-25 | 2015-12-09 | 株式会社Screenホールディングス | Substrate processing equipment |
CN103033403B (en) * | 2011-09-29 | 2015-09-02 | 鞍钢股份有限公司 | A kind of preparation method of thin-sheet metal film test sample |
CN102643028A (en) * | 2012-05-14 | 2012-08-22 | 深圳市拓捷科技发展有限公司 | Glass thinning equipment and method |
CN102701597B (en) * | 2012-06-26 | 2014-10-08 | 汕头市拓捷科技有限公司 | Rapid glass thinning equipment |
CN102701598B (en) * | 2012-06-26 | 2015-09-30 | 广东拓捷科技有限公司 | A kind of glass thinning apparatus of improvement |
CN103046053B (en) * | 2012-09-21 | 2015-04-01 | 中国兵器工业第二一三研究所 | Chemical polishing method of stainless steel by high-temperature oxidation |
CN103508676A (en) * | 2013-07-24 | 2014-01-15 | 芜湖长信科技股份有限公司 | Method for avoiding defect in LCD glass substrate thinning process and acid solution configuration method |
TW201519308A (en) * | 2013-11-13 | 2015-05-16 | Grand Plastic Technology Corp | Circulation type uniformly etching device |
CN105541120A (en) * | 2015-12-28 | 2016-05-04 | 常熟市金亿复合材料有限公司 | Coating process for hollow glass plate |
JP6323695B2 (en) * | 2016-09-30 | 2018-05-16 | パナソニックIpマネジメント株式会社 | Polishing liquid for glass and polishing method |
CN107286853A (en) * | 2017-07-12 | 2017-10-24 | 天津津航技术物理研究所 | A kind of devitrified glass high brightness chemical polishing solution and preparation method |
CN107235641A (en) * | 2017-08-14 | 2017-10-10 | 湖北工程学院 | A kind of glass thinning etching solution and preparation method thereof |
CN107902914A (en) * | 2017-12-14 | 2018-04-13 | 天津美泰真空技术有限公司 | A kind of glass substrate thinning technique etching solution |
CN107814491A (en) * | 2017-12-14 | 2018-03-20 | 天津美泰真空技术有限公司 | A kind of flat glass substrate etching solution |
CN109439329A (en) * | 2018-10-29 | 2019-03-08 | 苏州博洋化学股份有限公司 | FPD array process novel I GZO etching solution |
CN109111859A (en) * | 2018-10-30 | 2019-01-01 | 秦皇岛市大龙建材有限公司 | Glass polishing solution |
CN111029230B (en) * | 2019-12-13 | 2022-04-05 | 山西长城微光器材股份有限公司 | Micro-channel plate in-channel polishing method |
CN111925126A (en) * | 2020-08-12 | 2020-11-13 | 郑州恒昊光学科技有限公司 | Paste for repairing slight scratch of optical glass |
CN116042098A (en) * | 2023-02-08 | 2023-05-02 | 广东粤港澳大湾区黄埔材料研究院 | Nano alumina polishing solution and application thereof in polishing of infrared chalcogenide glass |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5854974A (en) * | 1981-09-28 | 1983-04-01 | 三菱電機株式会社 | Golf exerciser |
JPH0641770A (en) * | 1992-07-27 | 1994-02-15 | Daikin Ind Ltd | Treatment for surface of silicon wafer |
JPH07217707A (en) * | 1994-02-01 | 1995-08-15 | Yokohama Rubber Co Ltd:The | Steel cord belt endless working method and cooling/ refrigerating device for practicing this mehtod |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5413958A (en) * | 1992-11-16 | 1995-05-09 | Tokyo Electron Limited | Method for manufacturing a liquid crystal display substrate |
JPH10109012A (en) * | 1996-10-04 | 1998-04-28 | Stec Kk | Deodorizing method and deodorizing device for garbage disposal |
US6174371B1 (en) * | 1997-10-06 | 2001-01-16 | Dainippon Screen Mfg. Co., Ltd. | Substrate treating method and apparatus |
JPH11111658A (en) * | 1997-10-06 | 1999-04-23 | Dainippon Screen Mfg Co Ltd | Method and device for processing substrate |
-
2001
- 2001-04-30 KR KR10-2001-0023329A patent/KR100380844B1/en not_active IP Right Cessation
- 2001-05-01 TW TW090110411A patent/TWI263079B/en not_active IP Right Cessation
- 2001-06-05 SG SG200103698A patent/SG94843A1/en unknown
-
2002
- 2002-04-11 CN CNB021059632A patent/CN1277142C/en not_active Expired - Fee Related
- 2002-04-11 CN CNB2005100833270A patent/CN100462319C/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5854974A (en) * | 1981-09-28 | 1983-04-01 | 三菱電機株式会社 | Golf exerciser |
JPH0641770A (en) * | 1992-07-27 | 1994-02-15 | Daikin Ind Ltd | Treatment for surface of silicon wafer |
JPH07217707A (en) * | 1994-02-01 | 1995-08-15 | Yokohama Rubber Co Ltd:The | Steel cord belt endless working method and cooling/ refrigerating device for practicing this mehtod |
Also Published As
Publication number | Publication date |
---|---|
CN100462319C (en) | 2009-02-18 |
CN1277142C (en) | 2006-09-27 |
KR100380844B1 (en) | 2003-04-18 |
TWI263079B (en) | 2006-10-01 |
CN1380572A (en) | 2002-11-20 |
KR20020080215A (en) | 2002-10-23 |
CN1724432A (en) | 2006-01-25 |
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