TWI255232B - Nozzle plate and manufacturing method of same - Google Patents
Nozzle plate and manufacturing method of same Download PDFInfo
- Publication number
- TWI255232B TWI255232B TW93125877A TW93125877A TWI255232B TW I255232 B TWI255232 B TW I255232B TW 93125877 A TW93125877 A TW 93125877A TW 93125877 A TW93125877 A TW 93125877A TW I255232 B TWI255232 B TW I255232B
- Authority
- TW
- Taiwan
- Prior art keywords
- nozzle
- layer
- hole
- electrode layer
- electrode
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 27
- 239000012530 fluid Substances 0.000 claims abstract description 218
- 238000000034 method Methods 0.000 claims description 64
- 239000000758 substrate Substances 0.000 claims description 41
- 238000005530 etching Methods 0.000 claims description 40
- 238000012545 processing Methods 0.000 claims description 40
- 239000007921 spray Substances 0.000 claims description 19
- 239000002245 particle Substances 0.000 claims description 17
- 238000000926 separation method Methods 0.000 claims description 8
- 238000010521 absorption reaction Methods 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 238000007599 discharging Methods 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 582
- 239000000463 material Substances 0.000 description 53
- 230000005684 electric field Effects 0.000 description 47
- 229910019567 Re Re Inorganic materials 0.000 description 39
- 239000010408 film Substances 0.000 description 38
- 229920002120 photoresistant polymer Polymers 0.000 description 37
- 239000007788 liquid Substances 0.000 description 28
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 24
- 239000010936 titanium Substances 0.000 description 24
- 229910052719 titanium Inorganic materials 0.000 description 24
- 230000005499 meniscus Effects 0.000 description 22
- 239000005871 repellent Substances 0.000 description 21
- 239000007789 gas Substances 0.000 description 18
- 230000002829 reductive effect Effects 0.000 description 18
- 230000002940 repellent Effects 0.000 description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 16
- 239000001301 oxygen Substances 0.000 description 16
- 229910052760 oxygen Inorganic materials 0.000 description 16
- 230000015572 biosynthetic process Effects 0.000 description 15
- 238000004891 communication Methods 0.000 description 15
- 239000000049 pigment Substances 0.000 description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 14
- 229920001721 polyimide Polymers 0.000 description 13
- 239000007769 metal material Substances 0.000 description 11
- 238000001312 dry etching Methods 0.000 description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 229910001868 water Inorganic materials 0.000 description 10
- 238000009826 distribution Methods 0.000 description 9
- 239000004575 stone Substances 0.000 description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 230000008859 change Effects 0.000 description 8
- 238000007747 plating Methods 0.000 description 8
- 239000009719 polyimide resin Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 238000000576 coating method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 7
- 229910052786 argon Inorganic materials 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000005611 electricity Effects 0.000 description 6
- 238000011084 recovery Methods 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000009713 electroplating Methods 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 229920002313 fluoropolymer Polymers 0.000 description 5
- 239000004811 fluoropolymer Substances 0.000 description 5
- 239000012212 insulator Substances 0.000 description 5
- 229910017604 nitric acid Inorganic materials 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 238000003672 processing method Methods 0.000 description 5
- 230000003068 static effect Effects 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000005686 electrostatic field Effects 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000012821 model calculation Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 241000238631 Hexapoda Species 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002466 imines Chemical class 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000001659 ion-beam spectroscopy Methods 0.000 description 3
- 230000036961 partial effect Effects 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 3
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 150000002221 fluorine Chemical class 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000010902 straw Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- -1 wrong Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 241000771208 Buchanania arborescens Species 0.000 description 1
- 244000025254 Cannabis sativa Species 0.000 description 1
- 235000012766 Cannabis sativa ssp. sativa var. sativa Nutrition 0.000 description 1
- 235000012765 Cannabis sativa ssp. sativa var. spontanea Nutrition 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 101150030061 Eloc gene Proteins 0.000 description 1
- 235000003325 Ilex Nutrition 0.000 description 1
- 241000209035 Ilex Species 0.000 description 1
- 241001272720 Medialuna californiensis Species 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- 241000239226 Scorpiones Species 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 208000002599 Smear Layer Diseases 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 210000003323 beak Anatomy 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 235000009120 camo Nutrition 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 235000005607 chanvre indien Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 229910052805 deuterium Inorganic materials 0.000 description 1
- 125000004431 deuterium atom Chemical group 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000011487 hemp Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000010977 jade Substances 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- 210000002445 nipple Anatomy 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000001454 recorded image Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 235000015170 shellfish Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007514 turning Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/1433—Structure of nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1643—Manufacturing processes thin film formation thin film formation by plating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14475—Structure thereof only for on-demand ink jet heads characterised by nozzle shapes or number of orifices per chamber
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003209840A JP3892423B2 (ja) | 2003-08-29 | 2003-08-29 | ノズルプレートおよびその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200523123A TW200523123A (en) | 2005-07-16 |
TWI255232B true TWI255232B (en) | 2006-05-21 |
Family
ID=34263978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW93125877A TWI255232B (en) | 2003-08-29 | 2004-08-27 | Nozzle plate and manufacturing method of same |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3892423B2 (ja) |
TW (1) | TWI255232B (ja) |
WO (1) | WO2005021269A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109910435A (zh) * | 2015-12-29 | 2019-06-21 | 意法半导体股份有限公司 | 用于流体喷射装置的改进的制造方法以及流体喷射装置 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007050636A (ja) * | 2005-08-19 | 2007-03-01 | Fujifilm Corp | 液体吐出ヘッドおよび画像記録装置ならびに液体吐出ヘッドの製造方法 |
JP4706850B2 (ja) * | 2006-03-23 | 2011-06-22 | 富士フイルム株式会社 | ノズルプレートの製造方法、液滴吐出ヘッド及び画像形成装置 |
JP4407686B2 (ja) | 2006-10-16 | 2010-02-03 | セイコーエプソン株式会社 | 液滴吐出ヘッド、液滴吐出ヘッドの製造方法、および液滴吐出装置 |
JPWO2008155986A1 (ja) * | 2007-06-20 | 2010-08-26 | コニカミノルタホールディングス株式会社 | 液体吐出ヘッド用ノズルプレートの製造方法、液体吐出ヘッド用ノズルプレート及び液体吐出ヘッド |
GB0919744D0 (en) * | 2009-11-11 | 2009-12-30 | Queen Mary & Westfield College | Electrospray emitter and method of manufacture |
JP5418283B2 (ja) * | 2010-02-18 | 2014-02-19 | ブラザー工業株式会社 | 液体吐出装置 |
JP6048794B2 (ja) * | 2012-07-31 | 2016-12-21 | 株式会社リコー | ノズルプレート、ノズルプレートの製造方法、インクジェットヘッド及びインクジェット印刷装置 |
JP6609977B2 (ja) * | 2015-04-27 | 2019-11-27 | 株式会社リコー | ノズルプレート、インクジェットヘッド、インクジェット装置およびノズルプレートの製造方法 |
CN108311305A (zh) * | 2018-04-11 | 2018-07-24 | 黑龙江八农垦大学 | 双级式静电喷头感应电极 |
TWI736949B (zh) * | 2019-04-16 | 2021-08-21 | 南韓商恩傑特股份有限公司 | 感應電流體動力學噴射打印裝置 |
IT201900007196A1 (it) | 2019-05-24 | 2020-11-24 | St Microelectronics Srl | Dispositivo microfluidico per l'espulsione continua di fluidi, in particolare per la stampa con inchiostri, e relativo procedimento di fabbricazione |
CN116472177A (zh) * | 2021-10-12 | 2023-07-21 | 加伊亚斯塔股份有限公司 | 用于三维油墨打印的喷嘴和系统 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3114634B2 (ja) * | 1996-12-20 | 2000-12-04 | 村田機械株式会社 | マルチノズル型インクジェットのノズル製造方法 |
JP2002154210A (ja) * | 2000-11-20 | 2002-05-28 | Canon Inc | インクジェット記録ヘッドの製造方法、インクジェット記録ヘッド、およびインクジェット記録装置 |
JP2003127386A (ja) * | 2001-10-22 | 2003-05-08 | Ricoh Co Ltd | 液滴吐出ヘッド及びその製造方法 |
-
2003
- 2003-08-29 JP JP2003209840A patent/JP3892423B2/ja not_active Expired - Lifetime
-
2004
- 2004-08-27 WO PCT/JP2004/012395 patent/WO2005021269A1/ja active Application Filing
- 2004-08-27 TW TW93125877A patent/TWI255232B/zh not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109910435A (zh) * | 2015-12-29 | 2019-06-21 | 意法半导体股份有限公司 | 用于流体喷射装置的改进的制造方法以及流体喷射装置 |
CN109910435B (zh) * | 2015-12-29 | 2022-04-05 | 意法半导体股份有限公司 | 喷嘴板、流体喷射装置及它们的制造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2005021269A1 (ja) | 2005-03-10 |
JP2005074635A (ja) | 2005-03-24 |
TW200523123A (en) | 2005-07-16 |
JP3892423B2 (ja) | 2007-03-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI255232B (en) | Nozzle plate and manufacturing method of same | |
JP5728795B2 (ja) | ノズルプレートの製造方法、及び、液滴吐出ヘッドの製造方法 | |
JP4660683B2 (ja) | ノズルプレートの製造方法及び液滴吐出ヘッドの製造方法 | |
JP2009184176A (ja) | ノズル基板、ノズル基板の製造方法、液滴吐出ヘッド及び液滴吐出装置 | |
JP5218164B2 (ja) | ノズル基板の製造方法及び液滴吐出ヘッドの製造方法 | |
JP2005059215A (ja) | 静電吸引型流体吐出装置 | |
JP2009113351A (ja) | シリコン製ノズル基板、シリコン製ノズル基板を備えた液滴吐出ヘッド、液滴吐出ヘッドを搭載した液滴吐出装置、及びシリコン製ノズル基板の製造方法 | |
JP5332275B2 (ja) | シリコン製ノズル基板の製造方法、液滴吐出ヘッドの製造方法、及び液滴吐出装置の製造方法 | |
JP2009119724A (ja) | シリコン製ノズル基板、シリコン製ノズル基板を備えた液滴吐出ヘッド、液滴吐出ヘッドを搭載した液滴吐出装置、及びシリコン製ノズル基板の製造方法 | |
JP2007175992A (ja) | ノズルプレートの製造方法及びノズルプレート、液滴吐出ヘッドの製造方法及び液滴吐出ヘッド、並びに液滴吐出装置の製造方法及び液滴吐出装置 | |
JP2008273079A (ja) | ノズル基板の製造方法、液滴吐出ヘッドの製造方法及び液滴吐出装置の製造方法 | |
JP2008094018A (ja) | ノズルプレートの製造方法及び液滴吐出ヘッドの製造方法 | |
JP2007261152A (ja) | ノズル基板の製造方法、液滴吐出ヘッドの製造方法及び液滴吐出装置の製造方法 | |
JP2007253373A (ja) | 液滴吐出ヘッド、液滴吐出装置、液滴吐出ヘッドの製造方法及び液滴吐出装置の製造方法 | |
WO2016158917A1 (ja) | 液体吐出ヘッド用ノズルプレートの製造方法、液体吐出ヘッド用ノズルプレート及び液体吐出ヘッド | |
JP6099891B2 (ja) | ドライエッチング方法 | |
JP2009029018A (ja) | ノズル基板の製造方法、ノズル基板、液滴吐出ヘッド、及び液滴吐出装置 | |
JP2010214923A (ja) | ノズル基板の製造方法、その製造方法で製造されたノズル基板、液滴吐出ヘッドの製造方法、その製造方法で製造された液滴吐出ヘッド及び液滴吐出装置 | |
US9427953B2 (en) | Method of manufacturing liquid ejection head | |
JP2009274415A (ja) | ノズルプレート及び液体吐出ヘッド | |
JP2010149375A (ja) | ノズル基板の製造方法及び液滴吐出ヘッドの製造方法 | |
JP2011079245A (ja) | ノズル基板及びノズル基板の製造方法並びに液滴吐出ヘッド及び液滴吐出装置 | |
JP2007320254A (ja) | ノズルプレートの製造方法、ノズルプレート、液滴吐出ヘッドの製造方法、液滴吐出ヘッド、液滴吐出装置の製造方法及び液滴吐出装置 | |
JP2007210241A (ja) | 静電アクチュエータ、液滴吐出ヘッド及びそれらの製造方法 | |
JP4489637B2 (ja) | インクジェットヘッドおよびその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |