TW200523123A - Nozzle plate and manufacturing method the same - Google Patents

Nozzle plate and manufacturing method the same Download PDF

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Publication number
TW200523123A
TW200523123A TW93125877A TW93125877A TW200523123A TW 200523123 A TW200523123 A TW 200523123A TW 93125877 A TW93125877 A TW 93125877A TW 93125877 A TW93125877 A TW 93125877A TW 200523123 A TW200523123 A TW 200523123A
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TW
Taiwan
Prior art keywords
nozzle
layer
hole
electrode layer
electrode
Prior art date
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TW93125877A
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Chinese (zh)
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TWI255232B (en
Inventor
Haruhiko Deguchi
Hidetsugu Kawai
Shigeru Nishio
Shigeaki Kakiwaki
Kazuhiro Murata
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Sharp Kk
Nat Inst Of Advanced Ind Scien
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Publication of TW200523123A publication Critical patent/TW200523123A/en
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Publication of TWI255232B publication Critical patent/TWI255232B/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1637Manufacturing processes molding
    • B41J2/1639Manufacturing processes molding sacrificial molding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/1433Structure of nozzle plates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/162Manufacturing of the nozzle plates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1628Manufacturing processes etching dry etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1629Manufacturing processes etching wet etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1631Manufacturing processes photolithography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1642Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1643Manufacturing processes thin film formation thin film formation by plating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1645Manufacturing processes thin film formation thin film formation by spincoating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1646Manufacturing processes thin film formation thin film formation by sputtering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2002/14475Structure thereof only for on-demand ink jet heads characterised by nozzle shapes or number of orifices per chamber

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)

Abstract

A nozzle plate (8) has a first nozzle layer (1) and a second nozzle layer (2). The first nozzle layer (1) has a first nozzle hole (11a), and is provided on the fluid discharge side and thin. The second nozzle layer (2) is layered on the fluid supply side of the first nozzle layer (1) and thicker than the first nozzle layer (1), and has a second nozzle hole (11b) communicating with the first nozzle hole (11a) and forming a nozzle hole (11) together with the first nozzle hole (11a). A first electrode layer (25) formed on the inner wall of the first nozzle hole (11a) and a second electrode layer (26) formed on the inner wall of the second nozzle hole (11b) are electrically connected. A nozzle plate suitable for electrostatic suction-type fluid discharge device discharging an ultra-micro amount of fluid is provided. In the nozzle plate, an electrode is stably formed in the vicinity of a nozzle head portion, nozzle holes are easily made to be electrically independent from each other, and a drive signal for the electrode formed in the nozzle hole can be applied from the fluid supply side of the nozzle plate.

Description

200523123 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種用於排 嘴式平板,進一步詳細而言 由靜電吸引,排出流體至對 裝置之噴嘴式平板。 【先前技術】 出墨等流體之流體排出頭之噴 ’係關於用於使流體帶電,藉 象物上之靜電吸引型流體排出 般而σ有各種將墨等流體(排出材剩^排至對象物(記 錄媒體)上之流體噴射方式。此處係說明使用墨作為流體之 喷墨方式。 應求型(On demand type)噴墨方式開發出··利用壓電現象 之壓電方式,利用墨之膜沸騰現象之熱方式,及利用靜電 現象之靜電吸引方式等。特別是近年來強烈要求高解像度 之喷墨方式。為求實現高解像度之噴墨記錄,必須將排出 之墨液滴予以微小化。 此時,自喷嘴排出之墨液滴噴灑在記錄媒體前之動作, 可藉由以下之運動方程式(公式(1))來表示。 p ink · (4/3 ·疋· d3) · dv/dt =-Cd · (1/2 · p air · v2) · (π · d2/4).....⑴ 上述p ink係墨之體積密度,v係液滴速度,cd係抗力係 數’ P air係空氣之密度,d係墨液滴半徑,cd可藉由以下 公式(2)來表示。200523123 IX. Description of the invention: [Technical field to which the invention belongs] The present invention relates to a nozzle-type flat plate which is more specifically attracted by static electricity and discharges fluid to the nozzle-type flat plate of the device. [Prior art] The spraying of a fluid discharge head of a fluid such as ink is used to charge the fluid and discharge it by an electrostatically attracted fluid on the object. There are various fluids such as ink (exhaust material remaining ^ is discharged to the object). A fluid ejection method on an object (recording medium). Here is an explanation of an inkjet method using ink as a fluid. On demand type inkjet method has been developed... Piezoelectric method using piezoelectric phenomenon, using ink The thermal method of film boiling phenomenon and the electrostatic attraction method using electrostatic phenomenon. Especially in recent years, high-resolution inkjet method is strongly required. In order to achieve high-resolution inkjet recording, the discharged ink droplets must be minute At this time, the movement of the ink droplet discharged from the nozzle before spraying on the recording medium can be expressed by the following motion equation (formula (1)): p ink · (4/3 · 疋 · d3) · dv / dt = -Cd · (1/2 · p air · v2) · (π · d2 / 4) ..... ⑴ The above ink is the volume density of the ink, v is the droplet velocity, and cd is the resistance coefficient. P air is the density of air, d is the ink droplet radius, and cd is determined by Formula (2) below.

Cd=24/Re · (1+3/16 · Re0 62).........(2) 上述Re係雷諾數(Reyn〇lds number),將空氣黏度設為” 95731.doc 200523123 時’可藉由以下公式(3)來表示。Cd = 24 / Re · (1 + 3/16 · Re0 62) ......... (2) The above Re series Reynolds number (Reynolds number), set the air viscosity to "95731.doc 200523123 Hour 'can be expressed by the following formula (3).

Re=2 · d · p ink · v/ ...........· ·⑺ 上述公式(1)左邊之液滴半徑對墨液滴之運動能之影響 大於液滴半徑對空氣黏性阻力之影響。因而,在相同速度 下,液滴愈小,液滴速度之減速愈快,而無法到達離開特 定距離之記錄媒體,或是即使到達,而喷灑精確度差。 為求防止此種情事,須提高液滴之排出初速,亦即須提 南每單位體積之排出能。 但疋’先前之壓電方式及熱方式之喷墨頭,在將排出液 滴予以微小A,亦即提高排出液滴之每單位體積之排出能 的情況下,具有以下所示之問題,因而欲使排出液滴量為Re = 2 · d · p ink · v / ........... · · ⑺ The above formula (1) The influence of the droplet radius on the left on the kinetic energy of the ink droplet is greater than the droplet radius on the air The effect of viscous resistance. Therefore, at the same speed, the smaller the droplet, the faster the speed of the droplet is decelerated, and it is impossible to reach the recording medium that leaves a certain distance, or even if it reaches, the spray accuracy is poor. In order to prevent this, the initial velocity of droplet discharge must be increased, that is, the discharge energy per unit volume must be raised. However, the conventional piezoelectric and thermal inkjet heads have the following problems when the discharged liquid droplets are given a small A, that is, the discharge energy per unit volume of the discharged liquid droplets is increased. To make the discharged droplet volume be

Ipl以下,亦即使液滴之直徑(以下稱液滴徑)為一㈤以下 特別困難。 問題1 ·壓電方式之噴墨頭之排出能與驅動之壓電元件之 k位s及產生壓力有關。該壓電元件之變位量與墨排出量 亦即墨液滴尺寸密切相關,為求縮小液滴尺寸,亦須降低 變位量。因而,提高排出液滴之每單位體積之排出能困難。 問題2 ·熱方式之噴墨頭,由於係利用墨之膜沸騰現象, 因此形成泡時之壓力有物理性界限,墨之排出能大致由加 熱元件之面積來決定。該加熱元件之面積與產生泡之體 積,亦即與墨排出量大致成正比。因而縮小墨液滴尺寸時, 產生泡之體積變小,排出能變小。因此,提高墨之排出液 滴之每單位體積之排出能困難。 問題3 ·由於壓電方式及熱方式之驅動(加熱)元件之驅動 95731.doc 200523123 量均與排出量密切相關,因此 寸牯,抑制其偏差非常困難。 因此,為求解決上述各問題 式排出微小液滴之方法。 靜電吸引方式,自噴嘴排出 下之公式(4)所示。 ’特別是排出微小之液滴尺 ’而開發出藉由靜電吸引方 之墨液滴之運動方程式如以 ^ ink · (4/3 · ^ . d3) . dv/dt (4) =q.E_Cd.(1/2· ,____ 其中,q係液滴之電荷量,E係周圍之電場強度。 從上述公4.⑷可知靜電吸引方式,其排出之液滴與排出 能不同’即使在飛散中亦承受靜電力。因而可減輕每單位 體積之排出能,可適用於排出微小液滴。 /匕種靜電吸引方式之噴墨裝置(以下稱靜電吸引型喷墨 裝置),如在曰本公開專利公報「特開平8_238774號公報(公 開曰期:娜年9月17日)」中揭示有:在噴嘴更㈣設置 電壓施加敎電極之❹裝置。此外,日本公開專利公報 「特開2_-127410號公報(公開曰期:2〇〇〇年5月9曰)」中 揭示有:將喷嘴形成細縫,設置自噴嘴突出之針狀電極, 而排出包含微粒子之墨之噴墨裝置。 參照圖Π說明揭示於上述曰本公開專利公報「特開平 8-238774號公報(公開曰期·· 1996年9月17日)」之噴墨裝置 如下。圖17係喷墨裝置之剖面模式圖。 、 圖中之101表示墨噴射室,1〇2表示墨,103表示墨室,1〇4 表不噴嘴孔,105表示墨槽,1〇6表示墨供給路徑,表示 9573l.d〇( 200523123 旋轉滾筒,108表示記錄媒體 示處理控制部。 110表示控制元件部,丨^表 加 係、配置於墨喷射室⑻之墨室103側之靜電場施 之相二部,115係設置於旋轉滾筒1〇7之金屬圓筒⑺— ^ 部,116係在相對電極部115上施加數千v之負電 昼之偏壓電源部。117係在靜電場施加用電極部114上供給 數百V士之高電壓之高廢電源部,118係接地部。 此時’在靜電場施加用電極部114與相對電極部⑴之 間’施加於相對電極部115之數千V之負電壓之偏壓電源部 /數百高壓電源部117之高電麼重疊,而形成重疊電 場’藉由該重疊電場來控制自噴嘴孔104排出墨102。 此外,119係藉由施加於相對電極部115之數千乂之偏壓而 形成於噴嘴孔104之凸狀彎月部。 以下4明上述構造之靜電吸引方式之噴墨裝置之動作。 "先土 102藉由毛細管現象,經過墨供給路徑106而送 達排出墨102之喷嘴孔1〇4。此時,與噴嘴孔1〇4相對,配置 有安裝記錄媒體1 〇8之相對電極部丨丨5。 到達噴嘴孔104之墨1〇2藉由施加於相對電極部115之數 千之偏G而形成凸狀之墨彎月部11 9。藉由在配置於墨室 103内之靜電場施加用電極部114上,自數百v之高壓電源部 117施加信號電壓,而與來自施加於相對電極部115之偏壓 電源部116之電壓重疊,墨1〇2藉由重疊電場排出至記錄媒 體10 8 ’而形成印字圖像。 蒼照圖18(a)〜圖18(C)說明上述日本公開專利公報「特開 9573l.doc 200523123 平㈣川號公報(公開曰期:1996年9月17 喷墨裝置之液滴飛散前之彎月部動作如下。」^不 產=電:前’如圖18⑷所示,藉由施加於墨之㈣ 成有凸: '广墨之表面張力之平衡,而成為在墨表面形 成有凸起之彎月部119a之狀態。 在上述狀態下施加驅動電壓時, _ 18(b)所示,彎月邬 11 9b係形成因液表面上產生 ^ 弘仃開始向液面之凸起中心 木中,猎此,形成液面之凸起中提 τ 捉回之穹月部119b。It is particularly difficult to make the diameter of a droplet (hereinafter referred to as the droplet diameter) 1 μm or less. Problem 1 The discharge energy of the piezoelectric inkjet head is related to the k-position s of the driven piezoelectric element and the pressure generated. The displacement amount of the piezoelectric element is closely related to the ink discharge amount, that is, the ink droplet size. In order to reduce the droplet size, the displacement amount must also be reduced. Therefore, it is difficult to increase the discharge energy per unit volume of the discharged liquid droplets. Problem 2 · The thermal inkjet head uses the film boiling phenomenon of the ink, so the pressure when forming the bubble has a physical limit, and the discharge energy of the ink is roughly determined by the area of the heating element. The area of the heating element is proportional to the volume of the bubble generation, that is, it is approximately proportional to the ink discharge amount. Therefore, when the size of the ink droplets is reduced, the volume of bubbles generated becomes smaller, and the discharge energy becomes smaller. Therefore, it is difficult to increase the discharge energy per unit volume of ink discharge droplets. Question 3 · Because the driving of the piezoelectric (thermal) driving (heating) element 95731.doc 200523123 is closely related to the discharge volume, it is very difficult to suppress the deviation. Therefore, in order to solve the above-mentioned problems, a method of discharging minute liquid droplets is used. The electrostatic suction method is shown by the formula (4) below the nozzle. 'Especially for the discharge of tiny droplet gauges', the motion equation of ink droplets attracted by electrostatic attraction has been developed as ^ ink · (4/3 · ^. D3). Dv / dt (4) = q.E_Cd . (1/2 ·, ____ Among them, q is the charge of the droplets and E is the electric field strength around it. From the above-mentioned public 4.⑷, we know that the electrostatic attraction method, the discharged droplets and the discharge energy are different 'even in scattering. It can also withstand electrostatic force. Therefore, the discharge energy per unit volume can be reduced, and it can be used to discharge tiny liquid droplets. / Inkjet device of electrostatic suction method (hereinafter referred to as electrostatic suction type inkjet device), as described in this patent The publication "Japanese Patent Application Laid-Open No. 8_238774 (publication date: September 17, 2007)" discloses that a device for applying a voltage application electrode to a nozzle is provided. In addition, Japanese Patent Application Laid-Open No. 2_-127410 The bulletin (publication date: May 9, 2000) "discloses that an inkjet device is provided with a slit formed in a nozzle, a needle electrode protruding from the nozzle, and an ink containing fine particles is discharged. See Figure Π The description is disclosed in the above-mentioned Japanese Patent Laid-Open Publication No. Hei 8 -238774 (Publication Date · September 17, 1996) "The inkjet device is as follows. Figure 17 is a schematic cross-sectional view of the inkjet device. 101 in the figure indicates an ink ejection chamber, and 102 indicates ink. , 103 indicates an ink chamber, 104 indicates a nozzle hole, 105 indicates an ink tank, 10 indicates an ink supply path, and 9573l.d0 (200523123 rotates a roller, 108 indicates a recording medium and indicates a processing control unit. 110 indicates a control element. There are two parts of the electrostatic field applied on the 103 side of the ink chamber 103 of the ink ejection chamber 表, and 115 are arranged on the metal cylinder ⑺ of the rotating drum 107, and the 116 is on the opposite side. A bias power supply unit of thousands of volts of negative electric day is applied to the electrode unit 115. 117 is a high-waste power supply unit that supplies a high voltage of several hundred V to the electrostatic field application electrode unit 114, and 118 is a grounding unit. Between the electrostatic field applying electrode portion 114 and the counter electrode portion ⑴, the high voltage of the bias power supply portion / hundreds of high voltage power supply portions 117 of a negative voltage of several thousand V applied to the counter electrode portion 115 overlaps to form an overlap. The electric field 'controls the discharge of the ink 102 from the nozzle hole 104 by this overlapping electric field. 119 is a convex meniscus formed in the nozzle hole 104 by a bias voltage of several thousand 乂 applied to the opposite electrode portion 115. The following describes the operation of the inkjet device of the electrostatic suction method with the above structure. &Quot; First The capillary 102 passes through the ink supply path 106 to the nozzle hole 10 of the ink 102 through the capillary phenomenon. At this time, opposite to the nozzle hole 104, a counter electrode portion on which the recording medium 108 is mounted is arranged. 5 The ink 102 that has reached the nozzle hole 104 forms a convex ink meniscus 11 by applying a bias G of several thousands to the electrode portion 115. By applying a signal voltage from the high-voltage power supply section 117 of several hundred volts to the electrostatic field application electrode section 114 disposed in the ink chamber 103, the signal voltage is superimposed on the voltage from the bias power supply section 116 applied to the opposite electrode section 115. The ink 102 is discharged to the recording medium 10 8 ′ by the superimposed electric field to form a printing image. Figures 18 (a) to 18 (C) illustrate the above-mentioned Japanese Laid-Open Patent Gazette "Japanese Patent No. 9573l.doc 200523123 Hirahatagawa Gazette (Publication Date: September 17, 1996). The action of the meniscus is as follows. "^ Production = Electric: Front ', as shown in Figure 18 (b), is convex by applying to the ink:' The balance of the surface tension of the broad ink forms a protrusion on the ink surface. The state of the meniscus 119a. When the driving voltage is applied in the above state, as shown in _18 (b), the meniscus 911 9b is formed due to the formation on the liquid surface. , Hunting this, forming the raised surface of the liquid surface raised τ captured dome moon part 119b.

而後,繼續施加驅動電壓時, ^ L ^ r 口 S(c)所不,藉由液表 之1何進一步集中於中心,而形成所謂泰勒連線 (咖_eet_)之半月狀之f月部i i9e,在集中於該奉 勒連線頂部之電荷量之靜電力超過墨之表面張力之階段, 液滴分離而排出。 其次,參照圖19說明上述日本公開專利公報「特開 2_^2741()號公報(公開日期:謂年⑷日)」中揭示之 贺墨裝置如下。圖19係喷墨裝置之概略構造圖。 如圖所7F ’在噴墨裝置之保持構件内部收納有··以低電 介質材料(丙烯基樹脂、陶竟等)形成之線形記錄頭211,作 =賀墨頭;與該記錄頭211之墨排出孔相對而配置之金屬或 问:7丨貝製之相對電極210;在非導電性之墨媒體内儲存有 使帶電顏料粒子分散之墨用之墨槽212 ;使墨在墨槽212與 。己錄頭2 11之間循環之墨循環系統(泵2 12丨扑、管21 $ & 21外);分別施加吸引形成記錄圖像個像素之墨液滴用 之脈衝弘壓至各排出電極211 a之脈衝電壓產生裝置2丨3 ;依 95731.doc -10- 200523123 據圖像資料來控制脈衝電壓產生裝置213之驅動電路(圖上 未顯示);使記錄媒體230通過設於記錄頭211與相對電極 2 10間之間隙之記錄媒體搬運機構(圖上未顯示);及控制整 個裝置之控制器(圖上未顯示)等。 上述墨循環系統係藉由:連接記錄頭2丨丨與墨槽2丨2間之 兩條官215a,215b,及藉由控制器之控制而驅動之兩台泵 214a,214b 而構成。 而後’上述墨循環系統區分成··供給墨至記錄頭211用之 墨供給系統,及自記錄頭211回收墨用之墨回收系統。 墨供給系碑以泵214a自墨槽212内吸引墨,其經由管215a 壓送至圯錄頭211之墨供給部。另外,墨回收系統以泵2丨5b 自記錄頭211之墨回收部吸引墨,其經由管215b而強制性回 收至墨槽212内。 此外’如圖20所示,在上述記錄頭21丨内設有:將自墨供 給系統之管215a送入之墨擴大成線寬之墨供給部22〇a,將 來自墨供給部220a之墨導引成外凸形(山形)之墨流路221, 連接墨流路221與墨回收系統之管215b之墨回收部220b,將 墨流路221之頂點開放於相對電極21〇側之適當寬度(約〇.2 之細縫狀墨排出孔222 ,以特定間距(約〇·2 mm)排列於 墨排出孔222内之數個排出電極211a,及分別配置於各排出 電極211 a之兩側及上面之低電介質製(如陶瓷製)之隔離壁 223。 上述各排出電極21 la分別以銅、鎳等金屬形成,其表面 形成有浸潤性佳之防顏料附著用低電介質膜(如聚醯亞胺 9573 l.doc -11 - 200523123 膜)。此外,各排出電極2:^之前端形成三角錐形狀,並分 別僅以適當長度(7〇 μιη〜8〇 μιη)自墨排出孔222向相對電極 2 10側突出。 上述之圖上未顯示之驅動電路依據控制器之控制,僅於 依據圖像資料内所含之色調資料之時間供給控制信號至脈 衝私壓產生裝置213。藉此,脈衝電壓產生裝置213將依其 控制信號種類之脈衝頂部之脈衝Vp乘載於偏壓vb之高電 廢信號重疊於偏壓Vb而輸出。 而後,控制器送達圖像資料時,驅動墨循環系統之兩台 泵214a,214b—。藉此,自墨供給部22〇a壓送墨,並且墨回收 部220b成為負壓,流入墨流路221之墨以毛細管現象流入各 隔離壁223之間隙,浸潤至各排出電極2Ua之前端。此時, 由於在各排出電極21 la之前端附近之墨液面施加負壓,因 此分別在各排出電極211 a之前端形成墨彎月部。 再者,藉由控制器控制記錄媒體搬運機構,而沿著圖中 $頭顯示之特定方向輸送記錄媒體23〇,並且藉由控制驅動 電路,而在與排出電極211a之間施加前述之高電壓信號。 其次,參照圖21〜圖24,說明上述日本公開專利公報「特 開200(M 2741〇號公報(公開日期:2000年5月9日)」所揭示 之喷墨裝置之液滴飛散前之彎月部動作如下。 如圖21所示,來自脈衝電壓產生裝置213之脈衝電壓施加 於記錄頭211内之排出電極211a時,產生自排出電極21_ 向相對電極210側之電場。此時由於使用前端尖銳之排出電 極211a,因此其前端附近產生最強之電場。 95731.doc -12- 200523123 ,產生此種電場時,如圖22所示’墨溶媒中之各個帶電顏 料粒子20la分別藉由來自該電場之力(圖Η)而向墨液面 移動。藉此,墨液面附近之顏料濃度濃縮。 册於顏料濃度濃縮時,如圖23所示,在墨液面附近,數個 π電顏料粒子2〇la開始靠近電極之相反側聚集。而後,顏 料凝聚體201開始球狀地成長於墨液面附近時,各個來自該 顏料凝聚體2(H之靜電排斥力f讓開始作用於各個帶電顏 料粒子201a°亦即,來自顏料凝聚體2〇1之靜電排斥力卜⑽Then, when the driving voltage is continuously applied, ^ L ^ r port S (c) does not concentrate on the center of the surface of the liquid meter to form a half-moon-shaped f-moon part of the so-called Taylor connection (Ca_eet_). i i9e, at a stage where the electrostatic force concentrated on the top of the Fengle line exceeds the surface tension of the ink, the droplets are separated and discharged. Next, the congratulatory device disclosed in the aforementioned Japanese Laid-Open Patent Publication No. 2_ ^ 2741 () (publication date: the following day) is described with reference to FIG. 19 as follows. Fig. 19 is a schematic configuration diagram of an inkjet device. As shown in FIG. 7F ', a linear recording head 211 made of a low-dielectric material (acrylic resin, ceramic, etc.) is contained in the holding member of the inkjet device, and is used as a congratulating ink head; and the ink of the recording head 211 The metal or the discharge holes are arranged opposite to each other: 7 丨 the opposing electrode 210 made of shell; an ink tank 212 for dispersing charged pigment particles is stored in a non-conductive ink medium; and the ink is arranged in the ink tank 212. Ink circulation system that circulates between the head 2 and 11 (pump 2 12 丨 puff, tube 21 $ & 21 outside); pulses are applied to each discharge electrode to attract the ink droplets that form the pixels of the recorded image 211 a pulse voltage generating device 2 丨 3; according to 95731.doc -10- 200523123 to control the driving circuit of the pulse voltage generating device 213 (not shown) according to the image data; the recording medium 230 is passed through the recording head 211 A recording medium conveying mechanism (not shown in the figure) with a gap between the opposite electrode 2 and 10; and a controller (not shown in the figure) that controls the entire device. The above-mentioned ink circulation system is constituted by connecting two officials 215a, 215b between the recording head 2 丨 丨 and the ink tank 2 丨 2, and two pumps 214a, 214b driven by the control of the controller. Then, the above-mentioned ink circulation system is divided into an ink supply system for supplying ink to the recording head 211 and an ink recovery system for recovering ink from the recording head 211. The ink supply system uses a pump 214a to suck ink from the ink tank 212, and the pressure is fed to the ink supply unit of the recording head 211 via a tube 215a. In addition, the ink recovery system sucks ink from the ink recovery section of the recording head 211 with a pump 2b and 5b, and forcibly recovers the ink into the ink tank 212 through the tube 215b. In addition, as shown in FIG. 20, the recording head 21 丨 is provided with an ink supply section 22a for expanding the ink fed from the tube 215a of the ink supply system to a line width, and ink from the ink supply section 220a. Guide the ink flow path 221 in a convex shape (mountain shape), connect the ink flow path 221 to the ink recovery part 220b of the tube 215b of the ink recovery system, and open the vertex of the ink flow path 221 to an appropriate width on the side of the opposite electrode 21 (Slit-like ink discharge holes 222 of about 0.2, a plurality of discharge electrodes 211a arranged in the ink discharge holes 222 at a specific pitch (about 0.2 mm), and arranged on both sides of each discharge electrode 211a And the above-mentioned low-dielectric (such as ceramic) separation wall 223. Each of the above discharge electrodes 21a is formed of metal such as copper, nickel, etc., and a low-dielectric film for preventing pigment adhesion (such as polyurethane) is formed on its surface. Amine 9573 l.doc -11-200523123 film). In addition, each discharge electrode 2: ^ is formed into a triangular pyramid shape at the front end, and each is discharged from the ink discharge hole 222 to the opposite electrode only with an appropriate length (70 μm to 80 μm). 2 The 10 side protrudes. The driving circuit basis not shown in the above figure The control of the controller supplies the control signal to the pulse private pressure generating device 213 only based on the time of the tone data contained in the image data. Thus, the pulse voltage generating device 213 will pulse Vp at the top of the pulse according to the type of the control signal. The high-voltage waste signal carried by the bias voltage vb is superimposed on the bias voltage Vb and output. Then, when the controller sends the image data, the two pumps 214a, 214b of the ink circulation system are driven. By this, the ink supply unit 22 〇a The ink is fed by pressure, and the ink recovery unit 220b becomes a negative pressure. The ink flowing into the ink flow path 221 flows into the gaps of the partition walls 223 by a capillary phenomenon, and infiltrates the front ends of the respective discharge electrodes 2Ua. A negative pressure is applied to the ink surface near the front end of 21 la, so the ink meniscus is formed at the front end of each discharge electrode 211 a. Furthermore, the recording medium conveyance mechanism is controlled by the controller, and is shown along the $ head in the figure. The recording medium 23 is conveyed in a specific direction, and the aforementioned high voltage signal is applied between the recording medium 23 and the discharge electrode 211a by controlling the driving circuit. Next, the above-mentioned Japanese publication will be described with reference to FIGS. 21 to 24. The operation of the meniscus before the liquid droplets of the inkjet device disclosed in the Lee Gazette "Japanese Patent Publication No. 200 (M 27410 (Publication Date: May 9, 2000)" is as follows. As shown in FIG. 21, from the pulse When the pulse voltage of the voltage generating device 213 is applied to the discharge electrode 211a in the recording head 211, an electric field is generated from the discharge electrode 21_ to the opposite electrode 210 side. At this time, because the discharge electrode 211a having a sharp tip is used, the strongest is generated near the tip 95731.doc -12- 200523123 When such an electric field is generated, as shown in FIG. 22, each of the charged pigment particles 20la in the ink solvent moves toward the ink surface by the force from the electric field (Figure Η). Thereby, the pigment concentration near the ink surface is concentrated. When the pigment concentration is concentrated, as shown in FIG. 23, near the ink surface, several π electric pigment particles 201a start to gather near the opposite side of the electrode. Then, when the pigment agglomerates 201 began to grow spherically near the ink surface, each electrostatic aggregative force f from the pigment agglomerates 2 (H began to act on each of the charged pigment particles 201a °, that is, from the pigment agglomerates 2 〇1 static repulsive force

與=自脈衝電麼之電場E之力之合力f _分別作用於各 個帶電顏料轉子2 〇 1 a。 取因此二在帶電顏料粒子間之靜電排斥力未超過彼此之凝 承力之乾圍内’朝向顏料凝聚體201之合力f total作用之帶 ,貝料粒子2Gla(在連結排出電極2m之前端與顏料凝聚體 之中。之直線上之帶電顏料粒子上 力卿來自顏料凝聚體201之靜電排斥力f_時;二 ⑽)’ π電顏料粒子2〇u成長於顏料凝聚體加。 自η個帶電顏料粒子2〇la所形成之顏料凝聚體2〇ι承受 自脈衝電壓之電場E之靜電排斥力邱,另外承受來自墨溶 之約束力F esc。饍恭灿匕丄 静包排斥力FE與約束力Fesc平衡時,顏 ;矢是聚體201以自黑、、右二灿 ^液面稍微突出之狀態穩定。The combined force f_ of the force of the electric field E from the self-pulsed electric power acts on each of the charged pigment rotors 2 0 a. Take the band where the electrostatic repulsive force between the charged pigment particles does not exceed the cohesive force of each other 'toward the total force f total of the pigment aggregate 201, and the shell material particles 2Gla (connected to the front end of the discharge electrode 2m and Among the pigment aggregates, the charged pigment particles on the straight line are charged with electrostatic repulsive force f_ from the pigment aggregate 201; ii) 'π electric pigment particles 20u grow in the pigment aggregate. The pigment aggregate 20m formed from the n charged pigment particles 20la is subjected to the electrostatic repulsion force Qi of the electric field E from the pulse voltage, and additionally subjected to the binding force F esc from the ink dissolution. When the static repulsion force FE and the binding force Fesc are balanced, Yan Gongcan's dagger is stable, and the polymer 201 is in a state where the liquid level is slightly protruding from the black and right.

靜電排斥力FE超過約束力jp ’顏料凝聚體2 0 1自墨液面 再者,顏料凝聚體2〇丨成長, eSC時,如圖24(a)〜圖24(c)所示 200a脫離。 再者 先前之靜電吸引方式之原理 係使電荷集中於彎 95731.doc -13- 200523123 月部之中心來產生彎月部之隆起。該隆起之泰勒連線&山 部之曲率半徑係依電荷之集中量而定,集中 #月"而 曰 电何量與電 場強度之靜電力大於此時之彎月部之表面張力 一 始分離。 液滴開 由於彎月部之最大電荷量係依墨之物性值與彎月邻 率半徑而定,因此最小之液滴尺寸係由墨之物性值(特別是 表面張力)與形成於彎月部之電場強度而定。 疋 一般而言,液體之表面張力,其含溶劑者之表面張力低 於純粹之溶媒,即使在實際之墨中亦含各種溶劑,因此提 高表面張力®難。因而,考慮墨之表面張力一定時,係採 取藉由提高電場強度,來縮小液滴尺寸之方法。 但是如上所述,先前之靜電吸引方式係採取藉由提高電 場強度來縮小液滴尺寸之方法,不過上述日本公開專利公 報「特開平8-238774號公報(公開日期:1996年9月17曰)」 及上述日本公開專利公報「特開2〇〇〇-12741〇號公報(公開曰 期:2000年5月9日)」所揭示之喷墨裝置,兩者之排出原理 均係藉由在遠比排出液滴之投影面積大之彎月部區域形成 強電場強度之場,使電荷集中於該彎月部之中心,藉由包 含该集中之電荷與形成之電場強度之靜電力來進行排出, 口此而要轭加約200〇 V之非常高之電壓,導致驅動控制 困難,亚且在操作噴墨裝置上亦存在安全性方面之問題。 針對於此種問題努力檢討結果,查明在某噴嘴徑以下, 引起與先W之流體排出模型不同之排出膜型之排出現象, 藉由縮小排出墨部分(開始排出部)之寬度或直徑,不施加高 95731.doc -14- 200523123 電壓即可提Γ§3電場強度。 以下,使用圖25(a)及圖25(b)考察靜電吸引型之微量流體 排出之基本特性,特別是儲存於喷嘴前端之彎月部之電荷 形成之表面電位。 首先,如圖25(a)所示,將靜電吸引型流體排出裝置之單 純構造予以模型化。單純模型在前端之尖銳喷嘴250之内部 設有驅動電極25 1,排出材料252填充於整個喷嘴内部。而 後,與喷嘴前端面相對來配置基板254,並藉由背面電極255 接地。 形成此種旱純構造模型時,由於自電源2 5 6流出之電荷係 通過喷嘴250内部之排出材料之流體252内部,而在噴嘴前 端具靜電電容之彎月部257上與基板254相對,因此可假定 為圖25(b)所示之電源電壓V〇與喷嘴内部之電阻R,以及彎 月部257與基板254間之靜電電容C之串聯電路。 V〇RC之串聯電路可使用彎月部257上之儲存電荷Q⑴表 示如下。 R dQ(t)/dt + Q(t)/C= V〇.......(5) 求解該公式(5)之微分方程式時,彎月部表面之儲存電荷Q(t) 及彎月部表面電位V(t)可表示如下。 Q⑴=CV〇[l-exp(-t/RC)].....(6) V(t)= V〇[l-exp(-t/RC)]......(7) 如上所述可知,某時刻t之彎月部表面之儲存電荷Q(t)及 彎月部表面電位V⑴取決於喷嘴250内部之電阻R以及彎月 部25 7與基板254間之靜電電容C。亦即,此種構造之靜電吸 95731.doc -15- 200523123 引型流體排出裝置中,藉由縮小喷嘴25〇内部之電阻R,容 易在彎月部257表面儲存電荷,可縮短排出流體乃]前所需· 之日守間。亦即,可提向排出頻率,可進行高速描繪。 - 降低上述噴嘴250内部之電阻R之具體對策,須儘量使驅 動電極251接近於喷嘴250之墨端。 曰本公開專利公報「特開平10_1753〇5號公報(公開日 /月1998年6月30曰)」中揭示有在靜電吸引型喷墨喷嘴之 噴嘴孔内部形成電極之技術。圖26係顯示日本公開專利公 報「特開平10-175305號公報(公開日期:199時6月細)」籲 之喷嘴式平%製程之剖面圖。使用圖26說明曰本公開專利 么報4寸開平10-1 75305號公報(公開日期:1998年6月3〇日)」 之構造。 ㈤之301係喷嘴式平板,在喷嘴式平板3〇ι内預先形成 有數個墨貯存用凹部A·..,該嘴嘴式平板3(H之未形成墨貯 子用凹β A之面上塗敷加工不固定導電用電鑛3G3之光阻 層3〇2。而後,形成有貫穿噴嘴式平板如及光阻層逝之喷 嘴孔B而連通於各墨貯存用凹部A後,在喷嘴内周實施導電 用電鍍303。此時由於朵_ μ 、先阻層302係選擇不固定導電用電鍍 如之材料,因此導電用電㈣3僅在喷嘴式平板如内部及 實嘴式平板3〇1之未形成光阻層302之面上固定。如此,日 本公開專利公報「㈣平丨G_丨753㈣公報(公開日期··⑽ 年6月30日)」在贺嘴孔内部形成電極層(導電用電鍍3。 此外’日本公料利公報「特開平以繼號公報(公開 曰,月· 1999年2月16日)」中揭示有在靜電吸引型噴墨頭之 95731.doc -16- 200523123 貝觜式平板與記錄媒體相對面上形成電極之構造。圖27係 頒不日本公開專利公報「特開平u_42784號公報(公開日 』· 1999年2月16日)」之喷墨頭構造之說明圖。使用圖27 來祝明日本公開專利公報「特開平丨丨一”料號公報(公開日 期·· 1999年2月16日)」。 贺墨頭在絕緣控制基板411之表面形成控制電極4〇丨,並 且在其背面形成有控制電極術,並形成有自墨槽43〇貫穿 之墨排出孔413,使墨可通過控制電極4〇1或4〇2。在前述墨 排出孔413上設置突起之墨導引4丨2,施加於控制電極4〇〔 之私壓產生之私場集中於墨導引4丨2之前端,墨滴4 Μ 藉由該電場向經由相對電極42〇而設置之記錄媒體42ι飛 散。 但是,該日本公開專利公報「特開平1〇_1753〇5號公報(公 開曰期:i998年6月30曰)」及曰本公開專利公報「特開平 142784號公報(公開日期:刚⑷月16日)」所揭示之方The electrostatic repulsive force FE exceeds the binding force jp ′ and the pigment aggregates 201 are from the ink surface. Furthermore, the pigment aggregates 20 grow and eSC is separated as shown in FIG. 24 (a) to FIG. 24 (c). Furthermore, the principle of the previous electrostatic attraction method is to concentrate the charge in the center of the meniscus 95731.doc -13- 200523123 to generate the meniscus bulge. The radius of curvature of the Taylor line of the bulge & the mountain is determined by the concentration of the charge, and the electrostatic force of the amount of electricity and electric field strength is greater than the surface tension of the meniscus at this time. Separation. Since the maximum charge of the meniscus is determined by the physical properties of the ink and the radius of the meniscus adjacent rate, the smallest droplet size is determined by the physical properties of the ink (especially the surface tension) and the meniscus formed. It depends on the electric field strength.疋 In general, the surface tension of a liquid is lower than that of a pure solvent, even if it contains various solvents in the actual ink. Therefore, it is difficult to increase the surface tension®. Therefore, when the surface tension of the ink is considered constant, a method of reducing the droplet size by increasing the electric field strength is adopted. However, as described above, the conventional electrostatic attraction method has adopted a method of reducing the droplet size by increasing the electric field strength. However, the aforementioned Japanese Laid-Open Patent Publication No. 8-238774 (publication date: September 17, 1996) "And the inkjet device disclosed in the aforementioned Japanese Laid-Open Patent Gazette" Japanese Laid-Open Patent Publication No. 2000-12741 (Publication Date: May 9, 2000) ". The meniscus area, which is larger than the projected area of the discharged droplets, forms a field with a strong electric field intensity, so that the electric charge is concentrated in the center of the meniscus, and is discharged by an electrostatic force including the concentrated electric charge and the formed electric field strength. Because of this, a very high voltage of about 200V is required for the yoke, which makes driving control difficult, and there are also safety issues in operating the inkjet device. In view of such problems, we worked hard to review the results, and found out that below a certain nozzle diameter, the discharge phenomenon of a discharge film type different from the previous fluid discharge model was caused. By reducing the width or diameter of the ink discharge portion (starting discharge portion), Without applying high 95731.doc -14- 200523123 voltage, Γ§3 electric field strength can be improved. 25 (a) and 25 (b) will be used to examine the basic characteristics of the discharge of the electrostatically attracted microfluid, especially the surface potential formed by the charge stored in the meniscus at the tip of the nozzle. First, as shown in Fig. 25 (a), a simple structure of an electrostatic attraction type fluid discharge device is modeled. In the simple model, the driving electrode 251 is provided inside the sharp nozzle 250 at the front end, and the discharge material 252 is filled in the entire nozzle. Then, the substrate 254 is disposed opposite to the front end surface of the nozzle, and is grounded via the back electrode 255. When forming such a dry-pure structure model, the charge flowing from the power source 2 5 6 passes through the inside of the fluid 252 of the discharge material inside the nozzle 250, and the meniscus portion 257 with electrostatic capacitance at the front end of the nozzle is opposed to the substrate 254. A series circuit of the power supply voltage V0 and the resistance R inside the nozzle, and the electrostatic capacitance C between the meniscus 257 and the substrate 254 shown in FIG. 25 (b) can be assumed. The series circuit of V0RC can be expressed as follows using the stored charge Q⑴ on the meniscus 257. R dQ (t) / dt + Q (t) / C = V〇 ....... (5) When solving the differential equation of the formula (5), the stored charge Q (t) on the surface of the meniscus and The meniscus surface potential V (t) can be expressed as follows. Q⑴ = CV〇 [l-exp (-t / RC)] ..... (6) V (t) = V〇 [l-exp (-t / RC)] ... (7) As described above, it can be known that the stored charge Q (t) and the meniscus surface potential V⑴ at the time t depend on the resistance R inside the nozzle 250 and the electrostatic capacitance C between the meniscus 257 and the substrate 254. That is, in this type of electrostatic suction 95731.doc -15- 200523123 lead-type fluid discharge device, by reducing the resistance R inside the nozzle 25 °, it is easy to store electric charges on the surface of the meniscus 257 and shorten the discharge fluid.] Before the day · Mori. That is, the discharge frequency can be raised and high-speed drawing can be performed. -For the specific countermeasures for reducing the resistance R inside the nozzle 250, the driving electrode 251 must be as close to the ink end of the nozzle 250 as possible. The technique of forming an electrode inside a nozzle hole of an electrostatic suction type inkjet nozzle is disclosed in "Japanese Patent Application Laid-Open No. 10_175305" (publication date / June 30, 1998). Fig. 26 is a cross-sectional view showing a nozzle-type flat% process called "Japanese Patent Application Laid-Open No. 10-175305 (publication date: 199: June)". Using FIG. 26, a description will be given of the structure of the Japanese Patent Publication No. 4 inch Kaiping No. 10-1 75305 (publication date: June 30, 1998). The No. 301 series nozzle plate is formed with a plurality of ink storage recesses A · .. in the nozzle plate 30m, and the nozzle plate 3 (H is not coated with the ink reservoir concave β A surface. The photoresist layer 3202 of the electrically conductive electric ore 3G3 is not applied. Then, a nozzle hole B penetrating the nozzle plate such as the photoresist layer is formed to communicate with each of the ink storage recesses A, and the inner periphery of the nozzle is formed. Conductive electroplating 303. At this time, because the _μ, first resistive layer 302 is selected to not fix the conductive electroplating material, the conductive electrode 3 is only in the nozzle plate such as the interior and the solid nozzle plate 301. The surface on which the photoresist layer 302 is formed is fixed. In this way, the Japanese Laid-Open Patent Gazette ㈣G 丨 丨 753㈣ Gazette (Publication Date · June 30, 2010) is used to form an electrode layer inside the hole of the nozzle (electrolytic plating) 3. In addition, the Japanese Public Information Bulletin "Japanese Patent Publication No. Hei (Publication, Month, February 16, 1999)" discloses that the electrostatic suction type inkjet head is 95731.doc -16- 200523123 The structure of the electrode formed on the opposite surface of the flat plate and the recording medium. Figure 27 is awarded to Japan An illustration of the structure of an inkjet head in the Japanese Patent Laid-Open Publication "Japanese Patent Laid-Open Publication No. 42784 (Publication Date) · February 16, 1999". Use Figure 27 to clarify the material number of Japanese Patent Laid-open Publication "Japanese Patent Laid-Open No. 丨 丨 一" Bulletin (Publication date · February 16, 1999) ". The He ink head is formed with a control electrode 40 on the surface of the insulated control substrate 411, and a control electrode technique is formed on the back surface thereof, and a self ink tank 43 is formed. The penetrating ink discharge hole 413 allows the ink to pass through the control electrode 401 or 402. A protruding ink guide 4 丨 2 is provided on the aforementioned ink discharge hole 413, and is applied to the control electrode 4〇 [ The private field is focused on the front end of the ink guide 4 丨 2, and the ink droplet 4M is scattered by the electric field to the recording medium 42m provided through the opposite electrode 42. However, the Japanese Laid-Open Patent Gazette "Japanese Unexamined Patent Application No. 10_1753" Disclosed in the Official Gazette No. 5 (Publication Date: June 30, i998) and the "Patent Publication No. 142784 (Publication Date: June 16)"

法存在以下之問題’而無法適用於縮小排出墨部分之寬度 或直徑之靜電吸引型流體排出裝置。 X 百先’係日本公開專利公報「特開平1〇_1753〇5號公報(公 開日期:胸年6月30日)」之構造,藉此係在噴嘴式平板 3〇1之媒體相對面以外之區域形成有上述導電電錢3〇3,因 此形成於各墨貯存用凹部Α及噴嘴孔3之導電電鑛朗彼此 電性短路。因而此種噴嘴式平板3〇1無法僅排出指定之⑽ 通道’欲提高描綠圖像之解像度,須電性分離鄰接之通道 95731.doc -17- 200523123 〇方法如有以下所示之①②之方法。 =於形成導電電鑛3G3後’將噴嘴式平板則 存用凹部A···夕里、古人;^ 乂百墨貝丁 3〇3。 之墨抓入面側予以加工’每通道分斷導電電鑛 ②於形成導電電鍍303前,亦在喷嘴式平板3〇1之墨流入面 側^成與排出面相同之光阻層,而作成不增添導電電鑛3〇3 之區域。 *但是,①之形成導電電錢303層後進行分斷之方法,於分 斷加工上使用機械加工時,切削屑等塵埃進入噴嘴孔Β内造 · 成喷嘴堵塞’狗雷射等之熱之分斷力…因熱殘留應力, 賀嘴式平板30 1因上述應力而變形。 《此外,、亦考慮藉由㈣進行分斷加工,不過使用敍刻時, 須在形成於上述噴嘴式平板之墨流入面側之導電電鍍303 f形成光阻圖案。如上所述,為應用於縮小排出墨部分之 寬度或直徑之靜電吸引型流體排出裝置之噴嘴式平板時, 由:係成為具有10辦以下之喷嘴孔者,因此為求提高喷嘴 孔位之加工精確度,須使用約5〇 _之喷嘴式平板母材。但籲 是’如此薄之噴嘴式平板之剛性低,於作成光阻圖案時, 在處理喷嘴式平板中容易變形,而無法形成高精確度之圖 案。 就此上述②之方法亦同,因喷嘴式平板本身薄,即使在 形成導電電鍍3〇3之前,同樣地存在噴嘴式平板變形之問 題,而無法形成精確度佳之光阻圖案,而無法進行良好之 通道分離。 95731.doc -18 - 200523123 再者’日本公開專利公報「 特開平10-1 75305號公報(公 開曰期·· 1998年6月30曰)丨之太、土 、 h之方法,於喷嘴孔徑小達1〇 以下時’電鑛液供給足, 、曾雨 个疋亦有在賀嘴孔内部穩定地形成 V %電鍍極為困難之問題。 ^ 此钤,電鍍液供給最不足處係 士端部。亦如前述,須儘量使電極接近噴嘴之前端, °此則無法在最重要之喷嘴前端部穩定地形成電極。 料,噴嘴㈣小愈可排出微量之流體,財解像度雖 ,,但是反而電極之形成不穩定。因而,各通道之噴嘴 刖端部之喷嘴内部之電阻 %ι κ夂化,糟此,各通道之反應頻率 ’夂,不易今一地控制通道間之排出液適切量。亦即描緣 圖像之印字品質顯著降低。 另外’相#於日本公開專利公報「特開平觀4號公 報(公開日期:19&quot;年2月16日)」中所揭示之噴嘴式平板之 絕緣控制基板411,由於在與記錄媒體421之相對面上形成 有控制電極術,因此可以非常高之精確度設定電極對彎月 部之位置。因而並無日本公開專利公報「特開愤1753〇5 5虎公報(公開日期:1998年6月3G日)」之構造存在之問題, 通迢間之排出穩定性高,與鄰接通道之電性分離充分。 但是,如圖28所示,日本公開專利公報「特開平((aw 號公報(公開日期:1999年2月16日)」之構造,係在絕緣控 制基板川與記錄媒體421之相對面上,亦同時形成有自電 壓施加手段施加電壓於控制電極4〇1用之弓K酉己線4〇5,此 時亦自引出配線彻產生電場。特別是自引出配線405之彎 曲部分405a容易產生集中之電場’如在電氣零件上描緣時 95731.doc -19- 200523123 等,極可能因該電場而損壞電子零件。 【發明内容】 7 本發明之目的在提供_插喊此^ + w 種$嘴式平板及其製造方法,該 育嘴式平板可適用於排出曰 出超镟®流體之靜電吸引型流體排 2衣置,且可在噴嘴前端部近旁敎地形成電極,並且亦 谷易使數個喷嘴孔部間電性 #人v丨a 且J目貝1^式平板之流 體加驅動信號至形成於噴嘴孔部之電極。 為了達成上述目的,本發明之噴嘴式平板係設於靜電吸 型流體排出裝置,其係自噴嘴前端之流體排出孔藉 y及引而排出—藉由施加電壓而帶電之流體,並具有數個喷 鳥孔部’其構造為:具備薄層之第一喷嘴層,其係具有第 :贺嘴孔,並配置於流體排出側,並且至少具備一層第二 噴嘴層,其係層疊於該第一噴嘴層之流體供給側,:上二 第一噴嘴層厚,且與上述第一噴嘴孔連通,並且具有盘第 :嗔嘴孔構成喷嘴孔部之第二喷嘴孔,電性連接成膜㈣ 弟一噴嘴孔内壁之繁_兩士思 ^ (弟私極層與成膜於第二噴嘴孔内壁之 弟一電極層。 根據上述構造,噴嘴式平板係在薄層之第一噴嘴層上至 =疊1厚層之第二喷嘴層,因此可以第二喷嘴層確保 贺背式平板本身之強度及剛性’並可使第一喷嘴層之 十分薄。藉由使層厚變薄,形成於第-噴嘴層之第-噴^ 孔可將孔徑形成例如10μηι以下之超微細,並且可於此種超 微細之第一喷嘴孔内壁,在層厚方向上穩定地將第-電極 層予以成膜,將流體排出面之第一噴嘴孔之開口部作為流 95731.doc -20- 200523123 2排出孔日丁 ’可將第一電極成膜至該流體排出孔近旁。此 可比先則大幅降低噴嘴内部之電阻R,謀求提高流體 之排出頻率,可對記錄媒體高速描繪。 如此形成之第一電極層與形成於與第一喷嘴孔連 通之第嘴孔之第二電極層電性連接,因此,可經由第 二電極層,自喷嘴式平板之流體供給側供給驅動信號。因 此給廢動信號至第一電極層用之引出配線不致接近媒 妝’崎媒體亦不致因自引出配線產生之電場而遭受電性 損傷。 為了達成冬述目的’本發明之噴嘴式平板之製造方法具 備以下步驟··在基板上形 .、 第層,在上述犧牲層上形成 在上、; 在上述第—噴嘴層上形成數個第-噴嘴孔; ί;弟一噴嘴層上’包含各第-噴嘴孔之内壁面,形成 弟一電極層;以殘留 /成 » 弟贺鳴孔内壁與各第一喷嘴孔 周圍部之方式,加工上述第一電極層; = 上,亦包含殘留夕夂蝥币丄 I為層 〜+… 電極層部分’形成第二喷嘴岸; 述第二噴嘴層上將數個第二噴嘴孔以 +、曰, ::體排出側之開口部收納於殘留於上述第一噴; 弟:電極層部分之方式形成;在上述第二噴嘴層:= 各弟一噴嘴孔之内壁面,形成第_兩 L含 第一噴喈7丨門千k 成弟一电極層,及以在鄰接之 二“間電性分離之方式’加工第二電極層。 精此,於剛性高之基板上,經由犧牲層依序居最一 唷嘴層、第-電極層、第二噴 曰且·弟- 貝角層、弟二電極屄。 利用微影技術形成光阻圖案後 曰而’ 由乾式餘刻加工成所 95731.doc -21 - 200523123 需形狀’因此可以非常高之形狀精確度形成第一喷嘴孔、 第二喷嘴孔、第一電極層、第二電極層。 此外,由於喷嘴式平板之流體排出面係藉由犧牲層保護 至步驟之最後階段,因此,在噴嘴式平板製程中,沒有因 流體排出孔受到損傷而流體排出孔變形的危險。因而噴嘴 式平板之製造良率提高。 本發明之另外目的、特徵及優點藉由以下所示之記載即This method has the following problems, and cannot be applied to an electrostatic suction type fluid discharge device that reduces the width or diameter of the ink discharge portion. "X Baixian" is a structure of Japanese Patent Publication "Japanese Patent Application Laid-Open No. 10_175305 (Publication Date: June 30th of the year of the thorax)", and thus is located outside the media-opposite side of the nozzle-type flat plate 301. The above-mentioned conductive electric money 303 is formed in the area, so the conductive electric ore formed in each of the ink storage recesses A and the nozzle holes 3 is electrically short-circuited with each other. Therefore, this nozzle type flat plate 301 can not only discharge the designated channel. To increase the resolution of the green image, the adjacent channels must be electrically separated. 95731.doc -17- 200523123 〇 The method is as follows ①② of method. = After the formation of the conductive electricity ore 3G3 ’, the nozzle-type flat plate is provided with the recess A ·· Xili and the ancients; ^ 乂 百 墨 贝丁 303. The ink is drawn into the side of the ink to be processed. 'Each channel breaks the conductive ore. ② Before the conductive plating 303 is formed, the same photoresist layer is formed on the side of the ink inflow side of the nozzle plate 301 as the same as the discharge surface. Do not increase the area of conductive electricity mine 303. * However, ① The method of breaking off after forming the 303 layer of conductive electric money. When using machining for cutting processing, dust such as cutting chips enters the nozzle hole B, and the nozzle is blocked. Breaking force ... Due to the thermal residual stress, the nozzle plate 301 is deformed by the above-mentioned stress. << In addition, it is also considered that the cutting process is performed by using rhenium, but when using the engraving, a photoresist pattern must be formed on the conductive plating 303 f formed on the ink inflow side of the nozzle plate. As mentioned above, when the nozzle-type flat plate of the electrostatic suction type fluid discharge device which is used to reduce the width or diameter of the ink discharge portion is used, the nozzle plate has a diameter of 10 or less. For accuracy, a nozzle base material of about 50 ° must be used. However, the thickness of such a thin nozzle plate is low. When making a photoresist pattern, it is easy to deform in the processing of the nozzle plate, and it cannot form a pattern with high accuracy. The method of the above ② is the same. Because the nozzle plate is thin, even before the conductive plating 3 is formed, there is also the problem that the nozzle plate is deformed, and a photoresist pattern with good accuracy cannot be formed, and it cannot be performed well. Channels are separated. 95731.doc -18-200523123 Furthermore, "Japanese Laid-Open Patent Gazette No. 10-1 75305 (Publication date · June 30, 1998) 丨 the method of too, soil, h, the nozzle aperture is small When it is less than 10, the supply of power mineral fluid is sufficient, and Zeng Yuge also has a problem that it is extremely difficult to stably form V% plating inside the hole of the mouth. ^ At this point, the most inadequate supply of plating solution is the end of the person. As mentioned above, the electrode must be as close as possible to the front end of the nozzle. ° This will not form the electrode stably at the front end of the most important nozzle. It is expected that the smaller the nozzle, the smaller the amount of fluid that can be discharged. The formation of instability. Therefore, the internal resistance of the nozzle at the end of the nozzle 各 of each channel is reduced, and the reaction frequency of each channel is' 夂, which makes it difficult to control the proper amount of liquid discharged between the channels. The print quality of the tracing image is significantly lowered. In addition, the insulation control substrate of the nozzle type flat plate disclosed in "Phase #Japanese Unexamined Patent Publication No. 4 (publication date: 19 &quot; February 16)" is disclosed. 411 by Formed in opposite surfaces of the recording medium 421 has a control electrode technique, it is possible to set a very high accuracy of the position of the electrode portion of the meniscus. Therefore, there is no problem with the structure of the Japanese published patent publication "Japanese Laid-Open Patent No. 1753505 Tiger Publication (Publication Date: June 3, 1998)", the discharge stability between the channels is high, and the electrical properties of adjacent channels are high. Fully separated. However, as shown in FIG. 28, the structure of Japanese Laid-Open Patent Publication "Japanese Unexamined Patent Publication ((aw) (publication date: February 16, 1999)") is on the opposite side of the insulating control substrate and the recording medium 421. At the same time, a bow K 酉 line 405 for applying a voltage to the control electrode 401 by a self-voltage application means is also formed, and an electric field is also generated from the lead-out wiring at this time. In particular, the bent portion 405a of the lead-out wiring 405 is prone to concentration. The electric field ', such as 95731.doc -19-200523123, etc., is very likely to damage electronic parts due to the electric field. [Abstract] 7 The purpose of the present invention is to provide _insert this ^ + w species $ Mouth-type flat plate and manufacturing method thereof, the mouth-type flat plate can be used for electrostatic suction type fluid discharge 2 clothes which discharges Super 镟 ® fluid, and can form electrodes near the front end of the nozzle. The electrical properties between several nozzle holes are # 人 v 丨 a, and the driving signal of the J mesh shell 1 ^ type plate is applied to the electrode formed in the nozzle hole portion. In order to achieve the above purpose, the nozzle plate of the present invention is provided in electrostatic Suction type fluid discharge It is discharged from the fluid discharge hole at the front end of the nozzle by y and lead-the fluid charged by the application of voltage and has several bird spray holes. Its structure is: a first nozzle layer with a thin layer, which The first nozzle layer is provided with a nozzle hole, and is arranged on the fluid discharge side, and at least one second nozzle layer is stacked on the fluid supply side of the first nozzle layer. The thickness of the upper two first nozzle layers is the same as the above. The first nozzle hole communicates, and it has a second nozzle hole: the nozzle hole forming the second nozzle hole of the nozzle hole portion, which is electrically connected to form a film. An electrode layer on the inner wall of the second nozzle hole. According to the above structure, the nozzle plate is connected to the first nozzle layer of the thin layer to the second nozzle layer of the 1 thick layer, so the second nozzle layer can ensure congratulations. The strength and rigidity of the flat plate itself can also make the first nozzle layer very thin. By making the layer thickness thin, the first spray hole formed in the first nozzle layer can form the aperture to be ultrafine, for example, less than 10 μηι, And can be used on the inner wall of this ultra-fine first nozzle hole The first electrode layer is formed into a film stably in the layer thickness direction, and the opening of the first nozzle hole of the fluid discharge surface is regarded as a flow 95731.doc -20- 200523123 To the fluid discharge hole. This can greatly reduce the resistance R inside the nozzle compared with the previous one, so as to increase the discharge frequency of the fluid, and can describe the recording medium at a high speed. The first electrode layer thus formed is formed in communication with the first nozzle hole. The second electrode layer of the first nozzle hole is electrically connected. Therefore, the driving signal can be supplied from the fluid supply side of the nozzle plate through the second electrode layer. Therefore, the lead wiring for the waste signal to the first electrode layer is not close to the medium. Nakazaki Media does not suffer electrical damage due to the electric field generated by the self-extracting wiring. In order to achieve the purpose described in the winter, the method of manufacturing the nozzle plate of the present invention includes the following steps: forming a first layer on the substrate, forming a first layer on the sacrificial layer, and forming a plurality of first layers on the first nozzle layer. -Nozzle holes; ld; the inner wall surface of each first nozzle hole is formed on the first nozzle layer to form a first electrode layer; machining is performed in the manner of residual / into »the inner wall of the first nozzle hole and the periphery of each first nozzle hole The first electrode layer mentioned above also contains the residual metal oxide layer I as a layer ~ + ... The electrode layer portion 'forms a second nozzle bank; the second nozzle layer includes a plurality of second nozzle holes with +, , :: The opening on the body discharge side is stored in the first spray remaining; Brother: the electrode layer is formed; the second nozzle layer: = the inner wall surface of each nozzle hole, forming the _ two L-containing The first spray gate 7 is a gate electrode layer, and the second electrode layer is processed in the manner of "electrical separation between adjacent two." Therefore, on a highly rigid substrate, the sacrificial layer is used to Sequentially the most pouting layer, the first-electrode layer, the second spray and the brother-bei corner layer The second electrode 屄. After the photoresist pattern is formed by the lithography technology, it is processed from the dry type to the shape 95731.doc -21-200523123, so the shape of the first nozzle hole and the second can be formed with very high shape accuracy. Nozzle hole, first electrode layer, second electrode layer. In addition, since the fluid discharge surface of the nozzle plate is protected by the sacrificial layer to the final stage of the step, therefore, in the nozzle plate process, there is no There is a danger that the fluid discharge hole may be deformed due to damage. As a result, the manufacturing yield of the nozzle plate is improved. The other objects, features, and advantages of the present invention are described below.

可充分瞭解。此外,本發明之好處從參照附圖之以下說明 中即可明瞭。 【實施方式^ 以下,藉由實施例及比較例來進一步詳細說明本發明, 不過本發明可更確實地形成電壓之低電壓化。 以下,藉由實施例及比較例來進一步詳細說明本發明, 不過本發明並不限定於此等。 [前提技術]Can be fully understood. In addition, the advantages of the present invention will be apparent from the following description with reference to the accompanying drawings. [Embodiment ^ Hereinafter, the present invention will be described in more detail by way of examples and comparative examples. However, the present invention can more reliably reduce the voltage. Hereinafter, the present invention will be described in more detail through examples and comparative examples, but the present invention is not limited to these. [Prerequisite Technology]

首先,使用圖1〜圖6說明應用本發明之噴嘴式平板之屬 本發明前提構造之靜電吸引型流體排出裝置。 成為本發明之前提構造之靜電吸引型流體排出裝置, =徑為⑽㈣〜25㈣,且可以下之驅動電壓 制流體之排出。 &amp; 41,流體排出模型中,由於噴嘴徑縮小連帶引起驅 ::予::此50〜70 μιη以下之噴嘴徑,若不進行對排 _之其他措施,即無法以麵V以下之驅動 [排出墨。但是探討出在某個噴嘴徑以下,引起與先前 95731.doc -22· 200523123 流體排出模型不同之排出模型之排出現象。本發明即係依 據此種流體排出模型之新見解。 首先,說明新的流體排出模型。 在直徑d(以下說明中,只要未預先說明,係指喷嘴孔之 内徑)之喷嘴内注入導電性流體,並假定垂直地設於距無限 平板導體h之咼度。圖1顯示此種狀態。此時,被噴嘴前端(噴 嘴孔)激勵之電荷Q假定集中於藉由喷嘴前端之流體而形成 之半球部,並以以下公式類似表示。 Q = 2 π ε 〇 a V〇d …(8) 其中Q :被—噴嘴前端部激勵之電荷(c),ε 〇 ··真空之介電 苇數(F/m) d ·贺嘴之直徑(m) , vQ :施加於噴嘴之總電壓。 此外,α係取決於喷嘴形狀等之比例常數,且係取約5 之值,特別是d«h(h :噴嘴(正確而言係指喷嘴孔)_基板間 距離(m))時大致為1。 此外,基板使用導電基板時,與喷嘴相對,在基板内之 對稱位置上感應具有與上述電荷Q相反極性之鏡像電荷 Q’。基板為絕緣體時,與藉由介電常數而決定之對稱位置 上同樣地感應與電荷Q反極性之影像電荷Q,。 喷嘴前端部之集中電場強度E1。。,假定前端部之曲率半徑 為R時,則為 …⑼ 其中,k係取決於噴嘴形狀等之比例常數,並取約15〜8.5 之值,通常約為5(P.J· Birdseye and D A Smith,Surface S —,23(1970),p.19_)。此外,此處 95731.doc -23- 200523123 出模型,而假m/2。其相當於在噴嘴前端部 由表面張力而凸起成具有與噴嘴徑_轉 狀之妝鲅。 干^之丰球形 考慮作用於喷嘴前端之流體之壓力的平衡。首先 ’工 /V π 丁 ή 壓力2於噴J前端部之液面積為8時,則為 P^~sEhc^El- -〇〇) 依據公式(8)〜(1〇),壓力PeKa =1 e d kd kd2 …⑴) 則表示成 4, •Ύ 賀嘴W端部之流I# &gt;矣;$上 、々丨L餸之表面張力之壓力匕為 (12)First, an electrostatic suction type fluid discharge device constructed on the premise of the present invention will be described with reference to Figs. 1 to 6. It becomes the electrostatic suction type fluid discharge device with the structure previously mentioned in the present invention. The diameter is ⑽㈣ ~ 25 制, and the fluid can be discharged under the driving voltage. &amp; 41, In the fluid discharge model, the drive is caused by the reduction of the nozzle diameter :::: The nozzle diameter below 50 ~ 70 μιη cannot be driven by the surface V without other measures Drain the ink. However, it was explored that the discharge phenomenon caused by a discharge model different from the previous 95731.doc -22 · 200523123 fluid discharge model below a certain nozzle diameter. The present invention is based on the new insights of such a fluid discharge model. First, a new fluid discharge model will be explained. A conductive fluid is injected into a nozzle having a diameter d (in the following description, as long as it is not specified before, it refers to the inner diameter of the nozzle hole), and it is assumed that it is set perpendicularly to the angle h from the infinite flat plate conductor. Figure 1 shows this state. At this time, the charge Q excited by the front end of the nozzle (nozzle hole) is assumed to be concentrated in the hemispherical portion formed by the fluid at the front end of the nozzle, and is similarly expressed by the following formula. Q = 2 π ε 〇a V〇d… (8) where Q: the charge excited by the tip of the nozzle (c), ε 〇 ·· vacuum dielectric reed number (F / m) d · diameter of the nozzle (M), vQ: total voltage applied to the nozzle. In addition, α is a proportional constant that depends on the shape of the nozzle, etc., and takes a value of about 5, especially when d «h (h: nozzle (to be precise, the nozzle hole) _distance between substrates (m)) is approximately 1. In addition, when a conductive substrate is used as the substrate, a mirrored charge Q 'having a polarity opposite to the above-mentioned charge Q is induced at a symmetrical position in the substrate opposite to the nozzle. When the substrate is an insulator, the image charge Q of the opposite polarity to the charge Q is induced at the symmetrical position determined by the dielectric constant. The concentrated electric field intensity E1 at the tip of the nozzle. . Assuming that the radius of curvature of the front end is R, it is ... ⑼ where k is a proportional constant that depends on the shape of the nozzle, etc., and takes a value of about 15 to 8.5, usually about 5 (PJ · Birdseye and DA Smith, Surface S —, 23 (1970), p. 19_). In addition, here 95731.doc -23- 200523123 is the model, while false m / 2. This is equivalent to a makeup that is raised by surface tension at the front end portion of the nozzle to have a shape corresponding to the diameter of the nozzle. Consider the balance of the pressure of the fluid acting on the front end of the nozzle. Firstly, when the working area of the pressure 2 at the front end of the spraying pressure is 8, it is P ^ ~ sEhc ^ El- -〇〇) According to the formula (8) ~ (1〇), the pressure PeKa = 1 ed kd kd2… ⑴) is expressed as 4, • Ύ The flow at the end of the mouth I # &gt;矣; The pressure of the surface tension of $ 上 、 々 丨 L 餸 is (12)

其中,r ··表面張力 靜電力提高表面張力 力ps之關係為 藉由靜電力引起排出之條件,由於 因此靜電之壓力Pe與表面張力之壓Among them, r · · surface tension, the electrostatic force increases the surface tension, and the relationship between the force ps is a condition for discharging by electrostatic force. Therefore, the pressure Pe of the static electricity and the pressure of the surface tension

Pe&gt;P (13) 圖2顯示賦予某個直徑d 一 貝% Η之表面張力之壓力psPe &gt; P (13) Figure 2 shows the pressure ps that imparts a surface tension of a certain diameter d to 1 %% Η

靜電之壓力pe之關係。流體 一 L篮之表面張力假定流體為水( -72 mN/m)時。施加於噴嘴之兩 、角疋包壓為7〇〇 v時,於喷嘴直輕 為25 時,顯示靜電之壓 、、 re叙问表面張力之壓力ρ〆 此求出^)與d之關係,為 ··· (14) 供給排出之最低電壓。 此外’此時之排出摩力△ p為 △ P=Pe_Ps …(15) 95731.doc -24- 200523123 因此 d …(16) 對於某個直控d之喷嘴,藉由局部電場強度滿足排出停件 時之與排出編P之關連性顯示於圖3,此外,與排出臨 界包C (亦即產生排出之最低電塵之關連性顯示於圖*。 從圖3可知藉由局部電場強度滿足排出條件時(假定 V〇 700 V, r—72mN/m時)之噴嘴徑之上限為25#m。 圖4之计异係假設流體為水&amp; =72 mN/m)及有機溶劑 20 mN/m),假定k=5之條件。從該圖瞭解考慮微細噴嘴之 私昜市中效果知,排出臨界電壓v c隨喷嘴徑縮小而降低, 並瞭解流體為水時,於喷嘴徑為25/ni^f,排出臨界電壓% 約為700 V。 先前排出模型之電場考慮方法,亦即僅考慮藉由施加於 噴嘴之電壓V0與噴嘴_相對電極間距離11而定義之電場時’ 隨著嘴嘴徑微小,排出所需之驅動電壓增加。 反之,如使用上述局部電場之新的排出模型,著眼於局 部電場強度時,藉由微細噴嘴化即可降低排出時之驅動電 壓。此種驅動電壓之降低在裝置之小型化及喷嘴之高密度 化時極為有利。當然,藉由降低驅動電壓,亦可使用成本 效益高之低電壓驅動驅動器。 再者,上述排出模型,由於排出所需之電場強度取決於 局部之集中電場強度,因此無須存在相對電極。亦即,由 於先如之排出模型係在噴嘴—基板間施加電場,因此對於 絕緣體之基板須在與喷嘴相反側配置相對電極,或是將基 95731.doc -25- 200523123 亦即基板為絕緣體時, 板形成導電性。而配置相對電極時 可使用之基板厚度受限。 反之,本發明之排出模型 + 、1不而要相對電極,即使對於絕 緣性基板等仍可進行印字,梦 衣1構造之彈性增加。此外, 即使對厚絕緣體仍可進行印字。 此外,圖5顯示作用於盥美姑閂 一 &amp;扳間之鏡像力之大小與距基板 之距離h之關係。從圖上可知,基板與噴嘴間之距離愈近該 鏡像力愈顯著’且於h為20 m以下時特別顯著。 其次,考慮排出流量之精密控制。筒狀流路之流 於黏性流時,一係藉由以下之Hagen_p〇iseuiiie公式來表示。 此時假定圓筒形之噴嘴,流入該喷嘴之流體之流量Q由以下 公式表示。 (17) 其中’ 7?:流體之黏性係數(Pa· s),L :流路亦即喷嘴 之長度(m),d :流路亦即喷嘴孔之直徑(m),△ p :壓力差 (Pa)。從上述公式可知,由於流量q與流路半徑之4次方成 正比,因此可採用微細之喷嘴來限制流量。將公式(16)求出 之排出壓力△ P代入該公式(17)中而獲得以下公式。The relationship between static pressure pe. Fluid-The surface tension of an L-basket assumes that the fluid is water (-72 mN / m). When the corner pressure applied to the two nozzles is 700V, and the nozzle is 25 degrees light, the pressure of static electricity is displayed, and the pressure of the surface tension ρ〆requires the relationship between ^) and d, (14) Supply the minimum discharge voltage. In addition, the discharge friction force at this time △ p is △ P = Pe_Ps… (15) 95731.doc -24- 200523123 Therefore d… (16) For a nozzle that is directly controlled by d, the discharge stop is satisfied by the local electric field intensity The relationship between the time and the discharge series P is shown in FIG. 3, and the relationship with the discharge critical package C (that is, the lowest discharge of dust generated is shown in FIG. *. From FIG. 3, it can be seen that the discharge conditions are satisfied by the local electric field strength. The upper limit of the nozzle diameter is 25 # m at the time of assuming V〇700 V, r-72mN / m. The difference in Figure 4 assumes that the fluid is water &amp; = 72 mN / m) and the organic solvent is 20 mN / m ), Assuming k = 5. From this figure, understand the effect of the private city considering the fine nozzle. The discharge threshold voltage vc decreases as the diameter of the nozzle decreases. It is also known that when the fluid is water, the discharge threshold voltage% is about 700 when the nozzle diameter is 25 / ni ^ f. V. The electric field consideration method of the previous discharge model, that is, when only the electric field defined by the voltage V0 applied to the nozzle and the distance between the nozzle and the counter electrode 11 is taken into account ', as the diameter of the nozzle is small, the driving voltage required for discharge increases. On the other hand, if the new discharge model of the local electric field is used and the local electric field strength is focused on, the driving voltage during discharge can be reduced by making the nozzles finer. This reduction in driving voltage is extremely advantageous when the device is miniaturized and the nozzle density is increased. Of course, by reducing the driving voltage, a cost-effective low-voltage driver can also be used. Furthermore, in the above discharge model, since the electric field strength required for discharge depends on the local concentrated electric field strength, there is no need to have a counter electrode. That is, since the first discharge model is to apply an electric field between the nozzle and the substrate, the opposite electrode of the insulator substrate must be arranged on the opposite side of the nozzle, or the substrate 95731.doc -25- 200523123, that is, the substrate is an insulator. The plate becomes conductive. However, the thickness of the substrate that can be used in the configuration of the counter electrode is limited. On the other hand, the ejection models + and 1 of the present invention require not only an opposite electrode, but also printing on an insulating substrate and the like, and the flexibility of the structure of the dream garment 1 increases. In addition, printing can be performed even on thick insulators. In addition, Fig. 5 shows the relationship between the magnitude of the mirror image force acting on the toilet pin and the distance h from the substrate. It can be seen from the figure that the closer the distance between the substrate and the nozzle is, the more significant the image force is, and it is particularly significant when h is 20 m or less. Second, consider the precise control of discharge flow. The flow of the cylindrical flow path In the case of viscous flow, it is expressed by the following Hagen_poiseuiiie formula. At this time, a cylindrical nozzle is assumed, and the flow rate Q of the fluid flowing into the nozzle is expressed by the following formula. (17) where '7 ?: viscosity coefficient of fluid (Pa · s), L: flow path, that is, nozzle length (m), d: flow path, that is, nozzle hole diameter (m), Δp: pressure Poor (Pa). As can be seen from the above formula, since the flow rate q is proportional to the fourth power of the flow path radius, a fine nozzle can be used to limit the flow rate. The discharge pressure ΔP obtained by the formula (16) is substituted into the formula (17) to obtain the following formula.

QQ

47ud2 VL 2s0V02 (18) 該公式表示在直徑d、長度L之喷嘴上施加電壓v時,自 喷嘴流出之流體的流出量。圖6顯示該狀態。計算時係使用 L = 10mm,7/ = 1 (mPa · s),γ = 72(mN/m)之值。此時,喷 嘴之直徑假定為先前技術之最小值50 /xm。逐漸施加電壓v 95731.doc -26 - 200523123 時,於電壓vy_辦開始排出。該電塵相當於圖付說 明之開始排出M。此時自喷嘴之流量顯示於 排出電屢Vc正上方,流量急速增加。 在 遠拉型計算上,藉由使錢稍高於Ve來進行精密控制, 應可獲得微小之流量,不過從半對數顯示之圖亦可知實際 上不可能,特別是不易實現1〇-1〇mW下之微小量。此外, 採用某個直徑之喷嘴時,如公式(14)所示,係決定最小驅動 電麼。因而如先前技術,若使用直徑為50 μιη以上之喷嘴 時’不易達到10.1%3/8以下之微小排出量及咖ν以下之 驅動電壓。 從圖中可知,直徑為25师之喷嘴只須7〇〇 ν以下之驅動 電壓,直徑為10 _之噴嘴,500 下即可控制。此外, 直徑為1 μιη之喷嘴只須3〇〇 V以下。 如以上所述,本實施形態之靜電吸引型流體排出裝置, 由於係依據著眼於局部電場強度而新提出之排出模型,因 此可形成喷嘴徑為0.01 Am〜25 μιη之微細喷嘴,且以ι〇〇〇 V 以下之驅動電壓即可進行排出流體之排出控制。另外,依 據上述模型進行考察結果,直徑為25 gm之喷嘴時,以7〇〇 V 以下之驅動電壓;直徑為1〇 μπι以下之噴嘴時,以5〇〇 v以 下之驅動電壓;直徑為i μπι以下之噴嘴時,以3〇〇 V以下之 驅動電壓’即可進行排出控制。 本實施形態之靜電吸引型流體排出裝置如上述,可同時 縮小喷嘴徑及驅動電壓,不過此時與先前之靜電吸引型流 體排出裝置比較,以下之情形顯著。 95731.doc -27- 200523123 亦即,為上述之靜電吸引型流體排出裝置時,其排出特 ?基本上係取決於自流體排出頭内部之驅動電極至噴嘴前 端之排出流體流路内之電阻值,其電阻值愈低,排出反摩 ,愈高。亦即,藉由降低排出流體流路内之電阻值,可提 南驅動頻率,亦可排出更高電阻之排出流體材料,而可擴 大排出流體材料之選擇。 ’ 為求降低上述電阻值,可縮短職電極-噴嘴前端部間 之距離。 參 [第一種實施形態] 使用圖7〜罔12說明本發明_種實施形態如下。 (噴嘴式平板) 圖叫係本實施形態之噴嘴式平板8之一部分立體圖,圖 7(b)係圖7⑷之A_A’線剖面圖。噴嘴式平板8上形成有玲以 上之流體排出孔9,圖7⑷中顯示有2個流體排出孔9。此外, :7(c)係自流體供給側觀察噴嘴式平板8之一部分之立體 如圖7⑷〜⑷所示,噴嘴式平板8具傷:第-喷嘴層卜第 一”層2、第一電極層25、第二電極層26及喷嘴孔(噴嘴 孔部)11。 角 弟-噴嘴層1之流體排出側之面構成噴嘴式平板8之流體 排出面8a’並形成拒液層4,尤甘 ^ 在其相反側之流體供給側配置 有^贺嘴層2。此時’第—喷嘴層1如形成1㈣至8 Mm之 非吊薄之厚度,層厚之第二噴嘴層2可確保噴嘴式平板8之 強度及剛性。此時確保強度及剛性用之第二喷嘴層2係採用 95731.doc -28- 200523123 1層,不過亦可為2層以上。 噴嘴孔11係由貫穿第一喷嘴層丨之第一噴嘴孔lla,與貫 · 穿第二喷嘴層2之第二噴嘴孔llb構成。此時第一喷嘴孔Ua 之壁面係垂直於贺嘴式平板8之流體排出面8a之大致圓筒 幵乂狀,形成有拒液層4之流體排出面之大致圓形之開口部 成為流體排出孔9。另外,第二喷嘴孔丨lb係自與圓筒形狀 之第一喷嘴孔11 a連通之側之開口部扇形擴大之錐角形狀 (圓錐台形狀),並通過第二噴嘴層2,在與第一喷嘴層1相反 側之流體供給面8b上開口。形成於該第二噴嘴層2之表面亦 _ 有之流體供%面8b之第二喷嘴孔i lb之大致圓形之開口部 成為流體供給孔12。 在弟贺鳴孔之内壁之大致全面,及第一喷嘴孔ua 與第二喷嘴孔11b連通之連通孔(連通部)llx周邊,形成有第 一電極層25。該第一電極層25包含:圓筒部25a及延伸部 25b 上述圓同部25a形成於上述喷嘴孔Ha之内壁大致全 面。上述延伸部25b在第一喷嘴孔1 la與第二喷嘴孔Ub連通 之連通孔llx周邊,形成以連通孔1&amp;作為大致中心之圓環 形狀。延伸部25b形成有圓錐台形狀之第二噴嘴孔! lb之上 底Uy°亦即,第一噴嘴孔11a與第二噴嘴孔lib之連通孔 Ux(大致圓形)之口徑為D1時,D1小於第二喷嘴孔llb之上 底(流體排出側之開口部)ny之口徑〇2。而形成圓環形狀之 · 第一電極層25之延伸部25b之外徑D3大於口徑D2。 , 此外’在第二喷嘴孔nb内壁形成有與上述第一電極層25 電性連接之第二電極層26。該第二電極層26之一部分亦配 95731.doc -29- 200523123 置於喷嘴式平板8之流體供給面8b上,其一部分如圖7(c)所 示,形成引出配線26a,並連接於排出信號電壓施加手段(圖 上未顯示)。 另外,圖7(a)及圖27(C)中,為求簡化圖式,而省略形成 於構成喷鳴孔11之第一喷嘴孔11a及第二喷嘴孔lib各内壁 之第一電極層25及第二電極層26。 以下說明各部之尺寸及材質之具體例,不過本發明並不 限定於其具體例。 弟喷鳥層1使用厚度約1 之聚酿亞胺膜,第二噴嘴層 2使用厚度約?〇 μιη之聚醯亞胺膜。第一電極層乃之厚度為 0_5 /xm,並包含以鈦為主要成分之金屬材料,其中之圓筒 部25a形成至第一噴嘴孔丨la内壁之流體排出側端部。另 外1伸邛251)之外徑〇3約20/^111。形成於第一嗔嘴層1與第 A鳴層2之界面之電極層等形成於整個界面時,雖會造成 因整個賀嘴式平板之應力而產生翹曲,不過此種延伸部 採用各喷實孔11局部設置之構造,則可降低此種應力造成 之魅曲。 、另外’第二電極層26之厚度為〇·5师,同樣地包含以鈦 為主要成分之金屬。而第二電極層26之與第一電極層。之 連接部分26b,如圖8所示,係以面與第一電極層^之延伸 部25b接觸,來確保高度之連接可靠性。 …喷鳥孔11 a之成為流體排出孔9之開口部之口徑約為 3㈣由於其中形成有厚度為〇·5 μιη之第一電極層25,因 ^體排出孔9之實際徑(直徑)約為2/m。此外,第二喷嘴 95731.doc -30- 200523123 孔lib之上底lly之口徑D2為l〇 口部之口徑為30 jicm。 μΠ1’成為流體供給孔12之開 本構造之喷嘴式平板8中,為求可排出超微量流體而形成 _,須使流體排出孔9為㈣_以下,更宜術威 y藉由形成此種孔徑(直徑),可縮小形成廣範圍所需之電 場’可大幅降低移動電荷所需之電壓,亦即賦予該流體靜 電吸引流體所需帶電量用之所需電壓。藉&amp;,由於無須如 先前需要2綱V之高電壓,因此可謀求提高使用流體喷射 叙置時之安全性。 * 特別是形以下時,電場強度分布有效集中於該流 體排出孔之排出面近旁,並且自相對電極至噴嘴之流體突 出孔之距離變動不影響電場強度分布。藉此,不受相對電 極之位置精確度、記錄媒體之材料特性偏差及厚度偏差之 影響,而可穩定排出流體。 此外,如上述,藉由可將電場強度分布集中於流體排出 孔9之排出面近旁,即可在窄區域内形成強電場,如此可將 可排出之流體量形成超微量。藉此,於流體為墨時,印字 圖像可形成高解像度。 此外’第一喷嘴層1上之拒液層4係藉由厚度約〇 • 05 μηι之 氟聚合或矽系而分子膜而形成。上述拒液層4如後述,係藉 由乾式I虫刻除去階躍式覆蓋於流體排出孔9内之多餘區域。 本實施形態由於對喷灑精確度影響重大之喷嘴式平板8 之流體排出孔9之形狀,係由上述1 μιη之聚醯亞胺膜之加工 精癌度來決定,因此流體排出孔9之加工精確度非常高,同 95731.doc 200523123 時可確保非常高之喷灑精確度。 此外’為求提高流體排出孔9之加工精確度,而減少露出 於喷鳴式平板8之流體排出面之第一噴嘴層1之膜厚時,了 獲付更尚之加工精確度。此時,藉由減少第一喷嘴居1之膜 厚,雖第一喷嘴層1之剛性降低,流體排出孔9之結構性之 可靠性降低,不過藉由與第一噴嘴層丨接觸而配置第二噴嘴 層2,來補強第一喷嘴層丨,則不致降低第一喷嘴層丨之釺構 性之可#性,而可提高流體排出孔9之形狀精確度。亦即, 作成具有彳政細之流體排出孔9之噴嘴式平板8時,須採取此 種構造。 此外,由於第一電極層25係在噴嘴孔丨丨之各形成位置局 部設置,因此與配置於鄰接之喷嘴孔丨丨之第一電極層乃電 性絕緣。因此,可在各個通道單獨施加排出信號,串音 (Crosstalk)少,藉此可提高描繪圖像之解像度。 此外,由於第二喷嘴孔Ub係錐角形狀,因此在第二喷嘴 孔lib内部不易產生流體之亂流,可提高流體之排出穩定 性,並且,由於喷嘴孔llb之内壁與流體供給面补之邊緣變 寬,因此可有效抑制延伸至流體供給面扑之第二電極層% 之斷線。此外,藉由形成於噴嘴式平板8之流體排出面仏之 拒液層4,可防止流體附著於流體排出孔9近旁。 男外,用於第一電極層25之材料並不限定於以鈦為主要 成分之金屬材料。只要係在第二噴嘴層2之蝕刻加工及階躍 式覆蓋於後述之犧牲層5及流體排出孔9内之拒液層*之蝕 刻時,對該钱刻|有高耐性之材料,亦即對钱刻氣體(含氧 95731.doc -32· 200523123 之电水及s鼠之電漿等)或是蝕刻产〆 等)耐性高t A馱、虱氧化鉀水溶液 寺)耐回之材科即可。具體 鐵、鎳、金、〜&quot;、銳等為::鈦、銘、銅、-、 可藉由與上述蝕刻氣體戈蝕二、、、纟成分之金屬材料, 之組合來選擇。 同樣地,用於第二電極層26之材料亦不限定於以欽為主 要成分之金屬材料°只要係在階躍式覆蓋於後述之犧牲層5 及流體排出孔9内之拒液層4之_時,對曰 性之材料,亦即㈣刻氣體(含氧之電聚及含氣之、二: 或是蝕刻劑(硝酸、氫氧化 水寻) 且俨Λ ?尺冷液寺)耐性高之材料即可。 :“卞以鈦、銘、銅、銘、鐵、鎳、金、麵、·、 =、銳等為主要成分之金屬材料,可藉由與上述崎 或姓刻劑之組合來選擇。 ’、 此外’用於第一嘖嘴声】、, 可為聚醯亞胺以外之:八子::不限定於聚酿亞胺。亦 rSlQ,. 卜之-分子有機材料,亦可為氧化石夕 2) 化石夕(Sl3N4)等石夕化合物材料,或是亦可為石夕。 用於第一賀嘴層2之材料亦不限定於聚醯亞胺。 嘴^同樣地,亦可為聚酿亞胺以外之高分子有機材料,Γ 可為氧切、氮切等石夕化合物材料,或是亦可為石夕。 +此外,本實施形態之第二噴嘴孔m並不限定於在與第一 賀嘴孔1U之連通部分變窄之圓錐台形狀(錐角形奸如圖9 二示之噴嘴式平板8,,第二噴嘴孔Ub,之内壁亦可形成與喷 觜式平板8’之流體排出面8a及流體供給面朴垂直之所謂筆 直(Straight)形狀(圓筒形狀)。 此日r可將第二喷嘴孔llb,之流體供給孔12,,使圖7(a)〜(c) 95731.doc -33- 200523123 所示之第二喷嘴孔llb小於圓錐台形狀構成之流體供給孔 此可進步提尚喷嚆之積體度。此外,如圖7(b)所示, 採用噴嘴式平板8時,依其製造上之情況,第二電極層26 僅形成於第二噴嘴孔llb内壁之丨個側面,不過如圖9所示, 亦可形成於第二喷嘴孔llb之整個内壁面。 藉由形成本實施形態構造之喷嘴式平板8(8,),可發揮以 下①〜⑤之作用。 ① 流體排出孔9即使是口徑為8 _以下之維繫喷嘴式平板 8(8 )’仍可形成可施加排出信號電麼至噴嘴孔i i前端之結 構性穩定之零極。 ② 在第二噴嘴層2之流體供給側,藉由分離第二電極層26成 避免鄰接通道間電性短路,可輕易地對各個通道單獨施加 排出信號,串音少,藉此可提高描緣圖像之解像度。 ③ 由於可以第二喷嘴層2維持嗔嘴式平板8(8,)之剛性,因此 整個噴嘴式平板8(8,)之剛性提高,容易處理。 ④ 在膜厚較厚之第二喷嘴層2上加工之第二嗔嘴孔m之加 工精確度即使較差’由於第二㈣孔Ub加卫時,係以第一 電極層25之延伸部25b停止姓刻,因此不影響控制流體排出 量之流體排出孔9。 ⑤由於第一電極層25與形成於與第一喷嘴孔…連通之第 二噴嘴孔m之第二電極層26電性連接,因此可經由第二電 極層26’自噴嘴式平板8之流體供給側供給驅動信號,不致 因供給驅動信號至第—带托 弟弘極層25用之引出配線26a產生之 電場使記錄媒體受到電性損傷。 95731.doc 200523123 (噴嘴式平板之製造方法) 其次說明本實施形態之噴嘴式平板8之一種製造方法。圖 10(a)〜⑴係噴嘴式平板8製程之說明圖。 首先,在包含矽及玻璃等之任意厚度之暫時保持用之基 板6上,藉由使用鎳之濕式電鍍(電鍍)而形成犧牲層$。進一 步在犧牲層5上,藉由自旋式塗敷來塗敷聚醯亞胺樹脂,在 350°C下燒成2小時而形成第一喷嘴層丨。此時犧牲層5之厚 度為ΙΟμπι,第一喷嘴層丨之厚度為丨^^。47ud2 VL 2s0V02 (18) This formula indicates the amount of fluid flowing from the nozzle when a voltage v is applied to a nozzle with a diameter d and a length L. Fig. 6 shows this state. The calculation uses L = 10mm, 7 / = 1 (mPa · s), and γ = 72 (mN / m). At this time, the nozzle diameter is assumed to be the minimum value of 50 / xm of the prior art. When the voltage v 95731.doc -26-200523123 is gradually applied, the discharge starts at the voltage vy_. This electric dust is equivalent to starting to discharge M as illustrated in the figure. At this time, the flow rate from the nozzle is displayed directly above the discharge power Vc, and the flow rate increases rapidly. In the remote-pull type calculation, by making the money slightly higher than Ve for precise control, a tiny flow rate should be obtained, but from the semi-logarithmic graph, it can be seen that it is actually impossible, especially it is not easy to achieve 10-10. Tiny amount at mW. In addition, when using a nozzle with a certain diameter, as shown in formula (14), is the minimum driving power determined? Therefore, as in the prior art, when a nozzle having a diameter of 50 μm or more is used, it is difficult to achieve a minute discharge amount of 10.1% or less and a driving voltage of 3 or less. As can be seen from the figure, the nozzle with a diameter of 25 divisions only needs a driving voltage below 700 ν, and a nozzle with a diameter of 10 mm can be controlled at 500 times. In addition, a nozzle with a diameter of 1 μm only needs to be 300 V or less. As described above, since the electrostatic suction type fluid discharge device of this embodiment is a new discharge model based on the local electric field strength, a fine nozzle with a nozzle diameter of 0.01 Am to 25 μm can be formed, and The discharge voltage can be controlled by driving voltage below 〇0V. In addition, according to the results of the above model, a driving voltage of 700 V or less is used for a nozzle with a diameter of 25 gm; a driving voltage of 500 V or less is used for a nozzle with a diameter of 10 μm or less; the diameter is i For nozzles smaller than μm, discharge control can be performed with a driving voltage of 300V or lower. As described above, the electrostatic suction type fluid discharge device of this embodiment can reduce the nozzle diameter and the driving voltage at the same time. However, compared with the previous electrostatic suction type fluid discharge device at this time, the following situation is remarkable. 95731.doc -27- 200523123 That is, when it is the above-mentioned electrostatic suction type fluid discharge device, its discharge characteristics basically depend on the resistance value in the discharge fluid flow path from the driving electrode inside the fluid discharge head to the front end of the nozzle. The lower the resistance value, the higher the anti-friction. That is, by reducing the resistance value in the flow path of the discharged fluid, the driving frequency can be improved, and the discharged fluid material with higher resistance can be discharged, and the choice of the discharged fluid material can be expanded. In order to reduce the above resistance value, the distance between the electrode and the tip of the nozzle can be shortened. [First Embodiment] An embodiment of the present invention will be described with reference to Figs. 7 to 12 as follows. (Nozzle-type flat plate) The drawing is a perspective view of a part of the nozzle-type flat plate 8 of this embodiment, and FIG. 7 (b) is a cross-sectional view taken along line A_A 'in FIG. 7 (a). The nozzle plate 8 is formed with a fluid discharge hole 9 above Ling, and two fluid discharge holes 9 are shown in FIG. In addition, 7 (c) is a three-dimensional view of a part of the nozzle plate 8 as viewed from the fluid supply side, as shown in Figures 7⑷ ~ ⑷. The nozzle plate 8 has injuries: the first nozzle layer and the second electrode layer. Layer 25, second electrode layer 26, and nozzle hole (nozzle hole portion) 11. The surface of the fluid discharge side of the corner-nozzle layer 1 constitutes the fluid discharge surface 8a 'of the nozzle plate 8 and forms the liquid-repellent layer 4, especially Gan ^ On the fluid supply side on the opposite side, ^ He nozzle layer 2. At this time, if the first nozzle layer 1 is formed to a thickness of 1 mm to 8 Mm, the second nozzle layer 2 with a layer thickness can ensure the nozzle type. The strength and rigidity of the plate 8. At this time, the second nozzle layer 2 for ensuring the strength and rigidity is a layer of 95731.doc -28- 200523123, but it can also be more than two layers. The nozzle hole 11 is formed by penetrating the first nozzle layer. The first nozzle hole 11a is composed of the second nozzle hole 11b penetrating through the second nozzle layer 2. At this time, the wall surface of the first nozzle hole Ua is approximately circular perpendicular to the fluid discharge surface 8a of the nozzle plate 8. A cylindrical shape, a substantially circular opening having a fluid discharge surface of the liquid-repellent layer 4 becomes a fluid discharge hole 9. Another The second nozzle hole lb is a cone shape (conical frustum shape) that is fan-shaped from the opening on the side communicating with the cylindrical first nozzle hole 11a, and passes through the second nozzle layer 2, The fluid supply surface 8b on the opposite side of the nozzle layer 1 opens. The substantially circular opening of the second nozzle hole i lb formed on the surface of the second nozzle layer 2 also has a fluid supply surface 8b as a fluid supply hole. 12. A first electrode layer 25 is formed on the inner wall of the brother Heming hole, and around the communication hole (connecting portion) llx where the first nozzle hole ua communicates with the second nozzle hole 11b. The first electrode layer 25 Including: the cylindrical portion 25a and the extension portion 25b, the circular identical portion 25a is formed on the entire inner wall of the nozzle hole Ha. The extension portion 25b is around the communication hole 11x where the first nozzle hole 11a and the second nozzle hole Ub communicate, A circular ring shape with the communication hole 1 as its approximate center is formed. The extension 25b is formed with a second nozzle hole in the shape of a truncated cone! Lb upper and lower Uy °, that is, the communication between the first nozzle hole 11a and the second nozzle hole lib When the diameter of the hole Ux (substantially circular) is D1, D1 is smaller than the first The diameter of the upper end of the nozzle hole 11b (the opening on the fluid discharge side) ny is 0. The outer diameter D3 of the extended portion 25b of the first electrode layer 25 that is formed in a ring shape is larger than the diameter D2. A second electrode layer 26 electrically connected to the first electrode layer 25 is formed on the inner wall of the nozzle hole nb. A part of the second electrode layer 26 is also equipped with 95731.doc -29- 200523123 on the fluid supply surface of the nozzle plate 8 On part 8b, as shown in FIG. 7 (c), a lead-out wiring 26a is formed and connected to a discharge signal voltage applying means (not shown in the figure). In addition, in FIGS. 7 (a) and 27 (C), in order to simplify the drawing, the first electrode layer 25 formed on each inner wall of the first nozzle hole 11a and the second nozzle hole lib constituting the blowing hole 11 is omitted. And the second electrode layer 26. Specific examples of the dimensions and materials of the parts will be described below, but the present invention is not limited to the specific examples. The bird spray layer 1 uses a polyimide film with a thickness of about 1, and the second nozzle layer 2 uses a thickness of about 1? 〇 μιη polyimide film. The first electrode layer has a thickness of 0-5 / xm and includes a metal material mainly composed of titanium, wherein a cylindrical portion 25a is formed to a fluid discharge side end portion of the inner wall of the first nozzle hole 1a. In addition, the outer diameter of the extension 1 (251) is about 20 / ^ 111. When an electrode layer or the like formed at the interface between the first mouthpiece layer 1 and the A-th sounding layer 2 is formed on the entire interface, it may cause warping due to the stress of the entire nozzle plate, but such extensions are sprayed separately. The structure in which the solid holes 11 are partially provided can reduce the charm caused by such stress. In addition, the thickness of the second electrode layer 26 is 0.5 division, and similarly contains a metal containing titanium as a main component. The second electrode layer 26 and the first electrode layer. As shown in FIG. 8, the connection portion 26b is in contact with the extension portion 25b of the first electrode layer ^ by a plane to ensure a high degree of connection reliability. … The diameter of the opening portion of the bird spray hole 11 a that becomes the fluid discharge hole 9 is about 3 mm. Since the first electrode layer 25 having a thickness of 0.5 μm is formed therein, the actual diameter (diameter) of the body discharge hole 9 is about It is 2 / m. In addition, the second nozzle 95731.doc -30- 200523123 has a diameter D2 of the upper and lower holes lly of 10 and the diameter of the mouth is 30 jicm. μΠ1 'is formed in the nozzle plate 8 which is the open structure of the fluid supply hole 12. In order to discharge ultra-small amount of fluid, it is necessary to make the fluid discharge hole 9 below ㈣_. The pore diameter (diameter) can be reduced to form a wide range of electric field, which can greatly reduce the voltage required to move the charge, that is, the voltage required to give the fluid the electrostatic charge required to attract the fluid. By using &amp;, since a high voltage of 2 V is not required as before, it is possible to improve the safety when using a fluid ejection device. * Especially when the shape is below, the electric field intensity distribution is effectively concentrated near the discharge surface of the fluid discharge hole, and the change in the distance from the counter electrode to the fluid protrusion hole of the nozzle does not affect the electric field intensity distribution. Thereby, the fluid can be discharged stably without being affected by the positional accuracy of the opposite electrode, the deviation of the material characteristics of the recording medium, and the thickness deviation. In addition, as described above, by concentrating the electric field intensity distribution near the discharge surface of the fluid discharge hole 9, a strong electric field can be formed in a narrow area, so that the amount of fluid that can be discharged can be made into a minute amount. Thereby, when the fluid is ink, the printed image can form a high resolution. In addition, the liquid-repellent layer 4 on the 'first nozzle layer 1 is formed by a molecular film of fluorine polymerization or silicon based on a thickness of about 0.05 μm. As described later, the liquid-repellent layer 4 removes the extra area covered step by step in the fluid discharge hole 9 by dry-type worming. In this embodiment, the shape of the fluid discharge hole 9 of the nozzle plate 8 which has a great influence on the spraying accuracy is determined by the degree of processing cancer of the 1 μm polyimide film, so the processing of the fluid discharge hole 9 The accuracy is very high, and the same as 95731.doc 200523123 can ensure very high spray accuracy. In addition, in order to improve the processing accuracy of the fluid discharge hole 9, and to reduce the film thickness of the first nozzle layer 1 exposed on the fluid discharge surface of the squeaking plate 8, a more accurate processing accuracy is obtained. At this time, by reducing the film thickness of the first nozzle layer 1, although the rigidity of the first nozzle layer 1 is reduced, the structural reliability of the fluid discharge hole 9 is reduced, but the first The two nozzle layers 2 are used to reinforce the first nozzle layer 丨, so that the structural properties of the first nozzle layer 丨 will not be reduced, and the shape accuracy of the fluid discharge hole 9 can be improved. That is, it is necessary to adopt such a structure when the nozzle-type flat plate 8 having the fluid discharge holes 9 of a small size is made. In addition, since the first electrode layer 25 is partially provided at each formation position of the nozzle hole, the first electrode layer 25 is electrically insulated from the first electrode layer arranged at the adjacent nozzle hole. Therefore, the exhaust signal can be applied to each channel separately, and there is less crosstalk, thereby improving the resolution of the drawn image. In addition, since the second nozzle hole Ub has a tapered shape, turbulent flow of the fluid is not easily generated inside the second nozzle hole lib, which can improve the discharge stability of the fluid, and because the inner wall of the nozzle hole 11b and the fluid supply surface make up for it The edges are widened, so it is possible to effectively suppress the breakage of the second electrode layer% extending to the fluid supply surface. In addition, by the liquid-repellent layer 4 formed on the fluid discharge surface of the nozzle plate 8, the fluid can be prevented from adhering to the vicinity of the fluid discharge hole 9. Outside of men, the material for the first electrode layer 25 is not limited to a metal material containing titanium as a main component. As long as it is the etching process of the second nozzle layer 2 and the stepwise etching of the liquid-repellent layer * covered in the sacrificial layer 5 and the fluid discharge hole 9 described later, a material with high resistance to the money | To the money carved gas (containing oxygen 95731.doc -32 · 200523123 electric water and s rat plasma, etc.) or etching maggots, etc.) high resistance to t A 虱, lice of potassium oxide solution) can. Specific iron, nickel, gold, ~ &quot;, sharp, etc. are: titanium, Ming, copper,-, can be selected by the combination of the above etching gas with two, two, and thorium metal materials, to choose. Similarly, the material used for the second electrode layer 26 is not limited to a metal material with Chin as the main component, as long as it is stepwise covered with the liquid-repellent layer 4 in the sacrificial layer 5 and the fluid discharge hole 9 described later. _, High resistance to materials that are etched, that is, engraved gas (electropolymerization and oxygen containing oxygen, two: or etchant (nitric acid, hydroxide)) and 俨 Λ? Ruler cold liquid temple) Materials. : "卞 Titanium, Ming, Copper, Ming, Iron, Nickel, Gold, Surface, ·, =, Sharp, etc. as the main component of the metal material, can be selected by the combination with the above-mentioned Qi or surname engraving. ', In addition, "for the first pouting voice", can be other than polyimide: Yazi :: not limited to polyimide. Also rSlQ ,. Bu Zhi-molecular organic materials, can also be oxidized stone 2 ) Fossil evening compound (Sl3N4) and other stone evening compound materials, or it can also be stone evening. The material used for the first nozzle layer 2 is not limited to polyimide. Mouth ^ Similarly, it can also be polystyrene For high-molecular organic materials other than amines, Γ may be a material of stone compounds such as oxygen cut and nitrogen cut, or may also be stone cut. + In addition, the second nozzle hole m in this embodiment is not limited to the first nozzle hole m. The conical frustum shape of the narrowing connection part of the nozzle hole 1U (conical angle shape is shown in Fig. 9, the nozzle plate 8 shown in Fig. 2). The surface 8a and the fluid supply surface are perpendicular to the so-called straight shape (cylindrical shape). On this day, the second nozzle hole 11b can flow The supply hole 12 makes the second nozzle hole 11b shown in Figs. 7 (a) to (c) 95731.doc -33- 200523123 smaller than the fluid supply hole formed by the shape of a truncated cone. This can improve the integration of the spray nozzle. In addition, as shown in FIG. 7 (b), when the nozzle plate 8 is used, the second electrode layer 26 is formed only on one side of the inner wall of the second nozzle hole 11b according to the manufacturing conditions, but as shown in FIG. 9 It can also be formed on the entire inner wall surface of the second nozzle hole 11b. By forming the nozzle plate 8 (8,) of the structure of this embodiment, the following functions ① to ⑤ can be exhibited. ① The fluid discharge hole 9 is of a caliber The nozzle flat plate 8 (8) 'below 8 _ can still form a structurally stable zero pole that can apply the discharge signal to the front end of the nozzle hole ii. ② On the fluid supply side of the second nozzle layer 2, by The second electrode layer 26 is separated to avoid electrical shorts between adjacent channels, and an exhaust signal can be easily applied to each channel with less crosstalk, thereby improving the resolution of the tracing image. ③ Since the second nozzle layer 2 can be maintained The rigidity of the nozzle plate 8 (8,), so the entire nozzle plate 8 ( 8.) The rigidity is improved and easy to handle. ④ The machining accuracy of the second nozzle hole m processed on the second nozzle layer 2 with a thicker film thickness is poor. The extension 25b of the first electrode layer 25 is stopped, so it does not affect the fluid discharge hole 9 that controls the fluid discharge amount. ⑤ Because the first electrode layer 25 and the second nozzle hole m formed in communication with the first nozzle hole ... The second electrode layer 26 is electrically connected, so the driving signal can be supplied from the fluid supply side of the nozzle plate 8 through the second electrode layer 26 ', so as not to supply the driving signal to the lead-out wiring for the first-generation Hongji layer 25. The electric field generated by 26a electrically damages the recording medium. 95731.doc 200523123 (Manufacturing method of nozzle plate) Next, a manufacturing method of the nozzle plate 8 according to this embodiment will be described. Fig. 10 (a) to Fig. 10 are explanatory diagrams of the manufacturing process of the flat nozzle 8 of the ytterbium type. First, a sacrificial layer is formed on a substrate 6 for temporary holding of any thickness including silicon, glass, and the like by wet plating (plating) using nickel. Further, a polyimide resin was applied on the sacrificial layer 5 by spin coating, and fired at 350 ° C for 2 hours to form a first nozzle layer. At this time, the thickness of the sacrificial layer 5 is 10 μm, and the thickness of the first nozzle layer 丨 is ^^^.

其次,在上述第一喷嘴層丨上以光阻形成第一喷嘴孔1 之開口圖案:,藉由使用以氧為主要成分之氣體之乾式蝕 刻,將第一噴嘴孔lla予以加工(參照圖1〇(^)。Next, an opening pattern of the first nozzle hole 1 is formed on the first nozzle layer with a photoresist, and the first nozzle hole 11a is processed by dry etching using a gas containing oxygen as a main component (refer to FIG. 1). 〇 (^).

本钱刻方法可高速且精確度佳地加工㈣亞胺樹脂等之 有機物,並且與犧牲層5之錄之_選擇性高(鎳幾乎未被 蝕刻)。因此’犧牲層5不致因上述加工而受到重大損傷, 可維持犧牲層5表面之平坦性,因此形成於犧牲層5表面之 贺嘴式平板8之流體排出面之平坦性不致惡化。此外,由於 本加工係以非常高之精確度進行,因此係使用各向異性高 之名虫刻條件。此外,如卜新朴,, 卜士上所述,由於第一喷嘴層1極薄僅為 一因此可高精確度加工排出超微量流體用之第一噴嘴The cost engraving method can process organic substances such as fluorene imine resin at high speed and high accuracy, and has high selectivity with that of sacrificial layer 5 (nickel is hardly etched). Therefore, the 'sacrifice layer 5 is not significantly damaged due to the above-mentioned processing, and the flatness of the surface of the sacrificial layer 5 can be maintained. Therefore, the flatness of the fluid discharge surface of the nozzle plate 8 formed on the surface of the sacrificial layer 5 is not deteriorated. In addition, since this processing is performed with a very high degree of accuracy, the famous engraved conditions with high anisotropy are used. In addition, as described by Pu Xinpu, Pu Shi, since the first nozzle layer 1 is extremely thin and only one, it is possible to process the first nozzle for discharging ultra-micro fluid with high accuracy.

其次’在加工第一噴嘴孔U 、“…A 貝角孔Ua之苐-喷嘴層1上,以濺射 一丰+ 成刀之孟屬材料之第一電極層25。進 :在上“_電極層25上形成對應於㈣孔開口部形狀 之光阻圖案27(參照圖1〇(b))。 1 此吩,由於上述第一電極層 95731.doc •35- 200523123 25需要形成於第一喷嘴孔na内壁,因此,為求提高第— 極層25之階躍式覆蓋性,在3〇町⑽之氯氣壓條件下,= 一喷嘴層1上之膜厚係形成〇·5 μιη。 其-人,以使用氬為主要成分之氣體之電毁之乾式颠刻, 將第-電極層25加工成在第一噴嘴層i上殘留直徑約2〇阳 之成為上述延伸部251)之大致圓形形狀,並除去光阻(參照 圖10(c))。§亥加工步驟為求抑制形成於上述第一喷嘴孔11 &amp; 内壁之第-電極層25(圓筒部25a)之損傷,及除去形成於成 為第一噴嘴孔lla之底之犧牲層5上之第一電極層以,而採 φ 用各向異性㊅之|虫刻條件。 另外,局部殘留於上述第一噴嘴層丨上之上述延伸部 乃卜此時係形成大致圓形形狀,不過在加工步驟上不需要 為大致圓形形狀,如後述,只要是第二噴嘴孔nb之上底 係配置於在第一噴嘴们上自第一噴嘴孔&quot;a延伸而形成之 延伸部25b内之形狀即可。 但是,本喷嘴式平板係應用於靜電吸引型流體排出裝置 之賀嘴式平板8,由於係經由第一電極層2 5而在噴嘴前端邙 施加排出信號’因此在第一電極層25中 ;: 外’電場亦集中於第一喷嘴層【上之形狀之端部。因= 求使集中於上述第一喷嘴層1上之延伸部25b端部之電場均 一化,延伸部25b之形狀須加工成接近各向同性高之圓形形 _ 狀。 其次,在上述第一噴嘴層丨及第一電極層25上,以2〇 之厚度形成第二喷嘴層2(參照圖10(d))。第二喷嘴層2與第 9573l.doc -36- 200523123 -噴嘴層1同樣地係以自旋式塗敷法塗敷塗敷型聚酿亞胺 =,匕並在35(rc下燒成2小時而形成20μιη之厚度。此時第 -喷嘴孔lla亦被聚醯亞胺樹脂掩埋。第二噴嘴層2係基於 補強高精確度加工之膜厚薄之第一冑嘴層工之目的而形 成’具有提高整個喷嘴式平板8之剛性之效果。 八次’在上述第二喷嘴層2上’藉由絲刻而形成光阻匿 案28,進行使用以氧為主要成分之氣體之乾式蝕刻,而名 第二噴嘴層2上形成圓錐台形狀之第二噴嘴孔ub(參照圖Secondly, in the processing of the first nozzle hole U, "... A corner hole Ua-nozzle layer 1, a first electrode layer 25 is sputtered with a Feng + a knife-made Meng material. Advance: in the above" _ A photoresist pattern 27 (see FIG. 10 (b)) corresponding to the shape of the opening of the countersink is formed on the electrode layer 25. 1 This is because the above-mentioned first electrode layer 95731.doc • 35- 200523123 25 needs to be formed on the inner wall of the first nozzle hole na. Therefore, in order to improve the step-type coverage of the first electrode layer 25, the temperature is 30 °. Under the condition of chlorine pressure, the film thickness on a nozzle layer 1 was formed to 0.5 μm. The first electrode layer 25 was processed by electro-destructive dry etching using a gas containing argon as a main component, and the first electrode layer 25 was processed to have a diameter of about 20 Å remaining on the first nozzle layer i to become the above-mentioned extension 251). The shape is circular, and the photoresist is removed (see FIG. 10 (c)). § The processing steps are to suppress damage to the first electrode layer 25 (cylindrical portion 25a) formed on the inner wall of the first nozzle hole 11 &amp; and to remove the sacrificial layer 5 formed on the bottom of the first nozzle hole 11a. The first electrode layer was used, and φ was used for anisotropic worm | worming conditions. In addition, the extension portion partially remaining on the first nozzle layer is formed into a substantially circular shape at this time, but it does not need to be a substantially circular shape in the processing steps. As described later, as long as it is the second nozzle hole nb The upper sole may be arranged in the shape of the extension portion 25b formed by extending from the first nozzle hole "a" on the first nozzles. However, the nozzle plate is applied to the nozzle plate 8 of the electrostatic suction type fluid discharge device, and because the discharge signal is applied to the front end of the nozzle through the first electrode layer 25, the first electrode layer 25 is: The outer electric field is also concentrated at the end of the shape of the first nozzle layer. Because = the electric field at the end of the extension portion 25b concentrated on the above-mentioned first nozzle layer 1 is required to be uniform, the shape of the extension portion 25b must be processed to a shape close to a circular shape with high isotropy. Next, a second nozzle layer 2 is formed on the first nozzle layer 丨 and the first electrode layer 25 to a thickness of 20 (see FIG. 10 (d)). The second nozzle layer 2 is the same as No. 9573l.doc -36- 200523123-the nozzle layer 1 is coated with a coating type polyimide by a spin coating method, and fired at 35 ° C for 2 hours. And the thickness of 20μιη is formed. At this time, the first nozzle hole 11a is also buried with polyimide resin. The second nozzle layer 2 is formed based on the purpose of reinforcing the first nozzle layer with a thin film processed with high accuracy. The effect of improving the rigidity of the entire nozzle plate 8. The light concealment case 28 was formed on the second nozzle layer 2 by silk engraving eight times, and dry etching using a gas containing oxygen as its main component was performed. A frustum-shaped second nozzle hole ub is formed in the second nozzle layer 2 (see FIG.

⑺⑷)。另外,上述乾式蝕刻可以形成於第一噴嘴層1上之 第-電極層2!之延伸部25a(25b)停止。亦即,㈣制以氧 為主要成分之氣體之乾式㈣幾乎不姓刻以鈦為主要成分 之金屬材料所形成之第一噴嘴層i,因此在第一電極層h 露出之部位,乾式蝕刻不再繼續進行,而可輕易除去在前 :個步驟埋入第一噴嘴孔Ua之第二噴嘴層2。此外,上述 第二喷嘴孔Ub之加卫,在與第—喷嘴層r接合部,第二⑺⑷). In addition, the dry etching described above may stop the extension portion 25a (25b) of the -electrode layer 2! Formed on the first nozzle layer 1. That is, the dry type of the gas containing oxygen as the main component has almost no first nozzle layer i formed by engraving a metal material with titanium as the main component. Therefore, dry etching does not require the first electrode layer h to be exposed. Then, the second nozzle layer 2 embedded in the first nozzle hole Ua can be easily removed in the previous step. In addition, the second nozzle hole Ub is guarded at the joint portion with the first nozzle layer r, and the second

賀嘴孔lib之上底lly圖案化成配置於第一電極層25之 部25b内。 弟二贺嘴孔llb之錐角形狀加工時,上述敍刻係採用使光 1 且圖案28之#刻率與第二喷嘴層2之聚醯亞胺樹脂之㈣ ::致相等,#由將該光阻圖㈣在⑽下事後供烤6〇 ^刀鐘,將光阻圖案28作為錐角形狀,藉由㈣將該形狀轉 印於第二喷嘴層2之方法。The upper hole and the lower hole of the nozzle hole lib are patterned to be arranged in the portion 25b of the first electrode layer 25. When the taper angle shape of the second hole of the second hole is processed, the above-mentioned engraving is to make the #engraving rate of the light 1 and the pattern 28 equal to that of the polyimide resin of the second nozzle layer 2: The photoresist pattern ㈣ is post-baked for 60 minutes, and the photoresist pattern 28 is formed into a tapered shape, and the shape is transferred to the second nozzle layer 2 by ㈣.

亦即,如圖11(a)所示,姓刻率與構成第二喷嘴層2之聚酿 亞胺樹脂大致相等,形成具有錐角壁面似之光阻圖案I 95731.doc -37- 200523123 並以與第二噴嘴層2之蝕刻相同速度來蝕刻光阻圖案28,擴 大光阻圖案28之邊緣。此時,如圖11(b)所示,第二噴嘴層2 亦同時被蝕刻,結果在第二喷嘴層2上,如圖u 所示,步 成具有與具有形成於光阻圖案28之錐角之壁面28八相同形 狀之第二噴嘴孔丨lb。此外,此時由於光阻圖案“與第二噴 嘴層2之蝕刻率大致相等,因此須形成光阻圖案“之厚度= 第二喷嘴層2之厚度更厚。另外,圖u中省略形成於第一喷 嘴層1之第一噴嘴孔11 a部分之記載。 其次,在上述第二喷嘴層2上形成包含以鈦為主要成分之 金屬材料之等二電極層26。此時係使用離子束濺射法,在 0.2 mT〇rr之氬氣壓下,抑制鈦粒子因氬原子而散射,並傾 斜基板使鈦粒子自箭頭K之方向射達,而僅形成於第二噴嘴 層2内壁面之一側,且第二電極層%之—部分形成與第」電 極層25電性短路(參照圖10⑴)。膜厚係〇5 ^爪。 如此,藉由自斜方向入射鈦粒子來形成第二電極層%, 可防止第二電極層26附著於第—噴嘴孔Ua内,藉此,可防 止第一喷嘴孔11a之形狀變化及堵塞。 其次,在上述第二電極層26上形成光阻圖案29來覆蓋第 二噴嘴孔lib與形成於第二噴嘴層2上之第二電極層%之一 部分(參照圖10(g))。該光阻圖案29只須形成覆蓋第二喷嘴 孔nb與形成於第二噴嘴層2上之第二電極層26之_部分即 可,不過本實施例中,形成於第二噴嘴層2上之第二電極層 26為可加工成大致5〇叫徑之圓形形狀的形狀。此時,由於 光阻圖案29係形成埋人第二噴嘴孔山,因此在第二喷嘴孔 95731.doc -38- 200523123 m之最深區*,光阻層之厚度非常厚。因而光阻圖㈣ 須使用曝光之部分殘留作為圖案之正型光阻。 此外,此時須使用上述光阻圖案29而在第二喷脅層2上使 用第二電極層26形成引出配線26a。此時,由於無須以另外 / “作成引出配線26a,因此可簡化步驟。此外,如上述, 由於可經由噴嘴式平板8將引出配線%配置料錄媒體之 相反側,因此可自記錄媒體離開充分距離,避免該引出配 線產生之電場對記錄媒體造成嚴重之電性損傷。 其次’依據上述光阻圖案29,藉由使用以氬氣為主要成 分式㈣來加工第二電極層26,除去光阻圖案 29(茶照圖1()(h))。由於該加工步驟需要將第二電極層%加 工成所需之形狀’因此係在具有高度各向異性之姓刻條件 下進行蝕刻此外,係使用光阻剝離液來除去光阻圖案Μ。 其次,除去上述光阻圖案29後,浸潰於以硝酸與水為主 要成分之水溶液,僅蝕刻犧牲層5,自基板6取出噴嘴式平 板8(圖1〇(小。如前述,由於形成第一喷嘴们、第二喷嘴 層2之聚醯亞胺樹脂,及形成停止们或排出孔層&quot;之鈦幾 乎不被上述犧牲層5之蝕刻液蝕刻,因此可避免因犧牲層5 之蝕刻導致形狀變化及結構性之可靠性降低 其次,在除去犧牲層5之第一噴嘴層丨表面形成拒液層 4(圖10⑴)。此時基於考慮塗敷便利性之宗旨而使用氟聚合 物,並藉由沖壓(Stamp)等方法將其塗敷於第一噴嘴層i表 面,以间为子膜形成厚度為〇 〇5 之拒液層4。另外,就 階躍式覆蓋於第一喷嘴孔丨la内之拒液層4,係於形成拒液 95731.doc -39- 200523123 層4後,使用含氧之電 刻來將其除去。藉此, 小限度。 水错由自第二噴嘴孔1 lb側乾式蝕 可使噴觜式平板8之損傷程度達到最 如以上所述,本實施形態藉由 盥爹彳隹力工步驟中貫施光蝕刻 ’可在排出超微量流體之靜電吸引型流體排出 衣置之μ式平板8上,將各通道分離之第_及第二電極層 25, 26精確度佳地形成於喷嘴孔 猎此,由於各個通道 了早獨地施加排出信號,因此串 像之解像度。 ㈣圖 此外,由於—可形成薄之第一喷嘴们,因此,藉由控制將 形成於第-噴嘴孔lla内壁之第一電極層25予以成膜時之 乳昼’可穩定地成膜至流體排出孔9近旁。藉此,自電極供 給噴嘴前端之電阻R穩定,通道間之排出特性穩定。 另外,本實施形態之犧牲層5係使用鎳,第一噴嘴層^及 弟二噴嘴層2係使用聚醯亞胺樹脂,第一及第二電極層μ, 26係使用鈦,不過並不限定於該組合。 犧牲層5内,除鎳之外,依據與用於第一喷嘴層1、第二 賀嘴層2、第一電極層25及第二電極層%之材料之組合,可 使用鋁、銅等之可溶於硝酸或K〇H水溶液之材料,或是聚 醯亞胺等可藉由氧電漿蝕刻之材料。此外犧牲層5之形成方 法,除電鍍之外,依據材料而可使用蒸鍍法、濺射法及塗 敷法等。 &quot;&quot; 第一噴嘴層1、第二噴嘴層2及第二電極層26可使用因犧 牲層5之蝕刻造成損傷輕微之材料。此外,第一電極層25 95731.doc -40- 200523123 ^吏用對於犧牲層5之_及第二噴嘴孔⑴之餘刻,耐性 兩之材料。 此處,圖12中顯示使用材料(犧牲層、第一喷嘴層、第— 電極層、第二噴嘴層、第二電極層)及加工方法(第一喷嘴 孔、第一電極層、第一喑嵴 弟一貝€孔、弟二電極層、除去犧牲層 之較佳之組合例。 如圖12所示,第一啥趣庶 # 弟贺鳴層1及弟二噴嘴層2並不限定於聚 I亞⑽月曰寻南分子有機材料’亦可選擇石夕或氧化石夕等益 機石夕化合物。不過為求乾式钮刻氧化石夕及石夕,需要使用含 氣之反應氣韓.,由於本實施形態中使用之鈦之耐性低,因 此須利用金、銘等具有姓刻耐性之材料作為第一電極層Μ 或第二電極層26。 曰 此外’第-電極層25或第二電極層26,除鈦之外,亦可 依據圖12所示之組合而使用該表中記載之材料。 另外’第-電極層25材料之鈦,即使是使用四氣化碳( 與氧之混合氣體之電漿,仍可以較快之㈣速度進行姓 刻。但疋,形成於鈦下之第一喷嘴層u聚醯亞胺)被上述氣 體之▲電漿:刻速度比鈦快,而受到較大損傷。因此,本實 —一在第电極層25及第二電極層26之圖案化時,係採 用氬離子之乾式蝕刻法。 、 二IT第一電極層25或第二電極層26之餘刻率 、、1曰1或第二噴嘴層2之蝕刻率差異小之氬離子之 5㈣法,可將第-喷嘴層1或第二喷嘴層2之損傷抑制 在取小限度,而將第一電極層25或第二電極層辦以圖案 95731.doc -41 - 200523123 化0 此外,本實施形態係藉由蝕刻完全除去犧牲層5,不過亦 無須完全除去犧牲層5,而藉由僅蝕刻除去犧牲層5中與第 一喷嘴層1接觸之部分,即可自基板6取出噴嘴式平板8。 此外,拒液層4並不限定於氟聚合物,亦可使用矽系高分 子膜及DLC(類似鑽石碳)等。 糟由使用以上之加工步驟,可製造發揮上述①〜⑤項作用 之噴嘴式平板8。 'That is, as shown in FIG. 11 (a), the engraving rate is approximately equal to the polyimide resin constituting the second nozzle layer 2, and a photoresist pattern with a tapered wall surface is formed. I 95731.doc -37- 200523123 and The photoresist pattern 28 is etched at the same speed as the etching of the second nozzle layer 2 to expand the edge of the photoresist pattern 28. At this time, as shown in FIG. 11 (b), the second nozzle layer 2 is also etched at the same time. As a result, as shown in FIG. U, the second nozzle layer 2 is formed to have a cone formed with a cone formed on the photoresist pattern 28. The corner wall surface 28 has a second nozzle hole lb of the same shape. In addition, at this time, since the photoresist pattern "is substantially equal to the etching rate of the second nozzle layer 2, the thickness of the photoresist pattern" must be formed = the thickness of the second nozzle layer 2 is thicker. The description of the portion of the first nozzle hole 11a formed in the first nozzle layer 1 is omitted in FIG. Next, on the second nozzle layer 2 are formed two electrode layers 26 including a metal material containing titanium as a main component. At this time, the ion beam sputtering method is used to suppress the scattering of titanium particles due to argon atoms under an argon gas pressure of 0.2 mTorr, and the substrate is tilted so that the titanium particles reach the direction of the arrow K, and are formed only in the second nozzle. One side of the inner wall surface of the layer 2 and a part of the second electrode layer% forms an electrical short circuit with the first electrode layer 25 (see FIG. 10 (a)). The film thickness is 0 5 ^ claw. In this way, the second electrode layer% is formed by incident titanium particles from an oblique direction, so that the second electrode layer 26 can be prevented from adhering to the first nozzle hole Ua, and thereby the shape change and blockage of the first nozzle hole 11a can be prevented. Next, a photoresist pattern 29 is formed on the second electrode layer 26 to cover a portion of the second nozzle hole 1 b and the second electrode layer% formed on the second nozzle layer 2 (see FIG. 10 (g)). The photoresist pattern 29 only needs to form a part covering the second nozzle hole nb and the second electrode layer 26 formed on the second nozzle layer 2, but in this embodiment, it is formed on the second nozzle layer 2. The second electrode layer 26 has a shape that can be processed into a circular shape having a diameter of approximately 50 mm. At this time, since the photoresist pattern 29 forms a buried second nozzle hole mountain, the thickness of the photoresist layer is very thick in the deepest region * of the second nozzle hole 95731.doc -38- 200523123 m. Therefore, the photoresist pattern must be used as a pattern of the photoresist. In addition, at this time, it is necessary to use the above-mentioned photoresist pattern 29 and use the second electrode layer 26 on the second spray layer 2 to form the lead-out wiring 26a. At this time, since it is not necessary to create the lead-out wiring 26a separately, the steps can be simplified. In addition, as described above, the lead-out wiring can be arranged on the opposite side of the recording medium via the nozzle plate 8, so that it can be sufficiently separated from the recording medium. Distance to avoid serious electrical damage to the recording medium caused by the electric field generated by the lead-out wiring. Secondly, according to the above-mentioned photoresist pattern 29, the second electrode layer 26 is processed by using argon as the main component to remove photoresist. Pattern 29 (Tea Photo Figure 1 () (h)). Since this processing step requires the second electrode layer to be processed into the desired shape, it is etched under the condition of highly anisotropic engraving. In addition, the system The photoresist pattern M is removed using a photoresist stripping solution. Next, after the photoresist pattern 29 is removed, it is immersed in an aqueous solution containing nitric acid and water as main components, only the sacrificial layer 5 is etched, and the nozzle plate 8 is taken out of the substrate 6 ( Fig. 10 (small. As mentioned above, due to the formation of the polyimide resin of the first nozzles and the second nozzle layer 2 and the formation of the stoppers or the exhaust hole layer ", the titanium is hardly corroded by the sacrificial layer 5 described above. Etching liquid etching, so that the shape change and structural reliability reduction caused by the etching of the sacrificial layer 5 can be avoided, and the liquid-repellent layer 4 is formed on the surface of the first nozzle layer 丨 where the sacrificial layer 5 is removed (Figure 10⑴). Considering the purpose of coating convenience, a fluoropolymer is used, and it is applied to the surface of the first nozzle layer i by stamping or the like, and a liquid-repellent layer having a thickness of 0.05 is formed with a sub film in between. In addition, the liquid-repellent layer 4 that covers the first nozzle hole step by step is formed after the liquid-repellent 95731.doc -39- 200523123 layer 4 is formed, and then it is removed using an oxygen-containing electrocut. This is a small limit. Water can be dry-etched from the side of the second nozzle hole by 1 lb. The damage degree of the spray-type plate 8 can be maximized as described above. Etching can form the first and second electrode layers 25, 26 of each channel on the μ-type flat plate 8 on which the electrostatically attracted fluid discharge clothing which discharges a very small amount of fluid is formed. Each channel applied the exhaust signal early and independently, so the string image was resolved In addition, since thin first nozzles can be formed, by controlling the film formation of the first electrode layer 25 formed on the inner wall of the first nozzle hole 11a, the film can be formed stably. It is near the fluid discharge hole 9. As a result, the resistance R from the tip of the electrode supply nozzle is stable, and the discharge characteristics between the channels are stable. In addition, the sacrificial layer 5 of this embodiment uses nickel, the first nozzle layer ^ and the second nozzle layer. Polyimide resin is used for the 2 series, μ is used for the first and second electrode layers, and titanium is used for the 26 series, but it is not limited to this combination. The sacrificial layer 5 is used for the first nozzle layer 1 except for nickel. , The second nozzle layer 2, the first electrode layer 25 and the second electrode layer% of the material combination, can use aluminum, copper and other materials soluble in nitric acid or KOH solution, or polyimide, etc. Material that can be etched by oxygen plasma. As the method for forming the sacrificial layer 5, in addition to electroplating, a vapor deposition method, a sputtering method, a coating method, or the like can be used depending on the material. &quot; &quot; As the first nozzle layer 1, the second nozzle layer 2, and the second electrode layer 26, a material that is slightly damaged by the etching of the sacrificial layer 5 can be used. In addition, the first electrode layer 25 95731.doc -40- 200523123 is a material that is resistant to both the sacrificial layer 5 and the second nozzle hole 刻. Here, Fig. 12 shows the materials used (sacrifice layer, first nozzle layer, first electrode layer, second electrode layer, second electrode layer) and processing method (first nozzle hole, first electrode layer, first ridge). The best example of the combination of the hole, the second electrode layer, and the sacrificial layer is removed. As shown in FIG. 12, the first what is interesting # # 贺贺鸣 层 1 and the second nozzle layer 2 are not limited to poly I Yayue Yue said that the southern molecular organic materials can also be selected from Shixi or Oxidized Shixi compounds. However, in order to dry-type carved stone Xixiu and Shixi, it is necessary to use a gas containing reaction gas. Titanium used in this embodiment has low resistance, so it is necessary to use a material such as gold or an inscription resistant material as the first electrode layer M or the second electrode layer 26. In addition, the first electrode layer 25 or the second electrode layer 26. In addition to titanium, the materials described in this table can also be used in accordance with the combination shown in Figure 12. In addition, the titanium of the "first-electrode layer 25" material, even if it uses four gaseous carbon (a mixed gas with oxygen Plasma can still be engraved at a faster speed. However, it is formed in titanium. The first nozzle layer (polyimide) is affected by the plasma of the above gas: the etching speed is faster than titanium, and it is greatly damaged. Therefore, the actual-one in the first electrode layer 25 and the second electrode layer 26 During patterning, dry etching using argon ions is used. The remaining etch rate of the two IT first electrode layers 25 or the second electrode layers 26, and the argon ions with small differences in the etching rate of the first nozzle layer 2 or the second nozzle layer 2. In the fifth method, the damage of the first nozzle layer 1 or the second nozzle layer 2 can be suppressed to a minimum, and the first electrode layer 25 or the second electrode layer can be patterned 95731.doc -41-200523123. In this embodiment, the sacrificial layer 5 is completely removed by etching, but it is not necessary to completely remove the sacrificial layer 5, and only the portion of the sacrificial layer 5 that is in contact with the first nozzle layer 1 can be removed from the substrate 6 by etching. Type flat plate 8. In addition, the liquid-repellent layer 4 is not limited to a fluoropolymer, and a silicon-based polymer film, DLC (similar to diamond carbon), etc. can also be used. By using the above processing steps, the above-mentioned ① ~ ⑤ Nozzle type flat plate 8. '

[第二種實施形態] 使用圖13〜圖16說明本發明其他實施形態如下。另外,為 求便於說明’具有與第一種實施形態之圖式所示構件相同 功能之構件,係註記相同符號,而省略其說明。 (喷嘴式平板) 圖13(a)係本實施形態之噴嘴式平板8〇之一部分立體圖, 圖13(b)係圖13⑷之B_B,線剖面圖。喷嘴式平板⑼上形成有[Second Embodiment] Another embodiment of the present invention will be described below with reference to Figs. 13 to 16. In addition, for the convenience of explanation, members having the same functions as those shown in the drawings of the first embodiment are denoted by the same reference numerals, and descriptions thereof are omitted. (Nozzle-type flat plate) FIG. 13 (a) is a partial perspective view of a nozzle-type flat plate 80 of this embodiment, and FIG. 13 (b) is a cross-sectional view taken along line B_B of FIG. 13 (a). Nozzle-type plate ⑼ is formed

2個以上之流體排出孔9,圖13⑷中顯示有2個流體排出孔 9。此外’圖13(c)係自流體供給側觀察喷嘴式平板肋之 分之立體圖。 ^ 如圖13⑷〜圖13(c)所示,喷嘴式平板8〇之形成於第—1 紫層10之第-噴嘴孔Ue,與第二噴嘴孔同樣地係錐 形狀亚且在噴嘴式平板80之流體排出面術上,形成 面电極層81 ’來堵塞第—嗔嘴孔i ie之流體排出側之 部,形成於該表面電極層81之貫穿孔化成$流體排^ 9。而後,上述表面電極層81與形成於第一喷嘴孔内层 95731.doc -42- 200523123 之第一電極層25電性連接,可經由第一電極層25及第二電 極層26,自噴嘴式平板8〇之流體供給側施加驅動信號。此 4 ’第二喷嘴層20亦係採用1層,不過亦可為2層以上。 另外,圖13(a)(c)中,亦係為求簡化圖式,而省略形成於 構成喷嘴孔11之第一喷嘴孔丨lc及第二喷嘴孔丨lb各内壁之 第一電極層25及第二電極層26。 以下,說明各部之尺寸及材質之具體例,不過本發明並 不限定於其具體例。 表面電極層81使用以鉑為主要成分之金屬材料,為求減 _ &gt;、正個貞為g平板8〇之應力,而形成5 徑之大致圓形形 狀。此外,表面電極層81之厚度為〇.5 μιη。 本貫施形悲之第一噴嘴層丨〇包含以氧化矽為主要成分之 然機材料,厚度形成2 μιη。第二喷嘴層2〇包含以聚醯亞胺 樹脂為主要成分之有機材料,並形成⑼^㈤之膜厚。第一電 極層25及第二電極層26使用以鈦為主要成分之金屬材料, 並形成0·5 μηι之膜厚。 形成於表面電極層81之貫穿孔81a之流體排出孔9之口#鲁 為2 Mm,對膜面垂直加工至與第一喷嘴孔uc之連通部^ 通孔)。此時,流體排出孔9之口徑基於與第一種實施形態 相同之理由’須為φ10μπι以下’更宜為㈣㈣以下。 六此外,第一噴嘴孔丨lc之與流體排出孔9之連通部,亦即 _ 机體排出側開口部加工成4 μηι之口徑,並加工成扇形擴大 至與第二噴嘴孔llb之連通部之錐角形狀(圓錐台形狀 此外,第二噴嘴孔llb與第一喷嘴孔Uc之連通部,亦即 95731.doc -43- 200523123 流體排出側開口部加工成2〇 μιη之口徑,係扇形擴大之錐角 形狀(圓錐台形狀),並通過第二喷嘴層20,在噴嘴式平板8〇 · 之流體供給面80b上開口。 另外,圓錐台形狀之第一喷嘴孔11c之上底丨丨吖係以流體 排出孔9為大致中心之圓環形狀,表面電極層8 i之一部分形 成該上底llcy而露出。因此,流體排出孔9與第一噴嘴孔Uc 之連通孔Ilex(大致圓形)之口徑,比第一噴嘴孔1。之上底 1 ley之外口徑(在上述連通孔丨lcx之第一噴嘴孔} 之外形) 小。鲁 再者,圓錐台形狀之第二喷嘴孔llb之上底丨丨一係以第一 喷嘴孔lie為大致中心之圓環形狀,第一電極層之一部分形 成该上底llby而露出。因此,第一噴嘴孔Uc與第二喷嘴孔 lib之連通孔llbx(大致圓形)之口徑,比第二喷嘴孔lb之上 底1 lby之外口徑(在上述連通孔丨lbx之第二喷嘴孔} b之外 形)小。 此外,除第一喷嘴孔llc内壁之至少一部分,在第一喷嘴 孔lief第二噴嘴孔llb連通之周邊部形成有成為延伸部 25b之第私極層25。此時,由於構成第一喷嘴層1〇之氧化 在t述之第_喷嘴孔i i b加工時,對含氧之電裝之乾式姓 刻顯不π耐性,因此不形成第—電極層25之延伸部⑽,第 貝酱層10或第一喷嘴孔llc即使暴露在第二喷嘴孔⑽之 ㈣情況下,幾乎不被㈣’第_噴嘴孔⑴之形狀不致變 形0 反之,第一噴嘴層10使用第二噴嘴孔llb加工時耐性低之 95731.doc -44· 200523123 材料時(如第—種實施形態之情況,第-喷嘴層10與第二喷 嘴層20為相同材料),第一電極層25須形成覆蓋第—喷嘴孔 11c之内壁全部。亦即,第一電極層25在第二喷嘴孔&quot;b之 加工步驟中,係發揮保護第一喷嘴孔山或第—噴嘴層, 避免被#刻之保護層之功能。 此外,在第二噴嘴孔llb内壁形成有與上述第一電極層^ 電性連接之第二電極層26。此外,第二電極層^之一部分 亦配置於形成噴嘴式平板80之流體供給面嶋之第二喷嘴 層2〇之流體供給側表面,如圖13⑷所示,藉由形成於該表 面之將弟—電極層26加卫後之引出配線^,而連接於圖上 未顧示之驅動信號電壓施加手段。拒液層4係由且有厚产為 〇-〇5#m之氟聚合物之高分子材料形成。 又 此^由於表面電極層81對於第一噴嘴孔nc之韻刻手段 匕有门&quot;生因此,流體排出孔9之形狀不致因上述第一喷 UUlca之餘刻而變形。此外’由於對喷灑精確度影響重 大之喷嘴式平板之流體排出 後 &amp; 〇 山扎^炙形狀,係依成為表面電極 層81之上述之鈦膜之加工 確度來決疋,因此流體 =孔9之加工精確度非常高,如此可確保非常高之喷灑精 再者,為求提高流體排出孔9 電極㈣之膜厚時,雖可,、更_^確度而減少表面 丨、主 Τ隹了纹仟更向之加工精確度,不過, 口減 &gt; 表面電極層81之膜 ^ 、、夂表面電極層81之剛性降 低’ 排出孔9之結構性之可靠性降低。 但是’如此藉由與表面電極㈣接觸來配置第—喷嘴層 95731.doc -45- 200523123 〇:即可補強表面電極層81,不致降低表面電極層。之結 可靠性,而可提高流體排出孔9之形狀精確度。 由於第-電極層25對於第二嘴嘴孔爪之韻刻手段 八有南耐性,因此第-噴嘴孔Ue之形狀不致因第二喷嘴孔 ib之加工而大幅變形,並且第一嘴嘴層_致因第二喷嘴 孔11 b加工之過度蝕刻而被完全除去。 另、外’用於表面電極層81之材料並不^於以始為主要 ^刀之金屬材料。只要是於第—噴嘴孔山之㈣及第二噴 孔m之㈣及後述之犧牲層%之㈣與階躍式覆蓋於 流體排出孔%之拒液層4之㈣時,對該㈣具有高财性 之材料,亦即只要是可耐含氟之電漿、含氧之電漿、硝酸 錢氧化鉀水溶液等高之材料即可,可依與犧牲層刻、 弟一嘴嘴孔加工及第二噴嘴孔加工方法之組合來使用。且 體而言,如以紹、銅、銘、鐵、錦、金、始等為主要成分 之金屬材料’可藉由與上述钮刻氣體或姓刻劑之组 擇。 其他第—喷嘴層1〇、第二嘴嘴層2〇、第一電極層25及第 二電極層26等之材料亦均不限定於上述者,其材料與製造 方法之較佳組合於後述。 此外,本貫施形態之第二噴嘴孔丨ib係與第一喷嘴孔He 之連通孔(連通部)llbx變窄之圓錐台形狀(錐角形狀),不過 f不限=於此。如圖14所示之變形例之喷嘴式平板8〇,,亦 可形成第一贺嘴孔1 ib之側壁與停止層3垂直之所謂筆直形 狀(圓筒形狀)。此時,可使第二噴嘴孔llb之流體供給孔12 95731.doc -46 - 200523123 更小,可進一步提高噴嘴之積體度。此外,如圖14所示, 第二電極層26亦可形成於第二喷嘴孔Ub之整個内壁面,此 時第二電極層26關於電傳導之可靠性提高。 此外,此時係對對應於丨個喷嘴孔丨丨之丨個表面電極層Η 形成1個貫穿孔81a’不過亦可採用在丨個表面電極層8ι上形 成數個貫穿孔,對於丨個喷嘴孔丨丨具有數個流體排出孔9之 構造。 此外,亦可如第一種實施形態之噴嘴式平板8之情況,將 第一喷嘴孔1 lc形成側壁對於噴嘴式平板表面垂直之所謂 筆直形狀(圓筒形狀)。此時由於第_噴嘴孔之加工精確度提 高,因此可縮小表面電極層81之形狀,可減少表面電:層 8 1產生之應力。 糟由形成本實施形態構造之喷嘴式平板8〇(8〇,),除前述 ①〜⑤項之外,還可發揮以下的作用。 ⑥ 由於第-噴嘴孔Ue係、形成錐角形狀,因此形成於第一喷 嘴孔11C内之第—電極層25之敷層性(Coverage)加關於導電 性之可靠性提高。 ⑦ 由於形成於薄膜之表面電極層81之貫穿孔…成為流體 排出孔9,因此加工精確度非常高,並且流體排出孔9之形 狀不致因形成第一電極層25而變化,因此排出可靠性提 高。 (噴鳴式平板之製造方法) 其次說明本實施形態之噴嘴式平板8g之—種製造方法。 圖15(a)〜(g)係噴嘴式平板8〇製程之說明圖。 95731.doc -47- 200523123 首先,在基板6上與第一種實施形態同樣地形成犧牲層 50(圖15(a))。此時,犧牲層5〇之厚度為1〇#^。進一步在上 述犧牲層50上,以蒸鍍等方法形成厚度為〇5口之鉑膜, 使用光蝕刻形成將表面電極層81局部形成於喷嘴孔n形成 W刀之外形形狀,及成為流體排出孔9之貫穿孔8丨&amp;之形狀 之光阻圖案。而後,使用乾式蝕刻法同時加工上述表面電 極層8 1之外形形狀與流體排出孔9。 由於鉑膜係化學性較鈍性之材料,因此,此時上述乾式 蝕刻係採用使用氬之濺射蝕刻,物理性之加工藉由支配性 之方法進行却工。此外,由於本加工係以非常高之精確度 進行口此係使用各向異性高之韻刻條件。此時,上述表 面電極層8 1之形狀加工成5 μιη徑之大致圓形形狀。此外, 配置於上述表面電極層81内部之流體排出孔9係形成2 徑之大致圓形形狀。 其次,在上述犧牲層5〇及表面電極層81上,藉由p_cvD 法形成包含氧化矽膜之第一喷嘴層1〇。採用本1&gt;&lt;乂1)法 %,由於可藉由用於成膜之氣體組成、氣壓、產生電漿用 之RF功率來控制成膜之氧化矽膜具有之應力,並且階差部 成膜均勻性佳,因此上述表面電極層8丨之階差部不致產生 龜裂等’臈之結構性之可靠性高。因此喷嘴式平板整體結 構性之可靠性提高(參照圖150))。 其次,在上述第一噴嘴層1〇上,藉由光蝕刻作成光阻圖 案,並藉由含氟氣與氧氣之反應性離子蝕刻(RIE)加工,加 工後,藉由光阻剝離液除去光阻(參照圖15(b))。本蝕刻方 95731.doc -48- 200523123 法,由於藉由電漿而活化之氟選擇性與矽原子反應,因此 氧化矽之蝕刻速度非常高。反之,如上述,由於翻係化學 性穩定之材料,因此幾乎不與前述活化之氟反應。因而鉑 之蝕刻速度慢,藉此,本蝕刻可精確地在前述表面電極層 81與第一噴嘴層1〇之界面停止。 此外,本加工步驟係藉由使用含氟氣與氧氣之電漿,將 氧化矽與光阻之蝕刻速度設定成相同程度,採用第一種實 施形態在加工第二喷嘴層20之步驟中使用之反映光阻形狀 之方法來加工氧化矽,而將第—噴嘴孔Uc加工成錐角形 狀。此時,第—一喷嘴孔11c之位於與表面電極層81之接合部 之形狀,係形成4 pm徑之大致圓形形狀,與第二喷嘴層2〇 之界面之開口徑形成6 μπι。此外,第一喷嘴孔Uc之形狀係 加工成大於流體排出孔9,並在第一噴嘴孔Uc之圖案内配 置流體排出孔9。 此外,由於上述第一喷嘴孔11〇只須接合於表面電極層81 即可,因此除錐角形狀之外,亦可為對噴嘴面垂直之所謂 筆直形狀。 其次,藉由離子束濺射,自箭頭匕丨方向(對第一噴嘴層10 表面形成18。)形成鈦膜,在上述表面電極層81與第一喷嘴 孔lie之一部分及第一噴嘴層10上形成厚度為〇·5 之第 一電極層25。此時,須考慮第一噴嘴孔i丨c之形狀及第一噴 嘴層10之厚度,來決定鈦粒子之入射方向,避免上述鈦膜 在形成於上述表面電極層81之流體排出孔9内部成膜。此 外,此時係固定基板來形成第一電極層25,不過可在設定 9573 l.doc -49- 200523123 上述入射角度後,藉由以喷嘴面之法線方向為令心使基板 疑轉’可在第-噴嘴孔llc側壁全面形成第_電極層^。如 此形成之附著於第-喷嘴孔側壁全面之第一電極料,在 後述之第二喷嘴孔加工時,可發揮第—噴嘴孔山之保護層 之功能。 +其次’制乾式_法來力α上述第_電極層25在第一 戈背層ίο上之外形形狀。本加工係採用第一種實施形態中 加工第二電極層26時實施之加工方法來進行。亦即,以正 型之光阻形成所需之圖案後,藉由使用以氬氣為主要成分 之電漿之乾0刻來進行加工。此時配置於第一喷嘴層1〇 /與第二噴嘴層20界面之第一電極層25之形狀係形成Μ叫 徑之大致圓形形狀(參照圖15(〇)。 其次’在上述第一噴嘴層1〇上’以厚度2〇_形成塗敷型 之聚醯亞㈣脂膜’而形成第二噴嘴層2()(參照圖叫句)。 此時,上述塗敷型聚醯亞胺樹脂藉由自旋式塗敷法而塗敷 於第一喷嘴層1〇上,並在35〇tT燒成2小時。此時流體排 出孔9及第一喷嘴孔Uc亦被聚醯亞胺樹脂掩埋。 其次’在上述第二噴嘴層2〇上,藉由光敍刻而形成光阻 圖㈣,進行使用以氧為主要成分之氣體之乾式敍刻,而 在弟二喷嘴層20上形成錐角形狀(圓錐台形狀)之第二喷嘴 孔11 b(參照圖1 5(e))。 、另外’上述乾式蝕刻可以第-喷嘴層10、第一電極層25 或表面屯極層81 止。亦即,除第一噴嘴孔山之外,第一 贺嘴層10或第-電極層25露出之部位不進行過度之乾式蝕 95731 .doc •50- 200523123 刻。此外,同樣地,表面電極層81除上述流體排出孔9之外, 表面電極層8i露出之部位不進行過度之乾式蝕刻。亦即, 在第二喷嘴孔m之加卫製程中,於先前步驟被聚酿亞胺樹 脂掩埋之第-喷嘴孔llc及流體排出孔9,藉由除去聚醒亞 胺樹脂而重現,流體排出孔9以藉由形成於表面電極層μ 之圖案所決定之形狀而存在之第二噴嘴層2〇材料被除去, 而重現在先前步驟被聚醯亞胺樹脂掩埋之形狀。Two or more fluid discharge holes 9 are shown in Fig. 13 (2). In addition, Fig. 13 (c) is a perspective view of the nozzle plate ribs as viewed from the fluid supply side. ^ As shown in FIGS. 13 (a) to 13 (c), the nozzle plate 80 is formed at the first nozzle hole Ue of the first -1 purple layer 10, and is similar to the second nozzle hole in a tapered shape and is formed in the nozzle plate. In the fluid discharge surgery of 80, a surface electrode layer 81 'is formed to block the part on the fluid discharge side of the first-bouthole hole i ie, and the through hole formed in the surface electrode layer 81 is turned into a fluid discharge ^ 9. Then, the surface electrode layer 81 is electrically connected to the first electrode layer 25 formed in the first nozzle hole inner layer 95731.doc -42- 200523123, and can be self-nozzled through the first electrode layer 25 and the second electrode layer 26. A driving signal is applied to the fluid supply side of the plate 80. The 4 'second nozzle layer 20 is also one layer, but it may be two or more layers. In addition, in FIGS. 13 (a) and (c), the first electrode layer 25 formed on each inner wall of the first nozzle hole 丨 lc and the second nozzle hole lb constituting the nozzle hole 11 is omitted for simplicity. And the second electrode layer 26. Hereinafter, specific examples of the dimensions and materials of each part will be described, but the present invention is not limited to the specific examples. The surface electrode layer 81 is made of a metal material containing platinum as a main component, and is formed into a substantially circular shape with a diameter of 5 in order to reduce the stress of a flat plate 80. In addition, the thickness of the surface electrode layer 81 is 0.5 μm. The first nozzle layer of the original shape is composed of an organic material containing silicon oxide as a main component, and has a thickness of 2 μm. The second nozzle layer 20 contains an organic material containing polyimide resin as a main component, and forms a film thickness of ⑼ ^ ㈤. The first electrode layer 25 and the second electrode layer 26 are made of a metal material containing titanium as a main component, and formed into a film thickness of 0.5 μm. The mouth #lu of the fluid discharge hole 9 formed in the through hole 81a of the surface electrode layer 81 is 2 Mm, and the film surface is processed vertically to the communication portion with the first nozzle hole uc (through hole). At this time, for the same reason as in the first embodiment, the diameter of the fluid discharge hole 9 must be "10 µm or less", and more preferably ㈣㈣ or less. Sixth, in addition, the communication portion of the first nozzle hole 丨 lc and the fluid discharge hole 9, that is, the opening portion of the body discharge side is processed to a diameter of 4 μm, and processed into a fan shape to expand to the communication portion with the second nozzle hole 11b Taper angle shape (conical frustum shape) In addition, the connecting portion of the second nozzle hole 11b and the first nozzle hole Uc, that is, 95731.doc -43- 200523123, the opening on the fluid discharge side is processed to a diameter of 20 μm, which is enlarged in a sector The cone-shaped shape (conical frustum shape) passes through the second nozzle layer 20 and opens on the fluid supply surface 80b of the nozzle plate 80. In addition, the first conical frustum-shaped first nozzle hole 11c is upper and lower. It is a circular shape with the fluid discharge hole 9 as the center, and a part of the surface electrode layer 8 i forms the upper bottom llcy and is exposed. Therefore, the communication hole Ilex (substantially circular) of the fluid discharge hole 9 and the first nozzle hole Uc is exposed. The diameter of the second nozzle hole is smaller than that of the first nozzle hole 1. The outer diameter of the upper bottom 1 ley (outside of the above-mentioned communication hole lcx first nozzle hole}) is smaller than the first nozzle hole 11b. Upper bottom 丨 The first nozzle hole lie is The shape of the ring shape in the center, a part of the first electrode layer is formed by the upper bottom llby and exposed. Therefore, the diameter of the communication hole llbx (substantially circular) of the first nozzle hole Uc and the second nozzle hole lib is smaller than that of the second nozzle The upper diameter of the hole 1b is smaller than the outer diameter of the first nozzle hole (the shape of the second nozzle hole of the communication hole lbx) is small. In addition, at least a part of the inner wall of the first nozzle hole 11c is second at the first nozzle hole lief. The peripheral portion communicating with the nozzle hole 11b is formed with the second private electrode layer 25 which becomes the extension portion 25b. At this time, due to the oxidation of the first nozzle layer 10, the oxygen-containing electricity is processed during the processing of the _nozzle hole ib described in t. The dry-type surname is engraved with impatience, so the extension part of the first electrode layer 25 is not formed. Even if the second shell layer 10 or the first nozzle hole 11c is exposed to the second nozzle hole ⑽, it is almost not ㈣ '第 _Nozzle hole ⑴'s shape will not be deformed. 0 Conversely, when the first nozzle layer 10 is processed with the second nozzle hole 11b, the resistance is low 95731.doc -44 · 200523123 material (such as the case of the first embodiment, the -The nozzle layer 10 and the second nozzle layer 20 are the same material), the The electrode layer 25 must be formed to cover the entire inner wall of the first nozzle hole 11c. That is, in the processing step of the second nozzle hole &quot; b, the first electrode layer 25 plays a role in protecting the first nozzle hole mountain or the first nozzle layer. Avoid the function of the protective layer carved by #. In addition, a second electrode layer 26 electrically connected to the first electrode layer ^ is formed on the inner wall of the second nozzle hole 11b. In addition, a part of the second electrode layer ^ is also disposed on the The fluid-supply-side surface of the second nozzle layer 20 forming the fluid-supplying surface of the nozzle plate 80 is shown in Fig. 13 (a). It is connected to a driving signal voltage applying means not shown in the figure. The liquid-repellent layer 4 is formed of a polymer material having a thickness of fluoropolymer of 0-〇5 # m. In addition, since the surface electrode layer 81 has a method for engraving the first nozzle hole nc, the shape of the fluid discharge hole 9 is not deformed by the above-mentioned first spray UUlca. In addition, 'after the discharge of the fluid of the nozzle-type flat plate which has a great influence on the accuracy of spraying, the shape is determined by the processing accuracy of the above-mentioned titanium film which becomes the surface electrode layer 81, so fluid = hole The processing accuracy of 9 is very high, so that it can ensure a very high spraying accuracy. In addition, in order to improve the film thickness of the electrode 9 of the fluid discharge hole, although it is possible, the surface can be reduced with more accuracy. In order to improve the processing accuracy of the grain, the thickness of the surface electrode layer 81 is reduced, the rigidity of the surface electrode layer 81 is reduced, and the reliability of the structure of the discharge hole 9 is reduced. However, 'the nozzle layer 95731.doc -45- 200523123 〇 is arranged by contacting the surface electrode 如此 in this way, the surface electrode layer 81 can be reinforced without reducing the surface electrode layer. As a result, the accuracy of the shape of the fluid discharge hole 9 can be improved. Since the first-electrode layer 25 is highly resistant to the engraving means of the second nozzle hole claw, the shape of the first nozzle hole Ue is not greatly deformed by the processing of the second nozzle hole ib, and the first nozzle layer _ As a result of the over-etching of the second nozzle hole 11 b, it was completely removed. In addition, the material used for the outer surface electrode layer 81 is not a metal material with the beginning as the main blade. As long as it is the first nozzle hole mountain, the second nozzle hole m, and the sacrificial layer% described later, and the step of the liquid-repellent layer 4 covering the fluid discharge hole%, it has a high Financial materials, that is, as long as it is resistant to fluorine-containing plasma, oxygen-containing plasma, potassium nitrate aqueous solution of potassium oxide, etc., it can be engraved with sacrificial layers, hole processing and It is a combination of two nozzle hole processing methods. In particular, for example, the metallic materials including Shao, copper, Ming, iron, brocade, gold, and so on as the main components can be selected through the combination of the above-mentioned button gas or last name engraving agent. The other materials of the first nozzle layer 10, the second nozzle layer 20, the first electrode layer 25 and the second electrode layer 26 are not limited to those described above, and a preferable combination of the materials and the manufacturing method is described later. In addition, the second nozzle hole ib in this embodiment is a conical frustum shape (tapered angle shape) in which the communication hole (connecting portion) 11bx of the first nozzle hole He is narrowed, but f is not limited to this. The nozzle flat plate 80 according to the modification shown in FIG. 14 may also be formed in a so-called straight shape (cylindrical shape) in which the side wall of the first nozzle hole 1 ib is perpendicular to the stop layer 3. At this time, the fluid supply hole 12 95731.doc -46-200523123 of the second nozzle hole 11b can be made smaller, and the integrated degree of the nozzle can be further improved. In addition, as shown in FIG. 14, the second electrode layer 26 may also be formed on the entire inner wall surface of the second nozzle hole Ub. At this time, the reliability of the second electrode layer 26 with respect to electrical conduction is improved. In addition, at this time, one through-hole 81a 'is formed for one surface electrode layer corresponding to 丨 nozzle holes 丨 丨. However, it is also possible to form several through-holes in 丨 surface electrode layer 8ι. For 丨 nozzles, The hole 丨 丨 has a structure of a plurality of fluid discharge holes 9. In addition, as in the case of the nozzle plate 8 of the first embodiment, the first nozzle hole 1 lc may be formed into a so-called straight shape (cylindrical shape) whose side wall is perpendicular to the surface of the nozzle plate. At this time, since the machining accuracy of the _th nozzle hole is improved, the shape of the surface electrode layer 81 can be reduced, and the surface electricity: the stress generated by the layer 81 can be reduced. The nozzle-type flat plate 80 (80,) which forms the structure of this embodiment, besides the above items ① to ⑤, can also play the following functions. ⑥ Since the first nozzle hole Ue is formed in a tapered shape, the coverage of the first electrode layer 25 formed in the first nozzle hole 11C and the reliability of the conductivity are improved. ⑦ Because the through-holes formed on the surface electrode layer 81 of the thin film ... become the fluid discharge holes 9, the machining accuracy is very high, and the shape of the fluid discharge holes 9 is not changed by the formation of the first electrode layer 25, so the discharge reliability is improved . (Manufacturing method of spray-type flat plate) Next, a manufacturing method of the nozzle type flat plate 8g of this embodiment is demonstrated. 15 (a) to (g) are explanatory diagrams of a nozzle-type flat plate 80 manufacturing process. 95731.doc -47- 200523123 First, a sacrificial layer 50 is formed on the substrate 6 in the same manner as in the first embodiment (Fig. 15 (a)). At this time, the thickness of the sacrificial layer 50 is 10 mm. Further, a platinum film having a thickness of 0.05 is formed on the sacrificial layer 50 by a method such as vapor deposition, and the surface electrode layer 81 is partially formed on the nozzle hole n to form a W-blade shape by photo-etching and a fluid discharge hole. Photoresist pattern in the shape of 9 through holes 8 丨 &amp;. Then, the above-mentioned external shape of the surface electrode layer 81 and the fluid discharge hole 9 are simultaneously processed by a dry etching method. Since the platinum film is a chemically inert material, at this time, the dry etching method described above uses sputtering etching using argon, and physical processing is performed by a dominant method. In addition, since this process is performed with a very high degree of accuracy, it uses a highly anisotropic rhyme condition. At this time, the shape of the surface electrode layer 81 is processed into a substantially circular shape with a diameter of 5 µm. In addition, the fluid discharge holes 9 arranged inside the surface electrode layer 81 are formed into a substantially circular shape with a two diameters. Next, on the sacrificial layer 50 and the surface electrode layer 81, a first nozzle layer 10 including a silicon oxide film is formed by a p_cvD method. With this 1 &gt; &lt; 1) method%, the stress of the silicon oxide film formed can be controlled by the gas composition, gas pressure, and RF power used to generate the plasma for the film formation, and the step formation is The uniformity of the film is good, so the stepped portion of the surface electrode layer 8 丨 described above does not cause cracks and the like, and has high structural reliability. Therefore, the reliability of the overall structure of the nozzle plate is improved (see FIG. 150)). Next, a photoresist pattern is formed on the first nozzle layer 10 by photoetching, and is processed by reactive ion etching (RIE) containing fluorine gas and oxygen. After processing, the photoresist is removed by a photoresist stripping solution. Resistance (see Figure 15 (b)). This etching method 95731.doc -48- 200523123 method, because the fluorine activated by the plasma selectively reacts with silicon atoms, so the etching speed of silicon oxide is very high. On the other hand, as described above, since it is a chemically stable material, it hardly reacts with the aforementioned activated fluorine. Therefore, the etching speed of platinum is slow, whereby the etching can be stopped accurately at the interface between the surface electrode layer 81 and the first nozzle layer 10. In addition, this processing step is to set the etching speed of silicon oxide and photoresist to the same degree by using a plasma containing fluorine gas and oxygen. The first embodiment is used in the step of processing the second nozzle layer 20. A method reflecting the shape of the photoresist is used to process silicon oxide, and the first nozzle hole Uc is processed into a tapered shape. At this time, the shape of the first nozzle hole 11c located at the junction with the surface electrode layer 81 is formed into a substantially circular shape with a diameter of 4 μm, and the opening diameter of the interface with the second nozzle layer 20 is 6 μm. In addition, the shape of the first nozzle hole Uc is processed to be larger than the fluid discharge hole 9, and the fluid discharge hole 9 is arranged in the pattern of the first nozzle hole Uc. In addition, since the first nozzle hole 110 only needs to be bonded to the surface electrode layer 81, in addition to the tapered shape, it may be a so-called straight shape perpendicular to the nozzle surface. Next, by ion beam sputtering, a titanium film is formed in the direction of the arrow (18 is formed on the surface of the first nozzle layer 10), and a portion of the surface electrode layer 81 and the first nozzle hole lie and the first nozzle layer 10 are formed. A first electrode layer 25 having a thickness of 0.5 is formed thereon. At this time, the shape of the first nozzle hole i 丨 c and the thickness of the first nozzle layer 10 must be considered to determine the incident direction of the titanium particles, so as to prevent the titanium film from forming inside the fluid discharge hole 9 formed in the surface electrode layer 81. membrane. In addition, at this time, the substrate is fixed to form the first electrode layer 25. However, after setting the above-mentioned incident angle of 9573 l.doc -49- 200523123, the substrate can be suspected to be rotated by taking the normal direction of the nozzle surface as the center. A first electrode layer is formed on the sidewall of the first nozzle hole 11c. The thus formed first electrode material attached to the entire side wall of the first nozzle hole can play the role of the protective layer of the first nozzle hole mountain during the processing of the second nozzle hole described later. + Secondly, the dry-type method of the above-mentioned electrode layer 25 is shaped on the first back layer. This processing is performed using the processing method implemented when the second electrode layer 26 is processed in the first embodiment. That is, after forming a desired pattern with a positive-type photoresist, processing is performed by using a plasma using argon as a main component to dry it. At this time, the shape of the first electrode layer 25 disposed at the interface between the first nozzle layer 10 / and the second nozzle layer 20 is formed into a substantially circular shape with a diameter of M (see FIG. 15 (0). Secondly, in the first The second nozzle layer 2 () is formed on the nozzle layer 10 'to form a coating type polyimide film with a thickness of 20 mm' (refer to the figure). At this time, the above-mentioned coating type polyimide The resin was applied to the first nozzle layer 10 by a spin coating method, and was fired at 350 tT for 2 hours. At this time, the fluid discharge hole 9 and the first nozzle hole Uc were also polyimide resin. Buried. Secondly, on the above-mentioned second nozzle layer 20, a photoresist pattern is formed by light engraving, and dry engraving using a gas containing oxygen as a main component is performed to form a cone on the second nozzle layer 20. The second nozzle hole 11 b having an angular shape (conical frustum shape) (see FIG. 15 (e)). In addition, the above-mentioned dry etching may be performed by the first nozzle layer 10, the first electrode layer 25, or the surface electrode layer 81. That is, except for the first nozzle hole mountain, the exposed part of the first nozzle layer 10 or the -electrode layer 25 is not subjected to excessive dry etching 95731 .doc • 50-20 0523123. In addition, similarly, the surface electrode layer 81 is not exposed to the surface of the surface electrode layer 8i except for the above-mentioned fluid discharge hole 9. Excessive dry etching is not performed. That is, in the guarding process of the second nozzle hole m, The first nozzle hole 11c and the fluid discharge hole 9 buried by the polyimide resin in the previous step are reproduced by removing the polyimide resin, and the fluid discharge hole 9 is formed by a pattern formed on the surface electrode layer μ. The material of the second nozzle layer 20 existing in the determined shape is removed, and the shape buried in the polyimide resin in the previous step is reproduced.

射鈦粒子,來形成第二電極層26,可防止第二電極層%附 著於流體排出孔9内,藉此可防止流體排出孔9之形狀變化 及堵塞。 其次,使用光阻剝離液除去上述光阻圖案7〇,在上述第 二喷嘴層20上形成包含以鈦為主要成分之金屬材料之第二 電極層26。吟時係使用離子束賤射法,在g_2 mT。&quot;之氯氣 壓下^制鈦粒子因氬原子而散射,並且傾斜基板,使欽粒 子自箭頭K2之方向射達,而僅形成於第二喷嘴層2〇内壁面 之一側,第二電極層26之—部分形成與第-電極層25電性 短路(參照圖邱))。膜厚為〇.5障。如此,藉由自斜方向入Titanium particles are radiated to form the second electrode layer 26, which prevents the second electrode layer% from adhering to the fluid discharge hole 9, thereby preventing the shape change and blockage of the fluid discharge hole 9. Next, the photoresist pattern 70 is removed using a photoresist stripping solution, and a second electrode layer 26 containing a metal material containing titanium as a main component is formed on the second nozzle layer 20. Yin uses the low-level ion beam method at g_2 mT. &quot; Titanium particles scattered under the pressure of chlorine are scattered by argon atoms, and the substrate is tilted so that the particles reach the direction of the arrow K2, and are formed only on one side of the inner wall surface of the second nozzle layer 20. Part of the layer 26 is electrically short-circuited with the first electrode layer 25 (see Fig. Qiu)). The film thickness was 0.5 barriers. So, by entering from the oblique direction

其-人A知上述第二電極層26加工,該步驟與第一種實 施形態相同,因此省略。形成於第二噴嘴層上之第二電極 層26之形狀為大致7〇 μηι徑之圓形形狀。 其次,藉由浸潰於硝酸與水為主要成分之水溶液中僅 刻犧牲層50’而自基板6取下噴嘴式平板8〇(圖15化))。如 述开ν成第-噴嘴層1〇之氧化石夕,形成第二喷嘴層Μ之 醯亞胺樹脂與形成表面電極㈣之始,以及形成第一電 95731.doc -51 . 200523123 ^與弟二電極層26之鈦,幾乎不被上述犧牲層50之蝕刻 液钱刻’因此不致因犧牲層5〇之蝕刻而導致形狀變化及結 構性之可靠性降低。 其次,在第一喷嘴層1〇表面形成拒液層4(圖15(g))。此時 基於考慮塗敷便利性之宗旨而使用氟聚合物,並藉由沖壓 等方法將其塗敷於第一喷嘴層1〇表面,以高分子膜形成拒 液層4。另外,就階躍式覆蓋於第一喷嘴孔丨“内之拒液層, 係於形成拒液層後,使用含氧之電漿,藉由自第二喷嘴孔 1 lb側乾式蝕刻來將其除去。藉此,可使喷嘴式平板8〇之損 知私度達到最小限度。 本實施形態藉由使用含氧之電漿之乾式蝕刻來蝕刻除去 上述階躍式覆蓋。但是’本實施形態中,如上所述,流體 排出面上存在對使用含氧之電漿之乾式蝕刻具有高耐性之 表面電極層81,由於該表面電極層81決定流體排出孔9之形 狀,因此流體排出孔9之形狀不致因上述乾式蝕刻而變化。 因而可形成非常南精碟度之喷嘴孔。 具體而言,評估具有使用本實施形態之步驟作成之2〇〇 個流體排出孔9之噴嘴式平板8〇之各流體排出孔9之形狀 時,可以非常高精確度地進行加卫,偏差僅為± Qi5叫。 此外,噴嘴式平板80非常平坦,其翹曲亦在1〇/xm以下。 另外,本實施形態之犧牲層50係使用鎳,表面電極層81 使用在白’第-喷嘴層10使用氧化石夕,第二喷嘴層2〇使用聚 醯亞胺樹脂,第一電極層25使用鈦,第二電極層26使用鈦, 不過並不限定於該組合。 95731.doc -52- 200523123 犧牲層50除鎳之外,亦可依與用於表面電極層81、第一 I爲層10、第二喷嘴層20上之材料之組合,而使用鋁、銅 等可溶於硝酸或K〇H水溶液之材料。此外,犧牲層5〇之形 成方法,除電鍍之外,亦可依材料而使用蒸鍍法、濺射法、 塗敷法等。 第二喷嘴層20及第二電極層26可使用因犧牲層5〇之蝕刻 而損傷輕微之材料。不過,考慮與後述之第一噴嘴層或表 面電極層81之姓刻選擇性時,須為可進行使用含氧之電聚 之敍刻之有機樹脂。再者,使用具有各分子鍵橋接反應之 分二構造之有…機樹脂時,第二喷嘴層2〇之耐熱性及耐環境 性兩’可提高噴嘴式平板之可靠性。 此外,第一噴嘴層10及第一電極層25可使用對犧牲層5〇 之蝕刻及第二噴嘴孔llb之蝕刻耐性高之材料。再者,表面 电極層81可使用對犧牲層5〇之蝕刻、第二噴嘴孔之蝕刻 及第一喷嘴孔11 c之韻刻耐性高之材料。 圖16顯示使用材料(犧牲層、表面電極層、第一喷嘴層、 第二喷嘴層、第一電極層、第一電極層之形成區域、第二 電極層)及加工方法(流體排出孔、第一噴嘴孔、第二喷嘴 孔、除去犧牲層)之較佳組合例。 如圖16所示’第—噴嘴層1G或第二噴嘴層2()藉由聚酿亞 妝等有機樹脂及氧化矽等矽化合物之無機材料之組合,可 構成噴嘴層。不過,如氧化矽/氧化矽之組合,及聚醯亞胺 /聚醯亞胺之組合,在第二喷嘴孔加工時,係第一喷嘴層⑺ 會受到損傷之組合時,須在第一喷嘴孔Uc之内壁全面形成 9573l.doc -53- 200523123 第一電極層25,來保護第—噴嘴孔Uc。 此外,本實施形態係藉由_而完全除去犧牲層5〇 過亦無須完全除去犧牲層5〇,藉由姓刻僅除去犧牲声 之與第-喷嘴㈣接觸之部分時’即可自基板; 平板80。 Γ貝鳴式 亦可使用矽系高分 此外,拒液層4並不限定於氟聚合物 子膜及DLC(類似鑽石碳)等。 藉由使用以上之加工步驟 之喷嘴式平板80。 可製造發揮上述①〜⑦項作用The person-A knows that the second electrode layer 26 is processed. This step is the same as that of the first embodiment, and therefore it is omitted. The shape of the second electrode layer 26 formed on the second nozzle layer is a circular shape having a diameter of approximately 70 μm. Next, the nozzle plate 80 was removed from the substrate 6 by immersing only the sacrificial layer 50 'in an aqueous solution containing nitric acid and water as main components (Fig. 15B). As described, the beginning of the formation of the oxidized stone of the first-nozzle layer 10, the formation of the second imide resin of the second nozzle layer M and the formation of the surface electrode, and the formation of the first electrical 95731.doc -51. 200523123 ^ 与 弟The titanium of the two-electrode layer 26 is hardly engraved by the etching solution of the sacrificial layer 50, so that the shape change and structural reliability are not reduced due to the etching of the sacrificial layer 50. Next, the liquid-repellent layer 4 is formed on the surface of the first nozzle layer 10 (FIG. 15 (g)). At this time, a fluoropolymer is used for the purpose of considering the convenience of coating, and it is applied to the surface of the first nozzle layer 10 by a method such as stamping to form a liquid-repellent layer 4 with a polymer film. In addition, the liquid-repellent layer that covers the first nozzle hole step-by-step is formed after the liquid-repellent layer is formed by using an oxygen-containing plasma to dry-etch it from the 1 lb side of the second nozzle hole. This can minimize the damage and privacy of the nozzle plate 80. In this embodiment, the step coverage is removed by dry etching using an oxygen-containing plasma. However, in this embodiment, As described above, there is a surface electrode layer 81 having high resistance to dry etching using an oxygen-containing plasma on the fluid discharge surface. Since the surface electrode layer 81 determines the shape of the fluid discharge hole 9, the shape of the fluid discharge hole 9 It does not change due to the dry etching described above. Therefore, it is possible to form a nozzle hole with a very high precision. Specifically, each of the nozzle plate 80 having 200 fluid discharge holes 9 made using the steps of this embodiment is evaluated. When the shape of the fluid discharge hole 9 can be guarded with very high accuracy, the deviation is only ± Qi5. In addition, the nozzle plate 80 is very flat, and its warpage is also less than 10 / xm. In addition, this embodiment The sacrificial layer 50 is made of nickel, the surface electrode layer 81 is made of white oxide, the second nozzle layer 20 is made of polyimide resin, the first electrode layer 25 is made of titanium, and the second electrode layer is made of white oxide. 26 uses titanium, but is not limited to this combination. 95731.doc -52- 200523123 In addition to nickel, the sacrificial layer 50 can also be used for the surface electrode layer 81, the first I is the layer 10, and the second nozzle layer 20 The combination of the above materials uses aluminum, copper and other materials that are soluble in nitric acid or KOH solution. In addition, the method of forming the sacrifice layer 50 can be used in addition to electroplating. Shot method, coating method, etc. The second nozzle layer 20 and the second electrode layer 26 may be made of a material that is slightly damaged by the etching of the sacrificial layer 50. However, it is considered to be the same as that of the first nozzle layer or the surface electrode layer 81 described later. When the last name is selective, it must be an organic resin that can be used to describe the use of oxygen-containing electropolymerization. In addition, when using an organic resin with a two-part structure with a bridge reaction of each molecular bond, the second nozzle layer 2 Both heat resistance and environmental resistance can improve the reliability of the nozzle plate In addition, the first nozzle layer 10 and the first electrode layer 25 may be made of a material having high resistance to etching the sacrificial layer 50 and the second nozzle hole 11b. Furthermore, the surface electrode layer 81 may use the sacrificial layer 50. Materials with high resistance to etching, etching of the second nozzle hole, and the first nozzle hole 11 c. Figure 16 shows the materials used (sacrifice layer, surface electrode layer, first nozzle layer, second nozzle layer, first electrode Layer, the formation area of the first electrode layer, the second electrode layer) and the processing method (the fluid discharge hole, the first nozzle hole, the second nozzle hole, and the sacrificial layer are removed). As shown in FIG. —The nozzle layer 1G or the second nozzle layer 2 () can form a nozzle layer by a combination of an organic resin such as polystyrene and a silicon compound such as silicon oxide. However, if the combination of silicon oxide / silica and the combination of polyimide / polyimide is used in the processing of the second nozzle hole, the combination of the first nozzle layer ⑺ will be damaged. The inner wall of the hole Uc is fully formed with 9573l.doc -53- 200523123 first electrode layer 25 to protect the first nozzle hole Uc. In addition, in this embodiment, the sacrifice layer 50 is completely removed by _, and it is not necessary to completely remove the sacrifice layer 50. Only the portion of the sacrifice sound that is in contact with the first nozzle ㈣ can be removed from the substrate by the last name; Tablet 80. Γ Beam type Silicon-based high scores can also be used. In addition, the liquid-repellent layer 4 is not limited to a fluoropolymer film and DLC (diamond-like carbon). By using the nozzle plate 80 of the above processing steps. Can be manufactured to fulfill the above ① ~ ⑦ functions

此外,如4述各實施形態’可採用不形成拒液層4之構 造。藉由不在表面電極層81或第一喷嘴層i上形成拒液層 4,流體排出孔9之形狀精確度進一步提高。 一此外’如上述各實施形態,亦可為由具有表面電極層81、 弟-包極層25、第二電極層26及以上述材料為主要成分之 金屬膜之數個薄膜構成之所謂疊層膜。In addition, as described in each of the embodiments', a structure in which the liquid-repellent layer 4 is not formed can be adopted. By not forming the liquid-repellent layer 4 on the surface electrode layer 81 or the first nozzle layer i, the shape accuracy of the fluid discharge hole 9 is further improved. In addition, as in the above embodiments, it may be a so-called laminate composed of a plurality of thin films including a surface electrode layer 81, a brother-clad electrode layer 25, a second electrode layer 26, and a metal film mainly composed of the above-mentioned materials. membrane.

此外’上述各實施形態係說明藉由在基板6上形成犧牲層 Π並㈣該犧牲層5· 5〇’而製造噴嘴式平板δ. 8〇 之方法’不過除此之外,如亦可在鎳板等包含可以與犧牲 層5. 50之㈣相同方法進行㈣之材料之基板上直接形成 第一喷嘴層1 · 1 〇。 另外,本發明並不Ρ艮定於上述各種實施丨態,在申請專 利範圍内可作各種變更,適切組合分別揭示於不同實施形 心之技術丨生手奴而獲得之實施形態,亦包含在本發明之技 術性範圍内。 95731.doc -54- 200523123 如以上所述,本發明之㈣式平板係設於藉由靜 而自喷嘴前端之流體排出孔排出藉由施加電遷而帶: 體之靜電吸引型流體排出裝置内,且具有數個噴嘴:: 其構造具有:薄層之第一噴嘴層,其係具有第一嘴:, 亚配置於流體排出側;及至少具備一層第二喷嘴層i 堆疊於該第一喷嘴層之流體供給側,比上述第二嘴声 厚,且與上述第-噴嘴孔連通,並且具有與第—嘴嘴减 射嘴孔m㈣孔;並且電性連接形成於該第一喷 鳴孔内壁之第一電極層,與形成於第二喷嘴孔内壁之 電極層。 由=上述構造之噴嘴式平板係在薄層之第—喷嘴層上至 V堆登一層厚層之第二喷嘴層,因此可藉由第二喷嘴層確 保噴嘴式平板本身之強度及剛性,可使第一喷嘴層之料 充分薄。藉由減少厣 — 又 層厗形成於弟一贺嘴層之第一噴嘴a 可超微細地形成如彳Λ 、 ^ 10_以下之孔徑,並且可在此種超微細 之弟一賀鳴孔内壁, - 在層尽方向上穩定地形成第一電極 層’將流體排出面夕隹 4. 日士,U _ 面之苐一贺嘴孔之開口部作為流體排出孔 一 α成第兒極至該流體排出孔近旁。結果可比先前 大幅降低噴嘴内1 ^ 円4之電阻R,謀求提高流體之排出頻率,可 對C錄媒體高速插繪。 且由於如此形士、 ^成之弟一電極層與形成於與第一噴 通之第二噴嘴?丨+ # 、 ^ 帝 、 弟二電極層電性連接,因此可經由第二 电極層自噴嘴式 个板之Μ體排出側供給驅動信號。因此, &quot;t、給驅動信號至楚 一電極層用之引出配線不致接近媒體, 95731.doc -55- 200523123 。己錄媒體亦不致因引出配線產生之電場而遭受電性損傷。 /發明之噴嘴式平板進一步亦可構成上述第一電二在 第+貝嘴層與第二喷嘴層之界面,自第-喷嘴孔延伸至第 '㈢上上述苐一電極層在延伸至第一噴嘴層上之部 为與弟一電極層電性連接。 上述構造,由於第一電極層係在第一喷嘴層與第二噴嘴 層之界面,自第一噴嘴孔延伸至第一喷嘴層上,第二電極 層係在該延伸部分與第一電極層電性連#,因λ第—電極 層與第二電極層&lt;連接並非在各電極層之剖®,而係在電 極層之表面埤行。因此,雖亦有連接各不同電極層之構造, k。違極層之電性連接可靠性高,可大幅降低因斷線等 而無法有效施加驅動信號至第一電極層之危險性,而提高 排出可靠性。 μ 此外,本發明之喷嘴式平板進一步亦可構成上述第一電 極層形成於上述第一噴嘴孔之内壁全面。 由於上述構造係在第一噴嘴孔之内壁全面形成有第一電 極層,因此可施加均一之電場至流體排出孔内之流體。如 為在喷嘴式平板之流體排出面具有數個流體排出孔之構造 時,各流體排出孔於泰勒連線之形成位置不同時喷灑精確 度降低,不過藉此各流體排出孔之泰勒連線之形成位置穩 定,而可提高喷灑精確度。 此外,本發明之喷嘴式平板進一步亦可構成上述第一電 極層在上述第一喷嘴層與第二噴嘴層之界面,自第一喷嘴 孔延伸至第一喷嘴層上,上述第二噴嘴孔之與第一噴嘴孔 95731.doc -56- 200523123 連通側之開口部,係設於延伸至該第一喷嘴層上之第一電 極層部分内。 由於上述構造在第—喷嘴層與第二噴嘴層之界面,於第 一電極層延伸至第—喷嘴層上之部分,配置有第二噴嘴孔 之與第一喷嘴孔連通側之開口部,因此於姓刻加工第二喷 嘴孔時,該第—電極層之延伸部分發揮㈣停止部:功 能,而避免第一噴嘴孔或第一噴嘴層因形成第二噴嘴孔時 之蝕刻遭受損傷而變形。 如上所述,在第-電極層之延伸部分外側之第—喷嘴層 被姓刻時’第-一電極層會與喷嘴式平板分離而被除去,不 過错由上述構造則可穩定地製造嘴嘴式平板。 本發明之㈣式平板亦可進—步構成上述第―嗔嘴孔及 赁嘴孔形成流體排出側之開口部大於流體供給側。 上达構造係形成第一喷嘴孔及/或第二喷嘴孔具有 流體排出側擴大^^ 4隹&amp; ^ ^ 、’角狀,因此贺嘴孔之内壁面盘第一喷 :層=第二嗔嘴層之各表面之構成角係鈍角。藉I,自第 一噴嘴孔或第一噴嘴孔之内壁面至各噴嘴層表面,形成第 :=二電極層時,因内壁面與喷嘴層表面之構成角造成 :層:線之危險性低,可形成導電可靠性高之電極層。 口排出液體至噴嘴前端時,在噴嘴内產生亂流之 危險性小,可穩定地供給排出液體。 :外纟發明之噴嘴式平板亦可進一步構 =孔=流體排出側配置具有貫穿孔之表面電極層,堵塞 、匕孔之⑽體排出側開口部,該貫穿孔與第一喷嘴孔 95731.doc -57- 200523123 連通,亚且上述表面電極層與第一電極層電性連接。 上述構造,由於設於噴嘴式平板之流體排出面之表面電 極層之貫穿孔成為流體排出π,因此可以表面電極層之蝕 刻來加工對排出流體之噴灑精確度影響重大之流體排出 孔。藉此,比構成在内壁成膜之第一電極層之第一喷嘴孔 之流體排出側開口部作為流體排出孔,其流體排出孔之形 狀精確度更加穩定,同時噴灑精確度更加穩定化。 此外’本發明之噴嘴式平板亦可進—步構成最靠近流體 供給側之上述第二噴嘴層之第二電極層,在該第二噴嘴層 之流體供給规,鄰接之噴嘴孔部間電性分離。 ' 上述構造由於具有數個㈣孔部之噴嘴式平板中,最靠 近流體供給側之上述第二喷嘴層之第二電極層,在該第二 噴嘴層之流體供給側’鄰接之喷嘴孔部間電性分離,因此 可獨立驅純個噴嘴孔部,可進行高解像度之描綠。 :::,本發明之噴嘴式平板亦可進一步構成最靠近流體 ::述第二噴嘴層之第二電極層,亦形成於該第二 、s之&quot;IL體供給側表面,在該表面被圖案化而形成引出 配線。 _亡=造:於利用最靠近流體供給侧之第二噴嘴層之第 ΓΓ! 二喷嘴層之流體排出側表面作為引出配 電性分離第二ϋ 步驟同時在鄰接喷嘴孔部間 牛Α %s層。因此’分離步驟與引出配線之形成 V V成為一個步驟,簡 嘴嘴孔内壁之第二電極㈣1出配=,由於形成於第二 “玉層舁引出配線係加工相同電極層而 9573 l.do, • 58 - 200523123 形成’因此第二電極層與引出配線之連接可靠性非常古。 /匕外,本發明之噴嘴式平板亦可進—步構成上述第% 嘴孔之流體排出側之開σ部之直徑或是形成於上電 極層之貫穿孔之直徑為 8 μηι以下。 , 二 2前述’藉由將噴嘴之排出孔直徑形成㈣⑽阳之微 細徑’產生局部電場,藉由微細喷嘴化可降低排出時之驅 動電μ。此種驅動電M之降低對裝置之小型化及噴嘴之高 密度化極為有利。當然,藉由使驅動電壓降低,亦可使: 成本效益高之低電壓驅動驅動器,亦可謀求提高使用上之 安全性。 再者,上述排出模型,由於排出所需之電場強度取決於 局部集中電場強度,因此無須存在相對電極。亦即,不需 要相對電極而亦可對絕緣性基板等進行印字,裝置構造之 彈性增加,對於厚之絕緣體亦可進行印字。 其中,如上述構造藉由將喷嘴之流體排出孔之直徑如上 述地設定為φ8 μιη以下,電場強度分布有效集中於該流體排 出孔之排出面近旁,並且自相對電極至流體排出孔之距離 之變動不影響電場強度分布,因此不受相對電極之位置精 確度、冗錄媒體之材料特性之偏差及厚度偏差之影響,而 可進行穩定之流體排出。 此外’藉由可將電場強度分布有效集中於該流體排出孔 之排出面近旁,而在狹窄區域穩定形成強電場,可確實排 出超微量之流體,可使印字圖像達到高解像度。 如以上所述,本發明之噴嘴式平板之製造方法係具備以 95731.doc -59- 200523123 ,者在基板上形成犧牲層;在上述犧牲層上形成第 一贺嘴層;在上述第一噴嘴層上形成數個第一噴嘴孔;在 亡:第-噴嘴層上,包含各第一噴嘴孔之内壁面而形成第 :極層;以殘留於各第一喷嘴孔内壁與各第一噴嘴孔周 圍#之方式加工上述第一電極層;在上述第一噴嘴層上, 亦包3殘留之各第一電極層部分而形成第二喷嘴層;在上 述第二噴嘴層上形成數個第二喷嘴孔,使各第二;嘴孔在 流體排出側之開口部收納於殘留於上述第-噴嘴層上之夂 第一電極層部分;在上述第二噴嘴層上,包含各第二㈣ 孔之内J面,:形成第二電極層;及以在鄰接之 間電性分離之方式^孔 藉此,在剛性高之基板上,經由 犧牲層,依序堆疊第-⑨極層、第二噴嘴層及第二電極層。因而, 工成戶技術形成光阻圖案後,心可藉由乾式银刻加 嘴孔、Γ形狀’匕因此:以非常高之形狀精確度形成第-喷 弟-喷嘴孔、第一電極層及第二電極層。 、 此外,由於喷嘴式平板之流體 至步驟之最後階段,……係精由犧牲層保護 ▼俊因此在㈣式平板製造步驟中, 排出孔不致遭受損傷而變/nL 提高。 貝—因而喷嘴式平板之製造良率 此外,本發明之噴嘴式平板之製造方法進—步亦可 晶^ 之步驟與在犧牲層上形成第一喑喈 : 之間,在上述犧牲層上形成表面電極層,對庫於 噴嘴孔部形成部位來分離_ 、心; &quot;表面電極層,並且在各分離部 95731.doc -60- 200523123 ==穿孔之步驟;形成犧牲層上之第-喷嘴層之步驟, 亦包含分離之表面電極層上而形成第—噴嘴層。 層二嘴式平板之製造方法’由於可在形成於犧牲 、电亟層上加工流體排出孔作為貫穿孔,因此流 Γ出孔之形狀不致因形成於第—喷嘴孔内之第-電料 之产體排“刀布)而受形,而可製造具有更高精確度 之L體排出孔之噴嘴式平板。 :外,本發明之噴嘴式平板之製造方法,進一步亦 形成上述第二電極声 向入射成膜麵子。θ ^,對育嘴式平板表面,自斜方 ^外本❹之㈣式平板之製造方法,進—步亦可在来 入射成膜粒子。 板表面’自斜方向 自斜方向入射成腹+ 噴嘴孔之側壁的附二 成之電極層(第-、第二)對 成陰…:者性佳。再者,對於濺射乾或蒸鑛源形 …不形成電極層,因此,可 層時之第一噴嘴;^取罘一包極 面電極層之貫穿孔㈣等=成第一電極層時之形成於表 陰影之部分而成膜βι^形成電極層之區域作為該 與不形成電極層之區二二定形成電極層之區域 内部之電極層之附著性。I可提㈣成電極層之噴嘴孔 、:外’本發明之噴嘴式平板之製造方法進— ==第二噴嘴孔之步驟 二 層之_之耐性,比對第二喷一二之: 9573l.d〇&lt; -61 - 200523123 件。 藉此,由於可以第一電極層精度良好地停止第二噴嘴孔 形成用之蝕刻,因此第一喷嘴孔及第一噴嘴層不致因第二 喷嘴孔加工之過度蝕刻而遭受損傷,可製造形狀精確度高 之喷嘴式平板。 αIn addition, each of the above-mentioned embodiments describes a method for manufacturing a nozzle plate δ.80 by forming a sacrificial layer Π on the substrate 6 and sacrifice the sacrificial layer 5.50 ', but in addition, if The first nozzle layer 1 · 10 is directly formed on a substrate, such as a nickel plate, containing a material that can be subjected to the same method as that of the sacrificial layer 5.50. In addition, the present invention is not limited to the above-mentioned various implementation states, and various changes can be made within the scope of the patent application. Appropriate combinations are separately disclosed in different implementation centroid technologies. The implementation forms obtained by using slaves are also included in Within the technical scope of the present invention. 95731.doc -54- 200523123 As mentioned above, the flat plate of the present invention is provided in the electrostatic discharge type fluid discharge device which is statically discharged from the fluid discharge hole at the front end of the nozzle and is applied by electromigration. And has a plurality of nozzles: its structure has: a thin first nozzle layer having a first nozzle: sub-arranged on the fluid discharge side; and at least one second nozzle layer i stacked on the first nozzle The fluid supply side of the layer is thicker than the second nozzle, and communicates with the first nozzle hole, and has a hole Mm with the first nozzle reduction nozzle hole; and an electrical connection is formed on the inner wall of the first nozzle hole. The first electrode layer and the electrode layer formed on the inner wall of the second nozzle hole. The nozzle plate from the above structure is on the first nozzle layer of the thin layer to the second nozzle layer stacked with a thick layer of V. Therefore, the strength and rigidity of the nozzle plate can be ensured by the second nozzle layer. Make the material of the first nozzle layer sufficiently thin. By reducing a— another layer of 厗, the first nozzle a formed in the mouth of the first-he mouth can superfinely form apertures such as 彳 Λ, ^ 10_, and can be formed on the inner wall of this ultra-fine-he-heming hole ,-The first electrode layer is formed stably in the direction of the layer as far as possible. 'The fluid is discharged from the surface. 4. Rishi, U _ The opening of the nozzle hole as the fluid discharge hole-α becomes the first electrode. Fluid exits near the hole. As a result, the resistance R of 1 ^ 円 4 in the nozzle can be greatly reduced compared with the previous, and the discharge frequency of the fluid can be increased, and the C recording medium can be inserted at a high speed. And because of this, a younger brother has an electrode layer and a second nozzle formed on the first nozzle?丨 + #, ^ Emperor and Brother electrode layers are electrically connected, so the drive signal can be supplied from the M-body discharge side of the nozzle-type plate via the second electrode layer. Therefore, &quot; t, the drive wiring for the drive signal to the electrode layer is not close to the media, 95731.doc -55- 200523123. The recorded media will not suffer electrical damage due to the electric field generated by the outgoing wiring. / The nozzle plate of the invention may also constitute the interface between the first electric second layer at the + th nozzle layer and the second nozzle layer, and extend from the -nozzle hole to the first, and the first electrode layer extends to the first. The part on the nozzle layer is electrically connected with the first electrode layer. In the above structure, since the first electrode layer is located at the interface between the first nozzle layer and the second nozzle layer and extends from the first nozzle hole to the first nozzle layer, the second electrode layer is electrically connected to the first electrode layer at the extended portion.性 连 #, because λ the first electrode layer and the second electrode layer &lt; the connection is not in the cross section of each electrode layer, but on the surface of the electrode layer. Therefore, although there are structures for connecting different electrode layers, k. The electrical connection of the non-electrode layer has high reliability, which can greatly reduce the risk that the drive signal cannot be effectively applied to the first electrode layer due to a disconnection, etc., and improve the discharge reliability. In addition, the nozzle plate of the present invention may further form the first electrode layer formed on the entire inner wall of the first nozzle hole. Because the above structure is formed with the first electrode layer on the inner wall of the first nozzle hole, a uniform electric field can be applied to the fluid in the fluid discharge hole. If the fluid discharge surface of the nozzle plate has a plurality of fluid discharge holes, the spray accuracy of each fluid discharge hole is different when the formation position of the Taylor connection is different, but the Taylor connection of each fluid discharge hole is thereby taken. The formation position is stable, which can improve the spraying accuracy. In addition, the nozzle plate of the present invention may further constitute the first electrode layer extending from the first nozzle hole to the first nozzle layer at the interface between the first nozzle layer and the second nozzle layer, and the second nozzle hole The opening on the communication side with the first nozzle hole 95731.doc -56- 200523123 is provided in the first electrode layer portion extending to the first nozzle layer. Because the above-mentioned structure is at the interface between the first nozzle layer and the second nozzle layer, and the portion where the first electrode layer extends to the first nozzle layer is provided with the opening portion of the second nozzle hole on the communication side with the first nozzle hole, When the second nozzle hole is engraved, the extension portion of the first electrode layer functions as a ㈣stop: to prevent the first nozzle hole or the first nozzle layer from being deformed due to the damage caused by the etching during the formation of the second nozzle hole. As described above, when the first nozzle layer outside the extended portion of the first electrode layer is engraved, the first electrode layer is separated from the nozzle plate and removed, but the nozzle can be stably manufactured by the above structure. Style tablet. The flat plate of the present invention can further constitute the openings on the fluid discharge side of the first and second nozzle holes and the nozzle holes that are larger than the fluid supply side. The upper structure is to form the first nozzle hole and / or the second nozzle hole with the fluid discharge side enlarged ^^ 4 隹 &amp; ^ ^, 'angular shape, so the inner wall surface of the nozzle hole is first sprayed: layer = second The angles of the surfaces of the pouting layer are obtuse. By I, when the second nozzle layer is formed from the first nozzle hole or the inner wall surface of the first nozzle hole to the surface of each nozzle layer, due to the angle formed by the inner wall surface and the nozzle layer surface, the danger of the layer: line is low , Can form an electrode layer with high conductivity and reliability. When the liquid is discharged from the nozzle to the tip of the nozzle, there is little danger of turbulence in the nozzle, and the discharged liquid can be supplied stably. : The nozzle plate of the invention can also be further structured = hole = fluid discharge side is equipped with a surface electrode layer with through holes, and the carcass discharge side openings of the plugged and dagger holes are formed. -57- 200523123 is connected, and the surface electrode layer is electrically connected to the first electrode layer. In the above structure, since the through hole of the surface electrode layer provided on the fluid discharge surface of the nozzle plate becomes the fluid discharge π, the surface electrode layer can be etched to process the fluid discharge hole which has a great influence on the spray accuracy of the discharged fluid. Thereby, the shape of the fluid discharge hole is more stable than the fluid discharge side opening of the first nozzle hole constituting the first electrode layer of the first electrode layer formed on the inner wall, and the spray accuracy is more stabilized. In addition, the nozzle-type flat plate of the present invention may further constitute a second electrode layer of the above-mentioned second nozzle layer closest to the fluid supply side. The fluid supply gauge of the second nozzle layer is electrically connected between adjacent nozzle holes. Separation. 'The above structure is because of the nozzle plate having a plurality of countersunk holes, the second electrode layer of the second nozzle layer closest to the fluid supply side is between the nozzle hole portions adjacent to the fluid supply side of the second nozzle layer. It is electrically separated, so it can drive pure nozzle holes independently, and can trace green with high resolution. ::: The nozzle-type flat plate of the present invention can further form the closest to the fluid :: The second electrode layer of the second nozzle layer is also formed on the surface of the &lt; IL body supply side of the second, s, on the surface It is patterned to form a lead-out wiring. _ 死 = Fabrication: Use the ΓΓΓ of the second nozzle layer closest to the fluid supply side! The fluid discharge side surface of the two nozzle layers is used as an electrical distribution separation second step. At the same time, the layer Α% s between adjacent nozzle holes . Therefore, the 'separation step' and the formation of the lead-out wiring VV become a step, the second electrode 内 1 of the inner wall of the simple hole is distributed. Since the same electrode layer is processed on the lead-out wiring system formed in the second "jade layer", 9573 l.do, • 58-200523123 Formed 'so the reliability of the connection between the second electrode layer and the lead-out wiring is very ancient. / In addition to the dagger, the nozzle plate of the present invention can also be advanced-further forming the opening σ portion of the fluid discharge side of the %% nozzle The diameter of the hole or the diameter of the through hole formed in the upper electrode layer is 8 μηι or less. 2) The aforementioned "by forming the diameter of the discharge hole of the nozzle to form the fine diameter of the sun" generates a local electric field, which can be reduced by forming a fine nozzle. The driving power μ at the time of discharge. This reduction of the driving power M is extremely beneficial to the miniaturization of the device and the high density of the nozzle. Of course, by reducing the driving voltage, it can also make: a cost-effective low-voltage driving driver, It is also possible to improve the safety in use. Furthermore, since the electric field strength required for the above discharge model depends on the local concentrated electric field strength, there is no need for a counter electrode. That is, the insulating substrate can be printed without the need for a counter electrode, the flexibility of the device structure is increased, and printing can also be performed for a thick insulator. Among them, the diameter of the fluid discharge hole of the nozzle as described above is as described above. The ground is set to φ8 μm or less, the electric field intensity distribution is effectively concentrated near the discharge surface of the fluid discharge hole, and the change in the distance from the counter electrode to the fluid discharge hole does not affect the electric field intensity distribution, so it is not affected by the position accuracy of the counter electrode, The effects of material characteristics and thickness deviations of redundant recording media allow stable fluid discharge. In addition, by effectively concentrating the electric field intensity distribution near the discharge surface of the fluid discharge hole, stable formation of strong fluid can be achieved in a narrow area. The electric field can surely discharge a very small amount of fluid, so that the printed image can reach a high resolution. As described above, the method for manufacturing a nozzle flat plate of the present invention includes a method of forming a sacrifice on a substrate with 95731.doc -59- 200523123. Layer; forming a first nozzle layer on the sacrificial layer; forming several first layers on the first nozzle layer A nozzle hole; on the first nozzle layer, the first pole layer is formed by including the inner wall surface of each first nozzle hole; the above is processed in a manner that remains on the inner wall of each first nozzle hole and around the first nozzle hole # A first electrode layer; on the first nozzle layer, a second nozzle layer is also formed by covering each of the remaining first electrode layer portions; and a plurality of second nozzle holes are formed on the second nozzle layer so that each second The opening of the nozzle hole on the fluid discharge side is stored in the first electrode layer portion remaining on the first nozzle layer; on the second nozzle layer, the inner J surface of each second nozzle hole is included: Two electrode layers; and holes by means of electrical separation between adjacent ones, so that, on a substrate with high rigidity, a first ⑨ electrode layer, a second nozzle layer, and a second electrode layer are sequentially stacked through a sacrificial layer. Therefore, after the photoresist pattern is formed by industrial technology, the heart can be formed by dry silver engraving with mouth holes and a Γ shape. Therefore, the first spray nozzle-nozzle hole, the first electrode layer, and Second electrode layer. In addition, since the fluid of the nozzle flat plate reaches the final stage of the step, ... the system is protected by the sacrificial layer ▼ Jun. Therefore, in the flat flat plate manufacturing step, the discharge hole is not damaged and the nL is increased. The yield rate of the nozzle-type flat plate is further improved. In addition, the manufacturing method of the nozzle-type flat plate of the present invention can be further improved by forming the first step on the sacrificial layer and forming the first sacrificial layer on the sacrificial layer. The surface electrode layer is separated from the formation part of the nozzle hole. &Quot; The surface electrode layer is formed in each separation part 95731.doc -60- 200523123 == a perforation step; the first nozzle on the sacrificial layer is formed. The step of forming a layer includes forming a first nozzle layer on the separated surface electrode layer. Method for manufacturing a two-nozzle flat plate 'Since the fluid discharge hole can be processed as a through hole formed on the sacrificial and electric layer, the shape of the flow-out hole is not caused by the formation of the first electric material in the first nozzle hole. The production body is shaped by a "knife cloth", and a nozzle-type flat plate with higher accuracy of the L-body discharge hole can be manufactured. In addition, the manufacturing method of the nozzle-type flat plate of the present invention further forms the above-mentioned second electrode sound. The film-forming surface is incident. Θ ^, on the surface of the mouth-type flat plate, the method of manufacturing the flat plate of self-orthogonal ^ outer square is further, and the film-forming particles can also be incident on the surface. The oblique incidence of the abdomen + nozzle hole side wall with 20% of the electrode layer (first-, second) pairs of yin ...: good in nature. Furthermore, for sputtering dry or steam source shape ... no electrode layer is formed Therefore, the first nozzle when the layer can be layered; ^ Take a package of through-holes of the electrode surface electrode layer, etc. = the portion formed on the surface of the shadow when the first electrode layer is formed, and the area where the electrode layer is formed β ^ The area where the electrode layer is formed with the area where the electrode layer is not formed The adhesion of the electrode layer. I can be extracted into the nozzle hole of the electrode layer: "outside" the method of manufacturing the nozzle plate of the present invention-== the second nozzle hole step _ the resistance of the second layer, compared to the first Two sprays and two sprays: 9573l.d0 &lt; -61-200523123 pieces. As a result, the first electrode layer can stop the etching for forming the second nozzle hole with good accuracy, so the first nozzle hole and the first nozzle layer No damage is caused by excessive etching of the second nozzle hole, and a nozzle plate with high shape accuracy can be manufactured.

此外,本發明之噴嘴式平板之製造方法進—步亦可在形 成第一噴嘴孔之步驟及形成第二喷嘴孔之步驟,選擇使用 蝕刻對上述表面電極層之蝕刻之耐性,比對第一及第二之 各喷嘴層之蝕刻之耐性高之條件。 藉此,表面:電極層w夂因第一喷嘴孔形成時之過度姓刻 或第二喷嘴孔形成時之過度㈣而遭受損傷。因而,包: 表面電極層之貫穿孔之流體排出孔不致因過度㈣而變 形’導致_精確度惡化,而可穩定地製造噴灑精確度高 之喷嘴式平板。In addition, the manufacturing method of the nozzle plate of the present invention is further advanced. In the step of forming the first nozzle hole and the step of forming the second nozzle hole, the etching resistance of the above-mentioned surface electrode layer is selected by using etching to compare with the first And the condition that the second nozzle layer has high resistance to etching. As a result, the surface: the electrode layer w 遭受 is damaged due to excessive engraving when the first nozzle hole is formed or excessive ㈣ when the second nozzle hole is formed. Therefore, the fluid discharge holes of the through-holes of the surface electrode layer are not deformed due to excessive deformation, which leads to deterioration in accuracy, and a nozzle-type flat plate with high spray accuracy can be stably manufactured.

此外,本發明之噴嘴式平板之製造方法,進一步於上 電性分離第二電極層之步驟使用乾式蝕刻來進行。 藉此由於以乾式钱刻進行第二電極層之分離加工, 此加工之形狀精確度高,並且由於以氣態除去被加工區 之:極層材料’因此避免如切屑等隨伴加工產生之塵埃/ ^ 土帛嘴紫孔内而堵塞喷嘴孔。因而可穩定地製」 排出可靠性高之噴嘴式平板。 實施方式項中之具體實施態樣或實施例,僅係說明本考 :之技#内谷者’不應狹義解釋成僅限^於該具體例,^ 付口本《明之精神及以下記載之中請專利範圍内,可作名 95731.doc •62- 200523123 種變更來實施。 【圖式簡單說明】 場強度 圖1係在本發明之基本排出模型中計算喷嘴之兩 之說明圖。 、 之關連 圖2係顯示表面張力壓力及靜電性壓力與噴嘴栌 性之模型計算結果圖。 、二 之關連性之模型計算結果 圖3係顯示排出壓力與喷嘴徑 圖0In addition, in the method for manufacturing a nozzle plate according to the present invention, the step of electrically separating the second electrode layer is further performed using dry etching. Therefore, because the second electrode layer is separated and processed by dry money engraving, the shape of this processing is high, and because the material in the processed area is removed in a gaseous state: the material of the polar layer ', thus avoiding the dust generated by accompanying processing such as chips. ^ The nozzle hole is blocked by the purple hole in the soil. Therefore, a nozzle plate with high discharge reliability can be stably produced. The specific implementation patterns or examples in the implementation item are only for the purpose of explaining this test: The technique # 内 谷 者 'should not be interpreted narrowly to be limited to this specific example, ^ Within the scope of the Chinese patent, the name can be implemented as 95731.doc • 62- 200523123. [Brief description of the figure] Field intensity Fig. 1 is an explanatory diagram for calculating two nozzles in the basic discharge model of the present invention. Correlation Figure 2 is a model calculation result showing surface tension pressure, electrostatic pressure and nozzle flexibility. Model calculation results of the correlation between Figure 2 and Figure 3 show the discharge pressure and nozzle diameter. Figure 0

圖4係顯示排出界限電壓與喷嘴徑之關連性之模曾 結果圖。 圖5係顯示在荷電液滴與基板間作帛之鏡像力與喷嘴— 基板間距離之關係圖。 圖6係顯示自噴嘴流出之流量與施加電壓之相關關係之 模型計算結果圖。Fig. 4 is a graph showing the results of the correlation between the discharge limit voltage and the nozzle diameter. FIG. 5 is a graph showing the relationship between the mirror image force between the charged droplet and the substrate and the distance between the nozzle and the substrate. Fig. 6 is a model calculation result diagram showing the correlation between the flow rate from the nozzle and the applied voltage.

圖7(a)及圖7(c)係顯示本發明一種實施形態之喷嘴式平 板之立胆圖’圖7(b)係圖7(a)之A-A丨線剖面圖。 圖8係顯示上述喷嘴式平板之第一電極層與第二電極層 之連接部分之說明圖。 圖9係頦不本實施形態之噴嘴式平板之變形例者,且係相 當於圖7(c)之剖面圖。 圖10(a)圖1〇⑴係藉由剖面構造顯示本實施形態之上述 噴嘴式平板製造方法之說明圖。 圖11(a)〜圖U(c)係藉由噴嘴式平板之剖面構造進一步詳 細說明圖10(e)所示步驟之圖。 95731.doc -63· 200523123 圖12係顯示製造本實施形態之噴嘴式平板時,各層之使 用材料與加工方法之較佳組合之說明圖。 圖13(a)及圖13(c)係顯示本發明其他實施形態之喷嘴式 平板之立體圖,圖13(b)係圖13(a)之B-B,線剖面圖。 圖14係顯示其他實施形態之喷嘴式平板之變形例者,且 係相當於圖13(c)之剖面圖。 圖15(a)〜圖15(g)係藉由剖面之構造顯示其他實施形態之 上述噴嘴式平板之製造方法之說明圖。 圖16係顯示製造其他實施形態之噴嘴式平板時,各層之 使用材料與加工方法之較佳組合之說明圖。 圖Π係先前之靜電吸引型喷墨裝置之概略構造剖面圖。 圖18(a)〜圖18(c)係圖17所示之噴墨裝置之墨形成彎月部 之說明圖。 圖19係先前之其他靜電吸引型嘴墨裝置之概略構造圖。 圖20係圖19所示之噴墨裝置之喑峰 衣 赁鳥部分之概略剖面立體 圖。 原理之說明圖。 分施加電壓時微粒 圖21係圖19所示之喷墨裝置之墨排出 圖22係圖19所示之噴墨裝置在噴嘴部 子之狀態之說明圖。 圖2 3係圖19所不之喷黑麥置 原理之說明圖。 於T嘴部分形成微粒子 體之 Γ:):圖24⑷係圖19所示之噴墨裝置之墨形成彎月 之說明圖 部 圖,圖 圖25⑷係、靜電吸弓丨型流體排W置之概略構造 95731.doc -64- 200523123 25(b)係其等價電路。 圖26係用於靜電吸引型喷墨裝置之先前之喷嘴式平板之 側面剖面圖。 圖27係顯示先前之靜電吸引型喷墨裝置之記錄頭部分構 造之剖面圖。 圖28係顯示圖27之靜電吸引型喷墨裝置之記錄頭部分之 墨排出孔之部分放大剖面平面圖。 【主要元件符號說明】 1 第一喷嘴層 2 第_二喷嘴層 4 拒液膜 5 犧牲層 8 喷嘴式平板 9 流體排出孔 10 第一喷嘴層 11 喷嘴孔(喷嘴孔部) 11a 第一喷嘴孔 11c 第一喷嘴孔 lib 第二噴嘴孔 20 第二喷嘴層 25 第一電極層 25b 延伸部(延伸之第一電極層部分) 26 第二電極層 50 犧牲層 95731.doc -65- 200523123 80 81 喷嘴式平板 表面電極層Figs. 7 (a) and 7 (c) are stand-up diagrams showing a nozzle plate according to an embodiment of the present invention. Fig. 7 (b) is a sectional view taken along line A-A 丨 in Fig. 7 (a). Fig. 8 is an explanatory view showing a connection portion between the first electrode layer and the second electrode layer of the nozzle plate. Fig. 9 shows a modification of the nozzle plate according to this embodiment, and corresponds to the cross-sectional view of Fig. 7 (c). Fig. 10 (a) and Fig. 10 (a) are explanatory diagrams showing the nozzle-type flat plate manufacturing method according to the present embodiment by a cross-sectional structure. Figs. 11 (a) to U (c) are diagrams illustrating the steps shown in Fig. 10 (e) in more detail through the sectional structure of the nozzle plate. 95731.doc -63 · 200523123 Fig. 12 is an explanatory diagram showing a preferred combination of materials and processing methods for each layer when the nozzle flat plate of this embodiment is manufactured. Figs. 13 (a) and 13 (c) are perspective views showing a nozzle plate according to another embodiment of the present invention, and Fig. 13 (b) is a sectional view taken along line B-B of Fig. 13 (a). Fig. 14 shows a modification of the nozzle plate of another embodiment, and is a cross-sectional view corresponding to Fig. 13 (c). Figs. 15 (a) to 15 (g) are explanatory diagrams showing a method for manufacturing the above-mentioned nozzle plate according to another embodiment by the structure of the cross section. Fig. 16 is an explanatory diagram showing a preferred combination of materials and processing methods for each layer when a nozzle plate of another embodiment is manufactured. Figure Π is a schematic cross-sectional view of a conventional electrostatic suction inkjet device. 18 (a) to 18 (c) are explanatory diagrams of the meniscus formed by the ink of the inkjet device shown in FIG. FIG. 19 is a schematic configuration diagram of another conventional electrostatic suction type ink nozzle device. Fig. 20 is a schematic cross-sectional perspective view of a bird's clothing rental section of the ink jet device shown in Fig. 19; An illustration of the principle. Particles when a voltage is applied. Fig. 21 is an ink discharge diagram of the inkjet device shown in Fig. 19. Fig. 22 is an explanatory diagram of the state of the inkjet device shown in Fig. 19 at a nozzle portion. Figure 2 3 is an explanatory diagram of the principle of rye spray as shown in Figure 19. Γ :) forming a microparticle body in the T mouth part: FIG. 24 is an explanatory diagram of the ink formation meniscus of the inkjet device shown in FIG. 19, and FIG. 25 is a schematic view of the electrostatic discharge bow type fluid row W Structure 95731.doc -64- 200523123 25 (b) is its equivalent circuit. Fig. 26 is a side sectional view of a conventional nozzle type flat plate used for an electrostatic attraction type inkjet device. Fig. 27 is a sectional view showing the structure of a recording head of a conventional electrostatic attraction type ink jet device. Fig. 28 is a partially enlarged sectional plan view showing an ink discharge hole of a recording head portion of the electrostatic attraction type ink jet device of Fig. 27; [Description of main component symbols] 1 First nozzle layer 2 Second nozzle layer 4 Liquid-repellent film 5 Sacrifice layer 8 Nozzle plate 9 Fluid discharge hole 10 First nozzle layer 11 Nozzle hole (nozzle hole portion) 11a First nozzle hole 11c first nozzle hole lib second nozzle hole 20 second nozzle layer 25 first electrode layer 25b extension (extended first electrode layer portion) 26 second electrode layer 50 sacrificial layer 95731.doc -65- 200523123 80 81 nozzle Surface electrode layer

95731.doc 66-95731.doc 66-

Claims (1)

200523123 申請專利範圍: 1. 一種喷嘴式平板,係設於靜電吸引型流體排 係自噴嘴前端之流體排出孔藉由靜電吸引而排師由; 加電壓而帶電之流體,並具有數個嘴嘴孔部, 具備缚層之第-噴嘴層,其係具有第一嘖嘴孔“、 置於流體排出側;並且 、鳥孔,亚配 至少具備-層第二噴嘴層,其 之流體供給側,比上述第-喷嘴層厚,且::^嘴層 喷嘴孔; 、鳴孔構成賀嘴孔部之第二 % f生連接成膜於該第—喷嘴孔内 膜於第二噴嘴孔内壁之第二電極層。 冑極層與成 2.如請求項丨之噴嘴式平板,盆 嘴層與第二喷嘴層之界面,、自第Μ二電極層在第—喷 嘴声上,u、. 弟孔延設至第一嗜 曰 述第二電極層在延伸至第_嘻、 與第-電極層電性連接。 贺鳥層上之部分 3·如請求们之喷嘴式平板 述第-噴嘴孔之内壁全面。过弟-電極層形成於上 4.如w求们之噴嘴式平板, 一喷嘴層與第二噴嘴層之界面,極層在上述第 -嗔嘴層上,上述第二喷嘴孔之孔延設至第 開口部位於延設至該第—喷嘴嘴孔連通倒之 内。 、 S 之第一電極層部分 5.如請求们之喷嘴式平板, 江弟一贺嘴孔及/或第二 95731.doc 200523123 噴嘴孔係比流體排出側大地形成流體供給側之開口部。 6. 如請求項1之噴嘴式平板,其中在上述第一喷嘴孔之流體 排出側,以堵塞第一喷嘴孔之流體排出側開口部之方 式’配置具有貫穿孔之表面電極層,該貫穿孔與第一喷 為孔連通,並且上述表面電極層與第一電極層電性連接。 7. 如請求項1之喷嘴式平板,其中最在流體供給側之上述第 二喷嘴層之第二電極層係在該第二喷嘴層之流體供給 側,於鄰接之喷嘴孔部間電性分離。 8·如請求項7之喷嘴式平板,其中最在流體供給側之上述第 二噴嘴層之_第二電極層亦形成於該第二噴嘴層之流體供 給側表面,在該表面被圖案化而形成引出配線。 9·如請求項1之喷嘴式平板,其中上述第一喷嘴孔之流體排 出側之開口部之直徑或是形成於上述表面電極層之貫穿 孔之直徑係8 // m以下。 10. -種噴嘴式平板之製造方法,其特徵為具備以下步驟: 在基板上形成犧牲層; 在上述犧牲層上形成第一喷嘴層; 在上述第一喷嘴層上形成數個第一噴嘴孔,· 在上述第一噴嘴層上,包含各第一 形成第一電極層; 噴嘴孔之内壁面 一噴嘴孔周圍部之 以玟留於各第一噴嘴孔内壁與各第 方式,加工上述第一電極層; 亦包含殘留之各第一電極層部 在上述弟一喷嘴層上 分’形成第二噴嘴層; 95731.doc 200523123 在^述第二噴嘴層上將數個第二嘴嘴孔以各第二嘴嘴 孔之机體排出側之開口部收納於殘留於 上之各第1極層❹之方式形成;过弟贺爲層 /在士述第二嘴嘴層上,包含各第二嘴嘴孔之内壁面, 形成弟一電極層,·及 、在郇接之第二噴嘴孔間電性分離之方式,加工第二 電極層。 11.如睛求項H)之噴嘴式平板之製造方法其中於在基板上 形成犧牲層之步驟與在犧牲層上形成第一喷嘴層之步驟 ,間:具有在上述犧牲層上形成表面電極層,對應於喷 嘴孔部形成部位而分離該表面電極層,並且在各分離部 形成貫穿孔之步驟; 形成犧牲層上之第一噴嘴層之步驟中,亦包含分離之 表面笔極層上而形成第一噴嘴層。 12. 如t求項之喷嘴式平板之製造方法,其中上述形 成弟二電極層之步驟中,對喷嘴式平板表面自斜方向入 射成膜粒子。 13. 如明求項&quot;之噴嘴式平板之製造方法,其中上述形成第 一電極層之步驟中,對噴嘴式平板表面自斜方向入射成 膜粒子。 女明求項10或11之噴嘴式平板之製造方法,其中上述形 成第一噴嘴孔之步驟中,使用蝕刻,選擇上述第一電極 層對钱刻之耐受十生比第二嘴嘴層冑触刻之耐受性高之條 件0 95731.doc 200523123 1 5 ·如請求項11之噴嘴式平板之製造方法,其中形成第一嘴 嘴孔之步驟及形成第二喷嘴孔之步驟中,使用蝕刻 擇上述表面電極層對独刻之耐受性比第一及第二之各嘴 嘴層對钱刻之耐受性高之條件。 16.如請求項忉心之噴嘴式平板之製造方法 性分離第二電極厗夕半聰士社 /、T上述弘 包極層之步驟中使用乾式蝕刻進行。 95731.doc200523123 Scope of patent application: 1. A nozzle type flat plate, which is located in an electrostatic suction type fluid discharge system. The fluid discharge hole at the front end of the nozzle is discharged by electrostatic attraction. The fluid charged by voltage is provided with several nozzles. The hole portion is provided with a first nozzle layer having a binding layer, which is provided with a first nozzle hole, and is disposed on the fluid discharge side; and, a bird hole, a sub-hole has at least a second layer nozzle layer, and a fluid supply side thereof, Thicker than the above-mentioned nozzle layer, and: ^ nozzle layer nozzle hole; and the tweeter hole constitutes the second% of the nozzle hole, and is connected to form the first nozzle hole inner film on the second nozzle hole inner wall. Two electrode layers: 胄 electrode layer and formation 2. If requested, the nozzle plate, the interface between the basin nozzle layer and the second nozzle layer, from the M second electrode layer on the first nozzle sound, u ,. To the first addiction, the second electrode layer extends to the first electrode layer, and is electrically connected to the first electrode layer. The part on the bird layer 3. The inner wall of the first nozzle hole is as described in the nozzle plate. The elder brother-electrode layer is formed on the nozzle plate as described above. The interface between a nozzle layer and a second nozzle layer, the pole layer is on the above-mentioned nozzle layer, and the hole of the second nozzle hole is extended to the first opening portion and is located within the communication of the first nozzle hole. The first electrode layer part 5. If the nozzle plate of the requester, Jiang Di Yihe mouth and / or the second 95731.doc 200523123 nozzle hole are larger than the fluid discharge side to form the opening on the fluid supply side. The nozzle plate of claim 1, wherein a surface electrode layer having a through hole is disposed on the fluid discharge side of the first nozzle hole so as to block the opening portion of the fluid discharge side of the first nozzle hole. The spray is connected by holes, and the surface electrode layer is electrically connected to the first electrode layer. 7. The nozzle-type flat plate of claim 1, wherein the second electrode layer of the second nozzle layer on the fluid supply side is located there. The fluid supply side of the second nozzle layer is electrically separated from adjacent nozzle hole portions. 8. The nozzle-type flat plate of claim 7, wherein the second electrode layer of the second nozzle layer on the fluid supply side is also the second electrode layer. Formed in The fluid supply side surface of the second nozzle layer is patterned on the surface to form the lead-out wiring. 9 · The nozzle plate of claim 1, wherein the diameter of the opening on the fluid discharge side of the first nozzle hole is formed. The diameter of the through hole in the surface electrode layer is 8 // m or less. 10. A method for manufacturing a nozzle plate is characterized by having the following steps: forming a sacrificial layer on a substrate; and forming a first on the sacrificial layer. A nozzle layer; forming a plurality of first nozzle holes on the first nozzle layer, and including the first electrode layer on each of the first nozzle layers; an inner wall surface of the nozzle hole and a portion around the nozzle hole; Remaining on the inner wall of each first nozzle hole and each first method, the above-mentioned first electrode layer is processed; each remaining first electrode layer portion is also formed on the above-mentioned first nozzle layer to form a second nozzle layer; 95731.doc 200523123 at ^ The second nozzle layer is formed by storing a plurality of second nozzle holes in the openings on the discharge side of the body of each second nozzle hole in the first pole layer 残留 remaining on it; Floor / On the second mouth and mouth layer of Shishu, the inner wall surface of each second mouth and mouth is formed to form a first electrode layer, and the second electrode is processed by means of electrical separation between the connected second nozzle holes. Floor. 11. The manufacturing method of the nozzle type flat plate as described in item H), wherein the step of forming a sacrificial layer on the substrate and the step of forming a first nozzle layer on the sacrificial layer include: forming a surface electrode layer on the sacrificial layer; A step of separating the surface electrode layer corresponding to the nozzle hole portion forming portion and forming a through hole in each separating portion; the step of forming the first nozzle layer on the sacrificial layer also includes forming on the separated surface pen layer First nozzle layer. 12. The method for manufacturing a nozzle-type flat plate according to t, in which in the above step of forming the second electrode layer, film-forming particles are incident on the surface of the nozzle-shaped flat plate from an oblique direction. 13. The method for manufacturing a nozzle plate as described above, wherein in the above-mentioned step of forming the first electrode layer, film-forming particles are incident on the surface of the nozzle plate from an oblique direction. The method for manufacturing a nozzle-type flat plate of Nu Ming seeking item 10 or 11, wherein in the above-mentioned step of forming the first nozzle hole, etching is used to select the first electrode layer which is more resistant to money engraving than the second nozzle mouth layer. Conditions for high resistance to engraving 0 95731.doc 200523123 1 5 · The method for manufacturing a nozzle-type flat plate as claimed in item 11, wherein the step of forming the first nozzle hole and the step of forming the second nozzle hole use etching The condition that the surface electrode layer has a higher resistance to a single engraving than the first and the second mouth layers to a money engraving is selected. 16. A method for manufacturing a nozzle-type flat plate as described in the claim, the dry separation is performed in the step of isolating the second electrode, Yoshihana Satoshi Co., Ltd., T. 95731.doc
TW93125877A 2003-08-29 2004-08-27 Nozzle plate and manufacturing method of same TWI255232B (en)

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