TWI253483B - Evaluation method for polycrystalline silicon - Google Patents
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- TWI253483B TWI253483B TW090113172A TW90113172A TWI253483B TW I253483 B TWI253483 B TW I253483B TW 090113172 A TW090113172 A TW 090113172A TW 90113172 A TW90113172 A TW 90113172A TW I253483 B TWI253483 B TW I253483B
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- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 13
- 238000011156 evaluation Methods 0.000 title abstract description 13
- 239000002245 particle Substances 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 9
- 239000000203 mixture Substances 0.000 claims abstract description 9
- 229910052732 germanium Inorganic materials 0.000 claims description 9
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 9
- 239000004575 stone Substances 0.000 claims description 4
- 238000004458 analytical method Methods 0.000 claims description 3
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 claims description 3
- 238000000605 extraction Methods 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 2
- 239000011259 mixed solution Substances 0.000 claims 1
- 238000012986 modification Methods 0.000 claims 1
- 230000004048 modification Effects 0.000 claims 1
- 238000001914 filtration Methods 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract description 2
- 230000008569 process Effects 0.000 abstract description 2
- 239000003795 chemical substances by application Substances 0.000 abstract 4
- 238000007654 immersion Methods 0.000 abstract 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 abstract 1
- 239000013078 crystal Substances 0.000 description 25
- 239000007788 liquid Substances 0.000 description 15
- 239000002994 raw material Substances 0.000 description 8
- 239000000843 powder Substances 0.000 description 6
- 230000007547 defect Effects 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 241001428407 Ceramium Species 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- -1 Polyethylene Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000002079 cooperative effect Effects 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 239000006063 cullet Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 235000013601 eggs Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- LHYPTHFPISQQIS-UHFFFAOYSA-N hydrazine nitric acid Chemical compound [N+](=O)(O)[O-].NN.NN LHYPTHFPISQQIS-UHFFFAOYSA-N 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 239000012488 sample solution Substances 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0095—Semiconductive materials
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- Dispersion Chemistry (AREA)
- Food Science & Technology (AREA)
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- Sampling And Sample Adjustment (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
1253483 A7 B7
五、發明說明(i ) [發明所屬技術領域] 本發明係有關-種,用作提取單晶石夕之原料 之評估方法。 日曰’ (請先閱讀背面之注意事項再填寫本頁) [習知之技術] 以往,眾利知,製造單晶以法之—㈣克勞 法(以下稱為以法)。這種cz法的優點是,很容易得到大 口控、高純度而無重排或晶格缺陷極少的單晶梦。 cz法是百先將超高純度的多晶矽片清洗乾淨之後,置 英垣堝中,並用加熱爐使其溶解。在此同時添加所 2篁的少量導電型雜質(添加劑或摻雜劑)。例如添加卵) 曰產生p型結晶、添加磷(P)或銻(Sb)會產生N型結晶。按 照雜質添加量之不同’可以控制不同的結晶電阻率。 其-人’讓懸吊於線體的種晶(單結晶)接觸碎液,一邊 使其轉動-邊慢慢的提取使其成長為單晶。調整這時的溫 f或提取速度的條件’可以製造出各種直徑或特性的單 S曰。成長好的結晶和種晶一樣,會成為完全的單晶。使用 經 濟 部 智 慧 財 產 局 員 工 消 費 合 社 印 製 作原料之夕晶石夕所含的異物量愈少,製成的單晶石夕愈難發 生重排。 [發明所欲解決之問題] 夕然而,即使原本的多晶矽本身是超高純度,製造完成 的夕曰曰在矽碎裂成某種程度的大小時,有時金屬粉等的粒 子(異物)會附著在變成片狀的多晶矽表面。再者,在搬運 的時候,微細的樹脂片有時也會附著在上面。因此,單晶 I夕的靠 &商從原料供應商購進多晶矽時,有時微細的金屬 312684 &張 關家 g^~NS)A4 規格(210 x 29 1253483 A7 五、發明說明(2 ) 曰曰 粉或樹脂片會少量附著在多晶石夕片的表面。所以使用多 矽之前要先洗淨,但是清洗之後粒子數量並不會完全消 失’還是會有某種程度的殘留物。 〆 意 因為附著在多晶_片表面的粒子,會成為單晶錢取 完成後的結晶缺陷’所以當然要盡量要求使用清潔的多晶 矽。然而,在多晶碎表面的粒子數會由於原料供應商或製 品的批次不同而產生參差,所以要求使用多晶發前要評估 製品的粒子數量,設定標準 心加早,以便挑選可以使用的多晶矽, 或依據用途之不同來靈活使用。 …、而目刚係使用所購人的各種多晶碎來實際提取單 晶石夕,並以成品單晶梦評估結晶缺陷等各種缺陷之密度, 由評估結果反過來進行多曰々 个疋订夕日日矽的品質評估。所以,評估結 果的反應會變的很愕。ν义、丨、々 V〇 |雙幻很r又對於刚述多晶矽的挑選或靈活使用 等’難以有彈性的應對措施。 本發明係為解決前述之課題而開發者,其目的在提供 一種不必實際提取單晶,即可有效評估原料多晶梦中的異 物含量之方法。 、 經 濟 部 智 慧 財 產 局 員 工 消 費 合 社 印 製 [解決問題之方案] 為達到前述之目的,士欲αη々 本發明夕晶片之評估方法特徵 在:將塊狀或片狀的多晶石々、、*、主 J夕日日矽次潰於可以溶解多晶矽的藥液 中之後’測量前述藥液t所含之異物數目。 在本發明多晶矽之評估方法中,將塊狀或片狀的多晶 矽浸潰於前述之藥液時,多曰 ^ 夕日日矽的表面即會溶解。而在此 同時,附著在矽表面的異物 幻兵物和所含有的異物會呈現浮游於 本紙家標準- 2 312684 1253483 經濟部智慧財產局員工消費合作社印製 A7 五、發明說明(3 ) 藥液中之狀態。於暑 y y 樣品,用粒子計數^ ^如取樣—部分含有異物的藥液為 所含的異物數。等檢查儀器可以測量—定量的藥液中 如此根據本發明乡& 單晶,即可以事先_ 不义實際楗取 以比以往更早得到評 、初里、,口果,可 矽之挑選或用逯之不π ^ 』以依據夕晶 哎 < 不冋,容易的靈活對應。 而且’除了藥液中所含異物量之 物成分的分析。蕤舲 $也了以實仃異 藉此,不僅可以評估異物含量, 的鑑定。因為可以作為調查異物附著在原料: =上原因之線索’所以按此採取相對應的措施可“ 到清潔的原料多晶矽。 又,將多晶碎浸潰於收容有藥液的槽内之前,最好事 先將藥液循環過濾。 例如槽内收容有藥液之狀態下浸潰多晶矽之 潰多晶碎之前,預先循環過遽藥液的話,可讓初期狀離的 藥液保持於清潔狀態’而可以正確的進行異物數之測量。 [發明之實施型態] 以下’參照第1圖說明本發明之—實施型態多晶石夕的 評估方法。 首先,如第1圖(a)所示,準備好一定數量所要評估的 多晶矽片(例如5公斤)。這個多晶矽片i,不限特定的形 狀’例如塊狀也可以、顆粒狀(片狀)也可以、。 其次,如第1圖(b)所示,將前述的多晶矽片丨收容在 ----------——裝------- -訂·!----- (請先閱讀背面之注音?事項再填寫本頁) 1253483 經濟部智慧財產局員工消費合作社印製 A7 五、發明說明(4 ) 聚乙烯製、特氟隆製的籠架2中。為 在下-個階段的溶蝕液中,所以籠架必須 之溶蝕液所侵蝕的材質。 、為不會被使用中 再者,如第1圖(C)所示,將收 蘼加子、主机妝士 月〗迷夕晶矽片1之 叙架2心貝於裝有溶姓液3的溶餘槽4搜面。在這裡所使 用的溶蝕液3為可以溶解多晶矽的液 例如可以你用惫 硝酸。又,在本實施型態之溶蝕槽4 使用氟 丨角’泉5 '過滅考6, 在浸潰籠架2之前,預先將溶蝕 …σ 鮮)。 倨衣過濾(不含顆粒狀 然後,停止循環過渡,重複將籠架2玫入 4數次之後,再將其從溶蚀槽4中提取。接著,在曰 製、特氟隆(滅⑽)製等之任意容器8内採的樣 品’這時取樣的溶液中含有多晶碎的微粒或粉末。又 時’把容器8收容在密封室9内的同時使用真空泵w 將室9内抽成真空後,將會把溶餘液3吸引進容器 化取樣) 接著,將取樣的溶液放置一定的時間(例如數日卜在 多晶矽的微粒或粉末全部溶解之時,使用液中粒子計數 器,測量-定量的溶液中所含粒子的數目。在這裡,因為 多晶矽的微粒或粉末可以溶解於溶蝕液3裡,所以只有; 晶矽中的微粒或粉末中所含的粒子被計算。使用此方法了 將可以達到高效率化的測量。 同時,也可以使用掃瞄式電子顯微鏡(Seanning Electron MiCroscop,SEM)、能量分散型χ射線光譜分析 本紙張尺i翻中關家標準(CNS;A4規格⑵Qx 297公髮) 4 312684 I.----------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 1253483
— — — — — I — — —— I 1 — I I I I — I I I I I (請先閱讀背面之注音?事項再填寫本頁) 1253483 態之多晶矽的評估方 A7 B7 五、發明說明(7 活使用。 [圖面之簡單說明] 第1A至1D圖是本發明一實施型 法的說明圖。 第2A至2C圖是多晶碎其他評估方法的說明圖。 第3圖為測量結果之圖表,係表示本發明實施例各樣 品溶液中粒子的數量。 第4圖為測量結果之圖表,係砉;w. 你表不從原料多晶矽的各 採樣中所測量到的各單晶矽中的單體化率。 [符號之說明] I-----I---------丨訂·------•線 (請先閱讀背面之注意事項再填寫本頁) 1 多晶珍片 2 籠架 3 溶蝕液 4 溶蝕槽 5 泵 6 過濾器 7 液中粒子計數器 8 容器 9 室 10 真空泵 經濟部智慧財產局員工消費合作社印製
Claims (1)
1253483 H3 第90113172號專利申請案 申請專利範圍修正本 (94年Π月8汨;) 種夕曰曰夕〜汴估方法,係為單晶矽提取原料所使用之 夕曰曰矽〜坪估方法,其特徵在:將塊狀或片狀的多晶矽 浸潰於可溶解前述多晶奴氫氟酸與«的混合液 中,而使遺多晶石夕的表面溶解之後,在前述混合液或將 前述混合液進行取樣後的液中置入粒子計數器,以測量 該混合液中所含有之預定大小的異物數量,而決定提取 後4皁晶石夕的品質。 2.如申請專利範圍帛】項之多晶石夕的評估方法,其中,除 了測量前述混合液中所含有的異物數量之外,復採用掃 描式電子顯微鏡(SEM,Sc_mg Electr〇n麻崎印) 或能量分散型x射線光譜分析法(EDX, Energy D1Spers〗ve x_ray spectr〇sc〇py)施行前述異物的成分分 析。 3·如申請專利範圍第〗項之多晶矽的評估方法,其中,浸 經濟部中央標準局員工福利委員會印製 潰多晶石夕於前述混合液中之前,預先將前述混合液循環 過處。 本紙張尺度適用
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KR (1) | KR100398303B1 (zh) |
CN (1) | CN1229528C (zh) |
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DE102010039752A1 (de) | 2010-08-25 | 2012-03-01 | Wacker Chemie Ag | Polykristallines Silicium und Verfahren zu dessen Herstellung |
DE102012218747A1 (de) | 2012-10-15 | 2014-04-17 | Wacker Chemie Ag | Verfahren zur Abscheidung von polykristallinem Silicium |
JP6175909B2 (ja) * | 2013-05-31 | 2017-08-09 | 三菱マテリアル株式会社 | 多結晶シリコン洗浄方法及び多結晶シリコン洗浄装置 |
US10345211B2 (en) * | 2016-03-28 | 2019-07-09 | Hemlock Semiconductor Operations Llc | Method of determining a concentration of a material not dissolved by silicon etchants contaminating a product |
CN109738451A (zh) * | 2019-01-25 | 2019-05-10 | 江苏金晖光伏有限公司 | 一种单、多晶硅料的筛选检测方法 |
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US4213937A (en) * | 1976-09-22 | 1980-07-22 | Texas Instruments Incorporated | Silicon refinery |
JPH07104334B2 (ja) | 1989-03-31 | 1995-11-13 | 信越半導体株式会社 | Cz単結晶シリコン中の金属不純物濃度の定量方法 |
JP3156878B2 (ja) * | 1992-04-30 | 2001-04-16 | 株式会社東芝 | 半導体装置およびその製造方法 |
JPH05319990A (ja) | 1992-05-20 | 1993-12-03 | Toshiba Ceramics Co Ltd | 粒状シリコン原料の製造方法 |
JP2848176B2 (ja) * | 1992-12-17 | 1999-01-20 | コマツ電子金属株式会社 | 半導体単結晶の欠陥検出方法 |
JP3150222B2 (ja) | 1993-03-25 | 2001-03-26 | 三菱電機株式会社 | 半導体製造装置 |
JPH0737850A (ja) * | 1993-07-20 | 1995-02-07 | Mitsubishi Electric Corp | 洗浄装置 |
JPH0817815A (ja) * | 1994-06-30 | 1996-01-19 | Toshiba Corp | 半導体デバイスの製造方法、半導体基板の処理方法、分析方法及び製造方法 |
JPH0848512A (ja) | 1994-08-10 | 1996-02-20 | Tokuyama Corp | 多結晶シリコン粒子 |
JPH08306753A (ja) * | 1995-05-10 | 1996-11-22 | Nippon Steel Corp | シリコンウェハの品質評価方法 |
US5793833A (en) * | 1995-06-22 | 1998-08-11 | Shin-Etsu Handotai Co., Ltd. | Method of and apparatus for measuring and estimating the cleanliness of wafer accommodating members |
JPH11145230A (ja) * | 1997-11-10 | 1999-05-28 | Sony Corp | 多結晶シリコン膜の分析方法 |
JPH11162859A (ja) * | 1997-11-28 | 1999-06-18 | Canon Inc | シリコン結晶の液相成長方法及びそれを用いた太陽電池の製造方法 |
JPH11171685A (ja) | 1997-12-05 | 1999-06-29 | Toshiba Ceramics Co Ltd | シリコン単結晶引上装置 |
US6172376B1 (en) * | 1997-12-17 | 2001-01-09 | American Air Liquide Inc. | Method and system for measuring particles in a liquid sample |
JPH11304791A (ja) * | 1998-04-24 | 1999-11-05 | Tokuyama Corp | 多結晶シリコンの不純物分析方法 |
KR20010052812A (ko) * | 1998-06-30 | 2001-06-25 | 모리시타 요이찌 | 박막 트랜지스터 및 그 제조방법 |
JP3534172B2 (ja) | 1998-10-20 | 2004-06-07 | 三菱住友シリコン株式会社 | ポリシリコンの洗浄方法 |
KR20000040115A (ko) * | 1998-12-17 | 2000-07-05 | 김영환 | 오존 분포도 측정방법 |
-
2000
- 2000-06-26 JP JP2000191744A patent/JP3569662B2/ja not_active Expired - Lifetime
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2001
- 2001-05-31 TW TW090113172A patent/TWI253483B/zh not_active IP Right Cessation
- 2001-05-31 US US09/867,418 patent/US6916657B2/en not_active Expired - Lifetime
- 2001-06-21 DE DE10129489A patent/DE10129489B4/de not_active Expired - Lifetime
- 2001-06-25 KR KR10-2001-0036295A patent/KR100398303B1/ko active IP Right Grant
- 2001-06-26 CN CNB011218916A patent/CN1229528C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
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CN1330173A (zh) | 2002-01-09 |
CN1229528C (zh) | 2005-11-30 |
US20020000186A1 (en) | 2002-01-03 |
KR100398303B1 (ko) | 2003-09-19 |
DE10129489A1 (de) | 2002-02-21 |
DE10129489B4 (de) | 2012-08-16 |
KR20020019378A (ko) | 2002-03-12 |
JP3569662B2 (ja) | 2004-09-22 |
US6916657B2 (en) | 2005-07-12 |
JP2002005812A (ja) | 2002-01-09 |
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