TWI242110B - Process for preparing a radiation-sensitive composition - Google Patents
Process for preparing a radiation-sensitive composition Download PDFInfo
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- TWI242110B TWI242110B TW088100655A TW88100655A TWI242110B TW I242110 B TWI242110 B TW I242110B TW 088100655 A TW088100655 A TW 088100655A TW 88100655 A TW88100655 A TW 88100655A TW I242110 B TWI242110 B TW I242110B
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- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 238000003260 vortexing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/008,671 US6027853A (en) | 1998-01-16 | 1998-01-16 | Process for preparing a radiation-sensitive composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWI242110B true TWI242110B (en) | 2005-10-21 |
Family
ID=21732997
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW088100655A TWI242110B (en) | 1998-01-16 | 1999-03-03 | Process for preparing a radiation-sensitive composition |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6027853A (https=) |
| EP (1) | EP1044394B1 (https=) |
| JP (1) | JP2002509290A (https=) |
| KR (1) | KR100576534B1 (https=) |
| DE (1) | DE69925358T2 (https=) |
| TW (1) | TWI242110B (https=) |
| WO (1) | WO1999036831A1 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6359114B1 (en) * | 1995-06-07 | 2002-03-19 | Aphton Corp. | System for method for the modification and purification of proteins |
| US6506831B2 (en) * | 1998-12-20 | 2003-01-14 | Honeywell International Inc. | Novolac polymer planarization films with high temperature stability |
| US6414110B1 (en) * | 1999-11-12 | 2002-07-02 | Triquest Lp | Purification means |
| US6461717B1 (en) | 2000-04-24 | 2002-10-08 | Shipley Company, L.L.C. | Aperture fill |
| US20040192876A1 (en) * | 2002-11-18 | 2004-09-30 | Nigel Hacker | Novolac polymer planarization films with high temparature stability |
| CN100367113C (zh) * | 2002-12-11 | 2008-02-06 | 三星电子株式会社 | 用于形成共轭聚合物图案的组合物和使用该组合物形成共轭聚合物图案的方法 |
| JP4426526B2 (ja) * | 2003-07-17 | 2010-03-03 | ハネウエル・インターナシヨナル・インコーポレーテツド | 最新式のマイクロエレクトロニクス用途およびデバイス用の平坦化膜およびそれらの製造方法 |
| US20070248913A1 (en) * | 2006-04-24 | 2007-10-25 | Rahman M Dalil | Process for producing film forming resins for photoresist compositions |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57159821A (en) * | 1981-03-30 | 1982-10-02 | Fujitsu Ltd | Production of photopolymer |
| JPS6097347A (ja) * | 1983-11-01 | 1985-05-31 | Hitachi Chem Co Ltd | 画像形成性感光性組成物 |
| JP2590342B2 (ja) * | 1986-11-08 | 1997-03-12 | 住友化学工業株式会社 | ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物 |
| US4921778A (en) * | 1988-07-29 | 1990-05-01 | Shipley Company Inc. | Photoresist pattern fabrication employing chemically amplified metalized material |
| FR2658092B1 (fr) * | 1990-02-13 | 1992-05-15 | Atochem | Procede de purification de solutions de polyorganophosphazene par membranes. |
| US5171767A (en) * | 1991-05-06 | 1992-12-15 | Rohm And Haas Company | Utrafiltration process for the recovery of polymeric latices from whitewater |
| TW267219B (https=) * | 1991-12-27 | 1996-01-01 | Sumitomo Chemical Co | |
| US5527161A (en) * | 1992-02-13 | 1996-06-18 | Cybor Corporation | Filtering and dispensing system |
| US5571657A (en) * | 1993-09-30 | 1996-11-05 | Shipley Company, Inc. | Modified cation exhange process |
| US5462675A (en) * | 1994-07-15 | 1995-10-31 | Pall Corporation | Filter assembly and method of reducing hold-up in a filter assembly |
| JP3278306B2 (ja) * | 1994-10-31 | 2002-04-30 | 富士写真フイルム株式会社 | ポジ型フォトレジスト組成物 |
| JP3330254B2 (ja) * | 1995-04-19 | 2002-09-30 | 東京応化工業株式会社 | ネガ型レジスト組成物 |
| JP3467118B2 (ja) * | 1995-05-24 | 2003-11-17 | 富士写真フイルム株式会社 | ポジ型フォトレジスト組成物 |
| US5618655A (en) * | 1995-07-17 | 1997-04-08 | Olin Corporation | Process of reducing trace levels of metal impurities from resist components |
| JP3589365B2 (ja) * | 1996-02-02 | 2004-11-17 | 富士写真フイルム株式会社 | ポジ画像形成組成物 |
-
1998
- 1998-01-16 US US09/008,671 patent/US6027853A/en not_active Expired - Fee Related
-
1999
- 1999-01-13 DE DE69925358T patent/DE69925358T2/de not_active Expired - Fee Related
- 1999-01-13 WO PCT/US1999/000719 patent/WO1999036831A1/en not_active Ceased
- 1999-01-13 EP EP99904081A patent/EP1044394B1/en not_active Expired - Lifetime
- 1999-01-13 JP JP2000540482A patent/JP2002509290A/ja active Pending
- 1999-01-13 KR KR1020007007840A patent/KR100576534B1/ko not_active Expired - Fee Related
- 1999-03-03 TW TW088100655A patent/TWI242110B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| US6027853A (en) | 2000-02-22 |
| EP1044394B1 (en) | 2005-05-18 |
| DE69925358T2 (de) | 2006-01-12 |
| WO1999036831A1 (en) | 1999-07-22 |
| EP1044394A4 (en) | 2001-04-04 |
| DE69925358D1 (de) | 2005-06-23 |
| EP1044394A1 (en) | 2000-10-18 |
| KR100576534B1 (ko) | 2006-05-08 |
| JP2002509290A (ja) | 2002-03-26 |
| KR20010040340A (ko) | 2001-05-15 |
| WO1999036831A9 (en) | 1999-10-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |