TWD175853S - 電漿處理裝置用罩環 - Google Patents

電漿處理裝置用罩環

Info

Publication number
TWD175853S
TWD175853S TW104305549F TW104305549F TWD175853S TW D175853 S TWD175853 S TW D175853S TW 104305549 F TW104305549 F TW 104305549F TW 104305549 F TW104305549 F TW 104305549F TW D175853 S TWD175853 S TW D175853S
Authority
TW
Taiwan
Prior art keywords
plasma processing
sample table
plasma
processing equipment
cover
Prior art date
Application number
TW104305549F
Other languages
English (en)
Chinese (zh)
Inventor
Susumu Tauchi
Takashi Uemura
Kohei Sato
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Publication of TWD175853S publication Critical patent/TWD175853S/zh

Links

TW104305549F 2015-06-12 2015-10-06 電漿處理裝置用罩環 TWD175853S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-13036F JP1551512S (enrdf_load_stackoverflow) 2015-06-12 2015-06-12

Publications (1)

Publication Number Publication Date
TWD175853S true TWD175853S (zh) 2016-05-21

Family

ID=56105200

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104305549F TWD175853S (zh) 2015-06-12 2015-10-06 電漿處理裝置用罩環

Country Status (3)

Country Link
US (1) USD802790S1 (enrdf_load_stackoverflow)
JP (1) JP1551512S (enrdf_load_stackoverflow)
TW (1) TWD175853S (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber

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JP1584146S (enrdf_load_stackoverflow) 2017-01-31 2017-08-21
JP1584784S (enrdf_load_stackoverflow) 2017-01-31 2017-08-28
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USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
JP1640255S (enrdf_load_stackoverflow) * 2018-10-25 2019-09-02
USD881767S1 (en) * 2018-11-30 2020-04-21 Warn Automotive, Llc Latch ring
JP1638504S (enrdf_load_stackoverflow) * 2018-12-06 2019-08-05
USD918273S1 (en) * 2019-05-14 2021-05-04 Dana Gonzalez Shoe and float collar device
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
US12100577B2 (en) 2019-08-28 2024-09-24 Applied Materials, Inc. High conductance inner shield for process chamber
US12080522B2 (en) 2020-04-22 2024-09-03 Applied Materials, Inc. Preclean chamber upper shield with showerhead
USD973609S1 (en) * 2020-04-22 2022-12-27 Applied Materials, Inc. Upper shield with showerhead for a process chamber
USD1008967S1 (en) * 2022-05-16 2023-12-26 Japan Aviation Electronics Industry, Limited Collar for connector

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USD716239S1 (en) * 2013-11-06 2014-10-28 Applied Materials, Inc. Upper chamber liner
USD717746S1 (en) * 2013-11-06 2014-11-18 Applied Materials, Inc. Lower chamber liner
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber

Also Published As

Publication number Publication date
JP1551512S (enrdf_load_stackoverflow) 2016-06-13
USD802790S1 (en) 2017-11-14

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