JP1584146S - - Google Patents

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Publication number
JP1584146S
JP1584146S JPD2017-1755F JP2017001755F JP1584146S JP 1584146 S JP1584146 S JP 1584146S JP 2017001755 F JP2017001755 F JP 2017001755F JP 1584146 S JP1584146 S JP 1584146S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2017-1755F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2017-1755F priority Critical patent/JP1584146S/ja
Priority to TW106301395F priority patent/TWD190344S/zh
Priority to US29/610,999 priority patent/USD840365S1/en
Application granted granted Critical
Publication of JP1584146S publication Critical patent/JP1584146S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2017-1755F 2017-01-31 2017-01-31 Active JP1584146S (enrdf_load_stackoverflow)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2017-1755F JP1584146S (enrdf_load_stackoverflow) 2017-01-31 2017-01-31
TW106301395F TWD190344S (zh) 2017-01-31 2017-03-17 Shield ring for plasma processing unit
US29/610,999 USD840365S1 (en) 2017-01-31 2017-07-18 Cover ring for a plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2017-1755F JP1584146S (enrdf_load_stackoverflow) 2017-01-31 2017-01-31

Publications (1)

Publication Number Publication Date
JP1584146S true JP1584146S (enrdf_load_stackoverflow) 2017-08-21

Family

ID=59593506

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2017-1755F Active JP1584146S (enrdf_load_stackoverflow) 2017-01-31 2017-01-31

Country Status (3)

Country Link
US (1) USD840365S1 (enrdf_load_stackoverflow)
JP (1) JP1584146S (enrdf_load_stackoverflow)
TW (1) TWD190344S (enrdf_load_stackoverflow)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
JP1640255S (enrdf_load_stackoverflow) * 2018-10-25 2019-09-02
JP1638504S (enrdf_load_stackoverflow) * 2018-12-06 2019-08-05
USD918273S1 (en) * 2019-05-14 2021-05-04 Dana Gonzalez Shoe and float collar device
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
US12100577B2 (en) 2019-08-28 2024-09-24 Applied Materials, Inc. High conductance inner shield for process chamber
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
JP1678672S (enrdf_load_stackoverflow) * 2019-11-07 2021-02-08
JP1682811S (ja) * 2020-08-11 2021-04-05 整流板
JP1682812S (ja) * 2020-08-11 2021-04-05 整流板
JP1682810S (ja) * 2020-08-11 2023-03-28 整流板
JP1682813S (ja) * 2020-08-11 2021-04-05 整流板
JP1706321S (enrdf_load_stackoverflow) * 2021-06-28 2022-01-31
USD1008967S1 (en) * 2022-05-16 2023-12-26 Japan Aviation Electronics Industry, Limited Collar for connector

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD404369S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Manifold cover for use in a semiconductor wafer heat processing apparatus
JP2003100713A (ja) * 2001-09-26 2003-04-04 Kawasaki Microelectronics Kk プラズマ電極用カバー
USD491963S1 (en) * 2002-11-20 2004-06-22 Tokyo Electron Limited Inner wall shield for a process chamber for manufacturing semiconductors
USD494551S1 (en) 2002-12-12 2004-08-17 Tokyo Electron Limited Exhaust ring for manufacturing semiconductors
US20050150452A1 (en) * 2004-01-14 2005-07-14 Soovo Sen Process kit design for deposition chamber
JP2005340251A (ja) * 2004-05-24 2005-12-08 Shin Etsu Chem Co Ltd プラズマ処理装置用のシャワープレート及びプラズマ処理装置
USD559993S1 (en) * 2005-03-30 2008-01-15 Tokyo Electron Limited Cover ring
TWD121115S1 (zh) 2005-03-30 2008-01-21 東京威力科創股份有限公司 遮護環
US7186171B2 (en) * 2005-04-22 2007-03-06 Applied Materials, Inc. Composite retaining ring
USD557425S1 (en) 2005-08-25 2007-12-11 Hitachi High-Technologies Corporation Cover ring for a plasma processing apparatus
USD557226S1 (en) 2005-08-25 2007-12-11 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
US20080121620A1 (en) * 2006-11-24 2008-05-29 Guo G X Processing chamber
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD638951S1 (en) * 2009-11-13 2011-05-31 3M Innovative Properties Company Sample processing disk cover
USD717746S1 (en) * 2013-11-06 2014-11-18 Applied Materials, Inc. Lower chamber liner
JP1551512S (enrdf_load_stackoverflow) 2015-06-12 2016-06-13
JP1546800S (enrdf_load_stackoverflow) 2015-06-12 2016-03-28
JP1546801S (enrdf_load_stackoverflow) * 2015-06-12 2016-03-28

Also Published As

Publication number Publication date
TWD190344S (zh) 2018-05-11
USD840365S1 (en) 2019-02-12

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