JP1546801S - - Google Patents

Info

Publication number
JP1546801S
JP1546801S JPD2015-13038F JP2015013038F JP1546801S JP 1546801 S JP1546801 S JP 1546801S JP 2015013038 F JP2015013038 F JP 2015013038F JP 1546801 S JP1546801 S JP 1546801S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2015-13038F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2015-13038F priority Critical patent/JP1546801S/ja
Priority to TW104305551F priority patent/TWD175855S/zh
Priority to US29/544,071 priority patent/USD802545S1/en
Application granted granted Critical
Publication of JP1546801S publication Critical patent/JP1546801S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2015-13038F 2015-06-12 2015-06-12 Active JP1546801S (enrdf_load_stackoverflow)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2015-13038F JP1546801S (enrdf_load_stackoverflow) 2015-06-12 2015-06-12
TW104305551F TWD175855S (zh) 2015-06-12 2015-10-06 電漿處理裝置用下腔室
US29/544,071 USD802545S1 (en) 2015-06-12 2015-10-30 Lower chamber for a plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-13038F JP1546801S (enrdf_load_stackoverflow) 2015-06-12 2015-06-12

Publications (1)

Publication Number Publication Date
JP1546801S true JP1546801S (enrdf_load_stackoverflow) 2016-03-28

Family

ID=55539625

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2015-13038F Active JP1546801S (enrdf_load_stackoverflow) 2015-06-12 2015-06-12

Country Status (3)

Country Link
US (1) USD802545S1 (enrdf_load_stackoverflow)
JP (1) JP1546801S (enrdf_load_stackoverflow)
TW (1) TWD175855S (enrdf_load_stackoverflow)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1611626S (enrdf_load_stackoverflow) * 2017-01-20 2018-08-20
JP1584146S (enrdf_load_stackoverflow) * 2017-01-31 2017-08-21
USD842259S1 (en) * 2017-04-28 2019-03-05 Applied Materials, Inc. Plasma chamber liner
USD838681S1 (en) * 2017-04-28 2019-01-22 Applied Materials, Inc. Plasma chamber liner
USD837754S1 (en) * 2017-04-28 2019-01-08 Applied Materials, Inc. Plasma chamber liner
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
JP1638504S (enrdf_load_stackoverflow) * 2018-12-06 2019-08-05
USD979524S1 (en) * 2020-03-19 2023-02-28 Applied Materials, Inc. Confinement liner for a substrate processing chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD947914S1 (en) 2020-11-23 2022-04-05 Applied Materials, Inc. Base plate for a processing chamber substrate support
JP1704964S (ja) * 2021-04-19 2022-01-14 プラズマ処理装置用サセプタリング
JP1700629S (enrdf_load_stackoverflow) * 2021-04-26 2021-11-29
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1042374S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber
USD1055006S1 (en) 2022-03-18 2024-12-24 Applied Materials, Inc. Support ring for an interlocking process kit for a substrate processing chamber
USD1042373S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1034493S1 (en) * 2022-11-25 2024-07-09 Ap Systems Inc. Chamber wall liner for a semiconductor manufacturing apparatus

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4319432A (en) * 1980-05-13 1982-03-16 Spitfire Tool And Machine Co. Polishing fixture
USD404369S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Manifold cover for use in a semiconductor wafer heat processing apparatus
US6068548A (en) * 1997-12-17 2000-05-30 Intel Corporation Mechanically stabilized retaining ring for chemical mechanical polishing
US6264540B1 (en) * 2000-03-30 2001-07-24 Speedfam-Ipec Corporation Method and apparatus for disposable bladder carrier assembly
AU2003300375A1 (en) * 2002-10-11 2004-05-04 Semplastics, L.L.C. Retaining ring for use on a carrier of a polishing apparatus
JP5296985B2 (ja) * 2003-11-13 2013-09-25 アプライド マテリアルズ インコーポレイテッド 整形面をもつリテーニングリング
EP1899110A2 (en) * 2005-05-24 2008-03-19 Entegris, Inc. Cmp retaining ring
USD703160S1 (en) * 2011-01-27 2014-04-22 Hitachi High-Technologies Corporation Grounded electrode for a plasma processing apparatus
USD658691S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
US20120263569A1 (en) * 2011-04-14 2012-10-18 Scott Wayne Priddy Substrate holders and methods of substrate mounting
USD693782S1 (en) * 2012-11-19 2013-11-19 Epicrew Corporation Lid for epitaxial growing device
USD734377S1 (en) * 2013-03-28 2015-07-14 Hirata Corporation Top cover of a load lock chamber
TWD169790S (zh) * 2013-07-10 2015-08-11 日立國際電氣股份有限公司 基板處理裝置用氣化器之部分
USD722966S1 (en) * 2013-08-23 2015-02-24 Bridgeport Fittings, Inc. Split, non-metallic electrical insulating bushing
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
USD775710S1 (en) * 2015-05-19 2017-01-03 Il Han Kim End bushing for fishing reel spool
JP1546800S (enrdf_load_stackoverflow) * 2015-06-12 2016-03-28

Also Published As

Publication number Publication date
USD802545S1 (en) 2017-11-14
TWD175855S (zh) 2016-05-21

Similar Documents

Publication Publication Date Title
JP1546800S (enrdf_load_stackoverflow)
BR112018004768A2 (enrdf_load_stackoverflow)
JP1546801S (enrdf_load_stackoverflow)
JP1557477S (enrdf_load_stackoverflow)
BR112018005242A2 (enrdf_load_stackoverflow)
BR112018005468A2 (enrdf_load_stackoverflow)
BR112017027454A2 (enrdf_load_stackoverflow)
BR112018004132A2 (enrdf_load_stackoverflow)
BR0005085B1 (enrdf_load_stackoverflow)
BR0008158B1 (enrdf_load_stackoverflow)
BR0007747B1 (enrdf_load_stackoverflow)
BR0007688B1 (enrdf_load_stackoverflow)
BR0007672B1 (enrdf_load_stackoverflow)
BR0007487B1 (enrdf_load_stackoverflow)
CN303074579S (enrdf_load_stackoverflow)
CN303071533S (enrdf_load_stackoverflow)
CN303069481S (enrdf_load_stackoverflow)
CN303069222S (enrdf_load_stackoverflow)
CN303068850S (enrdf_load_stackoverflow)
CN303066182S (enrdf_load_stackoverflow)
BR0009649B1 (enrdf_load_stackoverflow)
BR0006866B1 (enrdf_load_stackoverflow)
BR0006854B1 (enrdf_load_stackoverflow)
BR0006634B1 (enrdf_load_stackoverflow)
BR0008132B1 (enrdf_load_stackoverflow)