TW585896B - Layered organic-inorganic perovskites having metal-deficient inorganic frameworks - Google Patents
Layered organic-inorganic perovskites having metal-deficient inorganic frameworks Download PDFInfo
- Publication number
- TW585896B TW585896B TW090102093A TW90102093A TW585896B TW 585896 B TW585896 B TW 585896B TW 090102093 A TW090102093 A TW 090102093A TW 90102093 A TW90102093 A TW 90102093A TW 585896 B TW585896 B TW 585896B
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- TW
- Taiwan
- Prior art keywords
- organic
- inorganic
- metal
- patent application
- scope
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 45
- 239000002184 metal Substances 0.000 title claims abstract description 45
- 230000002950 deficient Effects 0.000 title claims abstract description 6
- 239000013385 inorganic framework Substances 0.000 title 1
- 150000001449 anionic compounds Chemical class 0.000 claims abstract description 16
- 229910001412 inorganic anion Inorganic materials 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 12
- 150000002892 organic cations Chemical class 0.000 claims abstract description 12
- 229910001507 metal halide Inorganic materials 0.000 claims abstract description 10
- 150000005309 metal halides Chemical class 0.000 claims abstract description 10
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 18
- 150000001768 cations Chemical class 0.000 claims description 15
- 238000002360 preparation method Methods 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 15
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 12
- 150000003839 salts Chemical class 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 10
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 9
- 125000002091 cationic group Chemical group 0.000 claims description 9
- 238000001816 cooling Methods 0.000 claims description 8
- 230000002079 cooperative effect Effects 0.000 claims description 8
- 150000004985 diamines Chemical class 0.000 claims description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 6
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 6
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000011575 calcium Substances 0.000 claims description 6
- 229910052791 calcium Inorganic materials 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 238000012360 testing method Methods 0.000 claims description 5
- KOECRLKKXSXCPB-UHFFFAOYSA-K triiodobismuthane Chemical compound I[Bi](I)I KOECRLKKXSXCPB-UHFFFAOYSA-K 0.000 claims description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 claims description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical class OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- KWQLUUQBTAXYCB-UHFFFAOYSA-K antimony(3+);triiodide Chemical compound I[Sb](I)I KWQLUUQBTAXYCB-UHFFFAOYSA-K 0.000 claims description 2
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims 2
- 229910000039 hydrogen halide Inorganic materials 0.000 claims 2
- 239000012433 hydrogen halide Substances 0.000 claims 2
- 229910000043 hydrogen iodide Inorganic materials 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 125000004103 aminoalkyl group Chemical group 0.000 claims 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 claims 1
- 125000000732 arylene group Chemical group 0.000 claims 1
- 125000002541 furyl group Chemical group 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical group 0.000 claims 1
- 150000002894 organic compounds Chemical class 0.000 claims 1
- 125000005561 phenanthryl group Chemical group 0.000 claims 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims 1
- 235000015170 shellfish Nutrition 0.000 claims 1
- XIUROWKZWPIAIB-UHFFFAOYSA-N sulfotep Chemical compound CCOP(=S)(OCC)OP(=S)(OCC)OCC XIUROWKZWPIAIB-UHFFFAOYSA-N 0.000 claims 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims 1
- 125000005032 thiofuranyl group Chemical group S1C(=CC=C1)* 0.000 claims 1
- 229910052861 titanite Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 description 43
- 239000000126 substance Substances 0.000 description 11
- 239000011541 reaction mixture Substances 0.000 description 10
- 239000013078 crystal Substances 0.000 description 8
- -1 alkylammonium cations Chemical class 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 229910052797 bismuth Inorganic materials 0.000 description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical group [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 3
- 230000005669 field effect Effects 0.000 description 3
- 229910052500 inorganic mineral Inorganic materials 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 239000011630 iodine Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 150000001767 cationic compounds Chemical class 0.000 description 2
- 235000013339 cereals Nutrition 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000875 corresponding effect Effects 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000012552 review Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- HBRQLWCXJABKBQ-UHFFFAOYSA-J tetrabromoplumbane Chemical compound Br[Pb](Br)(Br)Br HBRQLWCXJABKBQ-UHFFFAOYSA-J 0.000 description 2
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- TXTQARDVRPFFHL-UHFFFAOYSA-N [Sb].[H][H] Chemical compound [Sb].[H][H] TXTQARDVRPFFHL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000007707 calorimetry Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 125000005131 dialkylammonium group Chemical group 0.000 description 1
- 230000035622 drinking Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910001411 inorganic cation Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000008040 ionic compounds Chemical class 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 235000012054 meals Nutrition 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910001511 metal iodide Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 230000037230 mobility Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical group [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003220 pyrenes Chemical class 0.000 description 1
- 238000000646 scanning calorimetry Methods 0.000 description 1
- 230000028327 secretion Effects 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
- 238000005092 sublimation method Methods 0.000 description 1
- CDTCEQPLAWQMLB-UHFFFAOYSA-J tetraiodoplumbane Chemical class I[Pb](I)(I)I CDTCEQPLAWQMLB-UHFFFAOYSA-J 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- QPBYLOWPSRZOFX-UHFFFAOYSA-J tin(iv) iodide Chemical compound I[Sn](I)(I)I QPBYLOWPSRZOFX-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F19/00—Metal compounds according to more than one of main groups C07F1/00 - C07F17/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
- H01L21/02197—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides the material having a perovskite structure, e.g. BaTiO3
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/022—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
- H01L21/31691—Inorganic layers composed of oxides or glassy oxides or oxide based glass with perovskite structure
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/50—Organic perovskites; Hybrid organic-inorganic perovskites [HOIP], e.g. CH3NH3PbI3
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Luminescent Compositions (AREA)
- Heterocyclic Compounds Containing Sulfur Atoms (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
585896 A7
發明領域 本發明係關於一具有相互交疊之無機陰離子層及有機 陽離子層足有機-無機鈣鈦礦。更明確的說,本發明係關 於一有機_無機鈣鈦礦,其中之無機陰離子層具有一 金屬且由角落共享的(corner sharing)金屬鹵化物所形成 的八面體架構,其中之有機陽離子層則具有複數個能於 該轉欽礦結構中作為無機陰離子層樣板之陽離子。 發明背景 鈣鈦礦家族之基本結構為ABX3結構,其係由角落共 车的ΒΧό八面體所形成的一種三度空間結構(第1 a及1 b 圖)。ABX3結構中的B乃是能與χ陰離子形成八面體結 構的金屬陽離子。A陽離子係位於BX6八面體間之i 2件 配位的洞中(12-f〇ld coordinated h〇les),且通常為無機金 屬。藉由以有機陽離子來取代A無機陽離子,可形成有 機-無機混雜之鈣鈦礦。 在此離子化合物中,有機成分為其結構中較秘密的部 分,因為其有賴有機陽離子來保持該結構呈電荷中性。 因此,這類化合物需符合特定;的化學計量數。舉例來說, 如果A是單價陽離子,則B是二價金屬。層狀、二度空 間之 A2BX4、ABX4 及一度 2 間之 A3BX5、a2A,BX5 #5 鈇 礦亦存在,並被認為是其三度空間母化合物的衍生物。 舉例來說,層狀之鈣鈦礦可被視為其三度空間結構之 母化合物的衍生物,其具y層厚度切割(即,y叫、2、3 第2頁 本紙張尺度適用中國國家標準(CNS)A4規格(210 χ 297公釐) (請先閱讀背面之注咅Ρ事項再填寫本頁) Ί^τ1 經濟部智慧財產局員工消費合作社印製 585896 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明( 或以上)並與有機調郎層互相交錯形成一三度空間結構。 層狀化合物一般具有相對於原始三度空間鈣鈦礦結構為 <100>或<11〇>方位之無機層。 有機無機鈣鈦礦中具<1〇〇>方位結構的家族成員,一 般具下列層狀通式之結構: (R-NH3)2Ay.lMyX3y + 1 其中Μ是一二價金屬,X是一鹵素原子(即,氯、溴、碘), Α是一小型的無機或有機陽離子(即,cs+、CH3NH3 + ), R-NH/是一大型的脂肪性或芳香性單銨基陽離子,且y 是一可定義無機層厚度的整數。在此系統中,銨基係經 由氫鍵與無機層_素原子結合,至於其屬於有機部分的 尾端則延伸進入層與層間的空間,並以凡德瓦力來穩固 整個結構。 此豕族中具(R-NH3)2MX4(y=i)結構之成員,包含有機_ 無機妈欽礦中最間早且數目最多的例子。類似這種y == 1 (或 更高值的y)的鈣鈦礦層結構,亦可藉由二銨陽離子來穩 定其結構,如此便產生具(NH3-R-NH3)2MX4通式之化合 物。在這些系統中,層與層間並沒有凡德瓦間隙,因為 每一無機層中的銨基團均藉由氫鍵連接到兩邊相鄰的無 機層上。 D. B· Mitzi,Proc. /worg. C/zem.,48,1 (1 999)〆文中 綜論了目前的技術狀態,並揭露在單一分子大小之組合 物中結合了有機及無機材質之有用特性的有機-無機約款 礦。 第3頁 一 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -----------------r—訂—.—·—線— (請先閱讀背面之注意事項再填寫本頁) 585896 A7 ____ B7 五、發明說明() 授予Liang等人之美國專利第5,882,548號中描述了 固態下製備以二價金屬鹵化物層為底之鈣鈦礦的方法。 (請先閱讀背面之注意事項再填寫本頁) C. R. Kagan et al.,Science,286,945 (1999)及 1999 年3月3日提申且目前仍在審查中的美國專利申請序號 第09/36 1,515號之專利,二者内容以參考文獻方式併入 本文中,其中揭露了無機物自我組合的本質,與無機物 之高載體移動特性 (high carrier mobilities characteristic),此兩種特性使無機物適合用於有機-無機 場效電晶體(organic-inorganic Field-Effect Transistors, OIFET’s)。同時亦揭露了以碘化錫(π)為底之有機無機 鈣鈦礦層結構之半導體金屬遷移及高載體移動特性。這 些物質可作為場效電晶體中的通道物質(channel materials) ° 經濟部智慧財產局員工消費合作社印製 1 999年7月8曰提申,且目前仍在審查中的美國專利 申請序號第09/350,428號之專利,及D. B. Mitzi,尸〜c. /利rg. Chm.,3 8(26),6246 (1 999),二者内容以參考文獻 方式併入本文中,其中描述了可將單一晶格及鈣鈦礦混 雜薄層中,來自無機架構之band gap tunability與來自有 機染料成分之高發光效率二者組合在一起。 K. Chondroudis et al.? Chem. Mater., 11, 3028 (1999) 一文描述了可用於有機-無機發光元件(0r§anic-Inorganic Light-Emitting Devices, OILED’s)之單一晶格及#5 鈥礦混 雜薄層。 M. Era et al·,却p/·尸办少心 Ze". 65,676 (1994)及先前 _第4頁__ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公餐) 一 585896 經濟部智慧財產局員工消費合作社印製 A7 ____B7 五、發明說明() 引述之 K. Chondroudis et al·,c/2em. n,3〇28 (1999),兩文均描述了諸如室溫化學勞光(r〇〇m temperature photolixminescence)、形成三級協調(third harmonic generation)、及源自無機層激發子(excit〇ns)所 致之偏光吸收(polariton absorption)等獨特的物理性質。 激發子表現出極大的結合能(> 300 meV)與振動強度。此 強化學螢光’以及其藉由併入結構中不同的金屬或卣原 子來調整發射波長的能力’使這些鈣鈥礦非常適合做為 電發光元件中的一種發射物質。這些物質可作為場效電 晶體中的通道物質。 儘管以上引述了各種以二價金屬_化物及簡單有機二 銨鹽為底所形成的鈣鈦礦層例子,但卻沒有以三價咬更 高價金屬iS化物,結合有機二銨鹽後,所製備而成的有 機-機#5鈥礦結構。 再者,企圖以相當短鏈的烷銨陽離子,來穩定 ― ^ 二價 祕為底所形成的#5鈥礦結構,也失敗了(已知這些短趟的 烷銨陽離子,可穩定以二價金屬_化物為底所形成的錦 鈦礦層)。這些嘗試也獲致與G. A. Mousdis et ai ^ αΑ·,Ζ·
Naturforsch·,53b,927 (199 8)所述差異極大的結構,其中 鹵化鉍結構具有一度空間鋸齒鏈式、角落共享之Biy 八6八 面體結構。 因此,本發明目的是要提供一種以缺乏金屬之無機加 構為底,所形成之新穎的半導體或絕緣之有機-機句戴碑 結構。 .汽 第5頁 -----------------r---訂---·---·---線-- (請先閱讀背面之注意事項再填寫本頁) 585896 經濟部智慧財產局員工消費合作社印製 A7 B7_ 一 五、發明說明() 礦,該製備方法至少包含下列步驟:(a)讓(i) 一有機二胺 之金屬_化物鹽類與(ii) 一金屬價數大於2之金屬互相接 觸,其中之接觸係於一溶劑及_化氫所形成的溶液中進 行;及(b)讓該溶液過飽和以使該鈣鈦礦由溶液中沉殿出 來。較好是,該反應混合物係藉由冷卻來達到過飽和。 本發明更包含一第二方法,其係用以製備一具有相互 交疊之無機陰離子層及有機陽離子層之有機-無機鈣鈦 礦,該製備方法至少包含下列步驟:(a)讓⑴一有機二胺 之金屬_化物鹽類與(ii) 一金屬價數大於2之金屬互相接 觸’其中之接觸係於足以形成鈣鈦礦沉澱之溫度下進行 一段足夠長、能產生鈣鈦礦沉澱的時間。 JS^jUSLl-說明: 本發明所描述之特徵,優點和目的經由上述之發明概 述’下面將作詳細的發明說明,並參考附圖所例舉之實 施例之後,將更明瞭其細節。 另外,附圖所例舉的只為本發明之典型實施例而已, 並非本發明之限制條件,對於其它等效之實施例亦包含 於本發明中。其中: 第la圖(左方)為本發明一 ABX3單位晶格之三度空間 示意圖。 第lb圖(右方)為基本aBX3鈣鈦礦結構之完整三度空 間結構之综覽圖,其中之點狀方格相當於一個單位晶格。 第2a圖顯示一單一的AEQT分子。 . —---- - 第 7苜 本紙張尺度適时(CNS)A4規格(21q χ挪公幻、 ---—- ----------!4'!μ --訂------.--- 線丨丨睾 (請先閱讀背面之注意事項再填寫本頁) 99 ; A 7 B7 五 經濟部智慧財產局員工消費合作社印製 、發明說明( 第2b圖顯示一單一的AEQT.2HT分子。 第3圖顯示(二質子化之AEQDBiwh.機-無機鈣鈦 礦晶體結構。
本發明之鈣鈦礦,係具相互交疊之無機陰離子層及有 機陽離子層。可藉由能模板產生角落共享金屬卣化物八 面體之有機陽離子來穩定整個晶體結構,而於有機-無機 辦欽礦層中併入三價或更高價之金屬齒化物架構,因而 產生半導體或絕緣之新穎的有機-無機鈣鈦礦。 在此有機-無機鈣鈦礦家族中,其無機結構係為層狀 之角落共享金屬南化物八面體。為平衡陽離子有機層的 正價數,已知之陰離子金屬鹵化物層(即,Μχ42·) —般係 限於一價金屬,例如,M = Cu2+、Ni2+、Mn2+、Fe2+、C〇2+、
Pd2+、Ge2+、Sn2+、Pb2+、Eu2+,且 x = ci-、Br·、Γ。在 前技所舉出的例子中,已知單層(即,y=〗)的有機-無機鈣 鈥礦之無機結構具MX/-的層狀結構,其中M2 +是一能形 成八面體配位的二價金屬。 本發明新穎的有機-無機鈣飲礦,具有以價數大於2 之金屬為底之金屬函化物結構。此讓層狀有機-機釣数碟 家族成員延伸包括藉由在Μ位置留下空位處所形成之高 價金屬齒化物八面體薄層。依據本發明,在Μ位置所留 下的空位處數目’必須與預期之二價金屬陽離子與實際 高價物間的電荷價數差異相等。 第8頁 本紙張尺度適用中國國家標準(CNS)A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) 585896 A7 五、發明說明()
Sn“、、Η广、Mb5+、Ta5+、M〇5+及其之組合。最好 是,該金屬鹽類的金屬包括Bi3—、sb3 +及其之組合。 ----------!·11 (請先閱讀背面之注意事項再填寫本頁) 用來製備本發明有機-無機鈣鈦礦之金屬鹽類可以是 氟、氯、溴、碘或其之組合。此_化物較好是碘。 三價金屬碘化物,較好是諸如碘化鉍(ΙΠ)、碘化銻(iii) 或其之混合物。 雖然上述化學通式已相當清楚顯示出如何在無機層之 Μ位置留下空白,但另有一股驅動力會促使其形成沒有 空隙的非-鈣鈦礦結構。舉例來說,儘管已有許多以二價 金屬齒化物與烷基二銨鹽為底形成的鈣鈦礦層結構之例 子在先’但當二價的B i3 +金屬鹵化物簡單的燒基二铵鹽 組合後,並不會形成層狀的有機-無機鈣鈦礦結構。如G. A. Mousdis et al·,Ζ· Naturforsch·,53b,927 (1 998)所述,所 得為具線性鋸齒鏈之角落共享BiX6八面體結構之鹵化鉍 結構。 _線· 經濟部智慧財產局員工消費合作社印製 因此,為使具高價數金屬之鈣鈦礦層狀結構穩定,必 須選擇適當相對應的有機陽離子(organic counter_ cation),使其能於鈣鈦礦層狀結構中,促進或模板 (template)角落共享金屬自化物八面體無機層結構的形 成。 因此,本發明使用一諸如有機二銨陽離子之類的有機 陽離子,作為相對應的有機陽離子,以於鈣鈦礦層狀結 構中,促進或模板(template)角落共享金屬鹵化物八面體 無機陰離子層結構的形成。該鈣鈦礦將因在金屬位置留 __ 第 _ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) A7 五、 B7 發明說明( 經濟部智慧財產局員工消費合作社印製 依據此方法,反應混 各成分,以使無機陰離子有-溶劑,以溶解 後可排列組合成相互交叠;有機有“離子層,在過飽和 混合物中沉澱出來。 廣卫目反應 任何能在環境溫度以 工册各成分溶解,並可於環蟥 度以下將相互交疊之有撫> μ ^ ^ ^ ^ 幾-播機鈣鈦礦沉澱出來的溶劑均 可用於本發明中。 ^分4 7 此溶劑較好是選自諸4 者如早負子醇或多質子醇之類的質 子化溶劑。這類質子仆、、办加a ^ 貝貝卞化/谷劑包括水、乙二醇、丙二醇、 丁二醇、甲醇、乙醇、 畔丙知、丁醇、特別是2-丁醇、及 其混合物。 也可早獨使用諸如乙腈、二甲基甲酿胺及四氯吹喃之 類的非質子化溶劑,或與質子化溶劑合併使用。 也可使用質子化溶劑之組合,較不具極性之質子化溶 劑之組合或非質子化溶劑之組合。因此,該接觸步驟亦 可於一諸如乙二醇之類的極性溶劑中進行,以產生一内 含各成分的溶液,之後再加入一諸如2_ 丁醇這樣極性較 低的溶劑。一般認為在溶液中添加2_ 丁醇可提高產物依 賴 /皿度之溶解度(temperature dependence 〇f the solubility)。因此,當反應係在沒有添加2_丁醇的情況下 進行時’冷卻後可得產物之產率將較低。 欲得鈣鈦礦,須讓反應混合物過飽和。可藉如上所述 的冷卻步驟使反應混合物過飽和,或藉由添加一非極性 溶劑至混合物中,或將溶劑揮發以濃縮反應混合物,來 η 訂 ▲ 第13頁 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 585896 A7 B7 五、發明說明() 達成過飽和。較好是藉由冷卻來使反應混合物達過飽和。 反應混合物過飽和後,會使無機陰離子層與有機陽離 子層自動交錯排列成相互交疊之有機-無機鈣鈦礦’並自 反應混合物中沉澱出來。 較好是,各成分係在約8 0 C至1 4 0 C間之5幕境溫度以 上的溫度下互相接觸,更好是在約11 6 °C之環境溫度以上 的溫度下互相接觸。之後將所得的反應混合物慢慢冷卻 至環境溫度,一般係介於-30°C至20°C間,較好是低於環 境溫度,約-20°C左右。 緩慢冷卻可形成單晶格。冷卻速率較好是約1.5 °C/小 時。但是,亦可使用稍快或稍慢的速率。 在本發明的第二方法中,一有機二胺之_化氫鹽及一 金屬價數大於2的金屬_化物,係在沒有溶劑的情況下 進行接觸。該接觸步驟係在足以產生鈣鈦礦之溫度下進 行一段足夠長的時間。 反應物可以在沒有溶劑的情況下,以固體或液體形式 引入。將反應混合物維持在一溫度下,該溫度係足以使 有機二胺之函化氫鹽及金屬画化物,彼此反應產生本發 明鈣鈦礦。可發生反應的溫度视反應物的性質而定,並 可以任何習知的方法進行測定。這類方法包括從反應混 合物中抽取樣αα以差異性掃瞒熱量儀(d i f f e r e n t i a 1 Scanning Calorimetry,DSC)或X光繞射進行分析,或是 以目視其顏色變化等。 本發明有機-無機鈣鈦礦可以習知方法,進一步處理 _____ 第14頁 本紙張尺度適用中國國家標準(CNS)A4規格(21〇 X 297公釐) (請先閱讀背面之注意事項再填寫本頁} _ 線· 經濟部智慧財產局員工消費合作社印製 585896 經濟部智慧財產局員工消費合作社印製 A7 _______B7__ 五、發明說明() 製造成有機-播機妈数礦晶體或薄層。這類習知方法包括 前述 D. B. Mitzi,尸roc. /⑽rg. C/zd,38(26),6246 (1999) 及Liang等人之美國專利第5,871,579號專利所述以溶液 為底之方法或揮發技術。 本發明具相互交疊之無機陰離子層及有機陽離子層之 有機-無機鈣鈥礦,係為一半導體或可絕緣之混雜妈鈥礦 層。其可用於平板顯示器、非線性之光/光電元件及化學 感應器中。使這些鈣鈦礦非常適合做為有機-無機發光二 極體(OILED’s)、有機-無機薄膜電晶體(OLTFT’s)及有機-無機場效電晶體中的一種可傳送及發射電荷的物質。 下列實施例僅供闡述本發明之用,本發明範轉並不僅 限於這些實施例中。 實施例1 以昇華法純化 Bil3(99.999%,無水,購自 Aldrich chemical Company,Inc., Milkwaukee, WI) 〇 在惰性氣體 下,將等莫耳數的5,5’’’-雙-(氨乙基)-2,2’:5’,2’’:5’’,2’’’-四級硫代呋喃-二碘化氫(AEQT2HI)(161.4毫克,0.24毫 莫耳,依 H. Muguruma et al·,J. Heterocyclic Chem·,33, 173 (1 996)所述之方法製備),及Bil3(141.5毫克,0.24 毫莫耳)加到試管中。試管中内容物可完全溶解於11 2 °C 下,由乙二醇(36毫升,99.8%,無水,購自 Aldrich)及 HI 濃溶液(57 wt%,0.6 毫升,99.99%,安定,購自 Aldrich) 組成的混合溶劑中。在緩慢添加2- 丁醇的期間(1 8毫升, ____第1項_ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) I — —.1 丨 i!! - — h!丨訂------I--I I (請先閱讀背面之注音?事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 585896 A7 ----- B7 五、發明說明() 99.5%,講自Aldrich),有少量的紅色沉觀開始形成。於 一密封管中將混合物加熱至11 6 °C,可使沉澱再度溶解。 之後以每小時1 ·5 °C的冷卻速率’將溶液緩緩冷卻至_2〇 C ’可得兩產率(2 2 %)之 木紅色層狀(二質子化 A E Q T ) B i 2 / 314約鈥礦結晶。 此產物的化學分析(二重複)也與預期之化式一致: 理論值(實際測試值):C 22.54 (22·6),Η 2.08 (2.2), Ν 2.63 (2.5),S 12.04 (12.1) 0 以X光單晶繞射來檢視(二質子化AEQT)Bi2/3I4單晶, 所得結果示於第3圖。結構分析確認Bi3 +在有機-無機妈 鈦礦結構中相當穩定,其單晶常數a = 3 9.7 5 (1 ) A,b = 5.980(2)A,c = 12·094(4)Α,且 β = 92.25 1 (5)。。無機層 具有角或落共享之BiI6八面體,其中鉍原子所在位置三 分之一係為空白的,且該空白發生處乃隨機性的。四級 硫代呋喃基團則非常有秩序,形成一順-反-順式的組態 構形,並與相鄰最近的四級硫代呋喃基形成一賀林伯 (herringbone)式的兩g 歹ij 。 比較(二質子化AEQT)Bi2/3I4與1 999年7月8日提申、 目前仍在審查中的美國專利申請序號第09/350,428號中 所述(二質子化AEQT)PbBr4之結構,可發現除了其係以 二價鉛離子來取代三價金屬並於金屬位置留下空白外, 本發明(二質子化AEQT)Bi2/3I4與(二質子化AEQT)PbBr4 第16頁 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ----r---訂---------線--AW (請先閱讀背面之注音?事項再填寫本頁) 585896 A7 B7 五、發明說明( 及(二質子化AEQT)PbI4兩化合物之結構並無差異。 (請先閱讀背面之注意事項再填寫本頁) 一般認為有機寡聚物間的作用,可使有機陽離子表現 出習知的層狀排列組合,以模板或產生相互交錯之缺乏 金屬的無機層。 製備具二價叙及挺二銨陽離子之層狀鈣鈥礦結構的嘗 試並未成功。相反的,可得結構完全不同的物質,類似
Mousdis et al·,Z· Naturforsch·,53B,927 (1 999)所述具有 一度空間鋸齒鏈式、角落共享之BiX6八面體結構。 實施例2 除了以破化銻(III)來取代碘化鉍(ΙΠ)外,重複實施例 1所述之步騾。單晶結構分析也證實銻化物(二質子化 AEQT)Sb2/3:[4與鉍化物之結構並無差異。二質子化 AEQT)Sb2/3I4 之晶格常數如下:& = 39439(7)A,b = 5·955(1)Α,c = 12·066(2)Α,且 β = 92.24(1)。。 經濟部智慧財產局員工消費合作社印製 本發明以藉實施例詳加說明,習知技藝者應能瞭解, 在不悖離本發明精神範疇下,仍可對本發明做許多改良 或修飾,這些改良或修飾也均應被视為仍屬本發明下附 申請專利範圍之範轉内。 第17頁 本紙張尺度適用中國國家標準(CNS)A4規格(21〇 X 297公釐)
Claims (1)
- 585896 § g|第士號專利案汾年 > 月修正 六 、申請專利範圍 :修正替換本. π 一種有機-無機鈣鈦礦組合物,該有機-無機鈣鈦礦包 含下列互相交錯之層: 一無機陰離子層,其係具有一由角落共享的金屬 _化物八面體所形成的一種缺乏金屬之無機架構,其 中該金屬具有一價數η為3-5,該金屬齒化物層具下 列之通式: (ΜΠ + )2/η V(n-2)/nX42 其中Μ是金屬;V是一空位處;X是一鹵素;且η 是一 3-5的整數;且 一有機陽離子層,其係具有複數個能於該鈣鈦礦 結構中作為缺乏金屬之無機陰離子層樣板之陽離 子。 2. (請先·«讀背面之注意事項再本頁) 如申請專利範圍第1項所述之有機-無機鈣鈦礦組合 物,其中該所述金屬係選自由Bi3+、Sb3+、In3+、La3+、 Gd3+、Fe3+、Eu3+、Sn4+、Te4+、HF“、Nb4+、Ta5+、 Mo5 +及其之組合所組成的族群中。 經濟部智慧財產局貝工消费合作社印制取 3 · 如申請專利範圍第2項所述之有機-無機鈣鈦礦組合 物,其中該所述金屬係選自由Bi3+、Sb3 +及其之組合 所組成的族群中。 4. 如申請專利範圍第1項所述之有機-無機鈣鈦礦組合 物,其中該所述之i化物為碘化物。 第18頁 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)585896 六、申請專利範圍 5· 如申凊專利範圍第1項所述之有機-無機鈣鈦礦組合 物’其中該所述金屬鹵化物係擇自由碘化鉍(111)、碘 化錄(III)、及其之混合物所組成之族群中。 6.如申請專利範圍第1項所述之有機-無機鈣鈦礦組合 物’其中該所述有機陽離子乃是有機二銨陽離子。 7· 如申請專利範圍第6項所述之有機-無機鈣鈦礦組合 物’其中該所述有機二銨陽離子係衍生自由具有雙一 (氨烷基)-取代的亞芳香基、具有雙-(氨烷基取代的 雜環亞芳香基、及其之組合所組成的之丄胺中。 8· 如申請專利範圍第7項所述之有機-無機鈣鈦礦組合 物,其中該所述二胺具有直鏈狀2-8個芳香基團,每 一芳香基團均可為單獨選自由亞苯基、亞蕃基、蒽 基、菲基、呋喃基或硫代呋喃基組成之族群中。 9. 如申請專利範圍第8項所述之有機-無機鈣鈦礦組合 物,其中該所述有機二銨陽離子係衍生自5,5’’’-雙-(氨乙基)-2,2’ : 5’,2’’ : 5’’,2’’’_四級硫代呋喃與碘化 氫反應後所生成之二銨鹽。 10. 一種製備具相互交疊之無機陰離子層及有機陽離子 第19頁 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公1) • — IIIII1I — — — I · I I (請先«讀背面之注意事項再填窝本頁) 訂---------線 經濟部智慧財產局員工消費合作社印製 ASB8C8D8 585896 六、申請專利範圍 層之有機-無機鈣鈦礦的方法,該製備方法包含下列 步驟: (a) 讓(i)有機二胺之鹵化氫鹽類與(ϋ) 一金屬鹵 化物互相接觸,該金屬i化物具有一金屬價數 3 - 5 ,其中之接觸係於一溶劑及碘化氫中進行並 產生一溶液;及 (b) 讓該溶液過飽和,以使鈣鈦礦能自溶液中沉澱 出來。 11·如申請專利範圍第1〇項所述之製備方法,其中該接 觸步驟係在琿境溫度以上之溫度進行,且該過飽和步 驟係藉由將溶液冷卻至環境溫度以下之溫度中進 行。 12.如申請專利範圍第π項所述之製備方法,其中該環 境溫度以上之溫度係介於80°C至140°C間。 13·如申請專利範圍第u項所述之製備方法,其中該環 境溫度以上之溫度為116°C。 14·如申請專利範圍第U項所述之製備方法,其中該環 境溫度以下之溫度係介於-30°C至20°C間。 15.如申請專利範圍第14項所述之製備方法,其中該環 __ _第 20 頁 —_____ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先-M讀背面之注意事項再_本頁) La- 線- 經濟部智慧財產局貝工消費合作社印製 A868C8D8 經濟部智慧財產局貝工消費合作社印製 585896 六、申請專利範圍 境溫度以下之溫度為·2〇°〇。 16·如申請專利範圍第π項所述之製備方法,其中所述 之冷卻步驟係以每小時i · 5艽的速率進行。 17.如申明專利範圍第10項所述之製備方法,其中所述 溶劑係選自由水、乙二醇、丙二醇、丁二醇、甲醇、 •乙醇.、丙醇、丁醇、2-丁醇、乙腈、二甲基甲醯胺、 四氫唉喃及其混合物所組成之族群中。 18·如申請專利範圍第1〇項所述之製備方法,其中所述 金屬齒化物係選自由碘化鉍(ΠΙ)、碘化銻(ΠΙ)、及其 之混合物所組成之族群中。 19·如申請專利範圍第1〇項所述之製備方法,其中所述 之破化氫鹽為5,5,,,-雙-(氨乙基)-2,2,:5,,2,,: 5 ’ ’,2 ’ ’ ’ -四級硫代呋喃二蛾化氫。 20. 如申請專利範圍第1〇項所述之製備方法,其中所述 之鹵化氫鹽係於試管中由齒化氫及有機二胺反應而 生成的。 21. 一種製備具相互交疊之無機陰離子層及有機陽離子 層之有機-無機鈣鈦礦的方法,該製備方法包含下列 __ 第 21 頁_— 一 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)A8B8C8D8 585896 六、申請專利範圍 步驟: 讓(i) 一有機二胺之齒化氫鹽類與(ii)一金屬鹵 化物互相接觸,該金屬齒化物具有一金屬價數3-5, 其中之接觸係於足以形成鈣鈦礦之溫度下進行一段 足夠長的時間,以產生鈣鈦礦。 (請先·Μ讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 第22頁 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)
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