TW583150B - Quartz glass blank for an optical component, and manufacturing procedure and use thereof - Google Patents
Quartz glass blank for an optical component, and manufacturing procedure and use thereof Download PDFInfo
- Publication number
- TW583150B TW583150B TW091125264A TW91125264A TW583150B TW 583150 B TW583150 B TW 583150B TW 091125264 A TW091125264 A TW 091125264A TW 91125264 A TW91125264 A TW 91125264A TW 583150 B TW583150 B TW 583150B
- Authority
- TW
- Taiwan
- Prior art keywords
- quartz glass
- content
- ppm
- blank
- molecules
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 189
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 38
- 230000003287 optical effect Effects 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 80
- 239000001257 hydrogen Substances 0.000 claims abstract description 61
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 61
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 52
- 230000005855 radiation Effects 0.000 claims abstract description 29
- 238000000265 homogenisation Methods 0.000 claims abstract description 23
- 239000011521 glass Substances 0.000 claims abstract description 20
- 230000007547 defect Effects 0.000 claims abstract description 19
- 238000011282 treatment Methods 0.000 claims abstract description 15
- 230000005540 biological transmission Effects 0.000 claims abstract description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000001301 oxygen Substances 0.000 claims abstract description 7
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 7
- 238000002156 mixing Methods 0.000 claims abstract description 6
- 238000004017 vitrification Methods 0.000 claims description 27
- 230000008569 process Effects 0.000 claims description 20
- 238000009826 distribution Methods 0.000 claims description 18
- 239000002245 particle Substances 0.000 claims description 13
- 239000007789 gas Substances 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 8
- 238000005496 tempering Methods 0.000 claims description 8
- 229910052681 coesite Inorganic materials 0.000 claims description 6
- 229910052906 cristobalite Inorganic materials 0.000 claims description 6
- 229910052682 stishovite Inorganic materials 0.000 claims description 6
- 229910052905 tridymite Inorganic materials 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 5
- 230000007062 hydrolysis Effects 0.000 claims description 5
- 238000006460 hydrolysis reaction Methods 0.000 claims description 5
- 238000005096 rolling process Methods 0.000 claims description 5
- 238000012545 processing Methods 0.000 claims description 3
- 239000004575 stone Substances 0.000 claims description 3
- 229910052704 radon Inorganic materials 0.000 claims 1
- SYUHGPGVQRZVTB-UHFFFAOYSA-N radon atom Chemical compound [Rn] SYUHGPGVQRZVTB-UHFFFAOYSA-N 0.000 claims 1
- 239000002210 silicon-based material Substances 0.000 claims 1
- 238000005056 compaction Methods 0.000 abstract description 29
- 238000010521 absorption reaction Methods 0.000 abstract description 24
- 239000010453 quartz Substances 0.000 abstract description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000001393 microlithography Methods 0.000 abstract 1
- 230000006378 damage Effects 0.000 description 19
- 230000006837 decompression Effects 0.000 description 14
- 238000009792 diffusion process Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 150000002431 hydrogen Chemical class 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 208000005156 Dehydration Diseases 0.000 description 6
- 208000027418 Wounds and injury Diseases 0.000 description 6
- 230000002079 cooperative effect Effects 0.000 description 6
- 230000018044 dehydration Effects 0.000 description 6
- 238000006297 dehydration reaction Methods 0.000 description 6
- 208000014674 injury Diseases 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 235000012239 silicon dioxide Nutrition 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000000875 corresponding effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000035876 healing Effects 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 206010021143 Hypoxia Diseases 0.000 description 3
- 238000001069 Raman spectroscopy Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 229910001868 water Inorganic materials 0.000 description 3
- 206010073306 Exposure to radiation Diseases 0.000 description 2
- 229910052778 Plutonium Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 description 2
- 229910052701 rubidium Inorganic materials 0.000 description 2
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 239000004071 soot Substances 0.000 description 2
- 230000007847 structural defect Effects 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- 101100264195 Caenorhabditis elegans app-1 gene Proteins 0.000 description 1
- 229910003849 O-Si Inorganic materials 0.000 description 1
- 229910003872 O—Si Inorganic materials 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000011221 initial treatment Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 230000001473 noxious effect Effects 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000007420 reactivation Effects 0.000 description 1
- 238000002407 reforming Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000010187 selection method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- -1 siloxanes Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229910052722 tritium Inorganic materials 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0071—Compositions for glass with special properties for laserable glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
- C03C2203/54—Heat-treatment in a dopant containing atmosphere
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10159961A DE10159961C2 (de) | 2001-12-06 | 2001-12-06 | Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW583150B true TW583150B (en) | 2004-04-11 |
Family
ID=7708266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW091125264A TW583150B (en) | 2001-12-06 | 2002-10-25 | Quartz glass blank for an optical component, and manufacturing procedure and use thereof |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7080527B2 (enExample) |
| EP (1) | EP1318124B1 (enExample) |
| JP (1) | JP4565805B2 (enExample) |
| KR (1) | KR100842203B1 (enExample) |
| AT (1) | ATE280139T1 (enExample) |
| DE (1) | DE10159961C2 (enExample) |
| TW (1) | TW583150B (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU6321600A (en) * | 1999-08-12 | 2001-03-13 | Nikon Corporation | Method for preparation of synthetic vitreous silica and apparatus for heat treatment |
| EP1288169A1 (de) * | 2001-08-30 | 2003-03-05 | Schott Glas | Verfahren zur Wasserstoffbeladung von Quarzglaskörpern zur Verbesserung der Brechzahlhomogenität und der Laserfestigkeit bei gleichzeitiger Einhaltung einer vorgegebenen Spannungsdoppelbrechung und danach hergestellte Quarzglaskörper |
| DE10159959A1 (de) * | 2001-12-06 | 2003-06-26 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
| US6992753B2 (en) | 2003-12-24 | 2006-01-31 | Carl Zeiss Smt Ag | Projection optical system |
| US7534733B2 (en) * | 2004-02-23 | 2009-05-19 | Corning Incorporated | Synthetic silica glass optical material having high resistance to laser induced damage |
| DE102004009577B3 (de) * | 2004-02-25 | 2005-03-03 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines optischen Bauteils |
| DE102004017031B4 (de) * | 2004-04-02 | 2008-10-23 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben |
| DE102004018887B4 (de) * | 2004-04-15 | 2009-04-16 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Bauteils aus Quarzglas zum Einsatz mit einer UV-Strahlenquelle und Verfahren für die Eignungsdiagnose eines derartigen Quarzglas-Bauteils |
| US7589039B2 (en) * | 2004-12-29 | 2009-09-15 | Corning Incorporated | Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same |
| US7506521B2 (en) * | 2004-12-29 | 2009-03-24 | Corning Incorporated | High transmission synthetic silica glass and method of making same |
| TWI312768B (en) * | 2004-12-30 | 2009-08-01 | Corning Incorporate | Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same |
| DE102005017739B4 (de) * | 2005-04-15 | 2009-11-05 | Heraeus Quarzglas Gmbh & Co. Kg | Halter aus Quarzglas für die Prozessierung von Halbleiterwafern und Verfahren zur Herstellung des Halters |
| DE102005017752B4 (de) | 2005-04-15 | 2016-08-04 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben |
| US20070059533A1 (en) * | 2005-09-12 | 2007-03-15 | Burdette Steven R | Thermal reflow of glass and fused silica body |
| DE102006043368B4 (de) * | 2005-09-16 | 2019-01-10 | Corning Inc. | Synthetisches Kieselsäureglas und Verfahren zur Herstellung desselben |
| DE102008049325B4 (de) * | 2008-09-29 | 2011-08-25 | Heraeus Quarzglas GmbH & Co. KG, 63450 | Verfahren zur Herstellung eines rohrförmigen Halbzeugs aus Quarzglas sowie Halbzeug aus Quarzglas |
| US8176752B2 (en) * | 2009-07-23 | 2012-05-15 | Corning Incorporated | Silica glass with saturated induced absorption and method of making |
| JP5935765B2 (ja) * | 2012-07-10 | 2016-06-15 | 信越化学工業株式会社 | ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69015453T3 (de) * | 1989-06-09 | 2001-10-11 | Heraeus Quarzglas Gmbh & Co. Kg | Optische Teile und Rohlinge aus synthetischem Siliziumdioxidglas und Verfahren zu ihrer Herstellung. |
| JPH03109223A (ja) * | 1989-09-22 | 1991-05-09 | Asahi Glass Co Ltd | 石英ガラスおよびその製造方法 |
| EP0546196B1 (en) | 1991-06-29 | 1997-05-02 | Shin-Etsu Quartz Products Co., Ltd. | Synthetic quartz glass optical member for excimer laser and production thereof |
| US5326729A (en) * | 1992-02-07 | 1994-07-05 | Asahi Glass Company Ltd. | Transparent quartz glass and process for its production |
| DE4204406C2 (de) * | 1992-02-14 | 1995-04-06 | Heraeus Quarzglas | Verfahren zur Herstellung eines homogenen, schlierenfreien Körpers aus Quarzglas oder aus einem hochkieselsäurehaltigen Glas durch Umformen eines stabförmigen Ausgangskörpers |
| JP2784708B2 (ja) * | 1992-12-28 | 1998-08-06 | 信越石英株式会社 | エキシマレーザー用光学石英ガラス部材及びその製造方法 |
| JP3194667B2 (ja) * | 1994-03-26 | 2001-07-30 | 信越石英株式会社 | 光学用合成石英ガラス成形体及びその製造方法 |
| US5707908A (en) * | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
| US6087283A (en) | 1995-01-06 | 2000-07-11 | Nikon Corporation | Silica glass for photolithography |
| US5616159A (en) * | 1995-04-14 | 1997-04-01 | Corning Incorporated | Method of forming high purity fused silica having high resistance to optical damage |
| JPH0959034A (ja) * | 1995-08-22 | 1997-03-04 | Sumitomo Metal Ind Ltd | 合成石英ガラス材及びその製造方法 |
| JP3188624B2 (ja) * | 1995-12-27 | 2001-07-16 | 信越石英株式会社 | 遠紫外線用高純度合成シリカガラス及びその製造方法 |
| US6415630B1 (en) * | 1997-05-15 | 2002-07-09 | Schott Glas | Method and device for producing a homogenous sheet of quartz glass without streaks |
| DE69816758T2 (de) | 1997-05-20 | 2004-06-03 | Heraeus Quarzglas Gmbh & Co. Kg | Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung |
| WO1999038814A1 (fr) * | 1998-01-30 | 1999-08-05 | Asahi Glass Company Ltd. | Elements optiques en verre de silice synthetique et leur procede de production |
| JP4493060B2 (ja) * | 1999-03-17 | 2010-06-30 | 信越石英株式会社 | エキシマレーザー用光学石英ガラスの製造方法 |
| DE10159962A1 (de) * | 2001-12-06 | 2003-07-03 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben |
-
2001
- 2001-12-06 DE DE10159961A patent/DE10159961C2/de not_active Expired - Lifetime
-
2002
- 2002-10-25 TW TW091125264A patent/TW583150B/zh not_active IP Right Cessation
- 2002-12-04 KR KR1020020076622A patent/KR100842203B1/ko not_active Expired - Fee Related
- 2002-12-04 AT AT02027123T patent/ATE280139T1/de not_active IP Right Cessation
- 2002-12-04 EP EP02027123A patent/EP1318124B1/de not_active Expired - Lifetime
- 2002-12-05 JP JP2002353981A patent/JP4565805B2/ja not_active Expired - Lifetime
- 2002-12-05 US US10/310,349 patent/US7080527B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP4565805B2 (ja) | 2010-10-20 |
| DE10159961C2 (de) | 2003-12-24 |
| EP1318124A2 (de) | 2003-06-11 |
| EP1318124A3 (de) | 2003-07-02 |
| EP1318124B1 (de) | 2004-10-20 |
| KR20030047752A (ko) | 2003-06-18 |
| JP2003176141A (ja) | 2003-06-24 |
| US7080527B2 (en) | 2006-07-25 |
| ATE280139T1 (de) | 2004-11-15 |
| KR100842203B1 (ko) | 2008-06-30 |
| DE10159961A1 (de) | 2003-06-26 |
| US20030115905A1 (en) | 2003-06-26 |
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