TW575798B - Method for regenerating and recovering resist removing liquid, and device for regenerating and recovering the same - Google Patents

Method for regenerating and recovering resist removing liquid, and device for regenerating and recovering the same Download PDF

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Publication number
TW575798B
TW575798B TW90100863A TW90100863A TW575798B TW 575798 B TW575798 B TW 575798B TW 90100863 A TW90100863 A TW 90100863A TW 90100863 A TW90100863 A TW 90100863A TW 575798 B TW575798 B TW 575798B
Authority
TW
Taiwan
Prior art keywords
photoresist stripping
stripping solution
photoresist
component
carbonic acid
Prior art date
Application number
TW90100863A
Other languages
English (en)
Chinese (zh)
Inventor
Michio Adachi
Kensuke Yano
Hiroichi Yoshida
Takahiko Tateno
Teruyuki Shibuya
Original Assignee
Hayashi Junyaku Kogyo Kk
Kimura Kakoki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hayashi Junyaku Kogyo Kk, Kimura Kakoki Co Ltd filed Critical Hayashi Junyaku Kogyo Kk
Application granted granted Critical
Publication of TW575798B publication Critical patent/TW575798B/zh

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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
TW90100863A 2000-10-24 2001-01-15 Method for regenerating and recovering resist removing liquid, and device for regenerating and recovering the same TW575798B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000324092A JP2002131932A (ja) 2000-10-24 2000-10-24 レジスト剥離液の再生回収方法及び再生回収装置

Publications (1)

Publication Number Publication Date
TW575798B true TW575798B (en) 2004-02-11

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ID=18801676

Family Applications (1)

Application Number Title Priority Date Filing Date
TW90100863A TW575798B (en) 2000-10-24 2001-01-15 Method for regenerating and recovering resist removing liquid, and device for regenerating and recovering the same

Country Status (2)

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JP (1) JP2002131932A (ja)
TW (1) TW575798B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101424889B (zh) * 2007-10-26 2013-12-18 日本瑞环化工株式会社 由剥离液废液再生剥离液的方法和再生装置
CN111694229A (zh) * 2020-07-14 2020-09-22 苏州市晶协高新电子材料有限公司 抗蚀剂剥离液高效再生装置和再生方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4834314B2 (ja) * 2005-03-04 2011-12-14 野村マイクロ・サイエンス株式会社 炭酸エチレンの再生方法及び再生装置
KR101266883B1 (ko) 2006-03-03 2013-05-23 주식회사 동진쎄미켐 레지스트 박리페액 재생방법 및 재생장치
KR101266897B1 (ko) * 2006-03-03 2013-05-23 주식회사 동진쎄미켐 레지스트 박리폐액 재생방법 및 재생장치
KR101292475B1 (ko) * 2006-08-29 2013-07-31 동우 화인켐 주식회사 전기분해를 이용한 박리제 재생방법
KR100997743B1 (ko) * 2008-06-25 2010-12-01 덕산약품공업주식회사 포토레지스트 제거용 폐액으로부터 유기용제의 회수 방법
KR101078871B1 (ko) * 2008-10-07 2011-11-01 덕산약품공업주식회사 포토레지스트 폐액으로부터 유기용제의 회수 방법
KR101038042B1 (ko) 2010-03-26 2011-05-31 재원산업 주식회사 폐 ｐｇｍｅａ의 재생방법
JP2013239480A (ja) * 2012-05-11 2013-11-28 Kimura Chem Plants Co Ltd レジスト剥離液の回収方法および回収装置
KR101686080B1 (ko) * 2014-07-25 2016-12-13 덕산실업(주) 포토레지스트 린스용 신너 폐액의 정제방법
CN113009794A (zh) * 2021-03-05 2021-06-22 苏州晶洲装备科技有限公司 一种光阻剥离液废液循环利用系统

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101424889B (zh) * 2007-10-26 2013-12-18 日本瑞环化工株式会社 由剥离液废液再生剥离液的方法和再生装置
CN111694229A (zh) * 2020-07-14 2020-09-22 苏州市晶协高新电子材料有限公司 抗蚀剂剥离液高效再生装置和再生方法

Also Published As

Publication number Publication date
JP2002131932A (ja) 2002-05-09

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