TW575792B - New unsaturated oxime derivatives and the use thereof as latent acids - Google Patents

New unsaturated oxime derivatives and the use thereof as latent acids Download PDF

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Publication number
TW575792B
TW575792B TW88111895A TW88111895A TW575792B TW 575792 B TW575792 B TW 575792B TW 88111895 A TW88111895 A TW 88111895A TW 88111895 A TW88111895 A TW 88111895A TW 575792 B TW575792 B TW 575792B
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TW
Taiwan
Prior art keywords
acid
phenyl
alkyl
cns
page
Prior art date
Application number
TW88111895A
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English (en)
Chinese (zh)
Inventor
Jean-Luc Birbaum
Toshikage Asakura
Hitoshi Yamato
Original Assignee
Ciba Sc Holding Ag
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Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of TW575792B publication Critical patent/TW575792B/zh

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/38Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63Esters of sulfonic acids
    • C07C309/64Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C07C309/66Methanesulfonates
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63Esters of sulfonic acids
    • C07C309/72Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/73Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/03Printing inks characterised by features other than the chemical nature of the binder
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/122Sulfur compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Materials For Photolithography (AREA)
  • Plural Heterocyclic Compounds (AREA)
TW88111895A 1998-08-19 1999-07-12 New unsaturated oxime derivatives and the use thereof as latent acids TW575792B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP98810810 1998-08-19

Publications (1)

Publication Number Publication Date
TW575792B true TW575792B (en) 2004-02-11

Family

ID=8236266

Family Applications (1)

Application Number Title Priority Date Filing Date
TW88111895A TW575792B (en) 1998-08-19 1999-07-12 New unsaturated oxime derivatives and the use thereof as latent acids

Country Status (10)

Country Link
US (1) US6703182B1 (OSRAM)
EP (1) EP1105373B1 (OSRAM)
JP (1) JP4489954B2 (OSRAM)
KR (1) KR100640092B1 (OSRAM)
CN (1) CN100340547C (OSRAM)
AU (1) AU5373999A (OSRAM)
DE (1) DE69903453T2 (OSRAM)
MY (1) MY117695A (OSRAM)
TW (1) TW575792B (OSRAM)
WO (1) WO2000010972A1 (OSRAM)

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TWI742165B (zh) * 2017-09-27 2021-10-11 奇美實業股份有限公司 化學增幅型正型感光性樹脂組成物、光阻圖案及其形成方法以及電子裝置

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CN100361815C (zh) * 2002-04-24 2008-01-16 东芝泰格有限公司 喷墨记录设备
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CN102781911B (zh) * 2010-02-24 2015-07-22 巴斯夫欧洲公司 潜酸及其用途
JP6599446B2 (ja) 2014-05-30 2019-10-30 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 多官能性アシルホスフィンオキシド光重合開始剤
WO2020049378A1 (en) 2018-09-07 2020-03-12 Igm Resins Italia S.R.L. Multifunctional bisacylphosphine oxide photoinitiators
CN113518805B (zh) 2018-12-28 2023-08-08 意大利艾坚蒙树脂有限公司 光引发剂
WO2021070152A1 (en) 2019-10-11 2021-04-15 Igm Resins Italia S.R.L. Coumarin glyoxylates for led photocuring
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
WO2023161049A1 (en) 2022-02-24 2023-08-31 Igm Resins Italia S.R.L. Photoinitiators
EP4273200A1 (en) 2022-05-06 2023-11-08 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers
EP4519377A1 (en) 2022-05-06 2025-03-12 IGM Group B.V. Photoinitiator package comprising phosphine oxide photoinitiators, oxazole-based sensitizers and amine additives
CN119137224A (zh) 2022-05-06 2024-12-13 Igm集团公司 包含氧化膦光引发剂、基于香豆素的敏化剂和胺添加剂的光引发剂包
EP4598967A1 (en) 2022-10-05 2025-08-13 IGM Resins Italia S.r.l. Polymeric (meth)acrylate photoinitiators
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
WO2025027517A1 (en) 2023-08-03 2025-02-06 Igm Resins Italia S.R.L. 10,11 -dihydro-5h-dibenzo[b,f]azepine derivatives as photoinitiatiors in photopolymerisation for use in photocurable compositions
EP4534614A1 (en) 2023-10-02 2025-04-09 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers
WO2025140854A2 (en) 2023-12-28 2025-07-03 Igm Resins Italia S.R.L. NOVEL SOLID FORM OF BIS(2,4,6-TRIMETHYLBENZOYL)-n-OCTYL-PHOSPHINE OXIDE
EP4579344A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Thioalkylcoumarin photosensitizers for photopolymerization
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI742165B (zh) * 2017-09-27 2021-10-11 奇美實業股份有限公司 化學增幅型正型感光性樹脂組成物、光阻圖案及其形成方法以及電子裝置

Also Published As

Publication number Publication date
DE69903453T2 (de) 2003-07-03
AU5373999A (en) 2000-03-14
KR20010085415A (ko) 2001-09-07
CN1313850A (zh) 2001-09-19
EP1105373B1 (en) 2002-10-09
WO2000010972A1 (en) 2000-03-02
US6703182B1 (en) 2004-03-09
CN100340547C (zh) 2007-10-03
MY117695A (en) 2004-07-31
DE69903453D1 (de) 2002-11-14
JP4489954B2 (ja) 2010-06-23
JP2002523398A (ja) 2002-07-30
EP1105373A1 (en) 2001-06-13
KR100640092B1 (ko) 2006-10-31

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