TW548405B - Apparatus and method for fabricating flat workpieces - Google Patents

Apparatus and method for fabricating flat workpieces Download PDF

Info

Publication number
TW548405B
TW548405B TW088122534A TW88122534A TW548405B TW 548405 B TW548405 B TW 548405B TW 088122534 A TW088122534 A TW 088122534A TW 88122534 A TW88122534 A TW 88122534A TW 548405 B TW548405 B TW 548405B
Authority
TW
Taiwan
Prior art keywords
patent application
scope
inspection
substrate
illumination
Prior art date
Application number
TW088122534A
Other languages
English (en)
Chinese (zh)
Inventor
Amir Noy
Doron Eidelman
Avi Gross
David Fisch
Original Assignee
Orbotech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orbotech Ltd filed Critical Orbotech Ltd
Application granted granted Critical
Publication of TW548405B publication Critical patent/TW548405B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00Gas-filled discharge tubes with solid cathode
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513Liquid crystal panels
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306Details
    • G02F1/1309Repairing; Testing

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing, Inspecting, Measuring Of Stereoscopic Televisions And Televisions (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
TW088122534A 1998-11-02 1999-12-21 Apparatus and method for fabricating flat workpieces TW548405B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IL12686698A IL126866A (en) 1998-11-02 1998-11-02 Apparatus and method for fabricating flat workpieces
PCT/IL1999/000583 WO2000026645A2 (en) 1998-11-02 1999-11-02 Apparatus and method for fabricating flat workpieces

Publications (1)

Publication Number Publication Date
TW548405B true TW548405B (en) 2003-08-21

Family

ID=11072091

Family Applications (1)

Application Number Title Priority Date Filing Date
TW088122534A TW548405B (en) 1998-11-02 1999-12-21 Apparatus and method for fabricating flat workpieces

Country Status (7)

Country Link
US (1) US6822734B1 (enExample)
JP (1) JP2002529758A (enExample)
KR (1) KR100756099B1 (enExample)
AU (1) AU6487199A (enExample)
IL (1) IL126866A (enExample)
TW (1) TW548405B (enExample)
WO (1) WO2000026645A2 (enExample)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3948728B2 (ja) * 2003-03-17 2007-07-25 オルボテック リミテッド パターン検査装置
DE10319543B4 (de) * 2003-04-30 2011-03-03 Byk-Gardner Gmbh Vorrichtung und Verfahren zur Bestimmung von Oberflächeneigenschaften
US7355692B2 (en) 2004-03-05 2008-04-08 Orbotech Ltd System and method for inspecting electrical circuits utilizing reflective and fluorescent imagery
WO2006012551A1 (en) * 2004-07-23 2006-02-02 Nextech Solutions, Inc. Large substrate flat panel inspection system
US7999994B2 (en) 2005-02-23 2011-08-16 Pixtronix, Inc. Display apparatus and methods for manufacture thereof
US9261694B2 (en) 2005-02-23 2016-02-16 Pixtronix, Inc. Display apparatus and methods for manufacture thereof
US20070205969A1 (en) 2005-02-23 2007-09-06 Pixtronix, Incorporated Direct-view MEMS display devices and methods for generating images thereon
US8519945B2 (en) 2006-01-06 2013-08-27 Pixtronix, Inc. Circuits for controlling display apparatus
US9229222B2 (en) 2005-02-23 2016-01-05 Pixtronix, Inc. Alignment methods in fluid-filled MEMS displays
US7616368B2 (en) 2005-02-23 2009-11-10 Pixtronix, Inc. Light concentrating reflective display methods and apparatus
US8159428B2 (en) 2005-02-23 2012-04-17 Pixtronix, Inc. Display methods and apparatus
US9082353B2 (en) 2010-01-05 2015-07-14 Pixtronix, Inc. Circuits for controlling display apparatus
US9158106B2 (en) 2005-02-23 2015-10-13 Pixtronix, Inc. Display methods and apparatus
US8310442B2 (en) 2005-02-23 2012-11-13 Pixtronix, Inc. Circuits for controlling display apparatus
US8482496B2 (en) 2006-01-06 2013-07-09 Pixtronix, Inc. Circuits for controlling MEMS display apparatus on a transparent substrate
KR20060102171A (ko) * 2005-03-23 2006-09-27 삼성전자주식회사 화상 검사 장치, 상기 장치를 이용한 패널 검사 방법
JP2007088518A (ja) * 2005-09-16 2007-04-05 Nec Corp 無線通信システム
US7391510B2 (en) * 2006-01-26 2008-06-24 Orbotech Ltd System and method for inspecting patterned devices having microscopic conductors
JP2007220890A (ja) * 2006-02-16 2007-08-30 Toshiba Corp 塗布現像処理装置における基板周縁処理方法
US8526096B2 (en) 2006-02-23 2013-09-03 Pixtronix, Inc. Mechanical light modulators with stressed beams
US7567344B2 (en) * 2006-05-12 2009-07-28 Corning Incorporated Apparatus and method for characterizing defects in a transparent substrate
US9176318B2 (en) 2007-05-18 2015-11-03 Pixtronix, Inc. Methods for manufacturing fluid-filled MEMS displays
US8169679B2 (en) 2008-10-27 2012-05-01 Pixtronix, Inc. MEMS anchors
SG163442A1 (en) 2009-01-13 2010-08-30 Semiconductor Technologies & Instruments System and method for inspecting a wafer
TW201124661A (en) * 2010-01-06 2011-07-16 Masterwork Automodules Technology Corp Ltd Line illuminating device.
US9035673B2 (en) 2010-01-25 2015-05-19 Palo Alto Research Center Incorporated Method of in-process intralayer yield detection, interlayer shunt detection and correction
BR112012019383A2 (pt) 2010-02-02 2017-09-12 Pixtronix Inc Circuitos para controlar aparelho de exibição
CN102834763B (zh) 2010-02-02 2015-07-22 皮克斯特罗尼克斯公司 用于制造填充冷密封流体的显示装置的方法
SG11201407341TA (en) * 2012-05-09 2014-12-30 Seagate Technology Llc Surface features mapping
US9212900B2 (en) * 2012-08-11 2015-12-15 Seagate Technology Llc Surface features characterization
US9297751B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Chemical characterization of surface features
US9297759B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Classification of surface features using fluorescence
CN103728314B (zh) * 2012-10-16 2017-01-04 希捷科技有限公司 区分原生表面特征与外来表面特征的方法
US9377394B2 (en) * 2012-10-16 2016-06-28 Seagate Technology Llc Distinguishing foreign surface features from native surface features
US9217714B2 (en) 2012-12-06 2015-12-22 Seagate Technology Llc Reflective surfaces for surface features of an article
US9134552B2 (en) 2013-03-13 2015-09-15 Pixtronix, Inc. Display apparatus with narrow gap electrostatic actuators
US9217715B2 (en) 2013-05-30 2015-12-22 Seagate Technology Llc Apparatuses and methods for magnetic features of articles
US9201019B2 (en) 2013-05-30 2015-12-01 Seagate Technology Llc Article edge inspection
US9513215B2 (en) 2013-05-30 2016-12-06 Seagate Technology Llc Surface features by azimuthal angle
US9274064B2 (en) 2013-05-30 2016-03-01 Seagate Technology Llc Surface feature manager
CN103995000B (zh) * 2014-05-15 2017-01-11 京东方科技集团股份有限公司 一种显示基板的检查装置及检查系统
US10042324B2 (en) * 2015-06-30 2018-08-07 Synaptics Incorporated Optical fingerprint imaging using holography
EP3710813B1 (en) 2017-11-13 2023-09-20 Illumina, Inc. System and method for large sample analysis of thin film
JP6709206B2 (ja) * 2017-11-30 2020-06-10 株式会社Subaru 製造補助装置
JP7161159B2 (ja) * 2019-06-11 2022-10-26 株式会社岩佐画工舎 映像情報収集装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6172947A (ja) 1984-09-18 1986-04-15 Takasago Thermal Eng Co Ltd クリ−ンル−ムの形成法およびこの方法に使用する空気調和設備ユニツト
JPH01194753A (ja) 1988-01-29 1989-08-04 Konica Corp 画像形成装置
US5058982A (en) 1989-06-21 1991-10-22 Orbot Systems Ltd. Illumination system and inspection apparatus including same
US5058491A (en) 1990-08-27 1991-10-22 Taiwan Semiconductor Manufacturing Company, Ltd. Building and method for manufacture of integrated circuits
US5401212A (en) 1990-08-29 1995-03-28 Intelligent Enclosures Corporation Environmental control system
IL96483A (en) * 1990-11-27 1995-07-31 Orbotech Ltd Optical inspection method and apparatus
US5586058A (en) 1990-12-04 1996-12-17 Orbot Instruments Ltd. Apparatus and method for inspection of a patterned object by comparison thereof to a reference
KR100221983B1 (ko) 1993-04-13 1999-09-15 히가시 데쓰로 처리장치
US5344365A (en) 1993-09-14 1994-09-06 Sematech, Inc. Integrated building and conveying structure for manufacturing under ultraclean conditions
IL108974A (en) 1994-03-14 1999-11-30 Orbotech Ltd Device and method for testing a display panel
JP3258821B2 (ja) * 1994-06-02 2002-02-18 三菱電機株式会社 微小異物の位置決め方法、分析方法、これに用いる分析装置およびこれを用いた半導体素子もしくは液晶表示素子の製法
US5640237A (en) 1995-08-29 1997-06-17 Kla Instruments Corporation Method and apparatus for detecting non-uniformities in reflective surafaces
US5917588A (en) * 1996-11-04 1999-06-29 Kla-Tencor Corporation Automated specimen inspection system for and method of distinguishing features or anomalies under either bright field or dark field illumination
JP4166340B2 (ja) 1997-09-24 2008-10-15 オリンパス株式会社 基板検査装置
JP4591802B2 (ja) * 2000-09-13 2010-12-01 株式会社ニコン 表面検査装置および方法

Also Published As

Publication number Publication date
WO2000026645A3 (en) 2000-08-10
US6822734B1 (en) 2004-11-23
IL126866A (en) 2003-02-12
KR20010082284A (ko) 2001-08-29
KR100756099B1 (ko) 2007-09-05
IL126866A0 (en) 1999-09-22
AU6487199A (en) 2000-05-22
JP2002529758A (ja) 2002-09-10
WO2000026645A2 (en) 2000-05-11

Similar Documents

Publication Publication Date Title
TW548405B (en) Apparatus and method for fabricating flat workpieces
TW461963B (en) Data processing system for defect inspection
CN100590427C (zh) 图像检查装置以及采用该图像检查装置的图像检查方法
JP3379805B2 (ja) 表面欠陥検査装置
JP3483948B2 (ja) 欠陥検出装置
KR102751649B1 (ko) 자동화된 광학 검사를 위한 광학 시스템
TW200302345A (en) Substrate inspection device
JP5425189B2 (ja) 半導体ウエハの検査装置および検査方法
WO2006118152A1 (ja) 外観検査装置及び外観検査方法並びに外観検査装置に装着可能な周縁部検査ユニット
TW200907333A (en) Visual inspection apparatus
JP4385419B2 (ja) 外観検査方法及び外観検査装置
CN102192908A (zh) 多晶硅薄膜检查方法及其装置
TW201939577A (zh) 基板檢查裝置、基板處理裝置及基板檢查方法
JP3883153B2 (ja) X線基板検査装置
TWI692740B (zh) 基板檢查裝置、基板處理裝置及基板檢查方法
JP2000333047A (ja) 光学的撮像装置および光学的撮像方法
TW202409549A (zh) 基板檢查裝置,基板檢查方法及基板檢查程式
TWI692614B (zh) 膜厚測定裝置、基板檢查裝置、膜厚測定方法及基板檢查方法
JP4552202B2 (ja) 表面検査装置
JP2001091474A (ja) 欠陥検査システム
JP3659954B2 (ja) 基板欠陥検査装置
JP3780292B2 (ja) 表面欠陥検査装置
TW200401879A (en) Microscope arrangement for inspecting a substrate
JP5476069B2 (ja) 塗膜形成ムラ検査装置
CN115165915A (zh) 一种光栅缺陷检测装置及检测方法

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees