SG11201407341TA - Surface features mapping - Google Patents
Surface features mappingInfo
- Publication number
- SG11201407341TA SG11201407341TA SG11201407341TA SG11201407341TA SG11201407341TA SG 11201407341T A SG11201407341T A SG 11201407341TA SG 11201407341T A SG11201407341T A SG 11201407341TA SG 11201407341T A SG11201407341T A SG 11201407341TA SG 11201407341T A SG11201407341T A SG 11201407341TA
- Authority
- SG
- Singapore
- Prior art keywords
- international
- article
- california
- features
- mapping
- Prior art date
Links
- 238000013507 mapping Methods 0.000 title abstract 3
- 238000000034 method Methods 0.000 abstract 1
- 230000008520 organization Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9506—Optical discs
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
- G01N2021/8861—Determining coordinates of flaws
- G01N2021/8864—Mapping zones of defects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/061—Sources
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/12—Circuits of general importance; Signal processing
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Signal Processing (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Geophysics And Detection Of Objects (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
(12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 14 November 2013 (14.11.2013) WIPOIPCT (10) International Publication Number WO 2013/169980 A1 (51) International Patent Classification: G01J1/10 (2006.01) (21) International Application Number: (22) International Filing Date: (25) Filing Language: (26) Publication Language: PCT/US2013/040271 9 May 2013 (09.05.2013) English English (30) Priority Data: 61/644,998 9 May 2012 (09.05.2012) US (71) Applicant: SEAGATE TECHNOLOGY LLC [US/US]; 10200 S. De Anza Blvd, Cupertino, California 95014 (US). (72) Inventors: AHNER, Joachim Walter; 3090 Hansen Road, Livermore, California 94559 (US). MCLAURIN, Stephen Keith; 1343 Fieldfair Court, Sunnyvale, Califor nia 94087 (US). (74) Agents: TABARROK & ZAHRT LLP et al.; Suite 1250, 60 South Market Street, San Jose, California 95113 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available)'. AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available)'. ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) (54) Title: SURFACE FEATURES MAPPING 100 o 00 o\ o\ FIG. 1 i-H (57) Abstract: Provided herein is an apparatus, including photon a emitting means for emitting photons onto surface of a an article, O a photon detecting means for detecting photons scattered from features in the surface of the article; and a mapping means for map - CJ ping the features in the surface of the article, wherein the apparatus configured is to process more than one article every 100 seconds.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261644998P | 2012-05-09 | 2012-05-09 | |
PCT/US2013/040271 WO2013169980A1 (en) | 2012-05-09 | 2013-05-09 | Surface features mapping |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201407341TA true SG11201407341TA (en) | 2014-12-30 |
Family
ID=49548370
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201407341TA SG11201407341TA (en) | 2012-05-09 | 2013-05-09 | Surface features mapping |
Country Status (12)
Country | Link |
---|---|
US (3) | US9036142B2 (en) |
EP (1) | EP2847556A4 (en) |
JP (2) | JP6289450B2 (en) |
KR (1) | KR102093108B1 (en) |
CN (1) | CN104412079B (en) |
CA (1) | CA2872898A1 (en) |
IL (1) | IL235589A0 (en) |
MY (1) | MY182531A (en) |
PH (1) | PH12014502486A1 (en) |
SG (1) | SG11201407341TA (en) |
TW (1) | TWI592652B (en) |
WO (1) | WO2013169980A1 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9212900B2 (en) | 2012-08-11 | 2015-12-15 | Seagate Technology Llc | Surface features characterization |
US9297759B2 (en) | 2012-10-05 | 2016-03-29 | Seagate Technology Llc | Classification of surface features using fluorescence |
US9297751B2 (en) | 2012-10-05 | 2016-03-29 | Seagate Technology Llc | Chemical characterization of surface features |
JP2014077660A (en) * | 2012-10-09 | 2014-05-01 | Fuji Xerox Co Ltd | Detector |
US9377394B2 (en) | 2012-10-16 | 2016-06-28 | Seagate Technology Llc | Distinguishing foreign surface features from native surface features |
US9217714B2 (en) * | 2012-12-06 | 2015-12-22 | Seagate Technology Llc | Reflective surfaces for surface features of an article |
US9513215B2 (en) * | 2013-05-30 | 2016-12-06 | Seagate Technology Llc | Surface features by azimuthal angle |
US9201019B2 (en) | 2013-05-30 | 2015-12-01 | Seagate Technology Llc | Article edge inspection |
US9217715B2 (en) | 2013-05-30 | 2015-12-22 | Seagate Technology Llc | Apparatuses and methods for magnetic features of articles |
US9581554B2 (en) * | 2013-05-30 | 2017-02-28 | Seagate Technology Llc | Photon emitter array |
US9274064B2 (en) | 2013-05-30 | 2016-03-01 | Seagate Technology Llc | Surface feature manager |
US12216301B2 (en) * | 2022-03-29 | 2025-02-04 | Intel Corporation | Apparatuses and methods for inspecting embedded features |
Family Cites Families (129)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4207467A (en) | 1978-09-05 | 1980-06-10 | Laser Precision Corp. | Film measuring apparatus and method |
US4806776A (en) | 1980-03-10 | 1989-02-21 | Kley Victor B | Electrical illumination and detecting apparatus |
US4598997A (en) | 1982-02-15 | 1986-07-08 | Rca Corporation | Apparatus and method for detecting defects and dust on a patterned surface |
US4477890A (en) | 1982-03-01 | 1984-10-16 | Discovision Associates | Mapping disc defect detector |
GB2130835A (en) | 1982-10-04 | 1984-06-06 | Andrzej Kamil Drukier | Apparatus for the diagnosis of body structures into which a gamma-emitting radioactive isotape has been introduced |
US4551919A (en) * | 1982-10-27 | 1985-11-12 | Mitutoyo Mfg. Co., Ltd. | Measuring instrument |
JPS6211151A (en) * | 1985-07-08 | 1987-01-20 | Dainippon Screen Mfg Co Ltd | Apparatus for inspecting surface flaw |
JPS6313342A (en) * | 1986-07-04 | 1988-01-20 | Hitachi Ltd | Fine foreign matter inspection device |
US4794550A (en) * | 1986-10-15 | 1988-12-27 | Eastman Kodak Company | Extended-range moire contouring |
GB8729246D0 (en) | 1987-12-15 | 1988-01-27 | Renishaw Plc | Opto-electronic scale-reading apparatus |
US5131755A (en) * | 1988-02-19 | 1992-07-21 | Chadwick Curt H | Automatic high speed optical inspection system |
US5066130A (en) | 1988-05-10 | 1991-11-19 | Canon Kabushiki Kaisha | Displacement measuring apparatus |
US5058178A (en) | 1989-12-21 | 1991-10-15 | At&T Bell Laboratories | Method and apparatus for inspection of specular, three-dimensional features |
DE4222804A1 (en) | 1991-07-10 | 1993-04-01 | Raytheon Co | Automatic visual tester for electrical and electronic components - performs video scans of different surfaces with unequal intensities of illumination by annular and halogen lamps |
US5168322A (en) | 1991-08-19 | 1992-12-01 | Diffracto Ltd. | Surface inspection using retro-reflective light field |
US5563702A (en) | 1991-08-22 | 1996-10-08 | Kla Instruments Corporation | Automated photomask inspection apparatus and method |
JPH0682378A (en) * | 1992-09-01 | 1994-03-22 | Nikon Corp | Defect inspection device |
JPH06194320A (en) * | 1992-12-25 | 1994-07-15 | Hitachi Ltd | Method and equipment for inspecting mirror face substrate in semiconductor manufacturing line and method for manufacturing |
JPH06241758A (en) | 1993-02-15 | 1994-09-02 | Canon Inc | Flaw inspection device |
EP0622624B1 (en) | 1993-04-23 | 1999-12-01 | Research Development Corporation Of Japan | A method for observing film thickness and/or refractive index |
US5627638A (en) | 1993-07-01 | 1997-05-06 | Prolaser Ltd. | Method and apparatus for detecting defects in lenses |
IL110618A (en) | 1994-08-10 | 1996-12-05 | Optomic Techn Corp Ltd | Device for testing optical elements |
JP3483948B2 (en) | 1994-09-01 | 2004-01-06 | オリンパス株式会社 | Defect detection device |
US5548403A (en) | 1994-11-28 | 1996-08-20 | The Regents Of The University Of California | Phase shifting diffraction interferometer |
JPH08178867A (en) | 1994-12-26 | 1996-07-12 | Aichi Steel Works Ltd | Flat steel hot flaw-detecting device |
US5726455A (en) | 1995-06-30 | 1998-03-10 | Stormedia, Inc. | Disk film optical measurement system |
US5790252A (en) * | 1995-09-27 | 1998-08-04 | Shin-Etsu Handotai Co., Ltd. | Method of and apparatus for determining residual damage to wafer edges |
JPH09178867A (en) | 1995-12-26 | 1997-07-11 | Casio Comput Co Ltd | Analog clock |
JPH11125602A (en) * | 1996-07-01 | 1999-05-11 | Advantest Corp | Method and device for analyzing foreign matter |
US5778039A (en) | 1996-02-21 | 1998-07-07 | Advanced Micro Devices, Inc. | Method and apparatus for the detection of light elements on the surface of a semiconductor substrate using x-ray fluorescence (XRF) |
US5661559A (en) * | 1996-03-14 | 1997-08-26 | Phase Metrics, Inc. | Optical surface detection for magnetic disks |
US5781649A (en) | 1996-04-15 | 1998-07-14 | Phase Metrics, Inc. | Surface inspection of a disk by diffraction pattern sampling |
US6556783B1 (en) * | 1997-01-16 | 2003-04-29 | Janet L. Gelphman | Method and apparatus for three dimensional modeling of an object |
JP3692685B2 (en) | 1997-02-19 | 2005-09-07 | 株式会社ニコン | Defect inspection equipment |
US5774212A (en) | 1997-03-19 | 1998-06-30 | General Electric Co. | Method and apparatus for detecting and analyzing directionally reflective surface flaws |
US5898491A (en) | 1997-03-28 | 1999-04-27 | Hitachi Electronics Engineering Co. Ltd. | Surface defect test method and surface defect tester |
US5909276A (en) * | 1997-03-31 | 1999-06-01 | Microtherm, Llc | Optical inspection module and method for detecting particles and defects on substrates in integrated process tools |
JPH10282009A (en) * | 1997-04-04 | 1998-10-23 | Toshiba Corp | Fine grain evaluation method and apparatus |
DE19717488C2 (en) * | 1997-04-25 | 2003-05-15 | Baumer Optronic Gmbh | Device for inspecting the surface of objects |
US5859698A (en) | 1997-05-07 | 1999-01-12 | Nikon Corporation | Method and apparatus for macro defect detection using scattered light |
US6040592A (en) * | 1997-06-12 | 2000-03-21 | Intel Corporation | Well to substrate photodiode for use in a CMOS sensor on a salicide process |
US5973839A (en) | 1998-03-05 | 1999-10-26 | Hewlett-Packard Company | Optical homogenizer |
US20010036588A1 (en) * | 1998-05-05 | 2001-11-01 | Ims-Ionen Mikrofabrikations Systeme Gmbh | Lithographic imaging of a structure pattern onto one or more fields on a substrate |
IL126866A (en) | 1998-11-02 | 2003-02-12 | Orbotech Ltd | Apparatus and method for fabricating flat workpieces |
US6256097B1 (en) | 1999-01-08 | 2001-07-03 | Rudolph Technologies, Inc. | Ellipsometer and ellipsometry method |
DE19909534B4 (en) | 1999-03-04 | 2011-07-07 | BYK-Gardner GmbH, 82538 | Apparatus and method for determining the quality of structured surfaces |
US6529270B1 (en) | 1999-03-31 | 2003-03-04 | Ade Optical Systems Corporation | Apparatus and method for detecting defects in the surface of a workpiece |
EP1116932A3 (en) * | 2000-01-14 | 2003-04-16 | Leica Microsystems Wetzlar GmbH | Measuring apparatus and method for measuring structures on a substrat |
US6476908B1 (en) * | 2000-04-10 | 2002-11-05 | Eclipse Optics, Inc. | Optical probe |
US6483584B1 (en) | 2000-04-14 | 2002-11-19 | National Science Council | Device for measuring the complex refractive index and thin film thickness of a sample |
US7751609B1 (en) * | 2000-04-20 | 2010-07-06 | Lsi Logic Corporation | Determination of film thickness during chemical mechanical polishing |
US6392745B1 (en) | 2000-06-13 | 2002-05-21 | American Air Liquide, Inc. | Method and apparatus for the fast detection of surface characteristics |
DE10031558A1 (en) | 2000-06-28 | 2002-01-10 | Clariant Gmbh | Process for conditioning organic pigments |
FR2811761B1 (en) | 2000-07-17 | 2002-10-11 | Production Rech S Appliquees | HIGH SPACE RESOLUTION ELLIPSOMETER OPERATING IN THE INFRARED |
US6731383B2 (en) * | 2000-09-12 | 2004-05-04 | August Technology Corp. | Confocal 3D inspection system and process |
JP2002190444A (en) * | 2000-10-10 | 2002-07-05 | Canon Inc | Pattern projection aligner, pattern preparation method, and device prepared by the pattern projection aligner and the preparation method |
US6630996B2 (en) | 2000-11-15 | 2003-10-07 | Real Time Metrology, Inc. | Optical method and apparatus for inspecting large area planar objects |
US6809809B2 (en) | 2000-11-15 | 2004-10-26 | Real Time Metrology, Inc. | Optical method and apparatus for inspecting large area planar objects |
US6515742B1 (en) | 2000-11-28 | 2003-02-04 | Memc Electronic Materials, Inc. | Defect classification using scattered light intensities |
US6509966B2 (en) | 2000-12-27 | 2003-01-21 | Hitachi Electronics Engineering Co., Ltd. | Optical system for detecting surface defect and surface defect tester using the same |
US6617603B2 (en) | 2001-03-06 | 2003-09-09 | Hitachi Electronics Engineering Co., Ltd. | Surface defect tester |
US6778273B2 (en) | 2001-03-30 | 2004-08-17 | Therma-Wave, Inc. | Polarimetric scatterometer for critical dimension measurements of periodic structures |
CN100403011C (en) * | 2001-04-06 | 2008-07-16 | 阿克佐诺贝尔国际涂料股份有限公司 | Method and device for surface evaluation |
JP2002340811A (en) * | 2001-05-21 | 2002-11-27 | Silicon Technology Co Ltd | Surface evaluation device |
US6617087B1 (en) * | 2001-06-27 | 2003-09-09 | Advanced Micro Devices, Inc. | Use of scatterometry to measure pattern accuracy |
JP2003202214A (en) | 2002-01-04 | 2003-07-18 | Mitsubishi Electric Corp | Shape measuring device and shape measuring method |
JP4102081B2 (en) * | 2002-02-28 | 2008-06-18 | 株式会社荏原製作所 | Polishing apparatus and foreign matter detection method for polished surface |
KR100798320B1 (en) * | 2002-03-06 | 2008-01-28 | 엘지.필립스 엘시디 주식회사 | Inspection device and method of liquid crystal panel |
US20040207836A1 (en) * | 2002-09-27 | 2004-10-21 | Rajeshwar Chhibber | High dynamic range optical inspection system and method |
US6847907B1 (en) | 2002-12-31 | 2005-01-25 | Active Optical Networks, Inc. | Defect detection and repair of micro-electro-mechanical systems (MEMS) devices |
DE10313038B4 (en) * | 2003-03-24 | 2005-02-17 | Klingelnberg Gmbh | Device for detecting the position of a probe element in a multi-coordinate measuring device |
DE10330005B4 (en) * | 2003-07-03 | 2006-12-21 | Leica Microsystems Semiconductor Gmbh | Device for inspecting a wafer |
US20050067740A1 (en) | 2003-09-29 | 2005-03-31 | Frederick Haubensak | Wafer defect reduction by short pulse laser ablation |
FR2860869B1 (en) * | 2003-10-10 | 2007-04-20 | Optis | PORTABLE DEVICE FOR MEASURING THE LIGHT INTENSITY OF AN OBJECT AND USE OF SUCH A DEVICE |
US7433031B2 (en) * | 2003-10-29 | 2008-10-07 | Core Tech Optical, Inc. | Defect review system with 2D scanning and a ring detector |
DE10359722A1 (en) * | 2003-12-19 | 2005-07-14 | Leica Microsystems Semiconductor Gmbh | Method for inspecting a wafer |
WO2005100961A2 (en) * | 2004-04-19 | 2005-10-27 | Phoseon Technology, Inc. | Imaging semiconductor strucutures using solid state illumination |
DE102004029014B4 (en) * | 2004-06-16 | 2006-06-22 | Leica Microsystems Semiconductor Gmbh | Method and system for inspecting a wafer |
US7580126B2 (en) | 2004-06-30 | 2009-08-25 | Chemimage Corp. | Method and apparatus for producing a streaming Raman image of nucleation, aggregation, and chemical interaction |
US7489399B1 (en) | 2004-08-20 | 2009-02-10 | Kla-Tencor Corporation | Spectroscopic multi angle ellipsometry |
US20060192949A1 (en) | 2004-12-19 | 2006-08-31 | Bills Richard E | System and method for inspecting a workpiece surface by analyzing scattered light in a back quartersphere region above the workpiece |
US20060147814A1 (en) | 2005-01-03 | 2006-07-06 | Ted Liang | Methods for repairing an alternating phase-shift mask |
JP2006308511A (en) | 2005-05-02 | 2006-11-09 | Canon Inc | Chemical analysis apparatus and analysis method |
US8243272B2 (en) | 2005-09-19 | 2012-08-14 | Jmar Llc | Systems and methods for detecting normal levels of bacteria in water using a multiple angle light scattering (MALS) instrument |
US7463369B2 (en) | 2006-03-29 | 2008-12-09 | Kla-Tencor Technologies Corp. | Systems and methods for measuring one or more characteristics of patterned features on a specimen |
WO2007121208A2 (en) * | 2006-04-11 | 2007-10-25 | Massachusetts Institute Of Technology | Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography |
US20090122304A1 (en) | 2006-05-02 | 2009-05-14 | Accretech Usa, Inc. | Apparatus and Method for Wafer Edge Exclusion Measurement |
JP4959225B2 (en) * | 2006-05-17 | 2012-06-20 | 株式会社日立ハイテクノロジーズ | Optical inspection method and optical inspection apparatus |
JP5138268B2 (en) * | 2006-06-14 | 2013-02-06 | 株式会社タニタ | Dimensional measuring device |
WO2008002659A2 (en) | 2006-06-29 | 2008-01-03 | Cdex, Inc. | Methods and apparatus for molecular species detection, inspection and classification using ultraviolet to near infrared enhanced photoemission spectroscopy |
WO2008013909A2 (en) | 2006-07-27 | 2008-01-31 | Rudolph Technologies, Inc. | Multiple measurement techniques including focused beam scatterometry for characterization of samples |
JP4843399B2 (en) | 2006-07-31 | 2011-12-21 | 株式会社日立ハイテクノロジーズ | Inspection apparatus and inspection method |
KR100763942B1 (en) | 2006-09-04 | 2007-10-05 | (주)포씨스 | Surface inspection device |
US7508508B2 (en) * | 2006-09-19 | 2009-03-24 | Seethrough Ltd. | Device and method for inspecting a hair sample |
US7714996B2 (en) | 2007-01-23 | 2010-05-11 | 3i Systems Corporation | Automatic inspection system for flat panel substrate |
WO2008139735A1 (en) | 2007-05-14 | 2008-11-20 | Nikon Corporation | Surface tester and surface testing method |
US7636156B2 (en) | 2007-06-15 | 2009-12-22 | Qimonda Ag | Wafer inspection system and method |
JP2009014510A (en) * | 2007-07-04 | 2009-01-22 | Hitachi High-Technologies Corp | Inspection method and inspection apparatus |
CN201069386Y (en) * | 2007-09-06 | 2008-06-04 | 复旦大学 | LED optical pass testing device |
JP2009139248A (en) | 2007-12-07 | 2009-06-25 | Hitachi High-Technologies Corp | Surface defect inspection system equipped with defect detection optical system and defect detection image processing |
IL188825A0 (en) * | 2008-01-16 | 2008-11-03 | Orbotech Ltd | Inspection of a substrate using multiple cameras |
KR100913484B1 (en) | 2008-02-19 | 2009-08-25 | 에스엔유 프리시젼 주식회사 | Dark Field Inspection Device |
JP5198189B2 (en) | 2008-08-29 | 2013-05-15 | 富士フイルム株式会社 | Hard disk inspection device |
WO2010030698A1 (en) * | 2008-09-09 | 2010-03-18 | Cornell University | Optical grid for high precision and high resolution method of wafer scale nanofabrication |
JP5341440B2 (en) | 2008-09-10 | 2013-11-13 | 株式会社日立ハイテクノロジーズ | Inspection device |
JP5469839B2 (en) * | 2008-09-30 | 2014-04-16 | 株式会社日立ハイテクノロジーズ | Device surface defect inspection apparatus and method |
JP5027775B2 (en) | 2008-10-03 | 2012-09-19 | 株式会社日立ハイテクノロジーズ | Substrate surface shape detection method and apparatus |
JP4719284B2 (en) | 2008-10-10 | 2011-07-06 | トヨタ自動車株式会社 | Surface inspection device |
SE533454C2 (en) * | 2008-12-18 | 2010-10-05 | Portendo Ab | Detection of small amounts of substances |
EP2738609A3 (en) * | 2009-07-01 | 2018-01-17 | Nikon Corporation | Exposure condition determining method and surface inspection apparatus |
KR101123638B1 (en) | 2009-08-26 | 2012-03-20 | 주식회사 케이엔제이 | Apparatus for detecting scratch and method adopting the same |
JP5282002B2 (en) | 2009-09-30 | 2013-09-04 | 株式会社日立ハイテクノロジーズ | Magnetic disk double-sided defect inspection method and apparatus |
JP5321490B2 (en) | 2010-02-08 | 2013-10-23 | 新日鐵住金株式会社 | Particle analysis method |
JP2012026862A (en) | 2010-07-23 | 2012-02-09 | Konica Minolta Business Technologies Inc | Surface inspection device and surface inspection method |
JP2012078140A (en) * | 2010-09-30 | 2012-04-19 | Hitachi High-Technologies Corp | Substrate surface defect inspection method and device thereof |
JP5721070B2 (en) | 2011-03-08 | 2015-05-20 | 国立研究開発法人産業技術総合研究所 | Optical property measuring device |
US9075934B2 (en) | 2011-09-24 | 2015-07-07 | Globalfoundries Inc. | Reticle defect correction by second exposure |
JP5875812B2 (en) | 2011-09-27 | 2016-03-02 | オリンパス株式会社 | Microscope system and illumination intensity adjustment method |
US9212900B2 (en) | 2012-08-11 | 2015-12-15 | Seagate Technology Llc | Surface features characterization |
US9297759B2 (en) | 2012-10-05 | 2016-03-29 | Seagate Technology Llc | Classification of surface features using fluorescence |
US9297751B2 (en) | 2012-10-05 | 2016-03-29 | Seagate Technology Llc | Chemical characterization of surface features |
US9377394B2 (en) | 2012-10-16 | 2016-06-28 | Seagate Technology Llc | Distinguishing foreign surface features from native surface features |
US20140129179A1 (en) | 2012-11-08 | 2014-05-08 | Datacolor, Inc. | System and apparatus for multi channel gloss measurements |
US9217714B2 (en) | 2012-12-06 | 2015-12-22 | Seagate Technology Llc | Reflective surfaces for surface features of an article |
US9201019B2 (en) | 2013-05-30 | 2015-12-01 | Seagate Technology Llc | Article edge inspection |
US9274064B2 (en) | 2013-05-30 | 2016-03-01 | Seagate Technology Llc | Surface feature manager |
US9513215B2 (en) | 2013-05-30 | 2016-12-06 | Seagate Technology Llc | Surface features by azimuthal angle |
US9581554B2 (en) | 2013-05-30 | 2017-02-28 | Seagate Technology Llc | Photon emitter array |
US9217715B2 (en) | 2013-05-30 | 2015-12-22 | Seagate Technology Llc | Apparatuses and methods for magnetic features of articles |
-
2013
- 2013-05-09 TW TW102116546A patent/TWI592652B/en not_active IP Right Cessation
- 2013-05-09 WO PCT/US2013/040271 patent/WO2013169980A1/en active Application Filing
- 2013-05-09 MY MYPI2014703311A patent/MY182531A/en unknown
- 2013-05-09 SG SG11201407341TA patent/SG11201407341TA/en unknown
- 2013-05-09 EP EP13787014.3A patent/EP2847556A4/en not_active Ceased
- 2013-05-09 KR KR1020147034291A patent/KR102093108B1/en not_active Expired - Fee Related
- 2013-05-09 CA CA2872898A patent/CA2872898A1/en not_active Abandoned
- 2013-05-09 US US13/890,470 patent/US9036142B2/en active Active
- 2013-05-09 JP JP2015511681A patent/JP6289450B2/en not_active Expired - Fee Related
- 2013-05-09 CN CN201380035014.0A patent/CN104412079B/en not_active Expired - Fee Related
-
2014
- 2014-11-07 PH PH12014502486A patent/PH12014502486A1/en unknown
- 2014-11-09 IL IL235589A patent/IL235589A0/en unknown
-
2015
- 2015-04-14 US US14/685,899 patent/US9488593B2/en not_active Expired - Fee Related
-
2016
- 2016-08-23 US US15/245,049 patent/US20160363540A1/en not_active Abandoned
-
2018
- 2018-02-06 JP JP2018019281A patent/JP6486515B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP6486515B2 (en) | 2019-03-20 |
US20130301040A1 (en) | 2013-11-14 |
TWI592652B (en) | 2017-07-21 |
JP2015516090A (en) | 2015-06-04 |
MY182531A (en) | 2021-01-25 |
US20160363540A1 (en) | 2016-12-15 |
PH12014502486B1 (en) | 2015-01-12 |
US9036142B2 (en) | 2015-05-19 |
KR20150008453A (en) | 2015-01-22 |
JP6289450B2 (en) | 2018-03-07 |
CN104412079B (en) | 2018-03-27 |
CA2872898A1 (en) | 2013-11-14 |
CN104412079A (en) | 2015-03-11 |
EP2847556A1 (en) | 2015-03-18 |
PH12014502486A1 (en) | 2015-01-12 |
IL235589A0 (en) | 2015-01-29 |
US20150219569A1 (en) | 2015-08-06 |
EP2847556A4 (en) | 2016-01-27 |
TW201411119A (en) | 2014-03-16 |
KR102093108B1 (en) | 2020-03-25 |
US9488593B2 (en) | 2016-11-08 |
JP2018105877A (en) | 2018-07-05 |
WO2013169980A1 (en) | 2013-11-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SG11201407341TA (en) | Surface features mapping | |
SG11201407662WA (en) | Process for the preparation of treprostinil and derivatives thereof | |
SG11201909955XA (en) | Formulations of anti-lag3 antibodies and co-formulations of anti-lag3 antibodies and anti-pd-1 antibodies | |
SG11201407381VA (en) | System and methods for coping with doppler effects in distributed-input distributed-output wireless systems | |
SG11201408769QA (en) | Methods of reducing the risk of a cardiovascular event in a subject on statin therapy | |
SG11201903331QA (en) | Restimulation of cryopreserved tumor infiltrating lymphocytes | |
SG11201806624XA (en) | Deposition of molybdenum thin films using a molybdenum carbonyl precursor | |
SG11201408561YA (en) | Tunable materials | |
SG11201407424TA (en) | Methods for determining information about a communication parameter and communication devices | |
SG11201407898WA (en) | Electrode testing apparatus | |
SG11201408161RA (en) | Antibodies comprising site-specific non-natural amino acid residues, methods of their preparation and methods of their use | |
SG11201407851RA (en) | Synthesis of pyrrolo [2, 3 - b] pyridines | |
SG11201406745VA (en) | Methods of therapeutic monitoring of phenylacetic acid prodrugs | |
SG11201406787TA (en) | Rnai-based therapies for cardiomyopathies, muscular dystrophies and laminopathies | |
SG11201407294UA (en) | Contamination identification system | |
SG11201408251SA (en) | A pharmaceutical composition containing nicotinic acid and/or nicotinamide and/or tryptophan for positively influencing the intestinal microbiota | |
SG11201407427WA (en) | Extreme pcr | |
SG11201407200TA (en) | Liquid formulation | |
SG11201408303WA (en) | Adhesive compositions of propylene-based and ethylene-based polymers | |
SG11201908075UA (en) | A microneedle device | |
SG11201807720TA (en) | Methods and systems for determining antibiotic susceptibility | |
SG11201408185UA (en) | Improved frame for climbing screen | |
SG11201408163VA (en) | Modified fibronectin fragments or variants and uses thereof | |
SG11201811778PA (en) | Substrate supporting apparatus | |
SG11201408127YA (en) | Flow control system |