TW518654B - Shutter mechanism of light irradiation device - Google Patents

Shutter mechanism of light irradiation device Download PDF

Info

Publication number
TW518654B
TW518654B TW088103880A TW88103880A TW518654B TW 518654 B TW518654 B TW 518654B TW 088103880 A TW088103880 A TW 088103880A TW 88103880 A TW88103880 A TW 88103880A TW 518654 B TW518654 B TW 518654B
Authority
TW
Taiwan
Prior art keywords
light
shutter plate
shutter
center
plate
Prior art date
Application number
TW088103880A
Other languages
English (en)
Chinese (zh)
Inventor
Takanao Ueno
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Application granted granted Critical
Publication of TW518654B publication Critical patent/TW518654B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shutters For Cameras (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
TW088103880A 1998-05-27 1999-03-12 Shutter mechanism of light irradiation device TW518654B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16154398A JP3575281B2 (ja) 1998-05-27 1998-05-27 光照射装置のシャッター機構

Publications (1)

Publication Number Publication Date
TW518654B true TW518654B (en) 2003-01-21

Family

ID=15737111

Family Applications (1)

Application Number Title Priority Date Filing Date
TW088103880A TW518654B (en) 1998-05-27 1999-03-12 Shutter mechanism of light irradiation device

Country Status (3)

Country Link
JP (1) JP3575281B2 (ko)
KR (1) KR100509301B1 (ko)
TW (1) TW518654B (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3832230B2 (ja) * 2000-11-14 2006-10-11 ウシオ電機株式会社 光照射装置
KR20020065201A (ko) * 2001-02-06 2002-08-13 앰코 테크놀로지 코리아 주식회사 반도체 패키지 제조용 레이져 빔 장치의 핀홀 구조
JP2003177548A (ja) * 2001-12-10 2003-06-27 Hitachi Electronics Eng Co Ltd 反射遮光型のシャッタを備えた光照射装置
JP4346320B2 (ja) * 2003-02-05 2009-10-21 大日本印刷株式会社 露光方法及び露光装置
TWI412318B (zh) * 2011-03-10 2013-10-11 Qisda Corp 可切換風道的冷卻裝置及投影機裝置
CN105807572B (zh) * 2014-12-31 2018-03-30 上海微电子装备（集团）股份有限公司 一种用于光刻机曝光分系统的自阻尼快门装置
CN109212910A (zh) * 2017-07-05 2019-01-15 上海微电子装备（集团）股份有限公司 一种光刻机用快门叶片装置
JP7299748B2 (ja) * 2019-05-10 2023-06-28 キヤノン株式会社 シャッター装置、露光装置、膜形成装置および物品製造方法
KR20230138132A (ko) 2022-03-23 2023-10-05 (주)이오시스템 영상 탐색기용 셔터 모듈 및 이를 구비하는 영상 탐색기

Also Published As

Publication number Publication date
KR19990088602A (ko) 1999-12-27
JP3575281B2 (ja) 2004-10-13
JPH11338005A (ja) 1999-12-10
KR100509301B1 (ko) 2005-08-18

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