經濟部智慧財產局員工消費合作社印製 518654 Α7 ___________ Β7 五、發明說明（1 ) 本發明係有關使用於半導體裝置或印刷電路板，液晶 基板等之製造，開閉隱藏於曝光裝置從照光裝置之放電燈 所放射光芒之快門機構。 〔先行技術〕 使用於製造半導體裝置或印刷電路板，液晶基板等之 曝光裝置，係將所隱藏之照光裝置之放電燈之光線照射於 被處理物（工件）加以曝光，但是，由於放電燈不能在短 周期反復點燈與熄燈，所以，經常點亮放電燈，由於由快 門機構來開閉從放電燈所放射之光芒使其曝光既定之光量 〇 茲於第1圖表示照光裝置之一例。包含從放電燈1所 照射紫外線之光線，係由聚光鏡2所聚光，經由凹透鏡3 射入於第1平面鏡4。於第1平面鏡4所反射之光線，將 聚光於使在照射領域之照度分布均勻化所設之集成透鏡（ integrated lens ) 5之射入部附近。從集成透鏡5所射出之 光線，係當配置於集成透鏡5後方之快門機構6開啓時， 就經由第2平面鏡7由準直透鏡（collimator lens ) 8變成 平行光而開始對於載置於光線照射面之工件照射，當閉合 快門機構6時就結束照射。按，快門機構6也可以配置在 集成透鏡5之前方。 於此照光裝置，爲了使工件表面之曝光量均勻，於從 打開快門（開始照射）直到閉合快門（結束照射）之時間 ，爲了使光線照射面之照射領域之累積光量變成相等必須 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐） ---„----------- I--------^---------. (請先閱讀背面之注意事項再填寫本頁) 518654 A7 _ B7 五、發明說明（2 ) (請先閱讀背面之注意事項再填寫本頁) 開閉快門機構。因此，從先前就使用如第2圖所示之迴轉 式快門機構。亦即，圓盤狀之鋁製快門板材料之兩側約略 以9 0°C角度缺口成扇型，此缺口部就是光線通過部6 3 。並且’屬於非缺口部之其餘快門板6 1就是遮光部6 4 。亦即’快門板6 1，係2個光線通過部6 3與2個遮光 部6 4爲交替地形成之點對稱形，屬於點對稱形中心點之 快門板6 1之中心對準重心。並且，快門板6 1，係將配 置於其中心之迴轉軸6 2作爲中心成平衡負荷狀態順滑地 向一定方向迴轉。 閉合快門時，雖然光芒由一方之遮光部6 4所遮光， 但是當快門板6 1開始迴轉時，光芒就抵達遮光部6 4與 光線通過部6 3之邊界，而會開始照射，但是，若快門板 6 1迴轉9 0 °時，就如第2圖（A )所示，變成完全開 啓快門之狀態，所有光芒將通過光線通過部6 3。並且， 從此狀態，快門板6 1再迴轉9 0 °時，就如第2圖（B )所示，變成閉合快門，由遮光部6 4再加以遮光。亦即 ，由於快門板6 1迴轉1 8 0 ° ，結束快門閉合—快門開 啓—快門閉合之1周期，而在其時段曝光工作。 經濟部智慧財產局員工消費合作社印製 這種快門機構，係由於在1周期之2個遮光部6 4之 迴轉方向爲一定，所以，於從開始照射到結束照射之時間 ，具有可將被照射面之累積光量保持一定之益處。 〔發明所欲解決之問題〕 然而，最近由於提高生產量之需求’例如’於半導體 〇 · 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 518654 A7 B7 五、發明說明p ) (請先閱讀背面之注意事項再填寫本頁) 裝置，因塗敷於工作之抗蝕劑之高感度化，或提高放電燈 之放射照度來縮短工作之曝光時間。並且，若欲縮短曝光 時間，就需要快門機構以高速開閉。亦即，不僅以高速迴 轉快門板並且必須快速地以良好精度停止於既定位置。所 以，必須將快門板薄壁化，輕量化來減少迴轉力矩。 若提高快電燈之放射照度時，當快門機構閉合時，對 屬於遮光部之快門板照射放射強度高之光線，此光能若被 快門板吸收時，就變換爲熱能致使快門板變成高溫，但是 ，若快門板變成薄壁化，輕量化，使用長時間時，快門板 會發生熱變形。 又，第2圖所示之先前快門板，係將快門板之兩側缺 口成扇型來形成光線通過部，因此，迴轉軸附近之快門板 之面積爲小，強度爲弱，所以，快門閉合時，若遮光部之 溫度變高則迴轉軸附近之快門板之溫度差變大，快門板會 發生扭曲變形。並且，若快門板變形時，即使閉合快門機 構，光線仍然會洩漏於照射面側而不能發揮作爲快門之功 能，變形厲害時，有時快門板會破損。 經濟部智慧財產局員工消費合作社印製 快門板之熱變形，係例如在快門板安裝補強材就可防 止。又，也可考慮安裝熱散片增強散熱能力來抑制溫度上 升之方法。但是，若對於快門板安裝補強材或散熱片時， 重量會變重致使迴轉力矩變大，快門板之高速迴轉及高精 度之快速停止將變成困難，所以，變成需要更大型之迴轉 驅動裝置及煞車裝置。亦即，將與快門板之薄壁化，輕量 化之要求背道而馳。 本纸張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 經濟部智慧財產局員工消費合作社印製 518654 A7 B7 五、發明說明c ) 像這樣地，雖然先前之快門板，係鋁製造而成爲薄壁 ，輕量，但是，對於可耐於最近來自提高放射照度所引起 之放電燈所產生放射熱之熱變形毫無採取任何措施。 於是，本發明之目的係提供一種，快門板爲薄壁，輕 量可高速開閉，即使長時間使用於放電燈之強烈照射強度 之光芒也不會發生熱變形之照光裝置之快門機構。 〔解決問題之手段〕 爲了達成這種目的，申請專利範圍第1項之發明，係 對於圓盤狀之快門板材料形成扇型之缺口部作爲光線通過 部，將屬於非缺口部之快門板作爲遮光部，將配置於快門 板中心之迴轉軸作爲中心成平衡負荷狀態迴轉進行照光裝 置之放電燈光芒之開閉之快門機構，.其特徵爲；對於遮光 部之光線射入面進行鏡面加工，並且，在光線射入面背面 形成紅外線放射膜。並且，如申請專利範圍第4項之發明 ，將快門板之迴轉軸對於光芒之光軸稍加傾斜，使在遮光 部所反射之光線不再射入於放電燈附近較佳。 接著，申請專利範圍第2項之發明，係一種快門機構 ，其係對於圓盤狀之快門板材料形成扇型缺口部作爲光線 通過部，將屬於非缺口部之快門板作爲遮光部’進行照光 裝置之放電燈光芒之開閉者，其特徵爲；將光線通過部在 一對遮光部之間只形成1個，對於快門板中心’將光線通 過部與相反側之快門板，形成爲快門板重心爲快門板中心 成爲對對準之形狀’將快門板配置於快門板中心之迴轉軸 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） --------------------訂--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 518654 A7 B7 五、發明說明f ) 作爲中心使其成平衡負荷狀態擺動。 並且，如申請專利範圍第3項之發明，係對於申請專 利範圍第2項發明之快門板之遮光部之光線射入面進行鏡 面加工，並且，在光線射入面背面形成紅外線放射膜較佳 ，此情形，也如申請專利範圍第4項之發明，將快門板之 迴轉軸對於光芒之光軸稍爲傾斜使在遮光部所反射之光線 不再射入於放電燈附近較佳。 〔發明之實施形態〕 茲依據圖面將本發明之實施形態具體地說明如下。使 用於申請專利範圍第1項發明之實施例之快門板形狀，係 與如第2圖所示者相同。亦即，將厚度2mm，外徑 7 1 0 m m 0之圓盤狀鋁板作爲快門板6 1之材料，此鋁 板兩側爲以90°角度缺口成扇型，此2個成對稱形之缺 口部爲光線通過部6 3。並且，屬於非缺口部之剩餘鋁板 爲成相同扇形之遮光部64，2個遮光部6 4也成對稱形 。所以，快門板6 1中心部之面積爲變成非常小。並且， 在與快門板6 1重心對準之中心配置迴轉軸6 2，由沒有 圖示之驅動裝置及煞車裝置，快門板6 1將以迴轉軸6 2 作爲中心向一定方向以平衡負荷狀態順滑地迴轉，而停止 於既定位置。 並且，對於遮光部6 4之光線射入面施加鏡面加工， 例如施加電解硏磨等之高亮度硏磨，於第3圖，形成方便 上以虛線所示之鏡面6 5。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱) ^ --：------------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 518654 A7 _ B7 五、發明說明I?) 另者，在遮光部6 4之光線射入面背面，形成有此也 方便上以虛線所示之紅外線放射膜6 6。紅外線放射膜6 6係將蓄儲於快門板6 1之熱能從不照射光線之面有效率 地散熱來抑制快門板6 1之溫度上升，作爲其代表例可例 舉黑色之無電解鍍鎳，但是，也可以爲具有耐熱性之黑色 塗料等。 像這樣地，因在遮光部6 4之光線射入面形成有鏡面 6 5，所以，射入之大部分光線會反射，蓄儲於快門板 6 1之熱能將變成非常少。並且，因在遮光部6 4之光線 射入面背面形成有紅外線放射膜6 6，所以，蓄儲於快門 板6 1之熱能，將從不照射光線之面有效率地散熱，而可 抑制溫度之上升。 因此，即使配置有迴轉軸6 2之快門板6 1中心部之 面積小而強度上爲弱，也可在此部分防止熱變形。並且， 並沒有安裝有冷卻散熱片或防止變形用之補強材，所以， 快門板6 1之迴轉力矩不至於增大，可進行快門板6 1之 高速迴轉及高精度之快速停止，而可對應曝光時間之縮短 〇 於此，對於遮光部6 4之光線射入面直角地射入光芒 時，在遮光部6 4之鏡面6 5所反射之光線，係直接返回 到光芒之光軸上，而由聚光鏡反射，聚光於放電燈之電極 或燈泡（bulb ) ，口罩（mouth piece )，所以，放電燈之 溫度上升，有時對於光學特性會發生不良影響。所以’將 快門板6 1之迴轉軸6 2對於光芒之光軸，例如傾斜5 ° 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ^--------訂---------· (請先閱讀背面之注意事項再填寫本頁) 518654 經濟部智慧財產局員工消費合作社印製 A7 B7__ 五、發明說明（7 ) 程度，如第3圖所示，由遮光部6 4之鏡面6 5所反射之 光線不會返回到光芒之光軸上較佳。 接著，說明申請專利範圍第2項之發明如下。快門板 6 1之材料，係厚度爲2mm，外徑爲7 1 Omm0之圓 盤狀鋁板，如第4 .圖所示，此鋁板之單側爲以9 0 °角度 缺口爲扇型以形成光.線通過部6 3。非缺口部爲遮光部 64a，64b。亦即，在一對遮光部64a ’ 64b之 間只形成1個光線通過部6 3。並且，在第4圖所示之快 門板6 1之上下中心線L之中點（快門板6 1中心）配置 有迴轉軸6 2。 閉合快門時，如第5圖（A)所示，光芒係由一方之 遮光部6 4 a所遮蔽。並且，當快門板6 1向箭頭方向轉 動時，光芒就從其上側開始照射，當快門板6 1轉動 9 0 °時，就如第5圖（B )所示，變成快門完全開啓之 狀態，所以光芒將通過光線通過部6 3。並且，從此狀態 而快門板6 1再轉動9 0 °時，就如第5圖（C )所示， 將變成閉合快門，由他方之遮光部6 4 b再加以遮光。亦 即，由於快門板6 1轉動1 8 0 ° ，結束快門閉—快門開 —快門閉之1周期，在其時段工件就受到曝光。並且，於 下一周期，快門板6 1就向相反方向轉動。亦即，快門板 6 1係將迴轉軸6 2作爲中心進行擺動運動。 即使於這種快門機構，由於1周期之2個遮光部 64a，64b之轉動方向爲广定，所以，從開始照射到 結束照射之時間，可將於被照射面之累積光量保持爲一定 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公g ) -I u - --：------I----------訂--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 518654 A7 B7 五、發明說明p ) 〇 在此’爲了快門板6 1以平衡負荷狀態順滑地進行擺 動運動，必須將配置迴轉軸6 2之快門板6 1中心與快門 板6 1之重心對準。所以，將快門板6 1之光線通過部 6 3與相反側之形狀，使快門板6 1上下之中心線L左右 面積變成相等，並且，使上下變成對稱形。第4圖係其一 例，雖然可成爲各種形，但是總之，因缺口成扇型之光線 通過部6 3只有1個，所以可使迴轉軸6 2附近之快門板 6 1面積較第2圖所示先前例者變成非常大。 因此，即使快門板6 1之溫度上升，由於迴轉軸6 2 附近之快門板6 1面積大而強度強，所以，可防止此部分 之熱變形。又，快門板6 1之重量係與第2圖所示先前例 完全相同，由於不至於增大迴轉力矩，可進行快門板6 1 之高速迴轉及高精度之快速停止，所以，可對應於曝光時 間之縮短。 接著，即使於這種快門板61，如上述，在遮光部 6 4 a，6 4 b之光線射入面施加鏡面加工以形成鏡面， 另者，在遮光部6 4 a，6 4 b之光線射入面背面形成紅 外線放射膜較佳。藉此，就可有效率地抑制快門板6 1之 溫度上升，與迴轉軸6 2附近之快門板6 1之面積大而強 度強之相乘效果，可獲得防止熱變形上之大效果。 . 又，此情形，也使快門板6 1 .之迴轉軸6 2對於光芒 光軸成傾斜，使在遮光部64a，64b之鏡面所反射之 光線不會返回到光芒之光軸上較佳。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） --^----------衣--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 518654 A7 ___ B7 五、發明說明P ) 〔發明效果〕 (請先閱讀背面之注意事項再填寫本頁) 如以上所說明’依據本發明，即使長時間使用於放電 燈之強烈照射強度之光芒開閉，快門板也不至於發生熱變 形，並且，快門板之迴轉力矩不會增加而構成可高速開閉 之照光芒裝置的快門機構。 圖式之簡單說明 第1圖係照光裝置之說明圖。 第2圖係快門板之先前例之說明圖。 第3圖係申請專利範圍第1項發明之實施例之說明圖 第4圖係申請專利範圍第2項發明之實施例之平面圖 〇 第5圖係申請專利範圍第2項發明之實施例之動作說 明圖。 〔符號之說明〕 經濟部智慧財產局員工消費合作社印製 1 快門板 2 迴轉軸 3 光線通過部 4 遮光部 5 鏡面 6 紅外線放射膜。 本纸張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Cooperatives 518654 Α7 ___________ B7 V. Description of the Invention (1) The present invention relates to the manufacture of semiconductor devices or printed circuit boards, liquid crystal substrates, etc. The opening and closing are hidden in the exposure device to discharge from the light device A shutter mechanism that emits light. [Advanced technology] Exposure devices used in the manufacture of semiconductor devices, printed circuit boards, liquid crystal substrates, etc., expose the light from the discharge lamp of the hidden illumination device to the object (workpiece) for exposure, but the discharge lamp cannot The light is repeatedly turned on and off in a short period. Therefore, the discharge lamp is always turned on, and a shutter mechanism opens and closes the light emitted from the discharge lamp to expose a predetermined amount of light. An example of a lighting device is shown in FIG. 1. The light including ultraviolet rays radiated from the discharge lamp 1 is condensed by a condenser lens 2 and enters a first plane mirror 4 through a concave lens 3. The light reflected by the first plane mirror 4 is condensed near the entrance portion of the integrated lens 5 provided to make the illumination distribution uniform in the irradiation field. When the shutter mechanism 6 disposed behind the integrated lens 5 is turned on, the light emitted from the integrated lens 5 is changed from collimator lens 8 to parallel light by the second plane mirror 7 and starts to irradiate the light placed on it. The surface of the workpiece is irradiated, and when the shutter mechanism 6 is closed, the irradiation is ended. Alternatively, the shutter mechanism 6 may be disposed in front of the integrated lens 5. Here, in order to make the exposure amount of the workpiece surface uniform, the time from the opening of the shutter (beginning the irradiation) to the closing of the shutter (the end of the irradiation), in order to make the accumulated light amount in the irradiation area of the light irradiation surface equal, must be applied to this paper scale China National Standard (CNS) A4 specification (210 x 297 mm) --- „----------- I -------- ^ ---------. (Please read the precautions on the back before filling out this page) 518654 A7 _ B7 V. Description of the invention (2) (Please read the precautions on the back before filling out this page) Opening and closing the shutter mechanism. Therefore, it has been used as before as the 2nd The rotating shutter mechanism shown in the figure. That is, the two sides of the disc-shaped aluminum shutter plate material are notched into a fan shape at an angle of about 90 ° C. This notch is the light passing portion 6 3. The remaining shutter plate 61 in the notch portion is the light-shielding portion 6 4. That is, the shutter plate 61 is a point-symmetrical shape in which the two light-passing portions 63 and the two light-shielding portions 64 are alternately formed. The center of the center of the shutter plate 61 is aligned with the center of gravity. Moreover, the shutter plate 61 is arranged at the center of the center. The shaft 62 as a center smoothly rotates in a certain direction in a balanced load state. When the shutter is closed, although the light is blocked by one of the light shielding portions 64, the light reaches the light shielding portion 6 when the shutter plate 61 is rotated. The boundary between the light and the light passing portion 63 will start to illuminate. However, when the shutter plate 61 is rotated 90 °, as shown in FIG. 2 (A), the shutter is fully opened, and all light will pass through the light. Passing section 6 3. From this state, when the shutter plate 61 is rotated 90 ° again, as shown in FIG. 2 (B), the shutter is closed and the light is blocked by the light shielding section 64. That is, due to the shutter Plate 6 1 turns 180 °, and ends the shutter-closed-shutter-closed cycle, and exposes it during its period. The employee ’s cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs prints this shutter mechanism because it is within one cycle. The direction of rotation of the two light-shielding sections 64 is constant. Therefore, the time from the start of the irradiation to the end of the irradiation has the advantage of keeping the accumulated amount of light on the illuminated surface constant. [Problems to be Solved by the Invention] However, recently Due to the need to increase production volume "for example" in semiconductors. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 518654 A7 B7 5. Invention Description p) (Please read the precautions on the back before (Fill in this page) device, because of the high sensitivity of the resist applied to the work, or to increase the radiance of the discharge lamp to shorten the exposure time of the work. In order to shorten the exposure time, the shutter mechanism needs to open and close at high speed. That is, the shutter plate must not only be rotated at a high speed, but also must be stopped at a predetermined position quickly with good accuracy. Therefore, the shutter plate must be thinned and lightened to reduce the turning moment. If the radiant illuminance of the fast electric lamp is increased, when the shutter mechanism is closed, the shutter plate belonging to the light shielding portion is irradiated with high-intensity light. If this light energy is absorbed by the shutter plate, it will be converted into thermal energy to cause the shutter plate to become high temperature. If the shutter plate becomes thinner and lighter, the shutter plate will be thermally deformed when used for a long time. In the previous shutter plate shown in FIG. 2, the two sides of the shutter plate are notched into a fan shape to form a light passing portion. Therefore, the area of the shutter plate near the rotation axis is small and the intensity is weak. Therefore, the shutter is closed. At this time, if the temperature of the light-shielding portion becomes higher, the temperature difference of the shutter plate near the rotation axis becomes larger, and the shutter plate will be distorted. In addition, if the shutter plate is deformed, even if the shutter mechanism is closed, light will still leak to the side of the irradiation surface and cannot function as a shutter. If the deformation is severe, the shutter plate may be damaged. The thermal deformation of the shutter plate printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs can be prevented by installing a reinforcing material on the shutter plate, for example. In addition, a method of installing a heat spreader to enhance the heat dissipation ability to suppress the temperature rise may be considered. However, if a reinforcing material or a heat sink is installed on the shutter plate, the weight will become heavy and the turning torque will increase, and the high-speed rotation and high-precision stop of the shutter plate will become difficult. Therefore, a larger rotary drive device and Brake device. In other words, it will run counter to the requirements of thinner and lighter shutter plates. This paper size applies the Chinese National Standard (CNS) A4 (210 X 297 mm) printed by the Intellectual Property Bureau of the Ministry of Economic Affairs's Consumer Cooperatives 518654 A7 B7 V. Description of the invention c) Although the previous shutter plate, It is made of aluminum and is thin and lightweight. However, it has not taken any measures against the thermal deformation caused by the recent radiant heat from a discharge lamp caused by an increase in irradiance. Therefore, an object of the present invention is to provide a shutter mechanism of a light device having a thin shutter plate, which can be opened and closed at a high speed with light weight, and which does not thermally deform even if it is used for a long time in the intense irradiation intensity of a discharge lamp. [Means for Solving the Problem] In order to achieve this purpose, the invention of the first scope of the patent application applies a fan-shaped notch portion formed of a disc-shaped shutter plate material as a light passing portion, and a shutter plate belonging to a non-notched portion as The light-shielding part is a shutter mechanism that rotates an axis of rotation arranged at the center of the shutter plate in a balanced load state to turn on and off the light of the discharge lamp of the lighting device. It is characterized in that the light-incident surface of the light-shielding part is mirror-finished and An infrared radiation film is formed on the back surface of the light incident surface. And, as for the invention in the fourth scope of the patent application, it is preferable to slightly tilt the rotation axis of the shutter plate with respect to the optical axis of the light, so that the light reflected by the light shielding portion is no longer incident near the discharge lamp. Next, the invention applying for the second item of the patent scope is a shutter mechanism that forms a fan-shaped notch portion as a light passing portion for a disc-shaped shutter plate material, and irradiates a shutter plate belonging to a non-notched portion as a light shielding portion. The device for opening and closing the light of the discharge lamp of the device is characterized in that the light passing portion is formed only between a pair of light shielding portions, and the center of the shutter plate is formed by the light passing portion and the shutter plate on the opposite side as the center of gravity of the shutter plate. For the center of the shutter plate to be aligned, 'the shutter plate is arranged on the rotation axis of the center of the shutter plate. The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) --------- ----------- Order --------- (Please read the notes on the back before filling in this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 518654 A7 B7 V. Invention Note f) as a center to make it swing in a balanced load state. In addition, if the invention in the third scope of the patent application is applied, the light incident surface of the light shielding portion of the shutter plate in the second invention in the patent application is mirror-finished, and it is preferable to form an infrared radiation film on the back of the light entrance surface. In this case, as in the invention in the scope of the patent application, it is better to tilt the rotation axis of the shutter plate slightly to the optical axis of the light, so that the light reflected in the light-shielding portion is no longer incident near the discharge lamp. [Embodiment of Invention] The embodiment of the present invention will be specifically described below with reference to the drawings. The shape of the shutter plate used in the embodiment of the first invention of the patent application is the same as that shown in FIG. That is, a disc-shaped aluminum plate with a thickness of 2 mm and an outer diameter of 7 10 mm 0 is used as the material of the shutter plate 61. The aluminum plate is notched at a 90 ° angle on both sides, and the two symmetrical notches are formed. For the light passing section 6 3. In addition, the remaining aluminum plate belonging to the non-notched portion is a light shielding portion 64 having the same fan shape, and the two light shielding portions 64 are also symmetrically formed. Therefore, the area of the central portion of the shutter plate 61 becomes very small. In addition, a rotation shaft 62 is arranged at the center aligned with the center of gravity of the shutter plate 61. With a driving device and a braking device (not shown), the shutter plate 61 will be centered on the rotation shaft 6 2 in a certain direction in a balanced load state. Slip on the ground and stop at the desired position. In addition, the light incident surface of the light-shielding portion 64 is subjected to mirror processing, for example, a high-brightness honing such as electrolytic honing. In FIG. 3, a mirror surface 65 shown by a dotted line is formed for convenience. This paper size applies to China National Standard (CNS) A4 specification (210 X 297 public love) ^-: ----------- order -------- -Line (Please read the precautions on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 518654 A7 _ B7 V. Description of the Invention I?) In addition, the light from the light-shielding part 64 is incident on the back of the face An infrared radiation film 66 is also formed, which is also conveniently shown in dotted lines. The infrared radiation film 6 6 efficiently dissipates the thermal energy stored in the shutter plate 61 from the side where the light is not radiated to suppress the temperature rise of the shutter plate 61. As a representative example thereof, black electroless nickel plating may be mentioned. However, a heat-resistant black paint or the like may be used. In this manner, since the mirror surface 65 is formed on the light incident surface of the light shielding portion 64, most of the incident light is reflected, and the thermal energy stored in the shutter plate 61 is reduced very much. In addition, an infrared radiation film 66 is formed on the back surface of the light incident surface of the light-shielding portion 64. Therefore, the thermal energy stored in the shutter plate 61 can efficiently dissipate heat from the surface where the light is not radiated, and the temperature can be suppressed. Its rise. Therefore, even if the area of the center portion of the shutter plate 61 where the rotary shaft 62 is arranged is small and the strength is weak, thermal deformation can be prevented in this portion. In addition, there are no cooling fins or reinforcing materials for preventing deformation. Therefore, the turning moment of the shutter plate 61 does not increase, and high-speed rotation of the shutter plate 61 and fast stop with high accuracy can be performed, and corresponding The exposure time is shortened. Here, when the light incident surface of the light shielding portion 64 is incident at right angles, the light reflected by the mirror surface 65 of the light shielding portion 64 is directly returned to the optical axis of the light, and Reflected by a condenser lens and focused on an electrode or bulb of a discharge lamp, or a mouth piece. Therefore, the temperature of the discharge lamp may increase, which may adversely affect the optical characteristics. Therefore, 'turn the rotation axis 6 2 of the shutter plate 6 1 to the light axis of the light, for example, incline 5 °. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ^ -------- Order --------- · (Please read the notes on the back before filling in this page) 518654 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7__ V. Description of invention (7) Degree, as shown in Figure 3 As shown, it is preferable that the light reflected by the mirror surface 65 of the light shielding portion 64 does not return to the optical axis of the light. Next, the invention of the 2nd patent application range is demonstrated as follows. The material of the shutter plate 61 is a disc-shaped aluminum plate with a thickness of 2mm and an outer diameter of 7 1 Omm0. As shown in Fig. 4, one side of this aluminum plate is fan-shaped at a 90 ° angle notch to form light. . 线 过 部 6 3.. The non-notched portions are light shielding portions 64a, 64b. That is, only one light passing portion 63 is formed between the pair of light shielding portions 64a '64b. A rotary shaft 62 is arranged at a midpoint (center of the shutter plate 61) above and below the center line L of the shutter plate 61 shown in FIG. When the shutter is closed, as shown in FIG. 5 (A), the light is blocked by one of the light shielding portions 6 4 a. In addition, when the shutter plate 61 is rotated in the direction of the arrow, the light starts to shine from the upper side. When the shutter plate 61 is rotated 90 degrees, as shown in FIG. 5 (B), the shutter is fully opened. So the light will pass through the light passing section 6 3. In addition, when the shutter plate 61 is rotated 90 ° from this state, as shown in FIG. 5 (C), the shutter will be closed, and the other light shielding portion 6 4b will block the light. That is, since the shutter plate 61 is rotated 180 ° to end the shutter-closed-shutter-opened shutter cycle, the workpiece is exposed during this period. Then, in the next cycle, the shutter plate 61 is rotated in the opposite direction. That is, the shutter plate 61 performs a swinging motion with the rotary shaft 62 as a center. Even in this shutter mechanism, since the rotation directions of the two light-shielding portions 64a and 64b in one cycle are widely determined, the time from the start of irradiation to the end of irradiation can keep the accumulated light amount of the illuminated surface to a fixed amount of paper. Standards apply to China National Standard (CNS) A4 specifications (210 X 297 g) -I u--: ------ I ---------- order -------- -(Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 518654 A7 B7 V. Invention Description p) 〇Here, for the shutter plate 6 1 to be smoothly carried out in a balanced load state In the swing motion, the center of the shutter plate 6 1 on which the rotary shaft 62 is arranged must be aligned with the center of gravity of the shutter plate 61. Therefore, the shape of the light passing portion 63 of the shutter plate 61 and the opposite side is made equal to the area of the center line L above and below the shutter plate 61, and the upper and lower sides are symmetrical. Fig. 4 is an example. Although it can be in various shapes, in short, since there is only one light passing portion 63 with a notch-shaped fan shape, the area of the shutter plate 61 near the rotary shaft 6 2 can be larger than that shown in Fig. 2 The previous example becomes very large. Therefore, even if the temperature of the shutter plate 61 increases, the area of the shutter plate 61 near the rotary shaft 6 2 is large and its strength is strong, so that thermal deformation of this portion can be prevented. In addition, the weight of the shutter plate 61 is exactly the same as the previous example shown in FIG. 2. Since the turning torque is not increased, high-speed rotation of the shutter plate 61 and fast stop with high accuracy can be performed, so it can correspond to exposure. The reduction of time. Next, even in such a shutter plate 61, as described above, the light incident surfaces of the light-shielding portions 6 4 a and 6 4 b are mirror-processed to form a mirror surface, and the light-shielding portions 6 4 a and 6 4 b are light-reflected. It is preferable to form an infrared radiation film on the back surface of the incident surface. Thereby, the temperature rise of the shutter plate 61 can be effectively suppressed, and the effect of multiplying the area and strength of the shutter plate 61 near the rotary shaft 62 can be large, and a large effect of preventing thermal deformation can be obtained. In this case, it is also preferable that the rotation axis 62 of the shutter plate 6 1 is inclined to the optical axis of the light, so that the light reflected by the mirror surfaces of the light shielding portions 64a and 64b does not return to the optical axis of the light. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)-^ ---------- clothing -------- order -------- -(Please read the notes on the back before filling this page) 518654 A7 ___ B7 V. Description of the invention P) [Invention effect] (Please read the notes on the back before filling this page) As explained above, according to the present invention, Even if it is used for a long time to open and close the light with strong irradiation intensity of the discharge lamp, the shutter plate will not be thermally deformed, and the turning moment of the shutter plate will not increase, which constitutes a shutter mechanism of a light irradiation device that can be opened and closed at high speed. Brief Description of the Drawings Fig. 1 is an explanatory diagram of a lighting device. FIG. 2 is an explanatory diagram of a previous example of a shutter plate. Figure 3 is an illustration of an embodiment of the first invention in the scope of patent application. Figure 4 is a plan view of an embodiment of the second invention in the scope of patent application. Figure 5 is an action of the second invention in the scope of patent application. Illustrating. [Explanation of Symbols] Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 1 Shutter plate 2 Rotary shaft 3 Light passing section 4 Shading section 5 Mirror 6 Infrared radiation film. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)