JPH11338005A - Shutter mechanism of light irradiation device - Google Patents

Shutter mechanism of light irradiation device

Info

Publication number
JPH11338005A
JPH11338005A JP10161543A JP16154398A JPH11338005A JP H11338005 A JPH11338005 A JP H11338005A JP 10161543 A JP10161543 A JP 10161543A JP 16154398 A JP16154398 A JP 16154398A JP H11338005 A JPH11338005 A JP H11338005A
Authority
JP
Japan
Prior art keywords
light
shutter plate
shutter
plate
center
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10161543A
Other languages
Japanese (ja)
Other versions
JP3575281B2 (en
Inventor
Takanao Ueno
高尚 上野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP16154398A priority Critical patent/JP3575281B2/en
Priority to TW088103880A priority patent/TW518654B/en
Priority to KR10-1999-0019201A priority patent/KR100509301B1/en
Publication of JPH11338005A publication Critical patent/JPH11338005A/en
Application granted granted Critical
Publication of JP3575281B2 publication Critical patent/JP3575281B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00Exposure-making shutters; Diaphragms
    • G03B9/08Shutters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shutters For Cameras (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a shutter mechanism of a light irradiation device where a shutter plate is made thin and light in weight, by which high speed opening/ closing is realized, and which is not thermally deformed even when it is used for opening/closing for the beam of light of a discharge lamp having high irradiation intensity for a long time. SOLUTION: In the rotary type shutter plate 61, a fan-shaped notched part is formed and made into a light passing part 63, and a non-notched part plate is made into a lightproof part 64, and the light incident surface of the lightproof part of the plate 61 is made into a mirror surface 65, and an infrared ray radiation film 66 is formed on the back surface of the light incident surface. The light passing part is formed between a pair of lightproof parts only by one, and the plate 61 on an opposite side to the light passing part with respect to the center of the plate 61 is formed so that the center of gravity of the plate 61 may be aligned with the center of the plate 61, then the area of the center part of the plate 61 is made large.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置やプリ
ント基板、液晶基板などの製造に使用される露光装置に
内蔵される光照射装置の放電ランプから放射される光芒
を開閉するシャッター機構に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a shutter mechanism for opening and closing a beam of light emitted from a discharge lamp of a light irradiation device incorporated in an exposure device used for manufacturing a semiconductor device, a printed circuit board, a liquid crystal substrate and the like. It is.

【0002】[0002]

【従来の技術】半導体装置やプリント基板、液晶基板な
どの製造に使用される露光装置は、内蔵された光照射装
置の放電ランプの光を被処理物(ワーク)に照射して露
光するが、放電ランプは短いサイクルで点灯と消灯を繰
り返すことができないので、放電ランプを常時点灯して
おき、シャッター機構によって放電ランプから放射され
る光芒を開閉することにより所定の光量で露光する。
2. Description of the Related Art An exposure apparatus used for manufacturing a semiconductor device, a printed circuit board, a liquid crystal substrate, etc. irradiates a workpiece (work) with light of a discharge lamp of a built-in light irradiating apparatus to perform exposure. Since the discharge lamp cannot be repeatedly turned on and off in a short cycle, the discharge lamp is always lit, and a shutter mechanism opens and closes a beam of light emitted from the discharge lamp to perform exposure with a predetermined amount of light.

【0003】図1に光照射装置の一例を示す。放電ラン
プ1から照射される紫外線を含む光は、集光鏡2により
集光され、凹レンズ3を介して第1平面鏡4に入射す
る。第1平面鏡4で反射した光は、照射領域での照度分
布を均一化するために設けられたインテグレータレンズ
5の入射部付近に集光する。インテグレータレンズ5か
ら出射した光は、インテグレータレンズ5の後方に配置
されたシャッター機構6が開くと、第2平面鏡7を介し
てコリメータレンズ8で平行光にされて光照射面に載置
されたワークの照射を開始し、シャッター機構6が閉じ
ると照射を終了する。なお、シャッター機構6は、イン
テグレータレンズ5の前方に配置されてもよい。
FIG. 1 shows an example of a light irradiation device. Light including ultraviolet rays emitted from the discharge lamp 1 is condensed by the condenser mirror 2 and enters the first plane mirror 4 via the concave lens 3. The light reflected by the first plane mirror 4 is condensed near an incident portion of an integrator lens 5 provided for uniforming the illuminance distribution in the irradiation area. When the shutter mechanism 6 arranged behind the integrator lens 5 opens, the light emitted from the integrator lens 5 is converted into parallel light by the collimator lens 8 via the second plane mirror 7 and the work placed on the light irradiation surface. Is started, and the irradiation ends when the shutter mechanism 6 is closed. Note that the shutter mechanism 6 may be arranged in front of the integrator lens 5.

【0004】この光照射装置において、ワーク表面の露
光量を均一にするために、シャッタ開(照射開始)から
シャッタ閉(照射終了)までの時間において、光照射面
の照射領域における積算光量が等しくなるようにシャッ
ター機構を開閉する必要がある。このため従来から図2
に示す回転式のシャッター機構が使用されている。すな
わち、円盤状のアルミ製シャッター板素材の両側が約9
0゜の角度で扇型に切り欠かれており、この切欠き部が
光通過部63である。そして、非切欠き部である残りの
シャッター板61が遮光部64である。つまり、シャッ
ター板61は、2個の光通過部63と2個の遮光部64
が交互に形成された点対称形であり、点対称形の中心点
であるシャッター板61の中心と重心が一致している。
そして、シャッター板61は、その中心に配置された回
転軸62を中心にしてバランス負荷状態で滑らかに一定
方向に回転する。
In this light irradiation device, in order to make the exposure amount on the work surface uniform, the integrated light amount in the irradiation area of the light irradiation surface is equal during the time from opening of the shutter (start of irradiation) to closing of the shutter (end of irradiation). It is necessary to open and close the shutter mechanism in order to achieve this. For this reason, FIG.
The rotary shutter mechanism shown in FIG. That is, both sides of the disc-shaped aluminum shutter plate material are about 9
It is cut out in a fan shape at an angle of 0 °, and this cutout portion is a light passing portion 63. The remaining shutter plate 61, which is a non-notched portion, is a light shielding portion 64. That is, the shutter plate 61 includes two light passing portions 63 and two light blocking portions 64.
Are point-symmetrical shapes formed alternately, and the center of the shutter plate 61 which is the center point of the point-symmetrical shape coincides with the center of gravity.
Then, the shutter plate 61 smoothly rotates in a fixed direction about a rotation shaft 62 disposed at the center thereof in a balanced load state.

【0005】シャッター閉のときは、光芒は一方の遮光
部64で遮光されているが、シャッター板61が回転を
開始すると、光芒が遮光部64と光通過部63の境界に
さしかかり、照射が始まるが、シャッター板61が90
゜回転すると、図2(A)に示すように、完全なシャッ
タ開状態となり、全ての光芒は光通過部63を通過す
る。そして、この状態からシャッター板61が更に90
゜回転すると、図2(B)に示すように、シャッター閉
となり、遮光部64で再び遮光される。つまり、シャッ
ター板61が180゜回転することにより、シャッター
閉→シャッタ開→シャッター閉の1サイクルが終了し、
その間にワークが露光される。かかるシャッター機構
は、1サイクルにおける2個の遮光部64の回転方向が
一定なので、照射開始から照射終了までの時間におい
て、被照射面における積算光量を一定にできる利点があ
る。
When the shutter is closed, the light beam is shielded by one of the light shielding portions 64. However, when the shutter plate 61 starts rotating, the light beam reaches the boundary between the light shielding portion 64 and the light passing portion 63, and irradiation starts. But the shutter plate 61 is 90
When rotated, the shutter is completely opened as shown in FIG. 2A, and all beams of light pass through the light passage section 63. Then, from this state, the shutter plate 61 is further moved 90 degrees.
When rotated, the shutter is closed as shown in FIG. 2B, and the light is shielded again by the light shielding unit 64. That is, when the shutter plate 61 rotates by 180 °, one cycle of shutter closing → shutter opening → shutter closing is completed,
In the meantime, the work is exposed. Such a shutter mechanism has an advantage that the integrated light amount on the irradiated surface can be kept constant during the period from the start of irradiation to the end of irradiation because the rotation directions of the two light-shielding portions 64 in one cycle are constant.

【0006】[0006]

【発明が解決しようとする課題】ところで最近は、スル
ープット向上の要請から、例えば半導体装置の製造にお
いては、ワークに塗布されるレジストの高感度化や、放
電ランプの放射照度を高めてワークの露光時間を短縮す
るようにしている。そして、露光時間が短縮するには、
シャッター機構は高速で開閉する必要がある。つまり、
シャッター板を高速で回転させると共に所定位置に急速
に精度良く停止させる必要がある。このためには、シャ
ッター板を薄肉化・軽量化して回転モーメントの減少を
図る必要がある。
However, recently, due to a demand for an improvement in throughput, for example, in the manufacture of a semiconductor device, the sensitivity of a resist applied to a work is increased, and the irradiance of a discharge lamp is increased to expose the work. Try to save time. And to shorten the exposure time,
The shutter mechanism needs to open and close at high speed. That is,
It is necessary to rotate the shutter plate at high speed and to stop it at a predetermined position quickly and accurately. For this purpose, it is necessary to reduce the rotational moment by making the shutter plate thinner and lighter.

【0007】放電ランプの放射照度を高めると、シャッ
ター機構が閉じているときに、遮光部であるシャッター
板に放射強度の高い光が照射され、この光エネルギーは
シャッター板に吸収されると、熱エネルギーに変換され
てシャッター板が高温になるが、シャッター板を薄肉化
・軽量化すると、長時間使用するとき、シャッター板が
熱変形を起す。
[0007] When the irradiance of the discharge lamp is increased, when the shutter mechanism is closed, light having a high radiation intensity is irradiated to the shutter plate, which is a light shielding portion. Although the temperature of the shutter plate becomes high due to conversion into energy, if the shutter plate is made thinner and lighter, the shutter plate undergoes thermal deformation when used for a long time.

【0008】また、図2に示す従来のシャッター板は、
シャッター板の両側を扇型に切り欠いて光通過部を形成
しているので、回転軸近傍のシャッター板は面積が小さ
くて強度が弱いので、シャッター閉の時、遮光部の温度
が高くなると回転軸近傍のシャッター板の温度差が大き
くなり、シャッター板がねじれるように変形する。そし
て、シャッター板が変形すると、シャッター機構を閉じ
ても光が照射面側に漏れることがあってシャッターとし
て機能せず、変形が著しい場合は、シャッター板が破損
することがある。
Further, the conventional shutter plate shown in FIG.
The shutter plate near the rotation axis has a small area and low strength because the light passage is formed by cutting out both sides of the shutter plate in a fan shape, so when the shutter is closed, the shutter plate rotates when the temperature of the light shielding unit increases. The temperature difference between the shutter plates near the axis increases, and the shutter plates deform to twist. Then, when the shutter plate is deformed, even if the shutter mechanism is closed, light may leak to the irradiation surface side and does not function as a shutter. If the deformation is significant, the shutter plate may be damaged.

【0009】シャッター板の熱変形は、例えばシャッタ
ー板に補強材を取り付けることで防ぐことができる。ま
た、放熱フィンを取り付けて熱放散能力を大きくして温
度上昇を抑制することが考えられる。しかし、シャッタ
ー板に補強材や放熱フィンを取り付けると、重量が増大
して回転モーメントが大きくなり、シャッター板の高速
回転および高精度の急速停止が困難になるので、より大
型の回転駆動手段および制動手段が必要になる。つま
り、シャッター板の薄肉化・軽量化の要請に反する。こ
のように、従来のシャッター板は、アルミ製であって薄
肉・軽量ではあったが、最近の放射照度を高めた放電ラ
ンプからの放射熱による熱変形に耐えるための処理は何
らなされていなかった。
[0009] Thermal deformation of the shutter plate can be prevented by, for example, attaching a reinforcing material to the shutter plate. In addition, it is conceivable to attach a radiation fin to increase the heat dissipation capacity and suppress a temperature rise. However, if reinforcing materials or heat radiation fins are attached to the shutter plate, the weight increases and the rotational moment increases, making it difficult to rotate the shutter plate at high speed and with high precision and quick stop. Means are needed. That is, this is contrary to the demand for thinner and lighter shutter plates. As described above, the conventional shutter plate is made of aluminum and is thin and lightweight, but no treatment has been performed to withstand thermal deformation due to radiant heat from a discharge lamp having recently increased irradiance. .

【0010】そこで本発明は、シャッター板が薄肉・軽
量であって高速の開閉が可能であり、放電ランプの強い
照射強度の光芒の開閉に長時間使用しても熱変形を起す
ことのない光照射装置のシャッター機構を提供すること
を目的とする。
Accordingly, the present invention provides a light source which has a thin and lightweight shutter plate which can be opened and closed at a high speed, and which does not cause thermal deformation even when used for a long time to open and close a light beam of a strong irradiation intensity of a discharge lamp. An object is to provide a shutter mechanism of an irradiation device.

【0011】[0011]

【課題を解決するための手段】かかる目的を達成するた
めに、請求項1の発明は、円盤状のシャッター板素材に
扇型の切欠き部を形成して光通過部とし、非切欠き部で
あるシャッター板を遮光部とし、シャッター板の中心に
配置された回転軸を中心にバランス負荷状態で回転して
光照射装置の放電ランプの光芒の開閉を行うシャッター
機構において、遮光部の光入射面に鏡面加工を行うとと
もに、光入射面の裏面に赤外線放射膜を形成する。そし
て、請求項4の発明のように、シャッター板の回転軸を
光芒の光軸に対して幾分傾斜させ、遮光部で反射した光
が放電ランプ近傍に再び入射しないようにするのが好ま
しい。
In order to achieve the above object, according to the first aspect of the present invention, a fan-shaped notch is formed in a disc-shaped shutter plate material to form a light passage portion, and a non-notch portion is formed. In the shutter mechanism, which rotates the balance plate in a balanced load state around the rotation axis disposed at the center of the shutter plate to open and close the beam of the discharge lamp of the light irradiation device, the light incident on the light shielding unit The surface is mirror-finished and an infrared emitting film is formed on the back surface of the light incident surface. It is preferable that the rotation axis of the shutter plate is slightly inclined with respect to the optical axis of the light beam so that the light reflected by the light shielding portion does not enter the vicinity of the discharge lamp again.

【0012】次に、請求項2の発明は、円盤状のシャッ
ター板素材に扇型の切欠き部を形成して光通過部とし、
非切欠き部であるシャッター板を遮光部として、光照射
装置の放電ランプの光芒の開閉を行うシャッター機構に
おいて、光通過部を一対の遮光部の間に1個のみ形成
し、シャッター板の中心に対して光通過部と反対側のシ
ャッター板を、シャッター板の重心がシャッター板の中
心と一致する形状にし、シャッター板をシャッター板の
中心に配置された回転軸を中心にしてバランス負荷状態
で揺動させる。
Next, according to a second aspect of the present invention, a fan-shaped notch is formed in a disk-shaped shutter plate material to form a light passing portion,
In a shutter mechanism that opens and closes a beam of a discharge lamp of a light irradiation device using a shutter plate that is a non-notched portion as a light blocking portion, only one light passing portion is formed between a pair of light blocking portions, and the center of the shutter plate is formed. The shutter plate on the side opposite to the light passage section is shaped so that the center of gravity of the shutter plate coincides with the center of the shutter plate, and the shutter plate is placed in a balanced load state around the rotation axis arranged at the center of the shutter plate. Rock it.

【0013】そして、請求項3の発明のように、請求項
2の発明のシャッター板の遮光部の光入射面に鏡面加工
を行うとともに、光入射面の裏面に赤外線放射膜を形成
するのが好ましく、この場合も、請求項4の発明のよう
に、シャッター板の回転軸を光芒の光軸に対して幾分傾
斜させて遮光部で反射した光が放電ランプ近傍に再び入
射しないようにするのが好ましい。
According to a third aspect of the present invention, the light incident surface of the light shielding portion of the shutter plate according to the second aspect of the present invention is mirror-finished and an infrared radiation film is formed on the back surface of the light incident surface. Preferably, also in this case, the rotation axis of the shutter plate is slightly inclined with respect to the optical axis of the light beam so that the light reflected by the light shielding portion does not enter the vicinity of the discharge lamp again. Is preferred.

【0014】[0014]

【発明の実施の形態】以下に、図面に基づいて本発明の
実施の形態を具体的に説明する。請求項1の発明の実施
例に使用するシャッター板の形状は、図2に示すものと
同じである。すなわち、厚さ2mm、外径710mmφ
の円盤状のアルミ板をシャッター板61の素材とし、こ
のアルミ板の両側が90゜の角度で扇型に切り欠かれて
おり、この2個の対称形をした切欠き部が光通過部63
である。そして、非切欠き部である残りのアルミ板が同
じく扇形をした遮光部64であり、2個の遮光部64も
対称形をしている。このため、シャッター板61の中心
部の面積は非常に小さくなっている。そして、シャッタ
ー板61の重心と一致した中心に回転軸62が配置さ
れ、図示略の駆動手段及び制動手段により、シャッター
板61は回転軸62を中心にして一定方向にバランス負
荷状態で滑らかに回転し、所定位置で停止する。
Embodiments of the present invention will be specifically described below with reference to the drawings. The shape of the shutter plate used in the embodiment of the first aspect of the present invention is the same as that shown in FIG. That is, a thickness of 2 mm and an outer diameter of 710 mmφ
A disc-shaped aluminum plate is used as a material of the shutter plate 61, and both sides of the aluminum plate are cut out in a fan shape at an angle of 90 °, and the two symmetrical notches are formed as light-passing portions 63.
It is. The remaining aluminum plate, which is a non-cutout portion, is also a fan-shaped light shielding portion 64, and the two light shielding portions 64 are also symmetrical. For this reason, the area of the center of the shutter plate 61 is very small. A rotating shaft 62 is arranged at the center corresponding to the center of gravity of the shutter plate 61, and the shutter plate 61 smoothly rotates in a fixed direction about the rotating shaft 62 in a fixed direction by a driving unit and a braking unit (not shown). Then, it stops at a predetermined position.

【0015】そして、遮光部64の光入射面に鏡面加
工、例えば電解研磨などによる高輝度研磨が施され、図
3において、便宜上点線で示す鏡面65が形成されてい
る。一方、遮光部64の光入射面の裏面には、これも便
宜上点線で示す赤外線放射膜66が形成されている。赤
外線放射膜66は、シャッター板61に蓄積された熱エ
ネルギーを光が照射されない面から効率良く放射してシ
ャッター板61の温度上昇を抑制するものであり、代表
例として黒色の無電解ニッケルめっきを挙げることがで
きるが、耐熱性を有する黒色の塗料などであっても良
い。
The light incident surface of the light shielding portion 64 is subjected to mirror finishing, for example, high-intensity polishing such as electrolytic polishing, and a mirror surface 65 indicated by a dotted line in FIG. 3 is formed for convenience. On the other hand, on the back surface of the light incident surface of the light shielding portion 64, an infrared radiation film 66 also indicated by a dotted line for convenience is formed. The infrared radiation film 66 efficiently radiates the heat energy accumulated in the shutter plate 61 from the surface not irradiated with light and suppresses the temperature rise of the shutter plate 61. As a typical example, black electroless nickel plating is used. Although it can be mentioned, a black paint having heat resistance may be used.

【0016】このように、遮光部64の光入射面に鏡面
65が形成されているので、入射した光の大部分は反射
し、シャッター板61に蓄積される熱エネルギーは非常
に少なくなる。そして、遮光部64の光入射面の裏面に
赤外線放射膜66が形成されているので、シャッター板
61に蓄積された熱エネルギーは、光が照射されない面
から効率良く放射し、温度上昇が抑制される。
As described above, since the mirror surface 65 is formed on the light incident surface of the light shielding portion 64, most of the incident light is reflected, and the heat energy stored in the shutter plate 61 is extremely small. Further, since the infrared radiation film 66 is formed on the back surface of the light incident surface of the light shielding portion 64, the heat energy accumulated in the shutter plate 61 is efficiently radiated from the surface not irradiated with light, and the temperature rise is suppressed. You.

【0017】このため、回転軸62が配置されたシャッ
ター板61の中心部の面積が小さくて強度的に弱くて
も、この部分で熱変形することを防止することができ
る。更には、冷却フィンや変形防止用の補強材を取り付
けている訳ではないので、シャッター板61の回転モー
メントが増大することがなく、シャッター板61の高速
回転および高精度の急速停止が可能であり、露光時間の
短縮に対応することができる。
For this reason, even if the area of the central portion of the shutter plate 61 on which the rotating shaft 62 is disposed is small and the strength is weak, it is possible to prevent thermal deformation at this portion. Further, since the cooling fins and the reinforcing material for preventing deformation are not attached, the rotational moment of the shutter plate 61 does not increase, so that the shutter plate 61 can be rotated at high speed and quickly stopped with high accuracy. , It is possible to cope with the reduction of the exposure time.

【0018】ここで、遮光部64の光入射面に光芒が直
角に入射すると、遮光部64の鏡面65で反射した光
は、そのまま光芒の光軸上に戻り、集光鏡で反射して放
電ランプの電極やバルブ、口金に集光するため、放電ラ
ンプの温度が上昇し、光学的な特性に悪影響を及ぼすこ
とがある。このため、シャッター板61の回転軸62を
光芒の光軸に対して、例えば5゜程度傾斜させ、図3に
示すように、遮光部64の鏡面65で反射した光が光芒
の光軸上に戻らないようにするのがよい。
Here, when the light beam enters the light incident surface of the light shielding portion 64 at a right angle, the light reflected by the mirror surface 65 of the light shielding portion 64 returns to the optical axis of the light beam as it is, and is reflected by the condenser mirror and discharged. Since the light is condensed on the electrodes, bulbs, and base of the lamp, the temperature of the discharge lamp increases, which may adversely affect optical characteristics. For this reason, the rotation axis 62 of the shutter plate 61 is inclined, for example, by about 5 ° with respect to the optical axis of the beam of light, and as shown in FIG. It is better not to return.

【0019】次に、請求項2の発明の実施形態を説明す
る。シャッター板61の素材は、厚さ2mm、外径71
0mmφの円盤状のアルミ板であり、図4に示すよう
に、このアルミ板の片側が90゜の角度で扇型に切り欠
かれて光通過部63が形成されており、非切欠き部が遮
光部64a,64bである。つまり、一対の遮光部64
a,64bの間に光通過部63が1個のみ形成されてい
る。そして、図4に示すシャッター板61の上下の中心
線Lの中点(シャッター板61の中心)に回転軸62が
配置されている。
Next, an embodiment of the present invention will be described. The material of the shutter plate 61 is 2 mm thick and 71 mm in outer diameter.
As shown in FIG. 4, one side of this aluminum plate is cut out in a fan shape at an angle of 90 ° to form a light passing portion 63, and a non-notched portion is formed as shown in FIG. These are the light shielding portions 64a and 64b. That is, the pair of light shielding portions 64
Only one light passing portion 63 is formed between a and 64b. The rotation shaft 62 is disposed at the midpoint of the upper and lower center lines L (the center of the shutter plate 61) of the shutter plate 61 shown in FIG.

【0020】シャッタ閉のときは、図5(A)に示すよ
うに、光芒は一方の遮光部64aで遮られている。そし
て、シャッター板61が矢印の方向に回動すると、光芒
はその上側から照射し始め、シャッター板61が90゜
回動すると、図5(B)に示すように、完全なシャッタ
開状態となり、全ての光芒は光通過部63を通過する。
そして、この状態からシャッター板61が更に90゜回
動すると、図5(C)に示すように、シャッター閉とな
り、他方の遮光部64bで再び遮光される。つまり、シ
ャッター板61が180゜回動することにより、シャッ
ター閉→シャッタ開→シャッター閉の1サイクルが終了
し、その間にワークが露光される。そして、次のサイク
ルにおいては、シャッター板61は逆方向に回動する。
つまり、シャッター板61は回転軸62を中心にして揺
動運動を行う、かかるシャッター機構においても、1サ
イクルにおける2個の遮光部64a,64bの回動方向
が一定なので、照射開始から照射終了までの時間におい
て、被照射面における積算光量を一定にできる。
When the shutter is closed, as shown in FIG. 5A, the beam of light is blocked by one of the light shielding portions 64a. When the shutter plate 61 rotates in the direction of the arrow, the beam of light starts to irradiate from above, and when the shutter plate 61 rotates 90 °, the shutter is fully opened as shown in FIG. All the light beams pass through the light passing section 63.
Then, when the shutter plate 61 is further rotated by 90 ° from this state, the shutter is closed as shown in FIG. 5C, and the light is shielded again by the other light shielding portion 64b. That is, when the shutter plate 61 rotates by 180 °, one cycle of shutter closing → shutter opening → shutter closing is completed, and the work is exposed during that time. Then, in the next cycle, the shutter plate 61 rotates in the opposite direction.
That is, the shutter plate 61 performs a swinging movement about the rotation axis 62. In such a shutter mechanism, since the rotation directions of the two light shielding portions 64a and 64b in one cycle are constant, from the start of irradiation to the end of irradiation. During the time, the integrated light amount on the irradiated surface can be made constant.

【0021】ここで、シャッター板61がバランス負荷
状態で滑らかに揺動運動を行うために、回転軸62が配
置されるシャッター板61の中心をシャッター板61の
重心と一致させる必要がある。このため、シャッター板
61の光通過部63と反対側の形状を、シャッター板6
1の上下の中心線Lの左右の面積が等しく、かつ上下が
対称形になるようにする。図4はその一例であり、いろ
いろの形状が可能であるが、いずれにしても、扇型に切
り欠かれた光通過部63が1個のみであるので、回転軸
62近傍のシャッター板61の面積は図2に示す従来例
よりもずっと大きくすることができる。
Here, in order for the shutter plate 61 to smoothly swing in a balanced load state, the center of the shutter plate 61 on which the rotating shaft 62 is disposed needs to coincide with the center of gravity of the shutter plate 61. For this reason, the shape of the shutter plate 61 on the side opposite to the light passing portion 63 is changed to the shutter plate 6.
The upper and lower center lines L are equal in the left and right areas, and the upper and lower centers are symmetrical. FIG. 4 is an example, and various shapes are possible. In any case, since there is only one light-passing portion 63 cut out in a fan shape, the shutter plate 61 near the rotation shaft 62 The area can be much larger than in the conventional example shown in FIG.

【0022】このため、シャッター板61の温度が上昇
しても、回転軸62近傍のシャッター板61の面積が大
きくて強度が強いので、この部分の熱変形を防ぐことが
できる。また、シャッター板61の重量は図2に示す従
来例と全く同じであり、回転モーメントが増大しないの
で、シャッター板61の高速回転および高精度の急速停
止が可能であり、露光時間の短縮に対応することができ
る。
For this reason, even if the temperature of the shutter plate 61 rises, the area of the shutter plate 61 near the rotating shaft 62 is large and the strength is strong, so that thermal deformation of this portion can be prevented. Further, the weight of the shutter plate 61 is exactly the same as that of the conventional example shown in FIG. 2, and the rotating moment does not increase, so that the shutter plate 61 can be rotated at high speed and quickly stopped with high accuracy, and the exposure time can be reduced. can do.

【0023】次に、かかるシャッター板61において
も、前述したとおり、遮光部64a,64bの光入射面
に鏡面加工を施して鏡面を形成し、一方、遮光部64
a,64bの光入射面の裏面には赤外線放射膜を形成す
るのがよい。これにより、シャッター板61の温度上昇
を効率良く抑制することができ、回転軸62近傍のシャ
ッター板61の面積が大きくて強度が強いことと相俟っ
て、熱変形防止に大きな効果を得ることができる。ま
た、この場合も、シャッター板61の回転軸62を光芒
の光軸に対して傾斜させ、遮光部64a,64bの鏡面
で反射した光が光芒の光軸上に戻らないようにするのが
よい。
Next, in the shutter plate 61, as described above, the light incident surfaces of the light shielding portions 64a and 64b are mirror-finished to form a mirror surface.
It is preferable to form an infrared radiation film on the back surface of the light incident surface of a, 64b. Thereby, the temperature rise of the shutter plate 61 can be suppressed efficiently, and the large effect of the large area and large strength of the shutter plate 61 near the rotation shaft 62 can provide a great effect in preventing thermal deformation. Can be. Also in this case, it is preferable that the rotation axis 62 of the shutter plate 61 is inclined with respect to the optical axis of the light beam so that the light reflected by the mirror surfaces of the light shielding portions 64a and 64b does not return to the optical axis of the light beam. .

【0024】[0024]

【発明の効果】以上説明したように、本発明によれば、
放電ランプの強い照射強度の光芒の開閉に長時間使用し
ても、シャッター板が熱変形を起すことがなく、しか
も、シャッター板の回転モーメントが増加することなく
て高速の開閉が可能な光照射装置のシャッター機構とす
ることができる。
As described above, according to the present invention,
Even if it is used for a long time to open and close the light beam of the strong irradiation intensity of the discharge lamp, the light can be opened and closed at high speed without causing thermal deformation of the shutter plate and without increasing the rotational moment of the shutter plate. It can be a shutter mechanism of the device.

【図面の簡単な説明】[Brief description of the drawings]

【図1】光照射装置の説明図である。FIG. 1 is an explanatory diagram of a light irradiation device.

【図2】シャッター板の従来例の説明図である。FIG. 2 is an explanatory view of a conventional example of a shutter plate.

【図3】請求項1の発明の実施例の説明図である。FIG. 3 is an explanatory diagram of an embodiment of the first invention.

【図4】請求項2の発明の実施例の平面図である。FIG. 4 is a plan view of an embodiment of the invention of claim 2;

【図5】請求項2の発明の実施例の作動説明図である。FIG. 5 is an operation explanatory view of the embodiment of the second invention.

【符号の説明】[Explanation of symbols]

61 シャッター板 62 回転軸 63 光通過部 64 遮光部 65 鏡面 66 赤外線放射膜 Reference Signs List 61 shutter plate 62 rotation axis 63 light passing part 64 light shielding part 65 mirror surface 66 infrared radiation film

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 円盤状のシャッター板素材に扇型の切欠
き部を形成して光通過部とし、非切欠き部であるシャッ
ター板を遮光部とし、シャッター板の中心に配置された
回転軸を中心にバランス負荷状態で回転して光照射装置
の放電ランプの光芒の開閉を行うシャッター機構におい
て、 前記遮光部の光入射面に鏡面加工を行うとともに、光入
射面の裏面に赤外線放射膜を形成したことを特徴とする
光照射装置のシャッター機構。
1. A disk-shaped shutter plate material having a fan-shaped notch formed as a light-passing portion, a non-notched shutter plate as a light-shielding portion, and a rotating shaft disposed at the center of the shutter plate. In a shutter mechanism that opens and closes the light beam of the discharge lamp of the light irradiation device by rotating in a balanced load state around the mirror, while performing mirror finishing on the light incident surface of the light shielding unit, an infrared emitting film is formed on the back surface of the light incident surface. A shutter mechanism of the light irradiation device, wherein the shutter mechanism is formed.
【請求項2】 円盤状のシャッター板素材に扇型の切欠
き部を形成して光通過部とし、非切欠き部であるシャッ
ター板を遮光部として、光照射装置の放電ランプの光芒
の開閉を行うシャッター機構において、 前記光通過部を一対の遮光部の間に1個のみ形成し、シ
ャッター板の中心に対して光通過部と反対側のシャッタ
ー板を、シャッター板の重心がシャッター板の中心と一
致する形状にし、シャッター板をシャッター板の中心に
配置された回転軸を中心に揺動させることを特徴とする
光照射装置のシャッター機構。
2. Opening and closing a light beam of a discharge lamp of a light irradiation device by forming a fan-shaped notch portion in a disk-shaped shutter plate material as a light passing portion and a shutter plate as a non-notched portion as a light shielding portion. In the shutter mechanism, only one light passing portion is formed between the pair of light shielding portions, and the shutter plate on the side opposite to the light passing portion with respect to the center of the shutter plate is located at the center of gravity of the shutter plate. A shutter mechanism for a light irradiation device, wherein the shutter mechanism has a shape that matches the center and swings a shutter plate about a rotation axis arranged at the center of the shutter plate.
【請求項3】 請求項2の光照射装置のシャッター機構
において、前記遮光部の光入射面に鏡面加工を行うとと
もに、光入射面の裏面に赤外線放射膜を形成したことを
特徴とする光照射装置のシャッター機構。
3. The light irradiation device according to claim 2, wherein the light-incident surface of the light-shielding portion is mirror-finished and an infrared-emitting film is formed on the back surface of the light-incident surface. The shutter mechanism of the device.
【請求項4】 請求項1または請求項3の光照射装置の
シャッター機構において、前記シャッター板の回転軸が
光芒の光軸に対して傾斜していることを特徴とする光照
射装置のシャッター機構。
4. The shutter mechanism of the light irradiation device according to claim 1, wherein a rotation axis of the shutter plate is inclined with respect to an optical axis of the light beam. .
JP16154398A 1998-05-27 1998-05-27 Shutter mechanism of light irradiation device Expired - Fee Related JP3575281B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP16154398A JP3575281B2 (en) 1998-05-27 1998-05-27 Shutter mechanism of light irradiation device
TW088103880A TW518654B (en) 1998-05-27 1999-03-12 Shutter mechanism of light irradiation device
KR10-1999-0019201A KR100509301B1 (en) 1998-05-27 1999-05-27 A shutter mechanism for a light irradiation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16154398A JP3575281B2 (en) 1998-05-27 1998-05-27 Shutter mechanism of light irradiation device

Publications (2)

Publication Number Publication Date
JPH11338005A true JPH11338005A (en) 1999-12-10
JP3575281B2 JP3575281B2 (en) 2004-10-13

Family

ID=15737111

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16154398A Expired - Fee Related JP3575281B2 (en) 1998-05-27 1998-05-27 Shutter mechanism of light irradiation device

Country Status (3)

Country Link
JP (1) JP3575281B2 (en)
KR (1) KR100509301B1 (en)
TW (1) TW518654B (en)

Cited By (7)

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Publication number Priority date Publication date Assignee Title
JP2003177548A (en) * 2001-12-10 2003-06-27 Hitachi Electronics Eng Co Ltd Light irradiation device equipped with reflective shading type shutter
JP2004240097A (en) * 2003-02-05 2004-08-26 Dainippon Printing Co Ltd Exposure method and aligner
KR100558403B1 (en) * 2000-11-14 2006-03-10 우시오덴키 가부시키가이샤 Light irradiation apparatus
TWI412318B (en) * 2011-03-10 2013-10-11 Qisda Corp Cooling apparatus with switchable conduit and projector having same
KR20170106352A (en) * 2014-12-31 2017-09-20 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 Self-damping shutter device for exposure system of photolithography machine
JP2020525860A (en) * 2017-07-05 2020-08-27 シャンハイ マイクロ エレクトロニクス イクイプメント(グループ)カンパニー リミティド Shutter blade device for photolithography device
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Publication number Priority date Publication date Assignee Title
KR100558403B1 (en) * 2000-11-14 2006-03-10 우시오덴키 가부시키가이샤 Light irradiation apparatus
JP2003177548A (en) * 2001-12-10 2003-06-27 Hitachi Electronics Eng Co Ltd Light irradiation device equipped with reflective shading type shutter
JP2004240097A (en) * 2003-02-05 2004-08-26 Dainippon Printing Co Ltd Exposure method and aligner
TWI412318B (en) * 2011-03-10 2013-10-11 Qisda Corp Cooling apparatus with switchable conduit and projector having same
KR20170106352A (en) * 2014-12-31 2017-09-20 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 Self-damping shutter device for exposure system of photolithography machine
JP2018502329A (en) * 2014-12-31 2018-01-25 シャンハイ マイクロ エレクトロニクス イクイプメント Self-attenuating shutter for photolithographic apparatus exposure systems.
JP2020525860A (en) * 2017-07-05 2020-08-27 シャンハイ マイクロ エレクトロニクス イクイプメント(グループ)カンパニー リミティド Shutter blade device for photolithography device
JP2020187185A (en) * 2019-05-10 2020-11-19 キヤノン株式会社 Shutter apparatus, exposure apparatus, film formation apparatus and article manufacturing method

Also Published As

Publication number Publication date
JP3575281B2 (en) 2004-10-13
TW518654B (en) 2003-01-21
KR100509301B1 (en) 2005-08-18
KR19990088602A (en) 1999-12-27

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