JP7299748B2 - SHUTTER DEVICE, EXPOSURE DEVICE, FILM FORMING DEVICE, AND PRODUCT MANUFACTURING METHOD - Google Patents

Description

The present invention relates to a shutter device, an exposure device, a film forming device, and an article manufacturing method.

For opening and closing an optical path in a manufacturing apparatus such as an exposure apparatus that exposes a substrate through an original, and a film forming apparatus that contacts a composition on a substrate with a mold and cures the composition by light irradiation. A shutter device can be used. Patent Literature 1 describes that the shutter blade is made of a high heat transfer material such as aluminum, aluminum is vapor-deposited on the light incident side, and the other side is painted with black paint.

Japanese Patent Application Laid-Open No. 2004-240097

2. Description of the Related Art In manufacturing apparatuses such as exposure apparatuses and film forming apparatuses, it is necessary to increase the speed of shutter blades in order to improve throughput. For that purpose, it is necessary to increase the strength while reducing the weight of the shutter blade.

SUMMARY OF THE INVENTION It is an object of the present invention to provide an advantageous technique for increasing strength while reducing the weight of shutter blades.

One aspect of the present invention relates to a shutter device that opens and closes an optical path of light with a shutter blade, the shutter blade having a first surface on which the light is incident and a second surface opposite to the first surface. A base member and an auxiliary member coupled to the second surface, wherein the thermal expansion coefficient of the auxiliary member is different from that of the base member, and the heat generated by the light causes the shutter blade to warp. is given.

The present invention provides an advantageous technique for reducing the weight and increasing the strength of shutter blades.

1 is a diagram showing the configuration of a shutter device according to a first embodiment; FIG. 4A and 4B are views showing the configuration of the shutter blades of the shutter device of the first embodiment; FIG. FIG. 8 is a diagram showing the configuration of shutter blades of a shutter device according to a second embodiment; The figure which shows the structure of the shutter blade|wing of the shutter apparatus of 3rd Embodiment. The figure which shows the structure of the shutter blade|wing of the shutter apparatus of 4th Embodiment. The figure which shows the structure of the shutter blade|wing of the shutter apparatus of 5th Embodiment. The figure which shows the structure of the shutter blade|wing of the shutter apparatus of 6th Embodiment. FIG. 9 is a diagram showing an analysis example of shutter blades of the shutter device of the second embodiment; FIG. 2 is a diagram exemplifying the configuration of an exposure apparatus; The figure which illustrates the structure of a film forming apparatus.

Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. In addition, the following embodiments do not limit the invention according to the scope of claims. Although multiple features are described in the embodiments, not all of these multiple features are essential to the invention, and multiple features may be combined arbitrarily. Furthermore, in the accompanying drawings, the same or similar configurations are denoted by the same reference numerals, and redundant description is omitted.

FIG. 1 shows a configuration example of the shutter device 1 of the first embodiment. The shutter device 1 includes shutter blades 2 and can be configured to open and close the optical path of the exposure light 4 by the shutter blades 2 . The shutter device 1 may comprise a drive mechanism for driving the shutter blades 2, for example a rotation mechanism 3 for rotating the shutter blades 2 around the rotation axis RA. The rotation axis RA can be parallel to the optical axis (principal ray) of the exposure light 4, for example. Note that the driving direction of the shutter blades 2 may be a linear direction. In the following, the directions can be described by an XYZ coordinate system in which the Z direction is the direction parallel to the optical axis of the exposure light 4 .

FIG. 2 shows a configuration example of the shutter blade 2 of the shutter device 1 of the first embodiment. In the example shown in FIG. 2, two shutter blades 2 are provided for the hub HB. The number of shutter blades 2 can be determined arbitrarily. The shutter blade 2 includes a base member 21 having a first surface S1 on which the exposure light 4 is incident and a second surface S2 opposite to the first surface S1, and an auxiliary member 22 coupled to the second surface S2. sell. The base member 21 may be made of metal such as aluminum or an aluminum alloy, but may be made of other materials. The auxiliary member 22 can be fixed to the base member 21 by an adhesive 23, for example. The thermal conductivity of the adhesive 23 is preferably higher than that of the base member 21 . In other examples, the auxiliary member 22 may be fixed to the base member 21 by fasteners such as screws, may be fixed to the base member 21 by welding, or may be fixed to the base member 21 by other methods. May be fixed.

The auxiliary member 22 may include a plate-like portion extending along the second surface S<b>2 of the base member 21 . The coefficient of thermal expansion of the auxiliary member 22 is different from that of the base member 21 , and the heat generated by the exposure light 4 can warp the shutter blades 2 . This warping can improve the rigidity of the shutter blade 2, for example, the rigidity in the Z direction. This is advantageous for high speed driving of the shutter blades 2 .

It is preferable that the thermal conductivity of the auxiliary member 22 is higher than that of the base member 21 . This is advantageous for suppressing temperature rise of the shutter blades 2 due to irradiation of the exposure light 4 . The density of the auxiliary member 22 is preferably smaller than that of the base member 21 . This is advantageous for reducing the weight of the shutter blade 2 and driving the shutter blade 2 at high speed. It is preferable that the reflectance of the auxiliary member 22 is smaller than the reflectance of the base member 21 . This is advantageous in preventing reflection of the exposure light 4 that may enter the auxiliary member 22 due to multiple reflection, thereby preventing the exposure light from leaking from the shutter device 1 to the side of the object to be exposed.

The auxiliary member 22 can be made of graphite, for example. Alternatively, the auxiliary member 22 is preferably made of carbon fiber, and the direction of the carbon fiber is preferably along the circumferential direction C around the rotation axis RA. The heat generated by the exposure light 4 can warp the shutter blades 2 . This can be given by the difference between the thermal expansion coefficients of the auxiliary member 22 and the base member 21 . In this state, the amount of warpage of the shutter blades 2 (the amount of displacement in the direction parallel to the axis of rotation RA) in a cross section along the circumferential direction around the axis of rotation RA is It is preferably larger than the amount of warp of the shutter blade 2 in the cross section. This can contribute to improving the rigidity of the shutter blade 2 that is rotationally driven by the rotating mechanism 3 .

FIG. 3 shows a configuration example of the shutter device 1 of the second embodiment. Matters not mentioned in the second embodiment may follow the first embodiment. The auxiliary member 22 may include one or more stripes ST. The dimension in the circumferential direction C of one or a plurality of stripe parts ST is larger than the dimension in the radial direction R. The stripes ST can have an arc shape, for example. The heat generated by the exposure light 4 can warp the shutter blades 2 . In such a state, the one or more stripes ST are such that the amount of warpage of the shutter blades 2 in the cross section along the circumferential direction around the rotation axis RA is the shutter in the cross section along the radial direction around the rotation axis RA. It can act so as to be greater than the amount of warpage of the blades 2 . In the example of FIG. 3, the number of stripes ST between the rotation axis RA and the outermost edge of the shutter blade 2 is three. can be arbitrarily determined as follows:

FIG. 8 shows an analysis example of the shutter blade 2 of the shutter device 1 of the second embodiment. In this example, the base member 21 is made of an aluminum alloy, and the auxiliary member 22 is made of graphite. The shutter blade 2 was designed so as not to warp at 23°C. FIG. 8 shows deformation of the shutter blade 2 when the temperature of the shutter blade 2 rises from 23.degree. C. to 80.degree. In FIG. 8 , the horizontal axis is the position in the circumferential direction R, and the vertical axis is the position in the optical axis direction (Z direction) of the exposure light 4 . R = 0 mm is the amount of deformation on the circumference at a distance of r + 0 mm from the axis of rotation RA, R = 3 mm is the amount of deformation on the circumference of a circle at a distance of r + 30 mm from the axis of rotation RA, and R = 60 mm is the amount of deformation on the circumference of the axis of rotation RA. shows the amount of deformation on the circumference of a circle at a distance of r+60 mm from . r is the radius of the hub HB that supports the shutter blades 2; In other words, R=0 mm is the amount of warpage (the amount of displacement in the Z direction) of the shutter blade 2 in a cross section along the circumferential direction of a circle at a distance of r+0 mm from the rotation axis RA. Also, R=30 mm is the amount of warpage (the amount of displacement in the Z direction) of the shutter blade 2 in a cross section along the circumferential direction of a circle at a distance of r+30 mm from the rotation axis RA. Also, R=60 mm is the amount of warpage (the amount of displacement in the Z direction) of the shutter blade 2 in a cross section along the circumferential direction of a circle at a distance of r+60 mm from the rotation axis RA. "Warp amount" in FIG. 8 indicates the maximum value of the warp amount of the shutter blade 2 in a cross section along the circumferential direction around the rotation axis RA. Due to such warping, the second moment of area of the shutter blade 2 is increased, and the rigidity is improved. In the analysis example, the eigenfrequency of the shutter blade 2 after deformation (80° C.) due to the heat generated by the exposure light 4 is compared with the natural frequency of the shutter blade 2 before deformation (23° C.) due to the heat generated by the exposure light 4. The frequency was 1.26 times. In other words, the rigidity of the shutter blade 2 was improved by the warp given by heat.

FIG. 4 shows a configuration example of the shutter blade 2 of the shutter device 1 of the third embodiment. Matters not mentioned in the third embodiment may follow the first or second embodiment. The auxiliary member 22 includes a plate-like portion PT extending along the second surface S2 of the base member 21, and the plate-like portion PT may have one or more grooves T. As shown in FIG. In one example, the one or more grooves T are larger in dimension in the circumferential direction C than in the radial direction R. The heat generated by the exposure light 4 can warp the shutter blades 2 . In such a state, the one or more grooves T are such that the amount of warpage of the shutter blade 2 in a cross section along the circumferential direction around the rotation axis RA 2 can act to increase the amount of warpage. Also in the third embodiment, the plate-like portion PT defined by one or more grooves T can be understood as having one or more stripe portions ST.

FIG. 5 shows a configuration example of the shutter blade 2 of the shutter device 1 of the fourth embodiment. The fourth embodiment is a modification of the third embodiment, and matters not mentioned in the fourth embodiment can follow the third embodiment. The auxiliary member 22 includes a plate-like portion PT extending along the second surface S2 of the base member 21, and the plate-like portion PT may have one or more grooves T. As shown in FIG. In one example, the one or more grooves T are larger in dimension in the circumferential direction C than in the radial direction R.

FIG. 6 shows a configuration example of the shutter blade 2 of the shutter device 1 of the fifth embodiment. Matters not mentioned in the fifth embodiment may follow the first to fourth embodiments. Also in the fifth embodiment, the auxiliary member 22 has one or more stripes ST and/or one or more grooves T. As shown in FIG. One or more stripes ST may have a rectangular shape.

FIG. 7 shows a configuration example of the shutter blade 2 of the shutter device 1 of the sixth embodiment. Matters not mentioned in the sixth embodiment may follow the first to fifth embodiments. Also in the sixth embodiment, the auxiliary member 22 has one or more stripe portions ST and/or one or more grooves T. FIG. In addition, in the sixth embodiment, the auxiliary member 22 can include connecting portions CN that connect a plurality of stripe portions ST.

FIG. 9 illustrates an exposure apparatus 100 incorporating the shutter device 1 illustrated as the first to sixth embodiments. The exposure device 100 exposes the photosensitive material PR by irradiating the substrate S coated with the photosensitive material PR with exposure light through the original plate R. FIG. The exposure apparatus 100 includes an illumination optical system 110 that illuminates the original R, and the illumination optical system 110 incorporates the shutter device 1 .

The exposure apparatus 100 can be used for manufacturing articles such as semiconductor devices. An article manufacturing method of one embodiment includes a coating step of coating a substrate S with a photosensitive material, an exposure step of exposing the substrate S that has undergone the coating step with an exposure apparatus 100, and a photosensitive material of the substrate S that has undergone the exposure step. It may include a developing step of developing and a processing step of processing the substrate S that has undergone the developing step. The processing step can be, for example, an ion implantation step, an etching step, or the like. The article manufacturing method can manufacture an article from the substrate S that has undergone such steps.

FIG. 10 illustrates a film forming apparatus 200 incorporating the shutter device 1 illustrated as the first to sixth embodiments. The film forming apparatus 200 forms a film of the cured composition IM on the substrate S by bringing the mold M into contact with the composition IM on the substrate S and curing the composition IM by irradiation with the exposure light 4 . do. The film forming apparatus 200 includes an optical system 210 for irradiating the composition IM with the exposure light 4, and the optical system 210 incorporates the shutter device 1. As shown in FIG. The film forming apparatus 200 is, for example, an imprint apparatus that forms a pattern of the cured product of the composition IM on the substrate S, or forms a planarization film of the cured product of the composition IM on the substrate S. It can be configured as a planarization device.

The film forming apparatus 200 can be used to manufacture articles such as semiconductor devices. An article manufacturing method of one embodiment includes a film forming step of forming a film on a substrate S by the film forming apparatus 200, and a processing step of processing the substrate S that has undergone the film forming step. Articles may be manufactured from the substrate S.

Although preferred embodiments of the present invention have been described above, the present invention is not limited to these embodiments, and various modifications and changes are possible within the scope of the gist thereof.

1: shutter device, 2: shutter blade, 3: rotation mechanism, 4: exposure light, 21: base member, 22: auxiliary member, ST: stripe portion, T: groove, PT: plate member

Claims (32)

A shutter device that opens and closes an optical path of light with a shutter blade,
the shutter blade includes a base member having a first surface on which the light is incident and a second surface opposite to the first surface; and an auxiliary member coupled to the second surface;
The thermal expansion coefficient of the auxiliary member is different from that of the base member, and the heat generated by the light causes the shutter blade to warp.
A shutter device characterized by: further comprising a rotation mechanism that rotates the shutter blades around a rotation axis;
2. The shutter device according to claim 1, characterized in that: In a state in which the shutter blades are warped by the heat, the amount of warpage of the shutter blades in a cross section along the circumferential direction around the rotation axis is determined by the amount of warpage of the shutter blades in a cross section along the radial direction around the rotation axis. greater than the amount of warpage of
3. The shutter device according to claim 2, characterized in that: The auxiliary member includes one or more stripes, and the one or more stripes have a dimension in the circumferential direction larger than a dimension in the radial direction.
4. The shutter device according to claim 3, characterized in that: The auxiliary member further includes a connecting portion that connects the plurality of stripe portions,
5. The shutter device according to claim 4, characterized in that: The one or more stripes have an arc shape,
6. The shutter device according to claim 4 or 5, characterized in that: The one or more stripes have a rectangular shape,
6. The shutter device according to claim 4 or 5, characterized in that: wherein the auxiliary member includes a plate-like portion extending along the second surface of the base member, the plate-like portion having one or more grooves;
4. The shutter device according to claim 3, characterized in that: The one or more grooves have an arc shape,
9. The shutter device according to claim 8, characterized in that: the one or more grooves have a rectangular shape;
9. The shutter device according to claim 8, characterized in that: The auxiliary member is made of carbon fiber, and the direction of the carbon fiber is along the circumferential direction.
11. The shutter device according to any one of claims 3 to 10, characterized in that: The auxiliary member is made of graphite,
The shutter device according to any one of claims 1 to 10, characterized in that: The thermal conductivity of the auxiliary member is higher than the thermal conductivity of the base member,
The shutter device according to any one of claims 1 to 10, characterized in that: the density of the auxiliary member is less than the density of the base member;
The shutter device according to any one of claims 1 to 10, characterized in that: the reflectance of the auxiliary member is smaller than the reflectance of the base member;
The shutter device according to any one of claims 1 to 10, characterized in that: the rigidity of the shutter blade after being deformed by the heat generated by the light is higher than the rigidity of the shutter blade before being deformed by the heat generated by the light;
16. The shutter device according to any one of claims 1 to 15, characterized in that: A shutter device comprising a shutter blade that opens and closes an optical path of light , and a rotation mechanism that rotates the shutter blade around a rotation axis,
the shutter blade includes a base member having a first surface on which light is incident and a second surface opposite to the first surface; and an auxiliary member coupled to the second surface;
The auxiliary member includes one or more stripes, and the one or more stripes have a dimension in a circumferential direction around the rotation axis greater than a dimension in a radial direction about the rotation axis.
A shutter device characterized by: The auxiliary member further includes a connecting portion that connects the plurality of stripe portions,
18. The shutter device according to claim 17 , characterized in that: The one or more stripes have an arc shape,
19. The shutter device according to claim 17 or 18 , characterized in that: The one or more stripes have a rectangular shape,
19. The shutter device according to claim 17 or 18 , characterized in that: A shutter device comprising a shutter blade that opens and closes an optical path of light , and a rotation mechanism that rotates the shutter blade around a rotation axis,
the shutter blade includes a base member having a first surface on which light is incident and a second surface opposite to the first surface; and an auxiliary member coupled to the second surface;
The auxiliary member includes a plate-like portion extending along the second surface of the base member, the plate-like portion having one or more grooves, the one or more grooves extending along the rotation axis. is greater than the dimension in the radial direction about the axis of rotation;
A shutter device characterized by: The one or more grooves have an arc shape,
22. The shutter device according to claim 21 , characterized in that: the one or more grooves have a rectangular shape;
22. The shutter device according to claim 21 , characterized in that: A shutter device that opens and closes an optical path of light with a shutter blade,
the shutter blade includes a base member having a first surface on which the light is incident and a second surface opposite to the first surface; and an auxiliary member coupled to the second surface;
Thermal conductivity of the auxiliary member is higher than thermal conductivity of the base member,
The auxiliary member is made of carbon fiber, and the direction of the carbon fiber is along the circumferential direction around the rotation axis that rotates the shutter blade.
A shutter device characterized by: A shutter device that opens and closes an optical path of light with a shutter blade,
the shutter blade includes a base member having a first surface on which the light is incident and a second surface opposite to the first surface; and an auxiliary member coupled to the second surface;
Thermal conductivity of the auxiliary member is higher than thermal conductivity of the base member,
The auxiliary member is made of graphite,
A shutter device characterized by: wherein the auxiliary member is fixed to the base member by an adhesive;
26. The shutter device according to claim 24 or 25, characterized in that: The thermal conductivity of the adhesive is higher than the thermal conductivity of the base member,
27. The shutter device according to claim 26 , characterized in that: The heat generated by the light causes the shutter blades to warp,
the rigidity of the shutter blade after being deformed by the heat generated by the light is higher than the rigidity of the shutter blade before being deformed by the heat generated by the light;
28. The shutter device according to any one of claims 24 to 27, characterized in that: An exposure device that exposes a photosensitive material by irradiating a substrate coated with the photosensitive material with light through an original plate,
The shutter device according to any one of claims 1 to 28 arranged to open and close an optical path of light in an illumination optical system that illuminates the original,
An exposure apparatus characterized by: a coating step of coating a photosensitive material on a substrate;
an exposure step of exposing the substrate that has undergone the coating step with an exposure apparatus according to claim 29 ;
a developing step of developing the photosensitive material of the substrate that has undergone the exposure step;
and a processing step of processing the substrate that has undergone the developing step,
A method for manufacturing an article, comprising manufacturing an article from the substrate. A film forming apparatus for forming a film of a cured product of the composition on a substrate by bringing a mold into contact with the composition on the substrate and curing the composition by light irradiation,
The shutter device according to any one of claims 1 to 28 arranged to open and close the optical path of light in an optical system for irradiating the composition with light,
A film forming apparatus characterized by: a film forming step of forming a film on a substrate by the film forming apparatus according to claim 31 ;
a processing step of processing the substrate that has undergone the film forming step;
A method for manufacturing an article, comprising manufacturing an article from the substrate.

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