TW202046022A - Shutter device, exposure device, film forming device and method of manufacturing goods enhancing strength while reducing weight of shutter blade - Google Patents

Abstract

A shutter device opens and closes an optical path of exposure light through shutter blades. The shutter blade comprises a base component having a first surface in which exposure light is incident and a second surface at a side opposite to the first surface, and an auxiliary component combined to the second surface. The thermal expansion rate of the auxiliary component is different from the thermal expansion rate of the base component. The shutter blade is bent by heat generated from the exposure light.

Description

Shield device, exposure device, film forming device and article manufacturing method

The present invention relates to a shutter device, an exposure device, a film forming device, and an article manufacturing method.

In manufacturing equipment such as an exposure device that exposes a substrate via an original plate, and a film forming device that contacts a composition on the substrate with a mold and cures the composition through light irradiation, it is possible to perform light path The shutter device is used for opening and closing. In Patent Document 1, it has been described that the shutter blade is formed by passing through a high heat transfer material such as aluminum, aluminum is vapor-deposited on the incident side of light, and black paint is applied to the opposite side. [Prior Technical Literature] [Patent Literature]

[Patent Document 1] JP 2004-240097 A

[The problem to be solved by the invention]

With regard to manufacturing equipment such as exposure equipment and film forming equipment, it is necessary to increase the speed of the shutter blades in order to increase the throughput. For this reason, it is necessary to increase the strength while reducing the weight of the shutter blade.

The object of the present invention is to provide a technique that is advantageous in terms of improving the strength while reducing the weight of the shutter blade. [Technical means to solve the problem]

One aspect of the present invention relates to a shutter device that opens and closes a light path of exposure light through a shutter blade, the shutter blade including a first surface on which exposure light enters and a side opposite to the first surface The second surface of the base member and the auxiliary member bonded to the second surface, the coefficient of thermal expansion of the auxiliary member is different from the coefficient of thermal expansion of the base member, and the heat generated by the exposure light causes the shade The blade is bent. [Compared with the effects of previous technologies]

According to the present invention, an advantageous technology is provided in order to reduce the weight of the shader blade and increase the strength.

Hereinafter, embodiments will be described in detail with reference to the drawings. In addition, the following embodiments are not inventors who limit the scope of patent applications. Although a plurality of features are described in the embodiment, it is not limited to that all of the plurality of features are required for the invention, and a plurality of features can be combined arbitrarily. In addition, in the drawings, the same or the same components are denoted by the same reference symbols, and repeated descriptions are omitted.

FIG. 1 shows a configuration example of the shutter device 1 of the first embodiment. The shutter device 1 may be configured to include a shutter blade 2 and open and close the light path of the exposure light 4 through the shutter blade 2. The shutter device 1 may be provided with a driving mechanism for driving the shutter blade 2, for example, may be provided with a rotation mechanism 3 for rotating the shutter blade 2 around a rotation axis RA. The rotation axis RA may be parallel to the optical axis (principal ray) of the exposure light 4, for example. In addition, the driving direction of the shutter blade 2 may be a linear direction. In the following, the directions can be explained through the XYZ coordinate system in which the direction parallel to the optical axis of the exposure light 4 is the Z direction.

In FIG. 2, a configuration example of the shutter blade 2 of the shutter device 1 of the first embodiment is shown. In the example shown in FIG. 2, two shutter blades 2 are provided with respect to the hub HB. The number of shutter blades 2 can be arbitrarily determined. The shutter blade 2 may include a base member 21 having a first surface S1 on which the exposure light 4 enters, and a second surface S2 opposite to the first surface S1, and an auxiliary member 22 coupled to the second surface S2. The base member 21 may be made of metals such as aluminum or aluminum alloy, but may be made of other materials. The auxiliary member 22 can be fixed to the base member 21 through an adhesive 23, for example. It is preferable that the thermal conductivity of the adhesive 23 be higher than the thermal conductivity of the base member 21. In other examples, the auxiliary member 22 can be fixed to the base member 21 by fasteners such as screws, can be fixed to the base member 21 by welding, or can be fixed to the base member 21 by other methods.

The auxiliary member 22 may include a plate-shaped portion that widens along the second surface S2 of the base member 21. The thermal expansion rate of the auxiliary member 22 is different from the thermal expansion rate of the base member 21, and the heat generated by the exposure light 4 can cause the shutter blade 2 to bend. Through this bending, the rigidity of the shutter blade 2, for example, the rigidity in the Z direction can be improved. This facilitates the high-speed drive of the shutter blade 2.

It is preferable that the thermal conductivity of the auxiliary member 22 be higher than the thermal conductivity of the base member 21. This is advantageous in order to suppress the temperature rise of the shutter blade 2 caused by the irradiation of the exposure light 4. It is preferable that the density of the auxiliary member 22 be smaller than the density of the base member 21. This is advantageous in order to reduce the weight of the shutter blade 2 and drive the shutter blade 2 at a high speed. It is preferable that the reflectance of the auxiliary member 22 be smaller than the reflectance of the base member 21. This is advantageous in order to prevent reflection of the exposure light 4 that may be incident on the auxiliary member 22 due to multiple reflections, and to prevent the exposure light from leaking from the shutter device 1 to the side of the exposure target.

The auxiliary member 22 can be made of graphite, for example. Alternatively, the auxiliary member 22 is formed of carbon fiber, and the direction of the carbon fiber is preferably along the circumferential direction C around the rotation axis RA. It may be in a state where the shutter blade 2 is bent by the heat generated by the exposure light 4. This may be caused by the difference between the thermal expansion rate of the auxiliary member 22 and the thermal expansion rate of the base member 21. In this state, the amount of curvature (the amount of displacement in the direction parallel to the rotation axis RA) of the shader blade 2 in the cross section in the circumferential direction around the rotation axis RA is greater than that along the radius centered on the rotation axis RA It is preferable that the amount of curvature of the shutter blade 2 in the cross section of the direction is large. This can contribute to the improvement of the rigidity of the shutter blade 2 rotatably driven by the rotation mechanism 3.

FIG. 3 shows a configuration example of the shutter device 1 of the second embodiment. Matters not mentioned in the second embodiment can follow the first embodiment. The auxiliary member 22 may include one or a plurality of elongated portions ST. One or more elongated portions ST have a size in the circumferential direction C that is larger than the size in the radial direction R. The long strip ST may have an arc shape, for example. The heat generated by the exposure light 4 causes the shutter blade 2 to have a curved shape. In such a state, one or a plurality of elongated portions ST can act as the curvature of the shader blade 2 in the cross section along the circumferential direction of the rotation axis RA than that along the radial direction centered on the rotation axis RA The amount of curvature of the shader blade 2 in the section is large. In the example of FIG. 3, although the number of elongated portions ST between the rotation axis RA and the outermost peripheral end of the shutter blade 2 is three, the number can be arbitrarily determined as 2, 3, 4, 5... etc. .

FIG. 8 shows an analysis example of the shutter blade 2 of the shutter device 1 of the second embodiment. In this example, the base member 21 is made of aluminum alloy, and the auxiliary member 22 is made of graphite. The shutter blade 2 is designed to not bend at 23°C. Fig. 8 shows the deformation of the shutter blade 2 when the temperature of the shutter blade 2 rises from 23°C to 80°C. In FIG. 8, the horizontal axis is the position in the circumferential direction R, and the vertical axis is the position in the optical axis direction (Z direction) of the exposure light 4. R=0mm represents the amount of deformation on the circumference of a circle with a distance of r+0mm from the rotation axis RA, R=3mm represents the amount of deformation on the circumference of a circle with a distance of r+30mm from the rotation axis RA, R=60mm represents the amount of deformation from the rotation The distance of the axis RA is the amount of deformation on the circumference of a circle of r+60 mm. r is the radius of the hub HB supporting the shutter blade 2. In other words, R=0 mm is the amount of curvature of the shutter blade 2 (the amount of displacement in the Z direction) in a cross section along the circumferential direction of a circle with a distance of r+0 mm from the rotation axis RA. In addition, R=30 mm is the amount of curvature of the shutter blade 2 (the amount of displacement in the Z direction) in a cross section along the circumferential direction of a circle with a distance of r+30 mm from the rotation axis RA. In addition, R=60mm is the amount of curvature of the shutter blade 2 (amount of displacement in the Z direction) in a cross section along the circumferential direction of a circle with a distance of r+60mm from the rotation axis RA. The "bending amount" in FIG. 8 shows the maximum value of the bending amount of the shutter blade 2 in the cross section along the circumferential direction around the rotation axis RA. Through such bending, the secondary axial moment of the cross section of the shutter blade 2 is increased, and the rigidity is improved. In the analysis example, compared to the natural frequency of the shutter blade 2 before deformation (23°C) caused by the heat generated by the exposure light 4, the shielding after the deformation (80°C) caused by the heat generated by the exposure light 4 The natural vibration frequency of the blade 2 becomes 1.26 times. That is, the bending caused by heat increases the rigidity of the shutter blade 2.

FIG. 4 shows a configuration example of the shutter blade 2 of the shutter device 1 of the third embodiment. Matters not mentioned in the third embodiment can follow the first or second embodiment. The auxiliary member 22 includes a plate-shaped portion PT that widens along the second surface S2 of the base member 21, and the plate-shaped portion PT may have one or more grooves T. In one example, one or more grooves T have a size in the circumferential direction C larger than the size in the radial direction R. It may be in a state where the shutter blade 2 is bent by the heat generated by the exposure light 4. In such a state, one or more grooves T can function as the amount of curvature of the shader blade 2 in a section along the circumferential direction around the rotation axis RA than in a section along the radius direction around the rotation axis RA. The bending amount of the shutter blade 2 is large. In the third embodiment, the plate-shaped portion PT defined by one or more grooves T can also be understood as having one or more elongated portions ST.

FIG. 5 shows a configuration example of the shutter blade 2 of the shutter device 1 of the fourth embodiment. The fourth embodiment is a modification of the third embodiment, and matters not mentioned in the fourth embodiment can follow the third embodiment. The auxiliary member 22 includes a plate-shaped portion PT that widens along the second surface S2 of the base member 21, and the plate-shaped portion PT may have one or more grooves T. In one example, one or more grooves T have a size in the circumferential direction C larger than the size in the radial direction R.

FIG. 6 shows a configuration example of the shutter blade 2 of the shutter device 1 of the fifth embodiment. Matters not mentioned in the fifth embodiment can follow the first to fourth embodiments. In the fifth embodiment, the auxiliary member 22 also has one or more elongated portions ST and/or one or more grooves T. One or a plurality of long strip parts ST may be rectangular.

FIG. 7 shows a configuration example of the shutter blade 2 of the shutter device 1 of the sixth embodiment. Matters not mentioned in the sixth embodiment can follow the first to fifth embodiments. In the sixth embodiment, the auxiliary member 22 also has one or more elongated portions ST and/or one or more grooves T. In addition, in the sixth embodiment, the auxiliary member 22 may include a connecting portion CN connecting a plurality of elongated portions ST.

In FIG. 9, the exposure apparatus 100 in which the shutter device 1 exemplified as the first to sixth embodiments is incorporated is illustrated. The exposure device 100 irradiates the substrate S on which the photosensitive material PR is applied with exposure light via the original plate R to expose the photosensitive material PR. The exposure apparatus 100 includes an illumination optical system 110 that illuminates the original plate R, and the shutter device 1 is incorporated in the illumination optical system 110.

The exposure apparatus 100 can be used in the manufacture of articles such as semiconductor devices. The article manufacturing method of one embodiment may include a coating process of applying a photosensitive material to the substrate S, an exposure process of exposing the substrate S that has undergone the coating process through the exposure device 100, and an exposure process of the substrate S that has undergone the exposure process. A development program in which the photosensitive material is developed, and a processing program in which the substrate S that has undergone the development program is processed. The processing procedure may be, for example, an ion implantation procedure, an etching procedure, and the like. The article manufacturing method can manufacture articles from the substrate S that has undergone such procedures.

In FIG. 10, the film forming apparatus 200 which incorporated the shutter apparatus 1 illustrated as 1st-6th embodiment is illustrated. The film forming apparatus 200 brings the mold M into contact with the composition IM on the substrate S, and cures the composition IM through the irradiation of the exposure light 4 to form a film of the cured product of the composition IM on the substrate S. The film forming apparatus 200 includes an optical system 210 that irradiates the composition IM with exposure light 4, and the shutter device 1 is incorporated in the optical system 210. The film forming apparatus 200 can be configured, for example, as an imprint apparatus that forms a pattern formed by a cured product of the composition IM on the substrate S, or a flat surface formed by a cured product of the composition IM is formed on the substrate S. The flattening device of the film.

The film forming apparatus 200 can be used in the manufacture of articles such as semiconductor devices. The article manufacturing method of one embodiment includes a film formation process of forming a film on the substrate S through the film forming apparatus 200 and a processing process of processing the substrate S that has undergone the film formation process. The article can be manufactured from the substrate S that has undergone such a process .

Although the preferred embodiments of the present invention have been described above, the present invention is not limited to these embodiments, and various changes and modifications can be made within the scope of the gist.

1: shader device 2: shader blade 3: Rotating mechanism 4: Exposure light 21: base material 22: auxiliary members ST: Long section T: groove PT: Plate structure

[Fig. 1] A diagram showing the configuration of the shutter device of the first embodiment. [Fig. 2] A diagram showing the structure of the shutter blade of the shutter device of the first embodiment. [Fig. 3] A diagram showing the structure of the shutter blade of the shutter device of the second embodiment. [Fig. 4] A diagram showing the structure of the shutter blade of the shutter device of the third embodiment. [Fig. 5] A diagram showing the structure of the shutter blade of the shutter device of the fourth embodiment. [Fig. 6] A diagram showing the structure of the shutter blade of the shutter device of the fifth embodiment. [Fig. 7] A diagram showing the structure of the shutter blade of the shutter device of the sixth embodiment. [Fig. 8] A diagram showing an analysis example of the shutter blade of the shutter device of the second embodiment. [Fig. 9] A diagram exemplifying the configuration of the exposure device. [Fig. 10] A diagram illustrating the structure of a film forming apparatus.

2: shader blade

21: base material

22: auxiliary members

23: Adhesive

C: circumferential direction

HB: Wheel hub

RA: Around the axis of rotation

S1: Side 1

S2: Side 2

Claims (29)

A shader device that opens and closes the light path of exposure light through shader blades, The shutter blade includes a base member having a first surface on which exposure light enters and a second surface opposite to the first surface, and an auxiliary member joined to the second surface, The thermal expansion coefficient of the auxiliary member is different from the thermal expansion coefficient of the base member, and the heat generated by the exposure light causes the shutter blade to bend. The shutter device according to claim 1, further comprising a rotation mechanism that rotates the shutter blades around a rotation axis. The shader device of claim 2, wherein, in a state where the shader blade is bent by the heat, the bending amount of the shader blade in a section along the circumferential direction of the rotation axis is greater than that of The amount of curvature of the shutter blade in the cross section in the radial direction with the rotation axis as the center is large. The shader device of claim 3, wherein the auxiliary member includes one or more elongated portions, and the size of the one or more elongated portions in the circumferential direction is larger than the size in the radial direction. The shader device of claim 4, wherein the auxiliary member further includes a connecting portion that connects the plurality of elongated portions. The shutter device of claim 4, wherein the one or more long strips are arc-shaped. The shader device of claim 4, wherein the one or more elongated portions are rectangular. The shade device according to claim 3, wherein the auxiliary member includes a plate-shaped portion that widens along the second surface of the base member, and the plate-shaped portion has one or more grooves. The shutter device of claim 8, wherein the aforementioned one or more grooves are arc-shaped. The shader device of claim 8, wherein the aforementioned one or more grooves are rectangular. The shade device of claim 3, wherein the auxiliary member is made of carbon fiber, and the direction of the carbon fiber is along the circumferential direction. The shutter device of claim 1, wherein the auxiliary member is made of graphite. The shade device of claim 1, wherein the thermal conductivity of the auxiliary member is higher than the thermal conductivity of the base member. The shader device of claim 1, wherein the density of the auxiliary member is lower than the density of the base member. The shader device of claim 1, wherein the reflectance of the auxiliary member is lower than the reflectance of the base member. A shader device is provided with a shader blade that opens and closes a light path of exposure light, and a rotation mechanism that rotates the shader blade about a rotation axis, The shutter blade includes a base member having a first surface on which exposure light enters and a second surface opposite to the first surface, and an auxiliary member joined to the second surface, The auxiliary member includes one or more elongated portions, and the size of the one or more elongated portions in the circumferential direction around the rotation axis is larger than the size in the radial direction centered on the rotation axis. The shader device of claim 16, wherein the auxiliary member further includes a connecting part that connects the plurality of elongated parts. Such as the shader device of claim 16, wherein the one or more elongated portions are arc-shaped. The shader device of claim 16, wherein the one or more elongated portions are rectangular. A shader device is provided with a shader blade that opens and closes a light path of exposure light, and a rotation mechanism that rotates the shader blade about a rotation axis, The shutter blade includes a base member having a first surface on which exposure light enters and a second surface opposite to the first surface, and an auxiliary member joined to the second surface, The auxiliary member includes a plate-shaped portion that widens along the second surface of the base member, the plate-shaped portion has one or more grooves, and the one or more grooves are in the circumferential direction around the rotation axis The size of is larger than the size in the radial direction centered on the aforementioned rotating shaft. The shutter device of claim 20, wherein the aforementioned 1 or more grooves are arc-shaped. The shutter device of claim 20, wherein the one or more grooves are rectangular. A shader device that opens and closes the light path of exposure light through shader blades, The shutter blade includes a base member having a first surface on which exposure light enters and a second surface opposite to the first surface, and an auxiliary member joined to the second surface, The thermal conductivity of the aforementioned auxiliary member is higher than the thermal conductivity of the aforementioned base member. The shutter device of claim 23, wherein the auxiliary member is fixed to the base member through an adhesive. The shutter device of claim 24, wherein the thermal conductivity of the adhesive is higher than the thermal conductivity of the base member. An exposure device that irradiates a substrate coated with a photosensitive material with exposure light through an original plate to expose the photosensitive material, The shader device according to any one of claims 1 to 15 is incorporated in an illumination optical system that illuminates the aforementioned original plate. An article manufacturing method, which includes: The coating process of coating the photosensitive material on the substrate, The exposure process in which the aforementioned substrate subjected to the aforementioned coating process is exposed through the exposure device as in claim 26, A development process of developing the aforementioned photosensitive material of the aforementioned substrate that has undergone the aforementioned exposure process, and A processing procedure for processing the aforementioned substrate that has undergone the aforementioned development procedure, An article is manufactured from the aforementioned substrate. A film forming device is a device that brings a mold into contact with a composition on a substrate and cures the composition through exposure of exposure light to form a film of a cured product of the composition on the substrate, The shutter device of any one of claims 1 to 25 is incorporated in an optical system that irradiates the composition with exposure light. An article manufacturing method, which includes: A film forming procedure for forming a film on a substrate through a film forming apparatus such as claim 28, and A processing procedure for processing the aforementioned substrate that has undergone the aforementioned film formation procedure, An article is manufactured from the aforementioned substrate.

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