TW446687B - Method and apparatus for producing ultra pure water - Google Patents

Method and apparatus for producing ultra pure water Download PDF

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Publication number
TW446687B
TW446687B TW86102030A TW86102030A TW446687B TW 446687 B TW446687 B TW 446687B TW 86102030 A TW86102030 A TW 86102030A TW 86102030 A TW86102030 A TW 86102030A TW 446687 B TW446687 B TW 446687B
Authority
TW
Taiwan
Prior art keywords
water
treated
pure water
ultra pure
producing ultra
Prior art date
Application number
TW86102030A
Other languages
English (en)
Inventor
Mitsugu Abe
Shuichi Chino
Yutaka Nakamura
Masahiko Kogure
Original Assignee
Nomura Micro Science Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nomura Micro Science Kk filed Critical Nomura Micro Science Kk
Application granted granted Critical
Publication of TW446687B publication Critical patent/TW446687B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Water Treatments (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
  • Degasification And Air Bubble Elimination (AREA)
TW86102030A 1996-02-20 1997-02-20 Method and apparatus for producing ultra pure water TW446687B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3190796 1996-02-20

Publications (1)

Publication Number Publication Date
TW446687B true TW446687B (en) 2001-07-21

Family

ID=12344075

Family Applications (1)

Application Number Title Priority Date Filing Date
TW86102030A TW446687B (en) 1996-02-20 1997-02-20 Method and apparatus for producing ultra pure water

Country Status (3)

Country Link
JP (2) JP4294731B2 (zh)
TW (1) TW446687B (zh)
WO (1) WO1997030939A1 (zh)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI408107B (zh) * 2004-03-31 2013-09-11 Kurita Water Ind Ltd 超純水製造裝置及其運轉方法
TWI460134B (zh) * 2005-10-06 2014-11-11 Pionetics Corp 流體之電化學離子交換處理
CN109906206A (zh) * 2016-11-18 2019-06-18 奥加诺株式会社 水处理方法及装置
CN114269696A (zh) * 2019-10-07 2022-04-01 栗田工业株式会社 Toc处理装置和处理方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4264681B2 (ja) * 1999-04-20 2009-05-20 栗田工業株式会社 電子材料のウェット洗浄工程用オゾン水の製造装置
JP5211414B2 (ja) * 2001-03-12 2013-06-12 栗田工業株式会社 超純水製造装置
JP2002282850A (ja) 2001-03-26 2002-10-02 Mitsubishi Electric Corp 超純水製造装置
JP5280038B2 (ja) * 2007-11-06 2013-09-04 野村マイクロ・サイエンス株式会社 超純水製造装置
JP5512357B2 (ja) * 2010-04-05 2014-06-04 オルガノ株式会社 純水製造方法及び装置
JP5512358B2 (ja) * 2010-04-05 2014-06-04 オルガノ株式会社 純水製造方法及び装置
JP5720122B2 (ja) * 2010-06-10 2015-05-20 岩崎電気株式会社 超純水製造システム
JP6038597B2 (ja) * 2012-11-05 2016-12-07 野村マイクロ・サイエンス株式会社 純水製造システム
JP6029948B2 (ja) * 2012-11-21 2016-11-24 野村マイクロ・サイエンス株式会社 純水製造方法及び純水製造システム
WO2014208505A1 (ja) * 2013-06-25 2014-12-31 株式会社日本フォトサイエンス 液体処理装置および方法
JP2018183761A (ja) * 2017-04-27 2018-11-22 野村マイクロ・サイエンス株式会社 超純水製造システム及び超純水製造方法
JP7513213B2 (ja) * 2022-07-14 2024-07-09 栗田工業株式会社 超純水製造装置及び超純水製造装置の運転方法
JP2024058285A (ja) * 2022-10-14 2024-04-25 栗田工業株式会社 純水製造装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0794036B2 (ja) * 1988-07-05 1995-10-11 東レ株式会社 超純水の製造方法
JP3110034B2 (ja) * 1990-06-06 2000-11-20 中野 浩二 有機物と溶存酸素とを同時に除去する方法
JPH05293494A (ja) * 1992-04-21 1993-11-09 Kurita Water Ind Ltd 純水製造装置
KR960016302B1 (ko) * 1992-05-15 1996-12-09 마쯔시다덴기산교 가부시기가이샤 순수(純水)의 제조장치 및 순수의 제조방법
JPH0639366A (ja) * 1992-07-22 1994-02-15 Japan Organo Co Ltd 超純水製造方法、及びその装置
JPH06198279A (ja) * 1993-01-05 1994-07-19 Japan Organo Co Ltd 紫外線分解装置
JP3262949B2 (ja) * 1993-09-13 2002-03-04 野村マイクロ・サイエンス株式会社 低濃度有機性廃水の処理装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI408107B (zh) * 2004-03-31 2013-09-11 Kurita Water Ind Ltd 超純水製造裝置及其運轉方法
TWI460134B (zh) * 2005-10-06 2014-11-11 Pionetics Corp 流體之電化學離子交換處理
CN109906206A (zh) * 2016-11-18 2019-06-18 奥加诺株式会社 水处理方法及装置
CN109906206B (zh) * 2016-11-18 2022-03-04 奥加诺株式会社 水处理方法及装置
CN114269696A (zh) * 2019-10-07 2022-04-01 栗田工业株式会社 Toc处理装置和处理方法

Also Published As

Publication number Publication date
JP4932757B2 (ja) 2012-05-16
JP4294731B2 (ja) 2009-07-15
JP2008173637A (ja) 2008-07-31
WO1997030939A1 (fr) 1997-08-28

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