TW428226B - Method for defining polysilicon pattern - Google Patents

Method for defining polysilicon pattern

Info

Publication number
TW428226B
TW428226B TW87101561A TW87101561A TW428226B TW 428226 B TW428226 B TW 428226B TW 87101561 A TW87101561 A TW 87101561A TW 87101561 A TW87101561 A TW 87101561A TW 428226 B TW428226 B TW 428226B
Authority
TW
Taiwan
Prior art keywords
oxide layer
cap oxide
layer
thickness
polysilicon
Prior art date
Application number
TW87101561A
Other languages
English (en)
Inventor
Bo-Lang Wang
Jr-Shiang Ji
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW87101561A priority Critical patent/TW428226B/zh
Application granted granted Critical
Publication of TW428226B publication Critical patent/TW428226B/zh

Links

Landscapes

  • Drying Of Semiconductors (AREA)
TW87101561A 1998-02-06 1998-02-06 Method for defining polysilicon pattern TW428226B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW87101561A TW428226B (en) 1998-02-06 1998-02-06 Method for defining polysilicon pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW87101561A TW428226B (en) 1998-02-06 1998-02-06 Method for defining polysilicon pattern

Publications (1)

Publication Number Publication Date
TW428226B true TW428226B (en) 2001-04-01

Family

ID=21629446

Family Applications (1)

Application Number Title Priority Date Filing Date
TW87101561A TW428226B (en) 1998-02-06 1998-02-06 Method for defining polysilicon pattern

Country Status (1)

Country Link
TW (1) TW428226B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100392822C (zh) * 2005-06-21 2008-06-04 联华电子股份有限公司 限定多晶硅图案的方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100392822C (zh) * 2005-06-21 2008-06-04 联华电子股份有限公司 限定多晶硅图案的方法

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Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees