TW396467B - Semiconductor device - Google Patents
Semiconductor device Download PDFInfo
- Publication number
- TW396467B TW396467B TW087121489A TW87121489A TW396467B TW 396467 B TW396467 B TW 396467B TW 087121489 A TW087121489 A TW 087121489A TW 87121489 A TW87121489 A TW 87121489A TW 396467 B TW396467 B TW 396467B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- wiring
- electrodes
- semiconductor device
- semiconductor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 98
- 239000000758 substrate Substances 0.000 claims description 20
- 238000005476 soldering Methods 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 63
- 239000004642 Polyimide Substances 0.000 description 8
- 229920001721 polyimide Polymers 0.000 description 8
- 239000010409 thin film Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- -1 gold-aluminum Chemical compound 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/4985—Flexible insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Wire Bonding (AREA)
Description
五、發明說明(1) 【發明之背景】 發明之領域 本發明係關於一種半導體裝置,尤有關於一種可防止 ’ .在配線基板上之複數晶片電極與配線間之任何連接故障的 半導體裝置。 習用技術之描述 目前有一種習知之半導體裝置,稱為晶片尺寸封裝 (以下稱為CSP ),其尺寸可減少到幾乎一個半導體晶片之 尺寸。 依據用以安裝半導體晶片之介設部的種類,習知之 β CSP可劃分為一些群組。此介設部可舉一薄膜載體作.為例 子。 然而,如果在薄膜載體上之配線與在半導體晶片上之 晶片電極,係藉由熱壓法而交互連接,由於可能的應力會 使這種接合點傾向於分離,而使這接合點變成電性斷路。 在本發明說明書之附圖中,圖7顯示一種習知之普通 型式的CSP之斜視圖。 如圖7所示,一半導體晶片1係配置於一個為薄膜載體 之TAB(帶式自動焊接)帶2上,並具有與TAB帶2實質上相同 的尺寸。 半導體晶片1之紹(A 1 )晶片電極(未顯不)’係經由在 :.1 TAB帶2之貫通孔中的隆起部(未圖示),而與隆起部9電連 接。整個半導體晶片1係藉由例如環氧樹脂之密封樹脂8所
第5頁 五、發明說明(2) 密封。 圖8係沿著圖7之線V I I I -V I 11之局部放大剖面圖。 在圖8中’ TAB帶2係由一聚醯亞胺帶2b與一銅猪之配 線2 a所構成乂,其中’聚醯亞胺帶2 b係用以作為一基底’而 配線2a係形成於聚醯亞胺帶2b上,並作為所欲支持半導體 晶片1之薄膜載體(配線基板)。 藉由在聚醯亞胺帶2b之貫通孔使銅作氣相沈積’會使 配線2a以一種期望的配線圖案,預先形成於聚醢亞胺帶2b 上。在每個隆起部6之露出表面,另一隆起部5(例如由鎳 (Ni)或金(Au)所組成)係藉由電鍍而形成。 晶片電極4係與半導體晶片1中之一配線層3電連接, 其表=係覆^ 一晶片覆蓋層12 ,俾能露出晶片電極4。 '由土 5f出來的薄膜載體,可用於裝配半導體封裝 由#用陧垃 起=5與晶片電極4成相互對面之關係,藉 由使用焊接工具,在埶忐^ 隆起部6加壓。因此,個_ D s波之情況不,配線2 a係對著 面形成金-銘(Au〇A1 ) 的隆起部5會變形,"藉以在接觸 片電極4在熱的情況下彼金^俾能使隆起部5與相對應之晶 性材料11,使半導體曰曰到加®。然後,藉由一種黏 起,從而完成半導體封^與晶片覆蓋層12彼此黏著在一 配線2a之表面上,用以時乂一阻焊劑塗佈至露出 然而,依此習知技彳^ °,,、不文腐蝕。 狀況下以加壓法而互相诖姑於隆起部5與晶片電極4在熱的 力,會使其接點有分離^ J =後阳由於TAB帶2之可能應 1貝向,因此,在組裝半導體封裝
五、發明說明(3) 後的檢驗期間,分離的接點將被發現,成為連接故障。 【發明之综合說明】 為解決上述問題,本發明之一個目的係提供一種半導 體裝置,其可避免在晶片電極與'隆起部間之任何連接故 障。 依據本發明之第一樣態,上述目標係由一種半導體裝 置所達成,此種半導體裝置包含:一配線基板,具有一預 先決定之配線圖案,形成於上述配線基板之一表面上;一 半導體晶片,配置於上述配線基板之另一表面上,並在同 一配線層具有兩個以上的晶片電極;上述配線基板具有複 數之貫通孔;以及複數之隆起部,與上述晶片電極成相互 面對的關係,分別形成於上述貫通孔,並使上述配線與述 晶片電極電連接。 依據本發明之第二樣態,上述目標係由另一種半導體 裝置所達成,此種半導體裝置包含:一配線基板,具有一 預先決定之配線圖案,形成於上述配線基板之一表面上; 一半導體晶片,配置於上述配線基板之另一表面上,並在 同一配線層具有·兩個以上的晶片電極;以及複數之隆起 部,以與上述晶片電.極成攻目互、面對之關係,分別配置於上 •述配線上,並使上述配線與上述晶片電極電連接。 依據本發明之第三樣態,上述目標係由又另一種半導 體裝置所達成,此種半導體裝置包含:一 TAB (帶式自動 靜接)帶,具有一預先決定之配線圖案,形成於上述TAB帶
五、發明說明(4) 之一表面上;一半導體晶片,配置於上述TAB帶之另一表 面上,並在同一配線層具有兩個以上的晶片電極;上述 TAB帶具有複數之貫通孔;以及複數之隆起部,以與上述 .晶片電極成相互面對之關係,分別形成於上述貫通孔,並 使上述配線與上述晶片電極電連接。 依據本發明之第四樣態,上述目標係由又另一種半導 體裝置所達成,此種半導體裝置包含:一 TAB帶,具有一 預先決定之配線圖案,形成於上述TAB帶之一表面上;一 半導體晶片,配置於上述TAB帶之另一表面上,並在同一 配線層具有兩個以上的晶片電極;以及複數之隆起部,以 與上述晶片電極成相互面對之關係,分別配置於上述配線 上,並使上述配線與上述晶片電極電連接。 在本發明第一至第四樣態之任一種半導體裝置中,成 為其較佳特徵的是.上述晶片電極係從上述半導體晶片之 一邊緣朝向其内、側%排列。 另一個較佳的特徵為:上述晶片電極係平行於上述半 導體晶片之一邊緣而排列,且上述配線係彎折於至少一 處。 又另一個較佳的特徵為:上述晶片電極係平行於上述 半導體晶片之一邊緣而排列,且上述配線具有大於上述晶 •片電極間之内部電極距離的末端寬度。 再另位一個較佳的特徵為:上述晶片電極包含從上述 半導體晶片之接地、電源與信號端子三者中所選擇之至少 一種端子。
第8頁 五、發明說明(5) 在依本發明之半導體裝置的構造中,.此裝置在同一配 線層上具有至少兩組晶片端子與隆起部,俾能在如果於某 位置之接點恰巧分離時,剩下'的接點將會被維持免於分1 離。因此,此半導體封裝不會有任钶的連接故障。 . 【圖示之簡單說明】 本發明之述與其他目的、優點與特徵,將於以下配合 附圖之詳細說明而更顯清楚,其中: 圖1係為依本發明第一實施例之半導體裝置之局部平 面圖.; 圖2 ( a )與2 ( b )係為沿著圖1之線I I - I I之局部剖面圖, 用以顯示製造圖1之半導體裝置的製造程序; —圖3係顯示應用圖1之構造的半導體封裝之局、剖面 圖; 圖4係顯示依本發明第二實施例之半導H裝置之局部 平面圖; 圖5係顯示依|本發明第三實施例之半導體裝置之局部 平面圖; 圖6係顯示依本發明第四實施例之半導體裝置之局部 剖面圖; 圖7 係顯示一種習知之普通型式的CSP (晶片尺寸封 裝)之斜視圖;以及 圖8係沿著圖7之線V I I I -V I I I之局部放大剖面圖。 【符號之說明】 1〜半導體晶片
五、發明說明(6) 2〜TAB(帶式自動焊接)帶 2 a〜配線 2b〜聚醯亞胺帶 ' 2c〜焊墊 3〜配線層 4 ~晶片電極 5 ~隆起部 6 ~隆起部 γ〜焊接工具 8 ~密封樹脂
9 ~隆起部 A 1 0 ~阻焊劑 1 1〜黏性材料 12〜晶片覆盖層 【較佳實施例之說明】 本發明之原理在應用至半導體裝置時特別有用,各種 較佳實施例將於以下參考附圖而詳細說明。 圖1係依本發明第一實施例之半導體裝置之局部平面 圖。 在圖1中,與圖8相似的部份或元件係以相同的參考數 1 ·|μ ' ·. 字表示。一半導體晶片1係配置於一 TAB (帶式自動焊接)帶 1 ; 2上,此半導體晶片1係為一薄膜载體(配線基板),並具有 與TAB帶2實質上相同的尺寸。兩個由鋁(A1 )所組成的晶片
第10頁 立、發明說明(7) ---- 電極4,,係連接至半導體晶片1之同—配線層3。 半導體晶片1之每個晶片電極4 ’係與ΤΑβ帶 一 而且在配線2a之末端,形成二 在tab帶2…線系由銅以-種期望 導體;ί的ίΙ;Γ。⑻與2(b)詳細說明第-實施例之半 圖2 ( a )與2 ( b )係為沿著圖1 用以Ϊ;製Ϊ:1之半導體裳置的製i程局部剖面圖, 首先 在圖2(a)中,作多 -聚醯亞胺帶2b,作為—基底马缚膜載體之TAB帶2包含:一 成,形成於聚醯亞胺帶】,以及一配;線2 a,由銅箔所組 才^對準的方式,#由兩° =灸’以^起部5與晶片電 式,使配線2 a對著降叶按工具7而採用熱或超音波方 安裝至T A B帶2上。 °而文加壓。從而使半導體晶片1 如圖2(b)所示,煤技 形,用以在接觸面形,具7之壓力使個別的隆起部5變 隆起部5盥晶片金鋁(Ali · A1)合金,因此,兩個 與6及和並對岸之a /贵強+度,可在三處以上設置隆起部5 隆起部5 i6對 每個晶片電極4對應到一組 圖。圖3係顯7^應用圖1之構造的半導體封裝之局部剖面 在圖3中各配線2 a在兩個位置經由各組之隆起部5與 五、發明說明(8) 6連接到一個晶片電極4。在配線2 a之一端,形成一焊墊 2c,於其上可安裝一個用以和封裝基板連接之大型隆起部 9 〇 圖4與5係顯示本發明之第二與第三實施例之局部平面 圖。 在圖4與圖5中,與圖3相似的部份或元件係以相同的 參考數字表示。在第二與第三實施例中,與同一配線層3 連接之兩個晶片電極4,係配置於平行半導體晶片1之邊 緣。 .
在圖4之第二實施例中,於另一末端部分彎折(9 0度 角)之配線2 a係連接至兩個晶片電極4。在圖5之第三實施 例中,一配線2 a具有大於兩個晶片電極4之距離的末端寬 度。當然,在任一情況下,配線2a與晶片電極4係經由隆 起部(未顯示)而交互連接。 本發明可應用到任何端子,例如半導體晶片1之電源 端子(VCC)、接地端子(GOD)與信號端子。如果它應用至接 地端子,則會獲得下列結果。 換言之,半導體晶片通常設有複數之電源端子與複數 之接地端子,俾能在如果連接故障恰巧發生於某接點,則 其餘接點仍能維持封閉以執行其原始功能。然而,在使用 '者之產品檢驗期間,如果即使某接點之連接故障被發現, 他或她可能會懷疑技術水準與製造者之技術水準。這種危 險可藉由將本發明應用到至少電源與接地端子而避免掉。 雖然其缺點為晶片電極所佔的面積會增加,但只要本發明
第12頁 五、發明說明(9) 只應用到電源端子與接地端子,則可能的影響會減少到可 忽略的程度。此外,因可達到確實的連接,所以即使會有 增加晶片電極所佔面積之一些風險,亦值得將本發明應用 .至電源端子與接地端子。 在用以說明的實施例中,隆起部5係配置於半導體晶 片1之後表面上。又,配線2 a與隆起部5係如圖6成彼此面 對的關係配置。 依據本發明之半導體裝置,在配線基板上的配線,係 與兩個以上的晶片電極(連接至半導體晶片之同一配線層) 連接,俾能在即使單一接點恰巧分離時,其他接點仍能維 持封閉。依據此半導體裝置,其整體並不會產生連接故 障。 很明顯地,本發明並未侷限於上述實施例,但在不背 離本發明之範疇與精神之下.,仍可作各種改變與變化。 最後,本申請案主張曰本特願平9 - 3 5 9 4 7 8號(申請於 1 9 9 7年1 2月2 6曰)之優先權,該曰本專利案在此併入作為 參考資料。
第13頁
Claims (1)
- ί r '· J I 六、申請專利範圍 L-.….一-—. J 1. 一種半導體裝置,包含: . 一配線基板,具有一預先決定之配線圖案,形成於該 配線基板之一表面上 一半導體晶片,配置於該配線基板之另一表面上,並 在同一配線層具有兩個以上的晶片電極; 該配線基板具有複數之貫通孔;以及 •複數之隆起部,以與該等晶片電極成相互面對之關 係,分別形成於該等貫通孔,並使該配線與該等晶片電極 電連接。2. 如申請專利範圍第1項之半導體裝置,其中,該等 晶片電極係從該半導體晶片之一邊緣朝向其内側而排列。 3. 如申請專利範圍第1項之半導體裝置,其中,ά等 晶片電極係平行於該半導體晶片之一邊緣而排列,且該配 線係彎折於至少一處。 4. 如申請專利範圍第1項之半導體裝置,其中,該等 晶片電極係平行於該半導體晶片之一邊緣而排列,且該配 線具有大於該等晶片電極間之内部電極距離的末端寬度。 5. 如申請專利範圍第1項之半導體裝置,其中,該等 晶片電極包含從該半導體晶片之接地、電源與信號端子三 者中所選擇之至少一種端子。 6. 一種半導體裝置,包含: 一配線基板,具有一預先決定之配線圖案,形成於該 配線基板之一表面上; 一半導體晶片,配置於該配線基板之另一表面上,並第〗4頁 六、申請專利範圍 在同一配線層具有兩個以上的晶片電極;以及 複數之隆起部,以與該等晶片電極成相互面對之關 係,分別配置於該配線上,並使該配線與該等晶片電極電 連接。 7. 如申請專利範圍第6項之半導體裝置,其中,該等 晶片電極係從該半導體晶片之一邊緣朝向其内側而排列。 8. 如申請專利範圍第6項之半導體裝置,其中,該等 晶片電極係平行於該半導體晶片之一邊緣而排列,且該配 線係彎折.於至少一處。,9. 如申請專利範圍第6項之半導體裝置,其中,該等 晶片電極係平行於該半導體晶片之一邊緣而排列,且該配 線具有大於該等晶片電極間之内部電極距離的末端寬度。 10. 如申請專利範圍第6項之半導體裝置,其中,該 等晶片電極包备從該半導體晶片之接地、電源與信號端子 三者中所選擇之至少一種端子。 11. 一種半導體裝置,包含: 一TAB (帶式自動焊接)帶,具有一預先決定之配線圖 案,形成於該TAB f之一表面上; . 一半導體晶片,配置於該TAB帶之另一表面上,並在 同一配線層具有兩個以上的晶片電極,該TAB帶具有複數之貫通孔;以及 複數之隆起部,以與該等晶片電極成相互面對之關係,分 別形成於該等貫通孔,並使該配線與該等晶片電極電連 接。第15頁 六、申請專利範圍 12. 如申請專利範圍第11項之半導體裝置,其中,該 等晶片電極係從該半導體晶片之一邊緣朝向其内側而排 列。 .13.如申請專利範圍第1 1項之半導體裝置,其中,該 等晶片電極係平行於該半導體晶片之一邊緣而排列,且該 配線係彎折於至少一處。 14. 如申請專利範圍第1 1項之半導體裝置,其中,該 等晶片電極係平行於該半導體晶片之一邊緣而排列,且該 配線具有大於該等晶片電極間之内部電極距離的末端寬 度。 15. 如申請專利範圍第11項之半導體裝置,其中,該 等晶片電極包含兴該#導體晶片之接地、電源與信號端子 三者中所選擇之至少一種端子。 16. 一種半導體裝'置,包含: 一 TAB帶,具有一預先決定之配線圖案,形成於該TAB 帶之一表面上; 一半導體晶片,配置於該TAB帶之另一表面上,並在 同一配線層具有兩個以上的晶片電極;以及 複數之隆起部,以與該等晶片電極成相互面對之關 係,分別配置於該配線上,並使該配線與該等晶片電極電 連接。 17. 如申請專利範圍第1 6項之半導體裝置,其中,該 等晶片電極係從該半導體晶片之一邊緣朝向其内側而排 列0第16頁 六、申請專利範圍 18. 如申請專利範圍第16項之半導體裝置,其中,該 等晶片電極係平行於該半導體晶片之一邊緣而排列,且該 配線係彎折於至少一處。 19. 如申請專利範圍第1 6項之半導體裝置,其中,該 等晶片電極係平行於該半導體晶片之一邊緣而排列,且該 配線具有大於該等晶片電極間之内部電極距離的末端寬 度。 20. 如申請專利範圍第16項之半導體裝置,其中,該 等晶片電極包含從該半導體晶片之接地、電源與信號端子 三者十所選擇之至少一種端子。第17頁
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9359478A JP3065010B2 (ja) | 1997-12-26 | 1997-12-26 | 半導体装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW396467B true TW396467B (en) | 2000-07-01 |
Family
ID=18464710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW087121489A TW396467B (en) | 1997-12-26 | 1998-12-22 | Semiconductor device |
Country Status (6)
Country | Link |
---|---|
US (1) | US6794750B2 (zh) |
EP (1) | EP0928028A3 (zh) |
JP (1) | JP3065010B2 (zh) |
KR (1) | KR100349957B1 (zh) |
CN (1) | CN1225509A (zh) |
TW (1) | TW396467B (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6077766A (en) * | 1999-06-25 | 2000-06-20 | International Business Machines Corporation | Variable thickness pads on a substrate surface |
JP3597754B2 (ja) | 2000-04-24 | 2004-12-08 | Necエレクトロニクス株式会社 | 半導体装置及びその製造方法 |
US7253510B2 (en) | 2003-01-16 | 2007-08-07 | International Business Machines Corporation | Ball grid array package construction with raised solder ball pads |
KR100510518B1 (ko) * | 2003-01-30 | 2005-08-26 | 삼성전자주식회사 | 반도체 장치 및 반도체 장치의 패키지 방법 |
KR100541649B1 (ko) * | 2003-09-03 | 2006-01-11 | 삼성전자주식회사 | 테이프 배선 기판과 그를 이용한 반도체 칩 패키지 |
KR100608364B1 (ko) * | 2004-04-29 | 2006-08-08 | 주식회사 하이닉스반도체 | 반도체 칩 패키지 |
KR100805289B1 (ko) * | 2005-08-22 | 2008-02-20 | 세이코 엡슨 가부시키가이샤 | 전기 영동 장치 및 전자 기기 |
TWM524553U (zh) * | 2016-03-21 | 2016-06-21 | Team Expert Man Consulting Service Ltd | 半導體封裝結構 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5399898A (en) * | 1992-07-17 | 1995-03-21 | Lsi Logic Corporation | Multi-chip semiconductor arrangements using flip chip dies |
JPH0563029A (ja) * | 1991-09-02 | 1993-03-12 | Fujitsu Ltd | 半導体素子 |
US5548091A (en) * | 1993-10-26 | 1996-08-20 | Tessera, Inc. | Semiconductor chip connection components with adhesives and methods for bonding to the chip |
JP2833996B2 (ja) * | 1994-05-25 | 1998-12-09 | 日本電気株式会社 | フレキシブルフィルム及びこれを有する半導体装置 |
US5635761A (en) * | 1994-12-14 | 1997-06-03 | International Business Machines, Inc. | Internal resistor termination in multi-chip module environments |
JPH08236586A (ja) * | 1994-12-29 | 1996-09-13 | Nitto Denko Corp | 半導体装置及びその製造方法 |
US5707894A (en) * | 1995-10-27 | 1998-01-13 | United Microelectronics Corporation | Bonding pad structure and method thereof |
US5844317A (en) * | 1995-12-21 | 1998-12-01 | International Business Machines Corporation | Consolidated chip design for wire bond and flip-chip package technologies |
KR0182510B1 (ko) * | 1996-02-17 | 1999-04-15 | 김광호 | 탭 테이프를 적용한 칩 스케일 패키지 |
US5686764A (en) * | 1996-03-20 | 1997-11-11 | Lsi Logic Corporation | Flip chip package with reduced number of package layers |
US5925930A (en) * | 1996-05-21 | 1999-07-20 | Micron Technology, Inc. | IC contacts with palladium layer and flexible conductive epoxy bumps |
US5952726A (en) * | 1996-11-12 | 1999-09-14 | Lsi Logic Corporation | Flip chip bump distribution on die |
US6441487B2 (en) * | 1997-10-20 | 2002-08-27 | Flip Chip Technologies, L.L.C. | Chip scale package using large ductile solder balls |
US6064114A (en) * | 1997-12-01 | 2000-05-16 | Motorola, Inc. | Semiconductor device having a sub-chip-scale package structure and method for forming same |
-
1997
- 1997-12-26 JP JP9359478A patent/JP3065010B2/ja not_active Expired - Fee Related
-
1998
- 1998-12-22 TW TW087121489A patent/TW396467B/zh active
- 1998-12-22 EP EP98124527A patent/EP0928028A3/en not_active Withdrawn
- 1998-12-24 KR KR1019980058330A patent/KR100349957B1/ko not_active IP Right Cessation
- 1998-12-28 CN CN98126502A patent/CN1225509A/zh active Pending
- 1998-12-28 US US09/222,524 patent/US6794750B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20020000654A1 (en) | 2002-01-03 |
CN1225509A (zh) | 1999-08-11 |
US6794750B2 (en) | 2004-09-21 |
EP0928028A3 (en) | 2000-06-28 |
KR19990063444A (ko) | 1999-07-26 |
KR100349957B1 (ko) | 2002-11-18 |
EP0928028A2 (en) | 1999-07-07 |
JP3065010B2 (ja) | 2000-07-12 |
JPH11191574A (ja) | 1999-07-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW392262B (en) | Electric parts and semiconductor device and the manufacturing method thereof, and the assembled circuit board, and the electric device using the same | |
JP3633559B2 (ja) | 半導体装置及びその製造方法、回路基板並びに電子機器 | |
JP3377001B2 (ja) | 半導体装置及びその製造方法、回路基板並びに電子機器 | |
JP3481444B2 (ja) | 半導体装置及びその製造方法 | |
JP3176307B2 (ja) | 集積回路装置の実装構造およびその製造方法 | |
US8564049B2 (en) | Flip chip contact (FCC) power package | |
JP3526788B2 (ja) | 半導体装置の製造方法 | |
US6344683B1 (en) | Stacked semiconductor package with flexible tape | |
JP2980046B2 (ja) | 半導体装置の実装構造および実装方法 | |
US20020004258A1 (en) | Semiconductor device and method of fabricating the same, circuit board, and electronic equipment | |
EP1045443A2 (en) | Semiconductor device and manufacturing method thereof | |
JP2002110898A (ja) | 半導体装置 | |
JP2001203319A (ja) | 積層型半導体装置 | |
JPS5880857A (ja) | 電子回路パツケ−ジング部材 | |
JPS629642A (ja) | 半導体装置の製造方法 | |
US6420787B1 (en) | Semiconductor device and process of producing same | |
TW548757B (en) | Semiconductor device, its manufacturing method, circuit substrate and electronic machine | |
TW396467B (en) | Semiconductor device | |
TW541632B (en) | Semiconductor device and manufacturing method thereof, circuit board and electronic equipment | |
JPH0831868A (ja) | Bga型半導体装置 | |
JP3569585B2 (ja) | 半導体装置 | |
JP3549316B2 (ja) | 配線基板 | |
JP4130277B2 (ja) | 半導体装置および半導体装置の製造方法 | |
JP2924394B2 (ja) | 半導体装置及びその製造方法 | |
JP3879803B2 (ja) | 半導体装置及びその製造方法、回路基板並びに電子機器 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent |