TW390004B - Device for storing semiconductor chip and method for making the same - Google Patents

Device for storing semiconductor chip and method for making the same Download PDF

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Publication number
TW390004B
TW390004B TW085104384A TW85104384A TW390004B TW 390004 B TW390004 B TW 390004B TW 085104384 A TW085104384 A TW 085104384A TW 85104384 A TW85104384 A TW 85104384A TW 390004 B TW390004 B TW 390004B
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Taiwan
Prior art keywords
semiconductor
metal
electrodes
wafer
gold
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TW085104384A
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English (en)
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Hideaki Maekawa
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Toshiba Corp
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Publication of TW390004B publication Critical patent/TW390004B/zh

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    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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  • Engineering & Computer Science (AREA)
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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Wire Bonding (AREA)

Description

A7 ____B7__··_ 五、發明説明(丨) 〔產業上之利用領域〕 本發明係關於半導髖覆晶裝置及其製造方法·特別是 關於有利於髙密度,髙集成化之半導體覆晶裝置的外圍器 〔先前之技術〕 對於一習知之半導體覆晶裝置的外圍裝置而言,一般 爲具備有金雇導線架構之SCTP (small outline ...... .· . package) ,S ◦ J ( small outline J-leaded)等之外 圍裝置,但是如此之構造通常要比實際的半導體元件的外 形尺寸來得大,因此便成爲妨礙追求髙密度化及髙集成化 之主因所在。甚至將上述半導髏覆晶裝置安裝於印刷配線 板上時,會因爲所使用之半導體覆晶裝置的熱硬化樹脂及 金屬導線的熱膨脹係數與印刷配線板的熱膨脹係數有所差 異之故,使得長期在髙溫/低溫的循環作用之下而產生應 力,導致熔接接合部發生龜裂而無法進行導電· 另一方面就追求高密度化及高集成化的方面而言,係 使用直接將半導體元件安裝於印刷配線板之所謂覆晶或 C Ο B ( chip on board)等之構造·但是像這樣的構造 係因直接將半導體元·件安裝於印刷配線板上•所以和樹脂 密封型半導體覆晶裝置比較之下,會較弱於承受機械性的 街擊,同時有必要導入新的製造裝置及技術* 習知對於用以作爲防止熔接接合部產生龜裂之對策而 言,並不是使用熱硬化樹脂來當作保護半導體元件的材料 (請先閱讀背面之注f項 再 fir • J·. 訂 線 經濟部智慧財產局貝工消費合作社印製 經濟部智慧財農局員工消費合作社印製 A7 B7五、發明説明(2 ) ,而是採用與印刷配線板的熱膨脹係數相近之同一材料的 環氧樹脂材料•另外,也不是使用金靥導線來使半導體覆 晶裝置與外部進行電氣性接觸,而是使用如_4(a)所 示之半導《元件的構造之平面圖樣*在半導髖覆晶裝置的 側面設置有半圖柱狀之金屬接觸部1 0 ·此外,圖4的元 件係爲了追求高密度化及髙集成化,而藉由金羼接觸部 1 0使複數個半導體覆晶裝置可以進行重叠之接合,促使 多段安裝成爲可能· ~ 第4圖(b)係表示圖4 (a)的A _A<線之斷面 圖,施以點面加工(spot facing),藉由固定劑7將設 置在環氧樹脂材3上之金羼電極5與半導體元件6進行物 理性的連接,並利用金靥導線4將半導體元件6上的接觸 電極1與金屬電極5予以進行電氣性的連接•另外,爲了 防止半導髖元件6與外部接觸而利用密封用樹脂2予以密 封•並且,爲了確認藉由密封用樹脂2來進行密封後是否 有通道,而將導通確認用電極1 1設置於環氧樹脂材3上 藉由圈5(a), (b),(c),(d),(e) ,(f)來說明根據習知之技術所進行之樹脂密封型半導 體覆晶裝置的製作工程。此斷面圓係取自圖4 ( a )的A 一 A >線之斷面。圇5 ( a )係表示於實施黏面加工後, 將設置有金屬電極5友電氣導通確認用電極1 1之環氧樹 脂材3上塗佈固定劑,並在固定劑7上載置半導體元件6 。圖5 ( b )係表示爲了使載置於固定劑7上之半導體元 (請先Μ讀背面之注f項再填
訂 -線. 本纸浪尺度逋用t國國家揉準(CNS ) A4规格(210X297公釐) / A7 ____B7 五、發明説明(3 ) 件6固定起來,而施以加熱使固定劑硬化•圖5(c)係 表示半導體元件6上之各接觸電極1與各金屬電極5之間 藉由金屬導線4予以連接起來•圖5(d) ,(e),( f )係表示爲了保護半導髖元件,而在塗佈一層密封用樹 脂2後之低壓中進行脫泡,並予以加熱使其硬化* 但是·以上所述之半導體元件的外園裝置的構造*係 具有將在以下敘述之問題點· .第1點,如圖4 ·( b )矿示那樣,在環氧樹脂材3與 半導髖元件6之間係利用金屬導線4予以進行電氣性的接 合*如此藉由金屬導線4來進行電氣性的接合時,必定使 得金屬電極5形成於比半導體元件6更外側之環氧樹脂材 3上•如此一來,便使得樹脂密封型半導體覆晶裝置的外 形尺寸更趨於增大,而有礙於追求髙密度化及高集成化· 第2點,如圖5(a) , (b) , (c)所示,藉由 金羼導線4來進行電氣性連接,及使用固定劑7將半導髖 元件6接著於環氧樹脂材3等之製程,將會使整個製造工 程數的增加•亦即,會增加其製造成本。 〔發明所欲解決之課題〕 如上所述,習知之半導體覆晶裝置,係其外形尺寸比 較大,因此其製造程序之工程數將會有增加等之問題存在 〇 本發明係有鑑於上述之問題,而以一種外形尺寸較小 ,削減製造工程數,進而減低製造成本之半導髖覆晶裝置 本纸張尺度適用中β國家輮率(C^S > A4规格(210X297公釐) / 請先聞讀背*之注$項再填寫 訂 線 經濟部智慧財產局員工消費合作社印製 五、發明説明( 4 A7 B7 經濟部智慧財產局貝工消費合作社印製 及其製造方法爲其主要之目的· 〔用以解決課題之手段〕 爲了達成上述之目的,本發明之半導體覆晶裝置的特 徵係具備有: 於中央位置以一定深度經由黏面加工而形成凹陷狀之 外圍裝置(—3 );及 被配列於上述外圔裝置的~凹狀部內之複數個第1金屬 電極(5 ):及 於上述外圍裝置的凹狀部內,與第1金屬電極(5 ) 成對向配置,且具有第2金屬電極(1),經由球狀金屬 構件(12)與上述第1金屬電極進行電氣性連接之半導 體晶片(6 );及 流入上述凹狀部內而使可以完全覆羞上述半導體晶片 之密封用樹脂構件(2 )而構成者· 此半導體的外圍裝置,係由環氧樹脂所構成· 本發明爲了達成上述之目的,而提供一種半導體(覆 晶filp chip)的製造方法,其特徵係具有: 於中央位置以一定的深度經由黏面加工所形成之設置 有複數個金羼電極的外圍裝置之凹狀部內,將半導體晶片 與上述金屬電極形成對向配置,且經由球狀金屬構件與上 述金屬電極進行電氣性的連接之工程;及 將密封用樹脂流入上述凹狀部內的同時,藉由形成於 外圍裝置的中央位置之貫通穴所產生的吸引作用,使得上 請 先 Μ 面 之 注
I η 訂 線 本纸張尺度適用中國國家揉丰(C^S > Α4规格(210X297公釐) 7 A7 B7 五、發明説明(5 ) 述密封用樹脂可以完全覆蓋上述半導體晶片之工程· 更進一步的來說明的話·本發明之半導«覆晶裝置之 製造方法的特徽爲具有: 藉由點面加工在環氧樹脂板的中央位置以一定的深度 加工成凹狀而來形成外圍裝置之工程;及 在上述外園裝置的凹狀部內形成複數個金屬電極之工 程,及 在上述外園裝置的凹狀部"內配置有一定高度的絕緣構 件之工程:及 在半導體晶片之複數個接觸電極上配置球狀金屬構件 之工程;及 將上述半導體晶片配置於上述絕緣構件上,同時使上 述複數個金屬電極與上述接觸電極形成對向配置,並經由 上述球狀金属構件來進行電氣性連接之工程;及 將密封用樹脂流入上述凹狀部內的同時,藉由形成於 外園裝置的中央位置之貫通穴所產生的吸引作用,使得上 述密封用樹脂可以完全覆蓋上述半導體晶片之工程· 〔作用〕 使用本發明所提供之手段,則可以將第1金屬電極直 接形成於半導體晶片的下面*如此一來便可以有助於使半 導體覆晶裝置的外形穴寸縮小•並且,因爲未使用金屬連 接線之故,所以能夠使外圍裝置的高度降低*以上所述之 這類的優點正是最逋合於追求半導《的高密度化及高集成 本纸張尺度適用中國困家揉率(C^S > A4规格(210X297公兼) {請先明讀背面之注$項再填寫'^ 訂 線- 經濟部智慧財產局員工消費含作社印製 -8 - 經濟部智慧財產局員工消费合作社印製 A7 _B7_五、發明説明(6 ) 化· 此外,本發明係使用球狀金属,所以能夠一次完成半 導體元件之密封作業,同時因利用絕緣構件來進行半導髖 晶片與外園裝置之間的接著工作,所以可以減少製造半導 髖覆晶裝置之工程數,亦即可以削減製造成本· 〔實施例〕 第1圖(a )係表示本麥*明之實施例的平面圖*本發 明之樹脂密封用半導«覆晶裝置,係在經過黏面加工後之 環氧樹脂材料3的上面設置與半導髖元件6的接觸電極同 一位置之金屬電極5,並在此金觸電極5的內側貼附有爲 了接著半導體元件6的絕緣接著帶8 *此外,爲了保護半 導體覆晶裝置6而在塗佈密封用樹脂2時,藉由設置在環 氧樹脂材3的底部中央之吸引口 9的吸引力來使得密封用 樹脂2能夠完全地覆蓋在半導髗元件6上· 第lffl(a)及第1圖(b)中顯示有,爲了能確保 範圔廣的吸引面稹,而在絕緣接著帶8的內側設置有比半 導體元件6的長度大之凹部2 0的構造。 其次,利用圖 2(3),(15),((;),(£1)及 (e )來說明本發明之樹脂密封型半導體覆晶裝置的製造 工程•此製造工程之斷面圖係取自圖1 (a)之B — B< 線之斷面。圈2 ( a ),係顯示在進行點面加工及在底部 中央部形成吸引口 9後,位於金屬電極5及導通確認用電 極1 1的上面,及爲了接著半導髓元件6,而貼附有絕緣 請 先 Η 面 之 注
I 訂 線 本紙張尺度適用中國國家榡準(CNS > A4规格(210X297公釐) 經濟部智慧財產局員工消費合作社印製 A7 _____B7____五、發明説明(7 ) 接著带8之環氧樹脂材8上,載置有將球狀金屬1 2安裝 於接觸電極1之半導髖元件6的工程*圓2 (b)係表示 同時進行環氧樹脂材3與半導體元件6之電氣的接合與絕 緣接著帶8之加熱硬化之工程· 圖2(c) , (d), (e)係顯示爲了保護半導體 元件6而塗佈上一層密封用樹脂2 *同時藉由來自吸引口 9的吸引力而使得可以完全覆盖半導髖元件6的全髏,然 後進行脫泡,加熱使其硬化等之工程· ' * . · - .·:♦ 對於習知之技術p言,如圚4 ( b )所示爲了要使環 氧樹脂材3與半導體元件6進行電氣性的接合而使用金羼 線4,因此金羼電極5不得不形成於半導髖元件6的外側 ,導致半導體覆晶裝置的外形尺寸更趨於增大· 相對的,如圖1 (b)所示,本發明係使用可進行電 氣性接合的球狀金屬1 2,所以能夠將金屬電極5直接形 成於半導體元件6的下部,如圖3所示本發明之半導體覆 晶裝置的外形尺寸要比習知者來得小•並且,本發明係使 用球狀金屬來取代習知者所使用之金屬導線來進行電氣性 接合,因此電氣性接觸部的高度係可藉由球狀金屬1 2的 直徑變更,促使能夠將半導髓覆晶裝置的厚度變薄•如此 一來,便可以比習知之技術者更容易達成半導體覆晶裝置 之髙密度化及高集成化。 另外,藉由金屬導線4來進行電氣接合的情況時,則 必須分別地將金屬電極1予以接合,相對的若利用球狀金 牖1 2的話,則可以一次完成接合之作業,並且如圆2 ( 請 先 聞 面 之 注
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訂 線 私紙張尺度逍用中國國家揉率(CNS ) A4规格(210X297公釐) 10 A7 B7 ___ 五、發明説明(8 ) b)所示也可以同時藉由絕緣接著帶8來進行半導髗元件 6之接著作業,因此可以削減製造工程,亦即能夠降低製 造成本· ^ 另一方面,如上述習知之構成因爲藉由球狀金屬1 2 來調整電氣接觸部的高度.,所以環氧樹脂材3下部與半導 體元件之間變得非常狹窄,導致密封用樹脂2很難進入· 但是,如圖1 ( a )所示,本發明之半導體覆晶裝置之構 造係設置有環氧樹脂材3的ίΤ部中央吸引口 9 ;及爲了確 保較廣的吸引面積而於絕緣接著帶8的內側設置有比半導 體元件6的長度大的凹陷部20。因此,如騙2 (c)所 示,在塗佈密封用樹脂2的同時藉由來自吸引口 9的吸引 力,促使密封樹脂2可以順利地被吸引入環氧樹脂材3的 下部和半導髖元件6之間,進而能夠完全地將半導體元件 6覆蓋。此時,亦會有密封樹脂2從吸引口 9溢出之虞, 但是只要對於密封樹脂2的黏度及吸引力,吸引時間等之 條件詳加考慮,便能夠防止溢出之情況發生* 以上所述之本發明的構成並不只局限於此,只要不脫 離本發明之主旨也是可以進行種種之變形· 另外,在本案之申請專利範圍的各構成要件添記圖面 參照圖號之目的是爲了能夠容易地理解本發明,而不是將 本發明之技術的範圔限定於圖面所示之實施例》 〔發明之效果〕 如以上說明,利用本發明的話,則可以將金属電極直 本紙張尺友逍用中國國家樣率(CNS > Α4规格(210X297公釐)
I (請先聞讀背面之注$項再填寫'% 訂 線 經濟部智慧財產局員工消費合作社印製 •Ί·. -11 - 經濟部智慧財產局員工消费合作社印製 A7 ____B7___ 五、發明説明(9 ) 接形成於半導體晶片的下面,有助於縮小半導髖覆晶裝置 的外形尺寸•並且,因爲不使用接合用金屬導線之故,所 以能夠降低外園裝置的髙度•以上所述之優點正是合適於 追求半導體覆晶裝置之高密度化及髙集成化等之條件· 另外,本發明係使用球狀金屬,因此可以一次完成接 合之作業,同時藉由絕緣構件來進行半導體晶片與外圍裝 置之接著作業,所以可減少製造工程數,亦即可以降低製 造成本。 〜 -'" -.. ,. · - 甚至可以防止密封用樹脂之未充填滿的情況發生,而 連到獲取其信賴性的提升等之效果· 〔圖面之簡單說明〕 第1圖係表示本發明之實施例的半導體覆晶裝置之平 面圈及斷面圖· 第2圖係表示本發明的製造工程之半導體覆晶裝置的 斷面圇· 第3圖係表示本發明與習知例之半導體覆晶裝置的比 較斷面圖· 第4圖係表示習知之半導體覆晶裝置的平面園與斷面 圖· 第5騙係表示習知之半導體覆晶裝置的製造工程之斷 面圓。 ' 〔圖號之說明〕 本紙張尺度適用中國國家揉準(> Α4规格(210X297公釐) 1^---Γ-----^------ir-------痒 (請先《讀背面之注f項再球寫ί) -12 - A7 B7 五、發明説明(1〇 ) 1 :接觸電極 2 :密封用樹脂 3 :環氣樹脂材料 4 :金屬導線 5 :接合用金靥電極 6 :半導體元件 7 :固定劑 8 :絕緣帶 ~ 9 :吸引口 1 0 :金羼接觸部 1 1 :導通確認用電極 1 2 :球狀金屬構件 2 0 :爲了確保吸引面積的凹陷部 (請先閏讀背面之注$項再填寫^.? - 線 經濟部智慧財產局員工消費合作社印製 本紙張尺度逋用中國國家標率(CNS > A4规格(210X297公釐) . / -13 -

Claims (1)

  1. 經濟部智慧財產局貝工消费合作社印製 A8 B8 C8 D8 六、申請專利範圍 1 . 一種半導體覆晶裝置,其特擞係具備有: 於中央位置以一定深度經由點面加工(spot facing )而形成凹陷狀之外園裝置;及 被配列於上述外園裝置的凹狀部內之複數個第1金屬 電極;及 設置於上述外園裝置的凹狀部內之吸引口;及 於上述外圍裝置的凹狀部內,與第1金靥電®成對向 配置,且具有第2金屬電極〜經由球狀金屬構件與上述第 +-+· ·.· ' . - *:> 1金屬電極進行電氣性連接之半導餿晶片;及 接著上述外園裝置與上述半導髓晶片之絕緣構件;及 流入上述凹狀部內而使可以完全覆蓋上述半導體晶片 之密封用樹脂構件而構成者· 2.如申請專利範圍第1項之半導體覆晶裝置,其中 上述外園裝置係由環氧樹脂所構成。 3 . —種半導體覆晶裝置之製造方法,其特徵係具有 於中央位置以一定的深度經由點面加工所形成之設置 有複數個金颶電極的外圔裝置之凹狀部內,將半導體晶片 與上述金靥電極形成對向配置,且經由球狀金羼構件與上 述金屬電極進行電氣性的連接之工程;及 將密封用樹脂流入上述凹狀部內的同時,藉由形成於 外園裝置的中央位置之貫通穴所產生的吸引作用,使得上 述密封用樹脂可以完全覆蓋上述半導體晶片之工程· 4.一種半導體覆晶裝置之製造方法,其特擞爲具有 * 1·1 I 1^—— — — — II— - — — It— — — · I I I I (請先Μ讀背面之注$項再缜寫本贾) 線1 本紙張尺度適用中國國家標準(CNS)A4規格(210x297公釐) _ 14 - A8明C8D6 六、申請專利範園 藉由黏面加工在環氧樹脂板的中央位置以一定的深度 加工成凹狀而來形成外圍裝罝之工程;及 在上述外園裝置的凹狀部內形成複數個金靥電極之工 程;及 在上述外圏裝置的凹狀部內配置有一定髙度的絕緣構 件之工程;及 在半導镰晶片之複數個接觸電極上配置球狀金屬構件 · .* ·· .. . - 之工程;及 將上述半導體晶片配置於上述絕緣構件上,同時使上 述複數個金屬電極與上述接觸電極形成對向配置*並經由 上述球狀金屬構件來進行電氣性連接之工程;及 將密封用樹脂流入上述凹狀部內的同時,藉由形成於 外圍裝置的中央位置之貫通穴所產生的吸引作用,使得上 述密封用樹脂可以完全覆盖上述半導體晶片之工程· 5.如申請專利範圔第4項之半導體覆晶裝置之製造 方法,其中上述絕緣構件係由聚酰亞胺所構成· (請先«讀背面之注f項再填X本頁) -ύ— •I 1_ ϋ 訂---------線· 經濟部智慧財產局員‘工汍费+作杜印製 本紙張尺度適用中國困家標準(CNS)A4規格(210x297公釐) -15 -
TW085104384A 1995-04-21 1996-04-12 Device for storing semiconductor chip and method for making the same TW390004B (en)

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KR100200254B1 (ko) 1999-06-15

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