TW375536B - Apparatus for generating plasma - Google Patents

Apparatus for generating plasma

Info

Publication number
TW375536B
TW375536B TW085111463A TW85111463A TW375536B TW 375536 B TW375536 B TW 375536B TW 085111463 A TW085111463 A TW 085111463A TW 85111463 A TW85111463 A TW 85111463A TW 375536 B TW375536 B TW 375536B
Authority
TW
Taiwan
Prior art keywords
generating plasma
plasma
coated
substrate
polymer
Prior art date
Application number
TW085111463A
Other languages
English (en)
Chinese (zh)
Inventor
Ing-Feng Hu
James C Tou
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Application granted granted Critical
Publication of TW375536B publication Critical patent/TW375536B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Paints Or Removers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
TW085111463A 1992-12-21 1993-11-05 Apparatus for generating plasma TW375536B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/994,381 US5298587A (en) 1992-12-21 1992-12-21 Protective film for articles and method

Publications (1)

Publication Number Publication Date
TW375536B true TW375536B (en) 1999-12-01

Family

ID=25540605

Family Applications (2)

Application Number Title Priority Date Filing Date
TW085111463A TW375536B (en) 1992-12-21 1993-11-05 Apparatus for generating plasma
TW82109289A TW296394B (cg-RX-API-DMAC7.html) 1992-12-21 1993-11-05

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW82109289A TW296394B (cg-RX-API-DMAC7.html) 1992-12-21 1993-11-05

Country Status (9)

Country Link
US (2) US5298587A (cg-RX-API-DMAC7.html)
EP (1) EP0674722B1 (cg-RX-API-DMAC7.html)
JP (1) JP3488458B2 (cg-RX-API-DMAC7.html)
KR (3) KR100360579B1 (cg-RX-API-DMAC7.html)
CA (1) CA2147486C (cg-RX-API-DMAC7.html)
DE (1) DE69318424T2 (cg-RX-API-DMAC7.html)
MX (1) MX9306910A (cg-RX-API-DMAC7.html)
TW (2) TW375536B (cg-RX-API-DMAC7.html)
WO (1) WO1994014998A1 (cg-RX-API-DMAC7.html)

Families Citing this family (125)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5567661A (en) * 1993-08-26 1996-10-22 Fujitsu Limited Formation of planarized insulating film by plasma-enhanced CVD of organic silicon compound
US5677051A (en) * 1993-11-30 1997-10-14 Tdk Corporation Magnetic recording medium having a specified plasma polymerized hydrogen containing carbon film and lubricant
US6149982A (en) * 1994-02-16 2000-11-21 The Coca-Cola Company Method of forming a coating on an inner surface
CO4370034A1 (es) 1994-02-16 1996-10-07 Coca Cola Co Metodo y sistemas para la formacion de un recubrimiento sobre superficies de recipientes
US5487920A (en) * 1994-04-19 1996-01-30 The Boc Group, Inc. Process for plasma-enhanced chemical vapor deposition of anti-fog and anti-scratch coatings onto various substrates
CA2224856C (en) * 1995-06-22 2002-04-30 Yuri Gudimenko Surface modification of polymers and carbon-based materials
EP0752483A1 (de) * 1995-06-28 1997-01-08 ANTEC Angewandte Neue Technologien GmbH Verfahren zur Beschichtung von Gegenständen aus Metall oder Kunststoff
KR100418145B1 (ko) * 1995-10-13 2005-01-31 다우 글로벌 테크놀로지스 인크. 피복된플라스틱기판을포함하는적층물
US5783452A (en) * 1996-02-02 1998-07-21 University Of Washington Covered microchannels and the microfabrication thereof
US6514573B2 (en) * 1996-02-21 2003-02-04 Commonwealth Scientific And Industrial Research Organisation Method for reducing crazing in a plastics material
AUPN820396A0 (en) * 1996-02-21 1996-03-14 Commonwealth Scientific And Industrial Research Organisation Method for reducing crazing in a plastics material
US5900284A (en) * 1996-07-30 1999-05-04 The Dow Chemical Company Plasma generating device and method
US5993598A (en) * 1996-07-30 1999-11-30 The Dow Chemical Company Magnetron
US5989998A (en) * 1996-08-29 1999-11-23 Matsushita Electric Industrial Co., Ltd. Method of forming interlayer insulating film
FR2756292B1 (fr) * 1996-11-26 1998-12-24 Saint Gobain Vitrage Procede de preparation d'une feuille en matiere plastique, cette feuille et vitrage la comportant
US6110544A (en) * 1997-06-26 2000-08-29 General Electric Company Protective coating by high rate arc plasma deposition
WO1999004911A1 (en) * 1997-07-28 1999-02-04 Massachusetts Institute Of Technology Pyrolytic chemical vapor deposition of silicone films
US6203898B1 (en) * 1997-08-29 2001-03-20 3M Innovatave Properties Company Article comprising a substrate having a silicone coating
US6055929A (en) * 1997-09-24 2000-05-02 The Dow Chemical Company Magnetron
CA2303897C (en) 1997-10-01 2007-05-08 The Dow Chemical Company Dual face shower head electrode for a magnetron plasma generating apparatus
US6627532B1 (en) * 1998-02-11 2003-09-30 Applied Materials, Inc. Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition
US6660656B2 (en) * 1998-02-11 2003-12-09 Applied Materials Inc. Plasma processes for depositing low dielectric constant films
US6593247B1 (en) * 1998-02-11 2003-07-15 Applied Materials, Inc. Method of depositing low k films using an oxidizing plasma
US6303523B2 (en) * 1998-02-11 2001-10-16 Applied Materials, Inc. Plasma processes for depositing low dielectric constant films
US6287990B1 (en) 1998-02-11 2001-09-11 Applied Materials, Inc. CVD plasma assisted low dielectric constant films
US6054379A (en) 1998-02-11 2000-04-25 Applied Materials, Inc. Method of depositing a low k dielectric with organo silane
US6147009A (en) * 1998-06-29 2000-11-14 International Business Machines Corporation Hydrogenated oxidized silicon carbon material
US6245690B1 (en) * 1998-11-04 2001-06-12 Applied Materials, Inc. Method of improving moisture resistance of low dielectric constant films
DE19901834A1 (de) * 1999-01-19 2000-07-20 Leybold Systems Gmbh Verfahren zum Beschichten von Substraten aus Kunststoff
US6520650B2 (en) 1999-02-08 2003-02-18 Valeo Sylvania L.C.C. Lamp reflector with a barrier coating of a plasma polymer
US6517341B1 (en) * 1999-02-26 2003-02-11 General Electric Company Method to prevent recession loss of silica and silicon-containing materials in combustion gas environments
US6517687B1 (en) 1999-03-17 2003-02-11 General Electric Company Ultraviolet filters with enhanced weatherability and method of making
US6365016B1 (en) 1999-03-17 2002-04-02 General Electric Company Method and apparatus for arc plasma deposition with evaporation of reagents
US6426125B1 (en) 1999-03-17 2002-07-30 General Electric Company Multilayer article and method of making by ARC plasma deposition
US6420032B1 (en) 1999-03-17 2002-07-16 General Electric Company Adhesion layer for metal oxide UV filters
US6261694B1 (en) 1999-03-17 2001-07-17 General Electric Company Infrared reflecting coatings
US6582823B1 (en) * 1999-04-30 2003-06-24 North Carolina State University Wear-resistant polymeric articles and methods of making the same
US6376064B1 (en) * 1999-12-13 2002-04-23 General Electric Company Layered article with improved microcrack resistance and method of making
US6743516B2 (en) 2000-09-29 2004-06-01 Guardian Industries Corporation Highly durable hydrophobic coatings and methods
US6258735B1 (en) 2000-10-05 2001-07-10 Applied Materials, Inc. Method for using bypass lines to stabilize gas flow and maintain plasma inside a deposition chamber
US6531398B1 (en) 2000-10-30 2003-03-11 Applied Materials, Inc. Method of depositing organosillicate layers
CN1650100A (zh) 2001-01-18 2005-08-03 陶氏环球技术公司 粘接式气门罩气缸盖组件
US6709721B2 (en) 2001-03-28 2004-03-23 Applied Materials Inc. Purge heater design and process development for the improvement of low k film properties
US6543404B2 (en) 2001-04-04 2003-04-08 Dow Global Technologies, Inc. Adhesively bonded engine intake manifold assembly
JP2003011661A (ja) * 2001-06-25 2003-01-15 Exatec Llc 自動車用固定グレイジングを提供するためのパネルおよび方法
US6733714B2 (en) * 2001-08-13 2004-05-11 Edwin J. Oakey Method for forming high-impact, transparent, distortion-free polymeric material
CN100457499C (zh) * 2001-08-15 2009-02-04 陶氏环球技术公司 改进的座椅系统
WO2003031362A1 (en) * 2001-10-05 2003-04-17 Dow Global Technologies Inc. Coated glass for use in displays and other electronic devices
US6890850B2 (en) * 2001-12-14 2005-05-10 Applied Materials, Inc. Method of depositing dielectric materials in damascene applications
US6838393B2 (en) * 2001-12-14 2005-01-04 Applied Materials, Inc. Method for producing semiconductor including forming a layer containing at least silicon carbide and forming a second layer containing at least silicon oxygen carbide
US6613389B2 (en) * 2001-12-26 2003-09-02 Dow Global Technologies, Inc. Coating process and composition for same
US20030183245A1 (en) * 2002-04-01 2003-10-02 Min-Shyan Sheu Surface silanization
US20030206337A1 (en) * 2002-05-06 2003-11-06 Eastman Kodak Company Exposure apparatus for irradiating a sensitized substrate
US6860010B2 (en) 2002-05-15 2005-03-01 Dow Global Technologies, Inc. Method of forming an automotive valve cover with integral positive crankcase ventilation
US7105460B2 (en) * 2002-07-11 2006-09-12 Applied Materials Nitrogen-free dielectric anti-reflective coating and hardmask
US6927178B2 (en) * 2002-07-11 2005-08-09 Applied Materials, Inc. Nitrogen-free dielectric anti-reflective coating and hardmask
US7128373B2 (en) * 2002-09-27 2006-10-31 Dow Global Technologies, Inc. Seating system and method of forming same
US6905773B2 (en) * 2002-10-22 2005-06-14 Schlage Lock Company Corrosion-resistant coatings and methods of manufacturing the same
JP2006509887A (ja) * 2002-12-13 2006-03-23 ダウ グローバル テクノロジーズ インコーポレイティド 耐点火性ポリマー複合体
US7250091B2 (en) * 2003-02-13 2007-07-31 Dow Global Technologies Inc Method of forming a seating system
US20040253378A1 (en) * 2003-06-12 2004-12-16 Applied Materials, Inc. Stress reduction of SIOC low k film by addition of alkylenes to OMCTS based processes
US7360519B2 (en) * 2003-07-10 2008-04-22 Dow Global Technologies, Inc. Engine intake manifold assembly
US20050037153A1 (en) * 2003-08-14 2005-02-17 Applied Materials, Inc. Stress reduction of sioc low k films
DE602004015815D1 (de) * 2003-09-19 2008-09-25 Dow Global Technologies Inc Verklebte motor- und getriebeteile
ATE375860T1 (de) * 2004-02-03 2007-11-15 Ems Chemie Ag Werkstoffverbunde aus einem formteil aus transparenten oder transluzenten, einfärbbaren kunststoffformmassen
US7030041B2 (en) * 2004-03-15 2006-04-18 Applied Materials Inc. Adhesion improvement for low k dielectrics
KR20070056135A (ko) 2004-09-01 2007-05-31 다우 글로벌 테크놀로지스 인크. 접착 촉진제
CN101031669A (zh) * 2004-09-27 2007-09-05 陶氏环球技术公司 由等离子体增强的化学气相沉积的多层涂层
JP2008518109A (ja) * 2004-10-29 2008-05-29 ダウ グローバル テクノロジーズ インコーポレイティド プラズマ増強化学蒸着法による耐摩耗性被膜
US8182884B2 (en) * 2005-02-28 2012-05-22 GM Global Technology Operations LLC Process for application of a hydrophilic coating to fuel cell bipolar plates
DE102005016422A1 (de) * 2005-04-08 2006-10-12 Hugo Claus Gmbh + Co. Kg Komponente für eine Lackiereinrichtung und Vorrichtung zu ihrer Entlackung
US20070020451A1 (en) 2005-07-20 2007-01-25 3M Innovative Properties Company Moisture barrier coatings
ATE406413T1 (de) * 2006-01-27 2008-09-15 Ems Chemie Ag Photochrome formmassen und daraus hergestellte gegenstände
US20070212548A1 (en) * 2006-03-10 2007-09-13 Exatec Llc Glazing system with high glass transition temperature decorative ink
US7897093B2 (en) * 2006-04-19 2011-03-01 Dow Global Technologies Inc. Thermoplastic articles and improved processes for making the same
US20070261224A1 (en) * 2006-05-11 2007-11-15 Dow Global Technologies Inc. Methods and articles in having a fringed microprotrusion surface structure
US8251688B2 (en) * 2006-05-12 2012-08-28 PH Realty, Inc. Apparatus for a mold vacuum system and method of forming a sheet utilizing the system
US20080006819A1 (en) * 2006-06-19 2008-01-10 3M Innovative Properties Company Moisture barrier coatings for organic light emitting diode devices
JP5562029B2 (ja) * 2006-06-29 2014-07-30 ダウ グローバル テクノロジーズ エルエルシー 熱可塑性物品および改良されたマスターバッチを用いたその製法
US20080160298A1 (en) * 2006-12-28 2008-07-03 Chengtao Li Polycarbonate glazing system and method for making the same
US8241713B2 (en) * 2007-02-21 2012-08-14 3M Innovative Properties Company Moisture barrier coatings for organic light emitting diode devices
US7878054B2 (en) * 2007-02-28 2011-02-01 The Boeing Company Barrier coatings for polymeric substrates
CN101678618A (zh) * 2007-05-01 2010-03-24 埃克阿泰克有限责任公司 等离子体涂层的边缘修补和现场修复
JP2010535291A (ja) * 2007-07-30 2010-11-18 ダウ グローバル テクノロジーズ インコーポレイティド 大気圧プラズマ化学蒸着方法
US20090061200A1 (en) * 2007-08-31 2009-03-05 Tristar Plastics Corporation Hydrophobic Insulation Material
WO2009104407A1 (ja) * 2008-02-20 2009-08-27 ダイキョーニシカワ株式会社 樹脂成形体
ITMI20080773A1 (it) * 2008-04-24 2009-10-25 Moma S R L Dispositivo per applicazioni termoidrauliche con migliorate proprieta anticalcare e relativo metodo di ottenimento
DE102008052098B4 (de) * 2008-10-14 2013-04-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung photokatalytisch aktiver Titandioxidschichten
US20100098885A1 (en) * 2008-10-21 2010-04-22 United Technologies Corporation Plasma silanization support method and system
US20100098836A1 (en) * 2008-10-21 2010-04-22 United Technologies Corporation Method and system for monitoring silane deposition
EP2251452B1 (en) 2009-05-13 2018-07-18 SiO2 Medical Products, Inc. Pecvd apparatus for vessel coating
KR101644301B1 (ko) 2009-01-30 2016-07-29 다우 글로벌 테크놀로지스 엘엘씨 중합체성 조성물 및 개선된 미학을 갖는 충전된 ｔｐｏ 제품
US7985188B2 (en) * 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
DE102009030810B4 (de) * 2009-06-26 2017-09-21 Alanod Gmbh & Co. Kg Beschichtung für einen optischen Reflektor
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US20110073251A1 (en) * 2009-09-29 2011-03-31 United Technologies Corporation Component bonding preparation method
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US8802603B2 (en) 2010-06-17 2014-08-12 Becton, Dickinson And Company Medical components having coated surfaces exhibiting low friction and low reactivity
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
FR2969162B1 (fr) * 2010-12-21 2014-04-18 Rhodia Operations Article ignifuge a base de polyamide comprenant un revetement par traitement plasma
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US8852693B2 (en) * 2011-05-19 2014-10-07 Liquipel Ip Llc Coated electronic devices and associated methods
KR101702471B1 (ko) * 2011-08-26 2017-02-03 엑사테크 엘.엘.씨. 유기 수지 라미네이트, 이의 제조 및 이용 방법, 및 이를 포함하는 제품
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
CN103930595A (zh) 2011-11-11 2014-07-16 Sio2医药产品公司 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备
WO2013165891A1 (en) * 2012-05-03 2013-11-07 3M Innovative Properties Company Durable solar mirror films
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
WO2014078666A1 (en) 2012-11-16 2014-05-22 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
EP2925903B1 (en) 2012-11-30 2022-04-13 Si02 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
WO2014164928A1 (en) 2013-03-11 2014-10-09 Sio2 Medical Products, Inc. Coated packaging
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
WO2014144926A1 (en) 2013-03-15 2014-09-18 Sio2 Medical Products, Inc. Coating method
JP2015098617A (ja) * 2013-11-18 2015-05-28 株式会社島津製作所 成膜装置
US9435268B2 (en) * 2014-03-24 2016-09-06 General Electric Company Methods of Si based ceramic components volatilization control in a gas turbine engine
EP3122917B1 (en) 2014-03-28 2020-05-06 SiO2 Medical Products, Inc. Antistatic coatings for plastic vessels
JP6294189B2 (ja) * 2014-08-22 2018-03-14 本田技研工業株式会社 表面改質金属部材及びその製造方法
EP3261605B2 (en) 2015-02-26 2022-04-20 SiO2 Medical Products, Inc. Cycloolefin polymer container with a scratch resistant and anti-static coating
EP4001456A1 (en) 2015-08-18 2022-05-25 SiO2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
WO2018118467A2 (en) * 2016-12-20 2018-06-28 Corning Incorporated Glass-based articles having crack mitigating single- and multi-layer films for retained article strength and scratch resistance
US20200171244A1 (en) * 2017-05-24 2020-06-04 Sio2 Medical Products, Inc. Sterilizable pharmaceutical package for ophthalmic formulations
FR3091875B1 (fr) * 2019-01-17 2021-09-24 Innovative Systems Et Tech Isytech Procédé et dispositif de traitement pour le dépôt d’un revêtement à effet barrière

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1077787A (en) * 1975-11-21 1980-05-20 National Aeronautics And Space Administration Abrasion resistant coatings for plastic surfaces
US4260647A (en) * 1979-06-13 1981-04-07 Rca Corporation Method of depositing an abrasive layer
US4493855A (en) * 1982-12-23 1985-01-15 International Business Machines Corporation Use of plasma polymerized organosilicon films in fabrication of lift-off masks
US4599243A (en) * 1982-12-23 1986-07-08 International Business Machines Corporation Use of plasma polymerized organosilicon films in fabrication of lift-off masks
FR2540128B1 (fr) * 1983-01-27 1986-02-21 Rhone Poulenc Spec Chim Compositions organopolysiloxaniques contenant des polyacyloxysilanes et durcissant tres rapidement en elastomeres en presence d'accelerateur du type hydroxyde metallique
EP0182367B1 (en) * 1984-11-20 1990-04-18 Hitachi Maxell Ltd. Magnetic recording medium and production of the same
JPS61159426A (ja) * 1984-12-28 1986-07-19 Stanley Electric Co Ltd プラズマ重合体膜の形成方法
DE3521318A1 (de) * 1985-06-14 1986-12-18 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum behandeln, insbesondere zum beschichten, von substraten mittels einer plasmaentladung
US4755426A (en) * 1986-01-18 1988-07-05 Hitachi Maxell, Ltd. Magnetic recording medium and production of the same
DE3624467A1 (de) * 1986-07-19 1988-01-28 Leybold Heraeus Gmbh & Co Kg Verfahren zum herstellen transparenter schutzschichten aus siliziumverbindungen
JP2560708B2 (ja) * 1987-01-22 1996-12-04 株式会社ブリヂストン プラスチツク表面の硬化保護膜及びその製造方法
US4927704A (en) * 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them
US5041303A (en) * 1988-03-07 1991-08-20 Polyplasma Incorporated Process for modifying large polymeric surfaces
US4894352A (en) * 1988-10-26 1990-01-16 Texas Instruments Inc. Deposition of silicon-containing films using organosilicon compounds and nitrogen trifluoride
DE3838412A1 (de) * 1988-11-12 1990-05-17 Ara Werk Kraemer Gmbh & Co Kaltvulkanisierbare siliconkautschukmasse, verfahren zu ihrer herstellung und verwendung
JP2854890B2 (ja) * 1989-09-13 1999-02-10 東レ・ダウコーニング・シリコーン株式会社 気体分離膜
JPH03108136A (ja) * 1989-09-20 1991-05-08 Sekisui Chem Co Ltd 光情報記録媒体およびその製造方法
JPH03126881A (ja) * 1989-10-11 1991-05-30 Ulvac Japan Ltd マグネトロンエッチング装置

Also Published As

Publication number Publication date
KR100299403B1 (ko) 2001-11-22
CA2147486C (en) 2005-06-28
JPH08505186A (ja) 1996-06-04
KR100360579B1 (ko) 2002-11-13
EP0674722B1 (en) 1998-05-06
KR100344334B1 (ko) 2002-07-22
KR950704535A (ko) 1995-11-20
JP3488458B2 (ja) 2004-01-19
US5320875A (en) 1994-06-14
TW296394B (cg-RX-API-DMAC7.html) 1997-01-21
US5298587A (en) 1994-03-29
DE69318424D1 (de) 1998-06-10
DE69318424T2 (de) 1998-12-17
CA2147486A1 (en) 1994-07-07
MX9306910A (es) 1994-06-30
WO1994014998A1 (en) 1994-07-07
EP0674722A1 (en) 1995-10-04

Similar Documents

Publication Publication Date Title
TW375536B (en) Apparatus for generating plasma
DE59308639D1 (de) Verfahren zum Erzeugen von siliciumoxidischen kratzfesten Schichten auf Kunststoffen durch Plasmabeschichtung
DE841140T1 (de) Verfahren zur Verbesserung der Entformungseigenschaften eines Formwerkzeuges durch eine Niedertemperatur-Plasmabehandlung
MY112082A (en) Process for thin film formation
DE69021960D1 (de) Verfahren zur kontinuierlichen Herstellung von einem grossflächigen funktionellen aufgedampften Film mittels Mikrowellen-Plasma-CVD sowie Anlage zur Durchführung des Verfahrens.
AU2242392A (en) Method and apparatus for generating vocal harmonies
GB9117091D0 (en) Diamond-like carbon coatings
JPS5614534A (en) Surface treatment of plastic molded product
AU7692294A (en) Process for the polymerization of cyclic olefins and a polymerizable composition
ES8707264A1 (es) Un procedimiento semicontinuo para preparar un producto de reaccion polimero no gelificado
EP0463406A3 (en) Propylenpolymers with broad molecular weight distribution
AU695905B2 (en) Process, and apparatus, for the injection of preheated oxygen into a high temperature reactor
HUT66775A (en) Polymer scale preventive agent, polymerization vessel having a polymer scale preventive coating and process of producing polymer using said vessel
CA2086123A1 (en) Apparatus and process for metering powder
EP0932083A3 (en) Coating composition for electrifying members and electrophotographic carrier
ZA79580B (en) Vinyl halide polymerisation process,reactor therefor and coating product for use in process and with reactor
MY121015A (en) Dual face shower head magnetron, plasma generating apparatus and method of coating a substrate
JPS57115431A (en) Surface treatment of thermoplastic synthetic resin molded product
PL339303A1 (en) Method of reducing contamination of a reactor
AU1985192A (en) A method of generating high carotenoid-producing microorganisms, microorganisms obtained by the method and a process for producing carotenoid-containing cells or cell parts or purified carotenoid
NO910269L (no) Kontinuerlig fremgangsmaate for fremstilling av tetrafosforpolysulfider.
AU659990B3 (en) Apparatus for generating a mixture of hydrogen and oxygen
GB2326165A (en) Method for reducing crazing in a plastics material
GB2270749B (en) An apparatus for generating a mixture of hydrogen and oxygen for producing a hot flame
JPS6426602A (en) Continuous production of polyvinyl acetate having low polymerization degree and polyvinyl alcohol having low polymerization degree

Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent