TW337556B - Phase shifting light shade, the phase shifting light shade frame and its manufacturing method - Google Patents

Phase shifting light shade, the phase shifting light shade frame and its manufacturing method

Info

Publication number
TW337556B
TW337556B TW085112357A TW85112357A TW337556B TW 337556 B TW337556 B TW 337556B TW 085112357 A TW085112357 A TW 085112357A TW 85112357 A TW85112357 A TW 85112357A TW 337556 B TW337556 B TW 337556B
Authority
TW
Taiwan
Prior art keywords
light
light area
main surface
phase shifting
area
Prior art date
Application number
TW085112357A
Other languages
English (en)
Inventor
Shuuji Nakao
Nori Kanaoka
Kouichirou Tsujita
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of TW337556B publication Critical patent/TW337556B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW085112357A 1996-05-15 1996-10-09 Phase shifting light shade, the phase shifting light shade frame and its manufacturing method TW337556B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12005296A JPH09304912A (ja) 1996-05-15 1996-05-15 位相シフトマスク、位相シフトマスク用ブランクスおよび位相シフトマスクの製造方法

Publications (1)

Publication Number Publication Date
TW337556B true TW337556B (en) 1998-08-01

Family

ID=14776707

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085112357A TW337556B (en) 1996-05-15 1996-10-09 Phase shifting light shade, the phase shifting light shade frame and its manufacturing method

Country Status (6)

Country Link
US (1) US5902702A (zh)
EP (2) EP0807851B1 (zh)
JP (1) JPH09304912A (zh)
KR (1) KR100230714B1 (zh)
DE (2) DE69606979T2 (zh)
TW (1) TW337556B (zh)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW365654B (en) * 1997-07-01 1999-08-01 Matsushita Electronics Corp Electronic device phase shift mask and method using the same
EP1025711A1 (en) * 1997-10-31 2000-08-09 Daewoo Electronics Co., Ltd Method for manufacturing thin film actuated mirror array in an optical projection system
US6045954A (en) * 1998-06-12 2000-04-04 Industrial Technology Research Institute Formation of silicon nitride film for a phase shift mask at 193 nm
KR100278996B1 (ko) * 1998-12-18 2001-02-01 김영환 반도체장치의 콘택 형성방법
KR100322537B1 (ko) 1999-07-02 2002-03-25 윤종용 블랭크 마스크 및 이를 이용한 위상 반전 마스크 제조방법
JP2001201842A (ja) * 1999-11-09 2001-07-27 Ulvac Seimaku Kk 位相シフトフォトマスクブランクス及び位相シフトフォトマスク並びに半導体装置の製造方法
JP2002009056A (ja) * 2000-06-22 2002-01-11 Mitsubishi Electric Corp 微細パターン形成方法およびその方法により製造した装置
US6395435B1 (en) 2000-06-27 2002-05-28 The United States Of America As Represented By The Secretary Of The Navy Photo-lithographic mask having total internal reflective surfaces
US6651313B1 (en) * 2000-10-06 2003-11-25 International Business Machines Corporation Method for manufacturing a magnetic head
US6636544B2 (en) 2000-12-06 2003-10-21 Applied Optoelectronics, Inc. Overlapping wavelength-tunable vertical cavity surface-emitting laser (VCSEL) arrays
US6696307B2 (en) 2000-12-06 2004-02-24 Applied Optoelectronics, Inc. Patterned phase shift layers for wavelength-selectable vertical cavity surface-emitting laser (VCSEL) arrays
AU2002220196A1 (en) * 2000-12-06 2002-06-18 Applied Optoelectronics, Inc. Patterned phase shift layers for wavelength-selectable vertical-cavity surface-emitting laser (vcsel) arrays
US6724796B2 (en) 2000-12-06 2004-04-20 Applied Optoelectronics, Inc. Modified distributed bragg reflector (DBR) for vertical cavity surface-emitting laser (VCSEL) resonant wavelength tuning sensitivity control
US6387787B1 (en) * 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
US6649531B2 (en) 2001-11-26 2003-11-18 International Business Machines Corporation Process for forming a damascene structure
EP1857876A1 (en) * 2006-05-15 2007-11-21 Advanced Mask Technology Center GmbH & Co. KG Method of forming a phase shift mask
KR102115564B1 (ko) 2013-09-24 2020-05-27 삼성디스플레이 주식회사 표시기판 및 이를 포함하는 표시패널
JP6716629B2 (ja) * 2017-05-18 2020-07-01 エスアンドエス テック カンパニー リミテッド 位相反転ブランクマスク及びその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5362591A (en) * 1989-10-09 1994-11-08 Hitachi Ltd. Et Al. Mask having a phase shifter and method of manufacturing same
EP0451307B1 (de) * 1990-04-09 1996-10-23 Siemens Aktiengesellschaft Phasenmaske für die Projektionsphotolithographie und Verfahren zu deren Herstellung
JPH0468352A (ja) * 1990-07-10 1992-03-04 Dainippon Printing Co Ltd 位相シフト層を有するフォトマスク及びその製造方法
JPH04147142A (ja) * 1990-10-09 1992-05-20 Mitsubishi Electric Corp フォトマスクおよびその製造方法
JP3036085B2 (ja) * 1990-12-28 2000-04-24 富士通株式会社 光学マスクとその欠陥修正方法
JPH04365044A (ja) * 1991-06-11 1992-12-17 Toppan Printing Co Ltd 位相シフト用マスクブランクおよび位相シフトマスクの製造方法
US5272024A (en) * 1992-04-08 1993-12-21 International Business Machines Corporation Mask-structure and process to repair missing or unwanted phase-shifting elements
JP3228354B2 (ja) * 1992-09-11 2001-11-12 凸版印刷株式会社 位相シフトマスク及び位相シフトマスクブランク並びに位相シフトマスクブランクの製造方法
JP3322284B2 (ja) * 1993-08-31 2002-09-09 凸版印刷株式会社 位相シフトマスク及びその製造方法
JPH0792655A (ja) * 1993-09-28 1995-04-07 Toppan Printing Co Ltd 光学マスクとマスクブランクおよびそれらの製造方法
JPH07159971A (ja) * 1993-12-06 1995-06-23 Toppan Printing Co Ltd 光学マスクブランクと光学マスクおよびそれらの製造方法

Also Published As

Publication number Publication date
KR100230714B1 (ko) 1999-11-15
JPH09304912A (ja) 1997-11-28
EP0807851B1 (en) 2000-03-08
DE69606979T2 (de) 2000-07-20
EP0922997A1 (en) 1999-06-16
DE69606979D1 (de) 2000-04-13
EP0807851A1 (en) 1997-11-19
US5902702A (en) 1999-05-11
EP0922997B1 (en) 2002-07-17
DE69622438T2 (de) 2003-02-20
KR970076063A (ko) 1997-12-10
DE69622438D1 (de) 2002-08-22

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