DE69622438D1 - Phasenverschiebungsmaske und Verfahren zur Herstellung einer solchen Maske - Google Patents
Phasenverschiebungsmaske und Verfahren zur Herstellung einer solchen MaskeInfo
- Publication number
- DE69622438D1 DE69622438D1 DE69622438T DE69622438T DE69622438D1 DE 69622438 D1 DE69622438 D1 DE 69622438D1 DE 69622438 T DE69622438 T DE 69622438T DE 69622438 T DE69622438 T DE 69622438T DE 69622438 D1 DE69622438 D1 DE 69622438D1
- Authority
- DE
- Germany
- Prior art keywords
- mask
- making
- phase shift
- shift mask
- phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12005296A JPH09304912A (ja) | 1996-05-15 | 1996-05-15 | 位相シフトマスク、位相シフトマスク用ブランクスおよび位相シフトマスクの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69622438D1 true DE69622438D1 (de) | 2002-08-22 |
DE69622438T2 DE69622438T2 (de) | 2003-02-20 |
Family
ID=14776707
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69606979T Expired - Fee Related DE69606979T2 (de) | 1996-05-15 | 1996-10-23 | Phasenverschiebungsmaske, Rohteil für eine solche Maske und Verfahren zur Herstellung einer solchen Maske |
DE69622438T Expired - Fee Related DE69622438T2 (de) | 1996-05-15 | 1996-10-23 | Phasenverschiebungsmaske und Verfahren zur Herstellung einer solchen Maske |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69606979T Expired - Fee Related DE69606979T2 (de) | 1996-05-15 | 1996-10-23 | Phasenverschiebungsmaske, Rohteil für eine solche Maske und Verfahren zur Herstellung einer solchen Maske |
Country Status (6)
Country | Link |
---|---|
US (1) | US5902702A (de) |
EP (2) | EP0807851B1 (de) |
JP (1) | JPH09304912A (de) |
KR (1) | KR100230714B1 (de) |
DE (2) | DE69606979T2 (de) |
TW (1) | TW337556B (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW365654B (en) | 1997-07-01 | 1999-08-01 | Matsushita Electronics Corp | Electronic device phase shift mask and method using the same |
EP1025711A1 (de) * | 1997-10-31 | 2000-08-09 | Daewoo Electronics Co., Ltd | Verfahren zur herstellung einer dünnfilmbestätigten spiegelmatrix in einem optischen projektionssystem |
US6045954A (en) * | 1998-06-12 | 2000-04-04 | Industrial Technology Research Institute | Formation of silicon nitride film for a phase shift mask at 193 nm |
KR100278996B1 (ko) * | 1998-12-18 | 2001-02-01 | 김영환 | 반도체장치의 콘택 형성방법 |
KR100322537B1 (ko) | 1999-07-02 | 2002-03-25 | 윤종용 | 블랭크 마스크 및 이를 이용한 위상 반전 마스크 제조방법 |
JP2001201842A (ja) * | 1999-11-09 | 2001-07-27 | Ulvac Seimaku Kk | 位相シフトフォトマスクブランクス及び位相シフトフォトマスク並びに半導体装置の製造方法 |
JP2002009056A (ja) * | 2000-06-22 | 2002-01-11 | Mitsubishi Electric Corp | 微細パターン形成方法およびその方法により製造した装置 |
US6395435B1 (en) | 2000-06-27 | 2002-05-28 | The United States Of America As Represented By The Secretary Of The Navy | Photo-lithographic mask having total internal reflective surfaces |
US6651313B1 (en) * | 2000-10-06 | 2003-11-25 | International Business Machines Corporation | Method for manufacturing a magnetic head |
US6696307B2 (en) | 2000-12-06 | 2004-02-24 | Applied Optoelectronics, Inc. | Patterned phase shift layers for wavelength-selectable vertical cavity surface-emitting laser (VCSEL) arrays |
US6724796B2 (en) | 2000-12-06 | 2004-04-20 | Applied Optoelectronics, Inc. | Modified distributed bragg reflector (DBR) for vertical cavity surface-emitting laser (VCSEL) resonant wavelength tuning sensitivity control |
WO2002047128A1 (en) * | 2000-12-06 | 2002-06-13 | Applied Optoelectronics, Inc. | Patterned phase shift layers for wavelength-selectable vertical-cavity surface-emitting laser (vcsel) arrays |
US6636544B2 (en) | 2000-12-06 | 2003-10-21 | Applied Optoelectronics, Inc. | Overlapping wavelength-tunable vertical cavity surface-emitting laser (VCSEL) arrays |
US6387787B1 (en) * | 2001-03-02 | 2002-05-14 | Motorola, Inc. | Lithographic template and method of formation and use |
US6649531B2 (en) | 2001-11-26 | 2003-11-18 | International Business Machines Corporation | Process for forming a damascene structure |
EP1857876A1 (de) * | 2006-05-15 | 2007-11-21 | Advanced Mask Technology Center GmbH & Co. KG | Methode zur Herstellung einer Phasenschiebermaske |
KR102115564B1 (ko) | 2013-09-24 | 2020-05-27 | 삼성디스플레이 주식회사 | 표시기판 및 이를 포함하는 표시패널 |
JP6716629B2 (ja) * | 2017-05-18 | 2020-07-01 | エスアンドエス テック カンパニー リミテッド | 位相反転ブランクマスク及びその製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5362591A (en) * | 1989-10-09 | 1994-11-08 | Hitachi Ltd. Et Al. | Mask having a phase shifter and method of manufacturing same |
DE59010548D1 (de) * | 1990-04-09 | 1996-11-28 | Siemens Ag | Phasenmaske für die Projektionsphotolithographie und Verfahren zu deren Herstellung |
JPH0468352A (ja) * | 1990-07-10 | 1992-03-04 | Dainippon Printing Co Ltd | 位相シフト層を有するフォトマスク及びその製造方法 |
JPH04147142A (ja) * | 1990-10-09 | 1992-05-20 | Mitsubishi Electric Corp | フォトマスクおよびその製造方法 |
JP3036085B2 (ja) * | 1990-12-28 | 2000-04-24 | 富士通株式会社 | 光学マスクとその欠陥修正方法 |
JPH04365044A (ja) * | 1991-06-11 | 1992-12-17 | Toppan Printing Co Ltd | 位相シフト用マスクブランクおよび位相シフトマスクの製造方法 |
US5272024A (en) * | 1992-04-08 | 1993-12-21 | International Business Machines Corporation | Mask-structure and process to repair missing or unwanted phase-shifting elements |
JP3228354B2 (ja) * | 1992-09-11 | 2001-11-12 | 凸版印刷株式会社 | 位相シフトマスク及び位相シフトマスクブランク並びに位相シフトマスクブランクの製造方法 |
JP3322284B2 (ja) | 1993-08-31 | 2002-09-09 | 凸版印刷株式会社 | 位相シフトマスク及びその製造方法 |
JPH0792655A (ja) * | 1993-09-28 | 1995-04-07 | Toppan Printing Co Ltd | 光学マスクとマスクブランクおよびそれらの製造方法 |
JPH07159971A (ja) | 1993-12-06 | 1995-06-23 | Toppan Printing Co Ltd | 光学マスクブランクと光学マスクおよびそれらの製造方法 |
-
1996
- 1996-05-15 JP JP12005296A patent/JPH09304912A/ja active Pending
- 1996-10-09 TW TW085112357A patent/TW337556B/zh active
- 1996-10-23 DE DE69606979T patent/DE69606979T2/de not_active Expired - Fee Related
- 1996-10-23 EP EP96117021A patent/EP0807851B1/de not_active Expired - Lifetime
- 1996-10-23 DE DE69622438T patent/DE69622438T2/de not_active Expired - Fee Related
- 1996-10-23 EP EP98118148A patent/EP0922997B1/de not_active Expired - Lifetime
- 1996-11-12 US US08/745,556 patent/US5902702A/en not_active Expired - Fee Related
-
1997
- 1997-01-11 KR KR1019970000586A patent/KR100230714B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100230714B1 (ko) | 1999-11-15 |
TW337556B (en) | 1998-08-01 |
US5902702A (en) | 1999-05-11 |
EP0807851A1 (de) | 1997-11-19 |
EP0922997B1 (de) | 2002-07-17 |
KR970076063A (ko) | 1997-12-10 |
EP0922997A1 (de) | 1999-06-16 |
DE69606979D1 (de) | 2000-04-13 |
DE69622438T2 (de) | 2003-02-20 |
JPH09304912A (ja) | 1997-11-28 |
EP0807851B1 (de) | 2000-03-08 |
DE69606979T2 (de) | 2000-07-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |