TW335570B - 2D balanced positioning device, and lithographic device provided with such a positioning device - Google Patents
2D balanced positioning device, and lithographic device provided with such a positioning deviceInfo
- Publication number
- TW335570B TW335570B TW086108976A TW86108976A TW335570B TW 335570 B TW335570 B TW 335570B TW 086108976 A TW086108976 A TW 086108976A TW 86108976 A TW86108976 A TW 86108976A TW 335570 B TW335570 B TW 335570B
- Authority
- TW
- Taiwan
- Prior art keywords
- parallel
- guide
- actuator
- shift
- viewed
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/44—Movable or adjustable work or tool supports using particular mechanisms
- B23Q1/56—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/60—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/62—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides
- B23Q1/621—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides a single sliding pair followed perpendicularly by a single sliding pair
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/44—Movable or adjustable work or tool supports using particular mechanisms
- B23Q1/56—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/60—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/62—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides
- B23Q1/621—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides a single sliding pair followed perpendicularly by a single sliding pair
- B23Q1/623—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides a single sliding pair followed perpendicularly by a single sliding pair followed perpendicularly by a single rotating pair
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q11/00—Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
- B23Q11/0032—Arrangements for preventing or isolating vibrations in parts of the machine
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Chemical & Material Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Library & Information Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP96203709 | 1996-12-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW335570B true TW335570B (en) | 1998-07-01 |
Family
ID=8224766
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086108976A TW335570B (en) | 1996-12-24 | 1997-06-26 | 2D balanced positioning device, and lithographic device provided with such a positioning device |
Country Status (6)
Country | Link |
---|---|
US (1) | US5815246A (zh) |
EP (1) | EP0894287B1 (zh) |
JP (1) | JP4338223B2 (zh) |
DE (1) | DE69702601T2 (zh) |
TW (1) | TW335570B (zh) |
WO (1) | WO1998028664A1 (zh) |
Families Citing this family (58)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999016113A1 (fr) * | 1997-09-19 | 1999-04-01 | Nikon Corporation | Platine, dispositif d'alignement de balayage et procede d'exposition de balayage, et dispositif fabrique par ce moyen |
US20010003028A1 (en) | 1997-09-19 | 2001-06-07 | Nikon Corporation | Scanning Exposure Method |
AU1051999A (en) | 1997-11-12 | 1999-05-31 | Nikon Corporation | Projection exposure apparatus |
JP3387809B2 (ja) * | 1998-02-18 | 2003-03-17 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
KR20010043861A (ko) * | 1998-06-17 | 2001-05-25 | 오노 시게오 | 노광방법 및 장치 |
JP4146952B2 (ja) | 1999-01-11 | 2008-09-10 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
JP2001118773A (ja) | 1999-10-18 | 2001-04-27 | Nikon Corp | ステージ装置及び露光装置 |
DE60032568T2 (de) * | 1999-12-01 | 2007-10-04 | Asml Netherlands B.V. | Positionierungsapparat und damit versehener lithographischer Apparat |
EP1111470B1 (en) * | 1999-12-21 | 2007-03-07 | ASML Netherlands B.V. | Lithographic apparatus with a balanced positioning system |
US6836093B1 (en) | 1999-12-21 | 2004-12-28 | Nikon Corporation | Exposure method and apparatus |
EP1111469B1 (en) * | 1999-12-21 | 2007-10-17 | ASML Netherlands B.V. | Lithographic apparatus with a balanced positioning system |
TWI264617B (en) | 1999-12-21 | 2006-10-21 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
TW546551B (en) * | 1999-12-21 | 2003-08-11 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
JP4474020B2 (ja) * | 2000-06-23 | 2010-06-02 | キヤノン株式会社 | 移動装置及び露光装置 |
US6958808B2 (en) * | 2000-11-16 | 2005-10-25 | Nikon Corporation | System and method for resetting a reaction mass assembly of a stage assembly |
US6757053B1 (en) | 2000-11-16 | 2004-06-29 | Nikon Corporation | Stage assembly including a reaction mass assembly |
US6593997B1 (en) * | 2000-11-16 | 2003-07-15 | Nikon Corporation | Stage assembly including a reaction assembly |
US6603531B1 (en) * | 2000-11-16 | 2003-08-05 | Nikon Corporation | Stage assembly including a reaction assembly that is connected by actuators |
US6885430B2 (en) * | 2000-11-16 | 2005-04-26 | Nikon Corporation | System and method for resetting a reaction mass assembly of a stage assembly |
US6987558B2 (en) | 2001-01-16 | 2006-01-17 | Nikon Corporation | Reaction mass for a stage device |
US6927838B2 (en) | 2001-02-27 | 2005-08-09 | Nikon Corporation | Multiple stage, stage assembly having independent stage bases |
US20020117109A1 (en) * | 2001-02-27 | 2002-08-29 | Hazelton Andrew J. | Multiple stage, stage assembly having independent reaction force transfer |
EP1243969A1 (en) * | 2001-03-20 | 2002-09-25 | Asm Lithography B.V. | Lithographic projection apparatus and positioning system |
US6844694B2 (en) | 2001-08-10 | 2005-01-18 | Nikon Corporation | Stage assembly and exposure apparatus including the same |
US6597435B2 (en) | 2001-10-09 | 2003-07-22 | Nikon Corporation | Reticle stage with reaction force cancellation |
US6927505B2 (en) * | 2001-12-19 | 2005-08-09 | Nikon Corporation | Following stage planar motor |
US7061577B2 (en) | 2002-03-26 | 2006-06-13 | Nikon Corporation | Image adjustor including damping assembly |
US6724466B2 (en) | 2002-03-26 | 2004-04-20 | Nikon Corporation | Stage assembly including a damping assembly |
JP3947501B2 (ja) * | 2002-06-07 | 2007-07-25 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ用機器およびデバイスの製造方法 |
EP1369745B1 (en) * | 2002-06-07 | 2013-02-27 | ASML Netherlands B.V. | Lihographic apparatus and device manufaturing method |
US20040119436A1 (en) * | 2002-12-23 | 2004-06-24 | Michael Binnard | Method and apparatus for reducing countermass stroke with initial velocity |
JP2004253741A (ja) * | 2003-02-21 | 2004-09-09 | Sumitomo Eaton Noba Kk | 移動装置及び半導体製造装置 |
WO2004086468A1 (ja) | 2003-02-26 | 2004-10-07 | Nikon Corporation | 露光装置、露光方法及びデバイス製造方法 |
SG2012031217A (en) | 2003-04-11 | 2015-09-29 | Nippon Kogaku Kk | Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly |
ATE449982T1 (de) | 2003-04-11 | 2009-12-15 | Nikon Corp | Reinigungsverfahren für optik in immersionslithographie |
TWI616932B (zh) | 2003-05-23 | 2018-03-01 | Nikon Corp | Exposure device and component manufacturing method |
US20040252287A1 (en) * | 2003-06-11 | 2004-12-16 | Michael Binnard | Reaction frame assembly that functions as a reaction mass |
KR101289979B1 (ko) | 2003-06-19 | 2013-07-26 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조방법 |
US7248339B2 (en) * | 2003-07-04 | 2007-07-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR101296501B1 (ko) | 2003-07-09 | 2013-08-13 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
KR101343720B1 (ko) | 2003-07-28 | 2013-12-20 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의제어 방법 |
US7221433B2 (en) | 2004-01-28 | 2007-05-22 | Nikon Corporation | Stage assembly including a reaction assembly having a connector assembly |
JP2005216132A (ja) * | 2004-01-30 | 2005-08-11 | Sumitomo Eaton Noba Kk | 移動装置の制御方法、及び移動装置の連動装置、及び移動装置の連動方法、及び半導体製造装置、及び液晶製造装置、及びメカニカルスキャンイオン注入装置 |
US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
US7224432B2 (en) * | 2004-05-14 | 2007-05-29 | Canon Kabushiki Kaisha | Stage device, exposure apparatus, and device manufacturing method |
KR101747662B1 (ko) | 2004-06-09 | 2017-06-15 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
US8384874B2 (en) | 2004-07-12 | 2013-02-26 | Nikon Corporation | Immersion exposure apparatus and device manufacturing method to detect if liquid on base member |
US7914972B2 (en) * | 2004-07-21 | 2011-03-29 | Nikon Corporation | Exposure method and device manufacturing method |
US7193683B2 (en) * | 2005-01-06 | 2007-03-20 | Nikon Corporation | Stage design for reflective optics |
WO2007055237A1 (ja) * | 2005-11-09 | 2007-05-18 | Nikon Corporation | 露光装置及び露光方法、並びにデバイス製造方法 |
KR100745371B1 (ko) * | 2006-10-23 | 2007-08-02 | 삼성전자주식회사 | 자기부상형 웨이퍼 스테이지 |
US8164736B2 (en) * | 2007-05-29 | 2012-04-24 | Nikon Corporation | Exposure method, exposure apparatus, and method for producing device |
NL2002935A1 (nl) * | 2008-06-27 | 2009-12-29 | Asml Netherlands Bv | Object support positioning device and lithographic apparatus. |
JP4739442B2 (ja) * | 2009-06-09 | 2011-08-03 | キヤノン株式会社 | ステージ装置、及びステージ装置の制御方法、それを用いた露光装置及びデバイスの製造方法 |
BR112015003044A2 (pt) * | 2012-10-09 | 2017-07-04 | Koninklijke Philips Nv | dispositivo de posicionamento, dispositivo e método de controle para uso em um dispositivo de posicionamento, e, programa de computador |
JP6261967B2 (ja) * | 2013-12-03 | 2018-01-17 | 株式会社ディスコ | 加工装置 |
DE102016224940B3 (de) * | 2016-12-14 | 2017-08-24 | Bruker Axs Gmbh | Röntgenvorrichtung mit motorischer Drehmomentkompensation am Detektorkreis des Goniometers und Verfahren zum Betrieb einer Röntgenvorrichtung |
DE102018210996A1 (de) * | 2018-07-04 | 2020-01-09 | Carl Zeiss Smt Gmbh | Abstützung einer optischen einheit |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4676649A (en) * | 1985-11-27 | 1987-06-30 | Compact Spindle Bearing Corp. | Multi-axis gas bearing stage assembly |
EP0393994B1 (en) * | 1989-04-17 | 1994-06-15 | SHARP Corporation | A linear driving apparatus |
NL8902471A (nl) * | 1989-10-05 | 1991-05-01 | Philips Nv | Tweetraps positioneerinrichting. |
NL9100202A (nl) * | 1991-02-05 | 1992-09-01 | Asm Lithography Bv | Lithografische inrichting met een hangende objecttafel. |
NL9100421A (nl) * | 1991-03-08 | 1992-10-01 | Asm Lithography Bv | Ondersteuningsinrichting met een kantelbare objecttafel alsmede optisch lithografische inrichting voorzien van een dergelijke ondersteuningsinrichting. |
JP3277581B2 (ja) * | 1993-02-01 | 2002-04-22 | 株式会社ニコン | ステージ装置および露光装置 |
US5623853A (en) * | 1994-10-19 | 1997-04-29 | Nikon Precision Inc. | Precision motion stage with single guide beam and follower stage |
-
1997
- 1997-06-18 US US08/878,362 patent/US5815246A/en not_active Expired - Lifetime
- 1997-06-26 TW TW086108976A patent/TW335570B/zh not_active IP Right Cessation
- 1997-09-29 DE DE69702601T patent/DE69702601T2/de not_active Expired - Lifetime
- 1997-09-29 EP EP97940299A patent/EP0894287B1/en not_active Expired - Lifetime
- 1997-09-29 JP JP52856498A patent/JP4338223B2/ja not_active Expired - Fee Related
- 1997-09-29 WO PCT/IB1997/001183 patent/WO1998028664A1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
DE69702601T2 (de) | 2001-03-08 |
EP0894287A1 (en) | 1999-02-03 |
JP2000505957A (ja) | 2000-05-16 |
US5815246A (en) | 1998-09-29 |
EP0894287B1 (en) | 2000-07-19 |
JP4338223B2 (ja) | 2009-10-07 |
WO1998028664A1 (en) | 1998-07-02 |
DE69702601D1 (de) | 2000-08-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK4A | Expiration of patent term of an invention patent |