BR112015003044A2 - dispositivo de posicionamento, dispositivo e método de controle para uso em um dispositivo de posicionamento, e, programa de computador - Google Patents

dispositivo de posicionamento, dispositivo e método de controle para uso em um dispositivo de posicionamento, e, programa de computador

Info

Publication number
BR112015003044A2
BR112015003044A2 BR112015003044A BR112015003044A BR112015003044A2 BR 112015003044 A2 BR112015003044 A2 BR 112015003044A2 BR 112015003044 A BR112015003044 A BR 112015003044A BR 112015003044 A BR112015003044 A BR 112015003044A BR 112015003044 A2 BR112015003044 A2 BR 112015003044A2
Authority
BR
Brazil
Prior art keywords
positioning device
computer program
control method
positioning
program
Prior art date
Application number
BR112015003044A
Other languages
English (en)
Inventor
Johannes Wilhelmus Van Lievenoogen Anne
Bernhard Sperling Frank
Original Assignee
Koninklijke Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Nv filed Critical Koninklijke Philips Nv
Publication of BR112015003044A2 publication Critical patent/BR112015003044A2/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B15/00—Systems controlled by a computer
    • G05B15/02—Systems controlled by a computer electric
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Reciprocating, Oscillating Or Vibrating Motors (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Linear Motors (AREA)
  • Control Of Linear Motors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
BR112015003044A 2012-10-09 2013-09-27 dispositivo de posicionamento, dispositivo e método de controle para uso em um dispositivo de posicionamento, e, programa de computador BR112015003044A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261711251P 2012-10-09 2012-10-09
PCT/IB2013/058925 WO2014057386A1 (en) 2012-10-09 2013-09-27 Positioning device, control device and control method

Publications (1)

Publication Number Publication Date
BR112015003044A2 true BR112015003044A2 (pt) 2017-07-04

Family

ID=49765591

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112015003044A BR112015003044A2 (pt) 2012-10-09 2013-09-27 dispositivo de posicionamento, dispositivo e método de controle para uso em um dispositivo de posicionamento, e, programa de computador

Country Status (7)

Country Link
US (1) US9507276B2 (pt)
EP (1) EP2907158B1 (pt)
JP (1) JP5878676B2 (pt)
CN (1) CN104704625B (pt)
BR (1) BR112015003044A2 (pt)
RU (1) RU2633302C2 (pt)
WO (1) WO2014057386A1 (pt)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102003416B1 (ko) * 2012-05-29 2019-07-24 에이에스엠엘 네델란즈 비.브이. 지지 장치, 리소그래피 장치 및 디바이스 제조 방법
JP6452338B2 (ja) * 2013-09-04 2019-01-16 キヤノン株式会社 ステージ装置、およびその駆動方法
CN108279551B (zh) * 2017-01-05 2020-10-27 复旦大学 光刻机运动平台及其微运动平台和控制方法
EP3964893A1 (de) 2020-06-29 2022-03-09 Carl Zeiss SMT GmbH Kompensation von kriecheffekten in einer abbildungseinrichtung
EP3961305A3 (de) 2020-06-29 2022-03-09 Carl Zeiss SMT GmbH Kompensation von kriecheffekten in einer abbildungseinrichtung

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4507597A (en) * 1983-06-10 1985-03-26 The Perkin-Elmer Corporation Electro-magnetic alignment assemblies
JPS61127104A (ja) 1984-11-24 1986-06-14 Matsushita Electric Works Ltd 電磁石装置
SU1732398A1 (ru) * 1989-07-31 1992-05-07 Физико-Энергетический Институт Ан Латвсср Устройство дл подачи и позиционировани полупроводниковых пластин при контроле их свойств
NL8902471A (nl) 1989-10-05 1991-05-01 Philips Nv Tweetraps positioneerinrichting.
US5815246A (en) * 1996-12-24 1998-09-29 U.S. Philips Corporation Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device
AU8747698A (en) 1997-08-21 1999-03-16 Nikon Corporation Positioning device, driving unit, and aligner equipped with the device
US6130517A (en) * 1998-02-12 2000-10-10 Nikon Corporation Magnetic actuator producing large acceleration on fine stage and low RMS power gain
US6437463B1 (en) 2000-04-24 2002-08-20 Nikon Corporation Wafer positioner with planar motor and mag-lev fine stage
JP4745556B2 (ja) * 2001-08-20 2011-08-10 キヤノン株式会社 位置決め装置、露光装置、及びデバイス製造方法
JP4136363B2 (ja) 2001-11-29 2008-08-20 キヤノン株式会社 位置決め装置及びそれを用いた露光装置
US6927505B2 (en) 2001-12-19 2005-08-09 Nikon Corporation Following stage planar motor
KR20050084304A (ko) 2002-12-16 2005-08-26 코닌클리케 필립스 일렉트로닉스 엔.브이. 높은 위치 정밀도로 물체를 처리하는 장치
US20050162802A1 (en) * 2004-01-22 2005-07-28 Nikon Research Corporation Of America Offset gap control for electromagnetic devices
US7253576B2 (en) * 2004-04-05 2007-08-07 Nikon Corporation E/I core actuator commutation formula and control method
US7456935B2 (en) 2005-04-05 2008-11-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table
WO2007057842A1 (en) 2005-11-18 2007-05-24 Koninklijke Philips Electronics N.V. Linear variable reluctance actuator having band coils
US7352149B2 (en) 2006-08-29 2008-04-01 Asml Netherlands B.V. Method for controlling the position of a movable object, a positioning system, and a lithographic apparatus
JP5020597B2 (ja) * 2006-10-27 2012-09-05 キヤノン株式会社 位置決め装置、露光装置、及びデバイス製造方法
NL2005240A (en) 2009-09-22 2011-03-23 Asml Netherlands Bv Actuator, positioning system and lithographic apparatus.

Also Published As

Publication number Publication date
EP2907158B1 (en) 2016-05-04
JP5878676B2 (ja) 2016-03-08
RU2633302C2 (ru) 2017-10-11
CN104704625B (zh) 2018-03-06
WO2014057386A1 (en) 2014-04-17
US20150235887A1 (en) 2015-08-20
CN104704625A (zh) 2015-06-10
RU2015109146A (ru) 2016-11-27
EP2907158A1 (en) 2015-08-19
JP2015530866A (ja) 2015-10-15
US9507276B2 (en) 2016-11-29

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Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 6A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2533 DE 23-07-2019 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.