TW330346B - A photo-reflective type detector and its manufacturing method - Google Patents

A photo-reflective type detector and its manufacturing method

Info

Publication number
TW330346B
TW330346B TW085105284A TW85105284A TW330346B TW 330346 B TW330346 B TW 330346B TW 085105284 A TW085105284 A TW 085105284A TW 85105284 A TW85105284 A TW 85105284A TW 330346 B TW330346 B TW 330346B
Authority
TW
Taiwan
Prior art keywords
photo
reflective type
type detector
manufacturing
emitting
Prior art date
Application number
TW085105284A
Other languages
English (en)
Inventor
Mitsuo Kohachi
Akihiro Fujida
Naoudo Hasegawa
Original Assignee
Sharp Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kk filed Critical Sharp Kk
Application granted granted Critical
Publication of TW330346B publication Critical patent/TW330346B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/12—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto
    • H01L31/16—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the semiconductor device sensitive to radiation being controlled by the light source or sources
    • H01L31/167—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the semiconductor device sensitive to radiation being controlled by the light source or sources the light sources and the devices sensitive to radiation all being semiconductor devices characterised by potential barriers

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
  • Position Input By Displaying (AREA)
TW085105284A 1995-09-20 1996-05-02 A photo-reflective type detector and its manufacturing method TW330346B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP24104995 1995-09-20
JP7500896A JPH09148620A (ja) 1995-09-20 1996-03-28 光反射型検出器及びその製造方法

Publications (1)

Publication Number Publication Date
TW330346B true TW330346B (en) 1998-04-21

Family

ID=26416167

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085105284A TW330346B (en) 1995-09-20 1996-05-02 A photo-reflective type detector and its manufacturing method

Country Status (5)

Country Link
US (2) US5811797A (zh)
EP (1) EP0790654B1 (zh)
JP (1) JPH09148620A (zh)
DE (1) DE69636093T2 (zh)
TW (1) TW330346B (zh)

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JP4700825B2 (ja) * 2000-06-21 2011-06-15 株式会社ミツトヨ 光学式エンコーダ
JP4801243B2 (ja) * 2000-08-08 2011-10-26 ルネサスエレクトロニクス株式会社 リードフレームおよびそれを用いて製造した半導体装置並びにその製造方法
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EP1349279B1 (de) 2002-03-29 2011-04-27 Münchner Hybrid Systemtechnik GmbH Optoelektronischer Berührungs- oder Näherungsschalter
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JP2005156549A (ja) * 2003-11-05 2005-06-16 Sendai Nikon:Kk 光学式エンコーダ
JP2005159137A (ja) * 2003-11-27 2005-06-16 Sharp Corp 光半導体素子およびこの光半導体素子を用いた電子機器
JP2005294494A (ja) * 2004-03-31 2005-10-20 Toshiba Corp 光半導体装置及びその製造方法
JP2006338785A (ja) * 2005-06-02 2006-12-14 Sony Corp 受発光集積装置及び光ディスク装置
US7410282B2 (en) * 2005-10-25 2008-08-12 Visteon Global Technologies, Inc. Bi-functional headlight module
JPWO2008117800A1 (ja) * 2007-03-26 2010-07-15 仁科　▲りん▼太郎 反射型光センサ
US7777172B2 (en) * 2007-06-01 2010-08-17 Fairchild Semiconductor Corporation Methods for reducing cross talk in optical sensors
JP5404026B2 (ja) * 2008-02-29 2014-01-29 京セラ株式会社 受発光一体型素子アレイおよびセンサ装置
JP5204518B2 (ja) * 2008-03-21 2013-06-05 株式会社神戸製鋼所 反射異方性の少ない電子部品用銅合金板
EP2310934A2 (en) * 2008-04-08 2011-04-20 Nxp B.V. Optical pointing device having improved environmental resistance and reflected noise prevention and compensation
JP2010027689A (ja) * 2008-07-15 2010-02-04 Toshiba Discrete Technology Kk 光半導体装置
TWI383129B (zh) * 2008-11-19 2013-01-21 Everlight Electronics Co Ltd 對立式光編碼器
US8420999B2 (en) * 2009-05-08 2013-04-16 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Metal shield and housing for optical proximity sensor with increased resistance to mechanical deformation
US8957380B2 (en) * 2009-06-30 2015-02-17 Avago Technologies General Ip (Singapore) Pte. Ltd. Infrared attenuating or blocking layer in optical proximity sensor
US8779361B2 (en) * 2009-06-30 2014-07-15 Avago Technologies General Ip (Singapore) Pte. Ltd. Optical proximity sensor package with molded infrared light rejection barrier and infrared pass components
US9525093B2 (en) 2009-06-30 2016-12-20 Avago Technologies General Ip (Singapore) Pte. Ltd. Infrared attenuating or blocking layer in optical proximity sensor
US8716665B2 (en) * 2009-09-10 2014-05-06 Avago Technologies General Ip (Singapore) Pte. Ltd. Compact optical proximity sensor with ball grid array and windowed substrate
US9733357B2 (en) * 2009-11-23 2017-08-15 Avago Technologies General Ip (Singapore) Pte. Ltd. Infrared proximity sensor package with improved crosstalk isolation
US8841597B2 (en) * 2010-12-27 2014-09-23 Avago Technologies Ip (Singapore) Pte. Ltd. Housing for optical proximity sensor
GB2490386A (en) * 2011-04-30 2012-10-31 Avago Tech Ecbu Ip Sg Pte Ltd Optical proximity sensor with attenuating layers to reduce crosstalk
DE102012104910B4 (de) 2012-06-06 2022-12-29 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronische Vorrichtung und Apparatur mit einer solchen Vorrichtung
US9696199B2 (en) 2015-02-13 2017-07-04 Taiwan Biophotonic Corporation Optical sensor
US10593823B2 (en) 2015-12-14 2020-03-17 Rohm Co., Ltd. Optical apparatus
JP6536416B2 (ja) * 2016-01-15 2019-07-03 オムロン株式会社 トナー濃度センサおよび画像形成装置
KR101863861B1 (ko) * 2016-08-23 2018-06-01 주식회사 오토닉스 3차원 스캐너
CN108711566B (zh) * 2018-05-25 2024-05-24 南京矽力微电子技术有限公司 光学感测系统、光学感测组件及其制造方法
US20220302094A1 (en) * 2019-08-23 2022-09-22 Rohm Co., Ltd. Optical sensor, and method for manufacturing optical sensor
CN116111440B (zh) * 2023-04-14 2023-08-04 苏州立琻半导体有限公司 光源模组

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US5525828A (en) * 1991-10-31 1996-06-11 International Business Machines Corporation High speed silicon-based lateral junction photodetectors having recessed electrodes and thick oxide to reduce fringing fields
US5656098A (en) * 1992-03-03 1997-08-12 Canon Kabushiki Kaisha Photovoltaic conversion device and method for producing same
JPH0745859A (ja) * 1993-07-30 1995-02-14 Furukawa Electric Co Ltd:The 光センサー
EP0664052B1 (en) * 1993-08-10 1997-12-17 Loral Vought Systems Corporation Photoconductive impedance-matched infrared detector with heterojunction blocking contacts
JP2666700B2 (ja) * 1993-10-20 1997-10-22 日本電気株式会社 フォトカプラ
JP3176496B2 (ja) * 1993-12-27 2001-06-18 シャープ株式会社 光結合装置およびその製造方法
US5682062A (en) * 1995-06-05 1997-10-28 Harris Corporation System for interconnecting stacked integrated circuits

Also Published As

Publication number Publication date
JPH09148620A (ja) 1997-06-06
DE69636093T2 (de) 2006-11-23
US6060337A (en) 2000-05-09
US5811797A (en) 1998-09-22
EP0790654A2 (en) 1997-08-20
EP0790654B1 (en) 2006-05-03
DE69636093D1 (de) 2006-06-08
EP0790654A3 (en) 1998-06-03

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees